CN101836108A - Organic chemical sensor comprising plasma-deposited microporous layer, and method of making and using - Google Patents

Organic chemical sensor comprising plasma-deposited microporous layer, and method of making and using Download PDF

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CN101836108A
CN101836108A CN200880112371A CN200880112371A CN101836108A CN 101836108 A CN101836108 A CN 101836108A CN 200880112371 A CN200880112371 A CN 200880112371A CN 200880112371 A CN200880112371 A CN 200880112371A CN 101836108 A CN101836108 A CN 101836108A
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electrode
analyte
sensing element
covalent network
layer
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CN101836108B (en
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摩西·M·戴维
斯特凡·H·格里斯卡
纳尔逊·B·小奥布赖恩
尼尔·A·拉科
迈克尔·S·文德兰
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3M Innovative Properties Co
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
    • G01N27/125Composition of the body, e.g. the composition of its sensitive layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10T442/608Including strand or fiber material which is of specific structural definition
    • Y10T442/614Strand or fiber material specified as having microdimensions [i.e., microfiber]
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Abstract

Applicant discloses a sensing element for sensing an organic chemical analyte, comprising a first electrode and a second electrode, and a microporous, hydrophobic, analyte-responsive dielectric material disposed at least in proximity to the first and second electrodes. The analyte-responsive dielectric material may be an amorphous random covalent network comprising a mean pore size of less than about 10 nm and a porosity of at least about 20%. An electrical property of the sensing element, such as capacitance, can be monitored in order to sense an organic chemical analyte.

Description

Organic chemical sensor and preparation and using method with plasma-deposited microporous layer
Background technology
The ability that detects chemical analyte (especially organic chemical analyte) is important in many application (comprising environmental monitoring or the like).This detection and/or monitoring to organic molecule especially can be used in the end indicator in (for example) so-called serviceable life, and this indicator is that personal safety equipment (for example respirator) is required.
Many methods that are used to detect chemical analyte have been developed, for example methods such as optics, gravimetric analysis, microelectron-mechanical.Particularly, developed the sensor that is used to monitor electrical properties (for example electric capacity, impedance, resistance etc.).This class sensor usually depends on the variation that analyte is adsorbed on the material or the material electrical properties takes place when absorbing wherein.
For example, the U.S. Patent Application Publication 2006/0249402 of authorizing people such as Snow discloses a kind of sensing apparatus, and this sensing apparatus has dielectric, nano-electrode grid on the dielectric on bottom electrode, the bottom electrode and the top electrodes that electrically contacts with this grid.Nano-electrode can be a carbon nano-tube network.People such as Snow with this unit describe for showing capacitance variations existing under the situation of chemical analyte.
The U.S. Patent Application Publication 2006/0237310 of authorizing people such as Patel discloses a kind of device, this device is described to can be by absorption or the absorption of analyte in the chemical sensing material, make electrical properties (as electric capacity, resistance etc.) can the relevant mode that circuit detected being changed, thereby detect the plurality of target analyte with the sensing electrode that scribbles this chemical sensing material.
The United States Patent (USP) 5,512,882 of authorizing Stetter and Maclay discloses a kind of sensor, and its impedance changes when being exposed to the steam of selected chemical substance.This sensor comprises certain polymkeric substance, and the physical arrangement of this polymkeric substance is changed (as by expanding or decay) by steam.This sensor also has the conducting element that is scattered with polymkeric substance.Can measure variation by impedance measuring circuit.
The United States Patent (USP) 5,482,678 of authorizing Sittler discloses a kind of sensor, and it is included in the material that expands under the situation that has organic liquid, gas or steam.This material is applied to carrier surface, makes the expand back carrier deflection and change two distances between the capacitor plate of this material, thereby changes the electric capacity between the pole plate.
The United States Patent (USP) 5,965,451 of authorizing Plog and Maunz discloses a kind of gas sensor that is used for optionally detecting hydrocarbon, and it has capacity cell and as the sensitive layer of dielectric gas-permeable.This sensitive layer is the zeolite of doped precious metal, and this zeolite has the regular crystal structure that is made of primary pore, and the diameter of primary pore is near the gas-kinetic diameter of gas molecule to be detected.
Summary of the invention
The applicant discloses a kind of sensing element that is applicable to the organic chemical analyte of (for example in the atmospheric environment) in detection or the monitoring of environmental.This sensing element comprises the dielectric substance to the analyte sensitivity near first electrode and second electrode.In context, the dielectric substance of analyte sensitivity is meant a kind of like this material: can absorb organic chemical analyte, and electrical properties can show measurable variation when absorbing organic analyte in this material.In one embodiment, to the dielectric substance of analyte sensitivity shows specific inductive capacity when absorbing analyte variation, make sensing element constitute capacitor and can observe the capacitance variations of sensing element.
In one embodiment, dielectric substance to the analyte sensitivity is the microporous hydrophobic material, this material has amorphous random covalent network, and this amorphous random covalent network comprises at least about 30% carbon atom, and has less than the average cell size of about 10nm with at least about 20% factor of porosity.This material can provide following advantage: to the organic analyte susceptibility of low content height, rapid and low to the water-sensitive sensitivity to organic analyte response.Under the situation of not accepting opinion or mechanism restriction, the performance that this material shows during with the dielectric substance done the analyte sensitivity may be because any or all following SOME PROPERTIES: hydrophobicity, best factor of porosity, the pore volume of micropore of containing best hole dimension scope and amorphous random covalent network by plasma-deposited with the ability of formation to the dielectric layer of analyte sensitivity.
In one aspect, herein disclosed is the sensor that is used for the sensing organic chemical analyte, this sensor comprises: sensing element, sensing element comprises first electrode, second electrode and is set to the microporous hydrophobic dielectric substance to the analyte sensitivity of close at least first electrode and second electrode, wherein the microporous hydrophobic dielectric substance to the analyte sensitivity has amorphous random covalent network, this amorphous random covalent network comprises the carbon at least about 30%, and has less than the average cell size of about 10nm with at least about 20% factor of porosity; And function circuit, the function circuit and first electrode and the second electrode electrical communication, wherein function circuit can and can detect the variation of the electrical properties of sensing element to first electrode and second electrode application voltage.In one embodiment, amorphous random covalent network comprises the carbon at least about 30%, and comprises silicon, oxygen and hydrogen.In alternative embodiment, amorphous random covalent network comprises 100% carbon basically.
On the other hand, herein disclosed is the method that is used for the sensing organic chemical analyte, this method comprises: provide the sensor that comprises following parts: sensing element, sensing element comprises first electrode, second electrode and the microporous hydrophobic dielectric substance that is set to close at least first electrode and second electrode to the analyte sensitivity, wherein the microporous hydrophobic dielectric substance to the analyte sensitivity has amorphous random covalent network, this amorphous random covalent network comprises the carbon at least about 30%, and has less than the average cell size of about 10nm with at least about 20% factor of porosity; And function circuit, the function circuit and first electrode and the second electrode electrical communication, wherein function circuit can and can detect the variation of the electrical properties of sensing element to first electrode and second electrode application voltage.Described sensing element is exposed in the environment that may contain one or more organic chemical analyte; To first electrode and second electrode application voltage; And the electrical properties of monitoring sensing element.In one embodiment, amorphous random covalent network comprises the carbon at least about 30%, and comprises silicon, oxygen and hydrogen.In alternative embodiment, amorphous random covalent network comprises 100% carbon basically.
On the other hand, herein disclosed is the method that is used for preparative organic chemistry analyte sensing element, this method comprises: the substrate with conductive layer is provided; Form plasma by the gaseous mixture that comprises organosilane, oxygen and hydro carbons; The top substrate that has conductive layer is exposed to plasma, makes to form amorphous random covalent network layer on the top of conductive layer, this amorphous random covalent network layer comprises the carbon at least about 30%, and comprises silicon, hydrogen and oxygen; Heat the dielectric layer to the analyte sensitivity that amorphous random covalent network has the amorphous random covalent network of microporous hydrophobic with formation, this amorphous random covalent network has less than the average cell size of about 10nm with at least about 20% factor of porosity; And on to the dielectric layer top of analyte sensitivity, deposit second conductive layer.
Aspect another, herein disclosed is the method that is used for preparative organic chemistry analyte sensing element, this method comprises: the substrate with first conductive electrode and second conductive electrode is provided, and wherein first conductive electrode and second conductive electrode adopt interdigitated configuration and each interval certain distance; Form plasma by the gaseous mixture that comprises organosilane, oxygen and hydro carbons; The top substrate that has conductive electrode is exposed to plasma, makes to form amorphous random covalent network layer in the space between interdigited electrode at least, this amorphous random covalent network layer comprises the carbon at least about 30%, and comprises silicon, hydrogen and oxygen; Heat the dielectric layer to the analyte sensitivity that this amorphous random covalent network has the amorphous random covalent network of microporous hydrophobic with formation, this amorphous random covalent network has less than the average cell size of about 10nm with at least about 20% factor of porosity.
These and other aspects of the present invention will be apparent from following embodiment.Yet, under any circumstance should not be to be restriction with above content understanding to claimed theme, this theme only is subjected to the qualification of appended claims, because it can be made amendment in course of the review.
Description of drawings
Fig. 1 is the side view of the exemplary sensing element of employing parallel plate electrode configuration.
Fig. 2 is the vertical view of the exemplary sensing element of employing interdigitated configuration.
Fig. 2 a is the cut-open view along the exemplary sensing element of Fig. 2 of the line intercepting that is labeled as " 2a " among Fig. 2.
Fig. 3 is the skeleton view of the exemplary sensing element of employing interdigitated configuration.
Fig. 4 is the figure line of measurement capacitance of the exemplary sensing element of parallel plate electrode configuration, and measurement capacitance changed with the time of the organic analyte that is exposed to multiple content.
In above-mentioned many figure, identical Reference numeral shows components identical.Except as otherwise noted, the equal not drawn on scale of institute's drawings attached in the presents, and select these accompanying drawings just for different embodiments of the invention are shown.Specifically, the size of multiple assembly only adopts exemplary term to be described, and should not infer any relation between the size of multiple assembly from accompanying drawing.
Embodiment
Though for example can use the term of " top ", " bottom ", " top ", " below ", " preceding ", " back " and " first " and " second " and so in the disclosure, should be appreciated that these terms only are to use on relative meaning.
Sensing element
See figures.1.and.2, herein disclosed is sensing element 1/101, it comprises the dielectric layer 10/110 to the analyte sensitivity at least, and this dielectric layer is near first electrode 20/120 and second electrode 30/130.Hereinafter these assemblies and feature and character will be discussed successively, and other optional component and feature and character.These discussion will with reference to following both carry out: Fig. 1, it illustrates the exemplary sensing element based on the general configuration of plane-parallel capacitor; Fig. 2, Fig. 2 a and Fig. 3, it illustrates the exemplary sensing element based on the general configuration of interdigited capacitor.For the sake of clarity, in the figure that describes different general configurations, multiple assembly is marked with different Reference numeral (being that unit increases with 100 in general).Yet should be appreciated that unless otherwise indicated the structure of multiple assembly, composition and character go for the sensing element of any capacitive character design.
Sensing element 1/101 is constructed to feasible dielectric layer 10/110 close enough, first electrode 20/120 and second electrode 30/130 to the analyte sensitivity, to such an extent as to the dielectric substance to the analyte sensitivity that comprises in this layer can interact with the electric field that electrode is set up.In the operation of sensing element 1/101, the dielectric layer 10/110 of analyte sensitivity is shown electrical properties when absorbing one or more analytes variation.In one embodiment, electrical properties is following electric capacity or the character relevant with electric capacity.By between first electrode 20/120 and second electrode 30/130, giving charge difference (for example between two electrodes, giving voltage difference), and the monitoring sensing element is for making the change of properties that takes place of response to the existence of analyte, can measure the variation of this character relevant with electric capacity.As this paper subsequently as described in, use function circuit 28/128 can finish this monitoring.
Term " electric capacity " is contained any electrical properties and mensuration process thereof with " character relevant with electric capacity ", this mensuration process usually with give electric charge (no matter be static charge or time power transformation lotus) and during giving electric charge and/or to monitor electrical properties afterwards relevant.This character not only comprises electric capacity, and comprises impedance, admittance, resistance, specific conductance etc., and can measure according to several different methods known in the art.
Dielectric layer to the analyte sensitivity
Dielectric layer 10/110 (term " layer " is using in general sense, and contains any physical configuration) to the analyte sensitivity comprises the dielectric substance to the analyte sensitivity at least in part.In context, term " to the dielectric substance of analyte sensitivity " means a kind of like this material: can absorb organic chemical analyte, and can show measurable variation aspect some electrical propertiess when absorbing organic analyte in this material.
Plasma-deposited
In one embodiment, the amorphous random covalent network that the dielectric substance of analyte sensitivity is had atom.This amorphous random covalent network can be by plasma-deposited formation.In context, " plasma " means the gaseous state or the fluent meterial of the partial ionization at least that contains spike (as electronics, ion, neutral molecule, free radical, other excited atoms and molecule etc.).
In a plurality of embodiment, amorphous random covalent network comprises at least about 20%, at least about 30% or at least about 40% carbon atom (these number percents are represented average; For example, per 100 atoms of network that comprise 30% carbon atom on average have 30 carbon atoms).
In specific embodiment, amorphous random covalent network constitutes (removing (for example) owing to there are other atoms of these traces under the situation of other gases of trace in the plasma reactor) by 100% carbon basically.Form hydrocarbon amorphous random covalent network by (for example), carry out thermal treatment as described below then, can prepare this structure.
In other embodiments, the non-carbon part of amorphous random covalent network can comprise the atom that is selected from by the following group of forming: silicon, oxygen, hydrogen and/or nitrogen (alone or in combination).In other embodiments, the non-carbon part of amorphous random covalent network also can comprise the atom that is selected from halogen (fluorine, chlorine etc.).
In one embodiment, amorphous random covalent network comprises silicon atom, carbon atom, hydrogen atom and oxygen atom, and utilizes the method that hereinafter describes in detail, is formed by the plasma-deposited of the potpourri that comprises silicon, carbon, oxygen and hydrogen atom or molecule.In specific embodiment, supply with the potpourri of organosilane, oxygen and hydro carbons to plasma.
This amorphous random covalent network generally includes continuous matrix.This paper is defined as assembly (as coating, layer etc.) with this matrix, and wherein the solid portion of material is interconnected (no matter whether having the factor of porosity of hereinafter describing in detail) continuously by covalent bond.That is to say that matrix is that difference is tangible with the assembly that comprises particle agglomeration (as zeolite, activated charcoal, carbon nano-tube etc.) continuously.For example, plasma-deposited layer or coating (as amorphous random covalent network) will comprise continuous matrix, even coating itself is to apply and/or have a micropore in the patterning mode.
In a plurality of embodiment, can be used for plasma-deposited organosilane and include, but is not limited to tetramethylsilane, methyl-monosilane, dimethylsilane, trimethyl silane, ethylsilane, positive tetraethyl orthosilicate (TEOS), tetramethyl-ring tetrasiloxane (TMCTS), disilane alcohol methane (disilanomethane), two (methyl-monosilane alcohol) methane (bis (methylsilano) methane), 1,2-disilane alcohol ethane (1,2-disilanoethane), 1, two (methyl-monosilane alcohol) ethane (1 of 2-, 2-bis (methylsilano) ethane), 2,2-disilane alcohol propane (2,2-disilanopropane), diethylsilane, diethylmethyl silane, propyl silane, the ethylene methacrylic base silane, the divinyl dimethylsilane, 1,1,2,2-tetramethyl disilane, hexamethyldisilane, 1,1,2,2,3,3-hexamethyl three silane, 1,1,2,3,3-pentamethyl three silane, dimethyl disilane alcohol ethane (dimethyldisilanoethane), dimethyl disilane alcohol propane (dimethyldisilanopropane), tetramethyl disilane alcohol ethane (tetramethyldisilanoethane), tetramethyl disilane alcohol propane (tetramethyldisilanopropane) or the like, or above-mentioned two or more combination.
In a plurality of embodiment, can be used for the cyclic hydrocarbon that plasma-deposited hydro carbons includes, but is not limited to straight or branched alkane, alkene, alkynes and has two to ten carbon atoms.Suitable hydro carbons comprises (C1-C10) alkane or (C1-C10) alkynes, for example methane, ethane, propane, butane, benzene, cyclohexane, toluene, ethene, propylene, acetylene and butadiene.
In one embodiment, in plasma generation and deposition process, adopt molecular oxygen (O 2).With the oxygen as the bigger molecule molecule of Si-O group, C-O group etc. (as a comprise) part only be provided compare, adopt molecular oxygen can cause oxygen atom to be present in the whole amorphous random covalent network with more random distribution mode, under preceding kind of situation, oxygen atom can be preferential near Si, C etc. in amorphous random covalent network.
Any suitable plasma reactor all can be used to form amorphous covalent networks film described herein.A kind of suitable plasma reactor apparatus provides the reaction chamber with capacitive coupled system, and it has at least one electrode and at least one ground-electrode by the power supply of radio frequency (RF) source.A kind of suitable reaction chamber is easily found time, and can keep carrying out the condition of Cement Composite Treated by Plasma.That is to say, this reaction chamber provides a kind of like this environment, and it allows the flow of control (for example) pressure, multiple inertia and reactant gas, the voltage that is applied to transmitting electrode, the electric field intensity of passing ion sheath, the formation that contains the plasma of spike, ion bombardment intensity and the spike speed to amorphous covalent networks deposition.In a kind of equipment, aluminium is the reaction chamber material, because aluminium has low sputtering yield, this means that pollution seldom can appear in the reaction chamber surface.Yet, also can use other suitable materials, for example, graphite, copper, glass or stainless steel.
In order to use plasma deposition method to form amorphous random covalent network, usually substrate is arranged on the reaction chamber inside of easily finding time or passes reaction chamber in base top.In certain embodiments, in this deposition process, can form a plurality of amorphous covalent networks films on the top of a plurality of substrates simultaneously.
By at least one electrode power supply (for example), can produce and keep the plasma that forms by the gas in the reaction chamber by the RF generator power supply of working in 0.001 to the 100MHz frequency range.Electrode system can symmetry or asymmetric.In some plasma apparatus, the electrode surface area ratio between ground-electrode and the transmitting electrode is 2: 1 to 4: 1 or 3: 1 to 4: 1.Transmitting electrode can be used (for example) water cooling.For discrete flat article, be set to directly contact the smaller electrode that asymmetric electrode disposes by (for example) goods, can realize plasma-deposited.Because the capacitive coupling between transmitting electrode and the goods can allow goods serve as electrode like this.
The RF power supply with 0.01 to 50MHz or 13.56MHz or its any integral multiple (as 1,2 or 3) scope in typical frequencies power supply.The RF power supply can be the RF generator such as the 13.56MHz oscillator.In order to obtain electric coupling efficiently (promptly, wherein reflective power is the sub-fraction of incident power), can power supply be connected to electrode by network, this network is used for the impedance of power supply and the impedance of transmission line (being generally 50 ohms reactive) are complementary, thereby by coaxial transmission line high efficiency of transmission RF energy.One type matching network (it comprises two variable condenser and an inductor) can trade name AMN3000 derive from Plasmatherm (St.Petersburg, FL).Traditional electric coupling method relates in the impedance matching network between transmitting electrode and power supply uses blocking capacitor.This blocking capacitor can prevent that Dc bias is divided to residual circuit.On the contrary, the Dc bias in the ground-electrode is shunted.Though the frequency range accepted of RF power supply can be enough high, so that form big negative DC auto-bias on smaller electrode, this frequency range should be so not high, to such an extent as to produce standing wave in the gained plasma, this can cause Cement Composite Treated by Plasma invalid.
Thermal treatment/microcellular structure
In one embodiment, plasma-deposited amorphous random covalent network is evicted hydrogen and/or hydro carbons from through thermal treatment from network, thereby forms microcellular structure.In context, " micropore " means the pore volume that material has a large amount of intraconnections, and average cell size (when characterizing with (for example) adsorption isotherm line method) is less than about 100nm.Therefore, the internal holes volume that the molecule (if there is) of organic analyte can penetration material, and stay in the hole.The existence of this analyte in internal holes can change the dielectric properties of material, makes the variation of specific inductive capacity (or any other suitable electrical properties) to be observed.
Under the situation of not accepting the restriction of opinion or mechanism, the applicant thinks, rely on the micropore dielectric substance, the favourable character that sensing element 1/101 disclosed in this invention can have the organic analyte of sensing aspect is: measurable variation of the electrical properties aspect of dielectric substance may be by due to the existence of analyte molecule in the hole.Therefore, do not requiring that the analyte molecule is changed (though this phenomenon also may take place with the character (for example swelling and/or expansion) that causes dielectric substance by abundant dissolving in dielectric substance itself, and also have and help measurable electrical response) situation under, may detect analyte.This microporosity of the dielectric substance of analyte sensitivity had help improve the sensitivity of dielectric substance a small amount of organic analyte.
In a plurality of embodiment, to the dielectric substance of analyte sensitivity have at least about 20%, at least about 30% or at least about 40% factor of porosity (as the time with (for example) adsorption isothermal characterized by techniques, this technology for example uses (for example) to derive from QuantachromeInstruments (Boynton Beach, those that instrument Florida) carries out) by trade name Autosorb.This factor of porosity can provide the good response to the low content organic chemical analyte.Yet, should not have big like this pore volume to the dielectric substance of analyte sensitivity, to such an extent as to be difficult to avoid electric short circuit or arc discharge between first electrode 20/120 and second electrode 30/130.Therefore, in a plurality of embodiment, the dielectric substance of analyte sensitivity had about at the most factor of porosity of 90%, at the most about 70% or about at the most 50%.
