CN101900850B - Manufacturing process of grating phase difference liquid crystal film - Google Patents

Manufacturing process of grating phase difference liquid crystal film Download PDF

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Publication number
CN101900850B
CN101900850B CN2010101694933A CN201010169493A CN101900850B CN 101900850 B CN101900850 B CN 101900850B CN 2010101694933 A CN2010101694933 A CN 2010101694933A CN 201010169493 A CN201010169493 A CN 201010169493A CN 101900850 B CN101900850 B CN 101900850B
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liquid crystal
phase difference
grating phase
manufacturing process
crystal film
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CN101900850A (en
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刘再权
刘晓林
谢佳
牛磊
陈瑞改
孙晓平
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Wuhu Tianma Automotive Electronics Co ltd
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Tianma Microelectronics Co Ltd
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Abstract

The invention provides a manufacturing process of a grating phase difference liquid crystal film, which is used for manufacturing a grating phase difference liquid crystal film arranged on the surface of a display of a stereo display device. The manufacturing process of the grating phase difference liquid crystal film comprises the following steps: 1. providing an upper glass substrate and a lower glass substrate, photoetching the surfaces of the upper glass substrate and the lower glass substrate to form transparent conducting layers spaced apart, and printing demolding adhesive on the glass substrates and the transparent conducting layers; 2. printing oriented films on the demolding adhesive, and rubbing the oriented films; 3. laminating the upper glass substrate and the lower glass substrate to form a liquid crystal box, cutting the liquid crystal box and filling liquid crystals into the liquid crystal box; and 4. carrying out ultraviolet curing on the liquid crystals, and then demolding the demolding adhesive to obtain the grating phase difference liquid crystal film. The manufacturing process of the grating phase difference liquid crystal film has the advantages of simple process and low cost.

Description

Manufacturing process of grating phase difference liquid crystal film
Technical field
The present invention relates to a kind of manufacturing process, relate in particular to a kind of manufacturing process of grating phase difference liquid crystal film that is applied in the 3 d display device.
Background technology
Now 3 d display device more and more appears in the application of numerous occasions, and the ultimate principle of its stereo display is that the right and left eyes to the people provides two discrepant pictures respectively, by brain this two width of cloth picture is synthesized the image with 3D effect.Can provide the mode of this two width of cloth picture to have much respectively, wherein utilize polaroid glasses to come the information of analyzing, thereby isolate the image of right and left eyes, offer right and left eyes respectively by a kind of phase filtrator output.
At present the position phase filtrator in the 3 d display device generally is the blooming of little polarizing layer (micro-polarizer) array of coming out of employing laser ablation, and it adopts the difference of thickness to realize the difference of a phase.But required thickness control is more accurate during fabrication for this blooming, and uniformity requirement is very high, so its cost is higher, correspondence has increased the cost of the 3 d display device of using this phase filtrator.
Summary of the invention
Than problem of higher, the invention provides the manufacturing process of grating phase difference liquid crystal film that a kind of manufacturing process is simple, cost is low at little polarizing layer manufacture process requirement of prior art 3 d display device.
A kind of manufacturing process of grating phase difference liquid crystal film, it is used for being manufactured on the grating phase difference liquid crystal film that display surface is set in the 3 d display device.This manufacturing process of grating phase difference liquid crystal film may further comprise the steps: step 1, provide lower glass substrate, this up and down the glass baseplate surface photoetching form the transparency conducting layer of space, and on this glass substrate and this transparency conducting layer, print stripping adhesive; Step 2, on stripping adhesive, print oriented film, and this oriented film is rubbed; Step 3, should go up lower glass substrate and fit to form liquid crystal cell, and cut this liquid crystal cell and pour into liquid crystal therein; Step 4, liquid crystal is carried out ultra-violet curing, then this stripping adhesive is carried out demoulding, obtain this grating phase difference liquid crystal film; Wherein, when this stripping adhesive was carried out demoulding, its temperature range was between liquid crystal cleaning point and liquid crystal decomposition temperature; Be lower than the temperature of fusion of stripping adhesive in the temperature of perfusion during liquid crystal, and be lower than the liquid crystal clearing point temperature but be higher than the nematic phase temperature of liquid crystal; When solidifying liquid crystal, the temperature of solidification temperature when pouring into liquid crystal is identical.
Preferably, this stripping adhesive is a hot melt adhesive, when printing this hot melt adhesive, adopt the roll printing coated technique, and the applied thickness of this hot melt adhesive is less than 0.2mm.
Preferably, in step 2, last lower glass substrate is the orthogonal directions friction.
Preferably, wherein the frictional direction of a glass substrate is-45 degree, and the frictional direction of another glass substrate is+45 degree.
Preferably, the material of this oriented film is a polyimide.
Preferably, the material of this transparency conducting layer is tin indium oxide or indium zinc oxide.
Manufacturing process of grating phase difference liquid crystal film of the present invention can be produced homogeneity grating phase difference liquid crystal film preferably with simple technology and lower cost.
Description of drawings
Fig. 1 is the STRUCTURE DECOMPOSITION synoptic diagram of the relevant 3 d display device of the present invention.
Fig. 2 is a position shown in Figure 1 phase structure of filter decomposing schematic representation.
Fig. 3 is the synoptic diagram that forms transparency conducting layer in the manufacturing process of grating phase difference liquid crystal film of the present invention.
Fig. 4 is the synoptic diagram that forms hot melt adhesive layer after Fig. 3 step.
Fig. 5 is the synoptic diagram that forms oriented film after Fig. 4 step.
Fig. 6 is the synoptic diagram of friction oriented film after Fig. 5 step.
Fig. 7 goes up the synoptic diagram that lower glass substrate is fitted into liquid crystal cell after Fig. 6 step.
Fig. 8 is the synoptic diagram of perfusion liquid crystal after Fig. 7 step.
Fig. 9 is the synoptic diagram that solidifies liquid crystal after Fig. 8 step.
Figure 10 is the synoptic diagram of hot melt adhesive demoulding after Fig. 9 step.
Figure 11 is the synoptic diagram of finished film edge cuts finishing after Figure 10 step.
Embodiment
Below in conjunction with accompanying drawing manufacturing process of grating phase difference liquid crystal film of the present invention is described.
See also Fig. 1 and Fig. 2, wherein, Fig. 1 is the STRUCTURE DECOMPOSITION synoptic diagram of the relevant 3 d display device of the present invention, and Fig. 2 is a position shown in Figure 1 phase structure of filter decomposing schematic representation.This 3 d display device 1 comprises LCD (liquid crystal display, LCD) 2 with position filtrator 3 mutually, in use, need to come the information of analyzing by these phase filtrator 3 outputs by polaroid glasses 4, thereby isolate the image of right and left eyes, offer right and left eyes respectively, reach the effect of watching stereo display.
This phase filtrator 3 comprises grating phase difference liquid crystal film 32 and λ/4 wave plates 34, and this grating phase difference liquid crystal film 32 is arranged on this LCD 2 surfaces, and this λ/4 wave plates 34 are between this grating phase difference liquid crystal film 32 and this polaroid glasses 4.The main effect of this grating phase difference liquid crystal film 32 is λ/2 phasic differences that respectively linearly polarized light of incident realized odd-numbered line and even number line in odd-numbered line and even number line, it solidifies the liquid crystal film of directed half-twist for interlacing, it is close to the surface of this LCD 2, and through accurate contraposition, the width of the sub-pixel of the width of its interlacing and this LCD 2 is overlapped fully.
By these LCD 2 outgoing are linearly polarized lights of equidirectional, liquid crystal through the directed half-twist of the curing in this grating phase difference liquid crystal film 32 is capable, it produces the phasic difference of λ/2, and linearly polarized light is just turned round and turn 90 degrees by TN (twisted nematic, twisted nematic panel) liquid crystal cell.And through the liquid crystal without spin in this grating phase difference liquid crystal film 32 when capable, linearly polarized light does not produce phase differential, linearly polarized light does not twist but directly penetrates, and does not change direction, so forms the linearly polarized light of the mutually perpendicular both direction of odd/even row.
This λ/4 wave plates 34 are arranged between this grating phase difference liquid crystal film 32 and this polaroid glasses 4, it mainly acts on is that the linearly polarized light of 0 λ, λ/2 phasic differences that will penetrate from this grating phase difference liquid crystal film 32 converts left light and right-hand circularly polarized light to, left sheet and right circular polarizing disk by these polaroid glasses 4, can realize the separation of images of right and left eyes, reach the stereos copic viewing effect.
See also Fig. 3 to Figure 11, this grating phase difference liquid crystal film 32 can by simple and easy, manufacture craft makes cheaply, the glue that wherein is used for demoulding can be hot melt adhesive or light-sensitive emulsion, is that example illustrates this grating phase difference liquid crystal film 32 manufacturing process with the hot melt adhesive in the present embodiment:
(1), forms transparency conducting layer 322 as Fig. 3.At first be provided for into two glass substrates 320 up and down of box, at the transparency conducting layer 322 of this glass substrate 320 photomask surfaces formation space, wherein the material of this transparency conducting layer 322 is tin indium oxide (ITO) or indium zinc oxide (IZO);
(2) as Fig. 4, printing heat melten gel 324.Printing heat melten gel 324 on transparency conducting layer 322, the preferential roll printing coated technique that adopts, select for use temperature less than 185 degrees centigrade hot melt adhesive 324, perhaps select for use greater than the liquid crystal cleaning point but less than the hot melt adhesive 324 of liquid crystal decomposition temperature, its applied thickness is less than 0.2mm, under keeping warm mode, hot melt adhesive 324 is applied evenly, then with hot melt adhesive 324 coolings;
(3) as Fig. 5, printing oriented film 326.Printing oriented film 326 is cured printed oriented film 326 then on 324 layers of hot melt adhesives, the material of this oriented film 326 be polyimide (polyimide, PI);
(4) as Fig. 6, friction oriented film 326.Selecting the orthogonal directions of two glass substrates 320 is frictional direction, and the direction that preferable frictional direction is chosen as two glass substrates 320 is set to-45 degree and+45 degree respectively;
(5), fit into box as Fig. 7.The last lower glass substrate 320 that will be formed with oriented film 326 is fitted and is formed the TN boxes, and 320 of last lower glass substrate frame 327 is set, and wherein, fits into that the box operation comprises that conduction is expected silk-screen, frame silk-screen, dusted, contraposition applying and low temperature and pressure;
(6) as Fig. 8, perfusion liquid crystal 328.Earlier this TN box is normally cut, pour into liquid crystal 328 then, wherein when high-temperature perfusion liquid crystal 328, its temperature is selected to be lower than the temperature of fusion of hot melt adhesive 324, and is lower than liquid crystal 328 clearing point temperatures but is higher than the nematic phase temperature of liquid crystal 328;
(7), solidify liquid crystal 328 as Fig. 9.This liquid crystal is carried out ultra-violet curing for 328 layers, and the temperature when wherein solidification temperature is with perfusion liquid crystal 328 is identical, the interlacing making alive, and voltage is selected the high voltage of appropriate frequency;
(8) as Figure 10, hot melt adhesive 324 demouldings.At high temperature hot melt adhesive 324 is melted demoulding, temperature is controlled between liquid crystal 328 cleaning points and liquid crystal 328 decomposition temperatures, because liquid crystal 328 ultra-violet curing operation, so liquid crystal 328 can not be affected;
(9) as Figure 11, the finishing of finished film edge cuts.Employing cut finishing is cut finishing with the edge of finished film, forms finished product grating phase difference liquid crystal film 32.
Manufacturing process of grating phase difference liquid crystal film of the present invention can be produced homogeneity grating phase difference liquid crystal film preferably with simple technology and lower cost.
Only be preferred case study on implementation of the present invention below, be not limited to the present invention, for a person skilled in the art, the present invention can have various changes and variation.Within the spirit and principles in the present invention all, any modification of being done, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (6)

1. a manufacturing process of grating phase difference liquid crystal film is used for being manufactured on the grating phase difference liquid crystal film that display surface is set in the 3 d display device, it is characterized in that, this manufacturing process of grating phase difference liquid crystal film may further comprise the steps:
Step 1, provide lower glass substrate, this up and down the glass baseplate surface photoetching form the transparency conducting layer of space, and on this glass substrate and this transparency conducting layer, print stripping adhesive;
Step 2, on stripping adhesive, print oriented film, and this oriented film is rubbed;
Step 3, should go up lower glass substrate and fit to form liquid crystal cell, and cut this liquid crystal cell and pour into liquid crystal therein;
Step 4, liquid crystal is carried out ultra-violet curing, then this stripping adhesive is carried out demoulding, obtain this grating phase difference liquid crystal film;
Wherein, when this stripping adhesive was carried out demoulding, its temperature range was between liquid crystal cleaning point and liquid crystal decomposition temperature; Be lower than the temperature of fusion of stripping adhesive in the temperature of perfusion during liquid crystal, and be lower than the liquid crystal clearing point temperature but be higher than the nematic phase temperature of liquid crystal; When solidifying liquid crystal, the temperature of solidification temperature when pouring into liquid crystal is identical.
2. manufacturing process of grating phase difference liquid crystal film according to claim 1 is characterized in that: this stripping adhesive is a hot melt adhesive, when printing this hot melt adhesive, adopt the roll printing coated technique, and the applied thickness of this hot melt adhesive is less than 0.2mm.
3. manufacturing process of grating phase difference liquid crystal film according to claim 1 is characterized in that: in step 2, last lower glass substrate is the orthogonal directions friction.
4. manufacturing process of grating phase difference liquid crystal film according to claim 3 is characterized in that: wherein the frictional direction of a glass substrate is-45 degree, and the frictional direction of another glass substrate is+45 degree.
5. manufacturing process of grating phase difference liquid crystal film according to claim 1 is characterized in that: the material of this oriented film is a polyimide.
6. manufacturing process of grating phase difference liquid crystal film according to claim 1 is characterized in that: the material of this transparency conducting layer is tin indium oxide or indium zinc oxide.
CN2010101694933A 2010-05-06 2010-05-06 Manufacturing process of grating phase difference liquid crystal film Active CN101900850B (en)

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Publication number Priority date Publication date Assignee Title
CN102707362B (en) * 2012-05-21 2015-03-18 京东方科技集团股份有限公司 Phase retarder and manufacturing method of phase retarder, polarization phase retarder and display device
CN107479297B (en) * 2017-09-13 2020-07-07 江西维真显示科技有限公司 Liquid crystal lens preparation method and device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5550663A (en) * 1994-05-24 1996-08-27 Omron Corporation Method of manufacturing optical low-pass filter
CN1991545A (en) * 2005-12-28 2007-07-04 株式会社半导体能源研究所 Display device and manufacturing method thereof
CN101029974A (en) * 2006-09-15 2007-09-05 天津三维显示技术有限公司 Practical free stereo displaying technology
CN101308641A (en) * 2007-05-18 2008-11-19 株式会社半导体能源研究所 Method for driving liquid crystal display device
CN101622577A (en) * 2007-02-27 2010-01-06 Jsr株式会社 Radiation sensitive resin composition, spacer for liquid crystal display element and diaphragm and their formation method
CN101655622A (en) * 2009-06-11 2010-02-24 深圳超多维光电子有限公司 Double vision display device and manufacturing method thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201765385U (en) * 2010-05-06 2011-03-16 天马微电子股份有限公司 Stereoscopic display device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5550663A (en) * 1994-05-24 1996-08-27 Omron Corporation Method of manufacturing optical low-pass filter
CN1991545A (en) * 2005-12-28 2007-07-04 株式会社半导体能源研究所 Display device and manufacturing method thereof
CN101029974A (en) * 2006-09-15 2007-09-05 天津三维显示技术有限公司 Practical free stereo displaying technology
CN101622577A (en) * 2007-02-27 2010-01-06 Jsr株式会社 Radiation sensitive resin composition, spacer for liquid crystal display element and diaphragm and their formation method
CN101308641A (en) * 2007-05-18 2008-11-19 株式会社半导体能源研究所 Method for driving liquid crystal display device
CN101655622A (en) * 2009-06-11 2010-02-24 深圳超多维光电子有限公司 Double vision display device and manufacturing method thereof

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