CN101319303A - Method for manufacturing precious metal containing sputtering targets - Google Patents
Method for manufacturing precious metal containing sputtering targets Download PDFInfo
- Publication number
- CN101319303A CN101319303A CNA2007101105782A CN200710110578A CN101319303A CN 101319303 A CN101319303 A CN 101319303A CN A2007101105782 A CNA2007101105782 A CN A2007101105782A CN 200710110578 A CN200710110578 A CN 200710110578A CN 101319303 A CN101319303 A CN 101319303A
- Authority
- CN
- China
- Prior art keywords
- precious metal
- target material
- making method
- sputtered target
- ingot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a method for manufacturing a sputtering target material containing precious metal, comprising the steps of preparing, surface treatment, fusion casting, hot processing and annealing, wherein in the preparing step, all metal ingots are prepared and subjected to the surface treatment step to remove surface oxides and oil stains; in the fusion casting step, the metal ingots are subjected to the vacuum melting according to the specific weight composition ratio to manufacture alloy fused mass, and the alloy fused mass is poured in a metal mold for freezing and forming to manufacture casting blanks, and simultaneously the arc heating is utilized to make surfaces of the alloy fused mass maintain high temperature melt form; in the end, the whole surface of the alloy fused mass is cooled at the same time, and the cooling gradually from outer edges to the center does not occur, thereby effectively removing defects of sink heads and shrinkage holes; and by matching the steps of hot processing and annealing, the sputtering target material with fine and compact texture and uniform compositions, the material output rate of which is as high as 90 percent, can be manufactured.
Description
Technical field
The present invention relates to a kind of making method of alloy sputtered target material, particularly relate to a kind of making method that contains the precious metal sputtered target material that is applied in the film sputter process.
Background technology
Hard disk is the modern main element that is used for storing mass data, and data mainly is the magneticthin film recording layer that leaves on the hard disks, and main component is cobalt (Co) base alloy material that contains platinum (Pt) precious metal.And this magneticthin film recording layer is to be coated on the hard disks in sputter (Sputtering) processing procedure mode, therefore the alloy target material that needs sputter to use.
And this sputter process is meant that the use plasma carries out ion bombardment to sputter with alloy target material, utilize the momentum of ion bombardment to shift, the lip-deep atom of alloy target material is clashed into out with the gas molecule form, through adhering to, after the processes such as absorption, surface transport, nucleation, growing up on hard disks forms the magneticthin film recording layer.
Because hard-core technologies such as electronics, semi-conductor, laser optics, precision optical machinery, high physical chemistry are contained in the seagate field, therefore also higher relatively with the requirement of alloy target material for sputter, can't carry out the casting of target with traditional atmosphere founding processing procedure.In addition, because platinum (Pt) bullion content that the hard disk recording layer includes with target is often up to more than the 30wt%, therefore, how to select suitable processing procedure for use, to improve the waste of must the material rate avoiding platinum (Pt) precious metal of target embryo, just becoming to be engaged in and contain noble metal target material manufacturers subject under discussion quite deeply concerned, also is the competitive power place of the sector.
United States Patent (USP) the 6th, 797, No. 137 disclosed technique means of patent case, then be to produce more cheap cobalt chromium boron (CoCrB) mother alloy of cost with the vacuum melting powder spraying apparatus earlier, and then with ball milling method with the powder of mother alloy and the powder thorough mixing of platinum (Pt) precious metal, impose hot isostatic pressing (Hot Isostatic Pressure at last again, HIP) processing procedure just can be produced highly purified cobalt chromium platinum boron (CoCrPtB) target, this target just can be used for the film sputter process of hard disk magnetic recording layer, cause the situation of target composition inequality yet the ball milling method that is adopted but is easy to generate powder mixing inequality, and then reduce the quality of follow-up sputter.
The making method of another kind of existing sputtered target material, then be to utilize vacuum induction melting (Vacuum Induction Melting, VIM) (VacuumArc Remelting, VAR) processing procedure are prepared high purity and are contained cobalt chromium (CoCr) alloy target material in processing procedure and vacuum arc refining.Be characterized in being used as negative potential with the ingot casting of vacuum induction melting (VIM), the copper crucible of collocation positive electrode carries out vacuum arc refining (VAR), to obtain high-quality casting embryo.Yet the VIM ingot casting just can be used as the electrode of VAR after up to the excision earlier of the rising head shrinkage cavity defect more than 40%, and therefore whole must the material rate certainly will be lower than 60%.In addition, above-mentioned two kinds of vacuum powder spraying apparatus, hot isostatic apparatus, vacuum induction melting equipment and vacuum arc refining units that existing target manufacture method is adopted, its equipment and manufacturing cost are all quite expensive, also increase the cost of manufacture of target virtually.
Therefore, how to improve alloy target material composition uniform and delicate degree and must the material rate, and then effectively reduce production costs, improve the market competitiveness, just become sputter and desire most ardently the direction that effort is studied with alloy target material manufacturers.
Summary of the invention
Purpose of the present invention is to provide a kind of making method that contains the precious metal sputtered target material, have to such an extent that expect high advantage, and the sputtered target material of institute's output not only has high purity, and organizes careful composition even.
For achieving the above object, the present invention contains the making method of precious metal sputtered target material, comprises one and prepares step, a surface treatment step, a founding step, a hot-work step and an annealing steps.
This preparation step is to prepare one by the metallic element of tool magnetic made a high purity substrates and a high purity precious metal ingot, this surface treatment step then is that this base material and precious metal ingot are removed oxide on surface and smeary operation, this founding step is to get the precious metal ingot of weight percent below 50%, the base material of complex equilibrium amount, carry out vacuum melting, alloy melt with the vacuum melting gained pours in the metal mold again, and cool off this metal mold, so that the alloy melt coagulation forming is a casting embryo, when alloy melt pours into this metal mold, synchronously make the alloy melt surface that is positioned at this metal mold keep the high-temperature fusion shape in the electric-arc heating mode, until pouring into end of processing, carry out this hot-work step then, carried out the viscous deformation operation should cast embryo, carried out this annealing steps again, should be cast the embryo operation of annealing, to obtain to contain the sputtered target material of precious metal, use for sputter process.
The making method that contains the precious metal sputtered target material of the present invention, the base material that this preparation step is prepared is selected from the following group that constitutes: iron, cobalt, nickel and these a combination.
The precious metal ingot that the making method that contains the precious metal sputtered target material of the present invention, this preparation step are prepared is selected from the following group that constitutes: platinum, palladium, gold and silver, rhodium, iridium, ruthenium, osmium and these a combination.
The making method that contains the precious metal sputtered target material of the present invention, the purity of base material that this preparation step is prepared and precious metal ingot all reaches weight percent more than 99.95%.
The making method that contains the precious metal sputtered target material of the present invention, this preparation step is also prepared a purity and is reached the chromium ingot metal of weight percent more than 99.95%, this base material then is a cobalt ingot metal, this founding step is with this cobalt ingot metal, chromium ingot metal and precious metal ingot, with the cobalt of weight percent 45%～60%, the chromium of weight percent 5%～27%, the precious metal of weight percent 25%～45%, it is carried out vacuum melting to obtain alloy melt.
The making method that contains the precious metal sputtered target material of the present invention, this surface treatment step is with this base material, chromium ingot metal, place acidic solution with precious metal ingot three, remove oxide on surface and greasy dirt in the ultrasonic vibration mode, and then place deionized water, remove the acidic solution that remains in the surface in the ultrasonic vibration mode equally, and then dried.
The making method that contains the precious metal sputtered target material of the present invention, the employed acidic solution of this surface treatment step is selected from the following group that constitutes: nitric acid, phosphoric acid, hydrochloric acid, hydrofluoric acid and chloroazotic acid.
The making method that contains the precious metal sputtered target material of the present invention, this making method also comprise a car system step, and this annealing steps is finished the sputtered target material that the back is obtained, and, use for sputter process except that behind the surface oxide layer through section, car.
The making method that contains the precious metal sputtered target material of the present invention, the working temperature of this hot-work step is between 0.75～0.85 times of the melting temperature of this casting embryo, the annealing temperature of this annealing steps is lower than between 100 ℃～300 ℃ of this hot-work step working temperatures, and annealing time is between 1～2 hour.
The making method that contains the precious metal sputtered target material of the present invention, this founding step are also added the boron of weight percent below 5% when vacuum melting.
The making method that contains the precious metal sputtered target material of the present invention, the vacuum melting mode that this founding step is carried out is a vacuum induction melting.
The making method that contains the precious metal sputtered target material of the present invention, the vacuum melting mode that this founding step is carried out is vacuum arc melting.
The making method that contains the precious metal sputtered target material of the present invention, this hot-work step are to adopt heat forged.
The making method that contains the precious metal sputtered target material of the present invention, this hot-work step are to adopt hot rolling to prolong.
The making method that contains the precious metal sputtered target material of the present invention, this annealing steps are to carry out under air atmosphere.
The making method that contains the precious metal sputtered target material of the present invention, this annealing steps are to carry out under protective atmosphere.
The making method that contains the precious metal sputtered target material of the present invention, the employed protective atmosphere of this annealing steps is an argon gas.
Effect of the present invention is, utilize alloy melt coagulation forming in metal mold to be casting embryo the time, utilize electric-arc heating to make the alloy melt surface keep the high-temperature fusion shape synchronously, at last the integral surface of alloy melt is cooled off simultaneously, and can not cool off to central authorities gradually by outer rim, therefore can effectively eliminate and emit the hole shrinkage cavity defect, and cooperate and carry out this hot-work, annealing steps, just can obtain to organize the uniform sputtered target material of careful composition.
Description of drawings
Fig. 1 is a schema, illustrates that the present invention contains the preferred embodiment of the making method of precious metal sputtered target material.
Fig. 2 is a micro-organization chart, illustrates that implementation method 1 utilizes the made sputtered target material of weight proportion of composing of 50wt% cobalt, 8wt% chromium and 42wt% platinum, and its grain-size is less than 150 μ m.
Fig. 3 is a micro-organization chart, illustrates that implementation method 2 utilizes the made sputtered target material of weight proportion of composing of 54wt% cobalt, 14wt% chromium, 31wt% platinum and 1wt% boron, and its grain-size is about 80 μ m.
Embodiment
Below by preferred embodiment and accompanying drawing the making method that the present invention contains the precious metal sputtered target material is elaborated.
Consult Fig. 1, the present invention contains the preferred embodiment of the making method 1 of precious metal sputtered target material, comprises one and prepares step 11, a surface treatment step 12, a founding step 13, a hot-work step 14, an annealing steps 15 and a car system step 16.
This preparation step 11 is to prepare one by the made high purity substrates of the metallic element of tool magnetic, a high-purity chromium ingot metal and a high purity precious metal ingot, and this base material, chromium ingot metal, precious metal ingot three's purity is all up to more than the 99.95wt%.
In the present embodiment, the base material that this preparation step 11 is prepared is cobalt (Co) ingot metal, can certainly be iron (Fe) ingot metal, or nickel (Ni) ingot metal, or iron, cobalt, three kinds of metallic elements of nickel any two blended alloy pigs at least wherein.Composition as for this precious metal ingot then is platinum (Pt) metallic element, can certainly be that palladium (Pd), gold (Au), silver (Ag), rhodium (Rh), iridium (Ir), ruthenium (Ru), osmium (Os) wait other kind precious metal elements, or any two metallic element institute blended alloys at least wherein, above-mentioned metallic element is all those of ordinary skills, and association is alternative easily, so should not be limited to the explanation of present embodiment.
This surface treatment step 12 is with this cobalt ingot metal, chromium ingot metal, place acidic solution with precious metal ingot three, remove oxide on surface and greasy dirt in the ultrasonic vibration mode, and then place deionized water, remove the acidic solution that remains in the surface in the ultrasonic vibration mode equally, and then dried.
In the present embodiment, acidic solution is to adopt the salpeter solution of volumetric concentration more than 95%, can certainly adopt phosphoric acid, hydrochloric acid, hydrofluoric acid, or the acidic solution of other kinds such as chloroazotic acid, all can be used as and remove oxide on surface and smeary purposes, so should not exceed with the explanation of present embodiment.
This founding step 13 is with this cobalt ingot metal, chromium ingot metal and precious metal ingot, cobalt with 45wt%～60wt%, the chromium of 5wt%～27wt%, the precious metal of 25wt%～45wt%, and add the boron of 0～5wt%, it is carried out vacuum melting to obtain alloy melt, again alloy melt is poured in the metal mold with the refrigeration cycle water route (generally being the fine copper mold that adopts high thermoconductivity), and continue to flow moving in the refrigeration cycle water route by water coolant, to cool off this metal mold, so that the alloy melt coagulation forming is a casting embryo, when alloy melt pours into this metal mold, synchronously make the alloy melt surface that is positioned at this metal mold keep the high-temperature fusion shape, until pouring into end of processing in the electric-arc heating mode.
Carry out this hot-work step 14 then, carried out viscous deformation operation (generally being exactly that heat forged or hot rolling are prolonged) formation predetermined shape should cast embryo, carry out this annealing steps 15 again, should cast the embryo operation of annealing, to obtain to contain the sputtered target material of precious metal, wherein, the working temperature of this hot-work step 14 is between 0.75～0.85 times of the melting temperature of this casting embryo, the annealing temperature of this annealing steps 15 is lower than between 100 ℃～300 ℃ of this hot-work step 14 working temperatures, and annealing time is between 1～2 hour.
Carry out this car system step 16 at last again, this annealing steps 15 is finished the sputtered target material that the back is obtained, except that behind the surface oxide layer, use for sputter process through section, car.
With next is to adopt the described every step of present embodiment, form according to different alloying constituents, and the different operating condition of hot-work step 14, annealing steps 15, two kinds of implementation methods that obtained, clearly stating the making method 1 that the present invention contains the precious metal sputtered target material clearly, and 1 effect that can reach of this making method.
This implementation method is with the example that is made as of cobalt chromium platinum (CoCrPt) alloy sputtered target material, at first in this preparation step 11, prepare purity up to the cobalt ingot metal more than the 99.95wt%, chromium ingot metal, with the platinum ingot, then carry out this surface treatment step 12, the ingot metal of above-mentioned three kinds is placed the salpeter solution of volumetric concentration more than 95%, remove oxide on surface and greasy dirt in the ultrasonic vibration mode, and then place deionized water, remove the salpeter solution that remains in the surface in the ultrasonic vibration mode equally, and then dried.
Then carry out this founding step 13, with this cobalt ingot metal, chromium ingot metal and platinum ingot, cobalt with 50wt%, the weight proportion of composing of the chromium of 8wt% and the platinum of 42wt%, the weighing of preparing burden, and the raw metal that scale is good places vacuum melting furnace, with vacuum induction melting (Vacuum Induction Melting, VIM) mode obtains alloy melt, again alloy melt is poured in the fine copper mold with circulation waterway and high thermoconductivity and cool off, with coagulation forming rapidly is a casting embryo, when alloy melt pours into mold, synchronously make the alloy melt surface that is positioned at mold keep the high-temperature fusion shape, until pouring into end of processing in the electric-arc heating mode.
Carry out this hot-work step 14 then, (just 1200 ℃) carry out heat forged under 0.85 times of the melting temperature of this casting embryo, carried out viscous deformation operation formation predetermined shape should cast embryo, then carry out this annealing steps 15 again, with the annealing temperature (just 900 ℃) of this casting embryo to be lower than 300 ℃ of heat forged temperature, under air atmosphere, carry out 2 hours anneal, to obtain careful, the uniform sputtered target material of structural constituent of crystal grain.
Carry out this car system step 16 at last again, this annealing steps 15 is finished the sputtered target material that the back is obtained, process section, car just can use for sputter process after removing surface zone of oxidation slightly.
By the made sputtered target material of above-mentioned processing procedure, it is must the material rate about 94%, and its microstructure then as shown in Figure 2, by can finding among the figure that organizing of sputtered target material is quite careful evenly, and presents the equiax crystal kenel, and grain-size is less than 150 μ m.
Implementation method 2
This implementation method is with the example that is made as of cobalt chromium platinum boron (CoCrPtB) alloy sputtered target material, at first in this preparation step 11, prepare purity up to the cobalt ingot metal more than the 99.95wt%, chromium ingot metal, with the platinum ingot, then carry out this surface treatment step 12, the ingot metal of above-mentioned three kinds is placed the hydrochloric acid soln of volumetric concentration more than 95%, remove oxide on surface and greasy dirt in the ultrasonic vibration mode, and then place deionized water, remove the hydrochloric acid soln that remains in the surface in the ultrasonic vibration mode equally, and then dried.
Then carry out this founding step 13, with this cobalt ingot metal, chromium ingot metal and platinum ingot, cobalt with 54wt%, the weight proportion of composing of the chromium of 14wt% and the platinum of 31wt% carries out the raw material weighing, and the boron of interpolation 1wt%, place vacuum melting furnace, it is carried out vacuum arc melting (Vacuum Arc Melting, VAM) mode obtains alloy melt, again alloy melt is poured in the fine copper mold with circulation waterway and high thermoconductivity and cool off, so that alloy melt rapidly coagulation forming be one the casting embryo, when alloy melt pours into mold, synchronously make the alloy melt surface that is positioned at mold keep the high-temperature fusion shape, until pouring into end of processing in the electric-arc heating mode.
Carry out this hot-work step 14 then, (just 1100 ℃) carry out hot rolling and prolong under 0.75 times of the melting temperature of this casting embryo, carried out viscous deformation operation formation predetermined shape should cast embryo, then carry out this annealing steps 15 again, this casting embryo is prolonged the annealing temperature of 100 ℃ of temperature (just 1000 ℃) to be lower than hot rolling, under argon gas atmosphere, carry out 1 hour anneal, to obtain careful, the uniform sputtered target material of structural constituent of crystal grain.
Carry out this car system step 16 at last again, this annealing steps 15 is finished the sputtered target material that the back is obtained, process section, car just can use for sputter process after removing surface zone of oxidation slightly.
By the made sputtered target material of above-mentioned processing procedure, it is must the material rate about 92%, and its microstructure then as shown in Figure 3, and by finding among the figure that organizing of sputtered target material is quite careful evenly, grain-size is about 80 μ m.
By above-mentioned two kinds of implementation methods as can be known, the present invention's making method 1 of containing the precious metal sputtered target material has the advantage of the following stated:
(1) must the material rate higher, reduce the production cost of sputtered target material:
In this founding step 13, when alloy melt in this metal mold the cooled and solidified moulding time, utilize electric-arc heating to make the alloy melt surface keep the high-temperature fusion shape and can not solidify simultaneously synchronously, after pouring into end of processing, alloy melt just can finish electric-arc heating, make the integral surface of alloy melt to cool off simultaneously whereby and can be by outer rim gradually to central authorities' cooling, that effectively eliminates this casting embryo emits the hole shrinkage cavity defect; Review existing target making method, its made alloy cast ingot also must carry out the process that the hole shrinkage cavity defect is emitted in one removal, so the target product is must the material rate lower, in comparison, making method 1 made last sputtered target material product of the present invention must the material rate up to more than 90%, can reduce the production cost of sputtered target material effectively, and by this casting embryo coagulation forming rapidly, can also avoid low-melting crystallisate to separate out in a large number, and then improve the hot ductility of this casting embryo.
(2) purity height, organize careful composition even:
Making method 1 of the present invention is because use the high purity metal ingot to carry out melting in vacuum environment, keep high purity so can avoid impurity to invade, and more in regular turn via this founding step 13, hot-work step 14 and annealing steps 15, just can obtain that crystal grain is careful, the uniform sputtered target material of structural constituent, can not produce as the target making method and adopt ball milling mixing processing procedure, cause the problem of target composition inequality because powder mixes inequality; Therefore, use the made sputtered target material of making method of the present invention 1, have the purity height, organize advantages such as careful composition is even, for follow-up sputter process, can keep quite good sputter quality, be fit to the high-tech industry utilization.
Conclude above-mentioned, the present invention contains the making method 1 of precious metal sputtered target material, integral surface by alloy melt is to present refrigerative state simultaneously, and can not cool off to central authorities gradually by outer rim, therefore that can effectively eliminate this casting embryo emits the hole shrinkage cavity defect, that improves the sputtered target material product must the material rate, reduces the production cost of sputtered target material; Moulding also can be avoided a large amount of the separating out of low-melting crystallisate as for this casting embryo passes through condensation rapidly, and then improves the hot ductility of casting embryo; In addition, use highly purified ingot metal to carry out the made sputtered target material of this founding step 13, hot-work step 14, annealing steps 15, also has the careful advantage such as evenly of purity height, structural constituent, quality when helping improving follow-up sputter process is so can reach purpose of the present invention really.