Once more under the situation of not accepting opinion or mechanism restriction, the size of internal holes and distribute can so that the organic analyte molecule of at least some at least some holes can form than original (as, than under the environment of monitoring analyte) the higher state (as accurate liquid) of condensation degree that has.This analyte molecule that can cause collecting in the internal holes has than quantity bigger under monitored environment and/or higher concentration; In addition or in contrast, the analyte molecule under this state can show than higher specific inductive capacity (relative dielectric constant) under not condensed vapor or the gaseous state.Therefore, can show the sensitivity that has a small amount of organic analyte excellence based on sensing element to the micropore dielectric substance (correctly having selected hole dimension and distribution) of analyte sensitivity.In a plurality of embodiment, the dielectric substance of analyte sensitivity is had less than about 50nm, less than about 20nm, less than about 10nm or less than the average cell size of about 5nm.In a plurality of embodiment, the dielectric substance of analyte sensitivity is had greater than about 0.3nm, greater than about 0.5nm or greater than the average cell size of about 1.0nm.
In one embodiment, the dielectric substance to the analyte sensitivity is substantially free of the hole of diameter greater than 1 μ m.
The dielectric substance to the analyte sensitivity with amorphous random covalent network can form above-mentioned microcellular structure by thermal treatment.Concrete heating condition can be through selecting, to improve other attributes of this material.For example, have more hydrophobic structure by heating amorphous random covalent network in inertia (or reductibility) gaseous environment and/or in the subatmospheric environment, can forming.This hydrophobic material can not absorb the aqueous water of capacity usually, to such an extent as to the marked change that this material significantly expands or otherwise shows physical characteristics, and this hydrophobic material can be used to provide the organic analyte sensing element that has relative insensitivity to water.The typical heating means that can be used to produce suitable hydrophobic micropore dielectric substance to the analyte sensitivity comprise that (for example) is with this material heating in vacuum one hour in 450 degrees centigrade vacuum drying oven.
Deposition only comprise carbon and hydrogen amorphous random covalent network (as, make by plasma with hydro carbons) concrete condition under, can utilize proper heat treatment to remove all hydrogen basically, have basically the poromerics of 100% carbon with formation.
To the dielectric layer 10/110 of analyte sensitivity comprise plasma-deposited, to the micropore dielectric substance of analyte sensitivity, can have any required general thickness to the dielectric layer 10/110 of analyte sensitivity.In a plurality of embodiment, layer 10/110 has less than about 2000nm or less than the general thickness of about 1000nm.In other embodiments, layer 10/110 has greater than about 50nm, greater than about 100nm or greater than the general thickness of about 200nm.In one embodiment, layer 10/110 has the thickness that equates basically on the whole length of layer and width.
In one embodiment, on the plasma-deposited top that is deposited upon conductive material layer, this conductive material layer is suitable for serving as an electrode (as hereinafter going through) of capacitance sensing element.In a plurality of embodiment, can be set near dielectric layer the analyte sensitivity to the extra layer of the insensitive dielectric substance of analyte.This layer any person in can be for a variety of reasons is provided, as, as protective seam, as tack coat to improve cementability or the like.In a further embodiment, plasma-deposited material can be patterned.The suitable method that makes this material form the configuration of patterning includes, but is not limited to the mode of deposition of control material spatially, to change material thickness or density.For example, can between sedimentary origin and substrate, mask be set, make the thickness of deposition materials between the primary importance of upper surface and the second place, change.
In a plurality of embodiment, can use a plurality of independent dielectric material layers to the analyte sensitivity.For example, can use the plasma-deposited dielectric substance of multilayer to the analyte sensitivity.Perhaps, except plasma-deposited dielectric material layer, also can use one or more some other dielectric material layer to the analyte sensitivity to the analyte sensitivity.Various layers to the dielectric substance of analyte sensitivity can be in direct contact with one another; Perhaps, also can separate by the layer (, as described herein) that is used for some other purpose as passivation layer, tack coat.
Electrode
See figures.1.and.2, first electrode 20/120 and second electrode 30/130 can comprise any suitable conductive material.The combination that can use different material (conduction and/or non electrically conductive material) is as different layers or as potpourri, if having enough monolithic conductives (as, electrode material has less than about 10 -2The constant resistance rate of ohm meter).Can be used for preparing multiple potpourri and compound substance that the examples of material of first electrode and/or second electrode includes, but is not limited to organic material, inorganic material, metal, alloy and comprises any or all of these materials.In certain embodiments, can use coated (for example, evaporation, sputter etc.) metal or metal oxide or their combination.Suitable conductive material comprises (for example) aluminium, tin, indium tin oxide, gold, silver, platinum, palladium, copper, nickel, titanium, chromium or the like.In one embodiment, two electrodes all have same material.In alternative embodiment, first electrode and second electrode have different materials.
In a plurality of embodiment, any one in first electrode and second electrode or both can be permeated by organic analyte.With regard to regard to the sensing element of the general fashion structure of as shown in Figure 1 plane-parallel capacitor, the kind electrode perviousness can be particularly useful.In this case, if second electrode 30 is permeable, then organic analyte can enter dielectric layer 10 to the analyte sensitivity by first type surface 13, and needn't enter dielectric layer 10 (it may be slower process) to the analyte sensitivity by edge 15.Equally, if first electrode 20 is permeable, then organic analyte can by first type surface 11 enter dielectric layer 10 to the analyte sensitivity (yet, if backing 40 for analyte for impermeable, provide first electrode 20 may be of no use with permeable configuration).
In a plurality of embodiment, electrode can owing to discontinuous be that analyte is permeable.In context, term " discontinuous " does not also mean that electrode package draws together the unit (spot, island etc.) that does not electrically contact each other.On the contrary, " discontinuous " means in the whole border of electrode, and some zones do not comprise conductive material.This discontinuous electrode can be that microcosmic is discontinuous.For example, electrode can have the colloidal sol formation of the particle (as nano particle) of conductive material by deposition (as coating, ink jet printing etc.).(typical colloidal sol can be made of silver, gold, platinum, palladium or other metal materials).In this case, the conducting particles that electrode can contain abundant contact has electric conductivity to guarantee electrode, but between particle, have enough spaces so that the organic analyte of electrode pair for permeable.In certain embodiments, heating (as sintering) conductive material (as, to about 250 ℃ temperature range, heat about 10 minutes at about 100 ℃ to about 2 hours time) can increase the contact between the particle, thus when improving electric conductivity, still keep vapor permeability.In other embodiments, electrode can have macroscopical discontinuous structure.For example, if conductive material comprises evaporation metal (it typically is impermeable), then conducting metal can be deposited in the mode of pattern (for example, with lattice or with example 1 disclosed " comb shape " pattern) rather than as successive layers.
See figures.1.and.2, the electric access area territory 25/125 of first electrode 20/120 and the electric access area territory 35/135 of second electrode 30/130 are provided so that and can function circuit 28/128 be connected to sensing element by these zones.This electric access area territory can be arranged in any position easily.For example, this electric access area territory is presented on the electrode edge in the exemplary diagram of Fig. 1 and Fig. 2, then is presented in the exemplary diagram of Fig. 3 on the first type surface (123 and 133) of electrode.In one embodiment, coupling arrangement (as contact mat or projection) 22/122 is set to the access area territory of contact (as being connected to) first electrode 20, makes to realize being electrically connected (for example by attached wire rod 24/124) between sensing element 1/101 and function circuit 28/128.Similarly, can be set to the same coupling arrangement 32/132 that contacts with the access area territory of second electrode 30.
Exemplary sensing element and preparation method
The parallel plate electrode configuration
The sensing element 1 that can prepare in one embodiment, general fashion (shown in the by way of example in the cut-open view of Fig. 1) structure by plane-parallel capacitor.In this configuration, sensing element has two and is roughly the plane, parallel, electrode of opposite, the dielectric layer of analyte sensitivity is present between two electrodes and prevents directly electrically contact between two electrodes.
In the illustrative methods of this sensing element of preparation, backing 40 (it can be continuous blocks, layer or the film of material) is provided, at least one in its close electrode, and can play the effect that physical strength and integrality are provided for the finished product sensing element.Any suitable material be can use, glass, pottery, plastics etc. comprised.In large-scale production process, can use polymer film (for example polyester, polyimide etc.).In certain embodiments, backing is the permeable material of analyte (for example, silicon rubber, a porous membrane etc.).
In one embodiment, on backing 40, be provided with the conductive layer that serves as first electrode 20.This conductive layer can comprise any material in the above-mentioned material, the blend or the potpourri that comprise conductive material and electrically non-conductive material, and can be by any suitable method deposition, include, but is not limited to that spin coating, dip-coating, the coating of solution mould, screen painting, commentaries on classics are coated with, two or more the combination in sputter, physical vapour deposition (PVD), chemical vapor deposition or these methods.In alternate embodiment, can form conductive layer on backing 40 tops by prefabricated membrane (as metal forming, conductive tape etc.) is set.As mentioned above, this first electrode 20 can be used as successive layers or lipostrat provides.
In one embodiment, the conductive layer first surface 21 that is provided so that electrode 20 near and/or at least a portion of the first surface 41 of contact backing 40.In alternative embodiment, between the first surface 41 of at least a portion of the first surface 21 of electrode 20 and backing 40, there is optional layer.As long as the function that does not hinder sensing element 1, then this optional layer can be used for any purpose (for example strengthening the bonding between first electrode 20 and the backing 40).
In the process of preparation sensing element 1, also provide dielectric layer 10 to the analyte sensitivity.In one embodiment, dielectric layer 10 to the analyte sensitivity is provided so that first first type surface 11 of layer 10 directly contacts at least a portion (keeping at least a portion of first electrode 20 to touch, to be used to be connected to function circuit) of the second surface 23 of first electrode 20.
In one embodiment, will be arranged on the dielectric substance of analyte sensitivity near the first electrode place by plasma-deposited method such as above-detailed.In this case, the substrate and first electrode (dielectric substance to the analyte sensitivity is disposed thereon) should make it can tolerate the condition that applies plasma.
In another embodiment, will be plasma-deposited on carrier substrates to the dielectric substance of analyte sensitivity, and then carrier substrates is arranged on first top of electrodes, can form dielectric layer by this method to the analyte sensitivity.In alternative embodiment, can be with plasma-deposited to interim carrier to the dielectric substance of analyte sensitivity, dielectric substance to the analyte sensitivity can be removed and be shaped to powder from carrier subsequently, and then with powder deposition to first electrode.
In a plurality of embodiment, can be set to form second electrode 30 by second conductive layer near dielectric layer 10 to the analyte sensitivity.Second electrode 30 can comprise above-mentioned conductive material, and can deposit according to said method.In certain embodiments (particularly backing 40 for analyte for impermeable situation under), second electrode 30 can comprise discontinuous construction (equally as previously mentioned), so that to organic analyte and Yan Weike is permeated.
With reference to Fig. 1, optional protective cover layer or restraining barrier 50 can be set at least one in the close electrode.In one embodiment, overlayer 50 is arranged on the top of second electrode 30 (to keep certain zone of second electrode 30 to touch, to be used to electrically contact).Any this overlayer 50 should significantly not hinder the function of sensing element 1.For example, arrive the dielectric layer 10 to the analyte sensitivity if sensing element is constructed to make the analyte of being paid close attention to must pass overlayer 50, then this overlayer should be to analyte and Yan Weike fully permeates.
Overlayer 50 can be by any method deposition known in the art, comprise coating (as spin coating, dip-coating, solvent application, evaporation, commentaries on classics be coated with, screen painting, flexographic printing or the like).In alternate embodiment, overlayer 50 can comprise the preformed layer (as film or band) that is arranged on second electrode 30.In one embodiment, overlayer 50 is provided so that the first surface 51 of overlayer 50 directly contacts at least a portion of the second surface 33 of second electrode 30.Tectal second surface can be the outmost surface of sensing element, or (if desired) itself can admit extra coating or layer.
In one embodiment, to the dielectric layer of analyte sensitivity through bakingout process (for example, being exposed to 450 ℃ following 1 hour of temperature), thereby increase the factor of porosity of amorphous random covalent network and/or strengthen hydrophobicity in any appropriate point of said method.For example, can form second electrode (and any optional overlayer) subsequently again to the substrate/first electrode/dielectric layer composition of analyte sensitivity is heat-treated.Perhaps, can form whole substrate/first electrode/, and then heat-treat dielectric layer/second electrod composition of analyte sensitivity.Any parts that exist in the heat treatment process (as substrate, electrode, optional tack coat, optional cap layer, arrangements of electric connection etc.) must so that can tolerate thermal treatment, and still can be carried out its required function in sensing element through selecting.
In one embodiment, the second surface 23 of first electrode 20 and first first type surface 11 of the dielectric layer 10 of analyte sensitivity directly contacted does not have insert layer between the two.Equally, in one embodiment, the first surface 31 of second electrode 30 directly contacts with second first type surface 13 to the dielectric layer 10 of analyte sensitivity, does not have insert layer between the two.Fig. 1 has described this embodiment.Yet what also it is contemplated that is, first electrode 20 and to having other optional layer between the dielectric layer 10 of analyte sensitivity and/or between second electrode 30 and the dielectric layer 10 to the analyte sensitivity.In this case, any one in the electrode or both can directly not contact in the surface of the dielectric substance of analyte sensitivity some or all.For example, can improve electrode and to the cohesiveness between the dielectric layer of analyte sensitivity with tack coat.Or can between surface, passivation layer (for example silicon dioxide layer) be set to the surface of the dielectric layer of analyte sensitivity and electrode, so that make the minimizing possibility of the arc discharge between the electrode.In certain embodiments, can use a plurality of this optional layer; Perhaps single layer can have multiple function.As long as they can significantly not hinder the required function of sensing element, just any this class optional layer (for example above-mentioned tack coat, passivation layer, protective seam, overlayer etc.) can be used for any purpose.For example, arrive the dielectric layer 10 to the analyte sensitivity if sensing element is constructed to make the analyte of being paid close attention to pass optional layer, then this optional layer should be to this analyte and Yan Weike fully permeates.
Usually, the edge of multiple layer can flush alignment (shown in the exemplary embodiment of Fig. 1) each other.Perhaps, multiple layer can cave in respect to other layers with the edge of other plies and/or some layer.
In the process on the top that will be deposited on first electrode 20, should electric access area territory 25 be set on first electrode 20, so that can electrically contact between electrode and the function circuit to the dielectric substance of analyte sensitivity.Similarly, if overlayer is placed on the top of second electrode 30, then electric access area territory 35 should be set similarly.This electric access area territory can be arranged in any position easily.In one embodiment, the coupling arrangement (as contact mat, projection etc.) 22 that the access area territory 25 with first electrode 20 electrically contacts can be set.Similarly, the coupling arrangement 32 that contacts with the access area territory 35 of second electrode 30 equally can be set.
