CN102212877B - MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof - Google Patents
MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof Download PDFInfo
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- CN102212877B CN102212877B CN2010102312739A CN201010231273A CN102212877B CN 102212877 B CN102212877 B CN 102212877B CN 2010102312739 A CN2010102312739 A CN 2010102312739A CN 201010231273 A CN201010231273 A CN 201010231273A CN 102212877 B CN102212877 B CN 102212877B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
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Abstract
The invention discloses an MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities, and the system provided by the invention is used for carrying out extensional reaction on a plurality of substrates arranged on a tray. The MOCVD system comprises a transmission cavity provided with a mechanical arm, a plurality of transit stations and at least two extensional reaction cavities, wherein the plurality of transit stations are connected with the transmission cavity; the substrates can be simultaneously subjected to extensional reaction in the extensional reaction cavities; and according to mechanical automation operation, the trays in the extensional reaction cavities can be taken out and put in without opening extensional reaction cavity covers, thereby improving the system capacity, saving the time for cooling the extensional reaction cavities and changing trays, and improving the production use ratio of equipment. Because the plurality of extensional reaction cavities share one set of transmission cavity, mechanical arm and the like, one and several other sets of corresponding equipment are saved, the setup cost and operation cost are lowered, and installing sites of the equipment are saved. Because the transit stations have the function of a pre-processing cavity, the tray can be precooled and preheated according to the production requirement so as to further improve the production efficiency.
Description
Technical field
The present invention relates to a kind of MOCVD (metal organic chemical vapor deposition) system and method for operation thereof that is used for production compound semiconductor photoelectric device, particularly a kind of MOCVD system and method for operation thereof with a plurality of epitaxial reaction chambers.
Background technology
Metal organic chemical vapor deposition system (hereinafter to be referred as the MOCVD system) is a most crucial equipment that is used to produce semiconductor photoelectric device; Substrate base passes through the epitaxy technique structure growth in the chamber of MOCVD; Form special optoelectronic device structure, MOCVD is widely used in the production of LED epitaxial wafer, high power laser and high efficiency solar cell etc. at present.
Owing to market and technical reason, less demanding for the output of epitaxial wafer, MOCVD equipment all designed for small-scale production in the past.As shown in Figure 1, be the MOCVD system that pallet or substrate are changed in the manual operation seen at most in the market, its through one independently 100 pairs of substrate bases of vacuum reaction chamber 610 carry out epitaxial process.Need open the chamber lid after extension is accomplished each time; On the pallet 600 of reaction chamber 100 the insides, get rebush bottom substrate 610 by operating personnel; And the deposit on the cleaning cavity; Guaranteeing that reaction chamber 100 can continue operate as normal, accounted for time of many equipment operations of these preparations, make the production efficiency of MOCVD system low.
Also have a kind of spray and high-speed rotary MOCVD system, every stove is got by manipulator and is changed pallet, accomplishes or pending substrate base and in holder, place extension.As shown in Figure 2, this kind MOCVD system comprises transmission cavity 200, with the reaction chamber 100 that is connected with transmission cavity 200 respectively, terminal 300 and platform 400; Also be provided with manipulator 210 in the transmission cavity 200, be used for pallet 600 is picked and placeed at above-mentioned each chamber.When reaction chamber 100 carries out epitaxial process to substrate base 610 under setting process conditions, separate through a vacuum separation valve 500 and transmission cavity 200.Terminal 300 is used for temporary will putting into the pallet after the processing of platform 400 from reaction chamber 100, and the pending pallet 600 that will put into reaction chamber 100 from platform 400; This terminal 300 is generally worked under vacuum environment with transmission cavity 200, but when the vacuum separation valve of opening between transmission cavity 200 and the platform 400 500, just is operated under the atmospheric pressure.
Compare manual operation, the mechanized operation of this kind MOCVD system can be carried out under higher temperature, has reduced the apparatus cools time thus; Mechanized operation has also improved the speed of changing sheet, has improved the production utilance of equipment.
Yet above-mentioned existing two production all only is provided with single epitaxial reaction chamber with the MOCVD system, yields poorly, and can not adapt to the production needs of extensive epitaxial substrate substrate; The MOCVD system of mechanical automation operation has increased cost and operating cost that unit makes especially owing to be provided with equipment such as transmission cavity, terminal and platform.
Summary of the invention
The purpose of this invention is to provide a kind of MOCVD system and method for operation thereof with a plurality of epitaxial reaction chambers; Make the shared same group of equipment such as transmission cavity, terminal and platform of a plurality of epitaxial reaction chambers; Both can increase the output of every MOCVD system exponentially; To adapt to the needs of large-scale production, can effectively reduce the unit manufacturing cost and the operating cost of system simultaneously again, save the floor space of system.
In order to achieve the above object; Technical scheme of the present invention provides a kind of MOCVD system with a plurality of epitaxial reaction chambers; Be used for carrying out the extension reaction to being placed on some substrate bases on the pallet, this MOCVD system comprise one be provided with the transmission cavity of manipulator, be connected with transmission cavity respectively be equal to or greater than two MOCVD epitaxial reaction chamber; Above-mentioned pallet is placed on respectively in above-mentioned a plurality of MOCVD epitaxial reaction chamber, makes some substrate bases carry out the extension reaction simultaneously at these a plurality of MOCVD epitaxial reaction chambers;
Said MOCVD system also comprises the terminal that is connected with transmission cavity, and the platform that is connected with terminal;
Manipulator in the transmission cavity is cooperated by radial expansion, axial rotation, the three-dimensional motion that moves up and down, and pallet is picked and placeed between MOCVD epitaxial reaction chamber and terminal, perhaps pallet is picked and placeed between a plurality of epitaxial reaction chambers;
Manipulator takes out pallet from terminal, put into the MOCVD epitaxial reaction chamber carries out the extension reaction, and the said pallet that from terminal, takes out, puts into the MOCVD epitaxial reaction chamber is for to put into the medium pending pallet of terminal from platform;
Be provided with some grooves position in the terminal, make each epitaxial reaction chamber correspondence be assigned input slot position and output magazine position; Place the pallet that the extension reaction of taking out from an epitaxial reaction chamber is accomplished among one of them output magazine position A1, place the wait of putting into from platform among input slot position A2 and send into the pallet that a said epitaxial reaction chamber carries out epitaxial process;
Place the pallet of accomplishing from the extension reaction of another epitaxial reaction chamber taking-up among the B1 of another output magazine position, the pallet that said another epitaxial reaction chamber carries out epitaxial process is sent in the wait that placement is put into from platform among the B2 of another input slot position.
The above-mentioned MOCVD system with a plurality of epitaxial reaction chambers also comprises some vacuum separation valves;
Particularly, between above-mentioned transmission cavity and each epitaxial reaction chamber, be provided with vacuum separation valve;
Between terminal and platform, be provided with vacuum separation valve;
Between transmission cavity and terminal, be provided with vacuum separation valve;
The only pressure balance or open when being in setting range in the chamber on its both sides of above-mentioned some vacuum separation valves.
Be connected with one group of terminal and platform with above-mentioned transmission cavity, as the input port and the delivery outlet of pallet.
Be connected with two groups of terminals and platform with above-mentioned transmission cavity, place the pallet that the new substrate base of waiting for epitaxial process is housed for one group therein, and in another group, place the pallet of having accomplished extension reaction substrate base from being equipped with of a plurality of epitaxial reaction chambers taking-ups.
Be provided with heater or cooling device in some groove positions of above-mentioned terminal; Some groove positions of above-mentioned terminal can be moved at vertical direction or horizontal direction.
A kind of method of operation with MOCVD system of a plurality of epitaxial reaction chambers and a terminal; Be applied to above-mentioned MOCVD system; This method of operation is included in the flow process of changing pallet among the output magazine position A1 that moves horizontally of said terminal, and this flow process comprises following steps:
(b) open the vacuum separation valve that is arranged between terminal and the platform;
(c) pallet is moved to platform;
(d) pallet that renews or change the substrate base on the pallet;
(e) new pallet sends back to the said output magazine position A1 that moves horizontally of terminal;
(f) shut vacuum separation valve;
(g) move new pallet to from the said output magazine position A1 that moves horizontally an input slot position A2 of terminal by manipulator (21).
In the output magazine position that can not move horizontally of said terminal, like B1, the flow process of middle replacing pallet is not carried out when on the said output magazine position A1 that moves horizontally, having pallet, comprises following steps:
(a) remove the output magazine position A1 that moves horizontally to said to pallet from the said output magazine position B1 that can not move horizontally by manipulator;
(b) open vacuum separation valve;
(c) pallet is moved to platform;
(d) pallet that renews or change the substrate base on the pallet;
(e) new pallet sends back to the said output magazine position A1 that moves horizontally of terminal;
(f) shut vacuum separation valve;
(h) move new pallet to from the said output magazine position A1 that moves horizontally another input slot position B2 of terminal by manipulator.
The method of operation of the above-mentioned MOCVD system with a plurality of epitaxial reaction chambers also is included in the step that epitaxial reaction chamber is changed pallet:
Keeping opening the vacuum separation valve between transmission cavity and the epitaxial reaction chamber under transmission cavity and the epitaxial reaction chamber pressure balance condition; And keeping opening the vacuum separation valve between transmission cavity and the terminal under transmission cavity and the terminal pressure balance condition; Manipulator takes out pallet in the epitaxial reaction chamber and puts into the output magazine position of terminal, puts into epitaxial reaction chamber to the new pallet on the input slot position then.
