CN101768765A - 电解液及利用此电解液制造铜箔的方法 - Google Patents
电解液及利用此电解液制造铜箔的方法 Download PDFInfo
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- CN101768765A CN101768765A CN200810189120A CN200810189120A CN101768765A CN 101768765 A CN101768765 A CN 101768765A CN 200810189120 A CN200810189120 A CN 200810189120A CN 200810189120 A CN200810189120 A CN 200810189120A CN 101768765 A CN101768765 A CN 101768765A
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CN 200810189120 CN101768765B (zh) | 2008-12-29 | 2008-12-29 | 电解液及利用此电解液制造铜箔的方法 |
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CN 200810189120 CN101768765B (zh) | 2008-12-29 | 2008-12-29 | 电解液及利用此电解液制造铜箔的方法 |
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CN101768765A true CN101768765A (zh) | 2010-07-07 |
CN101768765B CN101768765B (zh) | 2013-03-13 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103911635A (zh) * | 2014-03-21 | 2014-07-09 | 复旦大学 | 一种电镀铜溶液 |
WO2017000890A1 (zh) * | 2015-07-01 | 2017-01-05 | 张志梁 | 一种钢铁基体上直接无氰酸性镀铜镀液及工艺 |
CN111041530A (zh) * | 2019-12-30 | 2020-04-21 | 中国科学院青海盐湖研究所 | 一种高抗拉强度铜箔及其制备方法与*** |
Family Cites Families (3)
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DD264030A1 (de) * | 1987-08-26 | 1989-01-18 | Leipzig Galvanotechnik | Elektrolyt zur abscheidung von glanzkupferschichten mit erhoehter mikrohaerte |
US20050284766A1 (en) * | 2004-06-25 | 2005-12-29 | Herdman Roderick D | Pulse reverse electrolysis of acidic copper electroplating solutions |
CN101122035B (zh) * | 2006-08-11 | 2012-06-20 | 财团法人工业技术研究院 | 铜箔的制造方法 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103911635A (zh) * | 2014-03-21 | 2014-07-09 | 复旦大学 | 一种电镀铜溶液 |
CN103911635B (zh) * | 2014-03-21 | 2016-02-24 | 复旦大学 | 一种电镀铜溶液 |
WO2017000890A1 (zh) * | 2015-07-01 | 2017-01-05 | 张志梁 | 一种钢铁基体上直接无氰酸性镀铜镀液及工艺 |
CN111041530A (zh) * | 2019-12-30 | 2020-04-21 | 中国科学院青海盐湖研究所 | 一种高抗拉强度铜箔及其制备方法与*** |
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CN101768765B (zh) | 2013-03-13 |
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Effective date of registration: 20170601 Address after: Hsinchu County, Taiwan, China Co-patentee after: Changchun Petrochemical Co., Ltd. Patentee after: Industrial Technology Research Institute Address before: Hsinchu County, Taiwan, China Patentee before: Industrial Technology Research Institute |
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Effective date of registration: 20180409 Address after: Hsinchu County, Taiwan, China Co-patentee after: Changchun Petrochemical Co., Ltd. Patentee after: Industrial Technology Research Institute Co-patentee after: Li Changrong Polytron Technologies Inc Address before: Hsinchu County, Taiwan, China Co-patentee before: Changchun Petrochemical Co., Ltd. Patentee before: Industrial Technology Research Institute |