The interdigitated configuration
In another embodiment, can prepare the sensing element of constructing according to the general fashion of interdigited capacitor.The skeleton view of the cut-open view of the vertical view of Fig. 2, Fig. 2 a (along line " 2a " intercepting of Fig. 2) and Fig. 3 shows the exemplary embodiment of interdigitated sensing element.In context, any arrangement that comprises at least two electrodes that exists with the interdigitated configuration contained in term " interdigitated ".This configuration comprises interdigitated comb pattern (for example Fig. 2, Fig. 2 a and shown in Figure 3), and interdigitated screw type well known in the art or helical type pattern.All these designs all have a common characteristic: promptly have (at least) two electrodes in the interdigitated arrangement of coplane substantially, and near electrode, there is dielectric layer to the analyte sensitivity, make that the dielectric substance to the analyte sensitivity that comprises in this layer can interact with electric field when setting up electric field between the electrode.Can be arranged between the electrode (promptly in the residing plane of two electrodes, and insert) to the dielectric layer/material of analyte sensitivity near in the linear passageway between any two closest approaches of first electrode and second electrode.Perhaps, can be arranged so that the dielectric layer/material of analyte sensitivity: though not with the electrode coplane, the dielectric substance of analyte sensitivity is exposed in the fringe field of setting up between the adjacent part of two electrodes at least.In another alternate embodiment, can be arranged on simultaneously in these two positions the dielectric layer of analyte sensitivity.
Any method of the patterned deposition material that utilization is known (as mask vapour deposition, screen painting, ink jet printing) is deposited as two interdigital patterns with conductive material, can form interdigited electrode.Can design the concrete how much/dimensional properties (spacing, highly, length etc.) of electrode pattern as required.
In one embodiment, interdigited electrode is arranged on the backing 140 that can be made of above-mentioned material.First electrode 120 is arranged on the identical backing 140 usually with second electrode 130.In an embodiment (Fig. 2, Fig. 2 a and shown in Figure 3), the first surface 121 of first electrode 120 and the first surface 131 of second electrode 130 all directly contact certain part at least of the first surface 141 of backing 140.In alternative embodiment, (do not describe), electrode 120 and/or 130 and backing 140 between can have optional layer, this optional layer is similar to above-mentioned optional layer, and is subjected to identical problem and constraint.
Shown in the exemplary embodiment of Fig. 2, Fig. 2 a and Fig. 3, the patterned deposition of first electrode 120 and second electrode 130 can allow outside certain zone on surface 141 (or surface of any optional layer on it) of backing 140 is exposed to.Then, utilize similar above with reference to the described method of parallel plate electrode type sensing element, can be with plasma-deposited to backing 140 to the dielectric layer of analyte sensitivity.(same, the selection of substrate and/or electrode and design should make it can tolerate plasma deposition method.) deposited to the dielectric substance of analyte sensitivity thereby will be full of two spaces (as Fig. 2, Fig. 2 a and space shown in Figure 3 117) between the electrode.Therefore, in this embodiment, will directly contact at least a portion on the surface 141 of backing 140 to the first surface 111 of the dielectric layer 110 of analyte sensitivity.As Fig. 2 a and shown in Figure 3, this deposition process can cause that also the dielectric layer 110 to the analyte sensitivity covers and contact the second surface 123 of first electrode and the second surface 133 of second electrode (unless deposit selectively, as in the electrode one or two all covered).Therefore, in a plurality of embodiment, the first surface 111 of the dielectric layer 110 of analyte sensitivity is directly contacted the second surface 123 of first electrode 120 and/or the second surface 133 of second electrode 130.
In alternative embodiment, optional layer (not shown among Fig. 2, Fig. 2 a or Fig. 3) can be arranged on the top of second surface 123 of first electrode 120 and/or on the top of the second surface 133 of first electrode 130.In this embodiment, between the second surface 123 of the first surface 111 of the dielectric layer 110 of analyte sensitivity and first electrode 120 and/or with the second surface 133 of second electrode 130 between can directly not contact.This optional layer can play and describe similarly effect (protection etc.) before.Yet, in the interdigitation sensing element, optional layer on the top of one or two electrode can be for analyte for permeable, because analyte can be by the zone 117 of infiltration optional layer arrival to the dielectric layer 110 of analyte sensitivity.
In one embodiment, optional cap layer 150 (it can serve as protective seam, insulation course, decorative layer etc.) can be deposited on the top to the second surface 113 of the dielectric layer 110 of analyte sensitivity.Any this class overlayer should significantly not hinder sensing element function (as, it should be and can fully permeate the analyte paid close attention to).This overlayer can have by any known coating process (as spin coating, dip-coating, solvent application, evaporation, commentaries on classics be coated with, screen painting, flexographic printing etc.) coating deposited.In alternate embodiment, overlayer 150 can comprise the preformed layer (as film or band) on second surface 113 tops that are arranged on layer 110.
In one embodiment, to the dielectric layer of analyte sensitivity through bakingout process, thereby increase the factor of porosity of amorphous random covalent network and/or strengthen hydrophobicity.Any parts that exist in the heat treatment process (as substrate, electrode, optional tack coat, optional cap layer, arrangements of electric connection etc.) must so that can tolerate thermal treatment, and still can be carried out its required function in sensing element through selecting.
In deposition during to the dielectric substance (and any optional cap layer) of analyte sensitivity, should electric access area territory 125 be set on first electrode 120 and on second electrode 130, access area territory 135 be set, electrically contact between each electrode and the function circuit allowing.This electric access area territory can be arranged in any position easily.For example, this electric access area territory 125 and 135 is illustrated on the edge that is positioned at electrode in the exemplary illustration of Fig. 2, and is illustrated on the surface 123 and 133 that is positioned at electrode in the exemplary illustration of Fig. 3.
In one embodiment, the coupling arrangement (as contact mat, projection etc.) 122 that the access area territory 125 with first electrode 120 electrically contacts can be set.Similarly, the coupling arrangement 132 that contacts with the access area territory 135 of second electrode 130 equally can be set.
Function circuit
When the dielectric layer of analyte sensitivity was absorbed enough analytes, detectable variation can take place in the electrical properties relevant with sensing element (including, but is not limited to electric capacity, impedance, admittance, electric current or resistance).This detectable variation can be detected by the function circuit 28/128 with first electrode and the second electrode electrical communication.In context, " function circuit " typically refers to the electrical equipment that can be used for to the electrical properties of first electrode and second electrode application voltage (thereby giving charge difference to electrode) and/or monitoring sensing element, and wherein electrical properties can respond the existence of organic analyte and change.In a plurality of embodiment, function circuit can be monitored following any character or its combination: inductance, electric capacity, voltage, resistance, specific conductance, electric current, impedance, phasing degree, the power consumption factor or dissipation.
This function circuit can comprise individual equipment, this equipment not only to electrode application voltage, but also monitor electrical properties.In alternative embodiment, this function circuit can comprise two independent equipment: one provides voltage, another monitor signal.Function circuit can be connected to first electrode 20/120 and second electrode 30/130 by wire rod 24/124 and 34/134.In alternative embodiment, function circuit can be set to directly contact first electrode and/or second electrode, this contact both can be finished by coupling arrangement 22/122 and 32/132, and finish in the electric access area territory that also can directly contact each electrode by certain part with function circuit.For example, function circuit can be set to reside on circuit board or the flexible circuit (any one served as backing 40/140 wherein).First electrode directly can be deposited on circuit board/backing 40 then, make the part of its direct operating of contacts circuit.
