CN101550532A - Heating device used for vacuum plating equipment - Google Patents
Heating device used for vacuum plating equipment Download PDFInfo
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- CN101550532A CN101550532A CNA2009100276148A CN200910027614A CN101550532A CN 101550532 A CN101550532 A CN 101550532A CN A2009100276148 A CNA2009100276148 A CN A2009100276148A CN 200910027614 A CN200910027614 A CN 200910027614A CN 101550532 A CN101550532 A CN 101550532A
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- heating
- evaporation container
- well heater
- evaporation
- heating unit
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Abstract
The invention discloses a heating device used for a vacuum plating equipment, comprising a steam plating container and a heater; wherein the bottom of the steam plating container bulges upwards to form a heat-conductive trough; and the heating part of the heater is matched with the heat-conductive trough for heating. The heating device improves the heat energy utilization ratio of the equipment and prevents the cross pollution of the material in the steam plating chamber.
Description
Technical field
The invention belongs to the vacuum thermal evaporation technical field, be specifically related to a kind of heating unit that is used for vacuum coating film equipment.
Background technology
Vacuum coating technology occupies special consequence as a kind of important means of film preparation in modern microelectronics and micro element preparation; This technology is meant utilizes physics or chemical means to have the surface treatment method of special purpose rete at workpiece surface deposition one deck under vacuum environment.Generally vacuum coating technology is divided into two big classes: a class is a physical vapor deposition, is called PVD; Another kind of is chemical vapour deposition, is called CVD; Wherein the simplest the most frequently used be exactly thermal evaporation, evaporation after promptly utilizing material to be heated or distillation are translated into gaseous state and are deposited on substrate surface again.Corresponding therewith vacuum coating film equipment generally comprises deposited chamber, turret system, air-bleed system, inlet system, power-supply system, Controlling System and heating unit; Described heating unit generally comprises evaporation container and well heater.During use, substrate is fixed on the turret system, deposition material is placed the evaporation container, utilize this evaporation container of heater heats again, make the deposition material in it be converted into gaseous deposit, thereby reach the purpose of evaporation film-forming at substrate surface.In actual applications, usually need be on substrate the rete of continuous evaporating-plating several layers differing materials, thereby be typically provided with a plurality of supporting evaporation container and well heaters a vacuum coating film equipment kind, place a kind of deposition material in each evaporation container, successively various deposition materials are converted into gaseous state according to actual demand and are deposited on substrate surface again, thereby finish the preparation of the plural layer rete of substrate.
Existing heating unit mostly is traditional external-heat, a kind of evaporation container and a kind of well heater that U.S. RD Mathis company as shown in Figure 1 produces, evaporation container 1 is placed among the well heater 2, after the positive and negative polarities of well heater feed electric current, the heater strip spirrillum partly produces high heat, thereby the material in the evaporation container is heated.Evaporation container and well heater that although people have prepared is different, structured material is different, but when adopting this external-heat method to carry out the material evaporation, there are the following problems: (1) is because well heater is wrapped in the outside of evaporation container, a large amount of heats can outwards dissipate by thermal radiation, and the heat that is used to heat the evaporation container only accounts for a part seldom, thereby the effective rate of utilization of heat energy is very low; (2) the above-mentioned a large amount of heats that outwards dissipate have increased the temperature of deposited chamber, make the interior material of other evaporation containers of periphery that evaporation or distillation take place, thereby have caused the crossed contamination of evaporation indoor material, cause prepared film and device performance to descend.
At the problems referred to above, mostly adopt the mode of blocking or cooling with the minimizing crossed contamination in the prior art, but its cost of manufacture is all very high.In addition, the contriver once attempted the mode with internal heating, promptly with reference to existing internal heating mode, as " immersion heater " of heating up water, well heater is directly placed the material that heats in the evaporation container wherein, yet, there are the following problems for this type of heating: because well heater directly contacts with deposition material, in evaporate process, deposition material must be attached on the well heater, caused the waste of material on the one hand, also polluted well heater on the other hand, made in its evaporation container that can't be applied to other materials again.
Summary of the invention
The purpose of this invention is to provide a kind of heating unit that is used for vacuum coating film equipment, improving the utilization ratio of heat energy, and prevent the crossed contamination of evaporation indoor material.
To achieve the above object of the invention, the technical solution used in the present invention is: a kind of heating unit that is used for vacuum coating film equipment comprises evaporation container and well heater, the bottom of the described evaporation container formation thermal trough that raises up; The heating part of described well heater cooperates heating with described thermal trough.
Above, the bottom of the described evaporation container formation thermal trough that raises up, be to heat for well heater is inserted in the thermal trough, utilize the evaporation container that the heating part of well heater is wrapped up, thereby prevented that thermal radiation from outwards distributing, make that the heat energy of the overwhelming majority all is to be used for heating the evaporation container, thereby improved the utilization ratio of heat energy greatly; The material cross-contamination issue that the thermal radiation of also having avoided simultaneously outwards distributing causes.Thereby the shape of described thermal trough can be a cuboid, also can be other shapes, as long as and the heating part of well heater cooperate, maximum best with contact area, with the raising heat transfer area.Described evaporation container is a prior art, and its composition material can be quartz, graphite, boron nitride, aluminum oxide, tantalum, molybdenum, tungsten, copper, stainless steel or other pottery and metallic substance.Described well heater also is a prior art, its material can be tantalum, molybdenum, tungsten or stainless steel, preferred heating part is the small and exquisite well heater of volume, be convenient in the described thermal trough of the directly whole insertion in heating part, can certainly design the profile of well heater, make it follow the evaporation container to cooperate, be more suitable in heating.
In the technique scheme, the centre of described well heater raises up, and forms described heating part.
Further technical scheme, described thermal trough has 2, and symmetry is positioned at the bottom center position of evaporation container.It is for the equilibrium heating that a plurality of thermal troughs are set.
The present invention asks for protection the evaporation container of above-mentioned heating unit simultaneously, the bottom of the described evaporation container formation thermal trough that raises up.
Because the employing of technique scheme, compared with prior art, the present invention has following advantage:
1. the evaporation container bottom of the present invention formation thermal trough that raises up, heat thereby the heating part of well heater can be inserted in the thermal trough, utilize the evaporation container that the heating part of well heater is wrapped up, thereby prevented that thermal radiation from outwards distributing, make that the heat energy of the overwhelming majority all is to be used for heating evaporation container and inner deposition material thereof, thereby improved the utilization ratio of heat energy greatly; The material cross-contamination issue that the thermal radiation of also having avoided simultaneously outwards distributing causes has been obtained significant effect.
2. well heater of the present invention is arranged on the bottom of evaporation container, and the material in the discord evaporation container directly contacts, thereby well heater can use repeatedly, has improved utilization ratio, has also reduced cost simultaneously.
3. heating unit of the present invention is simple in structure, and cost is lower, is suitable for applying.
Description of drawings
Fig. 1 is the structural representation of heating unit in the background technology;
Fig. 2 is the sectional view of the embodiment of the invention one;
Fig. 3 is the vertical view of the embodiment of the invention one;
Fig. 4 is the stereographic map of evaporation container in the embodiment of the invention one;
Fig. 5 is the sectional view of Fig. 4;
Fig. 6 is the another sectional view of Fig. 4;
Fig. 7 is the sectional view of the embodiment of the invention two;
Fig. 8 is the front view of well heater in the embodiment of the invention two;
Fig. 9 is the vertical view of well heater in the embodiment of the invention two.
Wherein: 1, evaporation container; 2, well heater; 3, thermal trough; 4, heating part.
Embodiment
Below in conjunction with embodiment the present invention is further described:
Embodiment one
Shown in accompanying drawing 2～6, a kind of heating unit that is used for vacuum coating film equipment comprises evaporation container 1 and well heater 2, and the bottom of described evaporation container raises up and forms thermal trough 3; The heating part 4 of described well heater cooperates heating with described thermal trough 3.The centre of described well heater 2 raises up, and forms described heating part 4.The shape of the thermal trough of present embodiment is a cuboid, and the heating part 4 of described well heater also is the cuboid that cooperates.
Above, the bottom of the described evaporation container formation thermal trough that raises up, be to heat for well heater is inserted in the thermal trough, utilize the evaporation container that the heating part of well heater is wrapped up, thereby prevented that thermal radiation from outwards distributing, make that the heat energy of the overwhelming majority all is to be used for heating the evaporation container, thereby improved the utilization ratio of heat energy greatly; The material cross-contamination issue that the thermal radiation of also having avoided simultaneously outwards distributing causes.Described evaporation container is a prior art, and its composition material can be quartz, graphite, boron nitride, aluminum oxide, tantalum, molybdenum, tungsten, copper, stainless steel or other pottery and metallic substance.Described well heater also is a prior art, and its material can be tantalum, molybdenum, tungsten or stainless steel, and the well heater profile of present embodiment is designed to cuboid, makes it follow the evaporation container to cooperate, and is more suitable in heating; Simultaneously, the heating part at heater center position is thin and narrow, and the connection electrode at two ends is thicker and wide, make the resistance of heating part much larger than the connection electrode place, thereby the heat overwhelming majority produces in the heating part.
The applicant has carried out the experiment contrast to heating unit of the present invention and existing common external heating type heating unit: the used evaporation container of traditional heating unit is the quartz crucible of high 12.5mm, external diameter 12.5mm, wall thickness 0.8mm; The evaporation container of present embodiment forms the thermal trough except the bottom raises up, and its outside dimension is identical with common evaporation container with shape; The thick N of evaporation 100nm on silicon chip respectively then, N '-(1-naphthyl)-N, N '-phenylbenzene-4, the organic molecule film of 4 '-benzidine (being called for short NPB), the molecular formula of described NPB is: C
44H
32N
2, structural formula is:
Its glass transition temp (Tg)=99 ℃; The evaporation temperature is approximately 400 ℃, is under the condition of 0.4nm/s in evaporation speed, and two kinds of different heating units all need the evaporate process of 250s.Experimental results show that: traditional heating unit needs the heating power of 100W just can reach the evaporation speed of 0.4nm/s, and heating unit of the present invention only needs the heating power of 30W just can reach the evaporation speed of 0.4nm/s; Thereby improved the utilization ratio of heat energy greatly; And for traditional heating unit, the power that is wasted of these nearly 70W will cause more serious material crossed contamination by thermal radiation in deposited chamber, thereby be difficult to reach the purpose of the qualified organic film of preparation.
Embodiment two
Shown in accompanying drawing 7～9, a kind of heating unit that is used for vacuum coating film equipment comprises evaporation container 1 and well heater 2, the bottom of the described evaporation container formation thermal trough that raises up; The heating part 4 of described well heater cooperates heating with described thermal trough.The centre of described well heater 2 raises up, and forms described heating part 4.The shape of the thermal trough of present embodiment is similar to small hill shape, and the heating part 4 of described well heater also is the acute angle shape that cooperates.
Claims (4)
1. a heating unit that is used for vacuum coating film equipment comprises evaporation container (1) and well heater (2), it is characterized in that: the bottom of described evaporation container raises up and forms thermal trough (3); The heating part of described well heater (4) cooperates heating with described thermal trough (3).
2. the heating unit that is used for vacuum coating film equipment according to claim 1 is characterized in that: the centre of described well heater (2) raises up, and forms described heating part (4).
3. the heating unit that is used for vacuum coating film equipment according to claim 1 is characterized in that: described thermal trough (3) has 2, and symmetry is positioned at the bottom center position of evaporation container.
4. evaporation container that is used for the heating unit of vacuum coating film equipment is characterized in that: the bottom of the described evaporation container formation thermal trough that raises up.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2009100276148A CN101550532A (en) | 2009-05-14 | 2009-05-14 | Heating device used for vacuum plating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2009100276148A CN101550532A (en) | 2009-05-14 | 2009-05-14 | Heating device used for vacuum plating equipment |
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| Publication Number | Publication Date |
|---|---|
| CN101550532A true CN101550532A (en) | 2009-10-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNA2009100276148A Pending CN101550532A (en) | 2009-05-14 | 2009-05-14 | Heating device used for vacuum plating equipment |
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| CN (1) | CN101550532A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105648405A (en) * | 2016-03-29 | 2016-06-08 | 苏州方昇光电装备技术有限公司 | Organic material evaporator |
| WO2017114364A1 (en) * | 2015-12-31 | 2017-07-06 | 中国建材国际工程集团有限公司 | Crucible for accommodating and heating material, and system comprising arranged crucible and heater |
| WO2017114367A1 (en) * | 2015-12-31 | 2017-07-06 | 中国建材国际工程集团有限公司 | Heater device for heating crucible, operation method therefor and crucible for containing and heating material to be evaporated or sublimated |
| CN113567224A (en) * | 2021-01-29 | 2021-10-29 | 广东润鹏生物技术有限公司 | Heating device and to-be-heated member |
-
2009
- 2009-05-14 CN CNA2009100276148A patent/CN101550532A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017114364A1 (en) * | 2015-12-31 | 2017-07-06 | 中国建材国际工程集团有限公司 | Crucible for accommodating and heating material, and system comprising arranged crucible and heater |
| WO2017114367A1 (en) * | 2015-12-31 | 2017-07-06 | 中国建材国际工程集团有限公司 | Heater device for heating crucible, operation method therefor and crucible for containing and heating material to be evaporated or sublimated |
| KR20180098668A (en) * | 2015-12-31 | 2018-09-04 | 차이나 트라이엄프 인터내셔널 엔지니어링 컴퍼니 리미티드 | A system comprising crucible and crucible and heater arrangement to tolerate and heat the material |
| JP2019506536A (en) * | 2015-12-31 | 2019-03-07 | チャイナ トライアンフ インターナショナル エンジニアリング カンパニー リミテッドＣｈｉｎａ Ｔｒｉｕｍｐｈ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｅｎｇｉｎｅｅｒｉｎｇ Ｃｏ．，Ｌｔｄ． | A crucible for containing and heating materials and a system including a crucible and a heater set |
| EP3399069A4 (en) * | 2015-12-31 | 2019-10-16 | China Triumph International Engineering Co., Ltd. | Crucible for accommodating and heating material, and system comprising arranged crucible and heater |
| EP3399068A4 (en) * | 2015-12-31 | 2019-12-04 | China Triumpf International Engineering Co. Ltd. | Heater device for heating crucible, operation method therefor and crucible for containing and heating material to be evaporated or sublimated |
| KR102138990B1 (en) | 2015-12-31 | 2020-07-29 | 차이나 트라이엄프 인터내셔널 엔지니어링 컴퍼니 리미티드 | A system comprising a crucible for melting and heating the material and a crucible and heater configuration |
| CN105648405A (en) * | 2016-03-29 | 2016-06-08 | 苏州方昇光电装备技术有限公司 | Organic material evaporator |
| CN113567224A (en) * | 2021-01-29 | 2021-10-29 | 广东润鹏生物技术有限公司 | Heating device and to-be-heated member |
| CN113567224B (en) * | 2021-01-29 | 2022-09-06 | 广东润鹏生物技术有限公司 | Heating device and to-be-heated member |
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Application publication date: 20091007 |