Compared with prior art, the MOCVD system with a plurality of epitaxial reaction chambers according to the invention has the following advantages:
The present invention can carry out the extension reaction to substrate base simultaneously in a plurality of epitaxial reaction chambers; Increase the output of every MOCVD system exponentially; Need not open epitaxial reaction chamber, it remained under vacuum state and the higher working temperature, and can realize the operation that the epitaxial reaction chamber inner pallet picks and places; The time and the time of changing the dish operation of epitaxial reaction chamber cooling have not only been practiced thrift; Also make the deposit on the wall of chamber be not easy to come off, prolonged the cycle of carrying out the cavity clean and maintenance, improved the production utilance of equipment.
The present invention also changes the system configuration that existing platform is connected with transmission cavity; Multiposition connects more epitaxial reaction chamber to make transmission cavity can have more; With shared same set of transmission cavity, manipulator, terminal and platform; Save an other cover or an a few cover corresponding apparatus, reduced it cost and operating cost are set, practiced thrift the fabricating yard of this part equipment.
The present invention has designed terminal and the platform that is used for many epitaxial reaction chambers, has designed the order of a plurality of pallet-changings, can vertically reaching under the cooperation of groove position that horizontal direction moves and manipulator, has realized getting fast the operation of changing pallet.
The present invention is placed on the pallet of new pallet and taking-up respectively on the input slot position and output magazine position corresponding with epitaxial reaction chamber in the terminal; And can be respectively heating or refrigerating function through groove position time of shortening subsequent operation, further improved the production utilance of equipment.
The present invention can also be through being provided with two groups of terminals and platform, removes respectively as the input port and the delivery outlet of pallet, or vacuum separation valve, realized the further simplification of operating procedure.
Description of drawings
Fig. 1 is existing manually-operated structural representation with MOCVD system of single epitaxial reaction chamber;
Fig. 2 is the structural representation of the MOCVD system with single epitaxial reaction chamber of existing machinery automation mechanized operation;
Fig. 3 is the present invention has the MOCVD system of two epitaxial reaction chambers in embodiment 1 a structural representation;
Fig. 4 is the present invention has the MOCVD system of three epitaxial reaction chambers in embodiment 1 a structural representation;
Fig. 5 is the present invention has the MOCVD system of two epitaxial reaction chambers in embodiment 2 a structural representation;
Fig. 6 is the present invention has the MOCVD system of three epitaxial reaction chambers in embodiment 3 a structural representation;
Fig. 7 is a kind of end view of preferred structure that has the MOCVD system of two epitaxial reaction chambers among the present invention.
Embodiment
Below in conjunction with description of drawings multiple concrete system configuration of the present invention.
Embodiment 1
Please cooperate referring to Fig. 3, shown in Figure 4; The MOCVD system that present embodiment relates to a plurality of epitaxial reaction chambers; Comprise one be provided with manipulator 21 transmission cavity 20; And be connected with transmission cavity 20 be equal to or greater than two epitaxial reaction chamber 10, also comprise the terminal 30 that is connected with transmission cavity 20, and the platform 40 that is connected with terminal 30.Be provided with a vacuum separation valve 51 between transmission cavity 20 and each epitaxial reaction chamber 10; Be provided with a vacuum separation valve 52 between transmission cavity 20 and the terminal 30, be provided with a vacuum separation valve 53 between terminal 30 and the platform 40.
As shown in Figure 3 is the MOCVD system with two epitaxial reaction chambers; Shown in Figure 4 is the MOCVD system with three epitaxial reaction chambers.Transmission cavity 20 attachable maximum epitaxial reaction chamber 10 quantity are by the designing institute decision of transmission cavity 20.
Wherein, epitaxial reaction chamber 10 is the cores that are used for epitaxial growth structure film on substrate base 61 in the MOCVD system.Be placed with a pallet 60 in the epitaxial reaction chamber 10, a plurality of epitaxial wafer substrates 61 be placed on this pallet 60 carry out epitaxial growth, simultaneously treated substrate base 61 quantity are by the design decision of epitaxial reaction chamber 10.Epitaxial reaction chamber 10 is generally operational in the state of vacuum and high temperature; The present invention adorning/when unloading pallet 60; Epitaxial reaction chamber 10 is remained under the vacuum state, can prevent that outside contamination from getting into, and the state of vacuum high-temperature can also prevent that the deposit on epitaxial reaction chamber 10 inwalls from coming off; Thereby can keep clean in the epitaxial reaction chamber 10, effectively prolong the cycle of cleaning epitaxial reaction chamber 10.
The center of transmission cavity 20 is provided with manipulator 21, and it has rotation, radial translation, moves up and down 3 motor functions.This manipulator 21 need not be opened epitaxial reaction chamber 10 through the combination of these motions, just can take out, put into terminal 30 to pallet 60 from epitaxial reaction chamber 10, or take out, put into epitaxial reaction chamber 10 from terminal 30.In transmission cavity 20 and epitaxial reaction chamber 10 pressure balances or when reaching certain preset range, generally be under the vacuum state, can open two vacuum separation valves 51 between the cavity, fetch and deliver pallet 60 by manipulator 21.
In another kind of equipment disposition, vacuum separation valve 52 (promptly removing dotted portion among Fig. 3, Fig. 4) is not set between terminal 30 and the transmission cavity 20.Such configuration makes transmission cavity 20 always work in identical pressure state with terminal 30.When transmission cavity 20 and terminal 30 are in vacuum state, just can open vacuum separation valve 51, carry out pallet 60 and change getting of epitaxial reaction chamber 10; When opening vacuum separation valve 53, transmission cavity 20 can be along with terminal 30 gets into atmosphere pressure state together.This kind is not provided with the equipment disposition of vacuum separation valve 52, and needing is that transmission cavity 20 vacuumizes with 30 two cavitys of terminal simultaneously, though time lengthening, can on structure and operating procedure, realize further simplifying.
Be provided with the groove position 31 of some placement pallets 60 in the terminal 30; The quantity of this groove position 31 is by the quantity decision of epitaxial reaction chamber 10; For each epitaxial reaction chamber 10 is assigned two groove positions 31, is respectively applied for pallet 60 that extension reaction that placement takes out from epitaxial reaction chamber 10 accomplishes and pending pallet 60 such as puts into from platform 40.The groove position 31 of wherein placing new pallet 60 can have heater, and pallet 60 temperature are reached as more than 100 degrees centigrade, shortens the warm-up time of pallet 60; The groove position 31 of placing the pallet 60 of extension completion can have cooling device, can be cooled to the for example working temperature below 100 degrees centigrade of subsequent operation to pallet 60 within a certain period of time.Above-mentioned a kind of collocation method that heater and cooling device only are provided, it can require to be configured according to different production.
Some grooves position 31 in the above-mentioned terminal 30; Has the function that moves under the in the vertical direction; After opening vacuum separation valve 51,52, cooperate the manipulator 21 in the transmission cavity 20, between different groove positions 31 and epitaxial reaction chamber 10, carry out the operation that pallet 60 picks and places; On at least one groove position 31, the function that horizontal direction moves is set, when opening vacuum separation valve 53, can makes this groove position 31 move to platform 40, move pallet 60 on the platform 40 to, carry out subsequent operation.
Operating personnel can change the operation that pallet 60 perhaps changes substrate base 61 on the pallet 60 at platform 40.As shown in Figure 7, this platform 40 can be placed on glove box 70 the insides that are full of nitrogen, keeps clean operating environment.Platform 40 also can be placed in the dustless laminar flow hood 70 that high efficiency particle air filter is housed, so that operating environment satisfies the requirement of dust Control
Embodiment 2
MOCVD system as shown in Figure 5, that present embodiment relates to is an example to dispose two epitaxial reaction chambers 10, structure similar in itself and the foregoing description, comprise one be provided with manipulator 21 transmission cavity 20, and two epitaxial reaction chambers 10 that are connected with transmission cavity 20.Its difference is, also comprises two terminals 30 that are connected with transmission cavity 20, and each terminal 30 also is connected with a platform 40.
Similar to the above embodiments, be provided with vacuum separation valve 51 between transmission cavity 20 and each epitaxial reaction chamber 10; Be provided with vacuum separation valve 53 between terminal 30 and the platform 40.Vacuum separation valve 52 (dotted line is represented among Fig. 5) between transmission cavity 20 and the terminal 30 can be selected to be provided with or to remove as requested.Above-mentioned vacuum separation valve 51,52,53 all just can be opened in the pressure balance of its both sides cavity or when reaching in the certain limit.
With above-mentioned different, present embodiment is provided with two groups of terminals 30 and platform 40, so can make wherein one group of new pallet 60 of placing the wait epitaxial process specially, and the extension that placement is taken out from two epitaxial reaction chambers 10 in another group is reacted the pallet 60 of completion; Or make every group of terminal 30 and platform 40 corresponding epitaxial reaction chambers 10, be merely the replacement that this epitaxial reaction chamber 10 carries out pallet and pick and place work.
Similar to the above embodiments, be provided with in each terminal 30 some can be in groove position 31 vertical or that horizontal direction moves, the carrying of utility tray 60; This some grooves position 31 also can dispose heater or cooling device arbitrarily according to the different production needs, and pallet 60 is carried out preheating or cooling, to save the time of subsequent treatment.
Embodiment 3
As shown in Figure 6; Present embodiment relates to the MOCVD system with a plurality of epitaxial reaction chambers; With structure similar in the foregoing description, comprise one be provided with manipulator 21 transmission cavity 20, and the some terminals 30 that are connected with transmission cavity 20 and a plurality of epitaxial reaction chamber 10.
Its difference is that transmission cavity 20 is polygonal in the present embodiment, and it can be connected with more epitaxial reaction chamber 10 or terminal 30.To be example among Fig. 6, transmission cavity 20 is hexagonal, its respectively with two terminals 30, and three epitaxial reaction chambers 10 connect; Each terminal 30 also is connected with a platform 40.
Similar to the above embodiments, be provided with vacuum separation valve 51 between transmission cavity 20 and each epitaxial reaction chamber 10; Be provided with vacuum separation valve 53 between terminal 30 and the platform 40.Vacuum separation valve 52 (dotted line is represented among Fig. 6) between transmission cavity 20 and the terminal 30 can be selected to be provided with or to remove as requested.Above-mentioned vacuum separation valve 51,52,53 all just can be opened in the pressure balance of its both sides cavity or when reaching in the certain limit.
Similar with the foregoing description 2; Two groups of terminals being provided with in the present embodiment 30 and platform 40 are respectively as the input port and the delivery outlet of pallet 60; Place the new pallet 60 of waiting for epitaxial process specially for one group therein, and in another group, place the pallet of accomplishing from the extension reaction of three epitaxial reaction chambers, 10 taking-ups 60.
Similar to the above embodiments, be provided with in each terminal 30 some can be in groove position 31 vertical or that horizontal direction moves, the carrying of utility tray 60; This some grooves position 31 also can dispose heater or cooling device arbitrarily according to the different production needs, and pallet 60 is carried out preheating or cooling, to save the time of subsequent treatment.
Below in conjunction with a kind of MOCVD system with two epitaxial reaction chambers shown in Figure 7 is example, cooperates referring to embodiment 1 said explanation workflow of the present invention.
In this system, two epitaxial reaction chambers 10 that are connected with transmission cavity 20, shared same group of terminal 30 and platform 40.Need to prove that Fig. 7 is only as a kind of embodiment of the present invention, the terminal 30 that the present invention relates to and vertically, the groove position 31 that moves horizontally etc., be not limited to the structure of the following stated.
Two epitaxial reaction chamber 10A that are provided with in the corresponding system and 10B, terminal 30 is provided with 4 groove positions 31, is respectively output magazine position A1, B1 and input slot position A2, B2, wherein input slot position A2 and B2 are used to place new pending pallet 60, can be provided with heater; Output magazine position A1 and B1 place the pallet 60 of having accomplished the extension reaction, can be provided with cooling device.
In this example, the vacuum separation valve 52 between terminal 30 and the transmission cavity 20 is arranged on the top of terminal 30 chambers one sidewall, and terminal 30 and the vacuum separation valve 53 between the platform 40 are arranged on the bottom of the corresponding sidewall of chamber.The groove position 31 of terminal 30 is through vertically moving, and at the connector place of terminal 30 with transmission cavity 20, cooperative mechanical hand 21 carries out the operation (shown in input slot position B2 among Fig. 7) that pallet 60 picks and places; Similarly, have only the connector place that vertically moves to terminal 30 and platform 40 in this example, groove position 31 just can be moved horizontally to platform 40 (shown in output magazine position A1 among Fig. 7), picks and places the substrate base 61 on pallet 60 or the pallet 60 by operating personnel.Below get in the operating process of changing pallet 60, omit groove position 31 in description vertical or that horizontal direction moves.
Epitaxial reaction chamber changes the step of pallet:
(1) the A epitaxial reaction chamber changes pallet: under the equilibrium condition that keep-ups pressure, open vacuum separation valve 51 and 52; Manipulator 21 takes out pallet 60 and puts into the output magazine position A1 of terminal 30 from 10 li of A epitaxial reaction chambers, puts into A epitaxial reaction chamber 10 to the new pallet 60 on the A2 of input slot position then.
(2) the B epitaxial reaction chamber changes pallet: under the equilibrium condition that keep-ups pressure, open vacuum separation valve 51 and 52; Manipulator 21 is from the pallet 60 of 10 li taking-ups of B epitaxial reaction chamber and put into the output magazine position B1 of terminal, puts into B epitaxial reaction chamber 10 to the new pallet 60 on the B2 of input slot position then.
Prepare the step of new pallet:
(1) if only on the A1 of output magazine position, the pallet of having accomplished epitaxially grown substrate base 61 is arranged, operating procedure does
(b) open vacuum separation valve 53;
(c) pallet 60 is moved to platform 40;
(d) pallet 60 that renews or change the substrate base 61 on the pallet 60;
(e) new pallet 60 sends back to the output magazine position A1 of terminal 30;
(f) shut vacuum separation valve 53;
(g) A1 moves input slot position A2 to from the output magazine position new pallet 60 by manipulator 21.
So just accomplish the extension reaction of preparing next round for the A epitaxial reaction chamber, changed the operation of pallet.
(2) if only on the B1 of output magazine position, the pallet of having accomplished epitaxially grown substrate base 61 is arranged, operating procedure does
(a) B1 removes the A1 to the output magazine position from the output magazine position pallet 60 by manipulator;
(b) open vacuum separation valve 53;
(c) pallet 60 is moved to platform 40;
(d) pallet 60 that renews or change the substrate base 61 on the pallet 60;
(e) new pallet 60 sends back to the output magazine position A1 of terminal 30;
(f) shut vacuum separation valve 53;
(h) A1 moves input slot position B2 to from the output magazine position new pallet 60 by manipulator.
So just accomplish the extension reaction of preparing next round for the B epitaxial reaction chamber, changed the operation of pallet.
(3) if the pallet of having accomplished epitaxially grown substrate base 61 is all arranged at output magazine position A1 and output magazine position B1; Must accomplish the renewal of output magazine position A1 top tray 60 earlier; Promptly the institute of (1) in steps; Accomplish the renewal of output magazine position B1 top tray after vacating output magazine position A1 again, promptly the institute of (2) in steps.
Above step can be realized by auto-control software and hardware.
For transmission cavity 20 described in the embodiment 1 and 30 of terminals the system configuration (promptly removing dotted portion among Fig. 7) of vacuum separation valve 52 is not set, the step of above-mentioned " epitaxial reaction chamber changes pallet " and " preparing new pallet " can be suitable equally.
The step of above-mentioned " epitaxial reaction chamber changes pallet " and " preparing new pallet "; Can be suitable for equally like embodiment 2, described in 3; The transmission cavity 20 that is connected with a plurality of epitaxial reaction chambers 10 also connects the system configuration as the two groups of terminals 30 and the platform 40 of the input port of pallet 60 and delivery outlet respectively.This kind system is substituted in the operation of pallet 60, only need the input port end with platform 40 in all new pallets 60 be transported to successively in the terminal 30; And the pallet of the extension reaction being accomplished at the delivery outlet end 60 is transported to platform 40 from terminal 30 successively, and the operation of manipulator 21 and the complexity of each terminal 30 controls are further simplified.
In sum, the MOCVD system with a plurality of epitaxial reaction chambers according to the invention can carry out the extension reaction to substrate base simultaneously in a plurality of epitaxial reaction chambers; Increase the output of every MOCVD system exponentially; Need not open epitaxial reaction chamber, it remained under vacuum state and the higher working temperature, and can realize the operation that the epitaxial reaction chamber inner pallet picks and places; The time and the time of changing the dish operation of epitaxial reaction chamber cooling have not only been practiced thrift; Also make the deposit on the wall of chamber be not easy to come off, prolonged the cycle of carrying out the cavity clean and maintenance, improved the production utilance of equipment.
The present invention also changes the system configuration that existing platform is connected with transmission cavity; Multiposition connects more epitaxial reaction chamber to make transmission cavity can have more; With shared same set of transmission cavity, manipulator, terminal and platform; Save an other cover or an a few cover corresponding apparatus, reduced it cost and operating cost are set, practiced thrift the fabricating yard of this part equipment.
The present invention has designed terminal and the platform that is used for many epitaxial reaction chambers, has designed the order of a plurality of pallet-changings, can vertically reaching under the cooperation of groove position that horizontal direction moves and manipulator, has realized getting fast the operation of changing pallet.
The present invention is placed on the pallet of new pallet and taking-up respectively on the input slot position and output magazine position corresponding with epitaxial reaction chamber in the terminal; And can be respectively heating or refrigerating function through groove position time of shortening subsequent operation, further improved the production utilance of equipment.
The present invention can also be through being provided with two groups of terminals and platform, removes respectively as the input port and the delivery outlet of pallet, or vacuum separation valve 52, realized the further simplification of operating procedure.
Although content of the present invention has been done detailed introduction through above-mentioned preferred embodiment, will be appreciated that above-mentioned description should not be considered to limitation of the present invention.After those skilled in the art have read foregoing, for multiple modification of the present invention with to substitute all will be conspicuous.Therefore, protection scope of the present invention should be limited appended claim.
Claims (7)
1. MOCVD system with a plurality of epitaxial reaction chambers; Be used for the some substrate bases (61) that are placed on the pallet (60) are carried out the extension reaction; It is characterized in that, comprise one be provided with the transmission cavity (20) of manipulator (21), be connected with transmission cavity (20) respectively be equal to or greater than two MOCVD epitaxial reaction chamber (10); Pallet (60) is placed on respectively in said a plurality of MOCVD epitaxial reaction chambers (10), makes some substrate bases (61) carry out the extension reaction simultaneously at these a plurality of MOCVD epitaxial reaction chambers (10);
Said MOCVD system also comprises the terminal (30) that is connected with transmission cavity (20), and the platform (40) that is connected with terminal (30);
Manipulator (21) in the transmission cavity (20) is cooperated by radial expansion, axial rotation, the three-dimensional motion that moves up and down; Pallet (60) is picked and placeed between MOCVD epitaxial reaction chamber (10) and terminal (30), perhaps pallet (60) is picked and placeed between a plurality of epitaxial reaction chambers (10);
Manipulator (21) takes out pallet (60) from terminal (30), put into MOCVD epitaxial reaction chamber (10) carries out the extension reaction, said taking-up from terminal (30), put into MOCVD epitaxial reaction chamber (10) pallet for to put into the medium pending pallet of terminal (30) from platform (40);
Be provided with some grooves position (31) in the terminal (30), make each MOCVD epitaxial reaction chamber (10) correspondence be assigned input slot position and output magazine position;
The pallet (60) that the extension reaction that placement is taken out from an epitaxial reaction chamber in one of them output magazine position (A1) is accomplished, the pallet (60) that a said epitaxial reaction chamber carries out epitaxial process is sent in the wait that placement is put into from platform (40) in the input slot position (A2);
The pallet (60) that the extension reaction that placement is taken out from another epitaxial reaction chamber in another output magazine position (B1) is accomplished, the pallet (60) that said another epitaxial reaction chamber carries out epitaxial process is sent in the wait that placement is put into from platform (40) in another input slot position (B2).
2. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 1 is characterized in that, also comprises some vacuum separation valves (51,52,53);
Between said transmission cavity (20) and each epitaxial reaction chamber (10), be provided with vacuum separation valve (51);
Between terminal (30) and platform (40), be provided with vacuum separation valve (53);
Between transmission cavity (20) and terminal (30), be provided with vacuum separation valve (52);
Only pressure balance or open when being in setting range in the chamber on its both sides of said some vacuum separation valves (51,52,53).
3. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 1; It is characterized in that; Be connected with one group of terminal (30) and platform (40) with said transmission cavity (20); Input port and delivery outlet as pallet (60); Perhaps two groups of terminals (30) and platform (40) are wherein placed the pallet (60) that the new substrate base (61) of waiting for epitaxial process is housed for one group, and in another group, are placed the pallet (60) of having accomplished extension reaction substrate base (61) from being equipped with of a plurality of epitaxial reaction chambers (10) taking-up.
4. the MOCVD system with a plurality of epitaxial reaction chambers as claimed in claim 1 is characterized in that, is provided with heater or cooling device in some groove positions (31) of said terminal (30); Some groove positions (31) of said terminal (30) can be moved at vertical direction or horizontal direction.
5. a method of operation that is applied to MOCVD as claimed in claim 1 system is characterized in that, this method of operation is included in the flow process of changing pallet (60) in the output magazine position (A1) that moves horizontally of terminal (30), and this flow process comprises following steps:
(b) open the vacuum separation valve (53) that is arranged between terminal (30) and the platform (40);
(c) pallet (60) is moved to platform (40);
(d) pallet that renews (60) or change the substrate base (61) on the pallet (60);
(e) new pallet (60) sends back to the said output magazine position (A1) that moves horizontally of terminal (30);
(f) shut vacuum separation valve (53);
(g) move new pallet (60) to from the said output magazine position (A1) that moves horizontally the input slot position (A2) of terminal (30) by manipulator (21).
6. method of operation as claimed in claim 5; It is characterized in that; This method of operation also is included in middle another flow process of changing pallet (60) in the output magazine position (B1) that can not move horizontally of said terminal (30); Do not carry out when on the said output magazine position (A1) that moves horizontally, having pallet (60), said another flow process comprises following steps:
(a) remove the output magazine position (A1) that moves horizontally to said to pallet (60) from the said output magazine position (B1) that can not move horizontally by manipulator;
(b) open vacuum separation valve (53);
(c) pallet (60) is moved to platform (40);
(d) pallet that renews (60) or change the substrate base (61) on the pallet (60);
(e) new pallet (60) sends back to the said output magazine position (A1) that moves horizontally of terminal (30);
(f) shut vacuum separation valve (53);
(h) move new pallet (60) to from the said output magazine position (A1) that moves horizontally another input slot position (B2) of terminal (30) by manipulator.
7. method of operation as claimed in claim 6 is characterized in that, also is included in the step that epitaxial reaction chamber (10) is changed pallet (60):
Keeping opening the vacuum separation valve (51) between transmission cavity (20) and the epitaxial reaction chamber (10) under transmission cavity (20) and epitaxial reaction chamber (10) the pressure balance condition; And keeping opening the vacuum separation valve (52) between transmission cavity (20) and the terminal (30) under transmission cavity (20) and terminal (30) the pressure balance condition; Manipulator (21) takes out pallet (60) from epitaxial reaction chamber (10) lining and puts into the output magazine position of terminal (30), puts into epitaxial reaction chamber (10) to the new pallet (60) on the input slot position then.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102312739A CN102212877B (en) | 2010-07-09 | 2010-07-09 | MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof |
| PCT/CN2011/001124 WO2012003715A1 (en) | 2010-07-09 | 2011-07-08 | Mocvd system having multiple epitaxial reactor chambers and operation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102312739A CN102212877B (en) | 2010-07-09 | 2010-07-09 | MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof |
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| Publication Number | Publication Date |
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| CN102212877A CN102212877A (en) | 2011-10-12 |
| CN102212877B true CN102212877B (en) | 2012-08-22 |
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| Country | Link |
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| CN (1) | CN102212877B (en) |
| WO (1) | WO2012003715A1 (en) |
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| JP2011500961A (en) | 2007-10-11 | 2011-01-06 | バレンス プロセス イクウィップメント，インコーポレイテッド | Chemical vapor deposition reactor |
| CN105986251A (en) * | 2015-02-11 | 2016-10-05 | 上海理想万里晖薄膜设备有限公司 | PECVD system |
| CN110952079A (en) * | 2018-09-26 | 2020-04-03 | 东泰高科装备科技有限公司 | Shelf, bearing plate, tray, buffer cavity, loading cavity and substrate transmission system |
| DE102019123556A1 (en) | 2019-09-03 | 2021-03-04 | Aixtron Se | Loading module for a CVD reactor system |
| CN112391608A (en) * | 2020-11-13 | 2021-02-23 | 宁波沁圆科技有限公司 | CVD processing system and processing method |
| CN113463190A (en) * | 2021-05-13 | 2021-10-01 | 顾赢速科技(合肥)有限公司 | Epitaxial growth device |
| CN113881931A (en) * | 2021-10-11 | 2022-01-04 | 湘潭大学 | CVD device and dispersed air intake method thereof |
| CN114540946B (en) * | 2021-12-29 | 2023-11-14 | 华灿光电（浙江）有限公司 | MOCVD epitaxial equipment for improving preparation efficiency and application method thereof |
| CN114411247B (en) * | 2022-01-21 | 2023-05-16 | 深圳市纳设智能装备有限公司 | Epitaxial reaction equipment |
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| US5944857A (en) * | 1997-05-08 | 1999-08-31 | Tokyo Electron Limited | Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor |
| JP2000012647A (en) * | 1998-06-19 | 2000-01-14 | Sumitomo Eaton Noba Kk | Device and method for carrying wafer |
| IT1308606B1 (en) * | 1999-02-12 | 2002-01-08 | Lpe Spa | DEVICE FOR HANDLING SUBSTRATES BY MEANS OF A SELF-LEVELING DEPRESSION SYSTEM IN INDUCTION EPISTAXIAL REACTORS WITH SUCCESSOR |
| CN1328410C (en) * | 2004-10-19 | 2007-07-25 | 吉林大学 | Low-pressure metal organic chemical vapour phase depositing apparatus for zinc oxide and process thereof |
| WO2006055984A2 (en) * | 2004-11-22 | 2006-05-26 | Applied Materials, Inc. | Substrate processing apparatus using a batch processing chamber |
| CN2756644Y (en) * | 2004-12-21 | 2006-02-08 | 中国科学技术大学 | Intercommunication type multiple reaction room high temperature organic metal chemical gas phase depositing device |
| KR100764739B1 (en) * | 2006-05-10 | 2007-10-08 | 삼성전자주식회사 | Methods of forming a semiconductor device |
| US20090194026A1 (en) * | 2008-01-31 | 2009-08-06 | Burrows Brian H | Processing system for fabricating compound nitride semiconductor devices |
| CN101911253B (en) * | 2008-01-31 | 2012-08-22 | 应用材料公司 | Closed loop MOCVD deposition control |
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| CN102212877A (en) | 2011-10-12 |
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