CN101793988A - Method for accurately adjusting groove density in light path for making holographic grating - Google Patents
Method for accurately adjusting groove density in light path for making holographic grating Download PDFInfo
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- CN101793988A CN101793988A CN200910215451A CN200910215451A CN101793988A CN 101793988 A CN101793988 A CN 101793988A CN 200910215451 A CN200910215451 A CN 200910215451A CN 200910215451 A CN200910215451 A CN 200910215451A CN 101793988 A CN101793988 A CN 101793988A
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Abstract
The invention relates to a method for accurately adjusting groove density in a light path for making a holographic grating, belonging to a method in the field of spectroscopic technology. The invention solves the technical problem of providing a method for accurately adjusting groove density in a light path for making a holographic grating. The technical scheme is that: step one: a Lloyd mirror exposure optical system is configured for holographic grating exposure; step two: a reference grating is placed in the Lloyd mirror exposure optical system, and the interference fringe density of an interference field is adjusted to be the same as the groove density of the reference grating; and step three: a grating substrate used for exposure and coated with photoresist is placed at the position of the reference grating to enable the groove density of the grating after exposure to be the same as the interference fringe density of the interference field. By adopting the Moire fringe technique, the periodic measurement of the micron-grade interference fringes of the interference field is converted to the measurement of micron-grade Moire fringes, thereby the groove density of the holographic grating can be accurately determined and the method is of great practical significance to the making of holographic gratings.
Description
Technical field
The invention belongs to relate in the spectral technique field a kind of in holographic grating making optical path the method for accurately adjusting groove density.
Background technology
Grating constant is the very important technical indicator of diffraction grating, so-called grating constant is meant the inverse of every millimeter groove number, the dispersive power and the resolution of its decision grating, the accuracy of grating constant directly influences the wavelength accuracy of spectral instrument, must give strict control in manufacturing process.
When making holographic grating, the grating substrate that scribbles photoresist is placed in the interference field exposes, by the interference fringe in the photoresist record interference field, the density of this interference fringe is the incisure density of being made grating.When exposure wavelength one timing, the unique angle that depends on two bundle directional lights of the density of interference fringe.The method of conventional sense incisure density generally all is after finishing preparing grating, by measuring the incisure density that 0 grade of angle with 1 order diffraction light of grating calculates grating, measuring error is bigger, the light path adjustment process does not have fixed base to comply with, only adjust by rule of thumb, often to pass through a plurality of preparing grating bouts, and be difficult to meet the requirements of precision.
The prior art the most approaching with the present invention is that China Patent No. is CN 1544994A, denomination of invention is " method of accurately adjusting groove density in a kind of manufacturing of plane holographic grating ", in the method, the holographic grating exposure device of setting up comprises LASER Light Source 1, first catoptron 2 and second catoptron 3, expands and restraint wave filter 4, collimating mirror 5, the first adjustment catoptron 6, second adjustment catoptron 7 and the interference field 8 as shown in Figure 1; As the benchmark grating, the interference fringe density of adjusting interference field 8 is consistent with benchmark grating incisure density, makes the nominal value of holographic grating incisure density to be made consistent with the incisure density of machine engraving grating with the machine engraving grating of standard.This method is simple and feasible, easy operating, accurately control plane holographic grating incisure density.But this method is not suitable for Lip river Chinese mugwort mirror exposure optical system just at the double mirror exposure optical system with two adjustment catoptrons.
Summary of the invention
In order to overcome the defective that above-mentioned prior art exists, the objective of the invention is to set up the method for the accurate adjustment grating line density of the Lip river Chinese mugwort mirror exposure optical system that a kind of simple and feasible being applicable to have only an adjustment catoptron.
