Embodiment
The present invention does with detailed description below in conjunction with drawings and Examples:
Embodiment first
Embodiment 1
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP mainly comprises following six kinds of components: (1) a kind of-(X)-(Y)-(Z)-and the unsaturated water-soluble polymers of structure, (2) a kind of performed polymer of photopolymerization and (3) a kind of polyfunctional monomer, (4) one or more Photoepolymerizationinitiater initiater, (5) one or more solvent of one or more dyestuff or pigment and (6); Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of the side chain of two unsaturated double-bonds, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
The present invention is suitable for that X is selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, isoprene sulfonic acid in the chemical processing-free negative graph photosensitive composition of UV-CTP.X accounts for 10% mol ratio of multipolymer.Y is the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds.Perhaps, Y is the acrylic or methacrylic acid copolymerization units that contains the GMA grafting of a unsaturated double-bond replacement.Y accounts for 20% mol ratio of multipolymer.Z is acrylate or the methacrylic acid copolymerization units that contains a unsaturated double-bond substituted radical.Z accounts for 30% mol ratio of multipolymer.-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure in, the unsaturated double-bond sum accounts for 60% mol ratio of polymkeric substance.The performed polymer of photopolymerization is a kind of polyurethane acroleic acid performed polymer.Photopolymerizable monomer is a polyfunctional monomer.Photoepolymerizationinitiater initiater is selected from the triaizine compounds that halogen replaces.The chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP also contains any one or more combination conduct interpolation component in phenolics, acryl resin, the urethane resin.
The present invention is suitable for the flat stamping version that the chemical processing-free negative graph photosensitive composition of UV-CTP is made, it comprises: (1) aluminum substrate support (label 3, other are same), (2) on the aluminum substrate support contain above-mentioned-(X)-(Y)-(Z)-hydrophilic layer of the unsaturated water-soluble polymers of structure (label 2 other with) and (3) and hydrophilic layer be at the chemical processing-free negative graph photosensitive composition coating layer of the above-mentioned UV-CTP of being suitable for aluminum substrate the same side and on hydrophilic layer (label 3 other).
Flat stamping version of the present invention, the support of this flat stamping version are through electrolyzing and coarsening and anodic oxidation and carry out the aluminum substrate that sealing of hole is handled that its center line average boldness is at 0.4um.The coating dry weight of hydrophilicity-imparting treatment is 5mg/dm
2
The method for making of flat stamping version of the present invention is being coated with the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP through electrolyzing and coarsening and anodic oxidation and on the aluminum substrate after carrying out the sealing of hole processing.
The method for making of flat stamping version among the present invention, through before electrolyzing and coarsening and anodic oxidation and carrying out the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP of coating on the aluminum substrate after sealing of hole is handled, aluminum substrate is carried out hydrophilicity-imparting treatment with the unsaturated water-soluble polymers of the present invention-(X)-(Y)-(Z)-structure.This flat stamping version is suitable for using the plate-making of UV-CTP platemaking machine.This flat stamping version can not used developing liquid developing and uses the tap water flushing after using UV-CTP platemaking machine scan exposure, promptly obtains printable flat stamping version.This flat stamping version directly can be lockd up press printing without any processing after using UV-CTP platemaking machine scan exposure.
Embodiment 2
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP mainly comprises following six kinds of components: (1) a kind of-(X)-(Y)-(Z)-and the unsaturated water-soluble polymers of structure, (2) a kind of performed polymer of photopolymerization and (3) a kind of polyfunctional monomer, (4) one or more Photoepolymerizationinitiater initiater, (5) one or more solvent of one or more dyestuff or pigment and (6); Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of the side chain of two unsaturated double-bonds, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
The present invention is suitable for that X is selected from vinyl sulfonic acid in the chemical processing-free negative graph photosensitive composition of UV-CTP, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, the allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, the 15% mol ratio .Y that isoprene sulfonic acid .X accounts for multipolymer is the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds. perhaps, Y is that the 25% mol ratio .Z that the acrylic or methacrylic acid copolymerization units .Y that contains the GMA grafting that unsaturated double-bond replaces accounts for multipolymer contains in the unsaturated water-soluble polymers of the acrylate of a unsaturated double-bond substituted radical or 35% mol ratio .-(X)-(Y)-(Z)-structure that methacrylic acid copolymerization units .Z accounts for multipolymer, and the unsaturated double-bond sum accounts for 65% mol ratio of polymkeric substance. and the performed polymer of photopolymerization is a kind of polyurethane acroleic acid performed polymer. and photopolymerizable monomer is a polyfunctional monomer. and Photoepolymerizationinitiater initiater is selected from the triaizine compounds that halogen replaces. and the chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP also contains phenolics, acryl resin, any one or more combination is as adding component in the urethane resin.
The present invention is suitable for the flat stamping version that the chemical processing-free negative graph photosensitive composition of UV-CTP is made, it comprises: (1) aluminum substrate support, (2) on the aluminum substrate support contain above-mentioned-(X)-(Y)-(Z)-hydrophilic layer and (3) and the chemical processing-free negative graph photosensitive composition coating layer of hydrophilic layer of the unsaturated water-soluble polymers of structure at the above-mentioned UV-CTP of being suitable for aluminum substrate the same side and on hydrophilic layer.
