CN101451233B - Motion control device of rectangle sample magnetron sputtering instrument and control method thereof - Google Patents
Motion control device of rectangle sample magnetron sputtering instrument and control method thereof Download PDFInfo
- Publication number
- CN101451233B CN101451233B CN2007101585737A CN200710158573A CN101451233B CN 101451233 B CN101451233 B CN 101451233B CN 2007101585737 A CN2007101585737 A CN 2007101585737A CN 200710158573 A CN200710158573 A CN 200710158573A CN 101451233 B CN101451233 B CN 101451233B
- Authority
- CN
- China
- Prior art keywords
- sample
- rotating disk
- control
- motion
- motion control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Sampling And Sample Adjustment (AREA)
Abstract
The invention relates to a motion control device and a motion control method for a rectangular sample magnetron sputtering device. The device is provided with an industrial control computer, a motion executing mechanism and a motion control card, wherein the motion control card receives a feedback signal of the motion executing mechanism, transmits a control signal to the motion executing mechanism, and is in communicating connection with the industrial control computer; and a control program is stored in the industrial control computer. The method comprises the following steps: initializing an operation; entering a waiting and status display interface, and simultaneously detecting warning; setting a parameter for system status by hands of a user; setting a control code, and converting a code set by the user into a motion function which can be identified by the motion control card; checking that whether the control program automatically operates according to the control code, and setting a sample status after operation is finished, if so, opening a thread to operate the system and display in real-time; and finishing operation of the program. The device and the method improve the evenness of sample filming, and have the advantages of simple operation, easy realization and convenient installation and portability.
Description
Technical field
The present invention relates to the magnetron sputtering kinetic control system in a kind of material science, specifically a kind of rectangle sample magnetron sputtering instrument motion control device and control method thereof.
Background technology
Magnetron sputtering technique is the process for modifying surface of widely used experiment and production in physical science, material science.So-called " sputter " is exactly can particle (using the gas positive ion usually) with lotus. and the bombardment object causes the phenomenon that the body surface atom overflows from parent.Magnetron sputtering is in the environment of building, to add magnetic field, utilizes the lorentz's force constraint negative electrode target surface electronic motion in magnetic field, causes bombarding the high-energy electron minimizing that the energetic ion of target increases and bombard substrate, makes coating process have characteristics such as low temperature, high speed.But because the harshness of experimental situation, the groping and realize that the artificial regulatory complicacy is loaded down with trivial details of technology, efficient is low, and especially the film forming homogeneity of rectangle sample is difficult to control especially, and only roughly sputtering time and substrate being moved by rule of thumb, to control be unscientific equally.In addition, present motion control integrated circuit board is pci interface or ISA interface, installs and carry all very dumb.
Summary of the invention
In order to overcome above deficiency, the technical problem that the present invention will solve provides a kind of good uniformity, installs and carries rectangle sample magnetron sputtering instrument motion control device and control method thereof flexibly.
For addressing the above problem, the technical scheme that the present invention adopts is:
Apparatus of the present invention have industrial control computer and movement executing mechanism; Between industrial control computer and movement executing mechanism, be provided with motion control card; It receives the feedback signal of movement executing mechanism; And transmit control signal to movement executing mechanism, motion control card carries out communication through USB interface and industrial control computer and is connected, and has the basic function of motion control in the motion control card; Industrial control computer has sequence of control.
Said motion control card comprises micro-chip and motion-control module; The read-write of micro-chip, data signal, address signal and chip selection signal link to each other with motion-control module, and motion-control module links to each other with movement executing mechanism through driving circuit or photoelectric isolating circuit; Micro-chip carries out data communication through USB interface and industrial control computer; Said movement executing mechanism comprises that sample rotating disk rotation stepper-motor, sample rotating disk revolution stepper-motor and sample rotating disk promote stepper-motor.
