CN101446767B - 测量曝光机台焦距偏移量的方法 - Google Patents
测量曝光机台焦距偏移量的方法 Download PDFInfo
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- CN101446767B CN101446767B CN2007100942883A CN200710094288A CN101446767B CN 101446767 B CN101446767 B CN 101446767B CN 2007100942883 A CN2007100942883 A CN 2007100942883A CN 200710094288 A CN200710094288 A CN 200710094288A CN 101446767 B CN101446767 B CN 101446767B
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CN2007100942883A CN101446767B (zh) | 2007-11-27 | 2007-11-27 | 测量曝光机台焦距偏移量的方法 |
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CN2007100942883A CN101446767B (zh) | 2007-11-27 | 2007-11-27 | 测量曝光机台焦距偏移量的方法 |
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CN101446767A CN101446767A (zh) | 2009-06-03 |
CN101446767B true CN101446767B (zh) | 2010-12-15 |
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Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20140068970A (ko) * | 2011-08-31 | 2014-06-09 | 에이에스엠엘 네델란즈 비.브이. | 포커스 보정을 결정하는 방법, 리소그래피 처리 셀 및 디바이스 제조 방법 |
CN102385261A (zh) * | 2011-11-22 | 2012-03-21 | 合肥芯硕半导体有限公司 | 一种光刻机共轴对焦装置及对焦方法 |
KR102246872B1 (ko) * | 2014-07-29 | 2021-04-30 | 삼성전자 주식회사 | 포커스 계측 마크를 포함하는 포토마스크, 포커스 모니터 패턴을 포함하는 계측용 기판 타겟, 노광 공정 계측 방법, 및 집적회로 소자의 제조 방법 |
CN105223784B (zh) * | 2015-10-29 | 2018-01-26 | 上海华力微电子有限公司 | 一种检测光刻机焦距偏移量的方法 |
CN111338185B (zh) * | 2018-12-19 | 2022-05-20 | 联芯集成电路制造(厦门)有限公司 | 增进晶片曝光品质的方法 |
CN113138543B (zh) * | 2021-05-18 | 2024-07-12 | 京东方科技集团股份有限公司 | 自动对焦控制方法、存储介质、控制设备及数字曝光机 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5747202A (en) * | 1993-06-07 | 1998-05-05 | Canon Kabushiki Kaisha | Projection exposure method |
US5898479A (en) * | 1997-07-10 | 1999-04-27 | Vlsi Technology, Inc. | System for monitoring optical properties of photolithography equipment |
CN1459670A (zh) * | 2002-05-23 | 2003-12-03 | 矽统科技股份有限公司 | 微影制程的焦距检测方法 |
CN1799122A (zh) * | 2003-05-29 | 2006-07-05 | 松下电器产业株式会社 | 图案曝光中焦点偏移量的测量方法及图案曝光方法 |
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- 2007-11-27 CN CN2007100942883A patent/CN101446767B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5747202A (en) * | 1993-06-07 | 1998-05-05 | Canon Kabushiki Kaisha | Projection exposure method |
US5898479A (en) * | 1997-07-10 | 1999-04-27 | Vlsi Technology, Inc. | System for monitoring optical properties of photolithography equipment |
CN1459670A (zh) * | 2002-05-23 | 2003-12-03 | 矽统科技股份有限公司 | 微影制程的焦距检测方法 |
CN1799122A (zh) * | 2003-05-29 | 2006-07-05 | 松下电器产业株式会社 | 图案曝光中焦点偏移量的测量方法及图案曝光方法 |
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CN101446767A (zh) | 2009-06-03 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131216 |
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Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
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Effective date of registration: 20131216 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |