CN101576629B - Colored light filter piece, manufacture method thereof and liquid crystal display containing same - Google Patents
Colored light filter piece, manufacture method thereof and liquid crystal display containing same Download PDFInfo
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- CN101576629B CN101576629B CN2008100952837A CN200810095283A CN101576629B CN 101576629 B CN101576629 B CN 101576629B CN 2008100952837 A CN2008100952837 A CN 2008100952837A CN 200810095283 A CN200810095283 A CN 200810095283A CN 101576629 B CN101576629 B CN 101576629B
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Abstract
The invention relates to a colored light filter piece comprising a first colored light filter membrane layer, a first light adsorption membrane layer, a second colored light filter membrane pattern and a second light adsorption membrane pattern, wherein the first colored light filter membrane layer is positioned on a base plate. The first light adsorption membrane layer is positioned between the base plate and the first colored light filter membrane layer. The second colored light filter membrane pattern covers part of the first colored light filter membrane layer. The second light adsorption membrane pattern is positioned between the second colored light filter membrane pattern and the first colored light filter membrane layer.
Description
Technical field
The invention relates to a kind of colored filter and manufacture method thereof and the LCD that contains this colored filter.
Background technology
In recent years, (Liquid Crystal Display LCD) has that external form is thin, in light weight, an advantage such as low operating voltage, power saving and radiationless line, has become the main flow of display device because LCD.Yet because the technical restriction of LCD (LCD), can only be confined to display screen mostly is the less product of size.
For larger-size display, be the display device that adopts shadow casting technique towards development at present, for example say reflection type projection display device (reflective projection display device) and rear projection display apparatus (rear projection display device) etc.Wherein the reflection type projection display device comprises liquid crystal projector (Liquid Crystal Projector, LCP), digit optical is handled (Digital Light Processing, DLP) projector and reflection type liquid crystal (Liquid Crystal On Silicon, LCOS) projection display equipment etc.And also can use reflection type liquid crystal (LCOS) shadow casting technique in the rear projection display apparatus.Though product is in the market handled (DLP) projector based on liquid crystal projector (LCP) and digit optical, but because reflection type liquid crystal (LCOS) shadow casting technique has advantages such as low cost, high aperture (can up to 90%), high-res (pel spacing can to 12 μ m or littler), existing many manufacturers begin to develop this technology.
In display, the light that light source sent reaches the purpose of the light that filters different colours by colored filter.Typical colored filter is to be formed by stacking by the rete of different refractivity is staggered, to reach the purpose that specific wavelength is filtered.Known a kind of method of making colored filter is to adopt to divest method and implement.This kind method is to form trapezoidal photoresist layer in substrate, and then, the colored light filter membrane layer that will have different refractivity is formed on the substrate in regular turn, to cover gap and the photoresist layer between photoresist layer and the photoresist layer.The trapezoidal angle of falling is bigger, and then its sidewall more is difficult to be covered by colored light filter membrane layer, and therefore, photoresist layer and the colored light filter membrane layer that the top covered thereof can see through that divesting technology removes, and stay the colored light filter membrane layer that is positioned on the substrate.Yet, the trapezoidal photoresist layer that falls adopts the minus photoresistance to make more, and it is relevant that it falls the thickness and the photoresist reaction of trapezoidal angle and photoresistance, the exposure energy and the back temperature of toasting of exposing to the sun of must arranging in pairs or groups on technology can be controlled trapezoidal angle, therefore, the trapezoidal angle of falling is limited to, and can't make the trapezoidal of wide-angle.
In addition, also having a kind of method of making colored filter then to adopt etching method simultaneously and divest method implements.Its method for making is to form earlier first colored light filter membrane layer on substrate, and is mask with the patterning photoresist layer, carries out etching with its patterning, to form first colored light filter membrane pattern.Afterwards, on substrate, form second colored light filter membrane layer again, with the substrate between the overlay pattern photoresist layer and first colored light filter membrane pattern.Afterwards, utilize again and divest method, when removing the patterning photoresist layer, remove simultaneously the patterning photoresist layer with and on second colored light filter membrane layer, stay second colored light filter membrane layer between first colored light filter membrane pattern, form second colored light filter membrane pattern.Afterwards, form channel layer again.
When color filter film is that above-mentioned method can produce serious optical problem when superposeing the inorganic plated film that forms with depositional mode.More in detail, because the thickness of the patterning photoresist layer and first colored light filter membrane pattern is very thick, therefore when deposition second colored light filter membrane layer, will cause capture-effect, making between second colored light filter membrane layer that is deposited between first colored light filter membrane pattern and adjacent first color filter patterns (pixel) can gapped existence, and makes aperture opening ratio reduce.The effect of covering can make that also second colored light filter membrane layer has the problem of uneven thickness.Usually, can cause the thickness at center thicker, and the phenomenon of thickness-tapered on every side.Thinner thickness on every side will influence the performance of optics, causes the minimizing of reflective surface area, influences the spectrum and the reflectivity of plated film.In addition, the inequality of thickness also will make the follow-up channel layer of inserting be difficult to insert, and the fluctuating of easy feasible surface generation height, cause the follow-up problem that is formed on two liquid crystal generation orientations between the substrate.In addition, because photoresist layer is to adopt to divest mode and remove, therefore, the cleanliness factor of its technology is more wayward.
Summary of the invention
The present invention is providing a kind of colored filter exactly, and it can reduce the gap between the filter coating pattern of different colours, increases the aperture opening ratio of element, promotes reflection efficiency.
The present invention provides a kind of colored filter again, and it can provide preferred optical appearance.
The present invention is providing a kind of colored filter exactly, and the thickness of its colored light filter membrane layer is comparatively even, can reduce the surface height and rise and fall to the orientation problem that liquid crystal caused.
Of the present inventionly provide a kind of manufacturing method of color filters again, its technology is simple and be easy to control, reduces wrong situation of aiming at.
The present invention is providing a kind of reflecting type liquid crystal display panel exactly, and the thickness of its colored light filter membrane layer is comparatively even, can reduce the orientation problem of liquid crystal.
The present invention proposes a kind of colored filter, and it comprises first colored light filter membrane layer, the first extinction rete, second colored light filter membrane pattern and the second extinction film figure.First colored light filter membrane layer is positioned on the substrate.The first extinction rete is between the substrate and first colored light filter membrane layer.Second colored light filter membrane pattern, cover part first colored light filter membrane layer.The second extinction film figure is between second colored light filter membrane pattern and first colored light filter membrane layer.
Described according to the embodiment of the invention, above-mentioned colored filter also comprises a flatness layer, and it covers not on first colored light filter membrane layer that is covered by second colored light filter membrane pattern.
Described according to the embodiment of the invention, in the above-mentioned colored filter, the material of flatness layer comprises tetraethoxy silica alkane (TEOS) monox, non-impurity-doped silex glass (USG), boron-phosphorosilicate glass (BPSG), phosphorosilicate glass (PSG), advanced low-k materials and combination thereof.
Described according to the embodiment of the invention, above-mentioned colored filter also comprises the 3rd extinction film figure of the 3rd colored light filter membrane pattern and below thereof, cover part second colored light filter membrane pattern, or cover part flatness layer, or while cover part second colored light filter membrane pattern and part flatness layer.
Described according to the embodiment of the invention, in the above-mentioned colored filter, the material of the first extinction rete, the second extinction film figure and the 3rd extinction film figure comprises titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum or molybdenum nitride.
Described according to the embodiment of the invention, in the above-mentioned colored filter, first colored light filter membrane layer, second colored light filter membrane pattern and the 3rd colored light filter membrane pattern are inorganic plated film.
The present invention proposes a kind of formation method of colored filter again, and the method is included in and forms the first extinction rete, first colored light filter membrane layer, the second extinction rete and second colored light filter membrane layer on the substrate in regular turn.Then, patterning second colored light filter membrane layer and the second extinction rete are to form second colored light filter membrane pattern and the second extinction film figure.
Described according to the embodiment of the invention, the formation method of above-mentioned colored filter also is included in not and forms first flatness layer on first color filter film that is covered by second colored light filter membrane pattern.
Described according to the embodiment of the invention, the formation method of above-mentioned colored filter also comprises carries out flatening process to first flatness layer.
Described according to the embodiment of the invention, the formation method of above-mentioned colored filter also is included in and forms the 3rd extinction rete and the 3rd colored light filter membrane layer on the substrate, then, patterning the 3rd colored light filter membrane layer and the 3rd extinction rete, to form the 3rd colored light filter membrane pattern and the 3rd extinction film figure, cover part second colored light filter membrane pattern, or cover part flatness layer, or while cover part second colored light filter membrane pattern and part flatness layer.
Described according to the embodiment of the invention, the formation method of above-mentioned colored filter also comprises and forms second flatness layer, covers not on first flatness layer and second colored light filter membrane pattern that is covered by the 3rd colored light filter membrane pattern.
Described according to the embodiment of the invention, in the formation method of above-mentioned colored filter, the material of the first extinction rete, the second extinction film figure and the 3rd extinction film figure comprises titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum or molybdenum nitride.
Described according to the embodiment of the invention, in the formation method of above-mentioned colored filter, first colored light filter membrane layer, second colored light filter membrane pattern and the 3rd colored light filter membrane pattern are inorganic plated film.
The present invention proposes a kind of reflecting type liquid crystal display panel again, includes transparency carrier, reflection substrate and marginal liquid crystal layer.Has first electrode layer on the transparency carrier.Have element layer and colored filter on the reflection substrate.Colored filter comprises first colored light filter membrane layer, the first extinction rete, the first extinction rete, second colored light filter membrane pattern and the second extinction film figure.First colored light filter membrane layer is positioned on the reflection substrate.One first extinction rete is between the reflection substrate and first color filter film.Second colored light filter membrane pattern, cover part first color filter film.The second extinction film figure is between second colored light filter membrane pattern and first color filter film.Liquid crystal layer is disposed between first electrode layer and the colored filter.
Described according to the embodiment of the invention, in the above-mentioned reflecting type liquid crystal display panel, reflection substrate comprises semiconductor substrate, or has another transparency carrier in reflection horizon.
Described according to the embodiment of the invention, above-mentioned reflecting type liquid crystal display panel also comprises a polaroid, is arranged at transparency carrier and is not provided with on the surface of first electrode layer.
Described according to the embodiment of the invention, in the above-mentioned reflecting type liquid crystal display panel, colored filter also comprises a flatness layer, covers not on first colored light filter membrane layer that is covered by second colored light filter membrane pattern.
Described according to the embodiment of the invention, in the above-mentioned reflecting type liquid crystal display panel, the material of flatness layer comprises tetraethoxy silica alkane (TEOS) monox, non-impurity-doped silex glass (USG), boron-phosphorosilicate glass (BPSG), phosphorosilicate glass (PSG), advanced low-k materials and combination thereof.
Described according to the embodiment of the invention, in the above-mentioned reflecting type liquid crystal display panel, colored filter also comprises the 3rd extinction film figure of the 3rd colored light filter membrane pattern and below thereof, cover part second colored light filter membrane pattern, or cover part flatness layer, or while cover part second colored light filter membrane pattern and part flatness layer.
Described according to the embodiment of the invention, in the above-mentioned reflecting type liquid crystal display panel, the material of the first extinction rete, the second extinction film figure and the 3rd extinction film figure comprises titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum or molybdenum nitride.
Colored filter of the present invention, it can avoid the loss of optics, increases the area of reflection, the aperture opening ratio of lift elements.
Colored filter of the present invention, the thickness of its colored light filter membrane layer is comparatively even, can reduce the surface height and rise and fall to the orientation problem that liquid crystal caused.
The technology of manufacturing method of color filters of the present invention is simple and be easy to control.
Reflecting type liquid crystal display panel of the present invention, the thickness of its colored light filter membrane layer is comparatively even, can reduce the orientation problem of liquid crystal.
For above-mentioned and other purposes, feature and advantage of the present invention can be become apparent, preferred embodiment cited below particularly, and cooperate appended diagram, be described in detail below.
Description of drawings
Figure 1A to 1C is the flow process diagrammatic cross-section according to a kind of manufacturing method of color filters that first embodiment of the invention illustrated.
Fig. 2 A to Fig. 2 F is the flow process diagrammatic cross-section according to a kind of manufacturing method of color filters that second embodiment of the invention illustrated.
Fig. 3 A to Fig. 3 F is the flow process diagrammatic cross-section according to a kind of manufacturing method of color filters that third embodiment of the invention illustrated.
Fig. 3 F-1 is the diagrammatic cross-section according to a kind of colored filter that one embodiment of the invention illustrated.
Fig. 4 is the synoptic diagram of a kind of reflecting type liquid crystal display panel of illustrating according to fourth embodiment of the invention.
[main element symbol description]
5,450: light
10,20,30,40,418: colored filter
100,400,410,414: substrate
101,416: element layer
102,106,114: the extinction rete
106a, 106b, 114a: extinction film figure
104,108,116: colored light filter membrane layer
108a, 108b, 108c, 116a: colored light filter membrane pattern
110,210,218,310: patterned light blockage layer
112,120: flatness layer
112a, 120a: flatness layer
402: electrode layer
412: the reflection horizon
404,420: alignment film
430: liquid crystal layer
460: reflecting type liquid crystal display panel
Embodiment
Embodiment one
Figure 1A to 1C is the flow process diagrammatic cross-section according to a kind of manufacturing method of color filters that first embodiment of the invention illustrated.
Please refer to Figure 1A, the manufacturing method of color filters of the embodiment of the invention is to form earlier the first extinction rete 102 and first colored light filter membrane layer 104 on substrate 100 in regular turn.Then, form the second extinction rete 106 and second colored light filter membrane layer 108 in regular turn on first colored light filter membrane layer 104.Substrate 100 can be selected flexible base plate or hard substrate for use.For example, often the hard substrate that uses is glass substrate, quartz base plate, silicon substrate etc., and the flexible base plate that often uses is plastic substrate.In addition, can comprise an element layer 101 on the substrate 100.Element layer 101 can be active component layer or passive element layer.The active component layer can comprise that thin film transistor (TFT) and pixel electrode constitute, or is made of metal oxide semiconductcor field effect transistor and pixel electrode.The passive element layer then can comprise electrode.
The material of the first extinction rete 102 and the second extinction rete 106 for example is metal or metal nitride, as titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum, molybdenum nitride etc.The thickness of the first extinction film 102 and the second extinction film 106 for example is 1500 to 2500 dusts.The forming method of the first extinction film 102 and the second extinction film 106 for example is chemical vapour deposition technique (CVD) or physical vaporous deposition (PVD).First colored light filter membrane layer 104 is two kinds of inorganic plated films that color is different with second colored light filter membrane layer 108, for example is redness, green or blue inorganic plated film.First colored light filter membrane layer 104 and second colored light filter membrane layer 108 for example be by the multilayer refractive index n greater than 1.9 high refractive index layer and multilayer refractive index n less than 1.9 low-index film stacked formed stacked film mutually.High refractive index layer for example is TiO
2, Ti
3O
5, Ti
2O
3, TiO, Ta
2O
5Or ZnS.Low-index film for example is SiO
2, CaF
2, MgF
2Or Na
3AlF
6Afterwards, on second colored light filter membrane layer 108, form the first patterning photoresist layer 110.
Thereafter, please refer to Figure 1B, is mask with the first patterning photoresist layer 110, and etching second colored light filter membrane layer 108 and the second extinction rete 106 are to form the second colored light filter membrane pattern 108a and the second extinction film figure 106a.Afterwards, remove the first patterning photoresist layer 110.Then, on substrate 100, form flatness layer 112, cover that the second colored light filter membrane pattern 108a goes up and first color filter film 104 that do not covered by the second colored light filter membrane pattern 108a on.Flatness layer 112 for example is tetraethoxy silica alkane (TEOS) monox, non-impurity-doped silex glass (USG), boron-phosphorosilicate glass (BPSG), phosphorosilicate glass (PSG), advanced low-k materials and combination thereof.Advanced low-k materials is that specific inductive capacity is lower than 4 material, for example is fluorine doped silicon glass (FSG); Silicon sesquioxide such as hydrogen silicon sesquioxide (Hydrogensilsesquioxnane, HSQ), methyl silicon sesquioxide (Methyl silsesquioxane, MSQ) with mix organosilane polymer (Hybrido-organo siloxane polymer, HOSP); Aromatic hydrocarbons (Aromatic hydrocarbon) is as SiLK; Organic silicate glass (Organosilicate glass) as carbon black (black diamond, BD), 3MS, 4MS; Parylene (Parylene); Fluorinated polymer (Fluoro-Polymer) is as PFCB, CYTOP, Teflon; Polyarylether (Poly (arylethers)) is as PAE-2, FLARE etc.The method of the formation of flatness layer 112 can using plasma enhanced chemical vapor deposition method, subatmospheric chemical vapour deposition technique, high depth-width ratio ditch are filled out technology (High Aspect RatioProcess, HARP), mode such as high temperature thermal oxidation metallization processes, Low Pressure Chemical Vapor Deposition, high density plasma CVD method (HDPCVD), method of spin coating.
Then, please refer to Fig. 1 C, carry out flatening process, make flatness layer 112 planarizations, form flatness layer 112a.In diagram, flatness layer 112a only covers first colored light filter membrane layer 104 of being exposed between the second colored light filter membrane pattern 108a and the second extinction pattern 106a, yet the present invention is not as limit, and flatness layer 112a also can cover on the second colored light filter membrane pattern 108a again.Flatening process can adopt CMP (Chemical Mechanical Polishing) process, or etch back process.Perhaps, also can both uses of arranging in pairs or groups, for example be to carry out CMP (Chemical Mechanical Polishing) process earlier, then, carry out etch back process again, to finish the making of colored filter 10.
In brief, the colored filter 10 of present embodiment is to be disposed on the substrate 100, and it comprises the first extinction rete 102, first colored light filter membrane layer 104, the second extinction film figure 106a, the second colored light filter membrane pattern 108a and flatness layer 112a.First colored light filter membrane layer 104 is positioned on the substrate 100.The first extinction rete 102 is between first colored light filter membrane layer 104 and substrate 100.The second colored light filter membrane pattern 108a, cover part first colored light filter membrane layer 104.The second extinction film figure 106a is between the second colored light filter membrane pattern 108a and first colored light filter membrane layer 104.Flatness layer 112a then covers not on first colored light filter membrane layer 104 that is covered by the second colored light filter membrane pattern 108a, or some covers on the second colored light filter membrane pattern 108a.
When light 5 after substrate 100 tops enter colored filter 10, in the light by the second colored light filter membrane pattern 108a, the light of subband is reflected by the second colored light filter membrane pattern 108a, the light of residue wave band is then absorbed by the second extinction film figure 106a and can pass through the second extinction film figure 106a, is reflected by first colored light filter membrane layer 104 below it and produces interference on the color.And when light after substrate 100 tops enter colored filter 10, by flatness layer 112a, enter into the light of first colored light filter membrane layer 104 again, the light of subband is reflected by first colored light filter membrane layer 104; The light of residue wave band is then absorbed by the first extinction rete 102.In the light that is reflected by first colored light filter membrane layer 104, wherein a part can be passed through flatness layer 112a, reaches the purpose of filtering particular color; And another part then can be absorbed by the second extinction film figure 106a of first colored light filter membrane layer, 104 tops, and can not pass through the second absorption layer 106a, produces the interference on the color.So colored filter 10 can reach the purpose of filtering two kinds of colors.
Embodiment two
Fig. 2 A to Fig. 2 F is the flow process diagrammatic cross-section according to a kind of manufacturing method of color filters that second embodiment of the invention illustrated.
Please refer to Fig. 2 A, on substrate 100, form the first extinction rete 102 and first colored light filter membrane layer 104 in regular turn.Then, form the second extinction rete 106 and second colored light filter membrane layer 108 more in regular turn on first colored light filter membrane layer 104.The material of the first extinction rete 102, the second extinction rete 106, first colored light filter membrane layer 104, second colored light filter membrane layer 108 and formation method repeat no more in this as described in first embodiment.Afterwards, on second colored light filter membrane layer 108, form patterning photoresist layer 210.
Thereafter, please refer to Fig. 2 B, is mask with the first patterning photoresist layer 210, and etching second colored light filter membrane layer 108 and the second extinction rete 106 are to form the second colored light filter membrane pattern 108a, 108b and the second extinction film figure 106a, 106b.Afterwards, remove patterning photoresist layer 210.Then, on substrate 100, form flatness layer 112, cover the second colored light filter membrane pattern 108a, 108b is last and first colored light filter membrane layer 104 that do not covered by second colored light filter membrane pattern 108a, the 108b on.
Then, please refer to Fig. 2 C, carry out flatening process, make flatness layer 112 planarizations, form flatness layer 112a.The method of the material of flatness layer 112 and formation method and planarization repeats no more in this as described in first embodiment.
Afterwards, please refer to Fig. 2 D, on substrate 100, form the 3rd extinction rete 114 and the 3rd colored light filter membrane layer 116.The 3rd colored light filter membrane layer 116 and first colored light filter membrane layer 104, or with second colored light filter membrane layer 108 can be two kinds of inorganic plated films that color is similar and different, for example be red, green or blue inorganic plated film.The 3rd colored light filter membrane layer 116 for example be by the multilayer refractive index n greater than 1.9 high refractive index layer and multilayer refractive index n less than 1.9 low-index film stacked formed stacked film mutually.High refractive index layer for example is TiO
2, Ti
3O
5, Ti
2O
3, TiO, Ta
2O
5Or ZnS.Low-index film for example is SiO
2, CaF
2, MgF
2Or Na
3AlF
6Then, on corresponding to the 3rd colored light filter membrane layer 116 of the second colored light filter membrane pattern 108b, form patterning photoresist layer 218.
Thereafter, please refer to Fig. 2 E, is mask with patterning photoresist layer 218, and etching the 3rd colored light filter membrane layer 116 and the 3rd extinction rete 114 are to form the 3rd colored light filter membrane pattern 116a and the 3rd extinction film figure 114a on the second colored light filter membrane pattern 108b.Afterwards, remove patterning photoresist layer 218.Then, on substrate 100, form flatness layer 120, cover that the 3rd colored light filter membrane pattern 116a goes up and the second colored light filter membrane layer 108a and 108b and flatness layer 112a that are not covered by the 3rd colored light filter membrane pattern 116a on.
Afterwards, please refer to Fig. 2 F, carry out flatening process, make flatness layer 120 planarizations, form flatness layer 120a.The method of the material of flatness layer 120 and formation method and planarization repeats no more in this as described in the flatness layer 112 of first embodiment.So far, finish the making of colored filter 20.
In brief, the colored filter 20 of present embodiment is to be disposed on the substrate 100, and it comprises the first extinction rete 102, first colored light filter membrane layer 104, the second extinction film figure 106a, 106b, the second colored light filter membrane pattern 108a, 108b, the 3rd extinction film figure 114a, the 3rd colored light filter membrane pattern 116a and flatness layer 112a, 120a.First colored light filter membrane layer 104 is positioned on the substrate 100.The first extinction rete 102 is between first colored light filter membrane layer 104 and substrate 100.The second colored light filter membrane pattern 108a, 108b, cover part first colored light filter membrane layer 104 respectively.The second extinction film figure 106a is between the second colored light filter membrane pattern 108a and first colored light filter membrane layer 104.The second extinction film figure 106b is between the second colored light filter membrane pattern 108b and first colored light filter membrane layer 104.The 3rd colored light filter membrane pattern 116a cover part second colored light filter membrane pattern 108b.The 3rd extinction film figure 114a is between the 3rd colored light filter membrane pattern 116a and the second colored light filter membrane pattern 108b.Flatness layer 112a then covers not on first colored light filter membrane layer 104 that is covered by the second colored light filter membrane pattern 108a.Flatness layer 120a then covers not on the second colored light filter membrane pattern 108a, the 108b and flatness layer 112a that is covered by the 3rd colored light filter membrane pattern 116a, or more covers on the 3rd colored light filter membrane pattern 116a.
When light 5 after substrate 100 tops enter colored filter 20, in the light by the 3rd colored light filter membrane pattern 116a, the light of subband is reflected by the 3rd colored light filter membrane pattern 116a, reaches the purpose of filtering particular color; The light of residue wave band is then absorbed by the 3rd extinction film figure 114a, and can not pass through the 3rd extinction film figure 114a, is produced the interference on the color again by the second colorized optical filtering membrane filtration pattern 108b of its below reflection.And the situation of light that enters into the light of the second colored light filter membrane layer 108b and enter into first colored light filter membrane layer 104 by flatness layer 112a, 120a by flatness layer 120a is as person as described in first embodiment.So colored filter 20 can reach the purpose of filtering three kinds of colors.
Embodiment three
Fig. 3 A to Fig. 3 F is the flow process diagrammatic cross-section according to a kind of manufacturing method of color filters that third embodiment of the invention illustrated.
Please refer to Fig. 3 A to Fig. 3 F, the method and second embodiment of present embodiment manufacturing colored filter are similar, but it is slightly different, its discrepancy is it is to utilize patterning photoresist layer 210 to be used as mask in a second embodiment, patterning second colored light filter membrane layer 108 and the second extinction rete 106 are to form the second colored light filter membrane pattern 108a, 108b and the second extinction film figure 106a, 106b.Afterwards, make the 3rd colored light filter membrane pattern 116a and the 3rd extinction film figure 114a be formed on the second colored light filter membrane pattern 108b again.Present embodiment then is to utilize patterning photoresist layer 310 to be used as mask, with patterning second colored light filter membrane layer 108 and the second extinction rete 106, forms the second colored light filter membrane pattern 108a and the second extinction film figure 106a.At last, make the 3rd colored light filter membrane pattern 116a and the 3rd extinction film figure 114a be formed on the flatness layer 112a.Yet, the 3rd colored light filter membrane pattern 116a of the present invention and the 3rd extinction film figure 114a are not limited in and are formed on the second colored light filter membrane pattern 108b or the flatness layer 112a, also can be formed on simultaneously on the second colored light filter membrane pattern 108b and the flatness layer 112a.So far, finish the making of colored filter 30.
In brief, the colored filter 30 of present embodiment is to be disposed on the substrate 100, and it comprises the first extinction rete 102, first colored light filter membrane layer 104, the second extinction film figure 106a, the second colored light filter membrane pattern 108a, the 3rd extinction film figure 114a, the 3rd colored light filter membrane pattern 116a and flatness layer 112a, 120a.First colored light filter membrane layer 104 is positioned on the substrate 100.The first extinction rete 102 is between first colored light filter membrane layer 104 and substrate 100.The second colored light filter membrane pattern 108a, cover part first colored light filter membrane layer 104.The second extinction film figure 106a is between the second colored light filter membrane pattern 108a and first colored light filter membrane layer 104.Flatness layer 112a then covers not on first colored light filter membrane layer 104 that is covered by the second colored light filter membrane pattern 108a.The 3rd colored light filter membrane pattern 116a cover part flatness layer 112a.The 3rd extinction film figure 106a is between the 3rd colored light filter membrane pattern 116a and flatness layer 112a.Flatness layer 120a then covers not on the second colored light filter membrane pattern 108a and flatness layer 112a that is covered by the 3rd colored light filter membrane pattern 116a, or more covers on the 3rd colored light filter membrane pattern 116a.
When light 5 after substrate 100 tops enter colored filter 30, in the light by the 3rd colored light filter membrane pattern 116a, the light of subband is reflected by the 3rd colored light filter membrane pattern 116a, reaches the purpose of filtering particular color; The light of residue wave band is then absorbed by the 3rd extinction film figure 114a, and can not pass through the 3rd extinction film figure 114a and flatness layer 112a, is produced the interference on the color again by first color filter film, 104 reflections of its below.And by flatness layer 120a, the situation of light that enters into the light of the second colored light filter membrane layer 108a again and enter into first colored light filter membrane layer 104 is as person as described in first embodiment.So colored filter 30 can reach the purpose of filtering three kinds of colors.
In another embodiment, please refer to Fig. 3 F-1, colored filter 40 is similar to colored filter 20,30, but, the 3rd colored light filter membrane pattern 116a cover part flatness layer 112a and the second colored light filter membrane pattern 108c partly.Its manufacture method is similar to previous embodiment person, repeats no more in this.After light 5 entered colored filter 40, in the light by the 3rd colored light filter membrane pattern 116a, the light of subband was reflected by the 3rd colored light filter membrane pattern 116a, reached the purpose of filtering particular color; The light of residue wave band is then absorbed by the 3rd extinction film figure 114a, and can pass through the 3rd extinction film figure 114a, again by the second colored light filter membrane pattern 108c of its below or 104 reflections of first colored light filter membrane layer and the interference on the generation color.And by flatness layer 120a, the situation of light that enters into the light of the second colored light filter membrane layer 108c again and enter into first colored light filter membrane layer 104 by flatness layer 120a, 112a is as person as described in first embodiment.So colored filter 40 can reach the purpose of filtering three kinds of colors.
Embodiment four
Fig. 4 is the synoptic diagram of a kind of reflecting type liquid crystal display panel of illustrating according to fourth embodiment of the invention.
Please refer to Fig. 4, the reflecting type liquid crystal display panel 460 of present embodiment comprises transparency carrier 400, reflection substrate 414 and the liquid crystal layer 430 between transparency carrier 400 and reflection substrate 414.
According to the difference of application, transparency carrier 400 can be selected flexible base plate or hard substrate for use.For example, often the hard substrate that uses is glass substrate, quartz base plate etc., and the flexible base plate that often uses is plastic substrate.Dispose an electrode layer 402 on one surface of transparency carrier 400.The material of electrode layer 402 for example is a tin indium oxide.Then dispose a polaroid 406 on another surface of transparency carrier 400.
In reflecting type liquid crystal display panel 460, an element layer 416 is arranged on the surface of reflection substrate 414.Element layer 416 can be active component layer or passive element layer.The active component layer can comprise that thin film transistor (TFT) and pixel electrode constitute, or is made of metal oxide semiconductcor field effect transistor and pixel electrode.The passive element layer then can comprise electrode.
In addition, on the surface of reflection substrate 414, also has colored filter 418.Colored filter 418 can be disposed at element layer 416 tops (as shown in Figure 4), also can be disposed between reflection substrate 414 and the element layer 416 (not illustrating).Colored filter 418 can be the above embodiment of the present invention 1 to 3 described colored filter 10,20,30 or 40.
In one embodiment, alignment film 404 is configured between the electrode layer 402 and liquid crystal layer 430 of transparency carrier 400, and alignment film 420 for example be configured between colored filter 418 and the liquid crystal layer 430 (shown in Figure 4) or be configured in colored filter 418 and element layer 416 between (not illustrating).Alignment film 404,420 usefulness reach the purpose of pre-dumping so that the liquid crystal alignment in the liquid crystal layer 430.Yet, in another embodiment, display panels can not need alignment film 404,430, by doping light alignment materials (not illustrating) in liquid crystal layer 430, also can be so that liquid crystal layer influences the arrangement of liquid crystal molecule in the liquid crystal layer after irradiates light, for example can make liquid crystal molecule arrange and change nematic mode arrangement, the arrangement of mixing nematic mode into from level (homogenous) originally, or the arrangement of other patterns.
When light 450 passes through substrate 400, liquid crystal layer 430 arrival colored filters 418 from Polarizer 406 after, the light 450 of specific band can be reflected by colored filter 418, reach the purpose of optical filtering.
Manufacturing method of color filters of the present invention is to form the first extinction rete, first colored light filter membrane layer, the second extinction rete and second colored light filter membrane layer in regular turn earlier on substrate, carries out patterning again.Therefore, photoresist layer is formed on the second smooth colored light filter membrane layer, so, when carrying out gold-tinted technology, its be easy to control and degree of difficulty lower, can reduce wrong situation of aiming at.In addition, photoresist layer is not to remove in the mode that divests, and therefore, simple and cleanliness factor technology of its technology is easy to control.
In addition, manufacturing method of color filters of the present invention can be so that the colored light filter membrane pattern of each color be roughly rectangular, so can avoid the influence of the optical appearance that uneven thickness causes, increase the area of reflection, and almost very close to each other between the filter coating pattern (pixel) of different colours, so but the aperture opening ratio of lift elements.Flatness layer in the color filter technology of the present invention is easy to fill up and can reduces the surface height after carrying out flatening process and rises and falls, and rises and falls to the orientation problem that liquid crystal caused so can reduce the surface height.
Though the present invention discloses as above with embodiment; right its is not in order to qualification the present invention, any those skilled in the art, without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking the claim person of defining.
Claims (20)
1. colored filter comprises:
First colored light filter membrane layer is positioned on the substrate;
The first extinction rete is between this substrate and this first colored light filter membrane layer;
Second colored light filter membrane pattern, this first colored light filter membrane layer of cover part; And
The second extinction film figure, between this second colored light filter membrane pattern and this first colored light filter membrane layer,
Wherein the light of subband is reflected by this second colored light filter membrane pattern, and this light of residue wave band is then absorbed by this second extinction film figure.
2. colored filter as claimed in claim 1 also comprises flatness layer, covers not on this first colored light filter membrane layer that is covered by this second colored light filter membrane pattern.
3. colored filter as claimed in claim 2, wherein the material of this flatness layer comprises tetraethoxy silica alkoxide silicon, non-impurity-doped silex glass, boron-phosphorosilicate glass, phosphorosilicate glass, advanced low-k materials and combination thereof.
4. colored filter as claimed in claim 2 also comprises:
The 3rd extinction film figure of the 3rd colored light filter membrane pattern and below thereof, this second colored light filter membrane pattern of cover part, or this flatness layer of cover part, or this second colored light filter membrane pattern of cover part and partly this flatness layer simultaneously.
5. colored filter as claimed in claim 4, wherein the material of this first extinction rete, this second extinction film figure and the 3rd extinction film figure comprises titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum or molybdenum nitride.
6. colored filter as claimed in claim 4, wherein this first colored light filter membrane layer, this second colored light filter membrane pattern and the 3rd colored light filter membrane pattern are inorganic plated film.
7. the formation method of a colored filter comprises:
On substrate, form the first extinction rete;
On this first extinction rete, form first colored light filter membrane layer;
On this first colored light filter membrane layer, form the second extinction rete;
On this second extinction rete, form second colored light filter membrane layer; And
This second colored light filter membrane layer of patterning and this second extinction rete, forming second colored light filter membrane pattern and the second extinction film figure,
Wherein the light of subband is reflected by this second colored light filter membrane pattern, and this light of residue wave band is then absorbed by this second extinction film figure.
8. the formation method of colored filter as claimed in claim 7 also is included in not on this first color filter film that is covered by this second colored light filter membrane pattern and forms first flatness layer.
9. the formation method of colored filter as claimed in claim 8 also comprises this first flatness layer is carried out flatening process.
10. the formation method of colored filter as claimed in claim 8 also comprises:
On this substrate, form the 3rd extinction rete and the 3rd colored light filter membrane layer; And
Patterning the 3rd colored light filter membrane layer and the 3rd extinction rete, to form the 3rd colored light filter membrane pattern and the 3rd extinction film figure, this second colored light filter membrane pattern of cover part, or this flatness layer of cover part, or this second colored light filter membrane pattern of cover part and partly this flatness layer simultaneously.
11. the formation method of colored filter as claimed in claim 10 also comprises forming second flatness layer, covers not on this first flatness layer and this second colored light filter membrane pattern that is covered by the 3rd colored light filter membrane pattern.
12. the formation method of colored filter as claimed in claim 10, wherein the material of this first extinction rete, this second extinction film figure and the 3rd extinction film figure comprises titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum or molybdenum nitride.
13. the formation method of colored filter as claimed in claim 10, wherein this first colored light filter membrane layer, this second colored light filter membrane pattern and the 3rd colored light filter membrane pattern are inorganic plated film.
14. a reflecting type liquid crystal display panel comprises:
Transparency carrier has first electrode layer on it;
Reflection substrate has on it:
Element layer;
Colored filter, this colored filter comprises:
First colored light filter membrane layer is positioned on this reflection substrate;
The first extinction rete is between this reflection substrate and this first color filter film;
Second colored light filter membrane pattern, this first color filter film of cover part; And
The second extinction film figure is between this second colored light filter membrane pattern and this first color filter film; And
Liquid crystal layer is disposed between this first electrode layer and this colored filter,
Wherein the light of subband is reflected by this second colored light filter membrane pattern, and this light of residue wave band is then absorbed by this second extinction film figure.
15. reflecting type liquid crystal display panel as claimed in claim 14, wherein this reflection substrate comprises semiconductor substrate, or has another transparency carrier in reflection horizon.
16. reflecting type liquid crystal display panel as claimed in claim 14 also comprises polaroid, is arranged at this transparency carrier and is not provided with on the surface of this first electrode layer.
17. reflecting type liquid crystal display panel as claimed in claim 14, wherein this colored filter also comprises flatness layer, covers not on this first colored light filter membrane layer that is covered by this second colored light filter membrane pattern.
18. reflecting type liquid crystal display panel as claimed in claim 17, wherein the material of this flatness layer comprises tetraethoxy silica alkoxide silicon, non-impurity-doped silex glass, boron-phosphorosilicate glass, phosphorosilicate glass, advanced low-k materials and combination thereof.
19. reflecting type liquid crystal display panel as claimed in claim 17, wherein this colored filter also comprises:
The 3rd extinction film figure of the 3rd colored light filter membrane pattern and below thereof, this second colored light filter membrane pattern of cover part, or this flatness layer of cover part, or this second colored light filter membrane pattern of cover part and partly this flatness layer simultaneously.
20. reflecting type liquid crystal display panel sheet as claimed in claim 19, wherein the material of this first extinction rete, this second extinction film figure and the 3rd extinction film figure comprises titanium, titanium nitride, tantalum, tantalum nitride, chromium, molybdenum or molybdenum nitride.
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| CN108303817A (en) * | 2018-01-22 | 2018-07-20 | 深圳市华星光电技术有限公司 | Colored optical filtering substrates and preparation method thereof |
| CN108873519A (en) * | 2018-06-27 | 2018-11-23 | 深圳市华星光电技术有限公司 | COA type array substrate and preparation method thereof |
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| US4258126A (en) * | 1976-12-23 | 1981-03-24 | Dr. Johannes Heidenhain Gmbh | High resolution recording medium and method for producing same |
| CN1414417A (en) * | 2001-10-24 | 2003-04-30 | 精工爱普生株式会社 | Liquid crystal display device and electronic equipment |
| US20060275967A1 (en) * | 2005-05-12 | 2006-12-07 | Yoon-Ho Kang | Display device and manufacturing method thereof |
| CN1920623A (en) * | 2005-08-26 | 2007-02-28 | 联诚光电股份有限公司 | Reflective silicon single crystal liquid crystal panel and projection device using same |
| CN101059575A (en) * | 2006-04-19 | 2007-10-24 | 群康科技(深圳)有限公司 | Colorful filter and its production method, liquid crystal display and its production method |
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Patent Citations (5)
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| US4258126A (en) * | 1976-12-23 | 1981-03-24 | Dr. Johannes Heidenhain Gmbh | High resolution recording medium and method for producing same |
| CN1414417A (en) * | 2001-10-24 | 2003-04-30 | 精工爱普生株式会社 | Liquid crystal display device and electronic equipment |
| US20060275967A1 (en) * | 2005-05-12 | 2006-12-07 | Yoon-Ho Kang | Display device and manufacturing method thereof |
| CN1920623A (en) * | 2005-08-26 | 2007-02-28 | 联诚光电股份有限公司 | Reflective silicon single crystal liquid crystal panel and projection device using same |
| CN101059575A (en) * | 2006-04-19 | 2007-10-24 | 群康科技(深圳)有限公司 | Colorful filter and its production method, liquid crystal display and its production method |
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