CN101394705A - Apparatus for generating atmosphere pressure microwave glow plasma - Google Patents
Apparatus for generating atmosphere pressure microwave glow plasma Download PDFInfo
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- CN101394705A CN101394705A CNA2008101973582A CN200810197358A CN101394705A CN 101394705 A CN101394705 A CN 101394705A CN A2008101973582 A CNA2008101973582 A CN A2008101973582A CN 200810197358 A CN200810197358 A CN 200810197358A CN 101394705 A CN101394705 A CN 101394705A
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Abstract
The invention relates to a device for generating atmospheric pressure microwave glow plasma. The device comprises a plasma reactor, a microwave regulating and monitoring system and a microwave source. The microwave source is connected with the left end of the microwave regulating and monitoring system through a coupling flange. The plasma reactor consists of a rectangular waveguide, a bar-shaped electrode, a flat electrode, a short-circuiting piston, a silica tube, a water-cooled jacket, an upper flange and a lower flange. Through holes are formed on the parts of the wide edges of the rectangular waveguide; the silica tube is installed on the rectangular waveguide by passing through the through holes; the water-cooled jacket is installed on the outer side of the silica tube; the silica tube is hermetically connected with the upper flange and the lower flange to form a working chamber; the bar-shaped electrode is hermetically connected with the upper flange through threads; the flat electrode is hermetically connected with the lower flange through threads; and the short-circuiting piston is arranged on the end part of the left side of the plasma reactor. The device can operate the microwave glow plasma at atmospheric pressure, thereby facilitating continuous production. The produced plasma has higher energy density, active particle concentration and efficiency.
Description
Technical field
The present invention relates to the generation of plasma source under the atmospheric pressure, particularly a kind of device that produces atmosphere pressure microwave glow plasma.
Background technology
Plasma has higher temperature and energy density as the 4th attitude of material, contains a large amount of active components simultaneously, thereby causes physical change and the chemical reaction that can not or be difficult to realize in the conventional chemical reaction.Plasma Engineering can provide more favourable industrial processes method in addition, comprise the more effective and more cheap ability that reaches industrial correlated results, the situation that does not produce a large amount of unwanted byproducts and waste material is issued to identical purpose, realizes identical purpose under the situation that produces seldom pollution and toxic waste.Therefore plasma technique is widely used industrial, comprises that aspects such as the processing of microelectronics etching, functional material preparation, material surface modifying, sterilization, sterilization are widely used.
Plasma in industrial acquisition extensive use mainly is the low pressure plasma that produces under vacuum condition at present.The low pressure plasma exists the maintenance cost height, is unfavorable for shortcomings such as serialization production when commercial Application, so the exciting and be that plasma obtains more wide industrial key in application in industrial application study of plasma under the atmospheric pressure.The plasma that utilizes microwave under atmospheric pressure to produce at present mainly contains plasma jet and torch, and the research that produces even aura is reported seldom.
Summary of the invention
Problem to be solved by this invention is to propose a kind of device that produces atmosphere pressure microwave glow plasma at above-mentioned prior art, has overcome the deficiency of the plasma under the vacuum low air pressure condition.
The present invention for the solution that problem adopts of the above-mentioned proposition of solution is: a kind of device that produces atmosphere pressure microwave glow plasma, it is characterized in that including plasma reactor, microwave regulation and control and supervisory control system, microwave source, microwave source links to each other by the right-hand member of adpting flange with microwave regulation and control and supervisory control system
Wherein, plasma reactor is by rectangular waveguide, stick electrode, plate electrode, short-circuit plunger, quartz ampoule, water collar and upper flange, lower flange constitutes, on the broadside of rectangular waveguide, have the through hole of diameter 40-60mm, the quartz ampoule of same outer diameter as passes through hole and is loaded on the rectangular waveguide, water collar is equipped with in the outside at quartz ampoule, the water collar arranged outside has recirculated cooling water inlet and recirculated cooling water outlet, at the two ends of quartz ampoule upper flange and lower flange are housed, quartz ampoule and upper flange, lower flange is tightly connected and constitutes the operating room, stick electrode is connected by thread seal with upper flange, threaded adjusting can be passed through in the position of stick electrode, plate electrode is connected by thread seal with lower flange, the height of plate electrode can pass through threaded adjusting, is provided with short-circuit plunger in the left end of plasma reactor.
Press such scheme, described rectangular waveguide, when used microwave frequency during for 2.45GHz with BJ22 rectangular waveguide or BJ26 rectangular waveguide, when used microwave frequency is used the BJ9 rectangular waveguide during for 0.915GHz.
Press such scheme, stick electrode is a hollow structure, and the stick electrode arranged outside has water cooling plant, is connected with cooling water in the water cooling plant, and the rod end temperature of stick electrode can be regulated by the cooling degree of cooling water.
Its operation principle is: the frequency that microwave source produces is that the microwave of 2.45GHz or 0.915GHz enters into plasma reactor after microwave regulation and control and supervisory control system, by regulating short-circuit plunger, sets up TE in plasma reactor
103The microwave field of pattern is set up strong high-frequency electric field between stick electrode and metal plate electrode, it makes gas breakdown, produces and keep plasma.
Advantage of the present invention:
The present invention can under atmospheric pressure move microwave glow plasma, help producing continuously during as plasma chemical reactor, microwave plasma surface modification, the plasma that produces can have the more active particle concentration of high-energy-density and Geng Gao, has higher efficient when commercial Application.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Embodiment
The invention will be further described below in conjunction with embodiment and accompanying drawing, but can not be as limitation of the invention.
As shown in Figure 1, a kind of device that produces atmosphere pressure microwave glow plasma, include plasma reactor 3, microwave regulation and control and supervisory control system 2, microwave source 1, microwave source 1 links to each other by the right-hand member of adpting flange with microwave regulation and control and supervisory control system, between microwave regulation and control and supervisory control system and plasma reactor, also be provided with the microwave quartz window, left end at plasma reactor is provided with short-circuit plunger 8, plasma reactor 3 is by rectangular waveguide, stick electrode 6, plate electrode 11, short-circuit plunger 8, quartz ampoule 4, water collar and upper flange 5, lower flange 7 constitutes, on the broadside of rectangular waveguide, have the through hole of diameter 40-60mm, the quartz ampoule of same outer diameter as passes through hole and is loaded on the rectangular waveguide, in the outside of quartz ampoule water collar 13 is housed, water collar 13 arranged outside have recirculated cooling water inlet 16 and recirculated cooling water outlet 17, upper flange 5 and lower flange 7 are housed at the two ends of quartz ampoule, quartz ampoule and upper flange, lower flange is tightly connected and constitutes the operating room, stick electrode is connected by thread seal with upper flange, stick electrode and plate electrode are made by tungsten or molybdenum, the stick electrode arranged outside has water cooling plant, be connected with cooling water in the water cooling plant, the rod end temperature of stick electrode can be regulated by the cooling degree of cooling water, threaded adjusting can be passed through in the position of stick electrode, plate electrode is connected by thread seal with lower flange, the height of plate electrode can pass through threaded adjusting, and the upper surface spacing of stick electrode lower surface and plate electrode is generally 8-20mm.For described rectangular waveguide, when used microwave frequency during for 2.45GHz with BJ22 rectangular waveguide or BJ26 rectangular waveguide, when used microwave frequency is used the BJ9 rectangular waveguide during for 0.915GHz.
The course of work of the present invention may further comprise the steps:
A) upper flange 5 and lower flange 7 are loaded on the water collar 13, and with quartz ampoule 4 tight seals;
B) go up cooling water for device is logical, cooling water advances from recirculated cooling water inlet 16, goes out from recirculated cooling water outlet 17, and cooling water advances from recirculated cooling water inlet 14 again, goes out from recirculated cooling water outlet 15;
C) open mechanical pump and vacuumize, by pipeline 12 with the air pressure adjustment of operating room in the scope of 100-300Pa;
D) frequency that produces of microwave source 1 is that the microwave of 2.45GHz or 0.915GHz enters into plasma reactor 3 after microwave regulation and control and supervisory control system 2;
E) regulate short-circuit plunger 8, in plasma reactor, set up TE
103The microwave field of pattern, and make the strength of electric field be positioned at the axis place of the stick electrode 6 of band water-cooled;
F) height of adjusting metal plate electrode 11, make its upper surface concordant with the lower surface of rectangular waveguide broadside, regulate the length of stick electrode 6 in the operating room, the distance between the lower surface that makes stick electrode 6 and the upper surface of plate electrode between 8-20mm, generation microwave glow plasma 9;
G) turn down the pumping speed of mechanical pump, feed working gas from air inlet pipe 10, the air pressure of the operating room that progressively raises is until atmospheric pressure, and the temperature of control stick electrode bottom is at 1000-1100 ℃, plasma be continuous service under atmospheric pressure.