Function circuit 28/128 can comprise that (power supply can comprise battery or hard-wired power supply to (for example) power supply; Alternatively, also can provide power supply indirectly) by (for example) charging of built-in RFID circuit in operating circuit.Function circuit 28/128 also can comprise one or more microprocessors, and it is configured to the variation of the right one or more electrical propertiess of the charging of control electrode and/or sensing electrode that monitoring is recharged.What provide in addition has: analog to digital converter, be used to preserve memory storage from the data of sensing element, be used to operate sensing element software, the element of data recording and/or unidirectional or bidirectioanl-telemetry function etc. is provided.
Analyte
Sensing element (for example disclosed herein) can be used for detecting and/or the existence of the organic analyte of monitoring (no matter be qualitatively or quantitatively).This analyte can include, but is not limited to: hydro carbons, fluorocarbon, alkanes, naphthenic, aromatic compounds, alcohols, ethers, the ester class, ketone, halogenated hydrocarbon, amine, organic acid, the cyanic acid salt, Nitrates and nitrile, normal octane for example, cyclohexane, methyl ethyl ketone, acetone, ethyl acetate, carbon disulphide, phenixin, benzene, styrene, toluene, xylene, methyl chloroform, tetrahydrofuran, methyl alcohol, ethanol, isopropyl alcohol, normal butyl alcohol, the tert-butyl alcohol, cellosolvo, acetate, the 2-aminopyridine, glycol monoethyl ether, Toluene-2,4-diisocyanate, the 4-diisocyanate, nitromethane and acetonitrile etc.Analyte can be relative nonpolar organic molecule or relative polarity organic molecule.Analyte can be so-called steam, promptly can form the molecule of solid or liquid under the temperature and pressure environmental baseline that analyte (as toluene, acetone, heptane etc.) is experienced.Analyte can be so-called gas, promptly can not form the molecule (but as mentioned above, this molecule still can have the higher state of condensation degree in the internal holes to the dielectric substance of analyte sensitivity) of liquid or solid under environmental baseline usually.This gas can comprise methane, ethane or the like.In some cases, can detect the potpourri of organic analyte molecule.
The present invention can further specify by following example.
Example
Plasma reactor
Utilize plane radio frequency (RF) plasma system to deposit amorphous random covalent network layer.This system is by dried pumping plant (lobe pump EH1200, Edwards; And iQDP80 dry type mechanical pump, the turbomolecular pump that Edwards) provides support (TPH2000 type, Balzers) suction.Gas flow is controlled by digital flow controller (MKS Corporation).(the RF50S type power supply that derives from work in the Plasmatherm (St.Petersburg, FL)) (derives from RF Power Products (Voorhees, NJ)) transmission RF energy at AMN3000 type impedance matching network in utilization.
Preparation sample 1
Use is with 1.3mPa (1 * 10 -5(2.5cm * 2.5cm) goes up continuous (not patterning) aluminum coating of coating at the glass sheet of cleaning for the CHA IndustriesMark-50 evaporator of base pressure operation holder) and No.A-2049 aluminum shot (purity 99.995%, 6 * 6mm derives from CeracInc.).Deposited at rates aluminum coating with about 15 dust/seconds.Final thickness is about 100nm., make to form two aluminum coating zones that do not electrically contact each other apart from the line of the about 5mm of this aluminum plating glass one lateral edges place with diamond pen.Bigger zone forms first electrode thus, and less (edge) zone forms the zone that can electrically contact with (with after-applied) second electrode thus, and is as described below.Aluminum plating glass sheet after will ruling with adhesive tape is pasted into the glass sheet of 5cm * 5cm, so that handle.On the top of the less regional marginal portion of aluminizing, mask material is set.On the top of the bigger regional marginal portion of aluminizing, mask material is set equally.
Glass sheet is installed on the plane electrode in the above-mentioned plasma reactor system (pasting with Kapton Tape).Reaction chamber is closed and is pumped to the about 0.07Pa of pressure.The gaseous mixture that will comprise tetramethylsilane, 1,3-butadiene and oxygen is sent into vacuum chamber with following flow velocity.Plasma is kept under the following conditions:
Tetramethylsilane flow velocity: 100sccm (standard cubic centimeters per minute)
1,3-butadiene flow velocity: 160sccm
Oxygen gas flow rate: 100sccm
Operating pressure: 4.9Pa (37 millitorr)
Rf power: 75 watts
Sedimentation time: 14 minutes
This method produces the layer of the thick about 0.77 μ m with amorphous random covalent network material.Then remove mask material from sample.Then, with the thermal treatment 1 hour in about 450 ℃ vacuum drying oven of finding time of this sample.
With second electrode ink jet printing on the top of plasma-deposited material of patterning, to finish the structure of this sample.For ink jet printing second electrode, in Adobe Photoshop, created bitmap images (17.8m (702 point/inch)), download to the XY depositing system then.The print head that is used for depositing silver is the Dimatix SX3-128 print head in the droplet size with 10pL, 128 nozzle/holes, and printhead assembly length is approximately 6.5cm, and injector spacing is 508 microns.Be used to construct the Nano silver grain colloidal sol of this electrode can trade name AG-ID-G-100-S1 available from Cabot.In the ink jet printing process, use porous aluminum vacuum platen that sample is fixed.Finish when printing, sample is removed from porous aluminum vacuum platen, and under 125 ℃, place Thermolyne hot plate last 10 minute.
The ink jet printing silver electrode comprises the comb pattern of being made up of the Filled Rectangle with the microgroove that stretches out from one side.The rectangle part that prints electrode is arranged such that the part of this rectangle is positioned on the top of a part in the less zone of aluminizing (to make by lead being attached on this less zone of aluminizing, can realize and the electrically contacting of top electrodes), second remainder that prints electrode is positioned on the top of plasma-deposited material.Microgroove on the electrode is designed to that length is approximately 8.3mm, width is approximately 250 microns.Gap design between the microgroove becomes about 250 microns.(should be noted that all these sizes are the nominal size of bitmap images, rather than actual " printing " size.)
This operation provides first electrode that comprises continuous aluminium on the glass back sheet.For comprising the dielectric layer to the analyte sensitivity of plasma-deposited material, comprise that second electrode of comb pattern silver layer is positioned on the top of plasma-deposited layer on the top of aluminium electrode.
Specimen 1
The straight-through delivery system that uses simple custom build is delivered to sample to measure with the acetone of concentration known.The whole teflon pipe that adopts of delivery system.Spray into nitrogen in the container that contains aqueous acetone and keep constant temperature, contain the nitrogen stream of saturated acetone with formation.The refrigeration machine that utilization derives from FisherScientific makes aqueous acetone keep constant temperature, and according to Handbook of VaporPressure (steam pressure handbook) (Yaws, C.I.Gulf Publishing:Houston, 1994) calculate the temperature that this refrigeration machine is kept in order to produce saturated acetone air-flow.By using a series of mass flow controllers, this saturated acetone air-flow is diluted with extra nitrogen.Use infrared spectrometer (can derive from the concentration that ThermoElectron (Waltham, MA)) calibrates acetone in the air-flow by trade name Miran Sapphire.The acetone air-flow is fed the sales kit (SK) (maintenance controlled temperature) that contains sample 1.Utilize crocodile clip that first electrode of sample and second electrode are connected to and comprise that the LCR measuring instrument (can derive from Instek America, the function circuit of Corp. (Chino, CA)) by trade name Instek Model 821 LCR measuring instruments.At whole steam test period, by the variation (as shown in Figure 4) of specified time interval in 1 kilo hertz frequency monitoring sample electric capacity (with picofarad).
At first sample is placed unencapsulated chamber, with measuring samples initial capacitance of (in the room air) under environmental baseline.Since 0 time point sample is exposed in the dry nitrogen (about 8%, 20 ℃ of relative humidity) then.Then with chamber sealing, the nitrogen stream that will contain about 200ppm acetone is introduced in the chamber and was kept for first period.Subsequently sample is exposed to a period of time in the dry nitrogen air-flow that contains about 370ppm acetone.Then chamber is turned back in the drying nitrogen environment.Subsequently, with sample be exposed to successively the acetone of about 90ppm, approximately 90ppm acetone (once more) and approximately in the acetone of 50ppm, and between these exposures, sample is exposed in the dry nitrogen air-flow that does not contain acetone.After in being exposed to the acetone of about 50ppm, sample is exposed in the acetone of about 730ppm, sample is exposed in the dry nitrogen air-flow that does not contain acetone once more subsequently.
This paper has described a plurality of embodiment of the present invention.Yet should be appreciated that and to make multiple modification without departing from the invention.Therefore, other embodiment is in the scope of following claims.

Claims (20)

1. sensor that is used for the sensing organic chemical analyte comprises:
Sensing element, described sensing element comprises first electrode, second electrode and to the microporous hydrophobic dielectric substance of analyte sensitivity, described microporous hydrophobic dielectric substance to the analyte sensitivity is arranged at least near described first electrode and the second electrode place, wherein said microporous hydrophobic dielectric substance to the analyte sensitivity has amorphous random covalent network, described amorphous random covalent network comprises the carbon at least about 30%, and has less than the average cell size of about 10nm with at least about 20% factor of porosity; And
Function circuit, described function circuit and described first electrode and the second electrode electrical communication, wherein said function circuit can be to described first electrode and second electrode application voltage, and can detect the variation of the electrical properties of described sensing element.
2. sensor according to claim 1, wherein said amorphous random covalent network also comprises silicon, oxygen and hydrogen.
3. sensor according to claim 1, wherein said amorphous random covalent network comprises 100% carbon basically.
4. sensor according to claim 1, wherein said amorphous random covalent network has the factor of porosity at least about 30%.
5. sensor according to claim 1, the permeable organic chemical analyte of at least one in the wherein said electrode.
6. sensor according to claim 5, wherein said permeable electrode has discontinuous conductive material layer.
7. sensor according to claim 1, wherein said sensing element has the plane-parallel capacitor configuration.
8. sensor according to claim 1, wherein said sensing element has the interdigited capacitor configuration.
9. sensor according to claim 1, wherein said sensing element have the overlayer near at least one described electrode, the permeable organic chemical analyte of described overlayer.
10. the method for a preparative organic chemistry analyte sensing element comprises:
Substrate with conductive layer is provided;
Form plasma by the gaseous mixture that comprises organosilane, oxygen and hydro carbons;
The top substrate that has conductive layer is exposed to described plasma, makes to form amorphous random covalent network layer on the top of described conductive layer, described amorphous random covalent network layer comprises the carbon at least about 30%, and comprises silicon, hydrogen and oxygen;
Heat described amorphous random covalent network to form dielectric layer to the analyte sensitivity, described dielectric layer to the analyte sensitivity has the amorphous random covalent network of microporous hydrophobic, and the amorphous random covalent network of described microporous hydrophobic has less than the average cell size of about 10nm with at least about 20% factor of porosity; And
Deposition second conductive layer on the top of described dielectric layer to the analyte sensitivity.
11. method according to claim 10, wherein said dielectric layer to the analyte sensitivity has the factor of porosity at least about 30%.
12. method according to claim 10, the permeable organic chemical analyte of paying close attention to of wherein said second conductive layer.
13. the method for a preparative organic chemistry analyte sensing element comprises:
Substrate with first conductive electrode and second conductive electrode is provided, and described first conductive electrode and described second conductive electrode have the interdigitated configuration, and separate each other;
Form plasma by the gaseous mixture that comprises organosilane, oxygen and hydro carbons;
The top described substrate that has conductive electrode is exposed to described plasma, make and form amorphous random covalent network layer in the space between described interdigited electrode at least, described amorphous random covalent network layer comprises the carbon at least about 30%, and comprises silicon, hydrogen and oxygen;
Heat described amorphous random covalent network to form dielectric layer to the analyte sensitivity, described dielectric layer to the analyte sensitivity has the amorphous random covalent network of microporous hydrophobic, and the amorphous random covalent network of described microporous hydrophobic has less than the average cell size of about 10nm with at least about 20% factor of porosity.
14. method according to claim 13, wherein said dielectric layer to the analyte sensitivity has the factor of porosity at least about 30%.
15. the method for a sensing organic chemical analyte comprises:
Sensor is provided, and described sensor comprises:
Sensing element, described sensing element comprises first electrode, second electrode and to the microporous hydrophobic dielectric substance of analyte sensitivity, described microporous hydrophobic dielectric substance to the analyte sensitivity is arranged at least near described first electrode and the described second electrode place, wherein said microporous hydrophobic dielectric substance to the analyte sensitivity has amorphous random covalent network, described amorphous random covalent network comprises the carbon at least about 30%, and has less than the average cell size of about 10nm with at least about 20% factor of porosity; And
Function circuit, described function circuit and described first electrode and the second electrode electrical communication, wherein said function circuit can be to described first electrode and second electrode application voltage, and can detect the variation of the electrical properties of described sensing element;
Described sensing element is exposed in the environment that may contain one or more organic chemical analyte;
To described first electrode and second electrode application voltage; And
Monitor the electrical properties of described sensing element.
16. method according to claim 15, wherein said amorphous random covalent network also comprises silicon, oxygen and hydrogen.
17. method according to claim 15, wherein said amorphous random covalent network comprises 100% carbon basically.
18. method according to claim 15, wherein said dielectric layer to the analyte sensitivity has the factor of porosity at least about 30%.
19. method according to claim 15, wherein said sensing element comprises capacitor, and wherein said monitored electrical properties is the capacitive properties of described sensing element.
20. method according to claim 15, wherein said monitored character are the described electric capacity of described sensing element.
CN2008801123711A 2007-10-05 2008-09-30 Organic chemical sensor comprising plasma-deposited microporous layer, and method of making and using Expired - Fee Related CN101836108B (en)

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PCT/US2008/078281 WO2009046011A2 (en) 2007-10-05 2008-09-30 Organic chemical sensor comprising plasma-deposited microporous layer, and method of making and using

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KR20100087315A (en) 2010-08-04
WO2009046011A3 (en) 2009-06-11
AU2008308827A1 (en) 2009-04-09
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KR101476487B1 (en) 2014-12-24
JP5266326B2 (en) 2013-08-21
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EP2208058B1 (en) 2018-07-11
US20110031983A1 (en) 2011-02-10
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US8378694B2 (en) 2013-02-19
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