CN101333679B - Method and apparatus for shortening maintenance time of epitaxy end gas processor - Google Patents
Method and apparatus for shortening maintenance time of epitaxy end gas processor Download PDFInfo
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- CN101333679B CN101333679B CN 200710117832 CN200710117832A CN101333679B CN 101333679 B CN101333679 B CN 101333679B CN 200710117832 CN200710117832 CN 200710117832 CN 200710117832 A CN200710117832 A CN 200710117832A CN 101333679 B CN101333679 B CN 101333679B
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- water
- silicide
- tank
- pipeline
- funnel
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- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000012423 maintenance Methods 0.000 title claims abstract description 26
- 238000000407 epitaxy Methods 0.000 title claims abstract description 19
- 238000004904 shortening Methods 0.000 title abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000007789 gas Substances 0.000 claims abstract description 46
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 37
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims abstract description 35
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000000126 substance Substances 0.000 claims abstract description 22
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 16
- 238000010926 purge Methods 0.000 claims abstract description 13
- 238000005086 pumping Methods 0.000 claims abstract description 8
- 230000000694 effects Effects 0.000 claims abstract description 7
- 238000005406 washing Methods 0.000 claims abstract description 7
- 239000000779 smoke Substances 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 14
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000012545 processing Methods 0.000 abstract description 3
- 230000008901 benefit Effects 0.000 abstract description 2
- 238000007667 floating Methods 0.000 abstract description 2
- 230000002035 prolonged effect Effects 0.000 abstract 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 8
- 239000005052 trichlorosilane Substances 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 7
- 241000628997 Flos Species 0.000 description 6
- 238000009434 installation Methods 0.000 description 6
- 239000008399 tap water Substances 0.000 description 5
- 235000020679 tap water Nutrition 0.000 description 5
- 239000003513 alkali Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000002912 waste gas Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 241000009298 Trigla lyra Species 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 210000002421 cell wall Anatomy 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- -1 wherein Substances 0.000 description 1
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Abstract
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Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200710117832 CN101333679B (en) | 2007-06-25 | 2007-06-25 | Method and apparatus for shortening maintenance time of epitaxy end gas processor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200710117832 CN101333679B (en) | 2007-06-25 | 2007-06-25 | Method and apparatus for shortening maintenance time of epitaxy end gas processor |
Publications (2)
Publication Number | Publication Date |
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CN101333679A CN101333679A (en) | 2008-12-31 |
CN101333679B true CN101333679B (en) | 2010-11-10 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 200710117832 Active CN101333679B (en) | 2007-06-25 | 2007-06-25 | Method and apparatus for shortening maintenance time of epitaxy end gas processor |
Country Status (1)
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CN (1) | CN101333679B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN212017370U (en) * | 2020-03-16 | 2020-11-27 | 上海晶盟硅材料有限公司 | Water washing pipe for treating tail gas of epitaxial furnace |
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2007
- 2007-06-25 CN CN 200710117832 patent/CN101333679B/en active Active
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Publication number | Publication date |
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CN101333679A (en) | 2008-12-31 |
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Free format text: FORMER OWNER: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Effective date: 20120130 Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS Effective date: 20120130 |
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Effective date of registration: 20120130 Address after: 100088, 2, Xinjie street, Beijing Patentee after: GRINM Semiconductor Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Co-patentee before: GRINM Semiconductor Materials Co., Ltd. Patentee before: General Research Institute for Nonferrous Metals |
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Owner name: GRINM ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: GRINM SEMICONDUCTOR MATERIALS CO., LTD. |
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CP01 | Change in the name or title of a patent holder |
Address after: 100088, 2, Xinjie street, Beijing Patentee after: YOUYAN NEW MATERIAL CO., LTD. Address before: 100088, 2, Xinjie street, Beijing Patentee before: GRINM Semiconductor Materials Co., Ltd. |
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Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GRINM ADVANCED MATERIALS CO., LTD. Effective date: 20150615 |
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Effective date of registration: 20150615 Address after: 101300 Beijing city Shunyi District Shuanghe Linhe Industrial Development Zone on the south side of the road Patentee after: You Yan Semi Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Patentee before: YOUYAN NEW MATERIAL CO., LTD. |
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Address after: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee after: Youyan semiconductor silicon materials Co.,Ltd. Address before: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |