CN101806973B - Manufacturing method of segment liquid crystal display (LCD) with high contrast - Google Patents

Manufacturing method of segment liquid crystal display (LCD) with high contrast Download PDF

Info

Publication number
CN101806973B
CN101806973B CN2010101261208A CN201010126120A CN101806973B CN 101806973 B CN101806973 B CN 101806973B CN 2010101261208 A CN2010101261208 A CN 2010101261208A CN 201010126120 A CN201010126120 A CN 201010126120A CN 101806973 B CN101806973 B CN 101806973B
Authority
CN
China
Prior art keywords
light shielding
coated
screen
shielding material
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2010101261208A
Other languages
Chinese (zh)
Other versions
CN101806973A (en
Inventor
邱成峰
陈江
张有兵
刘小鹏
何勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YIBIN YINGTAI PHOTOELECTRIC CO Ltd
Original Assignee
YIBIN YINGTAI PHOTOELECTRIC CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YIBIN YINGTAI PHOTOELECTRIC CO Ltd filed Critical YIBIN YINGTAI PHOTOELECTRIC CO Ltd
Priority to CN2010101261208A priority Critical patent/CN101806973B/en
Publication of CN101806973A publication Critical patent/CN101806973A/en
Application granted granted Critical
Publication of CN101806973B publication Critical patent/CN101806973B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The invention relates to a manufacturing method of a segment liquid crystal display (LCD) with high contrast, which is mainly characterized by comprising the following steps: covering a capillary film or photoresist on a screen to manufacture a printing screen; installing the manufactured printing screen on a screen printer, and putting a glass substrate with an ITO pattern on the screen printer; dripping the liquid to be coated, namely a light shielding material on the screen printer; opening the screen printer to enable the light shielding material to be uniformly coated on the substrate, and drying the light shielding material, wherein the thickness of a light shielding film is in the range of 1-2um; putting the glass substrate coated with the light shielding material on a photoetching machine (an exposing machine); combining and aligning an electrode pattern on the substrate and a mask plate, and carrying out photoetching and exposing after aligning; and developing the substrate coated with the light shielding material after being photoetched and exposed to obtain the required pattern. The invention overcomes the defects of the traditional technology, improves the product accuracy, and simultaneously greatly reduces the purchase cost of processing equipment and the cost of production materials.

