CN101546002A - Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band - Google Patents
Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band Download PDFInfo
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Abstract
The invention relates to a fused silica transmission polarization light-splitting grating used at 1064 nano wave band. The grating is characterized in that the cycle of the grating is 604 to 624 nanometers; the groove depth is 1.32 to 1.42 micrometres; and the dutyfactor is 0.5. The polarization light-splitting grating only has minus 1 order and 0 order diffraction, and can respectively diffract TE polarization and TM polarization incident ray to minus 1 order and 0 order transmitted light beams under the condition of autocollimation right-angle setting; and the transmission rate and diffraction rate are respectively higher than 84 percent and 96 percent, while the extinction ratio is more than 20 dB. The sub-wavelength fused silica transmission polarization light-splitting grating is made by a micro machining method, and can realize batch production at low cost; moreover, the manufactured grating has good polarization light-splitting characteristic and stable and reliable performance.
Description
Technical field
This patent relates to a kind of fused quartz transmission polarization beam-splitting grating device, the 1064 nano waveband sub-wavelength fused silica polarization beam-splitting gratings that particularly a kind of autocollimatic right angle is provided with.
Background technology
1064 nano wavebands are one of common optical source wavelengths of high intensity laser beam system, are widely used in industry, national defence and scientific research field.Usually will use polarising beam splitter in laser system, polarising beam splitter requires to possess high extinction ratio and diffraction efficiency, and wide angle accommodation and operation wavelength are stable and reliable for performance, not easy damaged etc.Traditional polarising beam splitter has dichroic material by birefringece crystal or multilayer dielectric film etc. usually and constitutes, the birefringece crystal volume is big, efficient is low, can't satisfy the requirement of optical system miniaturization, integrated and high efficiency, though and multilayer dielectric film polarization beam apparatus efficient height, but complex manufacturing technology, easy damaged.Along with the deep development of micro-processing technology, the researchist finds that gradually the grating cycle has good polarization characteristic less than the sub-wave length grating of lambda1-wavelength, and volume is little, efficient is high, easy of integration, get more and more people's extensive concerning.People such as Zhang Liang have reported design based on the polarising beam splitter of the sub-wavelength rectangular raster of aluminum metal, and [formerly technology 1: Zhang Liang, Deng, 2006 Chinese lasers, 33467], because the metal grating layer absorbs the thermal effect of generation by force to laser, metal grating is worked under high intensity laser beam be damaged easily, can not be used for strong laser system.Fused quartz is because low absorption coefficient, Heat stability is good, has high anti-damage thresholding, it is the ideal material of preparation high intensity laser beam polarization beam apparatus, people such as Wang Bo have carried out reporting [formerly technology 2:Wang B et al., 2007 OpticsLetters 32 1299] to the design of the deep etching quartz grating polarization beam splitter of 1550 nano wave lengths.
The sub-wavelength fused silica grating is to utilize the microfabrication method, processes the sub-wave length grating of grating cycle less than operation wavelength in the fused quartz substrate.Because the cycle is less than lambda1-wavelength, i.e. operation wavelength, grating only exists-1 grade and 0 order diffraction, by grating parameter is optimized design, can make grating have good polarization beam splitting performance.The computational analysis of the diffraction characteristic of sub-wave length grating can not be adopted scalar diffraction theory, and must adopt vector grating electromagnetic theory.Vector grating electromagnetic theory is based on Maxwell equation and in conjunction with the grating boundary condition, finds the solution accurately by Computer Simulation.People such as Moharam have provided based on the algorithm of the rigorous coupled wave theory of vector grating electromagnetic theory [technology 3:Moharam MG et al. formerly, 1995J.Opt.Soc.Am.A 12 1077], can solve this class sub-wavelength fused silica grating diffration problem.Formerly technology 4[authorizes patent of invention number: 2006100234207] provided the deep erosion rectangular raster device of realizing polarization beam splitting, formerly technology 5[authorizes patent of invention number: 200510026558.8] provided quartz transmission grating device based on 1053 nano wavebands.As far as we know, nobody provides the sub-wavelength fused silica transmission polarization beam-splitting optical grating at 1064 nano wavebands at present.Therefore the sub-wavelength quartz transmission-polarizing beam-splitting grating that can realize having High Extinction Ratio and diffraction efficiency, wide incident angle and operation wavelength will have important Practical significance.
Summary of the invention
The purpose of this invention is to provide a kind of 1064 novel nano waveband sub-wavelength fused silica transmission polarization beam-splitting optical gratings, this grating can be two bunch polarized lights of TE polarization (electric vector is parallel to the grating cutting) and the different transmission directions of TM polarization (electric vector is perpendicular to the grating cutting) with the orthogonal a branch of photolysis of two kinds of polarization modes of TE, TM.To the incident light of 1064nm wavelength ,-1 grade surpasses 84% and 96% respectively with 0 grade of transmission diffraction efficient, and the transmission extinction ratio all is higher than 20dB.The sub-wavelength fused silica transmission polarization beam-splitting optical grating of 1064 nano wavebands of the present invention can be in enormous quantities, produce cheaply, and the grating polarization beam splitting characteristic good after the etching is stable and reliable for performance.
Technical solution of the present invention is as follows:
A kind of sub-wavelength fused silica transmission polarization beam-splitting optical grating that is used for 1064 nano wavebands, the cycle that it is characterized in that this grating is that 604 nanometers-624 nanometer, groove depth are 1.32 microns-1.42 microns, grating dutycycle, and promptly the grating ridge is 0.5 with the ratio in grating cycle.
The cycle of the sub-wavelength fused silica transmission polarization beam-splitting optical grating of described 1064 nano wavebands is 614 nanometers, and groove depth is 1.37 microns.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of rectangle sub-wavelength fused silica transmission polarization beam-splitting optical grating.Zone 1 and zone 2 are respectively uniform air (refractive index n
1=1.0) and fused quartz (refractive index n
2=1.4446).Between zone 1 and the zone 2 is the grating layer of periodic structure, the grating periods lambda=-m λ/(2n
1* sin θ), the conllinear order of diffraction when m is provided with for the autocollimatic right angle is inferior, and the present invention is provided with autocollimation and is-1 grade of reflection diffracting light, then m=-1; n
1Be grating incidence zone (zone 1) medium refraction index; λ represents lambda1-wavelength, and θ is the autocollimation incident angle, and λ is a lambda1-wavelength.The linear polarization plane wave of TE polarization and TM polarization is with angle (the autocollimatic right angle is provided with, and promptly is set to-1 grade of reflected light and returns along the incident direction of light) incident.-1 grade with 0 order diffraction optical transmission extinction ratio be defined as T respectively
Ext=10 * log
10(η
TE/ η
TM) and T
Ext=10 * log
10(η
TM/ η
TE), η
TEAnd η
TMBe respectively TE and TM polarization transmission diffraction of light efficient.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theory [formerly technology 3] to calculate extinction ratio and the diffraction efficiency of sub-wavelength fused silica polarization beam-splitting grating at 1064 nano wave length places.Shown in Fig. 2,3, obtain the parameters optimization of High Extinction Ratio rectangle sub-wavelength fused silica transmission polarization beam-splitting optical grating according to Theoretical Calculation, be that 604 nanometers-624 nanometer, etching depth are when being 1.32 microns-1.42 microns promptly when the cycle of grating, the transmission extinction ratio of polarization beam-splitting grating is greater than 20dB, and-1 grade of TE polarization and 0 grade of TM polarization transmission diffraction efficiency are higher than 84% and 96% respectively.Particularly the grating cycle is 614 nanometers, when etching depth is 1.37 microns, can makes the transmission extinction ratio reach 30dB and 40dB respectively, and the transmission diffraction rate reaches 88.3% and 98.4% respectively.
As shown in Figure 4, the grating cycle is 614 nanometers, etching depth is 1.37 microns, incident wavelength λ=1064 nanometers, the extinction ratio of this polarization beam-splitting grating all incident angles in ° ranges of incidence angles of 57.4 °＜θ＜62.3 all can be higher than 20dB, the angle bandwidth of promptly corresponding 4.9 degree ,-1 grade of TE polarization and 0 grade of TM polarization transmission diffraction efficiency are higher than 85.6% and 98.1% respectively.
As shown in Figure 5, cycle is 614 nanometers, etching depth is 1.37 microns, autocollimation incident angle θ=60 degree, the extinction ratio of this polarization beam-splitting grating all incident lights in 1044 nanometers＜λ＜1099 nanometer incident wavelength scopes all can be higher than 20dB, be the wavelength bandwidth of corresponding 55 nanometers ,-1 grade of TE polarization and 0 grade of TM polarization transmission diffraction efficiency are higher than 85% and 99% respectively.
Description of drawings
Fig. 1 is the geometry of the sub-wavelength fused silica transmission polarization beam-splitting optical grating of the present invention's 1064 nano wavebands.
Fig. 2 is the extinction ratio of sub-wavelength fused silica transmission polarization beam-splitting optical grating under different grating cycle and etching depth of the present invention's 1064 nano wavebands, autocollimatic right angle θ=60 degree, incident wavelength λ=1064 nanometers, dutycycle f=0.5.
Fig. 3 is optimizing under grating periods lambda=614 nanometers for the sub-wavelength fused silica transmission polarization beam-splitting optical grating of the present invention's 1064 nano wavebands, 0 grade of transmission extinction ratio of grating is with the change curve of etching depth, incident angle θ=60 degree, incident wavelength λ=1064 nanometers, dutycycle f=0.5.
Fig. 4 is 614 nanometers for the sub-wavelength fused silica transmission polarization beam-splitting optical grating of the present invention's 1064 nano wavebands in the cycle, etching depth is 1.37 microns, incident wavelength λ=1064 nanometers ,-1 grade of the TE/TM polarization and 0 grade of transmission diffraction efficient are with the change curve of incident angle.
Fig. 5 is 614 nanometers for the sub-wavelength fused silica transmission polarization beam-splitting optical grating of the present invention's 1064 nano wavebands in the cycle, etching depth is 1.37 microns, autocollimation incident angle θ=60 degree ,-1 grade of the TE/TM polarization and 0 grade of transmission diffraction efficient are with the change curve of lambda1-wavelength.
Fig. 6 is the index path of holographic exposure record grating.1 represents helium cadmium laser among the figure, and 2 represent shutter, and 3 represent catoptron, and 4 represent beam expanding lens, and 5 represent lens, and 6 represent beam splitter, and 7 represent quartz substrate.
Embodiment
Make the sub-wavelength fused silica transmission polarization beam-splitting optical grating by the microfabrication legal system.Manufacturing process comprises: quartz substrate chromium plating → resist coating → exposure → development → etching → steps such as removal residual chromium film.At first deposit layer of even chromium film basically, and on the chromium film, evenly be coated with the last layer positive photoetching rubber at cleaning, dry fused quartz.Adopt holographic exposure record grating then, as shown in Figure 6, the He-Cd laser instrument, wavelength is 441 nanometers, sends two bundle plane waves and forms interference field with 2 θ angles on quartz substrate, angle is by formula θ=sin
-1[λ/(and 2 * Λ)] determine that wherein λ is the recording light wavelength, Λ is the grating cycle of required processing.After exposure is finished, develop, and spend chrome liquor photoengraving pattern is transferred on the chromium film from photoresist, utilize chemical reagent to remove out unnecessary photoresist.At last, the using plasma lithographic method is transferred to grating pattern on the quartz substrate, and removes out the residual chromium film, just obtains the quartzy grating of rectangle of surface relief structure.
Grating by above step making, at autocollimatic right angle θ=60 degree, when wavelength work is 1064 nanometers, according to table 1, suitably select grating etching depth and cycle, just can obtain the sub-wavelength quartz transmission-polarizing beam-splitting grating of high-diffraction efficiency, High Extinction Ratio, can make TE polarization and TM polarized incident light-1 grade to reach 88.3% and 98.4% respectively with 0 grade of transmission diffraction rate.Extinction ratio all is higher than 20dB in 57.4 °＜θ of incident angle＜62.3 ° and incident wavelength 1044 nanometers＜λ＜1099 nanometer range.
The sub-wavelength fused silica transmission polarization beam-splitting optical grating of 1064 nano wavebands of the present invention, only there are-1 grade and 0 order diffraction, have very high extinction ratio and diffraction efficiency, utilize the microfabrication method to make, can be in enormous quantities, low-cost production, the grating polarization beam splitting characteristic good of making, anti-damage thresholding height, stable and reliable for performance, be a kind of important realization technology of polarization beam apparatus.
Diffraction efficiency and transmission extinction ratio when different grating groove depths of table 1 and cycle
Claims (2)
1, a kind of sub-wavelength fused silica transmission polarization beam-splitting optical grating that is used for 1064 nano wavebands, the cycle that it is characterized in that this grating is that 604 nanometers-624 nanometer, groove depth are 1.32 microns-1.42 microns, the dutycycle of grating is 0.5.
2, the sub-wavelength fused silica transmission polarization beam-splitting optical grating of 1064 nano wavebands according to claim 1, the cycle that it is characterized in that this grating is 614 nanometers, groove depth is 1.37 microns.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102193126A (en) * | 2011-05-26 | 2011-09-21 | 中国科学院上海光学精密机械研究所 | Broadband low-electric field enhanced reflection metal dielectric grating |
| CN102289014A (en) * | 2011-09-16 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers |
| CN103364857A (en) * | 2013-08-08 | 2013-10-23 | 青岛大学 | Wide-spectrum polarization-irrelevant transmission-type grating and preparation method thereof |
| CN103529645A (en) * | 2013-10-25 | 2014-01-22 | 无锡英普林纳米科技有限公司 | Preparation method for nano-seal |
| CN103558659A (en) * | 2013-10-22 | 2014-02-05 | 中国科学院上海光学精密机械研究所 | 1*2 parallel light beam splitting double-surface integral grating |
| CN113009705A (en) * | 2019-12-19 | 2021-06-22 | 苏州苏大维格科技集团股份有限公司 | Structured light assembly for eliminating zero-order diffraction influence |
| US11867937B2 (en) | 2018-01-24 | 2024-01-09 | President And Fellows Of Harvard College | Polarization state generation with a metasurface |
| US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
-
2009
- 2009-04-22 CN CN2009101036974A patent/CN101546002B/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102193126A (en) * | 2011-05-26 | 2011-09-21 | 中国科学院上海光学精密机械研究所 | Broadband low-electric field enhanced reflection metal dielectric grating |
| CN102193126B (en) * | 2011-05-26 | 2012-08-29 | 中国科学院上海光学精密机械研究所 | Broadband low-electric field enhanced reflection metal dielectric grating |
| CN102289014A (en) * | 2011-09-16 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers |
| CN103364857A (en) * | 2013-08-08 | 2013-10-23 | 青岛大学 | Wide-spectrum polarization-irrelevant transmission-type grating and preparation method thereof |
| CN103558659A (en) * | 2013-10-22 | 2014-02-05 | 中国科学院上海光学精密机械研究所 | 1*2 parallel light beam splitting double-surface integral grating |
| CN103529645A (en) * | 2013-10-25 | 2014-01-22 | 无锡英普林纳米科技有限公司 | Preparation method for nano-seal |
| US11867937B2 (en) | 2018-01-24 | 2024-01-09 | President And Fellows Of Harvard College | Polarization state generation with a metasurface |
| CN113009705A (en) * | 2019-12-19 | 2021-06-22 | 苏州苏大维格科技集团股份有限公司 | Structured light assembly for eliminating zero-order diffraction influence |
| US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
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