The technical problem to be solved in the present invention is: provide a kind of in holographic grating making optical path the method for accurately adjusting groove density.The technical scheme of technical solution problem is: first, be equipped with the Lip river Chinese mugwort mirror exposure optical system that a cover is used for the holographic grating exposure, as shown in Figure 2, comprise LASER Light Source 11, first plane mirror 12 and second plane mirror 13, spatial filter 14, collimating mirror 15, adjust catoptron 16, come from collimating mirror 15 the first beam recording light 17, come from the second beam recording light 18 and the interference field 19 of adjusting catoptron 16; Second, in the Chinese mugwort mirror exposure optical system of the Lip river of holographic grating exposure shown in Figure 2, in interference field 19, place benchmark grating 20, as shown in Figure 3, the groove direction that makes benchmark grating 20 is perpendicular to the plane of being made up of the first beam recording light 17 and the second beam recording light 18, the surface of benchmark grating 20 is towards collimating mirror 15, the normal parallel of benchmark grating 20 is in the front surface of adjusting catoptron 16, that is to say benchmark grating 20 and adjust 16 one-tenth 90 ° of angles of catoptron, at this moment, the first beam recording light 17 and the second beam recording light 18 shine on the surface of benchmark grating 20; Adjust catoptron 16 and benchmark grating 20, make the first beam recording light 17 through-2 order diffraction light of benchmark gratings 20 and the second beam recording light 18 pass through benchmark gratings 20+1 order diffraction light is along the equidirectional outgoing, on the light path of this two bundles diffraction light outgoing, be equipped with receiving screen 21, receiving screen 21 surfaces are vertical with two bundle diffraction light exit directions, this two bundles diffraction light shines on the receiving screen 21, on receiving screen 21, can form Moire fringe, as shown in Figure 4, the careful angle of pitch and the position angle of adjusting catoptron 16 and benchmark grating 20, with the Moire fringe that guarantees on receiving screen 21, to obtain perpendicular to the plane of being formed by the first beam recording light 17 and the second beam recording light 18, and width of fringe maximum; At this moment, the interference fringe density in the interference field 19 is identical with the incisure density of benchmark grating 20; The 3rd, take off benchmark grating 20 and receiving screen 21, the grating substrate 22 that scribbles photoresist is placed on the position at original benchmark grating 20 places, as shown in Figure 5, make grating substrate 22 record that scribbles photoresist by the first beam recording light 17 and the second beam recording light 18 forms interference fringe, the density of this interference fringe is by the incisure density of making holographic grating.
Principle of work explanation of the present invention: place a machine engraving grating identical as the benchmark grating with holographic grating grating constant to be made at the localization face of interference fringe, superimposed behind the two beam recording light process benchmark optical grating diffraction, just produce Moire fringe, by check, realize accurate adjustment to the interference field fringe period to Moire fringe.In interference field 19, put into benchmark grating 20, adjust benchmark grating 20 surfaces and become 90 ° of angles with adjustment catoptron 16 surfaces; Adjust the pitching and the orientation of catoptron 16 and benchmark grating 20, make the first beam recording light 17 through-2 order diffraction light of benchmark gratings 20 and the second beam recording light 18 pass through benchmark gratings 20+1 order diffraction light is along the equidirectional outgoing, be equipped with receiving screen 21 in this direction, on receiving screen 21, can form Moire fringe, the careful angle of pitch and the position angle of adjusting catoptron 16 and benchmark grating 20, with the Moire fringe that guarantees on receiving screen 21, to obtain perpendicular to the plane of being formed by the first beam recording light 17 and the second beam recording light 18, and width of fringe maximum; At this moment, the interference fringe direction in the interference field 19 is identical with the groove direction of benchmark grating 20, and the interference fringe density in the interference field 19 is identical with the incisure density of benchmark grating 20, and the density of this interference fringe is exactly to wait to make the incisure density of holographic grating.
Good effect of the present invention: accurately adjust incisure density in the holographic grating making optical path by Moire fringe technique, period measurement to micron-sized interference field interference fringe can be converted to measurement to millimetre-sized Moire fringe, make and exactly determined holographic grating grating constant to become definite easily, adopt this method to have bigger practical significance for making the high precision plane holographic grating.
Description of drawings
Fig. 1 is that the prior art China Patent No. is the holographic grating exposure device light channel structure synoptic diagram of CN 1544994A;
Fig. 2 is the holographic grating exposure device light channel structure synoptic diagram that adopts among the present invention;
Fig. 3 adds benchmark grating and the formed optical interference circuit synoptic diagram of receiving screen in holographic exposure device light path shown in Figure 2;
Fig. 4 is the Moire fringe synoptic diagram that shows on the receiving screen in the optical interference circuit shown in Figure 3;
Fig. 5 is the holographic grating making optical path synoptic diagram that adds the grating substrate that scribbles photoresist in optical interference circuit shown in Figure 2.
Embodiment
The present invention presses Fig. 2,3, light channel structure shown in 5 and by above-mentioned first, second, third party's method step is implemented, LASER Light Source 11 adopts krypton ion laser, wavelength is 413.1nm, first plane mirror 12 and second plane mirror 13 are the substrate of glass aluminum reflector, spatial filter 14 is made up of microcobjective and pin hole, the bore of collimating mirror 15 is ф 320mm, focal distance f=1.2m, adjusting catoptron 16 is the substrate of glass aluminum reflector, benchmark grating 20 need be according to the actual reflection grating that requires the choice criteria incisure density, receiving screen 21 adopts ordinary white frosted glass, K9 optical glass is adopted in grating substrate 22, the Shipley 1805 type photoresists that the photoresist that applies on the K9 optical glass produces for Japan.
Claims (1)
1. the method for an accurately adjusting groove density in holographic grating making optical path is to realize by the interference fringe density of adjusting interference field in the exposure light path; It is characterized in that: first, be equipped with the Lip river Chinese mugwort mirror exposure optical system that a cover is used for the holographic grating exposure, comprise LASER Light Source (11), first plane mirror (12) and second plane mirror (13), spatial filter (14), collimating mirror (15), adjust catoptron (16), come from collimating mirror (15) the first beam recording light (17), come from the second beam recording light (18) and the interference field (19) of adjustment catoptron (16); Second, in the Chinese mugwort mirror exposure optical system of the Lip river of holographic grating exposure, in interference field (19), place benchmark grating (20), the groove direction that makes benchmark grating (20) is perpendicular to the plane of being made up of the first beam recording light (17) and the second beam recording light (18), the surface of benchmark grating (20) is towards collimating mirror (15), the normal parallel of benchmark grating (20) is in the front surface of adjusting catoptron (16), that is to say that benchmark grating (20) becomes 90 ° of angles with adjustment catoptron (16), at this moment, the first beam recording light (17) and the second beam recording light (18) shine on the surface of benchmark grating (20); Adjust catoptron (16) and benchmark grating (20), make the first beam recording light (17) through-2 order diffraction light and the second beam recording light (18) of benchmark grating (20) pass through benchmark grating (20)+1 order diffraction light is along the equidirectional outgoing, on the light path of this two bundles diffraction light outgoing, be equipped with receiving screen (21), receiving screen (21) surface is vertical with two bundle diffraction light exit directions, this two bundles diffraction light shines on the receiving screen (21), on receiving screen (21), can form Moire fringe, the careful angle of pitch and the position angle of adjusting catoptron (16) and benchmark grating (20), with the Moire fringe that guarantees on receiving screen (21), to obtain perpendicular to the plane of being formed by the first beam recording light (17) and the second beam recording light (18), and width of fringe maximum; At this moment, the interference fringe density in the interference field (19) is identical with the incisure density of benchmark grating (20); The 3rd, take off benchmark grating (20) and receiving screen (21), the grating substrate (22) that scribbles photoresist is placed on the position at original benchmark grating (20) place, make grating substrate (22) record that scribbles photoresist by the first beam recording light (17) and the second beam recording light (18) form interference fringe, the density of this interference fringe is by the incisure density of making holographic grating.
