CN101084472B - 单块的偏振受控角漫射器及有关方法 - Google Patents
单块的偏振受控角漫射器及有关方法 Download PDFInfo
- Publication number
- CN101084472B CN101084472B CN2005800347317A CN200580034731A CN101084472B CN 101084472 B CN101084472 B CN 101084472B CN 2005800347317 A CN2005800347317 A CN 2005800347317A CN 200580034731 A CN200580034731 A CN 200580034731A CN 101084472 B CN101084472 B CN 101084472B
- Authority
- CN
- China
- Prior art keywords
- polarization
- controlled angle
- pattern
- angle diffuser
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0263—Diffusing elements; Afocal elements characterised by the diffusing properties with positional variation of the diffusing properties, e.g. gradient or patterned diffuser
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (16)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71450604P | 2004-08-31 | 2004-08-31 | |
US60/714,506 | 2004-08-31 | ||
PCT/US2005/030780 WO2006026593A2 (en) | 2004-08-31 | 2005-08-30 | Monolithic polarization controlled angle diffusers and associated methods |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010101433420A Division CN101793989B (zh) | 2004-08-31 | 2005-08-30 | 单块的偏振受控角漫射器及有关方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101084472A CN101084472A (zh) | 2007-12-05 |
CN101084472B true CN101084472B (zh) | 2010-06-09 |
Family
ID=35966983
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010101433420A Expired - Fee Related CN101793989B (zh) | 2004-08-31 | 2005-08-30 | 单块的偏振受控角漫射器及有关方法 |
CN2005800347317A Expired - Fee Related CN101084472B (zh) | 2004-08-31 | 2005-08-30 | 单块的偏振受控角漫射器及有关方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010101433420A Expired - Fee Related CN101793989B (zh) | 2004-08-31 | 2005-08-30 | 单块的偏振受控角漫射器及有关方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7916390B2 (zh) |
EP (1) | EP1789852A2 (zh) |
JP (1) | JP5314282B2 (zh) |
KR (1) | KR101265165B1 (zh) |
CN (2) | CN101793989B (zh) |
WO (1) | WO2006026593A2 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009535670A (ja) * | 2006-05-02 | 2009-10-01 | ホログラム インダストリーズ | 光学セキュリティ・マーキング部品、該部品を製造するための方法、該部品を備えるシステム、および該部品をチェックするための読み取り機 |
EP2145224B1 (en) * | 2007-02-07 | 2020-09-16 | BAER, Stephen C. | Forming ligth beams and patterns with zero intensity central points |
US8553331B2 (en) * | 2009-12-16 | 2013-10-08 | Flir Systems, Inc. | Selective diffractive optical element and a system including the same |
JP5557188B2 (ja) * | 2010-02-25 | 2014-07-23 | 株式会社ブイ・テクノロジー | レーザ照射装置 |
WO2013025842A1 (en) * | 2011-08-15 | 2013-02-21 | The Trustees Of Columbia University In The City Of New York | Systems and methods for performing machine vision using diffuse structured light |
CN103676498B (zh) * | 2013-11-18 | 2017-04-05 | 中国科学院上海光学精密机械研究所 | 光刻机光瞳整形单元结构及其衍射光学元件设计方法 |
US11231544B2 (en) | 2015-11-06 | 2022-01-25 | Magic Leap, Inc. | Metasurfaces for redirecting light and methods for fabricating |
KR102603675B1 (ko) | 2016-05-06 | 2023-11-16 | 매직 립, 인코포레이티드 | 광을 재지향시키기 위한 비대칭 격자들을 가진 메타표면들 및 제조를 위한 방법들 |
CN114200562A (zh) * | 2017-01-27 | 2022-03-18 | 奇跃公司 | 由具有不同取向的纳米梁的超表面形成的衍射光栅 |
IL268115B2 (en) | 2017-01-27 | 2024-01-01 | Magic Leap Inc | Anti-reflective coatings for cell surfaces |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5453814A (en) * | 1994-04-13 | 1995-09-26 | Nikon Precision Inc. | Illumination source and method for microlithography |
US5559583A (en) * | 1994-02-24 | 1996-09-24 | Nec Corporation | Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer |
US5850300A (en) * | 1994-02-28 | 1998-12-15 | Digital Optics Corporation | Diffractive beam homogenizer having free-form fringes |
CN1461974A (zh) * | 2002-05-31 | 2003-12-17 | Asml荷兰有限公司 | 组装光学元件套件和方法,光学元件,平版印刷机和器件制造法 |
US6671035B2 (en) * | 1999-09-29 | 2003-12-30 | Asml Netherlands B.V. | Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7656504B1 (en) * | 1990-08-21 | 2010-02-02 | Nikon Corporation | Projection exposure apparatus with luminous flux distribution |
US6285443B1 (en) * | 1993-12-13 | 2001-09-04 | Carl-Zeiss-Stiftung | Illuminating arrangement for a projection microlithographic apparatus |
US5726805A (en) * | 1996-06-25 | 1998-03-10 | Sandia Corporation | Optical filter including a sub-wavelength periodic structure and method of making |
US5914811A (en) * | 1996-08-30 | 1999-06-22 | University Of Houston | Birefringent grating polarizing beam splitter |
US6259561B1 (en) * | 1999-03-26 | 2001-07-10 | The University Of Rochester | Optical system for diffusing light |
IL138895A (en) * | 2000-10-05 | 2005-08-31 | Elop Electrooptics Ind Ltd | Optical switching devices |
JP2003255113A (ja) * | 2002-02-28 | 2003-09-10 | Canon Inc | 光分離素子およびそれを用いた光学機器 |
EP1367446A1 (en) * | 2002-05-31 | 2003-12-03 | ASML Netherlands B.V. | Lithographic apparatus |
JP2004078091A (ja) * | 2002-08-22 | 2004-03-11 | Ricoh Co Ltd | 光学素子の作製方法・光学素子・光ピックアップ・光ディスク装置 |
US7113336B2 (en) * | 2002-12-30 | 2006-09-26 | Ian Crosby | Microlens including wire-grid polarizer and methods of manufacture |
US7630133B2 (en) * | 2004-12-06 | 2009-12-08 | Moxtek, Inc. | Inorganic, dielectric, grid polarizer and non-zero order diffraction grating |
DE102007007907A1 (de) * | 2007-02-14 | 2008-08-21 | Carl Zeiss Smt Ag | Verfahren zur Herstellung eines diffraktiven optischen Elements, nach einem derartigen Verfahren hergestelltes diffraktives optisches Element, Beleuchtungsoptik mit einem derartigen diffratkiven optischen Element, Mikrolithografie-Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik, Verfahren zum Herstellen eines mikroelektronischen Bauelements unter Verwendung einer derartigen Projektionsbelichtungsanlage sowie mit einem solchen Verfahren hergestelltes Bauelement |
-
2005
- 2005-08-30 CN CN2010101433420A patent/CN101793989B/zh not_active Expired - Fee Related
- 2005-08-30 KR KR1020077006477A patent/KR101265165B1/ko not_active IP Right Cessation
- 2005-08-30 WO PCT/US2005/030780 patent/WO2006026593A2/en active Application Filing
- 2005-08-30 JP JP2007530252A patent/JP5314282B2/ja not_active Expired - Fee Related
- 2005-08-30 CN CN2005800347317A patent/CN101084472B/zh not_active Expired - Fee Related
- 2005-08-30 EP EP05795468A patent/EP1789852A2/en not_active Withdrawn
-
2007
- 2007-02-28 US US11/711,854 patent/US7916390B2/en not_active Expired - Fee Related
-
2011
- 2011-03-28 US US13/073,845 patent/US20110170188A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5559583A (en) * | 1994-02-24 | 1996-09-24 | Nec Corporation | Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer |
US5850300A (en) * | 1994-02-28 | 1998-12-15 | Digital Optics Corporation | Diffractive beam homogenizer having free-form fringes |
US5453814A (en) * | 1994-04-13 | 1995-09-26 | Nikon Precision Inc. | Illumination source and method for microlithography |
US6671035B2 (en) * | 1999-09-29 | 2003-12-30 | Asml Netherlands B.V. | Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus |
CN1461974A (zh) * | 2002-05-31 | 2003-12-17 | Asml荷兰有限公司 | 组装光学元件套件和方法,光学元件,平版印刷机和器件制造法 |
Non-Patent Citations (1)
Title |
---|
JP特开平6-289509A 1994.10.18 |
Also Published As
Publication number | Publication date |
---|---|
US20110170188A1 (en) | 2011-07-14 |
JP5314282B2 (ja) | 2013-10-16 |
CN101084472A (zh) | 2007-12-05 |
US20070211337A1 (en) | 2007-09-13 |
US7916390B2 (en) | 2011-03-29 |
CN101793989A (zh) | 2010-08-04 |
KR101265165B1 (ko) | 2013-05-23 |
WO2006026593A2 (en) | 2006-03-09 |
WO2006026593A3 (en) | 2006-07-13 |
JP2009506347A (ja) | 2009-02-12 |
CN101793989B (zh) | 2013-10-16 |
KR20070057185A (ko) | 2007-06-04 |
EP1789852A2 (en) | 2007-05-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: DIGITAL OPTICAL EAST COMPANY Free format text: FORMER NAME: TESSERA NORTH AMERICA INC. |
|
CP03 | Change of name, title or address |
Address after: North Carolina Patentee after: Digitaloptics Corp. East Address before: North Carolina Patentee before: Tessera North America Inc. |
|
ASS | Succession or assignment of patent right |
Owner name: DIGITAL OPTICS CORP. Free format text: FORMER OWNER: DIGITAL OPTICAL EAST COMPANY Effective date: 20140624 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140624 Address after: American California Patentee after: Digital Optics Corp. Address before: North Carolina Patentee before: Digitaloptics Corp. East |
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ASS | Succession or assignment of patent right |
Owner name: NANCHANG O-FILM TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: DIGITAL OPTICS CORP. Effective date: 20150126 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; TO: 330013 NANCHANG, JIANGXI PROVINCE |
|
TR01 | Transfer of patent right |
Effective date of registration: 20150126 Address after: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Patentee after: NANCHANG OFILM OPTICAL-ELECTRONIC TECH Co.,Ltd. Address before: American California Patentee before: Digital Optics Corp. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100609 Termination date: 20190830 |
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CF01 | Termination of patent right due to non-payment of annual fee |