CN102313563B - 霍尔传感器 - Google Patents
霍尔传感器 Download PDFInfo
- Publication number
- CN102313563B CN102313563B CN201110197634.7A CN201110197634A CN102313563B CN 102313563 B CN102313563 B CN 102313563B CN 201110197634 A CN201110197634 A CN 201110197634A CN 102313563 B CN102313563 B CN 102313563B
- Authority
- CN
- China
- Prior art keywords
- hall element
- hall
- input terminal
- current input
- control current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
- H10N52/101—Semiconductor Hall-effect devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010-153109 | 2010-07-05 | ||
JP2010153109 | 2010-07-05 | ||
JP2011-113472 | 2011-05-20 | ||
JP2011113472A JP5679906B2 (ja) | 2010-07-05 | 2011-05-20 | ホールセンサ |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102313563A CN102313563A (zh) | 2012-01-11 |
CN102313563B true CN102313563B (zh) | 2015-07-22 |
Family
ID=45399071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110197634.7A Expired - Fee Related CN102313563B (zh) | 2010-07-05 | 2011-07-05 | 霍尔传感器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8427140B2 (zh) |
JP (1) | JP5679906B2 (zh) |
KR (1) | KR101755698B1 (zh) |
CN (1) | CN102313563B (zh) |
TW (1) | TWI504031B (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013201230A (ja) * | 2012-03-23 | 2013-10-03 | Seiko Instruments Inc | ホールセンサ |
JP2013201229A (ja) * | 2012-03-23 | 2013-10-03 | Seiko Instruments Inc | ホールセンサ |
CN102723350B (zh) * | 2012-06-21 | 2014-07-23 | 吉林大学 | 基于PbSe胶体量子点的阵列式霍尔元件的制作方法 |
US9217783B2 (en) | 2012-09-13 | 2015-12-22 | Infineon Technologies Ag | Hall effect device |
CN103542869B (zh) * | 2013-10-24 | 2016-03-09 | 南京邮电大学 | 一种消除霍尔失调的四相电流旋转电路和方法 |
EP3180628B1 (en) * | 2014-08-13 | 2020-09-30 | The Timken Company | Hall effect sensor and system with improved sensitivity |
JP2016070829A (ja) * | 2014-09-30 | 2016-05-09 | エスアイアイ・セミコンダクタ株式会社 | ホールセンサ |
JP6483418B2 (ja) * | 2014-11-27 | 2019-03-13 | エイブリック株式会社 | ホールセンサおよびホールセンサの温度によるオフセットの補償方法 |
CN104535087B (zh) * | 2014-12-26 | 2017-06-09 | 上海集成电路研发中心有限公司 | 霍尔元件及霍尔元件结构 |
CN104502868A (zh) * | 2014-12-29 | 2015-04-08 | 南京大学 | 一种高精度的十字霍尔传感器的电路模型 |
CN104965182A (zh) * | 2015-07-03 | 2015-10-07 | 乐鑫信息科技(上海)有限公司 | 一种集成霍尔效应探测器的无线物联网芯片及方法 |
JP6676972B2 (ja) * | 2016-01-12 | 2020-04-08 | 株式会社デンソー | 磁気センサ |
JP6697909B2 (ja) * | 2016-03-15 | 2020-05-27 | エイブリック株式会社 | 半導体装置とその製造方法 |
CN106653998A (zh) * | 2016-08-23 | 2017-05-10 | 苏州矩阵光电有限公司 | 一种霍尔元件及其制备方法 |
KR101891727B1 (ko) | 2016-12-01 | 2018-08-24 | 국민대학교산학협력단 | 홀센서를 이용한 배터리상태 감지장치 및 이를 적용한 배터리 |
EP3385727A1 (de) * | 2017-04-07 | 2018-10-10 | Siemens Aktiengesellschaft | Verfahren zur strommessung und strommessvorrichtung |
CN111682104A (zh) * | 2020-06-02 | 2020-09-18 | 电子科技大学 | 一种基于平面工艺的异质结三维磁场测量霍尔传感器 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN87102998A (zh) * | 1986-04-29 | 1987-11-11 | 兰迪斯和吉尔楚格股份公司 | 可集成的霍尔元件 |
EP0362493A1 (de) * | 1988-09-21 | 1990-04-11 | Landis & Gyr Business Support AG | Hallelement |
WO2004025742A1 (de) * | 2002-09-10 | 2004-03-25 | Sentron Ag | Magnetfeldsensor mit einem hallelement |
CN101459217A (zh) * | 2007-12-14 | 2009-06-17 | 上海华虹Nec电子有限公司 | 霍尔盘 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62208683A (ja) | 1986-03-07 | 1987-09-12 | Seiko Instr & Electronics Ltd | 磁気センサ |
