CN102312219A - Coating device - Google Patents
Coating device Download PDFInfo
- Publication number
- CN102312219A CN102312219A CN2010102137443A CN201010213744A CN102312219A CN 102312219 A CN102312219 A CN 102312219A CN 2010102137443 A CN2010102137443 A CN 2010102137443A CN 201010213744 A CN201010213744 A CN 201010213744A CN 102312219 A CN102312219 A CN 102312219A
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- China
- Prior art keywords
- roller
- coating apparatus
- film coating
- heater coil
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The invention relates to a coating device. The coating device adopts an atomic layer deposition method to carry out coating. The coating device comprises a cavity, wherein the inner wall of the cavity is provided with a heating unit, and the heating unit is provided with a containing space which is used for containing an idler wheel and coating the idler wheel.
Description
Technical field
The present invention relates to a kind of film coating apparatus.
Background technology
The blooming piece general using has the copper roller of microstructure engraving at present, resin carrier is impressed back light solidify completion, and on processing procedure, be difficult to avoid grit to drop in roller surface.Less because of the hard copper hardness of plating, so when roller remained in operation, grit just drove between resin carrier and wheel face thereupon, cause scratch at last and cause diaphragm finished product optical quality bad.Because of wheel face is a copper material, form cupric oxide easily so be exposed to atmospheric environment on the other hand, when the zone of oxidation area increases, will cause microstructure to destroy, last roller is scrapped and must be carved again.
Directly plate nickel dam row engraving again at roller, certainly will shorten diamond cutter work-ing life, so best mode is still on the copper roller and carves microstructure, manage to make abrasion performance or the antioxidant effect of resist again to reach wheel face though increased the wheel surface hardness.
Because the roller volume is bigger; If carry out plated film, because of the consideration of membrane uniformity, except noting the vector gas flow field with general PVD mode; Maybe be because target storing, electric slurry source and roller rotation or the like doubt must be made the comparatively complicated system of a cover again.
In the tradition filming equipment, the heating unit operated by rotary motion heats workpiece from the below below film-coating workpiece, still, adopts this mode pair roller heating to cause the roller heating inhomogeneous.
Summary of the invention
In view of this, but be necessary to provide a kind of film coating apparatus of even heating roller.
A kind of film coating apparatus, it adopts the ald processing procedure to carry out plated film, and said film coating apparatus comprises a cavity, and said cavity inner wall is provided with heating unit, and said heating unit has a receiving space in order to accommodate a roller so that said roller is carried out plated film.
Compared with prior art, the heating unit of the film coating apparatus of the embodiment of the invention with in the middle of roller is centered around, thereby makes each position of roller be heated evenly around the roller setting, but and then even heating roller.
Description of drawings
Fig. 1 is the axial section of embodiment of the invention film coating apparatus.
Fig. 2 is the radial section figure of embodiment of the invention film coating apparatus.
The main element nomenclature
Film coating apparatus 1
First receiving space 30
Second receiving space 40
Inwall 110,120
Inlet mouth 111
Air outlet 121
Embodiment
To combine accompanying drawing that the embodiment of the invention is done further explain below.
See also Fig. 1 and shown in Figure 2, the embodiment of the invention provides a kind of film coating apparatus 1, and (atomic layer deposition, ALD) pair roller 20 carries out plated film in the process at ald for it.
Film coating apparatus 1 comprises cavity 10; Cavity 10 comprises lid 11, base 12, heating unit 13 and is used for the bracing frame 14 of support roller 20; Bracing frame 14 is arranged on the base 12; Thereby lid 11 covers and on base 12, limits one first receiving space, 30, the first receiving spaces 30 and can be square, round shape etc.
Preferably, first heater coil 131 is fitted on the inwall 110 of lid 11, and second heater coil 132 is fitted on the inwall 120 of base 12.
Preferably, second receiving space 40 is a round shape, and promptly shape is identical with the shape of roller 20.
Certainly, the gaseous species that the quantity of inlet mouth 111 can be introduced in the cavity 10 is as required set, and an inlet mouth 111 allows a kind of gas to get into cavity 10.
When pair roller 20 carries out plated film; Open lid 11, roller 20 is placed on the bracing frame 14, then lid 11 is covered on base 12; Pass through the vacuum tightness that realize in the cavitys 10 air outlet 121 with vacuum unit; Apply electric current and give first heater coil 131 and second heater coil 132 and make its pair roller 20 heating reach preset temperature, then reactant gases is introduced in the cavitys 10 through inlet mouth 111, thereby reactant gases reacts in cavity 10 and forms plated films on roller 20 surfaces.
Because heating unit uniform winding roller makes each position of roller be heated evenly, thereby the film thickness that makes roller surface form is even.
It is understandable that those skilled in the art also can do other variation etc. and be used for design of the present invention in spirit of the present invention, as long as it does not depart from technique effect of the present invention and all can.These all should be included within the present invention's scope required for protection according to the variation that the present invention's spirit is done.
Claims (7)
1. film coating apparatus; It adopts Atomic layer deposition method to carry out plated film, it is characterized in that, said film coating apparatus comprises a cavity; Said cavity inner wall is provided with heating unit, and said heating unit has a receiving space in order to accommodate a roller so that said roller is carried out plated film.
2. film coating apparatus as claimed in claim 1 is characterized in that, said heating unit comprises first heater coil and second heater coil, and said first heater coil and second heater coil are common to limit said receiving space to be used for holding said roller.
3. film coating apparatus as claimed in claim 2 is characterized in that said cavity comprises lid and base, and said first heater coil is fitted on the said lid inwall, and heater coil of the said end second is fitted on the said base.
4. like each described film coating apparatus of claim 1 to 3, it is characterized in that having bracing frame in the said cavity to support said roller.
5. film coating apparatus as claimed in claim 4 is characterized in that support frame as described above is positioned at said base.
6. film coating apparatus as claimed in claim 5 is characterized in that, has inlet mouth on the said lid.
7. film coating apparatus as claimed in claim 6 is characterized in that, has the air outlet on the said base.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010102137443A CN102312219A (en) | 2010-06-30 | 2010-06-30 | Coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010102137443A CN102312219A (en) | 2010-06-30 | 2010-06-30 | Coating device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN102312219A true CN102312219A (en) | 2012-01-11 |
Family
ID=45425773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010102137443A Pending CN102312219A (en) | 2010-06-30 | 2010-06-30 | Coating device |
Country Status (1)
Country | Link |
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CN (1) | CN102312219A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6473078A (en) * | 1987-09-11 | 1989-03-17 | Kawasaki Refractories Co Ltd | C.v.d. device |
US5128515A (en) * | 1990-05-21 | 1992-07-07 | Tokyo Electron Sagami Limited | Heating apparatus |
US20020150684A1 (en) * | 2001-04-16 | 2002-10-17 | Jayatissa Ahalapitiya H. | Method of forming carbon nanotubes and apparatus therefor |
US20050068519A1 (en) * | 2003-09-30 | 2005-03-31 | Tokyo Electron Limited | Method for monitoring status of system components |
KR20050067490A (en) * | 2003-12-29 | 2005-07-05 | 주식회사 하이닉스반도체 | Full batch type atomic layer deposition equipment |
-
2010
- 2010-06-30 CN CN2010102137443A patent/CN102312219A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6473078A (en) * | 1987-09-11 | 1989-03-17 | Kawasaki Refractories Co Ltd | C.v.d. device |
US5128515A (en) * | 1990-05-21 | 1992-07-07 | Tokyo Electron Sagami Limited | Heating apparatus |
US20020150684A1 (en) * | 2001-04-16 | 2002-10-17 | Jayatissa Ahalapitiya H. | Method of forming carbon nanotubes and apparatus therefor |
US20050068519A1 (en) * | 2003-09-30 | 2005-03-31 | Tokyo Electron Limited | Method for monitoring status of system components |
KR20050067490A (en) * | 2003-12-29 | 2005-07-05 | 주식회사 하이닉스반도체 | Full batch type atomic layer deposition equipment |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120111 |