Claims (3)
1, a kind of device that produces atmosphere pressure microwave glow plasma, it is characterized in that including plasma reactor (3), microwave regulation and control and supervisory control system (2), microwave source (1), microwave source (1) links to each other by the right-hand member of adpting flange with microwave regulation and control and supervisory control system, wherein, plasma reactor (3) is by rectangular waveguide, stick electrode (6), plate electrode (11), short-circuit plunger (8), quartz ampoule (4), water collar and upper flange (5), lower flange (7) constitutes, on the broadside of rectangular waveguide, have the through hole of diameter 40-60mm, the quartz ampoule of same outer diameter as passes through hole and is loaded on the rectangular waveguide, water collar (13) is housed in the outside of quartz ampoule, water collar (13) arranged outside has recirculated cooling water inlet (16) and recirculated cooling water outlet (17), upper flange (5) and lower flange (7) are housed at the two ends of quartz ampoule, quartz ampoule and upper flange, lower flange is tightly connected and constitutes the operating room, stick electrode is connected by thread seal with upper flange, threaded adjusting can be passed through in the position of stick electrode, plate electrode is connected by thread seal with lower flange, the height of plate electrode can pass through threaded adjusting, is provided with short-circuit plunger (8) in the left end of plasma reactor.
2, by the described device of claim 1, it is characterized in that described rectangular waveguide, when used microwave frequency during for 2.45GHz with BJ22 rectangular waveguide or BJ26 rectangular waveguide, when used microwave frequency is used the BJ9 rectangular waveguide during for 0.915GHz.
3, by claim 1 or 2 described devices, it is characterized in that stick electrode is a hollow structure, the stick electrode arranged outside has water cooling plant (6), is connected with cooling water in the water cooling plant, and the rod end temperature of stick electrode can be regulated by the cooling degree of cooling water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008101973582A CN101394705A (en) | 2008-10-23 | 2008-10-23 | Apparatus for generating atmosphere pressure microwave glow plasma |
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| CNA2008101973582A CN101394705A (en) | 2008-10-23 | 2008-10-23 | Apparatus for generating atmosphere pressure microwave glow plasma |
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Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102355791A (en) * | 2011-09-28 | 2012-02-15 | 南京创能电力科技开发有限公司 | Device for insulation connecting between cathode and anode of plasma generator |
| CN102640965A (en) * | 2011-11-11 | 2012-08-22 | 江南大学 | High voltage pulse electric field sterilization common-field treatment chamber with adjustable electrode distance |
| CN102802337A (en) * | 2011-06-03 | 2012-11-28 | 深圳光启高等理工研究院 | Plasma source device |
| CN102794146A (en) * | 2012-08-17 | 2012-11-28 | 清华大学 | Microwave plasma reaction device for preparing nano-material |
| CN103074594A (en) * | 2011-10-25 | 2013-05-01 | 浚鑫科技股份有限公司 | Quartz tube used in tablet PECVD equipment and installation method thereof |
| CN103726032A (en) * | 2013-12-31 | 2014-04-16 | 武汉工程大学 | Device for preparing diamond-like thin film by large-volume microwave plasmas |
| CN104254188A (en) * | 2014-10-10 | 2014-12-31 | 中国地质大学（武汉） | Miniature normal-voltage glow discharge plasma excitation source |
| CN104661423A (en) * | 2015-02-09 | 2015-05-27 | 清华大学 | Large-atmosphere low-temperature plasma fluidic generator |
| CN105895489A (en) * | 2016-05-04 | 2016-08-24 | 中国科学技术大学 | Device and method for parallel mask-less scanning micro-nano processing based on atmospheric pressure plasma jet tube |
| CN106304604A (en) * | 2016-11-03 | 2017-01-04 | 四川瑶天纳米科技有限责任公司 | A kind of neutron generator for neutron capture therapy |
| CN106322433A (en) * | 2016-09-29 | 2017-01-11 | 南京三乐微波技术发展有限公司 | Microwave plasma acting cavity capable of achieving automatic ignition |