The inventive method may further comprise the steps:
Initialization operation is carried out in beginning; Get into and wait for and status display interface that Cheng Jinhang alarm detection simultaneously bursts at the seams; The user manually is provided with system status parameters on display interface; The setting of control routine, the code that the user is provided with converts the movement function that motion control card can be discerned to; Whether sequence of control is set by sample state behind automatic operation of control routine and the end of run; Selection is that the journey that then bursts at the seams operational system also shows in real time; The EP operation.
When selecting sequence of control to move automatically, get back to and wait for and the state step display not according to control routine.
Said user manually is provided with system status parameters and comprises system state setting and automatically operation code setting on display interface, wherein the system state setting comprises that be in operation correction, sample title, shape, sample rotating disk pulling speed, sample rotating disk revolution speed, sample rotating disk rotational velocity, the sample of position deviation of sample position, sample needs length and certain corresponding target position of certain sample of plated film part; Automatically the operation code setting comprises that sample is at the residence time of each target position T, the sample action level state before this target position;
Setting state comprises behind the end of run: the sample that this experiment will be operated, the position that this sample stopped after experiment finished.
The said code that the user is provided with converts the movement function that motion control card can discern to and is specially:
The sample rotating disk promotes the pulse-repetition F of stepper motor driver
1PlusChange by following formula:
F
1Plus＝N
1×V
1×I
1/(L×60)+η
1
N wherein
1For promoting stepper-motor, the sample rotating disk accomplishes the needed umber of pulse of a commentaries on classics, V
1Be the sample rotating disk pulling speed that the user sets, I
1Be the reduction ratio of hoisting appliance, L is that stepper-motor is accomplished the stroke that a rotation mechanism promotes or reduces, η
1Error compensation for lifting device;
The pulse-repetition F of sample rotating disk revolution stepper motor driver
2PlusChange by following formula:
F
2Plus＝N
2×V
2×I
2/60+η
2
N wherein
2Accomplish one for sample rotating disk revolution stepper-motor and change needed umber of pulse, V
2Be sample rotating disk revolution speed, I
2Be the reduction ratio of revolution, η
2Error compensation for revolution;
The sample rotating disk promotes the pulse-repetition F of stepper motor driver
3PlusChange by following formula:
F
3Plus＝N
3×V
3×I
3/60+η
3
N in the formula
3Accomplish one for sample rotating disk rotation stepper-motor and change needed umber of pulse, V
3Be the sample rotating disk rotational velocity that the user sets, I
3Be the reduction ratio of free-wheeling system, η
3Error compensation for free-wheeling system.
It is coordinated operation that sample rotating disk rotation stepper-motor and the stepping of sample rotating disk promote motor, sets up the coordinated operation pattern through following equation:
T＝X/V
1 (1)
n＝X/h (2)
V
3＝n×60/T (3)
Wherein X is the length that sample needs the plated film part, and T is the residence time of sample at this target position, and h is that effective etched area of target is high-order, and n needs the number of turns of rotation for this process workpiece.
The inventive method also has following steps: termination routine when detecting guard signal; Said guard signal is the up-down limit position signal of sample rotating disk.
The present invention has following beneficial effect and advantage:
1. improved evenness of sample filming.Apparatus of the present invention make sample stop before different targets through rotation and revolution; And have move up and down, interlock such as sample disc rotation control; Through calculate with the sample unit surface sedimentary material granule amount than the ratio that converts sputtering time to; Thereby calculate sample rotation and the optimal movement speed that moves, guaranteed evenness of sample filming.
2. simple to operate, be prone to realize.The present invention is provided with the fully automatic operation that parameter is come implement device through user interface, comprises setting, operation code setting automatically, the operation prompting of system state and finishes that the back state is provided with etc., and is convenient, flexible, readable strong.
3. installation and easy to carry.The present invention selects the motion control card that has USB interface for use, can be easily and other control unit communications, and like PC, IPC, notebook computer etc.
Description of drawings
Fig. 1 is apparatus of the present invention structured flowchart;
Fig. 2 is the schematic diagram of motion control card in apparatus of the present invention;
Fig. 3 is the inventive method schema;
Embodiment
Like Fig. 1, shown in 2; Rectangle sample magnetron sputtering instrument motion control device of the present invention has industrial control computer and movement executing mechanism; Between industrial control computer and movement executing mechanism, be provided with motion control card, it receives the feedback signal (comprising guard signal) of movement executing mechanism, and transmits control signal to movement executing mechanism; Motion control card carries out communication through USB interface and industrial control computer and is connected; Have the basic function of motion control in the motion control card, industrial control computer has sequence of control, and sequence of control is through accomplishing exercises and control to these function calls.
Said motion control card comprises micro-chip and motion-control module; The read-write of micro-chip, data signal, address signal and chip selection signal link to each other with motion-control module, and motion-control module links to each other with movement executing mechanism through driving circuit or photoelectric isolating circuit; Micro-chip carries out data communication through USB interface and industrial control computer; The limit switch that produces guard signal is connected to corresponding spacing pin; Said movement executing mechanism comprises that sample rotating disk rotation stepper-motor, sample rotating disk revolution stepper-motor and sample rotating disk promote stepper-motor.
In the present embodiment, upper computer through USB interface (adopt CH372) with micro-chip (adopting ATmega168) communication, send instruction and read-write relevant register through micro-chip to motion-control module (adopting MCX314).Jtag interface is a programming port, can be used to do online debugging, carries out communication with micro-chip.
The ATmega168 micro-chip is based on 8 CMOS units of reduce power consumption of AVR enhancement type risc architecture, has following configuration: the In-System Programmable Flash of 16K byte (having the ability that in programming process, can also read, i.e. RWW); The EEPROM of 512 bytes, the SRAM of 1K byte, 23 universaling I/O port lines; 32 general purpose working registers, 3 timer/counters flexibly (T/C) with comparison pattern, the sheet inside/outside interrupts; Serial USART able to programme, the two-wire serial interface of byte-oriented, 1 SPI serial port; 16 tunnel 10 ADC has the programmable watchdog timer of sheet internal oscillator, and the 5 kinds of battery saving modes that can select through software.CPU quits work during idle pulley, and SRAM, T/C, USART, two-wire serial interface, SPI port and interrupt system work on; Quartz oscillator failure of oscillations during power-down mode, all functions all quit work except interruption and hardware reset, and the content of register then keeps always; Nonsynchronous timer continues operation during battery saving mode, and to allow user's benchmark of holding time, other parts of device then are in sleep state; CPU is out of service with all I/O modules during ADC squelch pattern, and nonsynchronous timer and ADC work on, the switching noise when changing to reduce ADC; Vibrator work during the Standby pattern and other partial sleeps make device only consume few electric current has quick startup ability simultaneously.
USB interface adopts CH372, is the general-purpose equipment interface chip of a usb bus, observes USB 1.1 agreements.At local side, CH372 has 8 bit data bus and reading and writing, sheet select wire and interrupt output, can be articulated on the system bus of units such as micro-chip, DSP easily; In computer system, the software kit of CH372 provides succinct easy-to-use operation-interface, with the single chip communication of local side just as the file in the reading writing harddisk.Underlying protocol in the USB communication that CH372 is built-in has built-in firmware mode and external firmware mode.CH372 has shielded the institute's protocols having in the usb communication under built-in firmware mode, between computer utility layer and local side unit, end-to-end being connected is provided.Use CH372, need not understand any usb protocol or firmware program, even driver, just can be like a cork the product up-gradation of parallel port, serial ports be arrived USB interface.
Motion-control module adopts MCX314, is a unicircuit that is used to realize 4 motion controls, and it can be controlled by stepper motor driver or by 4 position, speed and interpolation of pulse mode driven by servomotor.The function of MCX314 chip has and resource: 4 control, pulse output, constant speed control, speed control, position control, more spacing, linear interpolation, circular interpolation, bit pattern interpolation, interpolation continuously, single step interpolation, inside and external interrupt, external signal driving, input/output signal, servomotor feedback signal, monitoring, 8/16 bit data bus in real time.
Consider the complicated of actual environment and to the accurate location of substrate, movement executing mechanism adopts high-precision stepper-motor.
Software system design:
The developing instrument of assembling system application software of the present invention is the VC++ of Microsoft company, and it is the interactively visual IDE that runs on the windows platform.In this engineering project, mainly comprise such several types:
The system state class comprises all state variabless of system here, shows the function that storage is relevant with state;
The MCX314 function class comprises the power function of all MCX314 here, for example, pulse output, interpolation operation, the register read-write, I/O measures IO, frequency setting etc.;
The substrate motion class comprises all functions about the substrate motion, and these functions all are the basic function combinations by MCX314;
The code analysis class, this instrument of testing crew operation for ease, and definition process flexibly, this software definition some have the keyword of special implication, the function in this type is responsible for resolving these keywords, is broken down into concrete movement function.
For the handled easily personnel use this equipment, the inventive method has designed following major function:
Equipment state is provided with: set the current device state, like sample title, position, shape etc.Setting the back computingmachine will serve as with reference to carrying out by the technology of having set with the state of current setting;
Manual operation: this part is used for making things convenient for the experimenter to overhaul running gear and convenient debugging;
Operating parameter: here the experimenter is set to pre-designed technology in the software system;
Automatically operation: when confirming that technique initialization does not have wrong the time, the instrument that Clicks here will move according to the technology of prior setting automatically;
File is preserved: the experimenter preserves data for ease, just carries out the analysis in later stage, and these software system can be stored setting each running condition constantly of technology and system;
Limiting alarm: when the system motion system reaches the limit of the position, will inform computingmachine through motion control card through the transmitter output alarm signal, at this moment software system can stop corresponding motion.
Motion algorithm: because the length of substrate is several times of magnetic controlling target length; And the concentration of the plasma body of the etched area of target is also different from the center to the outer rim; So will on the substrate of long strip shape, make film relatively uniformly, accomplish the plated film of whole substrate on substrate thereby the film band that will let etching come out superposes.The origin of this algorithm is under the condition that certain constraint condition is set up, the ratio of one-tenth sputtering time when calculating the sedimentary material granule amount of the institute of unit surface on the substrate than table, thus calculate the optimal movement speed of substrate
When program enters into the control operation, use multithreading to carry out control process, can end technological process so at any time and show work status in real time.In workpiece motion s, program also needs constantly visit motion-control module (MCX314) internal logic pulse counter, can calculate each attitude of workpiece through reading the number of sending pulse like this.
And afterwards engineering staff develops practicality for ease, and native system in design, is packaged into dynamic link library with the power function of motion-control module (MCX314).
The principle of work of apparatus of the present invention is: sample is hung on the hook on the sample rotating disk, places in the working space of magnetic controlling target, magnetic controlling target is a metallic target, is a device that magnetic field is provided, and by magnet steel closed loop magnetic field is provided.On magnetic controlling target and sample, apply positive voltage and negative voltage respectively, make the gaseous ion ionization between magnetic controlling target and the sample, in magnetic field, do accelerated motion.Place layer of metal material (like copper) on the target surface; When then gaseous ion is done accelerated motion under the action of a magnetic field; Striking metallic substance on the target surface is bombarded it and sputters metallic plasma; Metal plasma cognition is taken exercises in the electric field of sample and target formation, on sample, deposits layer of metal material, i.e. metallic material film at last.The quantity of target can be a plurality of, can have the different metallic material on each target, lets sample stop before different targets through revolving round the sun, can sputter multiple layer metal coating.When sample has a plurality of needs to do coating, transfer realization certainly through sample.If the plasma zone area of metallic target is little, and sample has suitable length, then needs sample to move up and down.In order to guarantee the homogeneity of coating, apparatus of the present invention adopt the interlock design of sample disc rotation and go up and down interlock, sample disc rotation and revolution.
As shown in Figure 3, the inventive method realizes through following steps:
Initialization operation is carried out in beginning;
Get into and wait for and status display interface that Cheng Jinhang alarm detection simultaneously bursts at the seams;
The user manually is provided with system status parameters on display interface;
The setting of control routine, the code that the user is provided with converts the movement function that motion control card can be discerned to;
Whether sequence of control moves by control routine automatically, and finishes the back sample state and set;
Selection is that the journey that then bursts at the seams operational system also shows in real time; Otherwise, get back to and wait for and the state step display;
The EP operation.
The inventive method is further comprising the steps of: termination routine when detecting guard signal; This guard signal is the up-down limit position signal of sample rotating disk.
Said user manually is provided with system status parameters and comprises system state setting and automatically operation code setting on display interface, wherein the system state setting comprises sample position, sample be in operation correction, sample title, shape, the sample rotating disk pulling speed V of position deviation
1, sample rotating disk revolution speed V
2, sample rotating disk rotational velocity V
3, sample needs length X and corresponding certain target position (program is the initial reference position of operation automatically) of certain sample of plated film part; Automatically the operation code setting comprises that sample is at the residence time of each target position T, the sample action level state before this target position;
Setting state comprises behind the end of run: the sample that this experiment will be operated, the position that this sample stopped after experiment finished;
The said code that the user is provided with converts the movement function that motion control card can discern to and is specially:
The sample rotating disk promotes the pulse-repetition F of stepper motor driver
1PlusChange by following formula:
F
1Plus＝N
1×V
1×I
1/(L×60)+η
1
N wherein
1For promoting stepper-motor, the sample rotating disk accomplishes the needed umber of pulse of a commentaries on classics, V
1Be the sample rotating disk pulling speed that the user sets, I
1Be the reduction ratio of hoisting appliance, L is that stepper-motor is accomplished the stroke that a rotation mechanism promotes or reduces, η
1Error compensation for lifting device;
The pulse-repetition F of sample rotating disk revolution stepper motor driver
2PlusChange by following formula:
F
2Plus＝N
2×V
2×I
2/60+η
2
N wherein
2Accomplish one for sample rotating disk revolution stepper-motor and change needed umber of pulse, V
2Be sample rotating disk revolution speed, I
2Be the reduction ratio of revolution, η
2Error compensation for revolution;
The sample rotating disk promotes the pulse-repetition F of stepper motor driver
3PlusChange by following formula:
F
3Plus＝N
3×V
3×I
3/60+η
3
N in the formula
3Accomplish one for sample rotating disk rotation stepper-motor and change needed umber of pulse, V
3Be the sample rotating disk rotational velocity that the user sets, I
3Be the reduction ratio of free-wheeling system, η
3Error compensation for free-wheeling system.
It is coordinated operation that sample rotating disk rotation stepper-motor and the stepping of sample rotating disk promote motor, sets up the coordinated operation pattern through following equation:
T＝X/V
1 (1)
n＝X/h (2)
V
3＝n×60/T (3)
Wherein X is the length that sample needs the plated film part, and T is the residence time of sample at this target position, and h is that effective etched area of target is high-order, and n needs the number of turns of rotation for this process workpiece.
Claims (4)
1. rectangle sample magnetron sputtering instrument motion control method is characterized in that: may further comprise the steps:
Between industrial control computer and movement executing mechanism, be provided with motion control card; It accepts the feedback signal of movement executing mechanism; And transmit control signal to movement executing mechanism; Motion control card carries out communication through USB interface and industrial control computer and is connected, and has the basic function of motion control in the motion control card; Industrial control computer has sequence of control;
Said sequence of control is:
Initialization operation is carried out in beginning;
Get into and wait for and status display interface that Cheng Jinhang alarm detection simultaneously bursts at the seams;
The user manually is provided with system status parameters on display interface;
The setting of control routine, the code that the user is provided with converts the movement function that motion control card can be discerned to;
Whether sequence of control is set by sample state behind automatic operation of control routine and the end of run;
Selection is that the journey that then bursts at the seams operational system also shows in real time;
The EP operation;
Said user manually is provided with system status parameters and comprises system state setting and automatically operation code setting on display interface, wherein the system state setting comprises that be in operation correction, sample title, shape, sample rotating disk pulling speed, sample rotating disk revolution speed, sample rotating disk rotational velocity, the sample of position deviation of sample position, sample needs length and certain corresponding target position of certain sample of plated film part;
Automatically the operation code setting comprises that sample is at the residence time of each target position T, the sample action level state before this target position;
Setting state comprises behind the end of run: the sample that this experiment will be operated, the position that this sample stopped after experiment finished;
The said code that the user is provided with converts the movement function that motion control card can discern to and is specially:
The sample rotating disk promotes the pulse-repetition F of stepper motor driver
1PlusChange by following formula:
F
1Plus＝N
1×V
1×I
1/(L×60)+η
1
N wherein
1For promoting stepper-motor, the sample rotating disk accomplishes the needed umber of pulse of a commentaries on classics, V
1Be the sample rotating disk pulling speed that the user sets, I
1Be the reduction ratio of hoisting appliance, L is that stepper-motor is accomplished the stroke that a rotation mechanism promotes or reduces, η
1Error compensation for lifting device;
The pulse-repetition F of sample rotating disk revolution stepper motor driver
2PlusChange by following formula:
F
2Plus＝N
2×V
2×I
2/60+η
2
N wherein
2Accomplish one for sample rotating disk revolution stepper-motor and change needed umber of pulse, V
2Be sample rotating disk revolution speed, I
2Reduction ratio for revolution; η
2Error compensation for revolution;
The sample rotating disk promotes the pulse-repetition F of stepper motor driver
3PlusChange by following formula:
F
3Plus＝N
3×V
3×I
3/60+η
3
N in the formula
3Accomplish one for sample rotating disk rotation stepper-motor and change needed umber of pulse, V
3Be the sample rotating disk rotational velocity that the user sets, I
3Be the reduction ratio of free-wheeling system, η
3Error compensation for free-wheeling system;
It is coordinated operation that sample rotating disk rotation stepper-motor and the stepping of sample rotating disk promote motor, sets up the coordinated operation pattern through following equation:
T＝X/V
1 (1)
n＝X/h (2)
V
3＝n×60/T (3)
Wherein X is the length that sample needs the plated film part, and T is the residence time of sample at this target position, and h is that effective etched area of target is high-order, and n needs the number of turns of rotation for this process workpiece.
2. rectangle sample magnetron sputtering instrument motion control method according to claim 1 is characterized in that: when selecting sequence of control to move automatically not according to control routine, get back to and wait for and the state step display.
3. rectangle sample magnetron sputtering instrument motion control method according to claim 1 is characterized in that: also have following steps: termination routine when detecting guard signal.
