CN101338447A - Method for self-assembling photonic crystal - Google Patents
Method for self-assembling photonic crystal Download PDFInfo
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Abstract
A self-assembling photonic crystal method relates to a preparation method of photonic crystal. The invention solves the problems existing in the current method that the photo crystal with large area can not be prepared and the prepared photonic crystal can not be bent. The method comprises the procedures as follows: (1) the surface of a base plate is treated: (2) colloidal solution is prepared: and (3) the base plate is put into a vessel and the colloidal solution is added into the vessel; the colloidal solution volatilizes under the constant temperature of 20 DEG C to 70 DEG C; the photonic crystal is taken out until no substance volatilizes, and the photonic crystal is made. The self-assembling photonic crystal can make the single or double sides of the photonic crystal deposit on the base plate, thus making the photonic crystal deposit on the base plate to a maximum.
Description
Technical field
The present invention relates to the preparation method of photonic crystal.
Background technology
Single dispersoid particle self-assembling photonic crystal is a kind of material that has ordered 3 D structure on nanoscale, because the space periodic of specific inductivity is arranged, make that photonic crystal can modulated light wave, so wide application is arranged on optical mirror, photoswitch and optical communication.Publication number is that (name is called " control colloid micro ball self-assembly and preparation two dimension to CN1749445, the method of three-D photon crystal ") patent and publication number be the patent of CN1936074 (name be called " a kind of method of growing three-dimensional photon crystal film by pressure-reducing self-assembling and device "), in the process of preparation colloidal photon crystal, because substrate mostly is opticglass or silicon chips such as slide glass, due to the photonic crystal that obtains not bent, and because the restriction of hard sizes of substrate can't prepare large-area photonic crystal and often relatively poor in the photonic crystal quality of substrate edge.Publication number be CN101060922 (name is called " use colloidal nanoparticles colloidal photon crystal and preparation method thereof ") patent by in colloidal solution, introduce polyvinyl alcohol, the self-assembly of polyacrylic acid elastomeric material prepares flexible photonic crystal, the photonic crystal of this method preparation since the space to be filled, so can't be processed into the photonic crystal of counter opal structure by resilient material.Publication number is the CN101092054 patent of (name is called " hot pressing method for preparing of crystal thin film of not closed packing colloid "), utilize shell to prepare flexible photonic crystal for the photonic crystal of the nucleocapsid structure of resilient material by hot pressed mode, the photonic crystal order of this method preparation is poor.Vertical deposition method is a kind of method of colloidal photon crystal growth, common preparation is with vertical or angled the entering in the colloidal solution of substrate, by the volatilization of solution or lifting of substrate, make the photonic crystal of colloidal particle self-assembly on substrate forming ordered arrangement.But because the substrate that adopts is a level, the increase substrate area that the preparation of large area photon crystalline can only be passed through enlarges the volume of growth container and realizes.This causes most colloidal particle to be grown on wall of container, and utilization ratio of raw materials reduces.
Summary of the invention
The objective of the invention is to prepare large-area photonic crystal, and the not bent problem of photonic crystal of preparation, a kind of method of self-assembling photonic crystal is provided in order to solve existing method.
The method of first kind of self-assembling photonic crystal is as follows: one, the surface treatment of substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate that 0.01mm-1mm and surface are coated with aluminium, silver, gold or tin indium oxide; In the step 1 described substrate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
Substrate in present method step 1 is not handled and is directly put into the colloidal solution that step 2 obtains.
The method of second kind of self-assembling photonic crystal is as follows: one, the surface treatment of organic substrate: the acidic solution of organic substrate being put into massfraction 5%-30% soaks 1min-30min, and then with deionized water ultrasonic cleaning 10min-30min, drying; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; Acidic solution described in the step 1 is a potassium bichromate solution; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
Substrate in present method step 1 is not handled and is directly put into the colloidal solution that step 2 obtains.
The method of the third self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of organic substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
Substrate in present method step 1 is not handled and is directly put into the colloidal solution that step 2 obtains.
The inventive method is curled into hollow cylinder, hollow truncated cone-shaped or volution with substrate, so reduced the container volume of splendid attire colloidal solution, improved the colloidal solution utilization ratio (photonic crystal that usual way obtains, have only length just can take out use at the on-chip photonic crystal of hard, most of bead has all been grown on wall of container, causes waste.), used substrate is film like and can directly be attached on the wall of container and deposits among the present invention, reduced the use of delimiter, the inventive method makes the photonic crystal can single face or two-sided being deposited on the substrate, photonic crystal is deposited on the substrate, when the horizontal base plate that prior art adopts is compared the inventive method and has been increased the photonic crystal depositional area, the crystal that obtains can bend, do not fill other materials in the photonic crystal space of the present invention's preparation, can prepare the photonic crystal of counter opal structure.
Description of drawings
Fig. 1 is the synoptic diagram of hollow cylinder substrate.Fig. 2 is the synoptic diagram of hollow truncated cone-shaped substrate, wherein 0＜θ＜180.Fig. 3 is the synoptic diagram of volution substrate.
Embodiment
Technical solution of the present invention is not limited to following cited embodiment, also comprises the arbitrary combination between each embodiment.
Embodiment one: the method for self-assembling photonic crystal is as follows in the present embodiment: one, the surface treatment of substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate that 0.01mm-1mm and surface are coated with aluminium, silver, gold or tin indium oxide; In the step 1 described substrate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
When the described solvent of present embodiment is mixing solutions, press between each composition arbitrarily than combination.
Embodiment two: present embodiment and embodiment one are different is that substrate in the step 1 is not handled and directly put into the colloidal solution that step 2 obtains.Other are identical with embodiment one.
Embodiment three: present embodiment and embodiment one are different is that the temperature of loft drier in the step 1 is 35 ℃-65 ℃.。Other is identical with embodiment one.
Embodiment four: present embodiment and embodiment one are different is that the temperature of loft drier in the step 1 is 30 ℃-60 ℃.Other is identical with embodiment one.
Embodiment five: present embodiment and embodiment one are different is that the temperature of loft drier in the step 1 is 35 ℃-45 ℃.Other is identical with embodiment one.
Embodiment six: present embodiment and embodiment one are different is that the temperature of loft drier in the step 1 is 50 ℃.Other is identical with embodiment one.
Embodiment seven: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 0.01%-4.5%.Other is identical with embodiment one.
Embodiment eight: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 0.02%-4%.Other is identical with embodiment one.
Embodiment nine: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 0.05%-3.5%.Other is identical with embodiment one.
Embodiment ten: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 0.1%-3%.Other is identical with embodiment one.
Embodiment 11: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 0.5%-2.5%.Other is identical with embodiment one.
Embodiment 12: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 1%-2%.Other is identical with embodiment one.
Embodiment 13: present embodiment and embodiment one are different is that the massfraction of solution in the step 2 is 1.5%.Other is identical with embodiment one.
Embodiment 14: what present embodiment and embodiment one were different is that the temperature described in the step 3 is 35 ℃-65 ℃.。Other is identical with embodiment one.
Embodiment 15: what present embodiment and embodiment one were different is that the temperature described in the step 3 is 50 ℃.Other is identical with embodiment one.
Embodiment 16: the method for self-assembling photonic crystal is as follows in the present embodiment: one, the surface treatment of organic substrate: the acidic solution of organic substrate being put into massfraction 5%-30% soaks 1min-30min, and then with deionized water ultrasonic cleaning 10min-30min, drying; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; Acidic solution described in the step 1 is a potassium bichromate solution; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
When the described solvent of present embodiment is mixing solutions, press between each composition arbitrarily than combination.
The described potassium bichromate solution of present embodiment is to be 1.84g/cm by 60g potassium bichromate, 300ml deionized water and 460ml density
3, concentration is that 98% the vitriol oil is formed.
