CN101764021A - Ion pipe and ion beam extraction method - Google Patents
Ion pipe and ion beam extraction method Download PDFInfo
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- CN101764021A CN101764021A CN200910262405A CN200910262405A CN101764021A CN 101764021 A CN101764021 A CN 101764021A CN 200910262405 A CN200910262405 A CN 200910262405A CN 200910262405 A CN200910262405 A CN 200910262405A CN 101764021 A CN101764021 A CN 101764021A
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- ion beam
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Abstract
The invention provides an ion pipe and ion beam extraction method, wherein the ion pipe is arranged with a plurality of ion beam extraction holes, so that the ion beam current density becomes uniform. The ion pipe has a plasma generating member composed of cathode and anode, and a grid for extracting ion beams from the plasma, wherein the grid has a plurality of or a chain of ion beam extraction holes along the long side direction, by taking the center part of the plurality of or the chain of ion beam extraction holes as an origin point, taking the long side direction as the x shaft direction and taking the ion beam emission direction as the positive direction of z shaft, the ion pipe also includes: a first magnet, configured surrounding the plurality of or the chain of ion beam extraction holes, and applying a magnetic field in the positive direction of z shaft to the plurality of or the chain of ion beam extraction holes; and a second magnet, configured at the end of the plurality of or the chain of ion beam extraction holes, and applying a magnetic field in the x shaft origin point direction to the vicinity of the end.
Description
Technical field
The present invention relates to ionic tube, particularly relate to and to be arranged with the outbound course of ion beam of the ionic tube of a plurality of ion beam fairleads.
Background technology
Ionic tube generally is used for the frequency adjusting device of piezoelectric element etc., and its principle is, at the inner plasma that generates of ionic tube, this plasma is applied the magnetic field that ion beam penetrates direction, draws ion and make its acceleration from plasma, thereby form ion beam.
Disclosed ionic tube disposes a plurality of ion beam fairleads in patent documentation 1, and penetrates the ion beam with corresponding density peak value.
In Fig. 1, ionic tube is by constituting with lower member: be set up in the parallel ring-type of filament (negative electrode) 10 between a pair of silk electrode, long side direction and filament 10 anode 20, have the grid 30 of a plurality of ion beam fairleads 31 and the main body 40 that filament 10 and anode 20 is arranged and a plurality of ion beam fairleads 31 are exposed at inner sealing.Negative electrode 10 and anode 20 constitutes plasmas and generates members, is connected with separately power supply (not shown).In addition, main body 40 has the gas introduction port 41 that is used to import discharge gas.
Figure 11 A and Figure 11 B are end view and the vertical views around the anode 20 of the prior art.
Shown in Figure 11 B, grid 30 is provided with a plurality of ion beam fairleads 31 of arranging along the x direction of principal axis in the zone of dividing with the periphery of anode 20.
The action of ionic tube is: at first, discharge gass such as argon are imported to main body 40 inside from gas introduction port 41.And target 10 applies negative voltage respectively, and antianode 20 applies positive voltage, discharges by this voltage difference, produces plasma.After grid 30 being applied voltage, from plasma, ion drawn and make its acceleration by a plurality of ion beam fairleads 31, thereby form ion beam with not shown power supply.
Shown in Figure 11 A and Figure 11 B, around ion beam fairlead 31, be equipped with a plurality of first magnetites 50, its S utmost point is towards z axle positive direction (ion beam ejaculation direction), and the N utmost point is towards z axle negative direction.By described first magnetite 50, form the magnetic field of the z axle positive direction in the ion beam fairlead 31, improved plasma density.
Figure 11 C shows the Distribution of Magnetic Field of above-mentioned ionic tube.
Figure 11 D shows the position of this structure middle distance grid face 25mm, promptly disposes the current density of ion beam of the position of treatment substrate.As shown in the figure, each peak value is corresponding with each ion beam fairlead 31, and the density peak value of end side significantly reduces than near the density peak value the center.Like this, in the structure of Figure 11 A and Figure 11 B, have the uneven problem of ion beam current density sometimes.
This problem is described in detail below.
In order to obtain the uniform ion electric current distribution, need make near the density of the plasma the fairlead of the ejaculation that helps ion beam even in the treatment substrate side.Under the situation of the ionic tube with structure shown in Figure 1, the heat radiation by the filament end forms the Temperature Distribution of convex (promptly from central division temperature reduce) laterally, generates plasma and continues required electronics along with become not enough near the end.
