CN101333679B - Method and apparatus for shortening maintenance time of epitaxy end gas processor - Google Patents
Method and apparatus for shortening maintenance time of epitaxy end gas processor Download PDFInfo
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- CN101333679B CN101333679B CN 200710117832 CN200710117832A CN101333679B CN 101333679 B CN101333679 B CN 101333679B CN 200710117832 CN200710117832 CN 200710117832 CN 200710117832 A CN200710117832 A CN 200710117832A CN 101333679 B CN101333679 B CN 101333679B
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- water
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- pipeline
- funnel
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- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000012423 maintenance Methods 0.000 title claims abstract description 26
- 238000000407 epitaxy Methods 0.000 title claims abstract description 19
- 238000004904 shortening Methods 0.000 title abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000007789 gas Substances 0.000 claims abstract description 46
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 37
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims abstract description 35
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000000126 substance Substances 0.000 claims abstract description 22
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 16
- 238000010926 purge Methods 0.000 claims abstract description 13
- 238000005086 pumping Methods 0.000 claims abstract description 8
- 230000000694 effects Effects 0.000 claims abstract description 7
- 238000005406 washing Methods 0.000 claims abstract description 7
- 239000000779 smoke Substances 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 14
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000012545 processing Methods 0.000 abstract description 3
- 230000008901 benefit Effects 0.000 abstract description 2
- 238000007667 floating Methods 0.000 abstract description 2
- 230000002035 prolonged effect Effects 0.000 abstract 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 8
- 239000005052 trichlorosilane Substances 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 7
- 241000628997 Flos Species 0.000 description 6
- 238000009434 installation Methods 0.000 description 6
- 239000008399 tap water Substances 0.000 description 5
- 235000020679 tap water Nutrition 0.000 description 5
- 239000003513 alkali Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000002912 waste gas Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 241000009298 Trigla lyra Species 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 210000002421 cell wall Anatomy 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- -1 wherein Substances 0.000 description 1
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Abstract
Disclosed is a method for shortening maintenance time of the processor of epitaxy exhaust and a device thereof. The method is as follows: based on the water-washing method, by nitrogen purging, flocculent silicide at the inlet port sheds into a water flume; the water is pumped out by a water pump; at the same time, because of the pumping force of the water pump, the flocculent silicide floating on the water is gathered inside a funnel; a chemical liquid valve is opened, a chemical pump is started, and concentrated alkaline is added into the funnel; under the effect of the concentrated alkaline, the silicide is dissolved; and the water is added and pumped out repeatedly so that the flocculent silicide can be emptied inside the water flume. The method has the advantages that as the method that the alkaline is automatically added and the nitrogen purges the pipelines is introduced, on the basis of not disassembling the processor of epitaxy exhaust, and the exhaust processing system is improved, the maintenance time of the system can be reduced, and the maintenance period can be prolonged, thereby wholly improving the production efficiency of the epitaxy process; related pipelines are avoided being disassembled in the whole maintenance process, so residual gases in the pipelines are avoided being leaked.
Description
Technical field
The present invention relates to a kind of method and device that shortens the epitaxy end gas processor maintenance time.
Background technology
Need a large amount of HCL in the epitaxy technique, trichlorosilane (TCS), B
2H
6, PH
3, H
2Deng special gas, wherein, TCS, B
2H
6, PH
3All be hypertoxic gas, these gases can influence the life and the environmental safety of factory building periphery, need avoid directly entering in the air, and exhaust gas treating device is an exhaust gas processing device necessary in the epitaxy technique process.The extension exhaust gas treating device is the device that specialized designs is handled extension tail gas waste gas.Be connected by the vapor pipe of epitaxial furnace and the inlet mouth of exhaust gas treating device, extension waste gas enters in the vent gas treatment and reacts, and discharges free of contamination gas then.
