CN102031488A - Crucible for increasing film damage threshold - Google Patents
Crucible for increasing film damage threshold Download PDFInfo
- Publication number
- CN102031488A CN102031488A CN2010106011938A CN201010601193A CN102031488A CN 102031488 A CN102031488 A CN 102031488A CN 2010106011938 A CN2010106011938 A CN 2010106011938A CN 201010601193 A CN201010601193 A CN 201010601193A CN 102031488 A CN102031488 A CN 102031488A
- Authority
- CN
- China
- Prior art keywords
- crucible
- damage threshold
- film
- coating materials
- rete
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a crucible for increasing a film damage threshold. In the invention, a substance which is the same as a plated film material is selected to manufacture the crucible through a special process. The crucible only loads the material which is unified with that of the crucible to serve as the film material, and thus, the purity of a plated film can be ensured. Because the material component of the crucible is consistent with the film material, and even if the component of the crucible is evaporated with the film material, the purity of the generated film cannot be damaged, and thereby, the anti-damage capacity of the plated film can be effectively improved.
Description
[technical field]
Patent of the present invention relates to the optical coating field, especially a kind of crucible that improves the rete damage threshold.
[technical background]
Coating materials in the electron beam heating of metal crucible that the employing electron beam gun produces in the electron beam gun coating process makes it evaporation and is deposited on to form film on the substrate at present, the shortcoming of prior art is if Heating temperature is very high or coating materials is punched and made the portions of electronics bundle to the crucible direct heating, cause the crucible composition of trace to participate in evaporating film forming with coating materials, thereby influence the purity of rete, and then influence the rete damage threshold, the crucible of selecting for use the material the same to manufacture when of the present invention by special process with being coated with coating materials.It is to unify the material of material as coating materials that this crucible only loads with it, can guarantee to be coated with the purity of rete like this.Because the material composition of crucible is consistent with coating materials, the composition that crucible in time occurs evaporates with coating materials, and the purity of the rete of generation can be not destroyed yet, thereby can effectively improve the anti-damage ability of rete that is coated with.
[summary of the invention]
The employing of the present invention materials processing the same with the plated film coating materials becomes crucible, and material can be pa
2O
5, HFO
2Or SiO
2, the crucible of making only loads the coating materials the same with crucible material and carries out plated film, guarantees to be coated with the purity of rete.
[embodiment]
Embodiment one: adopt the SiO2 material to make crucible, the SiO2 coating materials is put into crucible, crucible is put into electron beam gun coating equipment evaporation again, the rete damage threshold that is coated with that obtains adopts common crucible significantly to improve.
Claims (2)
1. crucible that improves the rete damage threshold, the crucible that adopts the material the same to manufacture by special process with being coated with coating materials.It is characterized in that: this crucible only loads the material the same with crucible material as coating materials.
2. a kind of crucible that improves the rete damage threshold according to claim 1 is characterized in that: the material of described crucible can be pa
2O
5, HFO
2Or SiO
2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010106011938A CN102031488A (en) | 2010-12-23 | 2010-12-23 | Crucible for increasing film damage threshold |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010106011938A CN102031488A (en) | 2010-12-23 | 2010-12-23 | Crucible for increasing film damage threshold |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102031488A true CN102031488A (en) | 2011-04-27 |
Family
ID=43884924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010106011938A Withdrawn CN102031488A (en) | 2010-12-23 | 2010-12-23 | Crucible for increasing film damage threshold |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102031488A (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87206316U (en) * | 1987-04-16 | 1987-12-30 | 清华大学 | Crucible with si3n4 coating |
| CN1341080A (en) * | 1999-12-22 | 2002-03-20 | 赫罗伊斯石英玻璃股份有限两合公司 | Quartz glass crucible and method for production thereof |
| CN1389599A (en) * | 2002-04-29 | 2003-01-08 | 中国科学院上海硅酸盐研究所 | Gallium-lanthanum silicate crystal growth technology of crucible descending process |
| CN1417387A (en) * | 2001-10-16 | 2003-05-14 | 日本超精石英株式会社 | Surface modifying method for quartz glass crucible and surface modified crucible |
| CN1572733A (en) * | 2003-05-28 | 2005-02-02 | 瓦克化学有限公司 | Method for the production of an internally vitrified sio2 crucible |
| CN1662680A (en) * | 2002-04-22 | 2005-08-31 | 赫罗伊斯石英玻璃股份有限两合公司 | Quartz glass crucible and method for the production thereof |
| CN1808035A (en) * | 2005-12-28 | 2006-07-26 | 中国科学院长春应用化学研究所 | Composite crucible for preparing rare earth-magnesium intermediate alloy by molten salt electrolysis and preparation method thereof |
| CN1946881A (en) * | 2004-04-29 | 2007-04-11 | 维苏维尤斯·克鲁斯布公司 | Crucible for the crystallization of silicon |
| CN101628782A (en) * | 2009-07-29 | 2010-01-20 | 陈新源 | High-purity silica pot and production method thereof |
-
2010
- 2010-12-23 CN CN2010106011938A patent/CN102031488A/en not_active Withdrawn
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87206316U (en) * | 1987-04-16 | 1987-12-30 | 清华大学 | Crucible with si3n4 coating |
| CN1341080A (en) * | 1999-12-22 | 2002-03-20 | 赫罗伊斯石英玻璃股份有限两合公司 | Quartz glass crucible and method for production thereof |
| CN1417387A (en) * | 2001-10-16 | 2003-05-14 | 日本超精石英株式会社 | Surface modifying method for quartz glass crucible and surface modified crucible |
| CN1662680A (en) * | 2002-04-22 | 2005-08-31 | 赫罗伊斯石英玻璃股份有限两合公司 | Quartz glass crucible and method for the production thereof |
| CN1389599A (en) * | 2002-04-29 | 2003-01-08 | 中国科学院上海硅酸盐研究所 | Gallium-lanthanum silicate crystal growth technology of crucible descending process |
| CN1572733A (en) * | 2003-05-28 | 2005-02-02 | 瓦克化学有限公司 | Method for the production of an internally vitrified sio2 crucible |
| CN1946881A (en) * | 2004-04-29 | 2007-04-11 | 维苏维尤斯·克鲁斯布公司 | Crucible for the crystallization of silicon |
| CN1808035A (en) * | 2005-12-28 | 2006-07-26 | 中国科学院长春应用化学研究所 | Composite crucible for preparing rare earth-magnesium intermediate alloy by molten salt electrolysis and preparation method thereof |
| CN101628782A (en) * | 2009-07-29 | 2010-01-20 | 陈新源 | High-purity silica pot and production method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW200745356A (en) | ZnO vapor deposition material and ZnO film thereof | |
| WO2010019213A3 (en) | Vacuum deposition sources having heated effusion orifices | |
| CN105492652B (en) | TiB2Layer and its manufacture | |
| WO2012093807A3 (en) | Method and device for fingerprint resistant coating | |
| WO2018222366A3 (en) | Atomic layer deposition of stable lithium ion conductive interfacial layer for stable cathode cycling | |
| US10519551B2 (en) | Electrical steel sheet | |
| MY159313A (en) | Oxide evaporation material and method for producing the same | |
| RU2016121873A (en) | HAZARDOUS OXIDATION BARRIER LAYER | |
| US20200032384A1 (en) | Coating containing macroparticles and cathodic arc process of making the coating | |
| US8715810B2 (en) | Coated article and method for making the same | |
| CN108728808A (en) | A kind of rectangle magnetic control sputtering cathode of high target utilization ratio | |
| CN102031488A (en) | Crucible for increasing film damage threshold | |
| RU2014146776A (en) | EL-COVERED SPRAY COVERED WITH AL-CR-O CONTAINING Si CONTAINING IMPROVED CAPABILITY | |
| JP2007297712A (en) | Metallization through thin seed layer deposited using plasma | |
| BR112015032169B1 (en) | Method for coating a workpiece | |
| WO2015051277A3 (en) | Method and apparatus to produce high density overcoats | |
| WO2012093808A3 (en) | Method and device for fingerprint resistant coating | |
| Kumar et al. | Modern Coating Processes and Technologies | |
| Kondawar et al. | Electrospun Nanofibers for Coating and Corrosion | |
| Dickey et al. | Interaction between DC plasma and substrates in spatial PEALD | |
| Tanemura et al. | Low-temperature fabrication and random laser action of doped zinc oxide nanoneedles | |
| Yao et al. | Secondary electron yields from thermal sprayed metal surfaces | |
| US8329502B2 (en) | Conformal coating of highly structured surfaces | |
| Nagarani et al. | Review on gallium zinc oxide films: material properties and preparation techniques | |
| RU2016150301A (en) | Low-temperature method for creating transparent conductive composite nanocoatings with high hole or electron conductivity (options) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C04 | Withdrawal of patent application after publication (patent law 2001) | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20110427 |