Flat stamping version of the present invention, the support of this flat stamping version are through electrolyzing and coarsening and anodic oxidation and carry out the aluminum substrate that sealing of hole is handled that its center line average boldness is at 0.45um.The coating dry weight of hydrophilicity-imparting treatment is 15mg/dm
2
The method for making of flat stamping version of the present invention is being coated with the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP through electrolyzing and coarsening and anodic oxidation and on the aluminum substrate after carrying out the sealing of hole processing.
The method for making of flat stamping version among the present invention, through before electrolyzing and coarsening and anodic oxidation and carrying out the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP of coating on the aluminum substrate after sealing of hole is handled, aluminum substrate is carried out hydrophilicity-imparting treatment with the unsaturated water-soluble polymers of the present invention-(X)-(Y)-(Z)-structure.This flat stamping version is suitable for using the plate-making of UV-CTP platemaking machine.This flat stamping version can not used developing liquid developing and uses the tap water flushing after using UV-CTP platemaking machine scan exposure, promptly obtains printable flat stamping version.This flat stamping version directly can be lockd up press printing without any processing after using UV-CTP platemaking machine scan exposure.
Embodiment 3
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP mainly comprises following six kinds of components: (1) a kind of-(X)-(Y)-(Z)-and the unsaturated water-soluble polymers of structure, (2) a kind of performed polymer of photopolymerization and (3) a kind of polyfunctional monomer, (4) one or more Photoepolymerizationinitiater initiater, (5) one or more solvent of one or more dyestuff or pigment and (6); Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of the side chain of two unsaturated double-bonds, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
The present invention is suitable for that X is selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, isoprene sulfonic acid in the chemical processing-free negative graph photosensitive composition of UV-CTP.X accounts for 20% mol ratio of multipolymer.Y is the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds.Perhaps, Y is the acrylic or methacrylic acid copolymerization units that contains the GMA grafting of a unsaturated double-bond replacement.Y accounts for 30% mol ratio of multipolymer.Z is acrylate or the methacrylic acid copolymerization units that contains a unsaturated double-bond substituted radical.Z accounts for 40% mol ratio of multipolymer.-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure in, the unsaturated double-bond sum accounts for 70% mol ratio of polymkeric substance.The performed polymer of photopolymerization is a kind of polyurethane acroleic acid performed polymer.Photopolymerizable monomer is a polyfunctional monomer.Photoepolymerizationinitiater initiater is selected from the triaizine compounds that halogen replaces.The chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP also contains any one or more combination conduct interpolation component in phenolics, acryl resin, the urethane resin.
The present invention is suitable for the flat stamping version that the chemical processing-free negative graph photosensitive composition of UV-CTP is made, it comprises: (1) aluminum substrate support, (2) on the aluminum substrate support contain above-mentioned-(X)-(Y)-(Z)-hydrophilic layer and (3) and the chemical processing-free negative graph photosensitive composition coating layer of hydrophilic layer of the unsaturated water-soluble polymers of structure at the above-mentioned UV-CTP of being suitable for aluminum substrate the same side and on hydrophilic layer.
Flat stamping version of the present invention, the support of this flat stamping version are through electrolyzing and coarsening and anodic oxidation and carry out the aluminum substrate that sealing of hole is handled that its center line average boldness is at 0.5um.The coating dry weight of hydrophilicity-imparting treatment is 30mg/dm
2
The method for making of flat stamping version of the present invention is being coated with the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP through electrolyzing and coarsening and anodic oxidation and on the aluminum substrate after carrying out the sealing of hole processing.
The method for making of flat stamping version among the present invention, through before electrolyzing and coarsening and anodic oxidation and carrying out the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP of coating on the aluminum substrate after sealing of hole is handled, aluminum substrate is carried out hydrophilicity-imparting treatment with the unsaturated water-soluble polymers of the present invention-(X)-(Y)-(Z)-structure.This flat stamping version is suitable for using the plate-making of UV-CTP platemaking machine.This flat stamping version can not used developing liquid developing and uses the tap water flushing after using UV-CTP platemaking machine scan exposure, promptly obtains printable flat stamping version.This flat stamping version directly can be lockd up press printing without any processing after using UV-CTP platemaking machine scan exposure.
Embodiment 4
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP mainly comprises following six kinds of components: (1) a kind of-(X)-(Y)-(Z)-and the unsaturated water-soluble polymers of structure, (2) a kind of performed polymer of photopolymerization and (3) a kind of polyfunctional monomer, (4) one or more Photoepolymerizationinitiater initiater, (5) one or more solvent of one or more dyestuff or pigment and (6); Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of the side chain of two unsaturated double-bonds, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
The present invention is suitable for that X is selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, isoprene sulfonic acid in the chemical processing-free negative graph photosensitive composition of UV-CTP.X accounts for 25% mol ratio of multipolymer.Y is the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds.Perhaps, Y is the acrylic or methacrylic acid copolymerization units that contains the GMA grafting of a unsaturated double-bond replacement.Y accounts for 35% mol ratio of multipolymer.Z is acrylate or the methacrylic acid copolymerization units that contains a unsaturated double-bond substituted radical.Z accounts for 45% mol ratio of multipolymer.-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure in, the unsaturated double-bond sum accounts for 75% mol ratio of polymkeric substance.The performed polymer of photopolymerization is a kind of polyurethane acroleic acid performed polymer.Photopolymerizable monomer is a polyfunctional monomer.Photoepolymerizationinitiater initiater is selected from the triaizine compounds that halogen replaces.The chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP also contains any one or more combination conduct interpolation component in phenolics, acryl resin, the urethane resin.
The present invention is suitable for the flat stamping version that the chemical processing-free negative graph photosensitive composition of UV-CTP is made, it comprises: (1) aluminum substrate support, (2) on the aluminum substrate support contain above-mentioned-(X)-(Y)-(Z)-hydrophilic layer and (3) and the chemical processing-free negative graph photosensitive composition coating layer of hydrophilic layer of the unsaturated water-soluble polymers of structure at the above-mentioned UV-CTP of being suitable for aluminum substrate the same side and on hydrophilic layer.
Flat stamping version of the present invention, the support of this flat stamping version are through electrolyzing and coarsening and anodic oxidation and carry out the aluminum substrate that sealing of hole is handled that its center line average boldness is at 0.55um.The coating dry weight of hydrophilicity-imparting treatment is 40mg/dm
2
The method for making of flat stamping version of the present invention is being coated with the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP through electrolyzing and coarsening and anodic oxidation and on the aluminum substrate after carrying out the sealing of hole processing.
The method for making of flat stamping version among the present invention, through before electrolyzing and coarsening and anodic oxidation and carrying out the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP of coating on the aluminum substrate after sealing of hole is handled, unsaturated water-soluble polymers with the present invention-(X)-(Y)-(Z)-structure carries out hydrophilicity-imparting treatment to aluminum substrate. and this flat stamping version is suitable for using the plate-making of UV-CTP platemaking machine. and this flat stamping version is after using UV-CTP platemaking machine scan exposure, can not use developing liquid developing and use the tap water flushing, promptly obtaining printable flat stamping version. this flat stamping version directly can be lockd up press printing without any processing after using UV-CTP platemaking machine scan exposure.
Embodiment 5
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP mainly comprises following six kinds of components: (1) a kind of-(X)-(Y)-(Z)-and the unsaturated water-soluble polymers of structure, (2) a kind of performed polymer of photopolymerization and (3) a kind of polyfunctional monomer, (4) one or more Photoepolymerizationinitiater initiater, (5) one or more solvent of one or more dyestuff or pigment and (6); Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of the side chain of two unsaturated double-bonds, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
The present invention is suitable for that X is selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, isoprene sulfonic acid in the chemical processing-free negative graph photosensitive composition of UV-CTP.X accounts for 30% mol ratio of multipolymer.Y is the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds.Perhaps, Y is the acrylic or methacrylic acid copolymerization units that contains the GMA grafting of a unsaturated double-bond replacement.Y accounts for 40% mol ratio of multipolymer.Z is acrylate or the methacrylic acid copolymerization units that contains a unsaturated double-bond substituted radical.Z accounts for 50% mol ratio of multipolymer.-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure in, the unsaturated double-bond sum accounts for 80% mol ratio of polymkeric substance.The performed polymer of photopolymerization is a kind of polyurethane acroleic acid performed polymer.Photopolymerizable monomer is a polyfunctional monomer.Photoepolymerizationinitiater initiater is selected from the triaizine compounds that halogen replaces.The chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP also contains any one or more combination conduct interpolation component in phenolics, acryl resin, the urethane resin.
The present invention is suitable for the flat stamping version that the chemical processing-free negative graph photosensitive composition of UV-CTP is made, it comprises: (1) aluminum substrate support, (2) on the aluminum substrate support contain above-mentioned-(X)-(Y)-(Z)-hydrophilic layer and (3) and the chemical processing-free negative graph photosensitive composition coating layer of hydrophilic layer of the unsaturated water-soluble polymers of structure at the above-mentioned UV-CTP of being suitable for aluminum substrate the same side and on hydrophilic layer.
Flat stamping version of the present invention, the support of this flat stamping version are through electrolyzing and coarsening and anodic oxidation and carry out the aluminum substrate that sealing of hole is handled that its center line average boldness is at 0.6um.The coating dry weight of hydrophilicity-imparting treatment is 50mg/dm
2
The method for making of flat stamping version of the present invention is being coated with the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP through electrolyzing and coarsening and anodic oxidation and on the aluminum substrate after carrying out the sealing of hole processing.
The method for making of flat stamping version among the present invention, through before electrolyzing and coarsening and anodic oxidation and carrying out the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP of coating on the aluminum substrate after sealing of hole is handled, aluminum substrate is carried out hydrophilicity-imparting treatment with the unsaturated water-soluble polymers of the present invention-(X)-(Y)-(Z)-structure.This flat stamping version is suitable for using the plate-making of UV-CTP platemaking machine.This flat stamping version can not used developing liquid developing and uses the tap water flushing after using UV-CTP platemaking machine scan exposure, promptly obtains printable flat stamping version.This flat stamping version directly can be lockd up press printing without any processing after using UV-CTP platemaking machine scan exposure.
Embodiment 6
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP mainly comprises following six kinds of components: (1) a kind of-(X)-(Y)-(Z)-and the unsaturated water-soluble polymers of structure, (2) a kind of performed polymer of photopolymerization and (3) a kind of polyfunctional monomer, (4) one or more Photoepolymerizationinitiater initiater, (5) one or more solvent of one or more dyestuff or pigment and (6); Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of the side chain of two unsaturated double-bonds, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
The present invention is suitable for that X is selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, isoprene sulfonic acid in the chemical processing-free negative graph photosensitive composition of UV-CTP.X accounts for 10%~30% mol ratio of multipolymer.Y is the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds.Perhaps, Y is the acrylic or methacrylic acid copolymerization units that contains the GMA grafting of a unsaturated double-bond replacement.Y accounts for 20%~40% mol ratio of multipolymer.Z is acrylate or the methacrylic acid copolymerization units that contains a unsaturated double-bond substituted radical.Z accounts for 30%~50% mol ratio of multipolymer.-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure in, the unsaturated double-bond sum accounts for the 60-80% mol ratio of polymkeric substance.The performed polymer of photopolymerization is a kind of polyurethane acroleic acid performed polymer.Photopolymerizable monomer is a polyfunctional monomer.Photoepolymerizationinitiater initiater is selected from the triaizine compounds that halogen replaces.The chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP also contains any one or more combination conduct interpolation component in phenolics, acryl resin, the urethane resin.
The present invention is suitable for the flat stamping version that the chemical processing-free negative graph photosensitive composition of UV-CTP is made, it comprises: (1) aluminum substrate support, (2) on the aluminum substrate support contain above-mentioned-(X)-(Y)-(Z)-hydrophilic layer and (3) and the chemical processing-free negative graph photosensitive composition coating layer of hydrophilic layer of the unsaturated water-soluble polymers of structure at the above-mentioned UV-CTP of being suitable for aluminum substrate the same side and on hydrophilic layer.
Flat stamping version of the present invention, the support of this flat stamping version are through electrolyzing and coarsening and anodic oxidation and carry out the aluminum substrate that sealing of hole is handled that its center line average boldness is at 0.4-0.6um.The coating dry weight of hydrophilicity-imparting treatment is 5~50mg/dm
2
The method for making of flat stamping version of the present invention is being coated with the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP through electrolyzing and coarsening and anodic oxidation and on the aluminum substrate after carrying out the sealing of hole processing.
The method for making of flat stamping version among the present invention, through before electrolyzing and coarsening and anodic oxidation and carrying out the above-mentioned chemical processing-free negative graph photosensitive composition that is suitable for UV-CTP of coating on the aluminum substrate after sealing of hole is handled, aluminum substrate is carried out hydrophilicity-imparting treatment with the unsaturated water-soluble polymers of the present invention-(X)-(Y)-(Z)-structure.This flat stamping version is suitable for using the plate-making of UV-CTP platemaking machine.This flat stamping version can not used developing liquid developing and uses the tap water flushing after using UV-CTP platemaking machine scan exposure, promptly obtains printable flat stamping version.This flat stamping version directly can be lockd up press printing without any processing after using UV-CTP platemaking machine scan exposure.Above-mentioned as required each parameter can be got the arbitrary value of its value range.
The embodiment second portion
Flat stamping version light sensitivity height of the present invention, redeeming a vow to a god property of site are good, can be directly after with the ultraviolet light source exposure with the tap water flushing or without the printing that promptly is available on the machine of any washing processing step.Forme picture and text part lipophilicity is good, and blank parts does not go up dirty, and can obtain high pressrun, especially is fit to the plate-making of UV-CTP platemaking machine.Flat stamping version of the present invention does not contain diazo salt, and has single photographic layer structure.Flat stamping version light sensitivity height of the present invention, redeeming a vow to a god property of site are good, can be directly after the ultraviolet light source exposure with the tap water flushing or without the printing that promptly is available on the machine of any washing processing step, and can obtain high pressrun, especially suitable UV-CTP platemaking machine.Purpose of the present invention can realize by following measure:
The chemical processing-free negative graph photosensitive composition that the present invention is suitable for UV-CTP (is called for short photosensitive composition, other with) comprise: (1) a kind of-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure, it is characterized in that, the X representative contains the copolymerization units of sulfonic acid group, the Y representative contains the carboxyl acid copolymer unit of two unsaturated double-bond side chains, the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain, (2) a kind of performed polymer of photopolymerization, (3) a kind of polyfunctional monomer, (4) one or more dyestuff or pigment of one or more Photoepolymerizationinitiater initiater and (5).
Flat stamping version of the present invention is by doing support through electrolyzing and coarsening and the aluminum substrate after anodic oxidation and sealing of hole processing, and being coated with photosensitive composition of the present invention thereon and obtaining. the center line average boldness of this support is at 0.4-0.6um, before coating photosensitive composition of the present invention, the version base is carried out hydrophilicity-imparting treatment with the solution of the water soluble resin of the present invention-(X)-(Y)-(Z)-structure.
In the photosensitive composition of the present invention-(X)-(Y)-(Z)-polymkeric substance of structure is a kind of water-soluble polymers that contains unsaturated double-bond.Wherein, the X representative contains the copolymerization units of sulfonic acid group, and the Y representative contains the carboxyl acid copolymer unit of two unsaturated double-bond side chains, and the Z representative contains the acrylic ester copolymer unit of a unsaturated double-bond side chain.