Embodiment 17: present embodiment and embodiment 16 are different is that substrate in the step 1 is not handled and directly put into the colloidal solution that step 2 obtains.Other is identical with embodiment 16.
Embodiment 18: present embodiment and embodiment 16 are different is that the massfraction of acidic solution in the step 1 is 8%-25%.Other is identical with embodiment 16.
Embodiment 19: present embodiment and embodiment 16 are different is that the massfraction of acidic solution in the step 1 is 10%-20%.Other is identical with embodiment 16.
Embodiment 20: present embodiment and embodiment 16 are different is that the massfraction of acidic solution in the step 1 is 15%.Other is identical with embodiment 16.
Embodiment 21: present embodiment and embodiment 16 are different is that the massfraction of alkaline solution in the step 1 is 6%-18%.Other is identical with embodiment 16.
Embodiment 22: present embodiment and embodiment 16 are different is that the massfraction of alkaline solution in the step 1 is 8%-16%.Other is identical with embodiment 16.
Embodiment 23: present embodiment and embodiment 16 are different is that the massfraction of alkaline solution in the step 1 is 10%.Other is identical with embodiment 16.
Embodiment 24: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 0.01%-4.5%.Other is identical with embodiment 16.
Embodiment 25: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 0.02%-4%.Other is identical with embodiment 16.
Embodiment 26: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 0.05%-3.5%.Other is identical with embodiment 16.
Embodiment 27: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 0.1%-3%.Other is identical with embodiment 16.
Embodiment 28: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 0.5%-2.5%.Other is identical with embodiment 16.
Embodiment 29: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 1%-2%.Other is identical with embodiment 16.
Embodiment 30: present embodiment and embodiment 16 are different is that the massfraction of solution in the step 2 is 1.5%.Other is identical with embodiment 16.
The embodiment hentriaconta-: what present embodiment and embodiment 16 were different is that the temperature described in the step 3 is 35 ℃-65 ℃.。Other is identical with embodiment 16.
Embodiment 32: what present embodiment and embodiment 16 were different is that the temperature described in the step 3 is 50 ℃.Other is identical with embodiment 16.
Embodiment 33: the method for self-assembling photonic crystal is as follows in the present embodiment: one, the surface treatment of organic substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
The using plasma electric discharge device carries out oxygen plasma treatment in the present embodiment step 1, wherein the discharge power supply of plasma discharge apparatus is the plasma body high-voltage pulse power source, gas is by the control of D08-1A/ZM type flow director, and the detecting instrument of experiment comprises digital fluorescence oscilloscope (Tektronix TDS3015500MHz), OOIBase32 type spectrograph, quiet contact angle of JC200A/interfacial tension survey meter.
When the described solvent of present embodiment is mixing solutions, press between each composition arbitrarily than combination.
Embodiment 34: the substrate in the different step 1 of present embodiment and embodiment 33 is not handled and is directly put into the colloidal solution that step 2 obtains.Other is identical with embodiment 33.
Embodiment 35: present embodiment and embodiment 33 are different is that the temperature of loft drier in the step 1 is 25 ℃-55 ℃.Other is identical with embodiment 33.
Embodiment 36: present embodiment and embodiment 33 are different is that the temperature of loft drier in the step 1 is 30 ℃-50 ℃.Other is identical with embodiment 33.
Embodiment 37: present embodiment and embodiment 33 are different is that the temperature of loft drier in the step 1 is 35 ℃-45 ℃.Other is identical with embodiment 33.
Embodiment 38: present embodiment and embodiment 33 are different is that the temperature of loft drier in the step 1 is 40 ℃.Other is identical with embodiment 33.
Embodiment 39: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 0.01%-4.5%.Other is identical with embodiment 33.
Embodiment 40: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 0.02%-4%.Other is identical with embodiment 33.
Embodiment 41: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 0.05%-3.5%.Other is identical with embodiment 33.
Embodiment 42: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 0.1%-3%.Other is identical with embodiment 33.
Embodiment 43: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 0.5%-2.5%.Other is identical with embodiment 33.
Embodiment 44: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 1%-2%.Other is identical with embodiment 33.
Embodiment 45: present embodiment and embodiment 33 are different is that the massfraction of solution in the step 2 is 1.5%.Other is identical with embodiment 33.
Embodiment 46: what present embodiment and embodiment 33 were different is that the temperature described in the step 3 is 35 ℃-65 ℃.。Other is identical with embodiment 33.
Embodiment 47: what present embodiment and embodiment 33 were different is that the temperature described in the step 3 is 50 ℃.Other is identical with embodiment 33.
Claims (10)
1, the method for self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate that 0.01mm-1mm and surface are coated with aluminium, silver, gold or tin indium oxide; In the step 1 described substrate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
2, the method for self-assembling photonic crystal according to claim 1 is characterized in that substrate in the step 1 is not handled directly to put into the colloidal solution that step 2 obtains.
3, the method for self-assembling photonic crystal according to claim 1 is characterized in that the temperature described in the step 3 is 35 ℃-65 ℃.
4, the method for self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of organic substrate: the acidic solution of organic substrate being put into massfraction 5%-30% soaks 1min-30min, and then with deionized water ultrasonic cleaning 10min-30min, drying; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; Acidic solution described in the step 1 is a potassium bichromate solution; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
5, the method for self-assembling photonic crystal according to claim 4 is characterized in that substrate in the step 1 is not handled directly to put into the colloidal solution that step 2 obtains.
6, the method for self-assembling photonic crystal according to claim 4 is characterized in that the temperature described in the step 3 is 35 ℃-65 ℃.
7, the method for self-assembling photonic crystal, the method that it is characterized in that self-assembling photonic crystal is as follows: one, the surface treatment of organic substrate: will be through the substrate of deionized water ultrasonic cleaning 10min-30min acetone ultrasonic cleaning 10min-30min, blow to surface drying or in 20 ℃-60 ℃ loft drier with nitrogen then and dry by the fire, use oxygen plasma treatment 1min-10min again to dry; Two, the configuration of colloidal solution: with sphere diameter be polystyrene, polymethylmethacrylate, silicon-dioxide or the titanium dioxide bead of 50nm-5 μ m join obtain in the solvent monodispersity smaller or equal to 5%, massfraction is the solution of 0.005%-5%, with the ultrasonic concussion of the solution of gained 10min-30min, obtain colloidal solution then; Three, organic substrate is put into through washed with de-ionized water 10-30min, acetone ultrasonic cleaning 10-30min, deionized water rinsing and dried container, the colloidal solution that adds the step 2 configuration then, under being 20 ℃-70 ℃ constant temperature, temperature makes the colloidal solution volatilization then, wait not have the material volatilization and take out substrate, promptly obtain photonic crystal; Wherein the organic substrate described in the step 1 is that thickness is polyester substrate, polyimide substrate, polysulfones substrate, polycarbonate substrate, polyethylene substrate, polyvinyl chloride substrate, polyurethane substrate, organosilicon substrate or the rubber substrate of 0.01mm-1mm; In the step 1 described organic radical plate is curled into hollow cylinder, hollow truncated cone-shaped or volution; Solvent described in the step 2 is one or more the mixing solutions in deionized water, ethanol, methyl alcohol, the ethylene glycol.
8, the method for self-assembling photonic crystal according to claim 7 is characterized in that substrate in the step 1 is not handled directly to put into the colloidal solution that step 2 obtains.
9, the method for self-assembling photonic crystal according to claim 8 is characterized in that the temperature described in the step 3 is 35 ℃-65 ℃.
10, the method for self-assembling photonic crystal according to claim 9 is characterized in that the temperature described in the step 3 is 50 ℃.
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