General exhaust gas processing device comprises three kinds of combustion-types, water washing type, sedimentation type.Water washing type is connected with a special Venturi meter by the venting port of exhaust gas treating device, and the negative pressure that relies on Venturi meter to provide makes that the process gas in the epitaxial furnace is drawn in the exhaust gas treating device.In exhaust gas treating device, the HCL in the extension waste gas, TCS, B
2H
6, PH
3Through constantly washing, abundant and water reacts and is removed.Remaining H
2, N
2Be discharged in the air.Wherein the reaction of TCS (trichlorosilane) and water is:
2SiHCl3+3H2O→O＝SiH-O-SiH＝O+6HCl
The Si that generates
2H
2O
2Be pulverulent solids, and along with the prolongation of time, these powder can be assembled, and generate white floss, stop up inlet mouth.
Exhaust gas treating device mainly contains two effects in the normal pressure epitaxy technique:
1, handles the poisonous fume that produces in the epitaxial deposition process
2, the negative pressure of exhaust gas treating device Venturi generation forms stable negative pressure in the epitaxial furnace deposit cavity, guarantee the normal growth of epitaxial film.
Because the water in the exhaust gas treating device is atomized, and forms a large amount of steam, so at the inlet mouth of tail gas, TCS and steam can react, and attached to the inlet mouth place.Along with the prolongation in treatment time, these silicides that adhere to are constantly grown up, and stop up inlet mouth gradually, cause negative pressure reduction in the epitaxial furnace, and ordinary production can not be carried out.At this moment need to clear up the cotton-shaped silicide of inlet mouth, exhaust treatment system needs to shut down, and safeguards.
The maintenance of exhaust gas treating device at present mainly contains following problem:
1, the security of maintenance service owing to TCS, B2H6, PH3 etc. are hypertoxic gas, is the safety that guarantees the staff, and the maintenance service of exhaust gas treating device must wait for that epitaxy technique stopped about 1 hour, just can open exhaust pipe.In the process of salvaging cotton-shaped silicide, also probably have some responseless toxic gas leakages and come out.
2, the cotton-shaped silicide of inlet mouth accumulation lacks effective means it is pulverized in entering the bottom tank.These cotton-shaped compounds can be in the process of machine operation in theory, and the impact of process current is broken.But find in actual the use that most of silicide is difficult to be pulverized, but at the retaining cell wall, assembles on the water level sensor, can cause water level sensor malfunctioning, after exhaust gas treating device made a mistake and reports to the police, epitaxial furnace also can be forced to shutdown.Because about 50,000 dollars of the Direct Loss that the epitaxial furnace that the exhaust gas treating device warning causes shuts down automatically.So after each maintenance is finished, the cotton-shaped compound in the tank must be cleaned out.
In actual production, shorten maintenance time, the whole maintenance intervals of prolongation exhaust gas treating device of single exhaust gas treating device, eliminate the cotton-shaped silicide that forms in the vent gas treatment process, be to guarantee the normal prerequisite of moving of epitaxy technique.
Summary of the invention
Purpose of the present invention just provides a kind of method and device that shortens the epitaxy end gas processor maintenance time, use the present invention can reduce maintenance time, the prolongation maintenance intervals of system, improve the production efficiency of epitaxy technique on the whole, guarantee that epitaxy technique normally moves.
For achieving the above object, the present invention is by the following technical solutions: the method for this shortening epitaxy end gas processor maintenance time is on the basis of WATER-WASHING METHOD, purging by nitrogen, the cotton-shaped silicide of inlet mouth is shed in the tank, utilize water pump to extract the interior water of tank, simultaneously because the draft of water pump, the cotton-shaped silicide that swims on the water surface is collected in the funnel, open the chemical liquids valve, start chemical pumping, concentrated base is added in the funnel, under the effect of concentrated base, silicide is dissolved, by repeatedly add water, drawing water reaches cotton-shaped silicide emptying in the tank.
The alkali that the present invention uses can be sodium hydroxide or potassium hydroxide solution.
Advantage of the present invention is: introducing adds alkali and nitrogen purging pipeline automatically, on the basis of not taking exhaust gas treating device apart, by improvement to exhaust treatment system, can reduce maintenance time, the prolongation maintenance intervals of system, improve the production efficiency of epitaxy technique on the whole, avoided the dismounting of associated pipe in whole maintenance process, thus the leakage of residual gas in the pipeline of avoiding.
Description of drawings
Fig. 1: apparatus structure synoptic diagram of the present invention
Among Fig. 1, frame of broken lines is increase part of the present invention with interior device. Gas inlet I (AP), gas inlet II (RP), Water spraying filter 6, tank 7 etc. are the intrinsic device of original machine. The facility that newly adds is originally to punch as blind plate 5 places that safeguard by machine, is connected in the tank of machine. Wherein by left-to-right be: 1. nitrogen pipeline, open and close nitrogen pipeline by valve V1, it act as and purges silicide (silicide is collected at the tail gas import, and is corresponding with nitrogen outlet); 2. water supply pipe opens and closes pipeline by valve V2; Chemical pumping 3 uses etch-proof chemical pumping to extract chemical liquids from chemical tank, whether enters tank by valve V3 control chemical liquids. Common water pump 4, its effect are to extract out through the floccule of chemical liquids dissolving in the dilution tank, and by the switching of valve V4 control piper, and the other end that the device for cleaning pipeline that connects water pump enters tank is funnel-form.
Water supply pipe, carry the pipeline of chemical liquids to be connected to respectively on the distinct interface of a three-way pipe by pump, the outlet of this three-way pipe connects a pipeline, and device for cleaning pipeline enters in the tank. The use of chemical liquids and the use of running water are by V3, V2 control. Gas inlet I, the changeable use of gas inlet II.
Embodiment
When using native system to safeguard as exhaust gas treating device, at first open nitrogen valve V1, by the purging of nitrogen, the cotton-shaped silicide of inlet mouth is shed in the tank.Installation by simple nitrogen purging device makes that action is simpler, and has avoided the installation and removal of interface clip and because clip is installed and removed the pipeline gas leakage that may cause repeatedly.
Native system is at first introduced the blow off cotton-shaped silicide of inlet mouth of nitrogen purging device in casing, maintenance mode originally is an interface clip of opening system and extension tail gas, uses hydraulic giant (air gun) that cotton-shaped silicide is blown off.Comparatively speaking, the installation by simple nitrogen purging device makes that action is simpler, and has avoided the installation and removal of interface clip and because clip is installed and removed the pipeline gas leakage that may cause repeatedly.
After using nitrogen purging device that cotton-shaped silicide is blown off, utilize water pump to extract the interior water of tank, owing to the draft of water pump, the cotton-shaped silicide that swims on the water surface is collected in the funnel simultaneously.Close running water valve, open the chemical liquids valve simultaneously, start chemical pumping, an amount of concentrated base is added in the funnel.Under the effect of concentrated base, silicide is just dissolved after about ten minutes.Close the chemical liquids valve, the feeding tap water is gone out the alkali lye in the funnel and is diluted.When tap water arrives certain liquid level in the tank, start common water pump, the liquid in the tank is extracted into below the liquid level.By repeatedly add water, drawing water promptly to reach purpose with cotton-shaped silicide emptying in the tank.
Comparatively speaking, the treatment process that machine suppliers provides is more complicated, after the clip of opening air intake is disclosed cotton-shaped silicide down, need open " blind plate " of exhaust gas treating device water tank, and some instruments are salvaged away waste residue then.But blind plate aperture and tank volume differ greatly, and add that floss swims on the water surface, so the entire operation process is very difficult, and silicide is easy to be broken, though take long to also be difficult to floater cleaning is clean.Remaining floating matter can stop up the filtering net of machine when machine moves, and then causes the negative pressure of system to reduce, and influences the normal operation of epitaxy technique.
According to original service mode, often need the blockage problem of preventive maintenance after-filtration net.In the process of salvaging floss, frangible floss is difficult to be salvaged clean, and these remaining silicides can stop up filtering net the in service of exhaust gas treating device postorder, influence the normal operation of epitaxy technique.And use new maintenance mode, and drain by the dissolving of alkali lye and the water repeatedly of water pump in the tank, make residual silicide effectively be eliminated.
Embodiment 1:
In actual use, we at first adopt the nitrogen purging function by continuous pressure boost, cotton-shaped silicide are purged fall in the tank, and the time spent is about 1 minute.Open water pump then, water level is extracted into below the funnel, under the effect of water pump draft, the cotton-shaped silicide of fragmentation is concentrated at the funnel place.When cotton-shaped silicide after the funnel place concentrates, open and close chemical pumping chemical pumping adds appropriate alkaline liquor in funnel after.Wait for the tap water screw clamp that adds capacity after 10 minutes, because tap water directly is flushed in the funnel, so the chemical liquids in the funnel is diluted, the dissolved silicide is rushed out simultaneously.After stopping to add tap water, open water pump, once more water level is extracted into below the funnel.Because floss has been dissolved into little particle, so be easy to be taken away by water pump.Above repeatedly action just can be cleaned out the floss in the tank for twice.1 hour about time spent of this maintenance process.
Compare original method, owing to can not effectively clean out cotton-shaped silicide, approximately need 2 hours so the cleaning of floccule adds relevant pipeline dismounting, installation. And after installation, also need to be under manual mode, allow water circulation in the tank, at this moment remaining cotton-shaped silicide is collected in the position of screen pack, cleans out then. If do not clean out, in the process of machine operation, not smooth because of the blocked current of screen pack, reporting to the police appears in machine, and haveing suffered journey also needs to continue more than 1 hour. Consider the downtime of machine, this maintenance time is about 4～5 hours.
Claims (3)
1. method that shortens the epitaxy end gas processor maintenance time, it is a WATER-WASHING METHOD, it is characterized in that: on the basis of WATER-WASHING METHOD, purging by nitrogen, the cotton-shaped silicide of inlet mouth is shed in the tank, utilize water pump to extract the interior water of tank, simultaneously because the draft of water pump, the cotton-shaped silicide that swims on the water surface is collected in the funnel, opens the chemical liquids valve, starts chemical pumping, concentrated base is added in the funnel, under the effect of concentrated base, silicide is dissolved, by repeatedly add water, drawing water reaches cotton-shaped silicide emptying in the tank.
2. device of implementing the described method of claim 1, it comprises: tank, water smoke strainer, blind plate is characterized in that: following several inlet flume pipelines are housed: the nitrogen purging pipeline on the described blind plate; Water supply pipe; Pipeline by the pump delivery chemical liquids; The pipeline that connects water pump, the end that the pipeline of this connection water pump feeds tank has funnel.
3. device according to claim 2 is characterized in that: water supply pipe, be connected to respectively on the distinct interface of a Y-tube by the pipeline of pump delivery chemical liquids, the outlet of this Y-tube connects a pipeline, and pipeline feeds in the tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200710117832 CN101333679B (en) | 2007-06-25 | 2007-06-25 | Method and apparatus for shortening maintenance time of epitaxy end gas processor |
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|---|---|---|---|
| CN 200710117832 CN101333679B (en) | 2007-06-25 | 2007-06-25 | Method and apparatus for shortening maintenance time of epitaxy end gas processor |
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| Publication Number | Publication Date |
|---|---|
| CN101333679A CN101333679A (en) | 2008-12-31 |
| CN101333679B true CN101333679B (en) | 2010-11-10 |
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Address after: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee after: Youyan semiconductor silicon materials Co.,Ltd. Address before: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |