CN101071764A - Probing apparatus and probing method - Google Patents
Probing apparatus and probing method Download PDFInfo
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- CN101071764A CN101071764A CN 200710107426 CN200710107426A CN101071764A CN 101071764 A CN101071764 A CN 101071764A CN 200710107426 CN200710107426 CN 200710107426 CN 200710107426 A CN200710107426 A CN 200710107426A CN 101071764 A CN101071764 A CN 101071764A
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Abstract
There is provided a processing apparatus capable of modifying an existing processing apparatus having a single loading port to one having dual loading ports by providing an additional loading port without increasing a foot print thereof and also capable of realizing a complete automation of a wafer transfer by utilizing an existing automatic transfer line. The processing apparatus includes a loader chamber having: a first and a second loading ports positioned to be spaced apart from each other at the side of a prober chamber, each of the loading ports mounting thereon waters; a sub-chuck, disposed under the second loading port, for positioning the wafers; and a wafer transfer unit having a transfer arm for transferring the wafers between the sub-chuck and the prober chamber, the transfer arm being rotatable and movable vertically.
Description
Technical field
The present invention relates to a kind of processing unit that in semiconductor fabrication process, uses with load chamber, in more detail, relate to a kind of function that does not increase the floor space (footprint) of existing processing unit and expand load chamber, thereby can improve the processing unit that to tackle automation of the treatment effeciency of handled object.
Background technology
In semiconductor fabrication factory, the both sides of the carrying line of various processing unit in clean room (clean room) respectively are arranged with a plurality of.With the box is that unit drops into handled object (for example wafer) in the load chamber of each processing unit, is that unit drops into wafer with the monolithic by processing unit, supplies with the wafer that is dropped in the load chamber in process chamber, and herein wafer is implemented predetermined process.
At processing unit for example is under the situation of testing fixture, shown in Figure 15 (a), testing fixture comprises load chamber 1 and the probe chamber 2 that adjoins each other, from load chamber 1 to probe chamber 2 conveyance wafers, in probe chamber 2, carry out making wafer turn back to load chamber 1 after the electrical characteristics inspection of wafer.This load chamber 1 for example comprises load port (load port) 3, wafer transfer mechanism 4 and prealignment mechanism (secondary chuck) 5, and in addition, probe chamber 2 comprises wafer chuck 6, aligning guide (not shown) and probe (not shown).Take in the wafer case (cassette) of multi-disc wafer to load port 3 mountings of load chamber 1.In load chamber 1, wafer transfer mechanism 4 drives, conveyance wafer one by one from wafer case, way therein, in secondary chuck (sub chuck) 5, carry out the prealignment of wafer after, with the wafer chuck 6 of its conveyance to probe chamber 2.In probe chamber 2, wafer chuck 6 moves to horizontal direction and above-below direction, utilizes probe to carry out on wafer chuck 6 after the electrical characteristics inspection of wafer, makes wafer turn back to origin-location in the wafer case along opposite path.In addition, under the situation that with the monolithic is unit testing fixture that wafer is checked, drop into wafer to load chamber one by one, with the inspection of stipulating.
So, as testing fixture, shown in Figure 15 (a), load chamber 1 is configured in any side, the left and right sides (in this figure (a) for side, right side) of probe chamber 2, in the front side of load chamber 1, be that so-called single testing fixture that loads type (single loader type) that the face side of testing fixture disposes a load port 3 is extensively popularized.
In addition, as the testing fixture of other type, known for example have as put down in writing in the patent documentation 1 about have two load ports load chamber be set at so-called two testing fixtures that load types (dual loader type) in device front.
[patent documentation 1] Japanese kokai publication sho 63-081830
Recently, inspection speed etc. are high speed, and therefore, single testing fixture that loads type in the past can't be tackled the high speed of inspection speed etc.Therefore, under the situation of the testing fixture that is provided with single loading type, mostly urgent hope can be handled the testing fixtures of two loading types of the wafer in two wafer case continuously.Therefore, consider from single two changes of loading type of loading type in the past to patent documentation 1.
But, two testing fixtures that load type of patent documentation 1, in order to ensure the space of the ink roller (inker) that mark (marking) mechanism is set, the load chamber that loads the right side that is arranged on testing fixture in the type or left side in the past single is configured in the front of probe chamber.In such structure, the operator is positioned at the device front, therefore, carrying line can not be arranged on the device front face side in the automation conveyance of wafer, and have to be arranged on the left and right sides, is difficult to control the conveyance of carrying line.Therefore, existing single type of loading is changed over two types of loading, have various restrictions.For example, in the testing fixture shown in Figure 15 (a), even under the situation that enlarges load port 3, also need secondary chuck 5, therefore, shown in this figure (b), horizontally set load port 3A is so floor space enlarges.