Description

A kind of method for making of high-contrast segmentation LCD
Affiliated technical field
The present invention relates to a kind of method for making of high-contrast segmentation type LCD.Be applicable to the making of segmentation LCDs and processing.
Background technology
Over nearly 20 years, the world and Chinese flat panel display are flourish, and market constantly enlarges, and show that industry is the industry that behind semicon industry, surpasses hundred billion Yankee dollar markets in another message area, and Related product market total value surpasses trillion dollars.The output value at China's display screen and Related product thereof has accounted for China's IT industry 2/3rds left and right sides shares.At present, flat panel display is main with lcd technology, and it has: volume is little, in light weight, low-voltage, low-power consumption, radiationless, capacity is big, advantage such as easy of integration, obtains people's favor.Its concrete application comprises: (1) consumer electronics: as: digital camera, video camera display, GPS display, mobile phone, mobile displays such as portable game machine; (2) household appliances: colour television set, household electrical appliance displays such as VCD, DVD, air-conditioning, sound equipment; (3) instrument class: automobile dial plate display, all kinds of instrument displays such as monitor; (4) instrument class: laptop computer, desktop computer display, the net book display, or the like.Market potential is extremely huge.
Every word of common segmentation liquid crystal is 8 sections compositions, can only display digit and subalphbet, show other small numbers of characters, Chinese character and other symbol, and can be customized from producer, can character to display, Chinese character and other symbol be solidificated in appointed positions.The segmentation LCD is mainly used in the demonstration that is applied to instrument, because its condition of work is complicated, so except that conventional the requirement, also require high-contrast.Therefore, making high-contrast segmentation LCD is one of gordian technique of liquid crystal instrument display making.
Present stage; Making high is in the process that conventional LCD liquid crystal cell is made to comparison segmentation LCD; Increased by one and prepared the technology that coating one deck black light shield layer on the base of the figure version is arranged, black light shield layer thickness generally (is commonly referred to: the black film lcd products) between 0.5um-2um.And the method that applies the black light shield layer mainly is that screen printing is coated with membrane technology and spin-coating photoetching process now:
Screen printing is coated with membrane technology: the half tone of elder generation's selection or stretching suitable tension, again on the web plate with required graphic making; Base version with existing electrode pattern to be processed is placed on the wire mark machine then; With the electrode pattern fit contraposition on web plate figure and the base version, to printing behind the good position, dry, obtain required figure.This fabrication techniques technology is simple, and stock utilization is high, and the equipment input cost is low.But problems and shortcomings are: the one, and the fit aligning accuracy is not high: only be fit to make the lower product of accuracy requirement.This technology is on web plate, to make required figure, then with the base version on the contraposition of figure fit, in printing process, web plate has certain deformation simultaneously, therefore can only make the lower product of accuracy requirement.The 2nd, to restriction is arranged service time of web plate.Because of making required figure on the web plate; And the tension force of web plate can change in time, and the variation of web plate tension force can produce the further reduction of printing aligning accuracy, even deformation is arranged and web plate can't be used; Therefore this technology is higher to the tensile stress homogeneity and the size requirements of web plate; After changing to a certain degree, can not continue again to use, so restriction is arranged the service time of web plate with service time.
The spin-coating photoetching process: at first the base version of existing electrode pattern to be processed is placed on the spin coater with an amount of liquid to be coated (light screening material) droplets of material on substrate, by hand or mechanical precoating put down; Open spin coater then to certain revolution, light screening material evenly is coated on the base version; To scribble again and be placed on litho machine on the base version of light screening material and (also be called: exposure machine); With electrode pattern and the contraposition of mask plate fit on the base version, to back, good position photolithographic exposure, again the base version that scribbles light screening material of photolithographic exposure is developed, obtain needed figure.This technology is the base version that the sensitization photomask directly is coated in figure to be gone up the back adopt mask contraposition photolithographic exposure method, so the fit aligning accuracy is high, is applicable to the making of various product.The problems and shortcomings of this technology: the one, equipment has high input, and operational danger is high.Adopt this technology need use spin coater, spin coater equipment except be worth higher, high speed rotating has certain danger.The 2nd, material cost expense aspect: stock utilization is low, and cost of manufacture is high.What this technology was used is the sensitization light screening material, and material price is high, and it is outside to adopt the spin coating proceeding most materials to be got rid of in the base version, and stock utilization is low, so material cost is high; The 3rd, aspect of performance: the photomask thickness evenness is poor.The film thickness that adopts this technology to apply, relevant with radius of turn, the light shield layer thickness of coating changes with the variation of radius of turn, and the light shield layer variable thickness that therefore applies causes.
Summary of the invention
The purpose of this invention is to provide a kind of can minimizing equipment input, the method for making of the high-contrast segmentation LCD that can save production cost and improve the quality of products again is to remedy the deficiency of prior art.
The objective of the invention is to realize like this: a kind of method for making of high-contrast segmentation LCD is characterized in that:
A. capillary film or photoresists are overlayed on the web plate, make Printing screen;
B. the printing screen plate of making is contained on the wire mark machine, the glass-based version that will have the ITO figure again is placed on the wire mark machine;
C. with liquid to be coated, promptly light screening material drops on the wire mark machine; Unlatching wire mark machine makes light screening material evenly be coated in the base version and goes up and oven dry, and photomask thickness is in the 1-2um scope;
D. will scribble on the glass-based version of light screening material and be placed on the litho machine (exposure machine); Again with electrode pattern on the glass-based version and the contraposition of mask plate fit, to back, good position photolithographic exposure;
E. the base version that scribbles light screening material of photolithographic exposure is developed, obtain needed figure.
Beneficial effect of the present invention is: overcome the deficiency of technology in the past, when improving the product precision, greatly reduced the acquisition expenses and the production material cost of process equipment.
Through embodiment the present invention is further described below:
Embodiment
Embodiment:
One, web plate is selected for use
1.0 select the half tone of suitable tension, tension force is generally (15-40) newton/centimetre (N/cm), representative value 22N/cm.
2.0 cleaning-drying
2.1 get the version of throwing the net, after first water drenches, pour out an amount of mill net cream again, be coated in the half tone pros and cons equably, be circular-arc scouring about 5 minutes with hairbrush then, more from top to bottom, wash from left to right with giant;
2.2 on the half tone of rinsing well, pour out an amount of degreasing agent, be equably about the about 2min of circular-arc wiping with hairbrush, rinse web plate well with giant again;
2.3 baking net; Half tone after demoulding or the degreasing is taken towards the net room, with DI water from top to bottom, from left to right rinsed well half tone, dry up half tone surface moisture content with air gun then, put into baking oven again and dry by the fire net by process stipulation.
3.0 silk screen gluing
3.1 be placed on the worktable with what half tone tilted, pour photoresists into slot scraping (be no more than slot scraping 1/2) then, the gluing order is evenly coating from bottom to top, earlier from coated on bottom side, when being coated with another side, is coated with after should half tone being inverted, to guarantee uniform film thickness behind the gluing again;
3.2 treat to be coated with again behind the pressure sensitive adhesive double coated bone dry, thickness gone directly be as the criterion to technological requirement;
3.3 behind the photoresists, must dry on the screen cloth by set point of temperature and time;
4.0 silk screen exposure
4.1 take out the corresponding film, check version, the used film will be used the alcohol clean;
4.2 the film is sticked on the centre position of half tone with invisible tape, when pasting the film, paste earlier on one side, wipe to another side with non-dust cloth then, the film is close on the half tone, to guarantee tight between the film and half tone, so that production operation;
4.3 will post the web plate of the film makes public by technological requirement.
5.0 develop
Good half tone is placed on the scouring table and manifests (hydraulic pressure should be ascending) with the hydraulic giant flushing until picture and text 5.1 will make public;
5.2 with DI water flushing half tone, it is dry that the half tone that will clean is then put into the baker post bake by technological requirement.
6.0 system net aftertreatment
6.1 the silk screen after inspection oven dry on the lamp stand has or not network blocking, pin hole etc. bad, network blocking must be done over again, and pin hole can be used and mend the repairing of net glue;
Two, light shield layer is made:
1.0 last half tone
Unclamp four gib screws on the screen printer half tone carrier, half tone lain on the carrier, move half tone, "+" cabinet frame alignment mark on the half tone is aimed at the alignment mark on the CCD.
2.0 silk-screen black film
2.1 scrape on the half tone of precontract 1cm evenly place one line applying liquid (light screening material) at glue with dropper.
2.2 contraposition glass is placed on steps on starting switch on the silk-screen platform after the pushing; This moment, screen printer carried out a silk-screen operation; Get a slice test-run a machine sheet after examination is printed 20 and measure thickness; Guarantee thickness in the 1-2um scope through fine setting, if not in scope, then constantly through regulating screen printer to reach required thickness.
2.3 the glass-based version of existing ITO electrode pattern to be processed is placed on the wire mark machine silk-screen applying liquid (light screening material).
2.4 will apply the glass of light screening material puts into the preliminary drying stove and toasts by technology.
2.5 check preliminary drying the glass certified products flow into subsequent processing, unacceptable product is done over again.
3.0 exposure
3.1 shifting to an earlier date film room according to the production model is ready to film plate or irons plate;
3.2 need with the film or iron plate and go up on the exposure machine on request, and with major light inspection, like the film or iron the plate surface dirty point is arranged, must be stained with acetone with dust-free paper dirty point is glued, till according with process requirements;
3.3 get 1 glass that coats photoresists; With cotton swab alignment mark wiping on glass is come out; Be put on the exposure machine platform screens then and inhale vacuum, adjust exposure machine CCD camera lens then, let the CCD camera lens clearly see the film or iron the alignment mark on the alignment mark peace table glass on the plate;
3.4 after the adjustment OK, take 10 of test-run a machine glass exposures to be used to debug development effect earlier, behind the development effect debugging OK, according to the process conditions exposure volume production glass of debugging;
3.5 during exposure, as select film exposure for use, exposure must not be lower than 600mj/cm2, as making public with ironing plate, exposure must not be lower than 280mj/cm2, in the production, is adjusting exposure according to actual development effect.
4.0 develop
4.1 before producing, by technological requirement with developer solution by proportioning (CD-820: DI water=2L: 100L) configure and circulate even;
4.2 after developer solution circulation is good, takes test-run a machine glass after the exposure to be put into to soak in the dipper and develop, and with the stopwatch 2Min that clocks; In this process, otherwise the development effect of section sight glass, like the OK that also do not develop to time glass; According to actual effect proper extension development time, the good glass that develops taken out to be put into cleans in the pure water groove, the developer solution of glass surface is cleaned up; Dry up with the water of air gun then, then glass is taken CCD and observe development effect down, behind the development effect OK glass surface; In 1 normal glass of developing according to this developing process examination, can develop in batches behind the OK;
5.0 post bake
The glass good 5.1 will develop inserts in the basket, and good purification baking oven toasts with 160 ℃ of constant temperature 40Min to put into cleaning;
5.2 the glass that post bake is good waits to cool to the flow process backward of coming out of the stove after the room temperature;

