CN102097150B - Electron beam diffusion device for radiation processing - Google Patents
Electron beam diffusion device for radiation processing Download PDFInfo
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- CN102097150B CN102097150B CN2010105327581A CN201010532758A CN102097150B CN 102097150 B CN102097150 B CN 102097150B CN 2010105327581 A CN2010105327581 A CN 2010105327581A CN 201010532758 A CN201010532758 A CN 201010532758A CN 102097150 B CN102097150 B CN 102097150B
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Abstract
The invention discloses an electron beam diffusion device for radiation processing, which is combined by two groups of permanent magnet, wherein the first group of permanent magnet causes an electron beam group to horizontally defocus and vertically focus to evenly diffuse; and the second group of permanent magnet trims the edge of the diffused electron beam group. The electron beam is diffused with a permanent magnet combination method in the device, and the electron beam radiation evenness can be improved. The whole device does not consume power and has the advantages of simple structure and low construction cost. The diffused electron beam has big cross section and is evenly distributed. The electron beam diffusion device is not only suitable for radiating wire rods, strips and slabs but also suitable for large-size objects with an orthotropic structure.
Description
Technical field
The present invention relates to the RADIATION PROCESSING field, is a kind of electron beam disperser, and the electron beam of irradiated electrons accelerator is evenly spread, and radiation is by irradiation products.
Background technology
Utilize nuclear radiation and matter interaction; Illuminated material produces ionization or excites, and discharges orbital electron, forms free radical; Its physical property or chemical composition are changed; Become desired novel substance, or make biosome (microorganism etc.) receive expendable loss or destruction, reach the purpose of irradiation sterilization.Based on method of radiating product is handled, improved properties of product, be called RADIATION PROCESSING.RADIATION PROCESSING is different from traditional machining or hot-working, and high energy electron or gamma-rays have very strong penetration capacity, can be deep into material inside, on the aspect of molecule, carries out " processing ", is actually nanofabrication technique.The processor is the intermediate of the high activity of high-energy ray and its initiation, is not the thermal motion of molecule, does not produce thermal effect basically.Therefore, the RADIATION PROCESSING energy consumption is low, noresidue, few problem of environmental pollution, and RADIATION PROCESSING obtains increasing application in industry, agricultural, medical science, biology, environmental protection.
The radiation source that is used for RADIATION PROCESSING at present has two types, and one type is radioactive isotope such as cobalt source, and another kind of is charged particle accelerator such as electron accelerator.The advantage of electron accelerator is an Energy Controllable; Electron beam basic role is in illuminated product, and utilization ratio is high; There is not the handling problem in the useless source of radioactivity; Consumes electric power not during shutdown; In the whole process of production except that producing small amount of ozone, contaminated environment hardly.Therefore electron accelerator has the trend that more users adopt in RADIATION PROCESSING.
The emittance of irradiated electrons accelerator gun is about 20-25 π mmmrad, wherein the about 4-5mm of beam spot diameter.Quicken back electron beam spot diameter greatly about about 1cm through accelerator; Electron irradiation accelerator beam power is substantially between 10-50 kilowatt; Also have and surpass 100 kilowatts rebatron; Beam energy concentrates on this little areal extent, is not suitable for directly being used for the RADIATION PROCESSING product, and concentrated energy is prone to cause damaged products or exposure dose inhomogeneous.Therefore, after electron beam leaves accelerator, before being radiated object, an electron beam de-registration apparatus must be installed.All adopt the sweeping magnet method at present; Magnet is supplied power by a sawtooth wave power supply; The line scanning that is similar in the televisor is laterally being swept out electron beam, and the bundle lower device drives irradiated object and vertically at the uniform velocity passing through electron beam, quite the frame scan effect in the televisor; Make as far as possible by the irradiation object and receive uniform dosage, solved above-mentioned contradiction basically.The accelerator sweeping magnet structural drawing that Fig. 1 (a) is the 1MeV energy, 100mA stream is strong, Fig. 1 (b) is the scanning theory synoptic diagram.
But there is following shortcoming in electron beam scanning pattern: it not only wants consumed power, also is difficult to make large scale irregular part product to receive even irradiation.In addition, transmission speed and sweep frequency mismate might cause the inhomogeneous of illuminated object acceptable dose.
Summary of the invention
The object of the present invention is to provide a kind of electron beam disperser that is used for RADIATION PROCESSING; Do not need electrification to drive; Electron beam is evenly scattered shine on the radiation exposed product, not only be fit to wire rod, band and sheet material, also be fit to other and have the large sized object of different in nature structure.In " electron beam permanent magnetism disperser ", first group of permanent magnet effect is that electron beam is evenly scattered, and second group of permanent magnet is to carry out shaping to the periphery of the electron beam that scatters, and improves the uniformity coefficient of the electron beam irradiation that scatters.
A kind of electrons spread device that is used for irradiation processing; Comprise two groups of permanent magnets; First group of permanent magnet includes four magnetic poles; These four magnetic poles are fixed on the upper and lower yoke in pairs, and it is opposite to reach adjacent pole polarity relatively, and the magnetic field that these four magnetic poles constitute makes electron beam group laterally defocus longitudinal focusing and realizes evenly scattering; Second group of permanent magnet includes eight magnetic poles, and eight magnetic poles are fixed on the yoke of upper and lower, left and right in pairs, and it is opposite to reach adjacent pole polarity relatively, and repair the electron beam group edge that scatters in the magnetic field that these eight magnetic poles constitute.
It is Ru-Fe-Mn that said magnetic pole adopts material.
It is DT4 that said yoke adopts material.
Technique effect of the present invention is embodied in: only adopts two groups of permanent magnets, do not have power consumption, and simple in structure, cost is low.First group of permanent magnet can evenly scatter electron beam, and second group of periphery to the electron beam that scatters carries out the shaping compensation, improves the uniformity coefficient of the electron beam irradiation that scatters.The electron beam that with the energy is 0.5MeV, 1MeV is an example; The disperser action effect is like Figure 10,11,12,13, shown in 14; The transverse regularity of the vertical integration of electron beam≤6.7%, electron beam are dispersed in the long 1m that is, wide is in the rectangle of 0.3m; Than sweeping magnet, promoted the homogeneity of diffusion; Because the longitudinal area of electron beam disperser is big, improved the applicability of radiation product, not only be fit to wire rod, band and sheet material irradiation, also be fit to other and have the large sized object of different in nature structure.
Description of drawings
Fig. 1 is the sweeping magnet synoptic diagram, and Fig. 1 (a) is the sweeping magnet structural drawing, and Fig. 1 (b) is the sweeping magnet principle schematic.
Fig. 2 is a combination assumption diagram of the present invention, and Fig. 2 (a) is a front elevation, and Fig. 2 (b) is a side view.
Fig. 3 is packet configuration figure of the present invention, and Fig. 3 (a) is first group of permanent magnet front elevation, and Fig. 3 (b) is first group of permanent magnet side view, and Fig. 3 (c) is second group of permanent magnet front elevation, and Fig. 3 (d) is second group of permanent magnet side view.
Fig. 4 is TRANSPORT particle beams group phasor, and Fig. 4 (a) is directions X bundle group phasor, and Fig. 4 (b) is a Y direction bundle group phasor.
Fig. 5 is 0.5MeV line movement locus and exit bundle group phasor, and Fig. 5 (a) is a 0.5MeV line movement locus, and Fig. 5 (b) is a 0.5MeV line accelerating tube outlet directions X bundle group phasor, and Fig. 5 (c) is a 0.5MeV line accelerating tube outlet Y direction bundle group phasor.
Fig. 6 is 1MeV line movement locus and exit bundle group phasor, and Fig. 6 (a) is a 1MeV line movement locus, and Fig. 6 (b) is a 1MeV line accelerating tube outlet directions X bundle group phasor, and Fig. 6 (c) is a 1MeV line accelerating tube outlet Y direction bundle group phasor.
Fig. 7 rolls into a ball in the accelerating tube exit Gaussian distribution figure for electron beam.
Fig. 8 rolls into a ball in the accelerating tube exit gaussian distribution curve figure for electron beam
After Fig. 9 spreads for electronics passes through permanent magnet, the distribution on the radiation object (only first group of magnet) synoptic diagram.
After Figure 10 spreads for electronics passes through permanent magnet, the distribution on the radiation object (through second group of magnet finishing) synoptic diagram.
Diffusion profile when Figure 11 is 0.5MeV for electron energy
Diffusion profile curve map when Figure 12 is 0.5MeV for electron energy.
Diffusion profile when Figure 13 is 1MeV for electron energy.
Diffusion profile curve map when Figure 14 is 1MeV for electron energy.
Embodiment
As shown in Figure 2, the present invention includes two groups of permanent magnets.Concrete structure is participated in Fig. 3, and four magnetic poles of first group of permanent magnet are symmetrically distributed and are fixed on the lower yoke, and polarity adjacent and relative magnetic pole is opposite.The effect of this group magnet is that electron beam is stretched in one direction, compresses on another direction, makes electron beam be diffused as approximate ellipsoidal.
Eight magnetic poles of second group of permanent magnet are distributed on four yokes in pairs, and polarity adjacent and relative magnetic pole is opposite.Repair oval-shaped edge in the magnetic field that utilizes this group magnet to form, and forms approximate rectangular.
Next the accelerator with electron energy 0.5-1MeV is the working condition of example explanation electron beam permanent magnetism disperser of the present invention.The about 20-25 π of the emittance mmmrad of the electron gun of electron accelerator use at present gets intermediate value 22.5 π mmmrad, adopts beam transfer common software TRANSPORT to calculate beam trace.X, y represent respectively charged X and Y to the position, x ' and y ' represent respectively electronics X and Y to direction of motion.Fig. 4 is a bundle group phasor among the TRANSPORT, the emittance x=2.25mm of bundle group among the figure, and x '=10mrad, y=2.25mm, y '=10mrad, electron gun extraction voltage are 25KV, accelerating tube length: 1.2m.Fig. 5 (a) is a 0.5MeV line movement locus, and electron beam group reaches 0.5MeV through energy behind the accelerating tube, and the bundle spot is circular basically, the emittance x=11mm of bundle group, and x '=8.8mrad, y=11mm, y '=8.8mrad, bundle group radius is 1.1cm.Fig. 6 (a) is a 1MeV line movement locus, and electron beam group reaches 1MeV through energy behind the accelerating tube, and the bundle spot is circular basically, the emittance x=10mm of bundle group, and x '=9.1mrad, y=10mm, y '=9.1mrad, bundle group radius is 1cm.
Getting 0.5MeV electron beam spot radius is 1.1cm, and 1MeV electron beam spot radius is to calculate in the 1cm substitution particle tracing program, and electronics is Gaussian distribution at this moment shown in Fig. 7 and 8.
Through after first group of permanent magnet diffusion, the bundle spot is diffused as an ellipse to Fig. 9 for only, and oval inside distributes even basically.From the irradiation angle, expectation bundle shape of spot is near rectangle.Therefore adopt second group of permanent magnet, the halved tie spot edge is repaired, and is shown in figure 10; After electron beam passes through second group of permanent magnet; Become rectangle substantially, inner distribute more even, in the time of can getting accelerator energy and be 0.5MeV through calculating; (50cm-50cm) be total in the scope of 1m the transverse regularity of the vertical integration of electron beam≤6.7%; When accelerator energy is 1MeV, (50cm-50cm) be total in the scope of 1m, the transverse regularity of the vertical integration of electron beam≤3%, suitable irradiation is used.
Figure 11,12 have provided electron energy when being 0.5MeV diffusion profile and diffusion profile curve map, Figure 13,14 have provided electron energy when being 1MeV diffusion profile and diffusion profile curve map.
In order to adapt to the needs that beam energy is regulated, can adjust the gap of first group of permanent magnet, change the electron beam of magnetic field size with the different-energy that scatters, when being energy 0.5MeV and 1MeV among the figure, the electron diffusion distribution plan.
Electron beam permanent magnetism disperser has also solved the thing that an accelerator manufacturer feels trouble except the above-mentioned advantage of speaking of, the titanium window of scan box burns by the electron beam of concentration of energy easily.And concentration of energy can not take place in the electron beam that evenly spreads, and the electron beam of diffusion is through the titanium window, and the possibility that the titanium window is burnt significantly reduces.
Enumerate a specific embodiment below: (size 22 * 16cm), like Fig. 3 (a), shown in Fig. 3 (b), magnetic pole 1-4, material are Ru-Fe-Mn to first group of permanent magnet.The yoke 5-8 material of yoke is DT4.Wherein magnetic pole 1,3 DOM is identical; Magnetic pole 2,4 DOM are identical. Magnetic pole 1,4 is the S utmost point; Magnetic pole 2,3 is the N utmost point.Yoke 5,7 can move on yoke 6,8 to regulate the magnetic field size. Magnetic pole 1,2 spacing 1cm; 1,3 spacing 4-8cm are adjustable for magnetic pole, and whole magnet thickness is 1.5cm; The yoke spacing is adjustable to change the electron beam diffusion that magnetic field adapts to different-energy.
Second group of permanent magnet (size 18cm * 16cm), shown in Fig. 3 (c) and 3 (d), comprise magnetic pole 10-17, material is a Ru-Fe-Mn; Yoke 18, material are DT4. Magnetic pole 10,12,14,16 is the S utmost point; Magnetic pole 11,13,15,17 is the N utmost point. Magnetic pole 10 and 11,12 and 13 thin space is 3cm, and magnetic pole thickness is 3cm, is the 1cm place at magnetic pole thickness, and distance between two poles becomes 4cm; Magnetic pole 14 and 15,16 and 17 spacings are 4cm, and magnetic pole thickness is 1cm; The effect of given shape makes and forms given shape magnetic field halved tie group in the porch of second group of magnet and spread like this, when thickness 1cm, forms given shape magnetic field halved tie group shape and carries out shaping, thereby make the uniformity coefficient of electron beam diffusion be optimized then.The effect of this group permanent magnet is that the electron beam spot edge that spreads apart is repaired, and electricity bundle group is become be rectangle, and inside distributes more even, is fit to irradiation and uses.
In the present embodiment; See over from the front, the position of magnetic pole of first group of permanent magnet drops between second group of corresponding permanent magnet position of magnetic pole, and the reason of setting like this is evenly to spread for the electronics that satisfies the 1MeV energy; When energy changes; The position of magnetic pole can relatively move, and for example is positioned at outside second group of magnet position of magnetic pole or coincidence, no longer it is enumerated one by one in the present embodiment.
Claims (3)
1. electrons spread device that is used for irradiation processing; It is characterized in that; Comprise two groups of permanent magnets, first group of permanent magnet includes four magnetic poles, and these four magnetic poles are fixed on the upper and lower yoke in pairs; It is opposite to reach adjacent pole polarity relatively, and the magnetic field that these four magnetic poles constitute makes electron beam group laterally defocus longitudinal focusing and realizes evenly scattering; Second group of permanent magnet includes eight magnetic poles, and eight magnetic poles are fixed on the yoke of upper and lower, left and right in pairs, and it is opposite to reach adjacent pole polarity relatively, and repair the electron beam group edge that scatters in the magnetic field that these eight magnetic poles constitute.
2. electrons spread device according to claim 1 is characterized in that, it is neodymium iron boron that said magnetic pole adopts material.
3. electrons spread device according to claim 1 is characterized in that, it is DT4 that said yoke adopts material.
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| CN104217779A (en) * | 2014-09-15 | 2014-12-17 | 华中科技大学 | Device and method for electron beam diffusion section finishing |
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| US4276477A (en) * | 1979-09-17 | 1981-06-30 | Varian Associates, Inc. | Focusing apparatus for uniform application of charged particle beam |
| JP3264993B2 (en) * | 1992-08-17 | 2002-03-11 | 株式会社アルバック | Ion implanter |
| JPH11281799A (en) * | 1998-03-27 | 1999-10-15 | Ebara Corp | Electron beam irradiator |
| EP1560475A4 (en) * | 2002-10-25 | 2008-07-09 | Japan Science & Tech Agency | Electron accelerator and radiotherapy apparatus using same |
| JP5374731B2 (en) * | 2008-11-26 | 2013-12-25 | 独立行政法人日本原子力研究開発機構 | Laser-driven particle beam irradiation apparatus and method of operating laser-driven particle beam irradiation apparatus |
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| CN104217779A (en) * | 2014-09-15 | 2014-12-17 | 华中科技大学 | Device and method for electron beam diffusion section finishing |
| JP2016528683A (en) * | 2014-09-15 | 2016-09-15 | ▲華▼中科技大学Ｈｕａｚｈｏｎｇ Ｕｎｉｖｅｒｓｉｔｙ Ｏｆ Ｓｃｉｅｎｃｅ Ａｎｄ Ｔｅｃｈｎｏｌｏｇｙ | Electron beam cross-section dresser and dressing method |
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