CN102186629A - Polishing pad having a tricot mesh fabric as a base - Google Patents
Polishing pad having a tricot mesh fabric as a base Download PDFInfo
- Publication number
- CN102186629A CN102186629A CN2009801403878A CN200980140387A CN102186629A CN 102186629 A CN102186629 A CN 102186629A CN 2009801403878 A CN2009801403878 A CN 2009801403878A CN 200980140387 A CN200980140387 A CN 200980140387A CN 102186629 A CN102186629 A CN 102186629A
- Authority
- CN
- China
- Prior art keywords
- polishing
- polished section
- planar portions
- warp knitted
- polishing pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/02—Backings, e.g. foils, webs, mesh fabrics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Laminated Bodies (AREA)
- Knitting Of Fabric (AREA)
Abstract
The present invention relates to a polishing pad having a base knitted into a net with meshes for absorbing and discharging dust generated during polishing to an external dust suction device or for storing the dust in a pocket system, thereby improving polishing efficiency. The polishing pad of the present invention is provided with polishing powder firmly bonded onto one side of the base formed into a wide area to improve the durability of the polishing pad.; The polishing pad according to one embodiment of the present invention comprises a tricot mesh fabric (10) having plane portions (12) formed by densely knitting fiber yarns into a net and meshes (14) formed between the plane portions (12), a polishing powder layer (20) formed by bonding polishing powder to the plane portions at one side of the tricot mesh fabric (10) with an adhesive, and an upper layer (30) made of Velcro fabric and attached to the other side of the tricot mesh fabric (10). The polishing pad of the present invention is detachably fastened to the male hook Velcro formed at the surface of a polishing pad holder of an electric power tool (sander).
Description
Technical field
The present invention relates to a kind of polished section, relate in particular to a kind of with the polished section of warp knitted eyelet fabric as base material or substrate, wherein this warp knitted eyelet fabric comprises planar portions that forms with the close textured fiber yarn of web form and the mesh portion that forms between planar portions, and the polishing yarn adheres to planar portions at the one or both sides of warp knitted eyelet fabric.
Background technology
When making wood furniture or other woodworks, the rough surface of furniture or woodwork will polish and japanning usually.In polishing technology, use sand paper to come rough surface is handled usually.
Sand paper not only can be used for wooden surface grinding, can also be used for stone material, resin and metal material.Brief for the sake of simplicity, following description is that example describes with wooden polishing.
Typical sand paper is by being made up of the paper or the fabric of abrasive sand in surface adhesion, and sand paper is fixed to oscillating mode electric sander (sander).Perhaps, have the rear side of the paper of abrasive sand or fabric to adhere to the female Velcro of ring-type in surface adhesion, female Velcro of paper of Zhun Beiing or fabric (female Velcro) element is used for removably public Velcro (male Velcro) combination of elements with the polished section fixator that is arranged at the rail mounted sander thus.But, when using existing sand paper (that is, polished section) polishing wood furniture surperficial, can produce thin dirt and descend slowly and lightly in air or be collected at pending object surfaces, pollute working environment, damaged workers ' health, especially damaged workman's respiratory system and eyes.As a result, reduce operating efficiency, even caused the workman to escape millwork.
In recent years, some devices are also used in people's exploitation, and these dusts that device vacuum suck and absorption produces in millwork are to prevent the dust in the breathe air.The polished section fixator of sander has inlet hole, and to suck dust, polished section has and the corresponding hole of the inlet hole of fixator.When using by paper with perforation or textile polished section, polished section is easy to wearing and tearing because perforation becomes, and the part of being passed around the hole produces the polishing of not expecting through regular meeting, promptly at object surfaces generation scratch to be polished.In addition, be easy to dust on the card between the polishing yarn of the surface attachment of polished section, this can greatly damage the polishing performance of polished section.As a result, polishing efficient sharply descends.
Korean Utility Model is registered No. 436999 and has been described a kind of polished section, it is developed by the inventor, purpose is to solve the above problems, wherein, the polishing yarn is attached to a side of dictyosome, dictyosome is that the opposite side of female velcro elements and dictyosome is combined as a whole with the fiber yarn of web form weaving.
Described utility model is registered No. 436999 in polishing efficient with prevent from aspect the dust distribution to obtain significant effect by the mesh of the dust inspiration dictyosome that will produce in the polishing process.But, because the polishing yarn is attached to the surface of the fine fibre line in the dictyosome, the therefore service life of having reduced polished section.In addition, when the polished section that is proposed when removing other applications that dust sucks, the dust that produces in the polishing process can be stuck in the very little fine mesh, therefore causes dust shrugged off becoming very difficult, infringement polishing performance.
Summary of the invention
Technical problem
The present invention is intended to solve above-mentioned traditional problem, an object of the present invention is to propose a kind of polished section with improved structure, wherein this polished section can replace common polished section or banded polished section and dust intake system, the dust that produces in the polishing process is removed from the facet of polished section fast, improve polishing efficient, this polished section can be reused for a long time.
Technical scheme
In order to achieve the above object, one embodiment of the present of invention propose a kind of polished section, and it comprises: warp knitted eyelet fabric, and it has by fiber yarn knits the planar portions that forms so that mesh shape is close, and the mesh that forms between planar portions; The polishing thread layers, it has the polishing yarn of planar portions that is adhered to the one side of warp knitted eyelet fabric by adhesive; And top layer, it is made up of the Velcro fabric, is attached to the another side of warp knitted eyelet fabric, removably to combine with the hook-shaped public velcro elements that a surface of the polished section fixator that is fixed in power tool (as sander) forms.
According to a preferred embodiment of the invention, it is bonding to increase to form epoxy blanket on the planar portions of warp knitted eyelet fabric, then, with adhesive polishing yarn and substrate is combined.In addition, the top cover layer that comprises phenolic resins is formed on the polishing thread layers, and preferably, the antifouling cover layer that comprises calcium stearate is formed on the cover layer of top.
An alternative embodiment of the invention proposes a kind of two-sided polished section, and it comprises: warp knitted eyelet fabric, and it has by fiber yarn with the close planar portions that forms of knitting of web form, and the mesh that forms between described planar portions; And the polishing thread layers, it has the polishing yarn that is adhered to the planar portions of the end face of described warp knitted eyelet fabric and bottom surface by adhesive.
Advantageous effects
The polishing yarn of polished section of the present invention is attached to the flat and wide relatively face of warp knitted eyelet fabric substrate, so have outstanding tack, therefore has the durability of raising, is enough to reduce to polish the separation of yarn.This planar portions occupy at least polished section the gross area 50%.The dust that produces in the polishing process is collected into outside dust absorption system by the mesh that is formed at warp knitted eyelet fabric, and wherein mesh has the big relatively degree of depth and area, perhaps is written in bag shape mesh.As a result, the advantage of polished section of the present invention is the facet that dust does not remain on polished section, improves the polishing performance thus, and after the polishing, dust is easy to remove from mesh, makes thus and can reuse this polished section.
Description of drawings
From the following description to preferred embodiments and drawings that purport of the present invention and use thereof are described, above and other purpose of the present invention, characteristics and advantage will be conspicuous, in the accompanying drawings:
Fig. 1 is that to illustrate be the stereogram and the partial enlarged drawing of polished section according to an embodiment of the invention;
Fig. 2 is the amplification detail view that the main element of polished section according to an embodiment of the invention is shown;
Fig. 3 is the micrograph that the warp knitted eyelet fabric that is used as substrate of polished section according to an embodiment of the invention is shown;
Fig. 4 is the cross-sectional view of the layer structure of explanation polished section according to an embodiment of the invention;
Fig. 5 is the cross-sectional view of the layer structure of explanation polished section according to another embodiment of the invention;
Fig. 6 is the micrograph that illustrates according to the actual ratio of polished section of the present invention.
The specific embodiment
Above-mentioned purpose of the present invention and other characteristics will be described in detail in the following description.
Fig. 1 to 4 is schematic diagram or full-scale micrographs of polished section according to an embodiment of the invention.Polished section 1 of the present invention comprises: warp knitted eyelet fabric 10, and it has by fiber yarn with the close planar portions 12 that forms of knitting of mesh shape, and at the mesh 14 of 12 formation of planar portions; Polishing thread layers 20, it has the polishing yarn of planar portions that is adhered to the one side of warp knitted eyelet fabric 10 by adhesive; And top layer 30, its Velcro fabric by the another side that is attached to warp knitted eyelet fabric 10 is formed.
But used top layer is not limited to such Velcro fabric among the present invention.Polished section of the present invention also can be by in substrate (promptly, warp knitted eyelet fabric) adheres to fabric or synthetic resin sheet on the accompanying upper side of polishing yarn, can adhere to/can not adhere to paper manufacturing with suitable endurance, and this laminate is cut into long ribbon shape, form banded finishing strip thus.In addition, polished section of the present invention also can be made into sand paper type polished section.Should be understood that these modification all below the narration scope of the present invention in.
Warp knitted eyelet fabric 10 according to a preferred embodiment of the invention is well-known use requires the sweat shirt of certain air permeability in manufacturing linings, wherein the concrete structure of this fabric is for knitting natural or synthetic yarns forms the planar portions 12 with relatively large width (1-3mm) by close, and have big relatively diameter (1-3mm), be formed on the oval mesh 14 of 12 of such planar portions dividually, as shown in Figure 3.
Braiding structure according to warp knitted eyelet fabric of the present invention is not limited to the structure shown in the accompanying drawing, can be woven into multiple structure and mesh 14 also can have different size.
Have the fabric thickness of about 0.3-0.5mm according to the warp knitted eyelet fabric 10 of previous embodiment of the present invention, therefore, the degree of depth of each mesh 14 can be in the scope of 0.3-0.5mm.Polishing thread layers 20 is to form by the planar portions 12 adhesion polishing yarns in the one side of warp knitted eyelet fabric 10, forms the top cover layer subsequently on polishing thread layers 20.Correspondingly, it is big that the thickness of these layers of the degree of depth of mesh 14 is wanted, and this has increased the volume of mesh 14.As a result, these meshes 14 can load or receive the dust that produces in the polishing process fully.
Therefore first useful point of the present invention is to polish the whole planar portions 12 of yarn attached to warp knitted eyelet fabric 10, combines firmly with the planar portions 12 with relative big area.With traditional comparing with the conventional polished section of conventional dictyosome as substrate, conventional polished section is the outside that the polishing yarn is adhered to the fine fibre line, have combining of polishing yarn and fine fibre line owing to being subjected to acting on the problem that the friction on the yarn damages of polishing, the polishing yarn of polished section of the present invention forms solid polishing thread layers, be not easy in the polishing process, to separate, improved the durability of polished section thus.
Another one of the present invention is useful to be selected is at least 50% of the polishing zone that yarn was adhered to occupies whole polished section in the polished section area, has therefore improved the polishing performance of polished section, has reduced the needed time of polishing simultaneously significantly.
The size that the useful point of another one of the present invention is a mesh 14 is relatively large, make the volume of mesh increase fully, therefore, and (it has less clearance to the dictyosome described in No. the 436999th, the Korean utility model registration No. between the fiber yarn of dictyosome, make that the size and the volume of mesh are less, when dust is stuck in the mesh, be difficult to remove dust, therefore reduced polishing performance and reuse significantly) compare, be easy to discharge dust to outside dust collecting system, when using polished section of the present invention not absorb work, be easy to shrug off dust as common polished section by mesh.
Correspondingly, the present invention has the multiple beneficial point, such as having improved the polishing performance, has reduced the distribution of dust in the polishing process, and can repeat to use polished section.
The same substantially among the present invention described in the attaching process of employed polishing yarn and the applicant's No. the 436999th, the Korean utility model registration No., wherein, it is bonding to increase to form epoxy blanket (epoxy coating layer) on the planar portions 12 of warp knitted eyelet fabric 10, then, with adhesive polishing yarn and substrate are combined.In addition, the top cover layer that comprises phenolic resins is formed on the polishing thread layers, and preferably, the antifouling cover layer that comprises calcium stearate (calcium stearate) is formed on the cover layer of top.
Fig. 5 illustrates two-sided polished section according to another embodiment of the present invention, and it comprises: warp knitted eyelet fabric 10, and it has by fiber yarn with the close planar portions 12 that forms of knitting of mesh shape, and at the mesh 14 of 12 formation of planar portions; Polishing thread layers 20, it has the polishing yarn that is adhered to the planar portions of the end face of warp knitted eyelet fabric 10 and bottom surface by adhesive.
Above embodiment in the formation of polishing thread layers identical with process described in top first embodiment, therefore, repeat no more herein.
For the two-sided polished section of making according to the abovementioned embodiments of the present invention, the end face of warp knitted eyelet fabric 10 and bottom surface all form polishing thread layers 20, therefore end face and bottom surface can be used, and therefore can finish maximum millworks in the cheapest labour-saving mode.Therefore, this two-sided polished section is suitable for manual working or is equipped with the folder formula polissoir of polished section.
Fig. 6 illustrates the microgram of amplification of polished section that having of true ratio is adhered to the polishing yarn of the outer planar portions 12 of the mesh 14 of warp knitted eyelet fabric 10, can see that the surface of polishing thread layers 20 is coarse.The rough surface of polishing thread layers 20 can be adjusted by the particle diameter of selecting the polishing yarn.
Claims (according to the modification of the 19th of treaty)
1. one kind is the polished section of substrate with the warp knitted eyelet fabric, and it comprises:
Warp knitted eyelet fabric (10), it has planar portions (12) and mesh (14); Planar portions (12) is to form with web form braided fiber yarn, and fiber yarn is by the close flat shape that forms width 1-3mm of knitting; Mesh (14) forms between described planar portions (12) dividually, and the diameter of mesh (14) is 1-3mm; Described planar portions (12) accounts for more than 50% of the gross area;
Polishing thread layers (20), it has the polishing yarn of planar portions that is adhered to the one side of described warp knitted eyelet fabric (10) by adhesive;
Top layer (30), it is attached to the another side of described warp knitted eyelet fabric (10).
Illustrate or state (according to the modification of the 19th of treaty)
[0001]Explanation according to the 19th modification of Patent Cooperation Treaty
Former claim 1-4 is replaced by new claim 1.In the claim of replacing, former claim " warp knitted eyelet fabric (10), it has by fiber yarn knits the planar portions (12) that forms so that web form is close, and the mesh (14) that forms between described planar portions (12); " be modified to " warp knitted eyelet fabric (10), it has planar portions (12) and mesh (14); Planar portions (12) is to form with web form braided fiber yarn, and fiber yarn is by the close flat shape that forms width 1-3mm of knitting; Mesh (14) forms between described planar portions (12) dividually, and the diameter of mesh (14) is 1-3mm; Described planar portions (12) accounts for more than 50% of the gross area; ".
Claims (4)
1. one kind is the polished section of substrate with the warp knitted eyelet fabric, and it comprises:
Warp knitted eyelet fabric (10), it has by fiber yarn knits the planar portions (12) that forms so that web form is close, and the mesh (14) that forms between described planar portions (12);
Polishing thread layers (20), it has the polishing yarn of planar portions that is adhered to the one side of described warp knitted eyelet fabric (10) by adhesive;
Top layer (30), it is attached to the another side of described warp knitted eyelet fabric (10).
2. polished section as claimed in claim 1 is characterized in that: described top layer (30) by fabric, can adhere to a kind of formation that maybe can not adhere in paper, the synthetic resin sheet.
3. polished section as claimed in claim 2 is characterized in that: described top layer (30) uses the Velcro to form.
4. one kind is the polished section of substrate with the warp knitted eyelet fabric, and it comprises:
Warp knitted eyelet fabric (10), it has by fiber yarn knits the planar portions (12) that forms so that web form is close, and the mesh (14) that forms between described planar portions (12);
And polishing thread layers (20), it has the polishing yarn that is adhered to the planar portions of the end face of described warp knitted eyelet fabric (10) and bottom surface by adhesive.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20-2008-0013538 | 2008-10-10 | ||
| KR2020080013538U KR200448556Y1 (en) | 2008-10-10 | 2008-10-10 | A grinding pad using tricot mesh fabric as basement |
| PCT/KR2009/005130 WO2010041822A2 (en) | 2008-10-10 | 2009-09-10 | Polishing pad having a tricot mesh fabric as a base |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102186629A true CN102186629A (en) | 2011-09-14 |
Family
ID=42101051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009801403878A Pending CN102186629A (en) | 2008-10-10 | 2009-09-10 | Polishing pad having a tricot mesh fabric as a base |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20110195646A1 (en) |
| KR (1) | KR200448556Y1 (en) |
| CN (1) | CN102186629A (en) |
| WO (1) | WO2010041822A2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9522454B2 (en) * | 2012-12-17 | 2016-12-20 | Seagate Technology Llc | Method of patterning a lapping plate, and patterned lapping plates |
| US20150335356A1 (en) * | 2014-05-22 | 2015-11-26 | Rodge Brooks | Skin Treatment Apparatus |
| US10145869B2 (en) | 2014-12-22 | 2018-12-04 | Battelle Memorial Institute | Remote leak and failure detection of electrical water heaters through temperature and power monitoring |
| JP7245493B2 (en) * | 2018-11-14 | 2023-03-24 | 国立大学法人九州工業大学 | Polishing equipment |
| CN114454101A (en) * | 2022-03-03 | 2022-05-10 | 徐占文 | Polishing wheel and manufacturing method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004291180A (en) * | 2003-03-27 | 2004-10-21 | Riken Corundum Co Ltd | Coated abrasive, and method and apparatus for manufacturing the same |
| KR100581614B1 (en) * | 2004-12-23 | 2006-05-23 | 주식회사 썬텍인더스트리 | Precision abrasive cleaning tape |
| KR100809874B1 (en) * | 2006-03-23 | 2008-03-06 | 엠.씨.케이 (주) | Polishing pad utilized netting thread |
| KR200436999Y1 (en) * | 2006-11-23 | 2007-10-23 | 김명묵 | A grinding pad using net at basement |
-
2008
- 2008-10-10 KR KR2020080013538U patent/KR200448556Y1/en not_active IP Right Cessation
-
2009
- 2009-09-10 US US13/122,956 patent/US20110195646A1/en not_active Abandoned
- 2009-09-10 CN CN2009801403878A patent/CN102186629A/en active Pending
- 2009-09-10 WO PCT/KR2009/005130 patent/WO2010041822A2/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| US20110195646A1 (en) | 2011-08-11 |
| WO2010041822A2 (en) | 2010-04-15 |
| WO2010041822A4 (en) | 2010-08-19 |
| WO2010041822A3 (en) | 2010-07-01 |
| KR200448556Y1 (en) | 2010-04-21 |
| KR20100004087U (en) | 2010-04-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110914 |