| CN106816353A (en) * | 2015-12-02 | 2017-06-09 | 中国科学院深圳先进技术研究院 | Plasma source element, plasma source apparatus and its application |
| CN106984147A (en) * | 2017-03-31 | 2017-07-28 | 武汉工程大学 | The device of industrial organic exhaust gas is handled based on microwave plasma method |
| CN107087339A (en) * | 2017-07-03 | 2017-08-22 | 李容毅 | A kind of enhanced microwave plasma torch generating means of two-chamber excitation |
| CN107683010A (en) * | 2016-08-02 | 2018-02-09 | 韩国基础科学支援研究院 | Water-cooled surface wave plasma generating means |
| CN112235930A (en) * | 2020-10-10 | 2021-01-15 | 哈尔滨工业大学 | Measuring device for interaction of glow discharge plasma and microwave waveguide |
| CN113731325A (en) * | 2021-09-03 | 2021-12-03 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
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2008
- 2008-10-23 CN CNA2008101973582A patent/CN101394705A/en active Pending
Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102802337B (en) * | 2011-06-03 | 2015-04-22 | 深圳光启高等理工研究院 | Plasma source device |
| CN102802337A (en) * | 2011-06-03 | 2012-11-28 | 深圳光启高等理工研究院 | Plasma source device |
| CN102355791A (en) * | 2011-09-28 | 2012-02-15 | 南京创能电力科技开发有限公司 | Device for insulation connecting between cathode and anode of plasma generator |
| CN103074594A (en) * | 2011-10-25 | 2013-05-01 | 浚鑫科技股份有限公司 | Quartz tube used in tablet PECVD equipment and installation method thereof |
| CN102640965A (en) * | 2011-11-11 | 2012-08-22 | 江南大学 | High voltage pulse electric field sterilization common-field treatment chamber with adjustable electrode distance |
| CN102794146A (en) * | 2012-08-17 | 2012-11-28 | 清华大学 | Microwave plasma reaction device for preparing nano-material |
| CN103726032A (en) * | 2013-12-31 | 2014-04-16 | 武汉工程大学 | Device for preparing diamond-like thin film by large-volume microwave plasmas |
| CN104254188B (en) * | 2014-10-10 | 2017-02-01 | 中国地质大学（武汉） | Miniature normal-voltage glow discharge plasma excitation source |
| CN104254188A (en) * | 2014-10-10 | 2014-12-31 | 中国地质大学（武汉） | Miniature normal-voltage glow discharge plasma excitation source |
| CN104661423A (en) * | 2015-02-09 | 2015-05-27 | 清华大学 | Large-atmosphere low-temperature plasma fluidic generator |
| CN106816353B (en) * | 2015-12-02 | 2018-08-31 | 中国科学院深圳先进技术研究院 | Plasma source element, plasma source apparatus and its application |
| CN106816353A (en) * | 2015-12-02 | 2017-06-09 | 中国科学院深圳先进技术研究院 | Plasma source element, plasma source apparatus and its application |
| CN105895489B (en) * | 2016-05-04 | 2017-11-07 | 中国科学技术大学 | Parallel maskless based on atmospheric pressure plasma jet pipe scans micro-nano processing unit (plant) and method |
| CN105895489A (en) * | 2016-05-04 | 2016-08-24 | 中国科学技术大学 | Device and method for parallel mask-less scanning micro-nano processing based on atmospheric pressure plasma jet tube |
| CN107683010A (en) * | 2016-08-02 | 2018-02-09 | 韩国基础科学支援研究院 | Water-cooled surface wave plasma generating means |
| CN107683010B (en) * | 2016-08-02 | 2020-03-13 | 韩国基础科学支援研究院 | Water-cooled surface wave plasma generator |
| CN106322433A (en) * | 2016-09-29 | 2017-01-11 | 南京三乐微波技术发展有限公司 | Microwave plasma acting cavity capable of achieving automatic ignition |
| CN106304604A (en) * | 2016-11-03 | 2017-01-04 | 四川瑶天纳米科技有限责任公司 | A kind of neutron generator for neutron capture therapy |
| CN106984147A (en) * | 2017-03-31 | 2017-07-28 | 武汉工程大学 | The device of industrial organic exhaust gas is handled based on microwave plasma method |
| CN107087339A (en) * | 2017-07-03 | 2017-08-22 | 李容毅 | A kind of enhanced microwave plasma torch generating means of two-chamber excitation |
| CN112235930A (en) * | 2020-10-10 | 2021-01-15 | 哈尔滨工业大学 | Measuring device for interaction of glow discharge plasma and microwave waveguide |
| CN112235930B (en) * | 2020-10-10 | 2022-09-23 | 哈尔滨工业大学 | Measuring device for interaction of glow discharge plasma and microwave waveguide |
| CN113731325A (en) * | 2021-09-03 | 2021-12-03 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
| CN113731325B (en) * | 2021-09-03 | 2022-05-13 | 重庆大学 | Device for synthesizing nitrogen oxide by air plasma |
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Application publication date: 20090325 |