CN102285656A - Trichlorosilane vaporization device - Google Patents
Trichlorosilane vaporization device Download PDFInfo
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- CN102285656A CN102285656A CN2011101606725A CN201110160672A CN102285656A CN 102285656 A CN102285656 A CN 102285656A CN 2011101606725 A CN2011101606725 A CN 2011101606725A CN 201110160672 A CN201110160672 A CN 201110160672A CN 102285656 A CN102285656 A CN 102285656A
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Abstract
The invention relates to a polysilicon production device, and in particular relates to a trichlorosilane vaporization device, belonging to the technical field of polysilicon production. The trichlorosilane vaporization device comprises an evaporator, a hydrogen delivery pipe, a trichlorosilane liquid delivery pipe, a trichlorosilane gas delivery pipe, a mixed gas delivery pipe and a mixer, wherein the lower end of the evaporator is provided with a trichlorosilane liquid inlet, and the upper end is provided with a trichlorosilane gas outlet; the trichlorosilane liquid inlet is communicated with the trichlorosilane liquid delivery pipe; both the trichlorosilane liquid delivery pipe and the hydrogen delivery pipe are provided with gages; and the mixer is separately communicated with the hydrogen delivery pipe, the trichlorosilane gas delivery pipe and the mixed gas delivery pipe. By utilizing the trichlorosilane vaporization device to vaporize trichlorosilane, the evenly mixed gas with stable proportion can be obtained; and the raw materials can be mixed more evenly, silicon rods can grow evenly during the reduction reaction in a reduction furnace, and the produced grains have better appearance quality.
Description
Technical field
The present invention relates to the production of polysilicon device, relate in particular to a kind of vapourizing unit of trichlorosilane, belong to technical field of polysilicon production.
Background technology
Polysilicon is the basic material of electronic industry and photovoltaic industry, and along with the develop rapidly of information technology and solar energy industry, the whole world is swift and violent to the demand growth of polysilicon, and supply falls short of demand in market.
Polysilicon (p-Si) is a kind of form of elemental silicon, is the silicon crystal that is formed by many Siliciumatoms and many little die combinations, can be divided into metallurgical-grade polysilicon, solar level and electronic-grade polycrystalline silicon by the purity classification.Wherein solar-grade can polycrystalline silicon product purity 99.99～99.9999%(4 to 6 9), the electronic-grade polycrystalline silicon product purity reaches more than 99.9999%, ultra-purely reaches 99.9999999%～99.999999999%(9 to 11 9).Solar level and electronic-grade polycrystalline silicon can be prepared by metallurgical-grade polysilicon, usual method is for being converted into solid-state metallurgical grade silicon certain liquefied compound that exists in the temperature range that allows, for example metallurgical grade silicon is converted into chlorosilane, then its method with highly efficient distilling is carried out the degree of depth and purify, with reductive agents such as hydrogen the chlorosilane of purifying is reduced to polysilicon subsequently to remove impurity wherein.
At present, in the world the production of polysilicon technology use more than 70% be the improvement Siemens Method.The improvement Siemens Method is produced polysilicon and is comprised hydrogenchloride and silica flour synthesizing trichlorosilane, and trichlorosilane obtains high-purity trichlorosilane through rectification and purification, and (high-purity trichlorosilane refers to that purity reaches the trichlorosilane more than 99.99% for high-purity trichlorosilane and High Purity Hydrogen; High Purity Hydrogen refers to that purity reaches the hydrogen more than 99.9999%) mix the formation mixed raw material gas according to certain proportioning, feed in the reduction furnace reactor, be heated to about 1100 ℃ at the silicon wicking surface on the heating electrode, trichlorosilane and hydrogen generation reduction reaction, generate polysilicon and constantly be deposited on the silicon core, the diameter that makes this silicon core chap and form polycrystalline silicon rod gradually.
Production of polysilicon technical process complexity has a lot of key control parameters, and the subtle change of any parameter all can have tremendous influence to quality product, and the gasification process of trichlorosilane is one of key factor wherein.Trichlorosilane vaporization be meant high-purity trichlorosilane and hydrogen before entering reduction furnace by a certain percentage with the chlorosilane and the hydrogen blended process of gas phase.
In the trichlorosilane gasification process, the proportioning of hydrogen and trichlorosilane need stably be controlled in certain scope: hydrogen proportioning deficiency is unfavorable for suppressing other side reactions, can reduce the casting yield of silicon; The hydrogen proportioning is excessive, and hydrogen is not fully utilized, and causes waste, also makes the trichlorosilane density loss simultaneously, reduces the probability of collision on trichlorosilane and silicon rod surface, reduces the sedimentation velocity of silicon, and throughput descends.Therefore, must carry out strict control to the proportioning of hydrogen and trichlorosilane in the polysilicon production process.
In traditional production of polysilicon technology, the trichlorosilane vaporization is carried out in bubbler and separator, its mixing process is: the trichlorosilane that has certain liquid level in bubbler, in bubbler, feed hydrogen, make hydrogen carry out bubbling and vaporization mixing to trichlorosilane, by separator the liquid trichlorosilane in the gas is separated, and then send in the reduction furnace by the gas phase mixture that outlet conduit will be vaporized and mix.In the process of trichlorosilane vaporization, temperature by the trichlorosilane in the control bubbler and the pressure in the bubbler are controlled the ratio of hydrogen and trichlorosilane in the gas phase mixture, control the inlet amount of reduction furnace by the flow of controlling gas phase mixture.
In traditional trichlorosilane gasification process, adopt hydrogen that trichlorosilane is carried out bubbling and vaporization mixing, the trichlorosilane vaporization not exclusively; Temperature by the trichlorosilane of control in the bubbler and the pressure in the bubbler are controlled the ratio of hydrogen and trichlorosilane in the gas phase mixture, control the inlet amount of reduction furnace by the flow of control gas phase mixture, the ratio control of hydrogen and chlorosilane exists than mistake, raw materials for production can not be fully used, and the polycrystalline silicon rod speed of growth is slow, the casting yield of polysilicon is low.
Chinese patent application 200910310611.5 discloses a kind of chlorosilane vapourizing mixed process and device, the disclosed chlorosilane mixing device of this patent documentation comprises interchanger, chlorosilane transfer lime, hydrogen delivery tube are communicated with the tube side/shell side of this interchanger, all respectively be provided with under meter and flow control valve on chlorosilane transfer lime, the hydrogen delivery tube, accordingly, the tube side/shell side of this interchanger supplies system connectivity with heat.Adopt this chlorosilane mixing device, gasiform hydrogen and liquid chlorosilane can come the controller flow by under meter and variable valve, can more accurately control the preceding chlorosilane of vaporizer and the ratio of hydrogen of entering.But, adopt this mixing device to chlorosilane vapourizing, because the vaporescence of chlorosilane is uncontrollable, when the temperature and pressure of interchanger changes, the chlorosilane liquid level can fluctuate thereupon, the chlorosilane vapourizing amount is also corresponding to change, thereby actually enters the chlorosilane gas of reduction furnace and still there is error in the ratio control of hydrogen.In addition, in this device, chlorosilane liquid and hydrogen all enter from the top of interchanger, i.e. chlorosilane liquid spraying hydrogen, and the little metal impurity compound in the chlorosilane can enter reduction furnace together along with hydrogen, influences quality product; Simultaneously, the vaporization of chlorosilane is not complete stable state, causes the evaporating capacity fluctuation of chlorosilane, makes the proportioning fluctuation, and in addition, hydrogen flows at tube side fast, forms gas beam, and it is inhomogeneous to make that hydrogen and trichlorosilane gas mix.Above-mentioned defective has caused the fluctuation of material mixed gas proportioning, has mixed inequality, finally influences the reduction furnace reaction in furnace.
Summary of the invention
The objective of the invention is to overcome the deficiency that there is error in the ratio control of existing trichlorosilane and hydrogen in the existing trichlorosilane vaporization technology, a kind of improved trichlorosilane vaporization unit is provided.Utilize trichlorosilane vaporization unit of the present invention that trichlorosilane is vaporized, can accurately control the ratio of trichlorosilane and hydrogen.
To achieve these goals, the invention provides following technical scheme:
A kind of trichlorosilane vaporization unit, comprise vaporizer, hydrogen delivery tube, trichlorosilane liquid delivery tube, trichlorosilane air shooter and mixed gas pipeline, this trichlorosilane vaporization unit also comprises mixing tank, and the lower end of vaporizer is provided with the trichlorosilane liquid inlet, the upper end is provided with the trichlorosilane pneumatic outlet; The trichlorosilane liquid inlet is connected with the trichlorosilane liquid delivery tube;
Be provided with gauger on trichlorosilane liquid delivery tube, the hydrogen delivery tube;
Mixing tank is connected with hydrogen delivery tube, trichlorosilane air shooter and mixed gas pipeline respectively.
The technology of utilizing trichlorosilane vaporization unit of the present invention that trichlorosilane is vaporized mainly comprises:
(1), high-purity trichlorosilane liquid of obtaining of rectifying by the gauger metering after the trichlorosilane liquid delivery tube, enter evaporator evaporation by the trichlorosilane liquid inlet;
(2), the trichlorosilane gas that obtains of step (1) evaporation goes out vaporizer by the trichlorosilane pneumatic outlet, enters mixing tank through the trichlorosilane air shooter;
Hydrogen is measured after hydrogen delivery tube is sent into mixing tank by gauger;
Trichlorosilane gas mixes at gas mixer with hydrogen, obtains gas mixture;
Gas mixture is delivered to reduction furnace through mixed gas pipeline and carries out reduction reaction.
Adopt apparatus of the present invention that trichlorosilane is vaporized,, promptly adopt trichlorosilane gas to mix, can obtain the gas mixture that proportioning is stablized, mixed with hydrogen because the mixing of raw material is carried out after the trichlorosilane vaporization; The mixing of raw material is more even, helps the even growth of silicon rod in the reduction reaction of reduction furnace, and the crystal grain visual appearance of producing is better.
In the above-mentioned trichlorosilane vaporization unit, the gauger that is provided with on trichlorosilane liquid delivery tube, the hydrogen delivery tube is the gauger that flow control valve and mass flowmeter are formed, and also can adopt other alternative gaugers.
In the above-mentioned trichlorosilane vaporization unit, described vaporizer comprises shell and tube heat exchanger.
In the above-mentioned trichlorosilane vaporization unit, the tube side of described shell and tube heat exchanger is communicated with the trichlorosilane liquid delivery tube, and shell side is communicated with the pipeline of carrying outer circulation water.
In the above-mentioned trichlorosilane vaporization unit, described shell and tube heat exchanger provides trichlorosilane to evaporate required heat energy by outer circulation water.Described outer circulation water can be polycrystalline silicon reducing furnace stove tube water coolant, can effectively utilize the heat energy of polycrystalline silicon reducing furnace by-product.
In the above-mentioned trichlorosilane vaporization unit, the tube side of described shell and tube heat exchanger also is provided with liquidometer.It is constant to be convenient to control liquid level constantly, makes the trichlorosilane steam output constant, helps the trichlorosilane gas in the further accurately control mixing tank and the ratio of hydrogen.
In the above-mentioned trichlorosilane vaporization unit, the preferred internal floating type magnetic fluid level gauge of described liquidometer.Described internal floating type liquidometer is a kind of two-chamber liquidometer, the cavity of measured medium and magnetic panel end is isolated, the measured medium cavity is equipped with float, the corresponding lifting with the liquid level lifting in the container, float passes to magnetic panel linearly with the variation of liquid level simultaneously, and the clear height that indicates liquid level exactly.
In the above-mentioned trichlorosilane vaporization unit, the pipeline of the conveying outer circulation water that is communicated with vaporizer is provided with the outer circulation Water flow adjusting valve.
In the above-mentioned trichlorosilane vaporization unit, described outer circulation Water flow adjusting valve and liquidometer are formed control loop, the control loop that liquid level in the vaporizer is made up of this outer circulation Water flow adjusting valve and liquidometer is regulated, when liquid level rises, illustrate that steam output diminishes in the vaporizer, the shortage of heat that outer circulation water provides is described, at this moment, variable valve valve opening in the control loop can strengthen automatically, increase outer circulation discharge, increase the heat in the vaporizer like this, constant thereby the increase steam output is kept liquid level.More help the constant of liquid level in the vaporizer, can regulate and control the trichlorosilane gas in the mixing tank and the ratio of hydrogen more accurately.
In the above-mentioned trichlorosilane vaporization unit, the top of vaporizer also is provided with the separate chamber, and trichlorosilane liquid separates in the separate chamber with the trichlorosilane gas that evaporation obtains; Can avoid liquid foam entrainment, help obtaining the gas mixture that proportioning is stablized, mixed.
In the above-mentioned trichlorosilane vaporization unit, the preferred screen cloth scum dredger in separate chamber.
Compared with prior art, beneficial effect of the present invention:Trichlorosilane vaporization unit of the present invention comprises vaporizer, mixing tank, and mixing tank is connected with hydrogen delivery tube, trichlorosilane air shooter and mixed gas pipeline respectively, is provided with gauger on trichlorosilane liquid delivery tube, the hydrogen delivery tube.The technology of utilizing apparatus of the present invention that trichlorosilane is vaporized can obtain the gas mixture that proportioning is stablized, mixed; The mixing of raw material is more even, helps the even growth of silicon rod in the reduction reaction of reduction furnace, and the crystal grain visual appearance of producing is better.In the trichlorosilane gasification process of the present invention, vaporizer is provided with liquidometer, and it is constant to be convenient to control liquid level constantly, makes the trichlorosilane steam output constant, helps accurately controlling the trichlorosilane gas in the mixing tank and the ratio of hydrogen.On the pipeline of the conveying outer circulation water that is communicated with vaporizer the outer circulation Water flow adjusting valve can be set, outer circulation Water flow adjusting valve and liquidometer are formed control loop, more help controlling the constant of liquid level in the vaporizer.The top of vaporizer also can be provided with the screen cloth scum dredger, can avoid liquid foam entrainment, helps obtaining the gas mixture that proportioning is stablized, mixed.
Prove that through production test trichlorosilane vaporization unit of the present invention is applied in the production of polysilicon, can accurately control the proportioning of trichlorosilane gas and hydrogen.This technical process is simple, and is easy to operate, can realize automatic control of complete period and can improve quality product to a great extent.
Description of drawings
Fig. 1 is the structural representation of the embodiment of the invention 1.
Fig. 2 is the structural representation of the embodiment of the invention 2.
Fig. 3 is the structural representation of the embodiment of the invention 3.
Fig. 4 is the structural representation of the embodiment of the invention 4.
Mark among the figure: 1-hydrogen quality under meter, 2-hydrogen flowing quantity variable valve, 3-trichlorosilane mass flowmeter, 4-trichlorosilane flow control valve, 5-mixing tank, 6-outer circulation Water flow adjusting valve, the 7-liquidometer, 8-hydrogen, 9-outer circulation water backwater, 10-outer circulation water water purification, 11-trichlorosilane, 12-vaporizer, 13-trichlorosilane liquid inlet, the 14-shell and tube heat exchanger, 15-separate chamber (scum dredger), 16-trichlorosilane pneumatic outlet.
Embodiment
The present invention is further illustrated below in conjunction with the drawings and specific embodiments.
Embodiments of the present invention are not limited to following examples, and the various variations of making under the prerequisite that does not break away from aim of the present invention all belong within protection scope of the present invention.
As shown in Figure 1, the trichlorosilane vaporization unit that present embodiment is enumerated comprises vaporizer 12, mixing tank 5, trichlorosilane liquid delivery tube, trichlorosilane air shooter, mixed gas pipeline, vaporizer 12 comprises shell and tube heat exchanger 14, the bottom of vaporizer 12 is provided with trichlorosilane liquid inlet 13, top is provided with trichlorosilane pneumatic outlet 16, and trichlorosilane liquid inlet 13 is connected with the trichlorosilane liquid delivery tube; The tubulation tube side of shell and tube heat exchanger 14 is communicated with the trichlorosilane liquid delivery tube, and shell side is communicated with the pipeline of carrying outer circulation water.
The trichlorosilane liquid delivery tube is provided with trichlorosilane mass flowmeter 3 and trichlorosilane flow control valve 4, carries the pipeline of hydrogen to be provided with hydrogen quality under meter 1 and hydrogen flowing quantity variable valve 2, respectively trichlorosilane liquid and hydrogen is measured.
The trichlorosilane vaporization unit that utilizes present embodiment to enumerate is vaporized to trichlorosilane, comprising:
(1), high-purity trichlorosilane liquid of obtaining of rectifying is through trichlorosilane mass flowmeter 3 and 4 meterings of trichlorosilane flow control valve, the adjusting flow is 20kmol/h, send into the tube side of the shell and tube heat exchanger 14 of vaporizer 12 through the trichlorosilane liquid inlet 13 of vaporizer 12 bottoms by transport pipe, the about 0.5MPa of the pressure of vaporizer, about 65 ℃ of temperature;
Vaporizer 12 provides trichlorosilane to evaporate required heat energy by the outer circulation water of tubulation tube side, described outer circulation water water inlet 10 is polycrystalline silicon reducing furnace stove tube water coolants, and temperature is 150 ℃, and internal circulating load is 10000kg/h, obtaining leaving water temperature(LWT) is 142 ℃, can effectively utilize polycrystalline silicon reducing furnace heat energy;
(2) the trichlorosilane gas that obtains of step (1) and high-purity hydrogen 8 respectively through pipe-line transportation to mixing tank 5;
Trichlorosilane gas and hydrogen carry out reduction reaction through pipe-line transportation to reduction furnace after mixing tank mixes.
The gas mixture that present embodiment trichlorosilane gasification process obtains is used to supply with polycrystalline silicon reducing furnace and carries out reduction reaction.
Because the mixing of raw material is carried out after the trichlorosilane vaporization in the trichlorosilane gasification process of present embodiment, promptly adopt trichlorosilane gas to mix with hydrogen, can obtain the gas mixture that proportioning is stablized, mixed, the mixing of raw material is more even, the volume ratio of trichlorosilane gas and hydrogen can be stablized and is controlled at about 1:4 in the mixing tank, helps the even growth of silicon rod in the reduction reaction of reduction furnace; And the little metal impurity in the trichlorosilane is removed along with vaporescence, in the trichlorosilane gas foreign matter content still less, thereby the polysilicon grain visual appearance of producing is better.
As shown in Figure 2, the trichlorosilane vaporization unit that present embodiment is enumerated comprises vaporizer 12, mixing tank 5, trichlorosilane liquid delivery tube, trichlorosilane air shooter, mixed gas pipeline, vaporizer 12 comprises shell and tube heat exchanger 14, the bottom of vaporizer 12 is provided with trichlorosilane liquid inlet 13, top is provided with trichlorosilane pneumatic outlet 16, and trichlorosilane liquid inlet 13 is connected with the trichlorosilane liquid delivery tube; Vaporizer 12 also is provided with liquidometer 7, and liquidometer 7 is the internal floating type magnetic fluid level gauge, and the tube side of shell and tube heat exchanger is communicated with the trichlorosilane liquid delivery tube, and shell side is communicated with the pipeline of carrying outer circulation water.
The trichlorosilane liquid delivery tube is provided with trichlorosilane mass flowmeter 3 and trichlorosilane flow control valve 4, and hydrogen delivery tube is provided with hydrogen quality under meter 1 and hydrogen flowing quantity variable valve 2, respectively trichlorosilane liquid and hydrogen is measured.
Utilize technical process that trichlorosilane vaporization unit that present embodiment enumerates vaporizes to trichlorosilane with embodiment 1, because the tube side of shell and tube heat exchanger also is connected with liquidometer in the present embodiment, it is constant to control in the tube side trichlorosilane liquid level more accurately, make the trichlorosilane steam output can keep constant, help accurately controlling the trichlorosilane gas in the mixing tank and the ratio of hydrogen.The volume ratio of trichlorosilane gas and hydrogen can be stablized and is controlled at 1:4.5 in the mixing tank, helps the even growth of silicon rod in the reduction reaction of reduction furnace; And the little metal impurity in the trichlorosilane is removed along with vaporescence, in the trichlorosilane gas foreign matter content still less, thereby the polysilicon grain visual appearance of producing is better.
As shown in Figure 3, the trichlorosilane vaporization unit that present embodiment is enumerated comprises vaporizer 12, mixing tank 5, trichlorosilane liquid delivery tube, trichlorosilane air shooter, mixed gas pipeline, vaporizer 12 comprises the shell and tube heat exchanger 14 of bottom and the scum dredger 15 on top, the bottom of vaporizer 12 is provided with trichlorosilane liquid inlet 13, top is provided with trichlorosilane pneumatic outlet 16, and trichlorosilane liquid inlet 13 is connected with the trichlorosilane liquid delivery tube; Vaporizer 12 also is provided with liquidometer 7, and liquidometer 7 is the internal floating type magnetic fluid level gauge, and the tube side of shell and tube heat exchanger is communicated with the trichlorosilane liquid delivery tube, and shell side is communicated with the pipeline of carrying outer circulation water.
The trichlorosilane liquid delivery tube is provided with trichlorosilane mass flowmeter 3 and trichlorosilane flow control valve 4, and hydrogen delivery tube is provided with hydrogen quality under meter 1 and hydrogen flowing quantity variable valve 2, respectively trichlorosilane liquid and hydrogen is measured.
The trichlorosilane vaporization unit that utilizes present embodiment to enumerate is vaporized to trichlorosilane, comprising:
(1), high-purity trichlorosilane liquid of obtaining of rectifying is sent into the tube side of shell and tube heat exchanger 14 through the trichlorosilane liquid inlet of vaporizer 12 bottoms by transport pipe after trichlorosilane mass flowmeter 3 and 4 meterings of trichlorosilane flow control valve, the pressure of vaporizer (shell and tube heat exchanger) is 0.3～0.8MPa, and temperature is 15 ℃～65 ℃;
The liquid level of vaporizer 12 (liquid level in the shell and tube heat exchanger tube side) is regulated by liquidometer 7;
The trichlorosilane gas that evaporation obtains separates at scum dredger 15 with trichlorosilane liquid, and the trichlorosilane gas after the separation goes out vaporizer 12 by the trichlorosilane pneumatic outlet on vaporizer top.
(2) the trichlorosilane gas that obtains of step (1) to mixing tank 5, and with after after metering hydrogen mixes, carries out reduction reaction through pipe-line transportation to reduction furnace through pipe-line transportation.
In the present embodiment, the top of shell and tube heat exchanger also is provided with the separate chamber, and trichlorosilane liquid separates in the separate chamber with the trichlorosilane gas that evaporation obtains; Can avoid liquid foam entrainment, more help obtaining the gas mixture that proportioning is stablized, mixed.
The trichlorosilane vaporization unit that present embodiment is enumerated comprises vaporizer 12, mixing tank 5, trichlorosilane liquid delivery tube, trichlorosilane air shooter, mixed gas pipeline, vaporizer 12 comprises shell and tube heat exchanger, the top of vaporizer also is provided with scum dredger 15, scum dredger 15 belows are provided with liquidometer 7, the bottom of vaporizer 12 is provided with trichlorosilane liquid inlet 13, top is provided with trichlorosilane pneumatic outlet 16, and trichlorosilane liquid inlet 13 is connected with the pipeline of carrying trichlorosilane liquid; The tube side of the tubulation 14 of vaporizer 12 bottoms is communicated with the pipeline of carrying trichlorosilane liquid, and shell side is communicated with the pipeline of carrying outer circulation water; Be provided with outer circulation Water flow adjusting valve 6 in the pipeline of conveying outer circulation water, outer circulation Water flow adjusting valve 6 is formed control loops with liquidometer 7.
Carry the pipeline of trichlorosilane liquid to be provided with trichlorosilane mass flowmeter 3 and trichlorosilane flow control valve 4, carry the pipeline of hydrogen to be provided with hydrogen quality under meter 1 and hydrogen flowing quantity variable valve 2, respectively trichlorosilane liquid and hydrogen are measured.
Utilize processing step that trichlorosilane vaporization unit that embodiment enumerates vaporizes to trichlorosilane with embodiment 3.Wherein the liquid level of vaporizer 12 (liquid level in the shell and tube heat exchanger tube side) is regulated jointly by liquidometer 7 and outer circulation water regulating valve.
Claims (10)
1. trichlorosilane vaporization unit, comprise vaporizer, hydrogen delivery tube, trichlorosilane liquid delivery tube, trichlorosilane air shooter and mixed gas pipeline, it is characterized in that: this trichlorosilane vaporization unit also comprises mixing tank, and the lower end of vaporizer is provided with the trichlorosilane liquid inlet, the upper end is provided with the trichlorosilane pneumatic outlet; The trichlorosilane liquid inlet is connected with the trichlorosilane liquid delivery tube;
Be provided with gauger on trichlorosilane liquid delivery tube, the hydrogen delivery tube;
Mixing tank is connected with hydrogen delivery tube, trichlorosilane air shooter and mixed gas pipeline respectively.
2. trichlorosilane vaporization unit according to claim 1 is characterized in that: the gauger that is provided with on trichlorosilane liquid delivery tube, the hydrogen delivery tube is the gauger that flow control valve and mass flowmeter are formed.
3. trichlorosilane vaporization unit according to claim 1 is characterized in that: described vaporizer comprises shell and tube heat exchanger.
4. trichlorosilane vaporization unit according to claim 3 is characterized in that: the tube side of described shell and tube heat exchanger is communicated with the trichlorosilane liquid delivery tube, and shell side is communicated with the pipeline of carrying outer circulation water.
5. trichlorosilane vaporization unit according to claim 3 is characterized in that: the tube side of described shell and tube heat exchanger also is provided with liquidometer.
6. trichlorosilane vaporization unit according to claim 5 is characterized in that: described liquid level is counted the internal floating type magnetic fluid level gauge.
7. trichlorosilane vaporization unit according to claim 5 is characterized in that: the pipeline of the conveying outer circulation water that is communicated with vaporizer is provided with the outer circulation Water flow adjusting valve.
8. trichlorosilane vaporization unit according to claim 5 is characterized in that: described outer circulation Water flow adjusting valve and liquidometer are formed control loop.
9. trichlorosilane vaporization unit according to claim 3 is characterized in that: in the above-mentioned trichlorosilane vaporization unit, the top of vaporizer also is provided with the separate chamber.
10. trichlorosilane vaporization unit according to claim 9 is characterized in that: the separate chamber is the screen cloth scum dredger.
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| CN2011101606725A CN102285656A (en) | 2011-06-15 | 2011-06-15 | Trichlorosilane vaporization device |
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| CN2011101606725A CN102285656A (en) | 2011-06-15 | 2011-06-15 | Trichlorosilane vaporization device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104628005A (en) * | 2013-11-07 | 2015-05-20 | 浙江开化合成材料有限公司 | Vaporizer, white carbon black production apparatus and white carbon black production method |
| CN112807712A (en) * | 2021-01-05 | 2021-05-18 | 中国神华煤制油化工有限公司 | Evaporator with a heat exchanger |
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Application publication date: 20111221 |