Consequently, plasma density is shown in the curve a of Figure 12, and the plasma density with anodes centre is relatively higher and more by the low more tendency in end.Also be same under the situation of this tendency in the zone of the fairlead that is defined in the ejaculation that helps ion beam, the current density of end reduces with respect near the current density the center shown in Figure 11 D.
For the problems referred to above, disclose along long side direction in the patent documentation 2 and disposed a plurality of filaments, and the structure that each filament is controlled respectively with each power supply.In this structure, the more electric power of filament consumption of a plurality of filament medial end portions sides, thus the current density of the ion beam of the end side of feasible correspondence increases.
Patent documentation 1: TOHKEMY 2006-100205 communique
Patent documentation 2: TOHKEMY 2007-311118 communique
Yet in patent documentation 2 described structures, the current density that increase the ion beam end makes the current density homogenizing, and the electric power of switching on to the filament of end side is increased considerably, and consumes electric power and increases, and is therefore not preferred.In addition, the corresponding a plurality of filament of having to is provided with a plurality of power supplys, in the structure complicated of ionic tube, maximization, and the problem that also exists cost to improve.
Summary of the invention
Thereby,, be desirably under the prerequisite of the power supply formula that does not change filament the problem that the current density of the ion beam of solution end side reduces for the ionic tube that is arranged with a plurality of ion beam fairleads.
The described ionic tube of first invention of the present invention has the plasma that is made of negative electrode and anode and generates member, and from by the grid of drawing ion beam the plasma, grid has a plurality of or a series of ion beam fairlead along long side direction, central part with a plurality of or a series of ion beam fairlead is an initial point, with the long side direction is the x direction of principal axis, penetrating direction with ion beam is z axle positive direction, this ionic tube also has: first magnetite, its be disposed at a plurality of or a series of ion beam fairlead around, and a plurality of or a series of ion beam fairlead is applied the magnetic field of z axle positive direction; And second magnetite, it is disposed at the end of a plurality of or a series of ion beam fairlead, to applying the magnetic field of x axle initial point direction near the end.
Wherein, with with the x axle vertical with the z axle the axle be the y axle, at least 4 second magnetites are disposed at x axisymmetric position and the y axisymmetric position that surrounds a plurality of or a series of ion beam fairlead, and second magnetite S utmost point separately is towards x axle initial point direction, and the N utmost point is configured towards its rightabout.
The method that ion beam in the ionic tube that will be arranged with a plurality of ion beam fairleads in a second aspect of the present invention is drawn may further comprise the steps: (A) in the inner step that generates plasma of ionic tube; And (B) penetrate direction (z axle positive direction) to the ion beam of these a plurality of ion beam fairleads and apply magnetic field by first magnetite, and apply from the end of these a plurality of ion beam fairleads towards the magnetic field of central part direction (x axle initial point direction) by second magnetite, and the grid that is formed with these a plurality of ion beam fairleads applied voltage, draw ion and make the step of its acceleration.
In the ionic tube that is arranged with a plurality of ion beam fairleads, distribution by the improvement magnetic line of force has solved the problem that the ion beam current density of end side reduces, therefore the electric power that can not increase consumption, and realize the homogenizing of ion beam current density effectively with simple and inexpensive method.
Description of drawings
Fig. 1 is the figure of the ionic tube of explanation the present invention and conventional example.
Fig. 2 A is the figure that the first embodiment of the present invention is shown.
Fig. 2 B is the figure that the first embodiment of the present invention is shown.
Fig. 2 C is the figure of the explanation first embodiment of the present invention.
Fig. 2 D is the figure of the explanation first embodiment of the present invention.
Fig. 3 is the figure of explanation principle of the present invention.
Fig. 4 A is the figure to first embodiment of the present invention supplementary notes.
Fig. 4 B is the figure to first embodiment of the present invention supplementary notes.
Fig. 5 A is the figure that the second embodiment of the present invention is shown.
Fig. 5 B is the figure that the second embodiment of the present invention is shown.
Fig. 6 is the figure to the present invention's supplementary notes.
Fig. 7 is the figure to the present invention's supplementary notes.
Fig. 8 A is the figure that reference example 1 is shown.
Fig. 8 B is the figure that reference example 1 is shown.
Fig. 8 C is the figure that reference example 1 is shown.
Fig. 8 D is the figure of description references example 1.
Fig. 9 A is the figure that reference example 2 is shown.
Fig. 9 B is the figure that reference example 2 is shown.
Fig. 9 C is the figure that reference example 2 is shown.
Fig. 9 D is the figure of description references example 2.
Figure 10 A is the figure that the third embodiment of the present invention is shown.
Figure 10 B is the flow chart of the explanation third embodiment of the present invention.
Figure 11 A is the figure that conventional example is shown.
Figure 11 B is the figure that conventional example is shown.
Figure 11 C is the figure of explanation conventional example.
Figure 11 D is the figure of explanation conventional example.
Figure 12 is the figure of the general ionic tube of explanation.
Embodiment
Embodiment 1
The periphery of anode 20 of the ionic tube of first embodiment has been shown in Fig. 2 A and Fig. 2 B.In addition, the structure of the filament of ionic tube of the present invention (negative electrode) 10, grid 30, main body 40 and first magnetite 50 is identical with the structure shown in above-mentioned Fig. 1, Figure 11 A and Figure 11 B, therefore omits its explanation.
Shown in Fig. 2 A and Fig. 2 B, the ionic tube of present embodiment also has 4 with respect to x axle and axisymmetric second magnetite 60 of y.Second magnetite 60 is configured to the S utmost point respectively towards x axle initial point direction, and the N utmost point is towards its rightabout, and applies the magnetic field of x axle initial point direction near the end (end of anode 20) to ion beam fairlead 31.In addition, for convenience of description, be provided with 4 second magnetites 60, yet also can be 8,12 etc.
Fig. 2 C shows the Distribution of Magnetic Field of above-mentioned ionic tube.As shown in the figure, under the effect of second magnetite 60, (magnetic line of force of x axle ± 30～45mm) is towards ion beam fairlead 31 central portions (x axle initial point direction) near the end of a plurality of ion beam fairleads 31, should improve near the plasma density the end towards the magnetic field of inboard, help drawing of ion beam.
Yet the electronics in the known plasma that is in the same magnetic field carries out screw along the magnetic line of force shown in Fig. 3 (a).Under the situation of ion current density homogenizing, the distribution of plasma density only evenly gets final product in the zone of fairlead shown in the line b of Figure 12.In the present embodiment, by second magnetite 60 is configured shown in Fig. 2 A and Fig. 2 B, the magnetic line of force that makes the anode end shown in Fig. 3 (b) is towards the inboard, and makes the zone of the electronics of end towards fairlead therewith together, thereby the plasma density in the zone of fairlead is adjusted.
Fig. 2 D shows the current density of the ion beam of the position that in the position of this structure middle distance grid face 25mm, promptly disposes treatment substrate.In Fig. 2 D, the peak value of current density is corresponding with each ion beam fairlead 31.Compare as can be known with Figure 11 D, the ion beam current density peak value of the density peak value of ion beam end side and central portion is roughly par, thereby makes ion beam current density roughly even on the x direction of principal axis.
In addition, the 60 highly preferred configurations of second magnetite have been shown in the foregoing description 1, second magnetite 60 also can adopt other configurations so long as can apply the magnetic field of x axle initial point direction near the plasma the end (end of anode 20) of ion beam fairlead 31.
For example, shown in Fig. 4 A and Fig. 4 B, also second magnetite 60 can be disposed at the outside of grid 30.In this structure, also can play same effect and effect.
Embodiment 2
In Fig. 5 A and Fig. 5 B, the second embodiment of the present invention has been shown.What second magnetite 60 adopted in embodiment 1 is permanet magnet, and employing in the present embodiment is electromagnet.In Fig. 5 A and Fig. 5 B, second magnetite 60 coil (oblique line portion) of on the core of magnetic material, reeling, by power supply (not shown) thus its energising is produced magnetic force.In addition, in the present embodiment, second magnetite 60 also is to be the S utmost point with the central side, and opposite side is the N utmost point.
In this structure, also can access the effect identical with the foregoing description 1.
At this, antianode 20 supplementary notes.Fig. 6 (a)～(d) is the shape that anode is shown
The figure of the variation of (being vertical view).Fig. 6 (a) is the cyclic formula electrode shown in Fig. 2 B, and other for example Fig. 6 (b) is the shape that separates along long side direction, and Fig. 6 (c) is the コ word shape, and Fig. 6 (d) is the shape that broad ways separates, or the like.In addition, it is square not limiting, and also can be oval.In addition, also anode 20 can be set, and with main body 4 self as anode.
In addition, a plurality of ion beam fairleads 31 are remarked additionally.Fig. 7 (a)～(e) is the figure that the variation of a plurality of ion beam fairleads 31 is shown.As shown in the figure, except Fig. 2 B (being Fig. 7 (d)), ion beam 31 can be a different shape." a plurality of ion beam fairlead " mentioned in the scope of this specification and claim comprises the above-mentioned whole forms that illustrate for example and other similar forms.
Reference example 1
Shown in Fig. 8 A and Fig. 8 B is in second magnetite 60, and the N utmost point is disposed at x axle initial point direction, and the S utmost point is disposed at its rightabout situation (opposite with the polarity of Fig. 2 A and Fig. 2 B).Thus, near the end of ion beam fairlead 31, apply the magnetic field of x axle lateral direction.
Shown in Fig. 8 C, by second magnetite 60, near the magnetic field the end of a plurality of ion beam fairleads 31 is towards the outside of ion beam fairlead 31.
Shown in Fig. 8 D, not only the inhomogeneities of ion beam current density increases, and current density integral body has reduced.
Reference example 2
Shown in Fig. 9 A and Fig. 9 B is in second magnetite 60, and the S utmost point is disposed at z axle positive direction, and the N utmost point is disposed at its rightabout.Thus, shown in Fig. 9 C, near the end of ion beam fairlead 31, apply the magnetic field of z axle positive direction.The notion of this structure (that is, do not change magnetic field vector direction and change its big or small notion) similar with the situation of the electric power of the increase end side filament of patent documentation 2.
Shown in Fig. 9 D, though this ion beam current density integrally improved than the situation of Figure 11 D, yet its inhomogeneities is not eliminated basically.
Can know that by reference example 1 and reference example 2 for the configuration of second magnetite, the structure shown in each embodiment is preferred.The method of particularly improving magnetic direction of the present invention is being eliminated better effects if aspect inhomogeneous that ion beam current distributes than the method in patent documentation 2 described reinforcement magnetic fields.
Embodiment 3
In the foregoing description 1 and embodiment 2, second magnetite 60 is fixed, yet in the present embodiment, on the basis of reference example 1 and reference example 2, makes it that variable-angle is set.
Thus, the peak value of the particularly end of ion beam current density can be adjusted, the homogenizing that current density is more strict can be realized.
In addition, what also can make 4 second magnetites 60 is provided with angle interlock, perhaps makes a pair of second magnetite 60 interlocks on x axisymmetric position, y axisymmetric position or the diagonal position, perhaps makes 4 angle is set can adjusts respectively.
Wherein, so long as angle is set can adjusts from the outside when ion beam penetrates of second magnetite 60 just can adjust when ion beam irradiation, thereby more preferred.
Figure 10 B is the flow chart that ion beam outbound course under this situation is shown.
In step S100, from gas introduction port 41, discharge gass such as argon are imported, filament (negative electrode) 10 is applied negative voltage, antianode 20 applies positive voltage, by discharge generation plasma therebetween.
In step S110, in the magnetic field that applies z axle positive direction by first magnetite 50, apply by second magnetite 60 under the state in magnetic field of x axle initial point direction, grid 30 is applied voltage, from plasma, draw ion, and make its acceleration.
At this constantly, under the high situation of the end side peakedness ratio central portion peak value of ion beam current density, in step S120, adjust the angle that is provided with of second magnetite 60, adjust the distribution of density peak value.In addition, be under the situation of electromagnet at second magnetite 60, also can obtain desirable density peak value distribution by the electric current of adjusting coil electricity.
In addition, each figure does not draw in strict accordance with size.
Claims (3)
1. an ionic tube has the plasma that is made of negative electrode and anode and generates member, and the grid of drawing ion beam from plasma, it is characterized in that,
This grid has a plurality of or a series of ion beam fairlead along long side direction,
Central part with this a plurality of or a series of ion beam fairlead is an initial point, is the x direction of principal axis with this long side direction, and penetrating direction with ion beam is z axle positive direction,
This ionic tube also has:
First magnetite, its be disposed at this a plurality of or a series of ion beam fairlead around, and this a plurality of or a series of ion beam fairlead is applied the magnetic field of z axle positive direction; And
Second magnetite, it is disposed at the end of this a plurality of or a series of ion beam fairlead, to applying the magnetic field of x axle initial point direction near this end.
2. ionic tube according to claim 1 is characterized in that,
With with the x axle vertical with the z axle the axle be the y axle,
At least 4 described second magnetites are disposed at x axisymmetric position and the y axisymmetric position that surrounds described a plurality of or a series of ion beam fairlead, and described second magnetite S utmost point separately is towards x axle initial point direction, and the N utmost point is configured towards its rightabout.
3. the method for drawing of the ion beam in the ionic tube that will be arranged with a plurality of ion beam fairleads is characterized in that, may further comprise the steps:
(A) in the inner step that generates plasma of this ionic tube; And
(B) apply magnetic field by first magnetite to the ion beam ejaculation direction (z axle positive direction) of these a plurality of ion beam fairleads, and apply from the end of these a plurality of ion beam fairleads towards the magnetic field of central part direction (x axle initial point direction) by second magnetite, and the grid that is formed with these a plurality of ion beam fairleads applied voltage, draw ion and make the step of its acceleration.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008327624A JP5292558B2 (en) | 2008-12-24 | 2008-12-24 | Ion gun |
| JP2008-327624 | 2008-12-24 |
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| Publication Number | Publication Date |
|---|---|
| CN101764021A true CN101764021A (en) | 2010-06-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910262405A Pending CN101764021A (en) | 2008-12-24 | 2009-12-18 | Ion pipe and ion beam extraction method |
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|---|---|
| JP (1) | JP5292558B2 (en) |
| CN (1) | CN101764021A (en) |
| TW (1) | TWI478199B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105097403A (en) * | 2014-05-19 | 2015-11-25 | 东京毅力科创株式会社 | Plasma processing apparatus |
| CN112020900A (en) * | 2018-04-26 | 2020-12-01 | 国立大学法人东海国立大学机构 | Atomic beam generating device, bonding device, surface modifying method, and bonding method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5720021B2 (en) * | 2011-03-15 | 2015-05-20 | 株式会社昭和真空 | Ion gun |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3448315A (en) * | 1966-10-11 | 1969-06-03 | Itt | Ion gun improvements for operation in the micron pressure range and utilizing a diffuse discharge |
| JPH04368754A (en) * | 1991-06-14 | 1992-12-21 | Nissin Electric Co Ltd | Ion source |
| US6853141B2 (en) * | 2002-05-22 | 2005-02-08 | Daniel J. Hoffman | Capacitively coupled plasma reactor with magnetic plasma control |
| US6534923B2 (en) * | 2001-07-13 | 2003-03-18 | Microwave Power Technology | Electron source |
| TWI287816B (en) * | 2004-07-22 | 2007-10-01 | Asia Optical Co Inc | Improved ion source with particular grid assembly |
| TWI293788B (en) * | 2005-10-28 | 2008-02-21 | Hon Hai Prec Ind Co Ltd | Ion gun |
-
2008
- 2008-12-24 JP JP2008327624A patent/JP5292558B2/en active Active
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2009
- 2009-12-02 TW TW098141185A patent/TWI478199B/en active
- 2009-12-18 CN CN200910262405A patent/CN101764021A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105097403A (en) * | 2014-05-19 | 2015-11-25 | 东京毅力科创株式会社 | Plasma processing apparatus |
| CN105097403B (en) * | 2014-05-19 | 2017-11-21 | 东京毅力科创株式会社 | Plasma processing apparatus |
| US10297428B2 (en) | 2014-05-19 | 2019-05-21 | Tokyo Electron Limited | Plasma processing apparatus |
| US11133157B2 (en) | 2014-05-19 | 2021-09-28 | Tokyo Electron Limited | Plasma processing apparatus |
| CN112020900A (en) * | 2018-04-26 | 2020-12-01 | 国立大学法人东海国立大学机构 | Atomic beam generating device, bonding device, surface modifying method, and bonding method |
| CN112020900B (en) * | 2018-04-26 | 2023-11-21 | 国立大学法人东海国立大学机构 | Atomic beam generating device, bonding device, surface modifying method, and bonding method |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201103064A (en) | 2011-01-16 |
| TWI478199B (en) | 2015-03-21 |
| JP2010153096A (en) | 2010-07-08 |
| JP5292558B2 (en) | 2013-09-18 |
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Application publication date: 20100630 |