Background technology
Thin-film solar cells is the photoelectric device that the light energy conversion with the sun of filming becomes direct current (DC) electricity, transparent conductive film is essential in the film solar battery structure, transparent conductive film is namely drawn the collection of solar cell electricity as front electrode in thin-film solar cells, must accomplish again maximized the seeing through of sunlight of allowing.This just requires to sunlight high transmitance will be arranged as the transparent conductive film of electrode before the thin-film solar cells, itself must be again low square resistance simultaneously, to reduce the loss of ohmic contact.In order farthest to improve the photoelectric conversion efficiency of thin-film solar cells, must improve as far as possible battery absorbing sunlight, namely reduce the loss that enters the sunlight in the thin-film solar cells, improve thin-film solar cells absorbing sunlight, the matte that this just requires transparent conductive film to contact with thin-film solar cells, by the matte technology, make the light in the battery produce diffuse reflection, increase light in the distance of thin-film solar cells, to improve battery to the absorbing of sunlight, improve the photoelectric conversion efficiency of thin-film solar cells.The criterion of matte is suede degree, surface roughness and surface uniformity: the suede degree refers to that at wavelength be under the irradiation of incident light by the non-matte of film of 700nm, the ratio of the transmitance that the transmitance that light disperses at the matte of film and incident ray are total; Surface roughness then refers to the r.m.s. roughness of matte; Uniformity then is to refer in particular to suede degree and the uniformity coefficient of surface roughness in unit are of matte.
The required front electrode transparent conductive film of thin-film solar cells adopts physical vaporous deposition or chemical vapour deposition technique preparation usually.Chemical vapour deposition technique is prepared into transparent conductive film and has just formed corresponding matte when thin film deposition, so need to be in follow-up making herbs into wool operation.And preparing the required transparent conductive film of thin-film solar cells, physical vaporous deposition can launch on a large scale, physical vaporous deposition prepares the required transparent conductive film surface of thin-film solar cells does not almost have the suede degree, and the surface wool manufacturing operation that must increase in addition one film could satisfy the thin-film solar cells requirement required to transparent conductive film.The surface wool manufacturing that physical vaporous deposition prepares the required transparent conductive film of thin-film solar cells has dry method making herbs into wool and wet-method etching, and wherein dry method making herbs into wool is Physical, and industrialization large tracts of land production difficulty is large, there be limited evidence currently of.And wet-method etching is the chemical method etching, is the first-selected industrialization direction of the surface wool manufacturing of the required transparent conductive film of current thin film solar cell.Wet-method etching mainly contains and soaks etching and two kinds of common processes of spray etching.Soak etching surface suede degree and be easy to control, the good uniformity of surface roughness, the making herbs into wool process is convenient to autonomous control, and it is multiplex that production capacity is low in manual single-piece production, and the large-scale industrialization production difficulty is large; The spray etching then is convenient to continuous industry large-scale production, and output is large, but it is wayward to spray etching surface suede degree, and the uniformity fluctuation of surface roughness is larger, and the making herbs into wool process is difficult to control.No matter be to soak etching or spray etching technology and the corresponding skilled degree of one-tenth that operates of producing required height, the consistency stability of the product that large-scale industrialization is produced all is difficult to reach thin-film solar cells to the requirement of required transparent conductive film.
Summary of the invention
In view of this, the object of the present invention is to provide the process for etching of the front electrode transparent conductive film of a kind of thin-film solar cells, the pluses and minuses of comprehensive existing immersion etching and two kinds of common processes of spray etching, the advantage that the spray etching is easy to adopt continuous industry large-scale production with soak that etching surface suede degree is easy to control, the good uniformity of surface roughness, making herbs into wool process be convenient to the autonomous advantages that combines of controlling, and realizes the industrialization Automatic continuous immersion etching production of the required transparent conductive film of thin-film solar cells.
For achieving the above object, the present invention by the following technical solutions:
The process for etching of electrode transparent conductive film before the thin-film solar cells of the present invention, comprise immersion, cleaning, three process that carry out successively of oven dry, described immersion, cleaning, baking operation adopt autocontrol method to carry out the making herbs into wool of Automatic continuous immersion etching; Wherein, the etched solution of transparent conductive film is formulated in following weight ratio ratio by oxalic acid, hydrochloric acid, surface activity stabilizer and deionized water: oxalic acid 0.1wt%~1.5wt%; Hydrochloric acid 0.3wt%~2.5wt%; Surface activity stabilizer 0.01wt%~0.5wt%; All the other are deionized water; Described surface activity stabilizer is one or several the mixture in the surperficial active stabilizer of APES series, the surperficial active stabilizer of AEO series, the surperficial active stabilizer of aliphatic acid polyethenoxy ether series; Automatic control means are adopted in loading and unloading in immersion, cleaning, baking operation, automatically identify and sub-material by the material that has deposited transparent conductive film to different size and basis material, the technological parameter of determining each operation with select corresponding transparent conductive film etching solution; In immersion, cleaning, baking operation, adopt automatic control means according to the temperature of different ambient temperatures from main regulation control immersion operation, matting, guarantee to soak in the transparent conductive film making herbs into wool process temperature stabilization of operation and matting between 20 ℃~25 ℃; The temperature of baking operation drying is controlled at 40 ℃~75 ℃ automatically according to the different size and the basis material that have deposited transparent conductive film; In immersion, cleaning, baking operation, adopt automatic monitoring means, carry out automatic feedback and abnormal alarm, and in time record or automatically out of service.
Further, in soaking operation, adopt automatic control means according to the etching requirement of the transparent conductive film that has deposited on different size and the different matrix material, realize synchronous, the homogeneous of transparent conductive film immersion process, guarantee to have deposited transparent conductive film and soak the accurate, reliable of etch period; Soaking in the operation the whole material that has deposited transparent conductive film immerses simultaneously within the several seconds or leaves simultaneously etching solution; The all the time level immersion of material or the level that have deposited transparent conductive film are left etching solution; It is 20 seconds~100 seconds that transparent conductive film soaks the etch period adjusting range.
Further, in matting, adopt automatic control means according on different size and the basis material the good transparent conductive film of etching automatically select wash number and cleaning temperature, the number of times of cleaning is controlled at 3~5 times.
Further, in baking operation, adopt automatic control means according to the degree of the contained cleaning fluid in cleaned transparent conductive film surface on different size and the basis material, the autonomous selection and the wind speed of adjusting auto-drying drying and the size of air quantity, and can automatically adjust the wind direction of bake drying; According to the moist degree on cleaned transparent conductive film surface and the different phase of cleaned transparent conductive film bake drying on different size and the basis material, the flexible coupling different temperatures in the outlet stage of interstage of cleaned transparent conductive film bake drying import stage, bake drying and bake drying, the temperature regulating range of bake drying is 40 ℃~75 ℃.
The invention has the beneficial effects as follows:
The industrialization process for etching of of the present invention the front electrode transparent conductive film of thin-film solar cells is to soak the etching production technology at the industrialization Automatic continuous, the product of producing has certain industrial output, for the making herbs into wool that has deposited transparent conductive film on different size and the basis material, but the surface suede number of degrees value homogeneous of the transparent conductive film after the product etching of producing and free adjustment, surface roughness meets thin-film solar cells to the requirement of front electrode transparent conductive film, the surface uniform performance is good, the consistency stability of large-scale continuous production product reaches requirement, and reliability is high.
By adopting the automatic loading/unloading technological means to realize the reliability and stability of transparent conductive film making herbs into wool.The automatic loading/unloading means are by the automatic identification and the sub-material that have deposited transparent conductive film to different size and basis material, determine various process parameters that corresponding Automatic continuous soaks the etching production line and select corresponding transparent conductive film etching solution.Simultaneously, the automatic loading/unloading technology can also accomplish to have deposited the different size of transparent conductive film and the autonomous up and down Automatic continuous of basis material soaks the etching production line, minimizing improves production quality and production efficiency to damage and the human factor of film surface in the transparent conductive film etching process.The automatic loading/unloading technology can accomplish to regulate and dispose according to the capacity and output of correspondence the optimization of productive temp and the production process of whole production line equally.
By adopting automatic temperature-adjusting regulation technology means further to improve the reliability and stability of transparent conductive film making herbs into wool, can according to the capacity and output of producing automatically control automatic soaking operation in the transparent conductive film making herbs into wool process and automatically the temperature of matting in the scope that technical indicator sets, can guarantee that too the temperature of auto-drying drying is in the scope that technical indicator sets.The automatic temperature-adjusting regulation technology can also according to different ambient temperatures from main regulation control automatic soaking operation, automatically the temperature of the temperature of matting and auto-drying drying in the scope that technical indicator sets.
Soaking operation, employing automatic soaking technological means can be according to the specific requirement that has deposited the transparent conductive film etching on different size and the basis material, realize synchronous, the homogeneous of transparent conductive film automatic soaking process, guarantee to have deposited transparent conductive film and soak the accurate, reliable of etch period.The automatic soaking technology of electrode transparent conductive film etching can realize that the whole transparent conductive film surface that deposited immerses simultaneously or leave simultaneously etching solution within the several seconds before the thin-film solar cells that present technique adopts.The automatic soaking technology of the front electrode transparent conductive film etching of the thin-film solar cells that present technique adopts can guarantee to have deposited all the time level immersion of transparent conductive film or level is left etching solution.
In matting, the automatic cleaning technology means can realize according to wash number and the cleaning temperature of the good transparent conductive film of the etching automatic selective etching of good transparent conductive film on different size and the basis material.And in the time of can accomplishing to clean, remove immediately residual etching solution after the whole surface etch of transparent conductive film, guarantee the good transparent conductive film stay in grade of etching homogeneous.Simultaneously, can avoid again the flow velocity of the good transparent conductive film of etching local cleaning fluid when cleaning inhomogeneous, make the good transparent conductive film cleaning process of whole etching uniform and stable.
At baking operation, by auto-drying dry technology means according to the degree of the contained cleaning fluid in cleaned transparent conductive film surface on different size and the basis material, the autonomous selection and the wind speed of adjusting auto-drying drying and the size of air quantity, and can automatically adjust the wind direction of bake drying.Realization is according to the moist degree on cleaned transparent conductive film surface and the stage of cleaned transparent conductive film bake drying on different size and the basis material, the different temperatures of the interstage of flexibly cleaned transparent conductive film bake drying import of coupling, bake drying and the outlet of bake drying is adsorbed moisture again with the surface that prevents the making herbs into wool transparent conductive film that bake drying is good.
In whole operation process, automatic monitoring means processed are only sampled, are recorded and monitor the whole operation that has deposited transparent conductive film making herbs into wool on different size and the basis material included etching solution solubility and consumption; To the sorting of beat, different size and the size of automatic loading/unloading and the discriminating of different matrix material, realize automatic feedback and abnormal alarm, and be provided with timely record and automatic hold function.
Other advantages of the present invention, target and feature will be set forth to a certain extent in the following description, and to a certain extent, based on being apparent to those skilled in the art to investigating hereinafter, perhaps can obtain from the practice of the present invention instruction.Target of the present invention and other advantages can realize and obtain by specifically noted structure in the following specification.
Embodiment
The invention will be further described below in conjunction with embodiment.
Example 1, under the condition of room temperature, adopt industrialization Automatic continuous magnetron sputtering production line, in common deposition on glass the required transparent conductive film of thin-film solar cells, and carried out corresponding making herbs into wool, its properties of product are stable, during making herbs into wool, the proportioning weight ratio scope of etching solution mesoxalic acid (ethanedioic acid) is 0.15wt%; The proportioning weight ratio scope of hydrochloric acid is 0.3wt%; The proportioning weight ratio scope of surface activity stabilizer is 0.015wt%; All the other are deionized water, and the surface activity stabilizer is the surperficial active stabilizer of APES series.The automatic soaking time be 35 seconds, temperature stabilization at 22 ℃, automatically clean 4 times, temperature stabilization at 25 ℃.The temperature of bake drying and this adjustable range are 55 ℃.The light transmittance of making herbs into wool rear film is greater than 83% at the 550nm wavelength, and surperficial square resistance is at 7 Ω, and the suede degree can reach 40% at the 700nm wavelength, and surface roughness reaches 120nm and surface uniformity in 2.7%.
Example 2, under the condition of room temperature, adopt industrialization Automatic continuous magnetron sputtering production line, the deposition on glass that formerly tempering is good the required transparent conductive film of thin-film solar cells, and carried out corresponding making herbs into wool, its properties of product are stable, during making herbs into wool, the proportioning weight ratio scope of etching solution mesoxalic acid (ethanedioic acid) is 0.25wt%; The proportioning weight ratio scope of hydrochloric acid is 0.35wt%; The proportioning weight ratio scope of surface activity stabilizer is 0.015wt%; All the other are deionized water, and the surface activity stabilizer is the surperficial active stabilizer of APES series.The automatic soaking time be 45 seconds, temperature stabilization at 22 ℃, automatically clean 4 times, temperature stabilization at 25 ℃.The temperature of bake drying and this adjustable range are 65 ℃.The light transmittance of making herbs into wool rear film is greater than 84% at the 550nm wavelength, and surperficial square resistance is at 8 Ω, and the suede degree can reach 45% at the 700nm wavelength.Surface roughness reaches 128nm and surface uniformity in 2.9%.
Example 3, under the condition of room temperature, adopt industrialization Automatic continuous magnetron sputtering production line, deposited the required transparent conductive film of thin-film solar cells at common polymethyl methacrylate, and carried out corresponding making herbs into wool, its properties of product are stable, during making herbs into wool, the proportioning weight ratio scope of etching solution mesoxalic acid (ethanedioic acid) is 0.15wt%; The proportioning weight ratio scope of hydrochloric acid is 0.3wt%; The proportioning weight ratio scope of surface activity stabilizer is 0.015wt%; All the other are deionized water, and the surface activity stabilizer is the surperficial active stabilizer of APES series.The automatic soaking time be 35 seconds, temperature stabilization at 22 ℃, automatically clean 5 times, temperature stabilization at 25 ℃.The temperature of bake drying and this adjustable range are 50 ℃.The light transmittance of making herbs into wool rear film is greater than 81% at the 550nm wavelength, and surperficial square resistance is at 9 Ω, and the suede degree can reach 30% at the 700nm wavelength.Surface roughness reaches 118nm and surface uniformity in 3.2%.
Example 4, under the condition of room temperature, adopt industrialization Automatic continuous magnetron sputtering production line, deposited the required transparent conductive film of thin-film solar cells at common PET film, and carried out corresponding making herbs into wool, its properties of product are stable, during making herbs into wool, the proportioning weight ratio scope of etching solution mesoxalic acid (ethanedioic acid) is 0.15wt%; The proportioning weight ratio scope of hydrochloric acid is 0.3wt%; The proportioning weight ratio scope of surface activity stabilizer is 0.015wt%; All the other are deionized water, and the surface activity stabilizer is the surperficial active stabilizer of APES series.The automatic soaking time be 45 seconds, temperature stabilization at 22 ℃, automatically clean 5 times, temperature stabilization at 25 ℃.The temperature of bake drying and this adjustable range are 50 ℃.The light transmittance of making herbs into wool rear film is greater than 80% at the 550nm wavelength, and surperficial square resistance is at 8 Ω, and the suede degree can reach 28% at the 700nm wavelength.Surface roughness reaches 130nm and surface uniformity in 3.4%.
Explanation is at last, above embodiment is only unrestricted in order to technical scheme of the present invention to be described, other modifications that those of ordinary skills make technical scheme of the present invention or be equal to replacement, only otherwise break away from the spirit and scope of technical solution of the present invention, all should be encompassed in the middle of the claim scope of the present invention.