CN102129183B - Focusing and levelling measuring device - Google Patents
Focusing and levelling measuring device Download PDFInfo
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- CN102129183B CN102129183B CN201010022991.5A CN201010022991A CN102129183B CN 102129183 B CN102129183 B CN 102129183B CN 201010022991 A CN201010022991 A CN 201010022991A CN 102129183 B CN102129183 B CN 102129183B
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Abstract
The invention discloses a focusing and levelling measuring device. In the device, a first offset flat plate and a second offset flat plate are arranged on a measuring optical path on any one side; the first offset flat plate rotates a first angle around a first coordinate axis to compensate for the drift of a focal surface of a projection objective; and the second offset flat plate rotates a second angle and a third angle respectively around a second coordinate axis and a third coordinate axis to compensate for aberration caused by the rotation of the first offset flat plate, so that the drift of the focal surface of the projection objective can be compensated within large range while the imaging quality can be ensured.
Description
Technical field
The present invention relates to silicon semiconductor technology field, particularly a kind of focusing and leveling measurement apparatus.
Background technology
In projection lithography device, conventionally for example, between projection objective and substrate (, silicon chip), focusing and leveling measurement apparatus is set such as, to obtain the pattern information of substrate surface, specific region height and degree of tilt etc.Focusing and leveling measurement apparatus adopts the non-contact measurements such as optical measuring method conventionally, and permissible accuracy is higher.
But in the time that drift occurs the focal plane of projection objective, the measurement point center of focusing and leveling measurement apparatus, by not overlapping with the exposure visual field of projection objective, causes measuring error.Fig. 1 is the principle schematic that measuring error occurs to cause while drift projection objective focal plane.In Fig. 1, suppose that transverse coordinate axis is z axle, along slope coordinate axle is y axle, is x axle perpendicular to the coordinate axis of paper.Wherein, the optical path of focusing and leveling measurement apparatus is distributed in the both sides of projection objective (not shown) optical axis, arrives probe unit 14 from lighting unit 11.In the time that projection objective focal plane does not drift about, the incident light sending from lighting unit 11 incides the A point of the focal plane 10 that do not drift about and reflects after the offset flat-panel 12 perpendicular to optical path, then after the offset flat-panel 13 perpendicular to optical path, arrives the center O point of probe unit 14.In the time that the drift value of projection objective focal plane generation is h (on y axle), the incident light sending from lighting unit 11 after the offset flat-panel 12 perpendicular to optical path, incide drift focal plane 10 ' A ' and reflect, then arrive the O ' point of probe unit 14, departed from center O point, this has just caused the generation of measuring error.From Fig. 1, it can also be seen that, A ' some the side-play amount on y axle equals the drift value h that projection objective focal plane produces compared with A point, and side-play amount on z axle is d.Thus, after projection objective focal plane drifts about, carry out rectification building-out and seem particularly important.
In U.S. Pat 5633721, adopt the rotation of an offset flat-panel to compensate the drift that projection objective focal plane occurs, as shown in Figure 2.In Fig. 2, offset flat-panel 12 rotates an angle around x axle, make the incident light that sends from lighting unit 11 that refraction occur and incide drift focal plane 10 ' B point.Wherein, B point has identical abscissa value, side-play amount d when this has just compensated incident on z axle with the A point of the focal plane 10 that do not drift about.Offset flat-panel 13 rotates another angle around x axle, makes the measurement light after drift focal plane 10 ' reflection refraction occur and the center O point of arrival probe unit 14, and this has just compensated the side-play amount h on y axle, and then has compensated the drift value h of projection objective focal plane.Therefore, the rotation compensation by offset flat-panel 13 drift that occurs of projection objective focal plane.
But, in the time that offset flat-panel is not orthogonal to light path placement, can cause aberration, as shown in Figure 3.In Fig. 3, in the time that offset flat-panel 21 is placed perpendicular to light path, incident light sees through this offset flat-panel 21 and arrives imaging surface 22 center D point.And in the time that offset flat-panel 21 is not orthogonal to light path placement after the rotation of x axle, incident light arrives the D ' point of imaging surface 22 after these offset flat-panel 21 refractions.This just causes object point on axle to become off-axis point, and off-axis point imaging exists aberration.In Fig. 3, offset flat-panel 21 has just caused the aberration Δ Z on aberration Δ Y and the z axle on y axle around the rotation of x axle.Thus, the anglec of rotation of offset flat-panel is larger, and compensation range is also larger, but the aberration causing is also larger, and image quality is just poorer, and resolution is lower.Therefore, in order to guarantee image quality, the rotation of offset flat-panel can only be limited in certain low-angle, and compensation range is smaller, otherwise resolution does not reach again requirement.
Summary of the invention
The object of the present invention is to provide a kind of focusing and leveling measurement apparatus, can in a big way, compensate the drift of projection objective focal plane, can guarantee again image quality simultaneously.
The invention provides a kind of focusing and leveling measurement apparatus, its optical path is distributed in the both sides of projection objective optical axis, wherein, on the described optical path of either side, be provided with the first offset flat-panel and the second offset flat-panel, described the first offset flat-panel rotates the first angle around the first coordinate axis, described the second offset flat-panel rotates the second angle and the 3rd angle around the second coordinate axis and three axes respectively, rotates the aberration that described the first angle is brought to compensate described the first offset flat-panel around described the first coordinate axis.
Further, described measurement mechanism comprises offset flat-panel driver element, described offset flat-panel driver element has the first offset flat-panel drive motor and the second offset flat-panel drive motor, described the first offset flat-panel drive motor drives described the first offset flat-panel, and described the second offset flat-panel drive motor drives described the second offset flat-panel.
Further, described measurement mechanism also comprises: lighting unit, is used to described optical path that illumination light is provided; Projecting cell, makes described illumination light form and measure spot array at substrate surface; Receiving element, for the described measurement spot array receiving and imaging is reflected through described substrate surface; And photodetection unit, for characterize the electric signal of the pattern information of described substrate surface according to the imaging output of described measurement spot array.
Further, described the first offset flat-panel and described the second offset flat-panel are located in described projecting cell.
Further, described the first offset flat-panel and described the second offset flat-panel are located in described receiving element.
Further, described the first offset flat-panel and described the second offset flat-panel are located in described photodetection unit.
Further, described measurement mechanism also comprises signal processing unit, the electric signal of photodetection unit output export measurement result described in described signal processing unit processes.
Further, described measurement mechanism also comprises control module, and described control module provides steering order to described offset flat-panel driver element according to the measurement result of described signal processing unit output.
Further, the relation of described the second angle and described the 3rd angle and described the first angle meets:
θ2≥θ1，90≥θ3≥θ1*tanθ，
Wherein, θ 1 is described the first angle, and θ 2 is described the second angle, and θ 3 is described the 3rd angle.
Compared with prior art, focusing and leveling measurement apparatus provided by the invention, by the first offset flat-panel and the second offset flat-panel are set on the optical path of either side, the first offset flat-panel rotates the drift of the first angle with compensation projection objective focal plane around the first coordinate axis, the second offset flat-panel rotates the second angle and the 3rd angle to compensate the caused aberration of rotation of the first offset flat-panel around the second coordinate axis and three axes respectively, thereby can in a big way, compensate the drift of projection objective focal plane, can guarantee again image quality simultaneously.
Accompanying drawing explanation
Fig. 1 is the principle schematic that measuring error occurs to cause while drift projection objective focal plane;
Fig. 2 is the principle schematic that compensates the drift of projection objective focal plane generation in prior art;
Fig. 3 is that offset flat-panel is not orthogonal to the principle schematic that causes aberration when light path is placed;
Fig. 4 is according to the structural representation of focusing and leveling measurement apparatus of the present invention embodiment.
Embodiment
For object of the present invention, feature are become apparent, below in conjunction with accompanying drawing, the specific embodiment of the present invention is further described.
In background technology, mention, existing focusing and leveling measurement apparatus adopts the rotation of an offset flat-panel to compensate the drift that projection objective focal plane occurs, but cause certain aberration after offset flat-panel rotation, reduce image quality, this has just limited the rotating range of offset flat-panel, and then has limited compensation range.
Core concept of the present invention is, the first offset flat-panel and the second offset flat-panel are set on the optical path of either side, the first offset flat-panel rotates the drift of the first angle with compensation projection objective focal plane around the first coordinate axis, and the second offset flat-panel rotates the second angle and the 3rd angle to compensate the caused aberration of rotation of the first offset flat-panel around the second coordinate axis and three axes respectively.
Fig. 4 is according to the structural representation of focusing and leveling measurement apparatus of the present invention embodiment.In the present embodiment, as an example of substrate, the object take silicon chip as focusing and leveling.First, suppose that transverse coordinate axis is z axle, along slope coordinate axle is y axle, is x axle perpendicular to the coordinate axis of paper, all adopts this coordinate axis definition in the description below.In Fig. 4, this focusing and leveling measurement apparatus is arranged between projection objective 30 and silicon chip 40, and its optical path is distributed in the both sides of projection objective optical axis 31, wherein, is provided with the first offset flat-panel 28 and the second offset flat-panel 29 on the optical path of either side.The first offset flat-panel 28 is around the first coordinate axis (x axle) rotation, and the second offset flat-panel 29 rotates respectively around the second coordinate axis (y axle) and three axes (z axle).Concrete, this focusing and leveling measurement apparatus comprises offset flat-panel driver element 24.Offset flat-panel driver element 24 has the first offset flat-panel drive motor and the second offset flat-panel drive motor (not shown), the first offset flat-panel drive motor is used for driving the first offset flat-panel 28 around the rotation of x axle, and the second offset flat-panel drive motor is used for driving the second offset flat-panel 29 to rotate respectively around y axle and z axle.
As can be seen from Figure 4, this focusing and leveling measurement apparatus also comprises lighting unit 21, projecting cell 22, receiving element 23 and photodetection unit 26.Wherein, lighting unit 21 is used to described optical path that illumination light is provided, and this illumination light intensity is controlled.Projecting cell 22 is for forming and measure spot array on silicon chip 40 surfaces.Receiving element 23 is for receiving also imaging through the measurement spot array of silicon chip 40 surface reflections.Photodetection unit 26 is changed by photosignal, completes collection and the conversion of silicon chip 40 surface topography information, thereby characterizes the electric signal of the pattern information on silicon chip 40 surfaces according to the imaging output of measuring spot array.Because the first offset flat-panel 28 and the second offset flat-panel 29 can arrange on the optical path of either side, therefore in the present embodiment the first offset flat-panel 28 and the second offset flat-panel 29 are located in receiving element 23.In addition, this focusing and leveling measurement apparatus also comprises signal processing unit 27 and control module 25.Wherein, signal processing unit 27 is processed the electric signal of exporting photodetection unit 26 and is exported measurement result, particularly, need to complete the conditioning of the electric signal of exporting photodetection unit 26, switching, the interface conversion of peripheral hardware control signal etc. of multichannel measurement.The measurement result that control module 25 is exported according to signal processing unit 27 provides steering order to offset flat-panel driver element 24.The first offset flat-panel drive motor in offset flat-panel driver element 24 and the second offset flat-panel drive motor are controlled respectively the rotation of the first offset flat-panel 28 and the second offset flat-panel 29 according to steering order.