Claims (1)

1. the method for making of a high-contrast segmentation LCD is characterized in that:
A. photoresists are overlayed on the web plate, make Printing screen;
B. the Printing screen of making is contained on the wire mark machine, the glass-based version that will have the ITO figure again is placed on the wire mark machine;
C. with liquid to be coated, promptly light screening material drops on the Printing screen of making; Open the wire mark machine and make light screening material evenly be coated on the described glass-based version and oven dry, photomask thickness is in the 0.03-3um scope;
The glass-based version that d. will scribble light screening material is placed on the litho machine; Again with ITO figure and the contraposition of mask plate fit on the base version, to back, good position photolithographic exposure;
E. the base version that scribbles light screening material of photolithographic exposure is developed, obtain needed figure.
CN2010101261208A 2010-03-17 2010-03-17 Manufacturing method of segment liquid crystal display (LCD) with high contrast Active CN101806973B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010101261208A CN101806973B (en) 2010-03-17 2010-03-17 Manufacturing method of segment liquid crystal display (LCD) with high contrast

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010101261208A CN101806973B (en) 2010-03-17 2010-03-17 Manufacturing method of segment liquid crystal display (LCD) with high contrast

Publications (2)

Publication Number Publication Date
CN101806973A CN101806973A (en) 2010-08-18
CN101806973B true CN101806973B (en) 2012-08-22

Family

ID=42608830

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010101261208A Active CN101806973B (en) 2010-03-17 2010-03-17 Manufacturing method of segment liquid crystal display (LCD) with high contrast

Country Status (1)

Country Link
CN (1) CN101806973B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102566327B (en) * 2010-12-08 2016-06-08 无锡华润上华科技有限公司 Developing uniformity debugging method
TW201235776A (en) * 2011-02-17 2012-09-01 Brave C & H Supply Co Ltd Production method of printing screen plate with protective layer
CN102968241B (en) * 2012-12-24 2015-06-10 江西联创电子股份有限公司 Method for fabricating OGS glass with cover layer
CN103802444B (en) * 2014-01-25 2016-08-17 东莞南玻工程玻璃有限公司 A kind of colored glazed glass half tone and the manufacture method of colored glazed glass
CN106274039B (en) * 2016-08-16 2019-04-05 昆山良品丝印器材有限公司 Crystalline silicon printing halftone and its mask-making technology

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62285334A (en) * 1986-06-02 1987-12-11 Nec Kagoshima Ltd Manufacture of fluorescent character display tube
US6228538B1 (en) * 1998-08-28 2001-05-08 Micron Technology, Inc. Mask forming methods and field emission display emitter mask forming methods
CN100499200C (en) * 2004-09-02 2009-06-10 财团法人工业技术研究院 Method for making organic film transistor by high-precision printing
CN101470292B (en) * 2007-12-25 2010-11-17 比亚迪股份有限公司 Control method for bad voltage of LCD
CN201266291Y (en) * 2008-08-25 2009-07-01 深圳市宝盛电子技术有限公司 High-contrast black film liquid crystal display screen

Also Published As

Publication number Publication date
CN101806973A (en) 2010-08-18

Similar Documents

Publication Publication Date Title
CN101806973B (en) Manufacturing method of segment liquid crystal display (LCD) with high contrast
CN101462426B (en) Technology for printing sheet material with 3-D pattern
JP2015519613A (en) Manufacturing method of alignment film of mother board, transfer sheet and alignment liquid
CN102436094B (en) Liquid crystal display device and manufacturing method thereof
CN102049898A (en) Technology for producing liquid wallpaper silk screen mould
CN101153121B (en) Radiation-sensitive resin composition for spacer, spacer and method for forming the same
CN107193184A (en) A kind of method for preparing high-precision chromium plate mask plate circuitous pattern
CN109521641A (en) A kind of UV mold version lithographic fabrication process
CN102681243B (en) Display, and display module and manufacturing method thereof
CN106158590A (en) A kind of TFT processing technique of Thin Film Transistor-LCD
CN107390415A (en) TFT LCD liquid crystal display screen manufacture crafts
CN101995777B (en) For peeling off the composition of colour filter and using the method for its regeneration colour filter
CN202362559U (en) Liquid crystal display device
CN109703225A (en) A kind of silk-screen deviation ameliorative way
CN114236889B (en) LCD preparation method
CN104020608A (en) Display panel manufacturing method, display panel and display device
JP2006018263A (en) Photo development apparatus and method for fabricating color filter substrate using photo development apparatus
CN108267881B (en) LCD production process method for reducing rainbow phenomenon
JPH02290277A (en) Method and apparatus for applying viscous liquid
CN104802550A (en) Simple silk-screen printing process
CN109932842A (en) A method of reducing PI liquid cost
CN114690476B (en) Display panel and manufacturing method thereof
CN114280832B (en) Preparation method of LCD and TP integrated color liquid crystal display screen
TW594175B (en) A method for preparing films photosensitive resin composition for liquid crystal displays
CN101382614B (en) Optical filter copy process

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
PE01 Entry into force of the registration of the contract for pledge of patent right

Denomination of invention: Manufacturing method of segment liquid crystal display (LCD) with high contrast

Effective date of registration: 20151229

Granted publication date: 20120822

Pledgee: Yibin commercial bank Limited by Share Ltd science and Technology Branch

Pledgor: Yibin Yingtai Photoelectric Co.,Ltd.

Registration number: 2015990001182

PLDC Enforcement, change and cancellation of contracts on pledge of patent right or utility model