Claims (17)
1. a making method that contains the precious metal sputtered target material is characterized in that,
This making method comprises:
One prepares step, prepares one by the metallic element of tool magnetic made a high purity substrates and a high purity precious metal ingot;
One surface treatment step is removed oxide on surface and smeary operation with this base material and precious metal ingot;
One founding step, this base material and precious metal ingot are carried out vacuum melting, alloy melt with the vacuum melting gained pours in the metal mold again, and cool off this metal mold, so that the alloy melt coagulation forming is a casting embryo, when alloy melt pours into this metal mold, make the alloy melt surface that is positioned at this metal mold keep the high-temperature fusion shape in the electric-arc heating mode synchronously, until pouring into end of processing;
One hot-work step is carried out the viscous deformation operation with the casting embryo of finishing this founding step; And
One annealing steps with the operation of annealing of the casting embryo of finishing this hot-work step, to obtain to contain the sputtered target material of precious metal, uses for sputter process.
2. according to the described making method that contains the precious metal sputtered target material of claim 1, it is characterized in that,
The base material that this preparation step is prepared is selected from the following group that constitutes: iron, cobalt, nickel and these a combination.
3. according to the described making method that contains the precious metal sputtered target material of claim 2, it is characterized in that,
The precious metal ingot that this preparation step is prepared is selected from the following group that constitutes: platinum, palladium, gold and silver, rhodium, iridium, ruthenium, osmium and these a combination.
4. according to the described making method that contains the precious metal sputtered target material of claim 3, it is characterized in that,
The purity of base material that this preparation step is prepared and precious metal ingot all reaches weight percent more than 99.95%.
5. according to the described making method that contains the precious metal sputtered target material of claim 4, it is characterized in that,
This preparation step is also prepared a purity and is reached the chromium ingot metal of weight percent more than 99.95%, this base material then is a cobalt ingot metal, this founding step is with this cobalt ingot metal, chromium ingot metal and precious metal ingot, with the cobalt of weight percent 45%～60%, the chromium of weight percent 5%～27%, the precious metal of weight percent 25%～45%, it is carried out vacuum melting to obtain alloy melt.
6. according to the described making method that contains the precious metal sputtered target material of claim 5, it is characterized in that,
This surface treatment step is with this base material, chromium ingot metal, place acidic solution with precious metal ingot three, remove oxide on surface and greasy dirt in the ultrasonic vibration mode, and then place deionized water, remove the acidic solution that remains in the surface in the ultrasonic vibration mode equally, and then dried.
7. according to the described making method that contains the precious metal sputtered target material of claim 6, it is characterized in that,
The employed acidic solution of this surface treatment step is selected from the following group that constitutes: nitric acid, phosphoric acid, hydrochloric acid, hydrofluoric acid and chloroazotic acid.
8. according to the described making method that contains the precious metal sputtered target material of claim 7, it is characterized in that,
This making method also comprises a car system step, and this annealing steps is finished the sputtered target material that the back is obtained, and, uses for sputter process except that behind the surface oxide layer through section, car.
9. the described according to Claim 8 making method that contains the precious metal sputtered target material is characterized in that,
The working temperature of this hot-work step is between 0.75～0.85 times of the melting temperature of this casting embryo, and the annealing temperature of this annealing steps is lower than between 100 ℃～300 ℃ of this hot-work step working temperatures, and annealing time is between 1～2 hour.
10. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
This founding step is also added the boron of weight percent below 5% when vacuum melting.
11. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
The vacuum melting mode that this founding step is carried out is a vacuum induction melting.
12. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
The vacuum melting mode that this founding step is carried out is vacuum arc melting.
13. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
This hot-work step is to adopt heat forged.
14. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
This hot-work step is to adopt hot rolling to prolong.
15. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
This annealing steps is to carry out under air atmosphere.
16. according to the described making method that contains the precious metal sputtered target material of claim 9, it is characterized in that,
This annealing steps is to carry out under protective atmosphere.
17. according to the described making method that contains the precious metal sputtered target material of claim 16, it is characterized in that,
The employed protective atmosphere of this annealing steps is an argon gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101105782A CN101319303A (en) | 2007-06-05 | 2007-06-05 | Method for manufacturing precious metal containing sputtering targets |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101105782A CN101319303A (en) | 2007-06-05 | 2007-06-05 | Method for manufacturing precious metal containing sputtering targets |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101319303A true CN101319303A (en) | 2008-12-10 |
Family
ID=40179570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101105782A Pending CN101319303A (en) | 2007-06-05 | 2007-06-05 | Method for manufacturing precious metal containing sputtering targets |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101319303A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103667768A (en) * | 2013-12-24 | 2014-03-26 | 济源豫金靶材科技有限公司 | Silver target manufacturing method |
| CN104014767A (en) * | 2014-06-05 | 2014-09-03 | 贵研铂业股份有限公司 | Method for preparing NiV alloy target |
| CN104032273A (en) * | 2014-06-09 | 2014-09-10 | 励福实业（江门）贵金属有限公司 | Fastness rose gold target and preparation method thereof |
| CN104480439A (en) * | 2014-12-31 | 2015-04-01 | 宁夏东方钽业股份有限公司 | Preparation process of tantalum target material |
-
2007
- 2007-06-05 CN CNA2007101105782A patent/CN101319303A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103667768A (en) * | 2013-12-24 | 2014-03-26 | 济源豫金靶材科技有限公司 | Silver target manufacturing method |
| CN104014767A (en) * | 2014-06-05 | 2014-09-03 | 贵研铂业股份有限公司 | Method for preparing NiV alloy target |
| CN104014767B (en) * | 2014-06-05 | 2016-05-04 | 贵研铂业股份有限公司 | A kind of method of preparing NiV alloy target material |
| CN104032273A (en) * | 2014-06-09 | 2014-09-10 | 励福实业（江门）贵金属有限公司 | Fastness rose gold target and preparation method thereof |
| CN104480439A (en) * | 2014-12-31 | 2015-04-01 | 宁夏东方钽业股份有限公司 | Preparation process of tantalum target material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105745344B (en) | The manufacture method of magnetic disc substrate aluminium alloy plate and its manufacture method and disk | |
| JP2004149914A (en) | Tantalum amorphous alloy | |
| TWI663274B (en) | Sputtering target and manufacturing method thereof | |
| CN110337692A (en) | Aluminium alloy base plate for magnetic disk and its manufacturing method and the disk for using the aluminium alloy base plate for magnetic disk | |
| CN102732845B (en) | Nickel-chromium alloy target with high purity and high compositional uniformity and method for preparing same | |
| CN100549199C (en) | A kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target | |
| JP2002045960A (en) | Method for casting amorphous alloy | |
| US7754027B2 (en) | Method for manufacturing a sputtering target | |
| KR20190018561A (en) | Method for producing sputtering target, and sputtering target | |
| CN111286703B (en) | Nickel-platinum alloy sputtering target material and preparation method thereof | |
| CN104704139B (en) | Cu Ga alloy sputtering targets and its manufacture method | |
| TW201715046A (en) | Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same | |
| CN101319303A (en) | Method for manufacturing precious metal containing sputtering targets | |
| CN102877033A (en) | Manganese alloy target material and its manufacturing method | |
| KR20200106084A (en) | Method for forming a copper alloy sputtering target having a refined shape and microstructure | |
| CN104032274B (en) | A kind of CoCrPt based alloy sputtering target material and thin film and preparation method thereof | |
| TW201103999A (en) | Method for manufacturing nickel alloy target | |
| CN106011757B (en) | A kind of casting method for preventing the brittle alloy as sputtering target material from cracking | |
| TWI387497B (en) | Manufacturing method of nickel alloy target | |
| JP5661540B2 (en) | Cu-Ga based alloy powder having low oxygen content, Cu-Ga based alloy target material, and method for producing target material | |
| CN114934261B (en) | Iron target, iron-nickel alloy target and manufacturing method thereof | |
| JP2014051712A (en) | Cu-Ga-BASED ALLOY TARGET AND METHOD FOR PRODUCING THE SAME | |
| TWI308598B (en) | ||
| JP7086514B2 (en) | Cobalt or cobalt-based alloy sputtering target and its manufacturing method | |
| TW201805461A (en) | Ti-Nb alloy sputtering target and method for manufacturing same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20081210 |