CN1023674C - Color display system and tube having electron gun with dual electron modulation - Google Patents
Color display system and tube having electron gun with dual electron modulation Download PDFInfo
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- CN1023674C CN1023674C CN 91110595 CN91110595A CN1023674C CN 1023674 C CN1023674 C CN 1023674C CN 91110595 CN91110595 CN 91110595 CN 91110595 A CN91110595 A CN 91110595A CN 1023674 C CN1023674 C CN 1023674C
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Abstract
An improved color display system includes a cathode-ray tube and a magnetic deflection yoke positioned on the tube. The tube includes an envelope having an inline electron gun for generating and directing three inline beams along initially coplanar paths toward a screen on an interior surface portion of the envelope. The gun includes a plurality of spaced electrodes which comprise three lenses. The first lens includes a beam-forming region for providing substantially symmetrical beams to a second lens. The second lens includes a first modulation electrode for providing asymmetrically-shaped beams to a third, or main, lens At least one, but preferably two, dynamic voltage signals are applied to the modulation electrode of the second lens. Another dynamic voltage signal is applied to a second modulation electrode portion of the third lens. The voltage signals are related to the deflection of the beams and improve the electron beam spot size at the periphery of the tube screen.
Description
The resistance utmost point that the present invention relates to have word order formula three-gun is penetrated fiber tube (CRT), is specifically related to apply at least two kinds of different dynamic electric voltages on two electrodes of electron gun and comes the color cathode ray tube of the spot definition of controlling electron beam.
Because large-screen word order formula color CRT has been applied to computer-aided design (CAD)/computer aided production (CAM) and public place of entertainment recently, for satisfying the high-resolution requirement of these application scenarios, thereby need in whole phosphor screen scope, reduce the electron-baem spot size.The auto-convergence deflection system be used for producing make electron beam on the phosphor screen of pipe the rectangular raster along continuous straight runs and the magnetic field of vertical scan direction.Because the cause of fringing field, described auto-convergence deflection system produces strong astigmatism and deflection defocusing in pipe, and this astigmatism and the deflection defocusing vertically passing during mainly by the electron beam deflecting focuses on and causes, secondly, owes focusing by the level of electron beam and causes.
For this being made compensation, way so far is: produce astigmatism at the electron beam forming area of electron gun, with cause electron beam in vertical direction defocus and to strengthen electron beam Jiao in the horizontal direction poly-.Once constitute this astigmatism bundle and form the district with G1 control electrode that has seam shape aperture and G2 screen grid.These seam shape apertures produce has the non-axially symmetric field of four utmost point components, and this four utmost points component does up different effects to electronics on vertical plane and horizontal plane.Authorized on November 18th, 1980 in people's such as Chen the United States Patent (USP) 4,234,814 this seam shape aperture has been described.These structures are static: described quadrupole field produces the compensation astigmatism when electron beam is not deflected and does not experience the deflection system astigmatism.
For improved dynamic calibration is provided, the United States Patent (USP) 4,319,163 of authorizing Chen March 9 nineteen eighty-two adopts additional upstream screen grid G2a, and this screen grid has the aperture of fluting in the horizontal direction, and, add variable or modulated voltage thereon.Downstream screen grid G2b has circular aperture, and, adding fixed voltage, the variable voltage on the G2a has changed the intensity of quadrupole field, so that the astigmatism that is produced is proportional to the off-axis position that is scanned.
Utilizing the astigmatism bundle to form the district is effectively, but also has some shortcomings.At first,, bundle has little size, so this district is very responsive to structure tolerance because forming the district.Secondly, the optimum value in the time of must making the effective length of G2 grid or thickness depart from it not have fluting aperture.The 3rd, in the time of on variable voltage being added to the grid of restrainting the formation district, beam electronic current may change.The 4th, the position that the validity of quadrupole field is passed along with electron beam (thereby, along with beam electronic current) and change.