Specifically describe the course of work of this focusing and leveling measurement apparatus below.It should be noted that in original state, the first offset flat-panel 28 and the second offset flat-panel 29 are perpendicular to optical path setting.First, lighting unit 21 provides illumination light for whole measurement mechanism, and this illumination light forms and measures spot arrays by the projection slit array in projecting cell 22 and on silicon chip 40 surfaces.These are measured spot array and after silicon chip 40 surface reflections, enter receiving element 23 imaging.Then, measurement spot array after imaging incides photodetection unit 26, scanning reflection mirror (SR) in photodetection unit 26 modulates to improve the signal to noise ratio (S/N ratio) of measuring-signal to light signal, and photodetector array in photodetection unit 26 change by photosignal after output characterize the electric signal of the pattern information on silicon chip 40 surfaces.Signal processing unit 27 receives the electric signal of the photodetector array output of photodetection unit 26, and then this electric signal is carried out to a series of processing, output measurement result.In measurement result, comprise the relative drift value h1 between projection objective focal plane and focusing and leveling measurement apparatus, this can obtain according to following formula:
ΔL＝2*h1*tanθ，
In formula, Δ L is the location variation of measuring hot spot, and θ is the angle (with reference to figure 4) between illumination light and projection objective optical axis 31.Control module 25 issues steering order according to this measurement result to offset flat-panel driver element 24.In steering order, comprise the first offset flat-panel 28 around the first angle θ 1 of x axle rotation and the second offset flat-panel 29 around the second angle θ 2 of y axle rotation with around the 3rd angle θ 3 of z axle rotation.Wherein, the computing formula of the first angle θ 1 is as follows:
2*h1*sinθ＝B*(n-1)*tanθ1/n，
In formula, B is the thickness of the first offset flat-panel 28, and n is the refractive index of the first offset flat-panel 28.The relation of the second angle θ 2 and the 3rd angle θ 3 and the first angle θ 1 is as follows simultaneously:
θ2≥θ1，90≥θ3≥θ1*tanθ。
Known through optical analogy, in the time that they meet above the relation, can compensate well the first offset flat-panel 28 and rotate the caused aberration of the first angle θ 1 around x axle, and then assurance image quality.
Receive after steering order, the first offset flat-panel drive motor in offset flat-panel driver element 24 will be controlled the first offset flat-panel 28 and rotate the first angle θ 1 around x axle, to compensate the relative drift between projection objective focal plane and focusing and leveling measurement apparatus.Simultaneously, the second offset flat-panel drive motor in offset flat-panel drive motor 24 will be controlled the second offset flat-panel 29 and rotate the second angle θ 2 and the 3rd angle θ 3 around y axle and z axle respectively, to compensate because the first offset flat-panel 28 rotates the caused aberration of the first angle θ 1 around x axle.For example, the first offset flat-panel 28 is around x axle rotation 5 degree, and the second offset flat-panel 29 all rotates 12 degree around y axle and z axle, and experiment shows, in having compensated the drift of projection objective focal plane, well balance aberration, guaranteed image quality.
Visible, this focusing and leveling measurement apparatus arranges the first offset flat-panel and the second offset flat-panel by the receiving element on the optical path being arranged in a side, the first offset flat-panel rotates the drift of the first angle with compensation projection objective focal plane around the first coordinate axis, the second offset flat-panel rotates the second angle and the 3rd angle to compensate the caused aberration of rotation of the first offset flat-panel around the second coordinate axis and three axes respectively, thereby can in a big way, compensate the drift of projection objective focal plane, can guarantee again image quality simultaneously.
Certainly, in other embodiments of the invention, also the first offset flat-panel 28 and the second offset flat-panel 29 can be located in projecting cell 22 or photodetection unit 26, this all meets two offset flat-panels and is located at the condition on the optical path of either side, does not affect technique effect of the present invention.Certainly, particular location can be determined according to the concrete condition of focusing and leveling measurement apparatus.
In sum, focusing and leveling measurement apparatus provided by the invention, by the first offset flat-panel and the second offset flat-panel are set on the optical path of either side, the first offset flat-panel rotates the drift of the first angle with compensation projection objective focal plane around the first coordinate axis, the second offset flat-panel rotates the second angle and the 3rd angle to compensate the caused aberration of rotation of the first offset flat-panel around the second coordinate axis and three axes respectively, thereby can in a big way, compensate the drift of projection objective focal plane, can guarantee again image quality simultaneously.
Obviously, those skilled in the art can carry out various changes and modification and not depart from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention is also intended to comprise these changes and modification interior.
Claims (8)
1. a focusing and leveling measurement apparatus, its optical path is distributed in the both sides of projection objective optical axis, on the described optical path of either side, be provided with the first offset flat-panel and the second offset flat-panel, described the first offset flat-panel can rotate the first angle around the first coordinate axis, described the second offset flat-panel can rotate the second angle and the 3rd angle around the second coordinate axis and three axes respectively, rotate around described the first coordinate axis the aberration that described the first angle is brought to compensate described the first offset flat-panel, it is characterized in that, described aberration for compensation is specially:
Under original state, described the first offset flat-panel and the second offset flat-panel are placed perpendicular to described optical path;
The surface topography of measuring silicon chip, obtains the relative drift value h1 between described projection objective focal plane and focusing and leveling measurement apparatus according to measurement result;
According to described relative drift value, described the first offset flat-panel rotates the first angle around the first coordinate axis, described the second offset flat-panel rotates the second angle and the 3rd angle around the second coordinate axis and three axes respectively, rotates the aberration that described the first angle is brought to compensate described the first offset flat-panel around described the first coordinate axis;
Wherein, the computing formula of described the first angle θ 1 is as follows:
2*h1*sin θ=B* (n-1) * tan θ 1/n, B is the thickness of described the first offset flat-panel, and n is the refractive index of described the first offset flat-panel, and θ is the angle between described optical path and described projection objective optical axis;
Described the second angle θ 2 and the 3rd angle θ 3 meet with the relation of described the first angle θ 1:
θ2≥θ1,90°≥θ3≥θ1*tanθ。
2. focusing and leveling measurement apparatus as claimed in claim 1, it is characterized in that, described measurement mechanism comprises offset flat-panel driver element, described offset flat-panel driver element has the first offset flat-panel drive motor and the second offset flat-panel drive motor, described the first offset flat-panel drive motor drives described the first offset flat-panel, and described the second offset flat-panel drive motor drives described the second offset flat-panel.
3. focusing and leveling measurement apparatus as claimed in claim 2, is characterized in that, described measurement mechanism also comprises:
Lighting unit, is used to described optical path that illumination light is provided;
Projecting cell, makes described illumination light form and measure spot array at substrate surface;
Receiving element, for the described measurement spot array receiving and imaging is reflected through described substrate surface; And
Photodetection unit, for characterizing the electric signal of the pattern information of described substrate surface according to the imaging output of described measurement spot array.
4. focusing and leveling measurement apparatus as claimed in claim 3, is characterized in that, described the first offset flat-panel and described the second offset flat-panel are located in described projecting cell.
5. focusing and leveling measurement apparatus as claimed in claim 3, is characterized in that, described the first offset flat-panel and described the second offset flat-panel are located in described receiving element.
6. focusing and leveling measurement apparatus as claimed in claim 3, is characterized in that, described the first offset flat-panel and described the second offset flat-panel are located in described photodetection unit.
7. the focusing and leveling measurement apparatus as described in any one in claim 4～6, is characterized in that, described measurement mechanism also comprises signal processing unit, the electric signal of photodetection unit output export measurement result described in described signal processing unit processes.
8. focusing and leveling measurement apparatus as claimed in claim 7, is characterized in that, described measurement mechanism also comprises control module, and described control module provides steering order to described offset flat-panel driver element according to the measurement result of described signal processing unit output.
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| CN201010022991.5A CN102129183B (en) | 2010-01-19 | 2010-01-19 | Focusing and levelling measuring device |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102778822B (en) * | 2011-10-20 | 2014-08-13 | 中国科学院光电研究院 | Focusing and leveling device |
| CN103197519B (en) * | 2012-01-09 | 2015-02-11 | 上海微电子装备有限公司 | Offset plate adjusting device |
| CN105700296B (en) * | 2014-11-26 | 2019-04-30 | 上海微电子装备（集团）股份有限公司 | Silicon chip surface height and gradient detection device and method |
| CN110927965B (en) * | 2019-12-20 | 2021-08-17 | 易思维（杭州）科技有限公司 | Design method of compensation lens for compensating error caused by light deflection |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |