CN101748005A - Cleaning agent composition and cleaning method for liquid crystal panel - Google Patents
Cleaning agent composition and cleaning method for liquid crystal panel Download PDFInfo
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- CN101748005A CN101748005A CN200910261561A CN200910261561A CN101748005A CN 101748005 A CN101748005 A CN 101748005A CN 200910261561 A CN200910261561 A CN 200910261561A CN 200910261561 A CN200910261561 A CN 200910261561A CN 101748005 A CN101748005 A CN 101748005A
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Abstract
The invention provides a cleaning agent composition, which can clean the liquid crystal dirt and polyimides cutting residues ( foreign bodies on a terminal) and has good liquid stability, as well as a cleaning method for a liquid crystal panel by using the same. The cleaning agent composition for cleaning the liquid crystal panel, contains an organic base (A) with the acid dissociation constant (pKa) of 7 to 10, C8 to C16 hydrocarbons (B), and a surfactant (C) selected from polyoxyalkylene alkyl ethers represented by the following general formula (c1-1) (1)[ in the formula (1), R1 is an C8 to C18 alkyl or alkenyl, AO is an oxidated alkylidene, n is an average additional mol number of an oxyalkylene unit and is an integer of 2 to 30.] and sulfo succinic acid anion surfactant represented by the general formula (c2-1) (2) [in the formula (2), R2 is an C3 to C22 alkyl or alkenyl, R3 is an C3 to C22 alkyl or alkenyl, alkali metal, alkaline earth metal, ammonium or alkanol amine, Q1 is -O- or -NH-, M is an alkali metal atom, alkaline earth metal atom, ammonium or alkanol amine.], and the pH value of the cleaning agent composition is more than 8.5.
Description
Technical field
The present invention relates to be suitable for the cleansing composition of cleaning of liquid crystal panel and the purging method of liquid crystal panel.
Background technology
It is relative with the formed a pair of glass substrate of alignment films that has used polyimide (PI) etc. that liquid crystal panel generally is the membranaceous electrode that will use tin indium oxide (ITO) etc., stay the part opening, make between the alignment films bonding by tackiness agent, make liquid crystal cell, inject liquid crystal to this liquid crystal cell, above-mentioned opening portion is sealed with sealing compound, clean then, paste deflector plate separately at each glass baseplate surface, thereby make liquid crystal panel.
In addition, in the liquid crystal panel,, dispose a plurality of electrode terminals that are used for impressed voltage between electrode at the peripheral end face of glass substrate.
In the manufacturing of liquid crystal panel, the outside of the bonding part between a pair of glass substrate (with liquid crystal cell one side opposition side) is inevitably because the narrow gap of relative glass substrate can produce space part (narrow portion).So when liquid crystal cell injected liquid crystal, this liquid crystal can enter and attached to above-mentioned narrow portion owing to capillary phenomenon.
If to attached to the liquid crystal of above-mentioned narrow portion (hereinafter referred to as " liquid crystal dirt ".No matter) words of placing, because the residue of this liquid crystal dirt can be had an effect as releasing agent, in manufacturing process thereafter, may occur that deflector plate peels off, the bad connection of transmission terminal, transmission bottom fill that surface rippability bad, that be used for the slim chemical industry method of substrate films variety of issue such as peels off.
Cleaning for this liquid crystal dirt, be preferably the hydrocarbon of organic solvent, the purging method of traditional liquid crystal dirt generally is, uses the accurate water system that organic solvent such as organic solvent such as hydrocarbon or hydrocarbon and tensio-active agent or glycol ether combine or the method for water system clean-out system.
For example, liquid crystal panel that motion proposed to contain the oxyalkylene episome of the hydrocarbon compound, anion surfactant of carbonatoms 8～20, specific medium chain branched-chain primary alcohol, a certain amount of water is arranged with water system liquid ceanser compositions (with reference to patent documentation 1).According to related cleansing composition,, also can remove the liquid crystal dirt as the cutting powder (glass cullet) of adhesive attachment at glass on the electrode terminal, that when mother glass downcuts glass substrate, produce except the liquid crystal dirt.
Patent documentation 1: the Japanese Patent spy opens the 2004-002691 communique
Summary of the invention
But, in the liquid crystal panel, used on the alignment films of polyimide etc., arrange with respect to the certain orientation of electrode surface in order to make liquid crystal molecule, carried out rubbing on its surface (rubbing) handles.
When carrying out this friction treatment, can produce the cutting residue of polyimide etc.Therefore, the cutting residue of this polyimide etc. may be the same with above-mentioned liquid crystal dirt attached on the electrode terminal, produces variety of problems in manufacturing process thereafter.
Therefore, in the cleaning when making liquid crystal panel,, also must clean the cutting residue of removing polyimide etc. except the liquid crystal dirt.
Alkali is generally used in the dissolving of polyimide.But, in the invention that patent documentation 1 is put down in writing, do not use alkali, in the technology that patent documentation 1 is put down in writing, though can remove the liquid crystal dirt as the glass cullet of adhesive attachment on electrode terminal, remove the cutting residue of polyimide etc. with being difficult to high cleanliness.
In addition, even in the cleansing composition of patent documentation 1, only add alkali, but, so also be difficult to modulate and be homogeneous transparent outward appearance, composition that liquid stabilising is good because alkali and hydrocarbon compound are not easy to mix and can produce gonorrhoea.Use the cleansing composition scavenging solution crystal panel of this gonorrhoea, the dispersion thing in the composition may remain on the liquid crystal panel, causes cleaning bad.
Therefore, when liquid crystal dirt that adheres on the ablution crystal panel and polyimide etc. cut residue simultaneously, the clean that must be used to remove the clean of liquid crystal dirt respectively and be used to remove cutting residues such as polyimide.
To this, wish and to clean two kinds of dirts simultaneously by a clean.
The present invention In view of the foregoing forms, and purpose provides can clean the cutting residue of liquid crystal dirt and polyimide etc. simultaneously (hereinafter referred to as " foreign matter on the terminal ".) and good cleansing composition of liquid stabilising and the purging method that has used the liquid crystal panel of this cleansing composition.
People of the present invention in order to solve above-mentioned problem, provide following method by wholwe-hearted research.
Promptly, the present invention is: a kind of cleansing composition, be used for the cleaning of liquid crystal panel, it is characterized in that, containing acid disassociation index (pKa) is 7～10 organic bases (A), hydrocarbon (B) and the tensio-active agent (C) of carbonatoms 8～16, described tensio-active agent (C) be selected from polyoxyalkylene alkyl that following general formula (c1-1) represents,
[changing 1]
[in the formula, R
1Be the alkyl or the alkenyl of carbonatoms 8～18, AO is an oxyalkylene group, and n is the unitary average additional mole number of oxyalkylene (ア Le キ レ Application オ キ シ De), is 2～30 number.]
And the sulfosuccinic acid type anion surfactant of following general formula (c2-1) expression
[changing 2]
[in the formula, R
2Alkyl or alkenyl for carbonatoms 3～22; R
3Alkyl or alkenyl, alkali metal atom, alkaline-earth metal atom, ammonium or alkanolamine for carbonatoms 3～22; Q
1For-O-or-NH-, M is alkali metal atom, alkaline-earth metal atom, ammonium or alkanolamine.]，
And the pH of described cleansing composition is more than 8.5.
In the cleansing composition of the present invention, preferred also with the above-mentioned organic bases (A) more than 2 kinds.In addition, cleansing composition of the present invention preferably also contains acid disassociation index (pKa) and is 4～7 acid (D).
In addition, the feature of the purging method of liquid crystal panel of the present invention has been to use the cleansing composition of the invention described above.
By cleansing composition of the present invention, can clean the foreign matter on liquid crystal dirt and the terminal simultaneously, and liquid stabilising is good.
In addition, purging method by liquid crystal panel of the present invention, can pass through a clean, clean simultaneously fully the accompanying liquid crystal dirt in the slit (narrow portion) of removing liquid crystal panel and attached to cutting residues (foreign matter on the terminal) such as the polyimide on the electrode terminal.
Embodiment
＜cleansing composition 〉
Cleansing composition of the present invention is used for the cleaning of liquid crystal panel, contain organic bases (A), hydrocarbon (B), be selected from the tensio-active agent (C) of polyoxyalkylene alkyl and sulfosuccinic acid type anion surfactant, and the pH of cleansing composition is more than 8.5.
[organic bases (A)]
Among the present invention, be that 7～10 organic bases (A) is (hereinafter referred to as " (A) composition " by containing acid disassociation index (pKa).), mainly can obtain good cleaning force for the foreign matter on the terminal.In addition, also can modulate the good cleansing composition of liquid stabilising that is the homogeneous transparent outward appearance.
(A) acid of composition disassociation index (pKa) is 7～10, and preferred pKa is 7.5～9.5.PKa is 7～10, and after the cleansing composition modulation, liquid stabilising is better, and the pH change is less.In addition, identical scavenging solution can carry out repeatedly clean, can continue to reuse identical scavenging solution.This continues to reuse the characteristic of identical scavenging solution, in this manual, and hereinafter referred to as " cleaning force persistence ".
In addition, pKa is in 7～10 scopes, the easier pH that maintains expectation of the pH of cleansing composition.
In this specification sheets and claims, (acid dissociation constant, negative denary logarithm Ka) (logKa) for the equilibrium constant of " acid disassociation index (pKa) " expression dissociation reaction of release hydrogen ions from acid.The pKa of alkali is big more, and alkalescence is strong more.
The value of acid disassociation index (pKa) is recorded in the chemical brief guide basis piece of writing revision 3 editions (the kind Co., Ltd. of ball publishes) that Japanization association of Corporation edits.
As (A) composition, for example can enumerate Monoethanolamine MEA BASF (pKa9.5), diethanolamine (pKa8.87), trolamine (pKa7.76), quadrol (pKa9.92 and 7.12), diaminopropanes (pKa10.53 and 8.84), triamino propane (pKa9.86,8.07 and 3.72).
Wherein, based on beyond the cleaning force for the foreign matter on the terminal, angle that the cleaning force persistence is also excellent, preferred Monoethanolamine MEA BASF, diethanolamine, trolamine.
(A) composition can a kind uses separately, or appropriate combination is used more than 2 kinds.In addition, with (A) composition more than 2 kinds, can further improve the cleaning force persistence by also.
(A) components in proportions in the cleansing composition of the present invention, preferred 0.01～20 quality %, more preferably 0.1～15 quality %, further preferred 1～12 quality %.
(A) components in proportions is more than lower value, can further improve particularly the cleaning force for the foreign matter on the terminal.In addition, can further improve the liquid stabilising of cleansing composition.In addition, can suppress through the time pH that followed descend, improve the cleaning force persistence.
(A) components in proportions can suppress the increase of the viscosity of cleansing composition below higher limit, the rinsing after improving operability and cleaning.When particularly using Ultrasonic Cleaners to carry out clean, can suppress the increase of the viscosity of cleansing composition, further improve cleaning force.
[hydrocarbon (B)]
Among the present invention, the hydrocarbon (B) by containing carbonatoms 8～16 is (hereinafter referred to as " (B) composition ".), mainly can obtain good clearing power for the liquid crystal dirt.
(B) carbonatoms of composition is 8～16, and is preferred 10～14, more preferably 12～14.
Carbonatoms is 8～16, particularly 10～14, can further improve cleaning force for the liquid crystal dirt.In addition, carbonatoms is more than lower value, and inflammableness is low, and carbonatoms is below higher limit, and (B) favorable solubility of composition self obtains cleansing composition even, appearance transparent easily.
(B) composition is that the words of the hydrocarbon compound of carbonatoms 8～16 then are not particularly limited, and for example can enumerate paraffinic hydrocarbons, alkene.
As (B) composition, what specifically be fit to has enumerated the pairing alkene class of n-decane, n-dodecane, n-tetradecane, isodecane, Permethyl 99A. or their alkanes.
Wherein because boiling point is higher relatively, based on be difficult for igniting, the angle of the solvency power excellence of liquid crystal, more preferably the alkene class of the paraffinic of carbonatoms 12～14, carbonatoms 12～14.
Among the present invention, (B) composition for example can use, the ダ イ ア レ Application 12 market sale products such as (trade(brand)names) that the ノ Le マ Le パ ラ Off イ Application N12D (trade(brand)name) that ジ ヤ パ Application エ Na ジ one makes, Mitsubishi Chemical make.
(B) composition can a kind of independent or appropriate combination use more than 2 kinds.
Preferred 1～80 quality % of (B) components in proportions, more preferably 1～70 quality % in the cleansing composition of the present invention.
(B) components in proportions is more than lower value, can further improve particularly the cleaning force for the liquid crystal dirt.(B) components in proportions is below higher limit, can improve drip washing (rinsing) property after the cleaning.In addition, inflammableness also can be lower.
[tensio-active agent (C)]
Among the present invention, be selected from polyoxyalkylene alkyl (hereinafter referred to as (C1) composition by containing.) and sulfosuccinic acid type anion surfactant (hereinafter referred to as (C2) composition.) tensio-active agent (C) (hereinafter referred to as (C) composition.), mainly can obtain effect for the clearing power lifting of the foreign matter on liquid crystal dirt and the terminal.In addition, can get a promotion evenly, the effect of the liquid stabilising of appearance transparent.
About polyoxyalkylene alkyl (C1)
In this specification sheets and these claims, (C1) composition comprises material with carbonatoms carbochain more than 8 (this carbochain is equivalent to the R1 in the compound of for example following general formula (c1-1) expression).
(C1) composition can have been enumerated, and for example, has added the material of oxyalkylene on the higher alcohols (alcohol of preferred carbonatoms 8～18).Wherein, particularly based on liquid stabilising and the better viewpoint of drip washing (rinsing) property after cleaning, the suitable represented compound of following general formula (c1-1) of enumerating.
[changing 3]
[in the formula, R1 is the alkyl or the alkenyl of carbonatoms 8～18, and AO is an oxyalkylene group, and n is the average additional mole number of oxyalkylene units, is 2～30 number.]
In the above-mentioned formula (c1-1), R1 is the alkyl of carbonatoms 8～18 or the alkenyl of carbonatoms 8～18, and this alkyl or alkenyl both can be the straight chain shape, also can be the side chain shape.
The carbonatoms of R1 is 8～18, and is preferred 8～15 based on liquid stabilising and the good viewpoint of drip washing (rinsing) property after cleaning, more preferably 8～10.
In the above-mentioned formula (c1-1), AO is an oxyalkylene group, specifically can enumerate, and preferred oxygen vinyl, oxypropylene group, oxygen butenyl are based on the good viewpoint of drip washing (rinsing) property after cleaning force or liquid stabilising or the cleaning, more preferably oxyethylene group, oxypropylene group.
In the above-mentioned formula (c1-1), n is 2～30 number, based on cleaning force or the good viewpoint of liquid stabilising, more preferably 4～20 number.
Among the present invention, (C1) composition for example can use, the ノ イ ゲ Application XL series (trade(brand)name that the first industrial pharmacy is made; The carbonatoms of R1 is 10, AO is the oxyethylene group type), the ニ ユ one コ one Le series (trade(brand)name made of Japanese emulsifying agent; The carbonatoms of R1 is 8, AO is the oxyethylene group type) etc. the market sale product.
About sulfosuccinic acid type anion surfactant (C2)
(C2) composition can be enumerated for example sulfosuccinate, wherein, particularly based on liquid stabilising and the better viewpoint of drip washing (rinsing) property after cleaning, the suitable represented compound of following general formula (c2-1) of enumerating.
[changing 4]
[in the formula, R2 is the alkyl or the alkenyl of carbonatoms 3～22; R3 is alkyl or alkenyl, alkali metal atom, alkaline-earth metal atom, ammonium or the alkanolamine of carbonatoms 3～22; Q1 is-O-or-NH-, M is alkali metal atom, alkaline-earth metal atom, ammonium or alkanolamine.]
In the above-mentioned formula (c2-1), R2 is the alkyl of carbonatoms 3～22 or the alkenyl of carbonatoms 3～22, and this alkyl or alkenyl both can be the straight chain shape, also can be the side chain shape.
The carbonatoms of R2 is 3～22, and is preferred 6～16 based on liquid stabilising and the good viewpoint of drip washing (rinsing) property after cleaning, more preferably 8～12.
In the above-mentioned formula (c2-1), R3 is the alkyl of carbonatoms 3～22, alkenyl, alkali metal atom, alkaline-earth metal atom, ammonium (NH4) or the alkanolamine of carbonatoms 3～22.
Alkyl among the R3, alkenyl both can be the straight chain shape, also can be the side chain shape.
The carbonatoms of this alkyl or alkenyl is 3～22, based on liquid stabilising and the good viewpoint of drip washing (rinsing) property after cleaning, and more preferably 6～16, further preferred 8～12.
Alkali metal atom among the R3 can be enumerated sodium, potassium etc.
Alkaline-earth metal atom among the R3 can be enumerated calcium, magnesium etc.
Alkanolamine among the R3 can be enumerated Monoethanolamine MEA BASF, diethanolamine, trolamine etc.
In the above-mentioned formula (c2-1), Q1 is-O-or-NH-, be preferably-O-.
In the above-mentioned formula (c2-1), M is alkali metal atom, alkaline-earth metal atom, ammonium or alkanolamine, can enumerate the illustrative identical separately material with above-mentioned R3.Wherein, preferred as alkali atom.
As (C2) composition, preferred dioctyl in above-mentioned is a sulfosuccinate.
Among the present invention, (C2) composition can use for example リ パ one Le 870P market sale products such as (trade(brand)names) of lion king manufacturing.
(C) composition can a kind of independent or appropriate combination use more than 2 kinds.
Preferred 1～30 quality % of (C) components in proportions, more preferably 10～25 quality % in the cleansing composition of the present invention.
(C) components in proportions can further improve particularly liquid stabilising more than lower value.In addition, can further improve cleaning force for the foreign matter on liquid crystal dirt and the terminal.(C) components in proportions can be improved the effect of liquid stabilising and cleaning force fully below higher limit.In addition, can improve drip washing (rinsing) property after the cleaning.
[acid (D)]
In the cleansing composition of the present invention, preferably further contain acid disassociation index (pKa) and be 4～7 acid (D) (hereinafter referred to as " (D) composition ").By containing (D) composition, mainly can stablize the pH after cleansing composition is modulated, improve the cleaning force persistence.
(D) pKa of composition is 4～7, preferred 5～7.PKa can improve the cleaning force persistence below 7.PH is more than 4, can suppress through the time pH that followed descend, can be promoted the persistent effect of cleaning force fully.
As (D) composition, for example can enumerate citric acid (pKa5.69,4.35 and 2.90), phenylformic acid (pKa4.00), acetic acid (pKa4.76), succsinic acid (pKa5.20 and 3.99).
Wherein, based on the good angle of pH stabilization effect behind the modulation cleansing composition, optimization citric acid, phenylformic acid.
Among the present invention, (D) composition for example can use, the PuroxB market sale products such as (trade(brand)names) that the Network エ Application acid (crystallization) (trade(brand)name, citric acid monohydrate compound) that Xiao Song room chemistry is made, DSM N. V. make.
(D) composition can a kind of independent or appropriate combination use more than 2 kinds.
Preferred 0.01～3 quality % of (D) components in proportions, more preferably 0.1～1.5 quality % in the cleansing composition of the present invention.
(D) components in proportions is more than lower value, can further improve the pH stabilization effect behind the modulation cleansing composition.(D) components in proportions can further improve the liquid stabilising effect below higher limit.
[other compositions]
In the cleansing composition of the present invention, can be as required, and with above-mentioned (A)～(D) other compositions in addition.
As other compositions, for example can enumerate water, liquid crystal dissolving auxiliary, liquid stabilising agent etc.
Liquid crystal dissolving auxiliary can be enumerated the organic solvent beyond (B) composition, for example can use phenylglycol, methyl-sulphoxide (DMSO) etc.
The liquid stabilising agent for example can be enumerated, and in R40-(A ' O) the m-R5[formula, R4 is the alkyl or the alkenyl of carbonatoms 1～6; R5 is that hydrogen atom or methyl, A ' O are that oxyalkylene group, m are 1～5 number.] expression compound.
In the above-mentioned formula, R4 is the alkyl of carbonatoms 1～6 or the alkenyl of carbonatoms 1～6, and this alkyl, alkenyl both can be the straight chain shape, also can be the side chain shape.
A ' O is an oxyalkylene group, is preferably oxyethylene group.
The pH of cleansing composition of the present invention is more than 8.5, and preferred pH is more than 9.The higher limit of preferred this pH is below pH10.5, more preferably below the pH10.
The pH of cleansing composition is more than 8.5, and preferred pH is more than 9, can obtain particularly the good cleaning force for the foreign matter on the terminal.In addition, can improve the cleaning force persistence.Preferably below pH10.5, more preferably pH10 is following, can suppress the corrosion of the metal parts of liquid crystal panel for this pH.
Among the present invention, the mensuration of pH is used pH meter (ProductName: D-51, Horiba Ltd makes) and pH electrode (ProductName: 9611-10D, Horiba Ltd makes), by for 25 ℃ cleansing composition dipping pH electrode, read the indicator value after 15 seconds and carry out.
The modulator approach of cleansing composition of the present invention is not particularly limited, can be according to general method, and mix each composition successively and modulate.The interpolation order of preferred each composition can be arbitrarily, adds each composition on a small quantity slightly, modulates while stir.
As above illustrated, by cleansing composition of the present invention, can pass through a clean, clean simultaneously attached to liquid crystal dirt on the liquid crystal panel and the foreign matter on the terminal.In addition, to be outward appearance, the liquid stabilising of homogeneous transparent good for cleansing composition of the present invention.
In addition, by cleansing composition of the present invention, available same scavenging solution carries out clean repeatedly, can reuse same scavenging solution (cleaning force excellent durability) continuously.
In addition, by cleansing composition of the present invention, can suppress the corrosion of the metal parts of liquid crystal panel.
Cleansing composition of the present invention is suitable for the cleaning of liquid crystal panel.
The purging method of＜liquid crystal panel 〉
The purging method of liquid crystal panel of the present invention is to use the method for the cleansing composition of the invention described above.
As this purging method, be not particularly limited, for example can enumerate, cleansing composition directly is sprayed onto on the liquid crystal panel that is cleaned body the method for coating wiping with nozzle etc.; Liquid crystal panel is immersed in method in the cleansing composition, carries out the method for ultrasonication etc. when cleaning.
In the purging method of liquid crystal panel of the present invention, carry out the method for ultrasonication when preferably cleaning.By using the cleansing composition of the invention described above, liquid crystal panel is carried out ultrasonic cleaning handle, but clean simultaneously effectively in the short period of time attached to liquid crystal dirt on the liquid crystal panel and the foreign matter on the terminal.
By the purging method of liquid crystal panel of the present invention, can clean simultaneously fully by a clean and remove attached to liquid crystal dirt on the liquid crystal panel and the foreign matter on the terminal.
The purging method that relates to is suitable for the cleaning of liquid crystal panel.
Embodiment
Below use embodiment that the present invention is further described in detail, but the present invention is not limited to these embodiment.In addition, " % " then expression " quality % " if no special instructions.
The modulation of＜cleansing composition 〉
(embodiment 1～11, comparative example 1～5)
According to the composition shown in the table 1,2, according to general method, Yi Bian on one side add each composition on a small quantity slightly and stir, making total amount is 100 quality %, modulates each routine cleansing composition with this.
In addition, the unit of the combined amount in the table is quality %, and the combined amount of each composition all is expressed as purity conversion amount.
Composition shown in the following instruction card.
[the composition explanation shown in the table].
Organic bases (A)
MEA: Monoethanolamine MEA BASF, the reagent superfine, Northeast chemistry is made; PKa9.5.
DEA: diethanolamine, the reagent superfine, Northeast chemistry is made; PKa9.12.
TEA: trolamine, the reagent superfine, Northeast chemistry is made; PKa7.76.
(A) [following table is shown " (A ') composition " to the comparison composition of composition.]
NaOH: sodium hydroxide, reagent, pure chemistry is made; More than the pKa13.
Hydrocarbon (B)
Dodecane: カ Network タ ス ノ Le マ Le パ ラ Off イ Application N12D (trade(brand)name), ジ ヤ パ Application エ Na ジ one makes.
12 (carbon) alkene: ダ イ ア レ Application 12 (trade(brand)names), Mitsubishi Chemical makes.
Tensio-active agent (C)
C8E4: polyoxyethylene Octyl Ether, 4 moles of episomes of oxyethane (EO); ニ ユ one コ one Le 1004 (trade(brand)name), Japanese emulsifying agent manufacturing.
C8E20: polyoxyethylene Octyl Ether, EO20 mole episome; ニ ユ one コ one Le 1020 (trade(brand)name), Japanese emulsifying agent manufacturing.
C10E4: polyoxyethylene decyl ethers, EO4 mole episome; ノ イ ゲ Application XL-40 (trade(brand)name), the first industrial pharmacy manufacturing.
C10E14: polyoxyethylene decyl ethers, EO14 mole episome; ノ イ ゲ Application XL-140 (trade(brand)name), the first industrial pharmacy manufacturing.
AOT: two-2-ethylhexyl sulfuration sodium succinate, リ パ one Le 870P (trade(brand)name), ラ イ オ Application is made.
Acid (D)
Citric acid: citric acid monohydrate compound, Network エ Application acid (crystallization) (trade(brand)name), Xiao Song room chemistry is made; PKa5.69,4.35 and 2.90.
Phenylformic acid: PuroxB (trade(brand)name), DSM N. V. make imported from Holland; PKa4.00.
Other compositions
Phenylglycol: PhG (trade(brand)name), Japanese emulsifying agent manufacturing.
C6E2: hexyl Diethylene Glycol (trade(brand)name), Japanese emulsifying agent manufacturing.
Water.
The pH of＜cleansing composition measures 〉
Measure the modulation of above-mentioned＜cleansing composition〉in the pH of stoste of the cleansing composition that obtains.
The mensuration of pH is used pH meter (ProductName: D-51, Horiba Ltd makes) and pH electrode (ProductName: 9611-10D, Horiba Ltd makes), by for 25 ℃ cleansing composition dipping pH electrode, read the indicator value after 15 seconds and carry out.
＜for the evaluation of the cleaning force of the foreign matter on liquid crystal dirt and the terminal 〉
[being cleaned the making of sample]
Use syringe, the slit (narrow portion) that the liquid crystal material that the TFT liquid crystal panel is used injects liquid crystal panel makes being cleaned sample.
In addition, as liquid crystal panel, use be: bonding by making between the alignment film of polyimide by tackiness agent, thus make tin indium oxide (ITO) electrode and the laminated in this order a pair of glass substrate of alignment film of polyimide liquid crystal panel relative to each other.Use the smear metal residue (foreign matter on the terminal) of the polyimide that is attached with the degree that can confirm by opticmicroscope on the electrode terminal of this liquid crystal panel.
[washing test]
As Ultrasonic Cleaners, the SC-20 type (model of using サ Application Electronics Industry Company to make; 50kHz, 200W).
In above-mentioned Ultrasonic Cleaners, be respectively charged into the stoste of each routine cleansing composition, dipping is cleaned sample in this stoste, carries out 40 ℃, 16 minutes ultrasonic cleaning.
Then, taking-up is cleaned sample, the ion exchanged water that in the above-mentioned Ultrasonic Cleaners of preparing separately, adds room temperature, in this ion exchanged water, flood the sample that is cleaned that has taken out, except scavenging period being set at 10 minutes, handle under the identical condition in the ultrasonic cleaning of using cleansing composition stoste, carry out ultrasonic wave drip washing and handle.
Then, take out and be cleaned sample, in the freeze-day with constant temperature machine of packing into, carry out 80 ℃, 20 minutes drying.
Behind dry the end, use polarizing microscope (model: BX-60, Olympus industrial makes), for the Restzustand of the liquid crystal material of the narrow portion that is cleaned sample and the Restzustand of the polyimide on the electrode terminal, estimate according to following metewand.The result is shown in table 1,2.
(metewand of cleaning force) ◎～zero is an acceptability limit.
◎: removed fully.
Zero: be removed substantially.
△: be removed a little.
*: be not removed fully.
In addition, therefore "-" expression in the table does not have implementation evaluation owing to occurred gonorrhoea at once behind the modulation cleansing composition.
The evaluation of＜liquid stabilising 〉
Behind each routine cleansing composition of modulation, under room temperature (25 ℃) and high temperature (50 ℃) condition, take care of separately respectively, for outward appearance, estimate according to following metewand through the cleansing composition after 1 day.The result is shown in table 1,2.
(metewand of liquid stabilising) ◎～zero is an acceptability limit.
◎: the outward appearance that all presents homogeneous transparent under room temperature and the high temperature.
Zero: present the outward appearance of homogeneous transparent under the room temperature, gonorrhoea under the high temperature.
△: equal gonorrhoea under room temperature and the high temperature.
*: gonorrhoea has appearred at once in (room temperature) behind the modulation cleansing composition.
The persistent evaluation of＜cleaning force 〉
The stoste 1000mL of the cleansing composition that each is routine, the 1000mL beaker of packing into is arranged on it in water-bath, preserves for 1 week and 1 month.
Do not cover this beaker in the preservation, in addition, be warming up to 50 ℃ and stir in 1 day in 8 hours, place under 16 hours remaining room temperatures, do not stir.Cleansing composition is not replaced in preservation period, uses same substance continuously.
Use separately through 1 week with through the cleansing composition after 1 month, according to above-mentioned＜for the evaluation of the cleaning force of the foreign matter on liquid crystal dirt and the terminal identical method, foreign matter on the terminal is carried out the evaluation of cleaning force, according to following metewand, carry out the persistent evaluation of cleaning force.The result is shown in table 1,2.
(the persistent metewand of cleaning force) ◎ ◎～zero is an acceptability limit.
◎ ◎:, all removed fully through a week back with through after one month.
◎:, after one month, be removed substantially through being removed fully after the week.
Zero:, after one month, be removed a little through being removed substantially after the week.
△:, after one month, be not removed through being removed a little after the week.
*: through a week back with through after one month, all be not removed fully.
[table 1]
[table 2]
Can confirm from above result, the cleansing composition of the embodiment 1～11 that the present invention relates to can clean only simultaneously attached to the liquid crystal dirt in the slit (narrow portion) of liquid crystal panel with attached to cutting residues (foreign matter on the terminal) such as the polyimide on the electrode terminal, and liquid stabilising is good.
In addition, also confirmed the cleaning force excellent durability of the cleansing composition of the embodiment 1～11 that the present invention relates to.
Claims (5)
1. cleansing composition, be used for the cleaning of liquid crystal panel, it is characterized in that, containing acid disassociation index (pKa) is 7～10 organic bases (A), the hydrocarbon (B) and the tensio-active agent (C) of carbonatoms 8～16, described tensio-active agent (C) is selected from the polyoxyalkylene alkyl of following general formula (c1-1) expression and the sulfosuccinic acid type anion surfactant that is selected from following general formula (c2-1) expression
[changing 1]
In the formula, R
1Be the alkyl or the alkenyl of carbonatoms 8～18, AO is an oxyalkylene group, and n is the average additional mole number of oxyalkylene units, is 2～30 number,
[changing 2]
In the formula, R
2Alkyl or alkenyl for carbonatoms 3～22; R
3Alkyl or alkenyl, alkali metal atom, alkaline-earth metal atom, ammonium or alkanolamine for carbonatoms 3～22; Q
1For-O-or-NH-, M is alkali metal atom, alkaline-earth metal atom, ammonium or alkanolamine, and the pH of described cleansing composition is more than 8.5.
2. cleansing composition as claimed in claim 1, and used the above-mentioned organic bases (A) more than 2 kinds.
3. cleansing composition as claimed in claim 1 also contains acid disassociation index (pKa) and is 4～7 acid (D).
4. cleansing composition as claimed in claim 2 also contains acid disassociation index (pKa) and is 4～7 acid (D).
5. the purging method of a liquid crystal panel has used any described cleansing composition of claim 1～4.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008319918A JP5489452B2 (en) | 2008-12-16 | 2008-12-16 | Liquid crystal panel cleaning composition and liquid crystal panel cleaning method |
| JP2008-319918 | 2008-12-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101748005A true CN101748005A (en) | 2010-06-23 |
| CN101748005B CN101748005B (en) | 2012-12-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200910261561 Expired - Fee Related CN101748005B (en) | 2008-12-16 | 2009-12-14 | Cleaning agent composition and cleaning method for liquid crystal panel |
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| Country | Link |
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| JP (1) | JP5489452B2 (en) |
| CN (1) | CN101748005B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014095793A1 (en) | 2012-12-19 | 2014-06-26 | Akzo Nobel Chemicals International B.V. | The use of an ethoxylated alcohol as a hydrotrope for an alkylene oxide adduct of an alcohol |
| JP6226144B2 (en) * | 2014-02-27 | 2017-11-08 | 荒川化学工業株式会社 | Detergent composition stock solution, detergent composition and cleaning method |
Citations (3)
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|---|---|---|---|---|
| EP0153857B2 (en) * | 1984-02-29 | 1996-05-08 | Unilever N.V. | Detergent compositions |
| CN1387426A (en) * | 1999-11-04 | 2002-12-25 | 花王株式会社 | Detergent composition |
| CN1451731A (en) * | 2002-04-18 | 2003-10-29 | 狮王株式会社 | Water liquid detergent composition for liquid crystal panel |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3223212B2 (en) * | 1993-04-28 | 2001-10-29 | ライオン株式会社 | Detergent composition |
| JP3227022B2 (en) * | 1993-04-30 | 2001-11-12 | ライオン株式会社 | Detergent composition |
| JP3255392B2 (en) * | 1994-12-06 | 2002-02-12 | 花王株式会社 | Aqueous detergent composition |
| JP4204091B2 (en) * | 1998-04-02 | 2009-01-07 | 旭化成ケミカルズ株式会社 | Cleaning composition |
| JP3799026B2 (en) * | 2002-03-29 | 2006-07-19 | 三洋化成工業株式会社 | Alkaline cleaner |
| JP2006225489A (en) * | 2005-02-17 | 2006-08-31 | Lion Corp | Water-based liquid detergent composition and method for cleaning and removing spacer particle |
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2008
- 2008-12-16 JP JP2008319918A patent/JP5489452B2/en not_active Expired - Fee Related
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2009
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0153857B2 (en) * | 1984-02-29 | 1996-05-08 | Unilever N.V. | Detergent compositions |
| CN1387426A (en) * | 1999-11-04 | 2002-12-25 | 花王株式会社 | Detergent composition |
| CN1451731A (en) * | 2002-04-18 | 2003-10-29 | 狮王株式会社 | Water liquid detergent composition for liquid crystal panel |
| JP2004002691A (en) * | 2002-04-18 | 2004-01-08 | Lion Corp | Water-base liquid detergent composition for liquid crystal panel |
Non-Patent Citations (1)
| Title |
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| 李薇薇等: "一种新型的LCD清洗剂", 《电子工艺技术》 * |
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| Publication number | Publication date |
|---|---|
| JP5489452B2 (en) | 2014-05-14 |
| JP2010143971A (en) | 2010-07-01 |
| CN101748005B (en) | 2012-12-19 |
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