The United States Patent (USP) 4,731,563 of authorizing people such as Bloom on March 15th, 1988 discloses a kind of electron gun astigmatic correction mode of not having above-mentioned shortcoming.This electron gun comprises that bundle forms electrode, main focus lens electrode and be used for forming two staggered electrodes that form multipole lens between district and the main focusing lens at the bundle of every electron beam path.Each multipole lens suitably is orientated, proofreading and correct relevant electron beam, thereby, compensate the influence of astigmatical magnetic deflection field at least in part to this electron beam.First multi-polar electrode lens forms between region electrode and the main focus lens electrode at bundle.Second multi-polar electrode lens is connected to main focus lens electrode, and, between first multi-polar electrode lens and main focusing lens, near first multi-polar electrode lens.Provide a kind of being used for that fixed-focus voltage is added to second multi-polar electrode lens, and, the dynamic voltage signal relevant with the electron beam deflecting is added to device on first multi-polar electrode lens.The position of each multipole lens is near main focusing lens, the intensity that is enough to make main focusing lens is as the function of the voltage quantities of dynamic voltage signal and change, this dynamic voltage signal is controlled first multi-polar electrode lens with horizontal frequency, so that with the distortion of single waveform correction electron beam on 3:00 and 9:00 point (hereinafter referred to as 3D and 9D) phosphor screen position.But,, make electron beam on the position of axle, pass the strong part of main focusing lens because fringing field infiltrates electron gun.The vertically passing focussing force that produces from the frame deflector coil of axle path and auto-convergence deflection system of electron beam require the vertical focusing voltage at the phosphor screen top be higher than the vertical focusing voltage of phosphor screen center and, must realize the dynamic calibration of this focus voltage difference with vertical scanning frequency.Can realize this point by in main focusing lens, using described cross structure, but, because vertical frequency is low, so will be economically required waveform being coupled in the focusing power supply and not damaging focusing power supply with capacitive way be difficult with respect to the tracking characteristics of anode supply.
The United States Patent (USP) 4,764,704 of authorizing people such as New on August 16th, 1988 is United States Patent (USP) 4,731, and 563 dynamic modulated multipole lens and bundle at electron gun form the district and combine with supplementary lens between the multipole lens.This supplementary lens in addition, asymmetricly focuses on electron beam, so that provide non-symmetrical electron beam to main lens for form static shift correction being provided and making its refraction from the axle electron beam of district's lens ejaculation from bundle.The shortcoming of this supplementary lens is: be used to electron beam to provide the rectangle aperture of static shift correction to be difficult to accurate centering in cylindrical rigging pilotage in the electron gun manufacture process.
People such as Katsume are being entitled as " the dynamic astigmatism controller current potential focused electron rifles of 21 inches plane corner chromoscopes " [SIDDIGEST, a kind of four current potential focused electron rifles that are provided with six electrodes have been described in article 136(1988)], wherein, the 4th electrode (G4) comprises three discrete component (G41, G42 and G43), the dynamic electric voltage of parabolic waveform be added on the G2 electrode and the element G41 and G43 of G4 electrode on.The G42 element has vertical orientated oval aperture, and this aperture and the circular aperture that is positioned at G41 and G43 element constitute quadrupole lens up and down and towards the horizontal blade of G42 element jointly, and these lens provide suitable compensation for astigmatism and deflection defocusing.The shortcoming of described electron gun is: the number of element has increased, thereby, improved the cost of electron gun, and the oval aperture on the G42 element runs into aspect centering and United States Patent (USP) 4,764, the identical difficulty that 704 rectangle aperture runs into.
People such as Shirai are being entitled as a kind of modification of having described people's such as Katsuma electron gun in " quadrupole lens that is used for the control of oval aperture lens electron gun dynamic focusing and astigmatism " [SIDDIGEST, 162(1987)] literary composition.The quadrupole lens of this electron gun (also comprising three-element G4 electrode) is made of the G41 of non-rotating symmetrical through hole in the G42 element and G4 electrode and the circular aperture horizontal line of rabbet joint on every side of G43.On G41 and G43 element, add dynamic electric voltage.The shortcoming of this electron gun is: the astigmatic correction limited ability of quadrupole lens is in the aberration of main lens.
Improved cathode ray tube of the present invention comprises the shell that electron gun is housed, and this used in electron gun is in producing three beams word order formula electron beam and making their phosphor screens on a part of inner surface of initial copline path this shell of directive.This electron gun comprises a plurality of electrodes that separate of forming three lens.First lens have and are used to second lens that the formation district of the electron beam of substantial symmetry is provided.Second lens comprise the asymmetrical bundle focusing arrangement that is used to the 3rd lens that non-symmetrical electron beam is provided.Be provided at least a dynamic voltage signal is added to device on first modulator electrode of second lens.Also be provided for simultaneously another kind of dynamic electric voltage is added to device on second modulator electrode of the 3rd lens.This first and second signal is relevant with the deflection of electron beam, thereby, improved phosphor screen electron-baem spot size on every side.Can also on first modulator electrode of second lens, add the different additional dynamic voltage signal relevant, with the further performance of improving pipe with the electron beam deflecting.
In the accompanying drawing:
Fig. 1 (the 1st page) is the plane graph of the section axial section of common color cathode ray tube.
Fig. 2 (the 2nd page) is the profile of signal of the general structure of explanation common double current potential four gate electron rifles.
Fig. 3 (the 1st page) is the image of electron beam light spot form on the explanation common color cathode ray tube screen.
The electron beam current density isopleth of phosphor screen center is shown for Fig. 2 electron gun the 2nd page of Fig. 4 a(); The 2nd page of Fig. 4 b() be illustrated in the isopleth of electron beam current density in the main lens of electron gun of Fig. 2; And the 2nd page of Fig. 4 c() electron beam deflecting of electron gun that Fig. 2 is shown current density isopleth during the fluoroscopic upper right corner in Fig. 3.
Fig. 5 and Fig. 6 are respectively the axial front view and the end views of electron gun of the present invention.
Fig. 7 (the 4th page), the 5th page of 8(), the 5th page of 9() and the 6th page of 10() be respectively the profile of electron gun shown in Fig. 5 along 7-7,8-8,9-9 and 10-10 line of vision.
The electron beam that Figure 11 (the 6th page) illustrates electron gun of the present invention leaves the beam current density isopleth of restrainting when forming district's (first lens).
Figure 12 (the 6th page) illustrates the current density isopleth of electron beam in main lens by second lens generation of electron gun of the present invention.
Figure 13 (the 7th page) illustrates two curves, and they are represented respectively in order to make along having managed major axis and having focused on and the line frequency modulation voltage that must superpose on the 7KV of G5 ' electrode focus voltage along the vertical component of the electron beam at phosphor screen top.
Figure 14 (the 8th page) illustrates a curve, and its expression is in order to make along the electron beam focusing of pipe minor axis and the frame frequency modulation voltage that must superpose on the low focusing of the best voltage of G4 electrode.
Figure 15 (the 9th page) illustrates a curve, the line frequency modulation voltage that its expression must superpose on the low focusing of the best voltage of G4 electrode for the additional convergence correction factor is applied to deflection beam.
Figure 16 (the 10th page) illustrates a pair of curve, electron beam spot definition and the functional relation that is added in the line frequency modulation voltage on the G4 electrode on 3D of their explanation phosphor screen upper edge major axis and the 9D position.
Figure 17 (the 11st page) illustrates a pair of curve, 6D and the locational electron-baem spot size of 12D and the functional relation that is added in the frame frequency modulation voltage on the G4 electrode of their explanation phosphor screen upper edge pipe minor axises.
Fig. 1 illustrates common rectangle chromoscope 10, its glass bulb 11 comprises rectangular panel 12 and bores the 16 tubulose necks 14 that are connected with the rectangle glass, panel 12 comprises watches panel 18 and circumferential flange or sidewall 20, with the frit seal method flange 20 is sealed on the glass awl 16.Inserted tricolour phosphor screen is set on the inner surface of panel 18.This phosphor screen is line-screen preferably, and simultaneously, phosphor strip extends along the high-frequency grating direction of line scan that is substantially perpendicular to pipe (direction of line scan is perpendicular to the plane of Fig. 1).In addition, this phosphor screen can be a screen.Use commonsense method, porous color selection electrode or planar mask 24 are removably mounted on leave phosphor screen 22 preset distance places.The in-line gun 26 that with dashed lines schematically is shown among Fig. 1 is installed in centre in the neck 14, is used to produce three-beam electron-beam 28, and makes them pass planar mask 24 directive phosphor screens 22 along initial copline beam path.One of ordinary electronic rifle is four grid bipotential electron guns, for example, authorizes on October 28th, 1986 described in people's such as Morrell the United States Patent (USP) 4,620,133, is shown in the electron gun among this paper Fig. 2.
Pipe among Fig. 1 is predetermined to be used with the external magnetic deflection system, for example, is positioned at the deflection system 30 in glass awl and pipe pre-connection district.When excitation deflection system 30, this system makes three-beam electron-beam 28 be subjected to the effect in magnetic field, and this magnetic field makes level and vertical scanning in the rectangular raster of electron beam on phosphor screen 22.Represent initial deflection (zero deflection state) plane with line P-P among Fig. 1 near deflection system 30 central authorities.Because the cause of fringing field, the deflecting region of pipe stretches into the zone of electron gun 26 vertically from deflection system 30.In order to simplify the actual flexion situation in deflection beam path in the not shown deflecting region among Fig. 1.Deflection system 30 produces non-uniform magnetic-field, and this magnetic field has strong pincushion vertical deflection magnetic field and strong barrel-shaped horizontal deflection magnetic field, so that make electron-beam convergence at peripheral part of phosphor screen 22.Distortion takes place and defocuses in electron beam when passing this non-uniform magnetic-field.As a result, at peripheral part of phosphor screen 22, the shape of electron-baem spot seriously distorts.Fig. 3 represents the Shu Guangdian of single electronic beam, and this luminous point is round in fluoroscopic center, and produces various forms of distortion around fluoroscopic.As shown in Figure 3, when along trunnion axis deflection, electron-baem spot has elongated in the horizontal direction.In fluoroscopic four corners, electron-baem spot elongates part by level and vertical elongation partly combines, the result, and the haloing shape elongates the elliptical spot of part around the formation band.Resolution reduces along with the electron beam deflecting, thereby the non-homogeneous focusing of can not ignore has produced the problem that must be solved.
Above-mentioned United States Patent (USP) 4,620,133 are devoted to described bundle focus issues, its method is: a kind of color image display device that comprises deflection system and electron gun is provided, this electron gun has bundle formation district, and (this district comprises first grid G1, second grid G2 and the 3rd grid G 3) and main focusing lens G3-G4, this main focusing lens and deflection system, bundle form district's collaborative work, to form Shu Guangdian on phosphor screen 22.Fig. 4 a herein illustrates for the electron beam that forms district and main lens generation for the bundle by electron gun shown in Fig. 2, the electron beam current density isopleth of phosphor screen 22 centers.Described electron gun current is 4 milliamperes.The electron beam current density isopleth of Fig. 4 a comprises bigger center and some surrounding zones, described center has constant basically beam electronic current, its value approximately is 50% of an average beam current, and in the surrounding zone, beam electronic current drop to average beam current about 5%, drop to 1% of average beam current at last.This electron beam is elongated to ellipse along vertical axis, to reduce the focussing force of crossing of electron-beam deflection system.Fig. 4 b is illustrated in the electrode G3 of Fig. 2 and the beam current density isopleth among the main lens L2 between the G4.In this position, electron beam is elongated in the horizontal direction; But, 50% beam current density district still is contained in the little oval core of electron beam, around this core is the bigger area elliptica of representing 5% and 1% current density isopleth of electron beam, and described electron beam is the electron beam that deflects into the phosphor screen upper right corner.At the identical haloing of the upper and lower appearance of this electron beam core.In large-screen receiver and CAD/CAM application scenario, the Shu Guangdian that described common double current potential electron gun produces on phosphor screen is unsafty.
The details of electron gun 40 of the present invention shown in Fig. 4 and 6.Electron gun 40 comprises: negative electrode of three every beam electrons bundles of equally spaced coplanar negative electrode 42(), control grid 44(G1), screen grid 46(G2), third electrode 48(G3), the 5th electrode 52(G5 the 4th electrode 50(G4)) (this G5 electrode comprises G5 ' part 54 and G5 " part 55) and the 6th electrode 56(G6).These electrodes order by name are that starting point separates arrangement with the negative electrode, and are fixed on a pair of glass support bar (not shown).