As the copolymerization units of X representative, can so long as contain the compound of alkene class unsaturated group and sulfonic acid group.Alkene class unsaturated group guarantees and other unit copolymerization that sulfonic acid group guarantees better water solubility.X can be selected from vinyl sulfonic acid, styrene sulfonic acid, 2-hydroxyl-3-allyloxy-1-propyl sulfonic acid, allyloxy benzene sulfonic acid, 2-acrylamido-2-methyl-propyl sulfonic acid, isoprene sulfonic acid etc.X in whole polymkeric substance shared ratio in 10%~30% molar ratio range, preferred 15%~25%.Be lower than 10% o'clock white space and keep on file easily, the ink affinity that is higher than 30% o'clock forme is not good.
As the copolymerization units of Y representative, be the acrylic or methacrylic acid copolymerization units that contains the side chain of two unsaturated double-bonds.The side chain that wherein contains two unsaturated double-bonds is by elder generation's grafting GMA monomer in acrylic or methacrylic acid, and then grafting alkene class unsaturated double-bond reaches on GMA.Can be used for the ethylenically unsaturated monomers of grafting can be selected from acryloyl chloride, methacrylic chloride, allyl isocyanate and isocyanate group ethyl-methyl acrylate etc.Y plays the effect of adjusting water wettability and photo-crosslinking curing rate in whole polymkeric substance, by on Y, introducing two unsaturated groups, can improve the ratio of unsaturated double-bond in the polymkeric substance greatly, among the present invention as required even can make the ratio of unsaturated double-bond in whole polymkeric substance reach 150%, laser curing velocity can be greatly improved like this, enough water wettabilities can be guaranteed again simultaneously.Y shared ratio in whole polymkeric substance is good in 20%~40% molar ratio range, preferred 25%~30%.
As the copolymerization units of Z representative, Z is acrylate or the methacrylic acid copolymerization units that contains a unsaturated double-bond substituted radical.Available acrylate can be selected from propenoic acid beta hydroxyl ethyl ester, methacrylic acid β hydroxyl ethyl ester, methylol methyl acrylate etc.The monomer of available grafting has acryloyl chloride, methacrylic chloride, allyl isocyanate and isocyanate group ethyl-methyl acrylate etc.Z the shared ratio of whole multipolymer 30%~50% molar ratio range in be good, preferred 35%~45%.
-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure in, the unsaturated double-bond sum accounts for 60~80% mol ratios of polymkeric substance, preferred 65~75%.Be lower than at 60% o'clock, can not obtain high curing rate and high cross-linking density; Be higher than at 80% o'clock, unfavorable for the shelf stability of resin.
-(X)-(Y)-(Z)-the unsaturated water-soluble polymers of structure accounts for 40%~80% of whole photographic layer dry weight, preferred 50%-70%.Be lower than at 40% o'clock, the coating of blank parts is difficult for wiping, and disadvantage dirty on the blank position easily takes place; Be higher than at 80% o'clock, the coating ink affinity is not good, easily blind version.
The performed polymer of photopolymerization of the present invention can use various types of prepolymers, as polyesters esters of acrylic acid, epoxy acrylate class, urethane acrylate class, polyether acrylate class, organosilicon preformed polymer class etc., wherein be preferably polyurethane acroleic acid class performed polymer.This prepolymer accounts for 1~50% of the dry weight of filming in light sensitive layer be good, preferred 5%~30%.Consumption is lower than at 1% o'clock, and curing rate is low, and the coating ink affinity is not good; Consumption surpasses at 50% o'clock, and the site reduction is not good, and coating easily is clamminess.
Photopolymerizable monomer of the present invention can be used various types of monomers, as: the simple function group monomer has (methyl) acrylate such as ethyl acrylate, butyl acrylate, allyl acrylate etc.; Polyfunctional monomer, diacrylate, 1 is arranged, 6-hexanediyl ester, pentaerythritol triacrylate and tetraacrylate, 1,3,5 one three one (2 one acrylyl oxy-ethyl) isocyanuric acid esters, hydroxypropyl glycerine base triacrylate, hydroxyethyl trimethylolpropane triacrylate, polyethylene glycol dimethacrylate etc.; The isocyanate group monomer has 2 one isocyanic acid Jia Jibingxisuanyizhis and dimethyl one m one isopropenyl benzyl isocyanate ester etc. preferably use polyfunctional monomer. and polyfunctional monomer accounts for 1~80% of the dry weight of filming in light sensitive layer be good, preferred 10%~50%.
Photoinitiators of the present invention can be the single compound or composition of two or more components of planting.Preferably adopt when exposure and cause crosslinked photoinitiators because of producing free radical.Preferable photoinitiators has activity in exposure when 200 to 500nm (as ultraviolet, visible light and infrared radiation) following time.Best photoinitiators has activity 300 to 450nm the time.The suitable visible light and the photoinitiators of uv induction comprise, ketone such as benzil, benzoin and acyloin class, for example, 2,2 one dimethoxys, one 2 one phenyl acetophenone, 2-benzyl one 2-N, N one dimethylamino one 1-(the 4-beautiful jade is for benzyl)-1 one butanone and benzoin methyl ester (2 one methoxyls, one 2 one phenyl acetophenone) etc.; The diaryl group iodized salt of sensitization and triaryl sulfonium salts etc.; The halogenated methyl 1 that chromophore replaces, 3,5 one triaizine compounds etc.All these photoinitiators use separately or with suitable accelerator (as amine, superoxide, and phosphorus compound) and/or suitable light sensitizer (as, ketone or a one dione compounds such as camphorquinone) use together.Photoinitiators is preferably in has enough amounts to obtain required extent of polymerization in the structure of the present invention.This amount depends on the efficient of photoinitiators and the thickness of photoactive layer.Usually the content of photoinitiators is 0.01 to 20 (weight) of coating dry weight.The preferable content of photoinitiators is 0.5% to 15% of coating dry weight among the present invention, preferred 0.5% to 10%.
Lithographic plate selectable components is colorant and/or dyestuff or fuel system among the present invention.For visible image is arranged, can add colorant of people and/or dyestuff or fuel system after exposure.Compounds suitable for use or system can be exposed to when it under actinic radiation or when its change color or color and luster when product from the photoinitiators that exposes contact.Suitable compound or system include but is not limited to, and as a colourless dyestuff, as the thiazine of acyl group protection, diazine is with oxazine, hydrol (as the hydrol of Michler), indoles alkene and triarylmethane lactone (as Crystal Violet lactone).The content of dyestuff in lithographic plate of the present invention should be enough to obtain the required version exposed portion and the contrast of unexposed portion.The preferable content of dyestuff is 0 to 10% (weight) of coating.
And photosensitive composition of the present invention can contain the combination of the component of various materials and necessity of the present invention.For example, the dyestuff of pigment, organic or inorganic particle, sensitization, plastifier, cementing agent, surfactant, antioxidant, help paint, anti-stabilizing agent, wax, ultraviolet or visible light absorber and brightener to can be used for the present invention and do not influence its performance.
The used version base of the present invention is through electrolyzing and coarsening and anodic oxidation and carries out sealing of hole and handle the back aluminum substrate that its center line average boldness is at 0.4~0.6um.Preferred 0.3~0.5um.Version base like this can make by the method for various electrolyzing and coarsening.Aluminum substrate of the present invention is the high-purity aluminium plate, and its aluminium content is preferably in more than 99%.Suitable aluminum substrate is (being limited to this but lose): iron accounts for 0.1%~0.5%, silicon accounts for 0.03%~0.3%, copper accounts for 0.003%~0.03%, titanium accounts for 0.01%~0.1%.The used electrolytic solution of electrolyzing and coarsening can be the aqueous solution of acid, alkali or salt or the aqueous solution that contains organic solvent.Wherein, it is better to make electrolytic solution with the aqueous solution of hydrochloric acid, nitric acid or their salt.At first aluminium plate is placed in the aqueous solution of 1%~30% NaOH, potassium hydroxide, sodium carbonate, sodium silicate etc., under 20~80 ℃ temperature, carries out 5~250 seconds chemical corrosion.Then in 10~30% nitric acid or sulfuric acid with 20~70 ℃ temperature neutralization, to remove grey matter.Pass through the aluminium plate of cleaning like this, under 10~60 ℃ temperature, with square wave, bench-type ripple or the sine wave etc. of positive and negative interaction variation, with 5~100A/dm
2Current density, electrolytic treatments is 10~300 seconds in the electrolytic solution of nitric acid or hydrochloric acid.Then, the aluminium plate through electrolysis is carried out anodized.Sulfuric acid process is used in anodic oxidation usually.The concentration of the sulfuric acid that uses is 5~30%, and current density is 1~15A/dm
2, oxidizing temperature is at 20~60 ℃, and oxidization time is 5~250 seconds, to form 1~10g/m
2Oxide film. the oxide film of Xing Chenging has higher oxide film micropore usually like this; adsorptive power is stronger; so be easy to adhere to foul. also need to carry out sealing of hole usually and handle. sealing of hole is handled can use various methods, is good with 50%~80% volume that reaches sealing oxide film micropore.
Photosensitive composition of the present invention usually with the coating of this field known technology (as, cutter is coated with, blade coating, bar is coated with, roller coat, extrusion etc.) on the version base.Photosensitive composition of the present invention is dissolved in appropriate solvent or/and in the water, be made into coating fluid.Suitable solvent has: ethylene glycol ethyl ether, ethylene glycol monomethyl ether, diethylene glycol methyl ether, methyl lactate, ethyl lactate, MEK, 1-methoxyl-2-propyl alcohol etc.The coating dry weight is 0.2~10g/m
2The best coating weight of photosensitive composition coating is 0.5g/m
2~3g/m
2
Before coating photosensitive composition of the present invention, preferably on the version base of handling through sealing of hole, be coated with earlier the unsaturated water-soluble polymers of the present invention-(X)-(Y)-(Z)-structure.Coating process can use various methods, as cutter be coated with, blade coating, bar are coated with, roller coat, extrusion, bar seam extrusion coated etc.Before the coating-(X)-(Y)-(Z)-polymkeric substance of structure is soluble in water to be made into suitable concentration, perhaps add various coating additives and be adjusted to suitable painting parameter.The coating dry weight of hydrophilicity-imparting treatment is preferably in 0.01~100mg/dm
2Scope in, preferred 5~50mg/dm
2Be less than 0.01mg/dm
2, fall flat; Surpass 50mg/dm
2The time, the coating and the bonding force of version base are descended, easily cause disadvantages such as version.
Below by example explanation the present invention, but be not limited to these strength.
Synthesis example 1
The DMF that adds 210 milliliters in 500 milliliters there-necked flask makes solvent, adds acrylic acid 14.4 grams, methacrylic acid β hydroxyl ethyl ester 32.6 grams and 2-acrylamido-2-methyl propane sulfonic acid 10.35 grams then respectively.Such solution is feeding N
2Under the condition, warming while stirring adds the AIBN0.3 gram when temperature rises to 80 ℃, remain under this temperature and reacted 4.5 hours.Afterwards, in such solution, add the GMA10.66 gram, methoxyl phenol 0.1 gram and tetramethyl ammonium chloride 8.22 are restrained, continue to remain under 80 ℃, reacted 4.5 hours.Subsequently above-mentioned solution is cooled to 30 ℃, adds acryloyl chloride 29.41 gram again,, remained under 30 ℃ the temperature reaction 1.5 hours methoxyl phenol 0.3 gram, triethylamine 32.89 grams.At last above-mentioned solution is disperseed in methyl lactate, drying obtains about 90 water-soluble polymerss of the present invention 1 that restrain.
Synthesis example 2
The DMF that adds 210 milliliters in 500 milliliters there-necked flask makes solvent, adds acrylic acid 7.2 grams, methacrylic acid β hydroxyl ethyl ester 32.6 grams and 2-acrylamido-2-methyl propane sulfonic acid 31.05 grams then respectively.Such solution is feeding N
2Under the condition, warming while stirring adds the AIBN0.3 gram when temperature rises to 80 ℃, remain under this temperature and reacted 4.5 hours.Afterwards, in such solution, add the GMA3.55 gram, methoxyl phenol 0.04 gram and tetramethyl ammonium chloride 2..74 are restrained, continue to remain under 80 ℃, reacted 4.5 hours.Subsequently above-mentioned solution is cooled to 30 ℃, adds acryloyl chloride 24.89 gram again,, remained under 30 ℃ the temperature reaction 1.5 hours methoxyl phenol 0.25 gram, triethylamine 27.83 grams.At last above-mentioned solution is disperseed in methyl lactate, drying obtains about 92 water-soluble polymerss of the present invention 2 that restrain.
Synthesis example 3
The DMF that adds 210 milliliters in 500 milliliters there-necked flask makes solvent, adds acrylic acid 14.4 grams, propenoic acid beta hydroxyl ethyl ester 17.41 grams and 2-acrylamido-2-methyl propane sulfonic acid 31.05 grams then respectively.Such solution is feeding N
2Under the condition, warming while stirring adds the AIBN0.3 gram when temperature rises to 80 ℃, remain under this temperature and reacted 4.5 hours.Afterwards, in such solution, add the GMA17.77 gram, methoxyl phenol 0.18 gram and tetramethyl ammonium chloride 13.70 are restrained, continue to remain under 80 ℃, reacted 4.5 hours.Subsequently above-mentioned solution is cooled to 30 ℃, adds acryloyl chloride 24.89 gram again,, remained under 30 ℃ the temperature reaction 1.5 hours methoxyl phenol 0.25 gram, triethylamine 27.83 grams.At last above-mentioned solution is disperseed in methyl lactate, drying obtains about 88 grams water-soluble polymers 3 of the present invention.
Synthesis example 4
The DMF that adds 210 milliliters in 500 milliliters there-necked flask makes solvent, adds acrylic acid 10.8 grams, propenoic acid beta hydroxyl ethyl ester 26.11 grams and 2-acrylamido-2-methyl propane sulfonic acid 25.88 grams then respectively. and such solution is feeding N
2Under the condition, warming while stirring adds the AIBN0.3 gram when temperature rises to 80 ℃, remain under this temperature and reacted 4.5 hours.Afterwards, in such solution, add the GMA8.89 gram, methoxyl phenol 0.1 gram and tetramethyl ammonium chloride 6.85 are restrained, continue to remain under 80 ℃, reacted 4.5 hours.Subsequently above-mentioned solution is cooled to 30 ℃, adds acryloyl chloride 26.06 gram again,, remained under 30 ℃ the temperature reaction 1.5 hours methoxyl phenol 0.26 gram, triethylamine 29.15 grams.At last above-mentioned solution is disperseed in methyl lactate, drying obtains about 90 water-soluble polymerss of the present invention 4 that restrain.
Synthesis example 5
The DMF that adds 210 milliliters in 500 milliliters there-necked flask makes solvent, adds acrylic acid 14.4 grams, propenoic acid beta hydroxyl ethyl ester 23.21 grams and 2-acrylamido-2-methyl propane sulfonic acid 20.7 grams then respectively.Such solution is feeding N
2Under the condition, warming while stirring adds the AIBN0.3 gram when temperature rises to 80 ℃, remain under this temperature and reacted 4.5 hours.Afterwards, in such solution, add the GMA14.22 gram, methoxyl phenol 0.15 gram and 4-ammonio methacrylate 11 are restrained, continue to remain under 80 ℃, reacted 4.5 hours.Subsequently above-mentioned solution is cooled to 30 ℃, adds acryloyl chloride 27.15 gram again,, remained under 30 ℃ the temperature reaction 1.5 hours methoxyl phenol 0.3 gram, triethylamine 30.36 grams.At last above-mentioned solution is disperseed in methyl lactate, drying obtains about 86 grams water-soluble polymers 5 of the present invention.