4. rectangle sample magnetron sputtering instrument motion control method according to claim 3 is characterized in that: said guard signal is the up-down limit position signal of sample rotating disk.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007101585737A CN101451233B (en) | 2007-11-28 | 2007-11-28 | Motion control device of rectangle sample magnetron sputtering instrument and control method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007101585737A CN101451233B (en) | 2007-11-28 | 2007-11-28 | Motion control device of rectangle sample magnetron sputtering instrument and control method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101451233A CN101451233A (en) | 2009-06-10 |
| CN101451233B true CN101451233B (en) | 2012-03-07 |
Family
ID=40733717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101585737A Active CN101451233B (en) | 2007-11-28 | 2007-11-28 | Motion control device of rectangle sample magnetron sputtering instrument and control method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101451233B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102314185B (en) * | 2010-07-07 | 2013-11-13 | 中国科学院电子学研究所 | Control method for advanced scannable two-dimensional rail observation (ASTRO) system |
| CN102644056B (en) * | 2012-05-10 | 2014-10-01 | 深圳市创益科技发展有限公司 | Magnetron sputtering device used for thin film solar cell and control system thereof |
| CN108770176B (en) * | 2018-08-06 | 2023-11-17 | 法德(浙江)机械科技有限公司 | Large-scale low-voltage high-efficiency Gao Shu direct-current hollow cathode source |
| CN110221630A (en) * | 2019-06-04 | 2019-09-10 | 吴江南玻华东工程玻璃有限公司 | A kind of building glass filming parameter adaptive control system |
| CN111020520B (en) * | 2019-12-02 | 2021-02-19 | 昊石新材料科技南通有限公司 | Method for improving treatment efficiency and safety of vapor deposition furnace |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1327082A (en) * | 2000-06-07 | 2001-12-19 | 中国科学院沈阳科学仪器研制中心 | Computer control device for vacuum coating |
| CN1790616A (en) * | 2004-10-28 | 2006-06-21 | 东京毅力科创株式会社 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program |
-
2007
- 2007-11-28 CN CN2007101585737A patent/CN101451233B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1327082A (en) * | 2000-06-07 | 2001-12-19 | 中国科学院沈阳科学仪器研制中心 | Computer control device for vacuum coating |
| CN1790616A (en) * | 2004-10-28 | 2006-06-21 | 东京毅力科创株式会社 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101451233A (en) | 2009-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101451233B (en) | Motion control device of rectangle sample magnetron sputtering instrument and control method thereof | |
| TWI634410B (en) | Method, apparatus, and non-transitory computer-readable storage medium for dynamic clock and voltage scaling in a computer processor based on program phase | |
| CN104077106B (en) | Asymmetric multi-core processor with primary handover mechanism | |
| US10089263B2 (en) | Synchronization of interrupt processing to reduce power consumption | |
| EP3742256A1 (en) | Priority based application event control (paec) to reduce power consumption | |
| CN201096668Y (en) | Control device for rectangle sample magnetic-controlled splash instrument motion | |
| CN101539191B (en) | Method and device for displaying and controlling opening of electric butterfly valve | |
| US9477458B2 (en) | Dynamic timeout determination for microcontroller management of firmware updates | |
| US20170168836A1 (en) | Operation of a multi-slice processor with speculative data loading | |
| CN104965759B (en) | A kind of method and terminal of control terminal | |
| CN114345565B (en) | Low-cost integrated centrifuge control system | |
| US9348359B2 (en) | Updating a desired tick rate for a kernel | |
| Dongjiang et al. | Implement of communication between configuration software and OPC server based on Modbus/TCP | |
| CN107132733A (en) | A kind of LED chip photoetching development method | |
| CN108733192A (en) | Control the method and apparatus that the screen of electric terminal is closed | |
| US20200174827A1 (en) | Precise accounting of processor time for multi-threaded time-critical applications | |
| CN207965765U (en) | A kind of easy-to-dismount computer | |
| CN111140530B (en) | Method for realizing SoC fan control under bootloader and SoC applying same | |
| CN211329305U (en) | Coating waste gas collecting system | |
| Chaure et al. | Design and implementation of ethernet based embedded network controller using ARM 7 (LPC2148) processor | |
| CN103593037A (en) | Geophysics instrument soft shutting method and system | |
| CN107566491A (en) | A kind of embedded Forth wireless terminals console method and interface | |
| CN211860151U (en) | STM 8-based outdoor remote testing bottom plate and system | |
| CN212180721U (en) | Accelerator on-line monitoring detection device | |
| JP5835218B2 (en) | Display control apparatus, method, and program |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: Hunnan Shenyang 110168 Liaoning province Xinyuan street, No. 1 Patentee after: Shenyang Scientific Apparatus Co., Ltd. of Chinese Academy of Sciences Address before: Hunnan Shenyang 110168 Liaoning province Xinyuan street, No. 1 Patentee before: Shenyang Scientific Instrument Research & Mfg. Center Co., Ltd., C.A.S |
|
| CP01 | Change in the name or title of a patent holder |