As known in the art, each negative electrode 42 comprises the cathode tube 58 of its front end by cathode cap 60 sealings, and cathode cap 60 has the end coating 62 that comprises electronic emission material.Each negative electrode 42 is by the heater coil (not shown) indirect that is positioned on cathode tube 58 appropriate locations.
G1 and G2 electrode 44,46 are two close to each other, flat plate electrodes basically, and they have three apertures 64 and 66 that pass word order wherein separately.Aperture 64 and 66 and cathode 62 centerings, with the equally spaced copline electron beam of the three beams 28(of excitation directive phosphor screen 22 as shown in fig. 1).Initial electron beam path is preferably substantially parallel, and simultaneously, intermediate path overlaps with the central shaft A-A of electron gun.
Novel G4 modulator electrode 50 comprises flat basically flat board, and the latter has the aperture 80 of the word order that passes three non-rotating symmetries wherein, aperture 78 centerings in these apertures and the G3 electrode.The shape of aperture shown in Fig. 7 80.
As shown in Figure 7, non-rotating to being much of hole 80 (that is the orientation of each aperture) upward elongation in the horizontal direction.In the aperture 80 each comprises round basically core, and the latter comprises radius r
1The main aperture 120 of=0.079 inch (2.007mm) and the arch section 122 of a pair of reverse setting, the latter is made of the secondary hole of each side that is positioned at main aperture.This pair hole and main aperture 120 are local overlapping, and the radius r in each secondary hole
2=0.020 inch (0.511mm), and each secondary hole is positioned at the distance that trunnion axis B-B goes up, leaves the center 0.067 inch (1.702mm) of main aperture 120, and therefore, total horizontal size H of aperture 80 is 0.174 inch (4.420mm).Merge smoothly in main aperture 120 in secondary hole 122.The maximum vertical size of aperture 80 is 0.158 inch (4.013mm), promptly equals the diameter of main aperture 120.This circle main aperture is convenient to cylindrical assembling pin assembling electron gun element.Non-rotating symmetrical aperture 80 provides passing four utmost point focussing forces of electron beam therebetween, and, strengthen this effect by adding the dynamic electric voltage that changes with the electron beam deflecting thereon.Above-mentioned United States Patent (USP) 4,319,163 discloses the method that adds dynamic electric voltage on the electron gun element of low voltage.
" electrode part 55 comprises the cup-shape member of first deep-draw to G5, at three apertures 82 that centered on by jut 83 of the bottom of this member processing.Three apertures 86 of flat basically this member of planar plate members 84(and aperture 82 centerings) be fixed on the openend of first cup-shape member, and, with this openend sealing, there is first plate part 88 of a plurality of apertures 90 to be fixed on the reverse side of planar plate members 84.
G5 ' electrode part 54 comprises the second deep-draw cup-shape member, forms groove 92 in the bottom of this member, simultaneously, and at the aperture 94 of three word orders of the bottom surface of groove 92 processing.Jut 95 is around aperture 94.The reverse openend of G5 ' electrode part 54 is by the sealing of second plate part 96, passes three apertures of this second plate part and aperture 90 centerings in first plate part 88, and, match with aperture 90 by following mode.
The shape of the groove 92 in the electrode of G5 ' shown in Fig. 8 part 54, for each electron beam path, groove 92 has consistent vertical height, and this groove has circular end.This shape is called " runway " shape.
The shape of macropore 100 in the electrode 56 of G6 shown in Fig. 9, the vertical height of macropore 100 is bigger at avris electron beam path place, and less at center electron beam path place.This shape is called " dog bone " or bar official seal " shape.
" first plate part 88 of electrode part 55 is in the face of second plate part 96 of G5 ' electrode part 54; aperture 90 in first plate part 88 has the jut that stretches out from this plate part; for each aperture; this jut is divided into two segmentations 106 and 108; aperture 98 in second plate part also has the ledge that stretches out from this plate part; for each aperture for G5, this jut is divided into two segmentations 110 and 112, as shown in Figure 10, segmentation 106 and 108 and segmentation 110 and 112 staggered, these segmentations are used for when different voltages are added to G5 respectively " when electrode part 55 and G5 ' electrode part 54; set up multipole (for example, four utmost points) lens in each electron beam path.By on G5 ' electrode, adding suitable dynamic voltage signal, might utilize by segmentation 106,108,110 and 112 quadrupole lenss of setting up, provide astigmatic correction, to proofread and correct or in electron gun or the astigmatism that in deflection system, occurs to electron beam.Above-mentioned United States Patent (USP) 4,731,563 has been described this quadrupole lens.
Provide the concrete size of the electron gun of using computer simulation that is used for the 27V110 pipe in the following table.(table is seen the literary composition back)
Among the embodiment that in table, provides, resembling shown in Fig. 6, electron gun 40 is electrically connected.In general, negative electrode is operated in about 150V, and the G1 electrode is in earth potential, and the G2 electrode is operated in the scope of about 300V to 1000V, G3 electrode and G5, and " electrode partly is connected to each other and is operated in about 7KV, and the G6 electrode is operated in the anode voltage of about 25KV.At least on G4 electrode and G5 ' electrode, add different dynamic electric voltages.
In electron gun 40 of the present invention, first lens L1(Fig. 6) comprise G1 electrode 44, the adjacent part of G2 electrode 46 and G3 electrode 48, lens L1 forms the high-quality electron beam of symmetric figure, rather than the non-symmetrical electron beam among the second lens L2.The beam current density isopleth of one of each electron beam of L1 shown in Figure 11.As can be seen, bundle of the present invention forms the district and do not produce any tangible asymmetry in electron beam.
The adjacent part that the second lens L2 comprises G4 modulator electrode 50 and G3 electrode 48 and G5 electrode 52 (promptly, G5 " electrode part 55); lens L2 constitutes non-sym lens; the latter forms the electron beam that horizontal direction is elongated; the Shu Guangdian isopleth of this electron beam shown in Figure 12 in the 3rd lens (promptly; main lens) L3, passes the non-rotating symmetrical aperture 80 of G4 electrode 50 and the dynamic electric voltage that is added on it and combines, and produces oval-shaped basically electron beam.
The still low aberration lens of main focusing lens (that is the 3rd the lens) L3 that between G5 ' electrode part 54 and G6 electrode 56, forms; When main lens modulation electrode portion 54 and focusing electrode 52 be in same potential (approximately 7KV) and, when G4 electrode 50 is in same potential (approximately 350V) with G2 electrode 46, these lens are in optimum state (as described below, as to obtain zero astigmatism in phosphor screen central authorities).
In electron gun 40 of the present invention, G4 modulator electrode 50 is all influential for modulation of the line frequency along pipe major axis (orientation of in-line gun) from the phosphor screen position of 3D to 9D (15.75KHz) and the modulation of the frame frequency along pipe minor axis (perpendicular to described orientation) from the phosphor screen position of 6D to 12D (60H).But, since under big current conditions the too close electron beam crossover location of G4 electrode, so, this electrode can not full remuneration at pipe corner 2D, 10D(because symmetry, can not full remuneration at pipe corner 4D, 8D) in deflection defocusing.Since under vertical sweep frequency in high voltage focusing power supply (7KV) capacity coupled difficulty, and, owing to the G4 electrode 50 that only utilizes low-voltage, invalid, so the present invention adopts the double modulation electrode in the modulation of the corner of pipe (2D, 10D and 4D, 8D) line frequency.The line frequency modulation is by finishing on the focusing power supply voltage (this voltage is added to G5 ' electrode part 54) that parabola shaped basically voltage signal (this voltage increases with the increase of deflection angle) is added to.The frame frequency modulation is to realize by different parabola shaped voltage signal (this signal also increases with the increase of deflection angle) being added to low focusing on the voltage (this voltage is added to G4 electrode 50).
Figure 13 illustrates first curve 124, this curve description for focus on along the pipe major axis electron beam from position 3D to position 9D, needed line frequency modulated voltage signal [for (phosphor screen center) focus voltage (7KV)] on G5 ' electrode part 54.Curve 126 expression: when focusing on from position 6D to position 12D correcting electronic bundle when suitable frame frequency modulated voltage signal is added to G4 electrode 50 so that along the minor axis of pipe, on G5 ' electrode part 54, need higher line frequency modulation voltage so as from this head of phosphor screen top (or bottom) to that (from 2D to 10D, perhaps, focused beam 4D to 8D).The modulated voltage signal of frame frequency shown in Figure 14 curve 128.
As can be seen from Figure 13, shortcoming by the bipolar electrode dynamic modulation signal voltage that waveform provided of Figure 13 and 14 is: for the required line frequency modulated voltage signal (curve 126) of focused beam correctly along fluoroscopic top, at corner 2D and 10D place, greater than along the major axis of pipe, from 3D to the 9D required line frequency modulated voltage signal (curve 124) of focused beam correctly.In other words, with the line frequency modulation of G5 ' main lens electrode part 54 and the frame frequency modulation of G4 electrode 50, can not realize edge length/minor axis fully and while focused beam on described each corner location.Though the bipolar electrode dynamic modulation of described " simply " is suitable,, it fails to make the optimized performance of this device.
Adopt " compound " bigrid modulated energy to make its optimized performance, described modulation forces along major axis (3D to 9D) and the total line frequency modulation voltage in each corner (2D to 10D) and equates.Because, though G4 electrode 50 is that effectively this is invalid for corner 2D and 10D for the line frequency modulation at fluorescence position 3D and 9D place, so, by on G4 modulator electrode 50, adding additional line frequency modulated voltage signal, can realize above-mentioned purpose.Therefore, by 10 to-300V(with respect to G2) the second line frequency modulated voltage signal 130 in the scope is added on the G4 electrode 50, make the locational electron beam of 3D and 9D cross focusing, can bring up to the value shown in the curve 126 to the amplitude that is added to the first line frequency modulated voltage signal on the G5 ' electrode part 54, thereby, when maintenance focuses on 3D and 9D position along major axis, realize focusing at corner 2D and 10D place, Figure 15 illustrates the second line frequency modulated voltage signal 130.
Figure 16 and 17 represent respectively to be added to line frequency on the G4 electrode 50 and frame frequency modulated voltage signal to along major axis at 3D to 9D place and along the influence of minor axis in the bundle spot definition at 6D to 12D place, Figure 16 represents: under the situation than the needed working point of the low about 300V of the G2 voltage of 350V, major axis along pipe, electron-baem spot size on the phosphor screen is elongated with about 1.6: 1 ratio in the horizontal direction, Figure 17 represents: under the situation of the high approximately needed working point of 300V than G2 voltage, at position 6D and 12D place along the pipe minor axis, the electron beam spot definition is elongated with about 1.7: 1 ratio in vertical direction on the phosphor screen, the spot definition of above-mentioned modulation effects vertical direction, and do not influence the spot definition of horizontal direction basically.
In a word, improved electron gun 40 comprises three lens, can modulate the second and the 3rd lens wherein respectively, the aberration that the auto-convergence deflection system that centers on pipe by glass awl and neck junction at shell with correction causes in electron gun, the 3rd lens comprise G5 ' electrode part, can modulate this electrode with first voltage signal with line-scanning frequency, so that direction along the pipe major axis, for the electron beam on the phosphor screen provides convergence correction, can be added to second voltage signal on the G4 electrode of second lens with vertical sweep frequency, so that along the short-axis direction of pipe, for the electron beam on the phosphor screen provides convergence correction.(this technology is except above-mentioned modulation voltage by adopting the Composite Double modulation technique, also comprise the additional line frequency modulated voltage signal that is added on the G4 electrode) and improve the line frequency modulation voltage that is added on the G5 ' electrode part, not only can make the focus optimization of electron beam along major axis and minor axis, and, electron beam is focused on.