DE59108800D1 (de) * | 1991-12-21 | 1997-08-28 | Itt Ind Gmbh Deutsche | Offsetkompensierter Hallsensor |
JPH06186103A (ja) | 1992-12-21 | 1994-07-08 | Taisee:Kk | センサー端子切替手段、並びに磁気測定方法若しくは圧力測定方法 |
JPH08102563A (ja) * | 1994-08-02 | 1996-04-16 | Toshiba Corp | 半導体ホール素子 |
EP0704710B1 (en) * | 1994-09-29 | 2003-02-05 | Ramesh, G. Mani, Dr. | Method for compensating the piezoresistive offset voltage in doubly connected Hall effect devices based on silicon |
DE19954360C2 (de) | 1999-11-11 | 2001-09-20 | Fraunhofer Ges Forschung | Hall-Element |
KR100608178B1 (ko) * | 2001-07-26 | 2006-08-04 | 아사히 가세이 덴시 가부시끼가이샤 | 반도체 홀 센서 |
US7372119B2 (en) * | 2001-10-01 | 2008-05-13 | Asahi Kasei Microsystems Co., Ltd. | Cross-shaped Hall device having extensions with slits |
US7015557B2 (en) | 2004-04-16 | 2006-03-21 | Honeywell International Inc. | Hall element with segmented field plate |
US7902820B2 (en) * | 2005-05-03 | 2011-03-08 | Imec | Method and apparatus for detecting spatially varying and time-dependent magnetic fields |
US7701756B2 (en) * | 2005-12-21 | 2010-04-20 | Governing Council Of The University Of Toronto | Magnetic memory composition and method of manufacture |
WO2007116823A1 (ja) * | 2006-04-03 | 2007-10-18 | Asahi Kasei Emd Corporation | ホール素子及び磁気センサ |
JP5073429B2 (ja) | 2007-09-18 | 2012-11-14 | 日本碍子株式会社 | 磁気センサ、ホール素子、磁気抵抗効果素子、ホール素子の作製方法、磁気抵抗効果素子の作製方法 |
WO2009070201A1 (en) * | 2007-11-27 | 2009-06-04 | Micromem Technologies Inc. | Sensor for a magnetic memory device and method of manufacturing the same |
-
2011
- 2011-05-20 JP JP2011113472A patent/JP5679906B2/ja not_active Expired - Fee Related
- 2011-06-30 US US13/135,301 patent/US8427140B2/en not_active Expired - Fee Related
- 2011-07-01 TW TW100123340A patent/TWI504031B/zh not_active IP Right Cessation
- 2011-07-04 KR KR1020110066068A patent/KR101755698B1/ko active IP Right Grant
- 2011-07-05 CN CN201110197634.7A patent/CN102313563B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN87102998A (zh) * | 1986-04-29 | 1987-11-11 | 兰迪斯和吉尔楚格股份公司 | 可集成的霍尔元件 |
EP0362493A1 (de) * | 1988-09-21 | 1990-04-11 | Landis & Gyr Business Support AG | Hallelement |
WO2004025742A1 (de) * | 2002-09-10 | 2004-03-25 | Sentron Ag | Magnetfeldsensor mit einem hallelement |
CN101459217A (zh) * | 2007-12-14 | 2009-06-17 | 上海华虹Nec电子有限公司 | 霍尔盘 |
Also Published As
Publication number | Publication date |
---|---|
CN102313563A (zh) | 2012-01-11 |
US8427140B2 (en) | 2013-04-23 |
TWI504031B (zh) | 2015-10-11 |
KR20120003818A (ko) | 2012-01-11 |
KR101755698B1 (ko) | 2017-07-07 |
JP2012032383A (ja) | 2012-02-16 |
US20120001280A1 (en) | 2012-01-05 |
TW201216538A (en) | 2012-04-16 |
JP5679906B2 (ja) | 2015-03-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160310 Address after: Chiba County, Japan Patentee after: SEIKO INSTR INC Address before: Chiba, Chiba, Japan Patentee before: Seiko Instruments Inc. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Chiba County, Japan Patentee after: EPPs Lingke Co. Ltd. Address before: Chiba County, Japan Patentee before: SEIKO INSTR INC |
|
CP01 | Change in the name or title of a patent holder | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150722 Termination date: 20210705 |
|
CF01 | Termination of patent right due to non-payment of annual fee |