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| CN200910215451A CN101793988A (en) | 2009-12-31 | 2009-12-31 | Method for accurately adjusting groove density in light path for making holographic grating |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102087480A (en) * | 2010-12-22 | 2011-06-08 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting real-time monitoring device in exposure light path of planar holographic grating |
| CN103335592A (en) * | 2013-06-21 | 2013-10-02 | 南京师范大学 | Double Lloyd's mirror digital holographic microscopic measurement method |
| CN103698836A (en) * | 2013-12-17 | 2014-04-02 | 中国科学院长春光学精密机械与物理研究所 | Method for precisely regulating direction of interference fringes in scanning exposure light path |
| CN103698835A (en) * | 2013-12-17 | 2014-04-02 | 中国科学院长春光学精密机械与物理研究所 | Holographic grating exposure method adopting heterodyne interference fringe locking control |
| CN108318954A (en) * | 2018-04-09 | 2018-07-24 | 苏州大学 | It is a kind of to make a meter system and method for magnitude grating |
| CN109407194A (en) * | 2018-12-19 | 2019-03-01 | 清华大学 | It is used to form the device of grating |
| CN112835263A (en) * | 2019-11-22 | 2021-05-25 | 北京理工大学 | Single-step exposure method and device for liquid crystal computer hologram |
| CN114415278A (en) * | 2022-01-14 | 2022-04-29 | 吉林大学 | Design method for planar variable-pitch grating scanning photoetching interference fringe line density |
| CN114740557A (en) * | 2022-01-14 | 2022-07-12 | 吉林大学 | Method for designing linear density of fringe by eliminating aberration and changing grating pitch in raster scanning photoetching |
-
2009
- 2009-12-31 CN CN200910215451A patent/CN101793988A/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102087480A (en) * | 2010-12-22 | 2011-06-08 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting real-time monitoring device in exposure light path of planar holographic grating |
| CN102087480B (en) * | 2010-12-22 | 2012-02-08 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting real-time monitoring device in exposure light path of planar holographic grating |
| CN103335592A (en) * | 2013-06-21 | 2013-10-02 | 南京师范大学 | Double Lloyd's mirror digital holographic microscopic measurement method |
| CN103335592B (en) * | 2013-06-21 | 2016-01-27 | 南京师范大学 | Two Lloyd's mirror digital holographic micro-measuring method |
| CN103698836A (en) * | 2013-12-17 | 2014-04-02 | 中国科学院长春光学精密机械与物理研究所 | Method for precisely regulating direction of interference fringes in scanning exposure light path |
| CN103698835A (en) * | 2013-12-17 | 2014-04-02 | 中国科学院长春光学精密机械与物理研究所 | Holographic grating exposure method adopting heterodyne interference fringe locking control |
| CN103698835B (en) * | 2013-12-17 | 2015-10-28 | 中国科学院长春光学精密机械与物理研究所 | Adopt the holographic grating exposure method that heterodyne system locking of interference fringe controls |
| CN103698836B (en) * | 2013-12-17 | 2015-12-02 | 中国科学院长春光学精密机械与物理研究所 | The method in accurate adjustment interference fringe direction in scan exposure light path |
| CN108318954A (en) * | 2018-04-09 | 2018-07-24 | 苏州大学 | It is a kind of to make a meter system and method for magnitude grating |
| CN108318954B (en) * | 2018-04-09 | 2019-12-27 | 苏州大学 | System and method for manufacturing meter-level grating |
| CN109407194A (en) * | 2018-12-19 | 2019-03-01 | 清华大学 | It is used to form the device of grating |
| CN112835263A (en) * | 2019-11-22 | 2021-05-25 | 北京理工大学 | Single-step exposure method and device for liquid crystal computer hologram |
| CN112835263B (en) * | 2019-11-22 | 2024-05-24 | 北京理工大学 | Single-step exposure method and device for liquid crystal calculation hologram |
| CN114415278A (en) * | 2022-01-14 | 2022-04-29 | 吉林大学 | Design method for planar variable-pitch grating scanning photoetching interference fringe line density |
| CN114740557A (en) * | 2022-01-14 | 2022-07-12 | 吉林大学 | Method for designing linear density of fringe by eliminating aberration and changing grating pitch in raster scanning photoetching |
| CN114740557B (en) * | 2022-01-14 | 2022-11-29 | 吉林大学 | Method for designing linear density of fringe by eliminating aberration and changing grating pitch in raster scanning photoetching |
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Open date: 20100804 |