Table
The inch millimeter
K-G1 interval 0.003 0.08
The thickness 0.0025 0.06 of G1 electrode 44
The thickness 0.024 0.61 of G2 electrode 46
G1 and G2 hole diameter 0.025 0.64
G1 and G2 interval 0.010 0.25
G2 and G3 interval 0.03 0.76
The thickness 0.010 0.25 of G3 plate part 68
G3 hole diameter 0.040 1.02
G3 electrode length 0.200 5.08
The thickness 0.035 0.89 of G4 electrode 50
G4 electrode orifice size 0.158V X 4.01V X
0.174H 4.42H
G3 and G4 interval 0.050 1.27
G5 " and G5 ' electrode part
55 and 54 total length 0.890 22.61
G4 and G5 interval 0.050 1.27
Interval 0.040 1.02 between the plate part 88 and 96
The length 0.130 3.30 of G6 electrode
G5 and G6 interval 0.050 1.27
The aperture interval 0.200 5.08 of center to center
The length 0.035 0.89 of G3 jut 79
The length 0.029 0.74 of G5 jut 83
The length 0.034 0.86 of G5 ' jut 95
The length 0.045 1.14 of G6 jut 105
Claims (3)
1, a kind of color cathode ray tube, it comprises the shell that in-line gun is housed, described used in electron gun is in the electron beam that produces the three beams word order, and make their phosphor screens on a part of inner surface of the described shell of initial copline path directive, described electron gun comprises a plurality of electrodes that separate each other, these electrodes are formed for focusing on first of described electron beam, the second and the 3rd lens, described first lens comprise and are used for providing the bundle of the electron beam of substantial symmetry to form the district to described second lens, described second lens comprise the electron beam focusing arrangement that is used for providing to described the 3rd lens the non-rotating symmetry of non-symmetrical electron beam, described the 3rd lens are main focusing lenss of low aberration, it is characterized in that:
The electron beam focusing arrangement of the described non-rotating symmetry of described second lens (L2) comprises having three first modulator electrodes (50) that pass the aperture (80) of the word order of non-rotating symmetry therebetween, and each in the described aperture is elongated on described word order direction and comprised having the first radius (r
1) central circular shaped section (120) and two arch sections (122) that oppositely are provided with, the circumference of the latter and described central circular shaped section intersects, and each is perpendicular to the diameter (2r of the size on the direction of described word order direction less than described central circular shaped section
1).
2, color cathode ray tube according to claim 1, it is characterized in that: described arch section (122) comprises the circular secondary hole (122) of partial stack on described central circular shaped section (120), and described secondary hole has separately less than the described first radius (r
1) the second radius (r
2).
3, color cathode ray tube according to claim 1, it is characterized in that: on every electron beam path, between described second lens (L2) and described the 3rd lens (L3), multipole lens is set, the electrode that is used to form this multipole lens comprises first multi-polar electrode lens (88) and second multi-polar electrode lens (96), described first multi-polar electrode lens comprises the part (55) of described second lens, and described second multi-polar electrode lens comprises the part (54) of described the 3rd lens.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US263,454 | 1988-10-27 | ||
| US07/263,454 US4877998A (en) | 1988-10-27 | 1988-10-27 | Color display system having an electron gun with dual electrode modulation |
| CN89107897A CN1017204B (en) | 1988-10-27 | 1989-10-10 | Colour display system and tube having electron gun with dual electron modulation |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN89107897A Division CN1017204B (en) | 1988-10-27 | 1989-10-10 | Colour display system and tube having electron gun with dual electron modulation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1061110A CN1061110A (en) | 1992-05-13 |
| CN1023674C true CN1023674C (en) | 1994-02-02 |
Family
ID=25742587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 91110595 Expired - Lifetime CN1023674C (en) | 1988-10-27 | 1991-11-02 | Color display system and tube having electron gun with dual electron modulation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1023674C (en) |
-
1991
- 1991-11-02 CN CN 91110595 patent/CN1023674C/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1061110A (en) | 1992-05-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C15 | Extension of patent right duration from 15 to 20 years for appl. with date before 31.12.1992 and still valid on 11.12.2001 (patent law change 1993) | ||
| OR01 | Other related matters | ||
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Granted publication date: 19940202 |