Embodiment 1
The preparation of version base: the A1050 calendering aluminium plate of purity 99.5%, thick 0.3mm, 70 ℃ of following etches are 20 seconds in 5% sodium hydrate aqueous solution, after the flowing water flushing, neutralize with 1% aqueous solution of nitric acid immediately.In 1% aqueous hydrochloric acid solution, use sine wave alternating current with 50A/dm down for 40 ℃ then
2Current density electrolyzing and coarsening 16 seconds.Then under 40 ℃, with in 5% the sodium hydrate aqueous solution with 10 seconds.Washing.Under 30 ℃, the aqueous sulfuric acid with 20% is with 15A/dm at last
2Current density, anodic oxidation 20 seconds.Washing.80 ℃ are carried out sealing of hole with 5% sodium silicate aqueous solution down and handled 18 seconds.Washing.Dry.The version base that obtains like this, the center line average boldness is 0.5um, the heavy 3.0g/dm of oxide film
2
Hydrophilicity-imparting treatment: on the version base that obtains in the above, the aqueous solution of the water soluble resin of the present invention of coating 0.1%, 100 ℃ were descended dry 20 seconds, and obtained 20mg/m
2The coating dry weight.
Above-mentioned through the version base of hydrophilicity-imparting treatment on sensitization liquid below the extrusion coated, then 120 ℃ dry 30 seconds down.Obtain 1.5g/m
2The coating dry weight.
Sensitization liquid 1 (each component by weight)
Water-soluble polymers 1 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can directly lock up on the printing machine and print without the tap water flushing.Its performance is listed in the table one of back.
Embodiment 2
With top identical method preparation version base, hydrophilic layer and painting photosensitive liquid.The following component of sensitization liquid:
Sensitization liquid 2 (each component by weight)
Water-soluble polymers 2 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 80 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 3
With top identical method preparation version base, hydrophilic layer and painting photosensitive liquid.The following component of sensitization liquid:
Sensitization liquid 3 (each component by weight)
Water-soluble polymers 3 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 4
With top identical method preparation version base, hydrophilic layer and painting photosensitive liquid.The following component of sensitization liquid:
Sensitization liquid 4 (each component by weight)
Water-soluble polymers 4 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 70 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 5
With top identical method preparation version base, hydrophilic layer and painting photosensitive liquid.The following component of sensitization liquid:
Sensitization liquid 5 (each component by weight)
Water-soluble polymers 5 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 6
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Just adjust electrolysis electricity make the version a basic center line average boldness be 0.4um.
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 7
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Just adjust electrolysis electricity make the version a basic center line average boldness be 0.6um.
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 8
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.The dry weight of just adjusting hydrophilic layer is 5mg/dm
2
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Embodiment 9
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.The dry weight of just adjusting hydrophilic layer is 50mg/dm
2
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 1
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Be the following component of sensitization liquid:
Sensitization liquid 6 (each component by weight)
Water-soluble polymers 1 1.6 of the present invention
Acrylic polymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 120 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 2
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Be the following component of sensitization liquid:
Sensitization liquid 7 (each component by weight)
Water-soluble polymers 1 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Ethyl acrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 110 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 3
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Be the following component of sensitization liquid:
Sensitization liquid 8 (each component by weight)
Water-soluble polymers 1 1.6 of the present invention
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
1-hydroxy-ketone (DAROCUR4265) 0.03
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 150 on the platemaking machine of UC-SETTER741 type UV-CTP exposes. then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 4
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Just adjusting electrolysis electricity, to make the center line average boldness of version base be 0.3um.
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 5
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Just adjusting electrolysis electricity, to make the center line average boldness of version base be 0.7um.
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 6
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.Be the following component of sensitization liquid:
Sensitization liquid 1 (each component by weight)
PVP(K60) 1.6
Polyurethane acroleic acid prepolymer 0.64
Pentaerythritol triacrylate 0.86
2-(4-methoxy-naphthyl)-4, two (three chloro the methyl)-1,3,5-triazines 0.03 of 6-
P methoxy phenol 0.03
BYK-306 0.012
Phthalocyanine blue dyestuff 0.032
1-methoxyl-2-propyl alcohol 32.80
The plate that obtains like this light value with 200 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 7
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.The dry weight of just adjusting hydrophilic layer is 3mg/dm
2
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature.Also can wash, directly lock up on the printing machine and print without tap water.Its performance is listed in the table one of back.
Comparative example 8
With method preparation version base, hydrophilic layer and the painting photosensitive liquid identical with example 1.The dry weight of just adjusting hydrophilic layer is 70mg/dm
2
The plate that obtains like this light value with 60 on the platemaking machine of UC-SETTER741 type UV-CTP exposes.Then, in MASTER VIEW developing machine,,, lock up printing then with pure tap water flushing 30 seconds~50 seconds with 40 ℃ temperature. also can wash, directly lock up on the printing machine and print without tap water. its performance is listed in the table one of back.
Table one