CN101884969B - Device for preparing thin film by liquid level drawdown method - Google Patents
Device for preparing thin film by liquid level drawdown method Download PDFInfo
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- CN101884969B CN101884969B CN2010102193405A CN201010219340A CN101884969B CN 101884969 B CN101884969 B CN 101884969B CN 2010102193405 A CN2010102193405 A CN 2010102193405A CN 201010219340 A CN201010219340 A CN 201010219340A CN 101884969 B CN101884969 B CN 101884969B
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Abstract
The invention relates to a device for preparing a thin film by a liquid level drawdown method, which controls the stable liquid level drawdown of sol by utilizing the principle of hydraulics and realizes uniform film coating on a substrate. The device mainly comprises a hydraulic piston, a hydraulic piston sleeve, a substrate bracket and the like. The uniform film coating of the sol on the surface of the substrate is implemented by the following steps: hanging the substrate with a clean surface on a sample bracket at a top end, fixing a container accommodating the sol at the top end of the hydraulic piston, closing a liquid outlet of a hydraulic pipeline at the lower end of the device, injecting liquid (water or oil) into the piston sleeve through a liquid inlet by using a hydraulic pump, driving the container accommodating the sol to move upwards by using the piston, and gradually impregnating the hung sample substrate in the sol so as to finish a substrate impregnation process; and stopping injecting the liquid, opening the liquid outlet and making the piston move downwards. The device controls the injection flow rate and drainage flow rate of the liquid by utilizing a flow-limiting valve so as to accurately control the film coating speed and can be charged with a drying gas to control the atmosphere of the film coating environment by a gas passage arranged on the device. Due to the design of small holes on a baffle plate in the device, the airflow disturbance is reduced, thereby ensuring more stable film coating process.
Description
Technical field
The present invention relates to a kind of device of preparing thin film by liquid level drawdown method, be applicable to the various films that utilize the colloidal sol preparation, relate to fields such as material, chemistry, physics, machinery, electronics.
Background technology
Traditional dipping-pulling method prepares film and generally adopts the substrate pull-type, is about to utilize transmission device that substrate is lifted out liquid level after substrate immerses colloidal sol, realizes coating process.Device provided by the invention then makes substrate fix, and utilizes simple hydraulic principle to realize the up-down of colloidal sol liquid level, thereby accomplishes the coating process at substrate surface.
This device is to utilize simple current-limiting apparatus just can realize that the stabilized uniform dipping lifts coating process without the machine driving of complex and expensive and control system with respect to traditional advantage that lifts film plating process.And this device upper end is provided with transparent protective shield, not only can keep watch on the dipping of film-lift process, but also clean environment is provided for coating process; Need a controlled relatively atmosphere owing to lift plated film, this pulling apparatus also has been equipped with the gas access, can feed dry nitrogen or air, provides atmosphere to regulate at coating process.The gas that feeds gets into and buffering from the device lower end, and the spilehole through central dividing plate gets into whole device equably, and gas vent is discharged from the upper end.Airflow flowing can be taken away the solvent molecule of film surface volatilization; Letting is unlikely to flow downward attached to the timely desiccant gelization of the colloidal sol of substrate surface causes the inhomogeneous of plated film; The design of aperture has reduced the flow perturbation that lifts environment, makes coating process more stable.This installs interior all right mounting temperature, humidity sensor, obtains the ambient parameter of plated film at any time.
Summary of the invention
Technology of the present invention is dealt with problems: improve deficiencies such as existing sol filming technology plated film is inhomogeneous, complex equipments is expensive, film coating environment is uncontrollable, the apparatus and method of a kind of simple and stable ground preparation gel film are provided.
Technical solution of the present invention: a kind of device of preparing thin film by liquid level drawdown method, this device comprises:
One transparent housing is cylinder, and the top is provided with a mobilizable loam cake, is used for fixing base sheet rack and airtight dustproof;
One base sheet rack is fixed in the center of loam cake;
One dividing plate is positioned at the middle part of cylinder transparent housing, and transparent housing is separated into two spaces up and down; Dividing plate is provided with a plurality of pores, and the dividing plate center is provided with and the identical hole of piston sleeve size; Described a plurality of pore is evenly distributed on the separator face, is used for transparent housing cylinder two-part gas communication up and down.
One piston sleeve through the hole of said dividing plate center, is fixed in space, transparent housing lower part; The bottom of piston sleeve is connected with two conduit under fluid pressures, is connected to an inlet and a leakage fluid dram respectively; Through the piston up-down in feed liquor and the discharge opeing control piston sleeve;
One container is fixed in the top of piston, is used to hold colloidal sol;
One base is the cylinder flute profile, and whole transparent housing is fixed on the base; Base can be used to hold drier.
One exhaust outlet is arranged on the transparent housing, is positioned at the top of whole device;
One air inlet is arranged on base week side.
Described air inlet and exhaust outlet can protect or guarantee the drying of environment in the whole device through charging into nitrogen or dry air to film coating environment.
Said conduit under fluid pressure is provided with speed-controlling device, thereby is used for the rising or falling speed control substrate of control piston and the separating rate of colloidal sol.
Described air inlet and exhaust outlet are provided with the control valve that is used for adjustments of gas flow size.
Described base can freely separate with transparent housing, fix.
The present invention's advantage compared with prior art is following:
(1) utilize simple current-limiting apparatus just can realize that the stabilized uniform dipping lifts coating process without the machine driving of complex and expensive and control system.
(2) at coating process protective atmosphere can be provided.
Description of drawings
Shown in Figure 1 is structural representation figure of the present invention.
Among the figure by 1-transparent housing, 2-inlet, 3-leakage fluid dram, 4-air inlet, 5-base, 6-conduit under fluid pressure, 7-piston sleeve, 8-dividing plate, 9-pore, 10-piston, 11-container, 12-base sheet rack, 13-exhaust outlet, 14-loam cake.
The specific embodiment
Below in conjunction with accompanying drawing, technical scheme of the present invention is further specified: as shown in Figure 1, a kind of device of preparing thin film by liquid level drawdown method, this device comprises:
One transparent housing 1 is cylinder, and the top is provided with a mobilizable loam cake 14, is used for fixing base sheet rack 12 and airtight dustproof;
One base sheet rack 12 can be a crozier, is fixed in the center of loam cake 14;
One dividing plate 8 is positioned at the middle part of cylinder transparent housing 1, and transparent housing is separated into two spaces up and down; Dividing plate 8 is provided with a plurality of pores 9, and the dividing plate center is provided with and the identical hole of piston sleeve size; Described a plurality of pore 9 is evenly distributed on the separator face, is used for transparent housing cylinder two-part gas communication up and down.
One piston sleeve 7 through the hole of said dividing plate center, is fixed in space, transparent housing lower part; The bottom of piston sleeve 7 is connected with two conduit under fluid pressures 6, is connected to an inlet 2 and a leakage fluid dram 3 respectively; Piston 10 through in feed liquor and the discharge opeing control piston sleeve moves up and down;
One container 11 is fixed in the top of piston 10, is used to hold colloidal sol;
One base 5 is the cylinder flute profile, and whole transparent housing 1 is fixed on the base 5; Base can be used to hold drier.
One exhaust outlet 13 is arranged on the transparent housing 1, is positioned at the top of whole device;
One air inlet 4 is arranged on the relevant position of base week side.
Described air inlet and exhaust outlet 13 can protect or guarantee the drying of environment in the whole device through charging into nitrogen or dry air to film coating environment.
Said conduit under fluid pressure 6 is provided with speed-controlling device, thereby is used for the rising or falling speed control substrate of control piston and the separating rate of colloidal sol.
Described air inlet 4 is provided with the control valve (not shown) that is used for adjustments of gas flow size with exhaust outlet 13.
Described base 5 can freely separate with transparent housing 1, fix.
As shown in Figure 1, apparatus of the present invention are so erect shown in the figure and are placed.One deck drier (optional during no dry gas stream) at first tiles on base 5; An amount of colloidal sol of in container 11, packing into then hangs cleaning substrate on base sheet rack 12, in air inlet 4, charge into air; Regulate exhaust outlet 13 and make air-flow evenly flow at a slow speed, guarantee that whole device is in dry atmosphere.
Open inlet 2, inject water to conduit under fluid pressure 6, piston 10 slowly rises; When the colloidal sol in the container 11 floods substrate, close inlet 2, wait for 1 minute and treat system stability; Open leakage fluid dram 3 then, the colloidal sol face in the container 11 moves down with piston 10 and container 11 gradually, and the speed of moving down of colloidal sol face can be through being arranged at the governor valve adjustment on the conduit under fluid pressure 6; After substrate exposes the colloidal sol face fully, close leakage fluid dram 3, promptly accomplish plated film one time.Can open loam cake 14, take out sample from base sheet rack 12.
More than be described with regard to embodiment of the present invention, but the present invention also can other mode implement, the present invention can do various changes in design in the contained claim scope of the application's claims.
Claims (4)
1. the device of a preparing thin film by liquid level drawdown method, it is characterized in that: this device comprises:
One transparent housing is cylinder, and the top is provided with a mobilizable loam cake, and loam cake is used for fixing base sheet rack and airtight dustproof;
One base sheet rack is fixed in the center of loam cake;
One dividing plate is positioned at the middle part of cylinder transparent housing, and transparent housing is separated into two spaces up and down; Dividing plate is provided with pore, and the dividing plate center is provided with and the identical hole of piston sleeve size;
One piston sleeve through the hole of said dividing plate center, is fixed in space, transparent housing lower part; The bottom of piston sleeve is connected with two conduit under fluid pressures, is connected to an inlet and a leakage fluid dram respectively; Through the piston up-down in feed liquor and the discharge opeing control piston sleeve;
One container is fixed in the top of piston, is used to hold colloidal sol;
One base is the cylinder flute profile, and whole transparent housing is fixed on the base; Base can be used to hold drier.
One exhaust outlet is arranged on the transparent housing, is positioned at the top of whole device;
One air inlet is arranged on base week side.
2. the device of a kind of preparing thin film by liquid level drawdown method according to claim 1, it is characterized in that: described conduit under fluid pressure is provided with speed-controlling device, thereby is used for the rising or falling speed control substrate of control piston and the separating rate of colloidal sol.
3. the device of a kind of preparing thin film by liquid level drawdown method according to claim 1 is characterized in that: described air inlet and exhaust outlet are provided with the control valve that is used for adjustments of gas flow size.
4. the device of a kind of preparing thin film by liquid level drawdown method according to claim 1 is characterized in that: described base can freely separate with transparent housing, fixing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102193405A CN101884969B (en) | 2010-06-25 | 2010-06-25 | Device for preparing thin film by liquid level drawdown method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102193405A CN101884969B (en) | 2010-06-25 | 2010-06-25 | Device for preparing thin film by liquid level drawdown method |
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| Publication Number | Publication Date |
|---|---|
| CN101884969A CN101884969A (en) | 2010-11-17 |
| CN101884969B true CN101884969B (en) | 2012-07-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2010102193405A Expired - Fee Related CN101884969B (en) | 2010-06-25 | 2010-06-25 | Device for preparing thin film by liquid level drawdown method |
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| CN (1) | CN101884969B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI613011B (en) * | 2016-09-30 | 2018-02-01 | 漢邦普淨節能科技有限公司 | Device for coating phosphors and coating method |
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| CN102898033B (en) * | 2012-10-26 | 2015-04-15 | 皇明太阳能股份有限公司 | Preparation method and device for antireflection films of outer glass tubes of solar heat collecting tube |
| CN103977931A (en) * | 2014-05-29 | 2014-08-13 | 泰州市爱国机械有限公司 | Improved gear oil immersion equipment |
| CN105457844B (en) * | 2015-12-24 | 2019-01-11 | 中国科学院宁波材料技术与工程研究所 | A kind of device of liquid level sedimentation plated film |
| CN106076754B (en) * | 2016-06-12 | 2018-07-31 | 南京工业大学 | A kind of pulling apparatus of Best-Effort request plated film |
| CN110451484B (en) * | 2019-09-04 | 2021-05-25 | 北京华碳元芯电子科技有限责任公司 | Preparation device and method of carbon nanotube film |
| CN112099546B (en) * | 2020-08-28 | 2021-12-28 | 西安交通大学 | Humidity control system for micro-nano manufacturing detection of micro-liquid-moving pipe |
| CN112636631B (en) * | 2020-12-17 | 2022-02-22 | 郑州轻工业大学 | PVP @ AgNPs packaged IPMC electric actuator and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3109585A1 (en) * | 1981-03-13 | 1983-05-19 | Verfahrenstechnik Hübers GmbH, 4290 Bocholt | Process and device for impregnating articles |
| CN1698974A (en) * | 2004-05-17 | 2005-11-23 | 电子科技大学 | Reversed dip coating device |
| CN2757308Y (en) * | 2004-12-20 | 2006-02-08 | 上海电器科学研究所（集团）有限公司 | Hanging basket type continuous dipping device |
| CN101143358A (en) * | 2007-10-26 | 2008-03-19 | 上海大学 | Method for preparing article surface membrane by liquid level descent method |
| CN101623682A (en) * | 2008-07-09 | 2010-01-13 | 北京石油化工学院 | Device for preparing membrane by liquid level sedimentation method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7959842B2 (en) * | 2008-08-26 | 2011-06-14 | Snu & R&Db Foundation | Carbon nanotube structure |
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2010
- 2010-06-25 CN CN2010102193405A patent/CN101884969B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3109585A1 (en) * | 1981-03-13 | 1983-05-19 | Verfahrenstechnik Hübers GmbH, 4290 Bocholt | Process and device for impregnating articles |
| CN1698974A (en) * | 2004-05-17 | 2005-11-23 | 电子科技大学 | Reversed dip coating device |
| CN2757308Y (en) * | 2004-12-20 | 2006-02-08 | 上海电器科学研究所（集团）有限公司 | Hanging basket type continuous dipping device |
| CN101143358A (en) * | 2007-10-26 | 2008-03-19 | 上海大学 | Method for preparing article surface membrane by liquid level descent method |
| CN101623682A (en) * | 2008-07-09 | 2010-01-13 | 北京石油化工学院 | Device for preparing membrane by liquid level sedimentation method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI613011B (en) * | 2016-09-30 | 2018-02-01 | 漢邦普淨節能科技有限公司 | Device for coating phosphors and coating method |
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| CN101884969A (en) | 2010-11-17 |
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Granted publication date: 20120704 Termination date: 20180625 |