But the relation from existing testing fixture and other testing fixture etc. does not spatially have affluence, can't continue to enlarge floor space.In addition, to load type be that prerequisite is constructed to the carrying line of the automation conveyance of reply wafer with single, therefore, changing over twoly when loading type, do not allow to enlarge floor space, can't tackle the automatic conveyance of wafer.These problems are not limited to testing fixture, exist too for other processing unit.
Summary of the invention
The present invention makes in order to solve above-mentioned problem, its purpose is to provide a kind of processing unit, this processing unit can not increase existing single floor space (footprint) of loading the processing unit of type (single loader type), change over two processing unit that load type (dual loader type) by setting up load port (load port), and, can utilize existing automatic carrying line to realize the full automation of wafer transfer.
The processing unit of a first aspect of the present invention comprises the load chamber that is configured in the process chamber side, it is characterized in that, above-mentioned load chamber comprises: mounting is taken in the framework of a plurality of above-mentioned handled objects and is separated from each other along above-mentioned side and two load ports disposing; Be configured between these load ports and the carrying device of the above-mentioned handled object of conveyance between these load ports and above-mentioned probe chamber; With the below that is arranged at least one load port in above-mentioned two load ports and carry out the detent mechanism of the location of above-mentioned handled object.
The processing unit of a second aspect of the present invention, comprise the load chamber that is configured in the process chamber side, it is characterized in that above-mentioned load chamber comprises: mounting take in a plurality of above-mentioned handled objects framework and with above-mentioned side in abutting connection with, separate and two load ports disposing at above-below direction mutually; And above-mentioned side in abutting connection with configuration and between these load ports and above-mentioned probe chamber the carrying device of the above-mentioned handled object of conveyance; And with above-mentioned side in abutting connection with the detent mechanism that is provided with and carries out the location of above-mentioned handled object.
In addition, the processing unit of a third aspect of the present invention is characterized in that, in first aspect or the described invention of second aspect, above-mentioned each load port is respectively along the conveyance path configurations of the auto-conveying apparatus of above-mentioned framework, and above-mentioned auto-conveying apparatus between carry out the handing-over of above-mentioned framework.
In addition, the processing unit of a fourth aspect of the present invention is characterized in that, in the described invention of either side, above-mentioned load port has in first aspect~third aspect: change the direction switching mechanism of the direction of above-mentioned framework; With the switching mechanism that the lid by this direction switching mechanism above-mentioned framework relative with above-mentioned carrying device is carried out switch.
In addition, the processing unit of a fifth aspect of the present invention, it is characterized in that, in the described invention of fourth aspect, above-mentioned direction switching mechanism has the mounting portion of the above-mentioned framework of mounting and makes the rotary body of this mounting portion rotation, the center of the above-mentioned handled object in the above-mentioned framework is configured in the position of only departing from given size with the center of above-mentioned rotary body, utilizes above-mentioned rotary body, and above-mentioned mounting portion carries out off-centre and rotates.
In addition, the processing unit of a sixth aspect of the present invention, it is characterized in that, aspect the 5th in the described invention, only rotate predetermined angular by above-mentioned rotary body, the lid of above-mentioned framework is relative with above-mentioned switching mechanism, and, above-mentioned framework only to the position of the switch of above-mentioned switching mechanism near the afore mentioned rules size.
In addition, the processing unit of a seventh aspect of the present invention is characterized in that, aspect the 5th or in the described invention in the 6th aspect, the afore mentioned rules angle is 90 °.
In addition, the processing unit of a eighth aspect of the present invention is characterized in that, aspect first aspect~7th in the described invention of either side, near above-mentioned detent mechanism, be provided with the recognition device of the above-mentioned handled object of identification.
In addition, the processing unit of a ninth aspect of the present invention is characterized in that, in first aspect~eight aspect in the described invention of either side, is provided with the transducer of the above-mentioned handled object that detection exposes in above-mentioned load port from above-mentioned framework.
In addition, the processing unit of a tenth aspect of the present invention is characterized in that, aspect the 9th in the described invention, is provided with the above-mentioned handled object that will expose and pushes push part in the above-mentioned framework in above-mentioned load port from above-mentioned framework.
In addition, the processing unit of a eleventh aspect of the present invention is characterized in that, aspect first aspect~tenth in the described invention of either side, above-mentioned carrying device comprises first lift drive mechanism and two kinds of lift drive mechanisms of second lift drive mechanism.
In addition, the processing unit of a twelveth aspect of the present invention is characterized in that, in the described invention of the tenth one side, above-mentioned first lift drive mechanism comprises cylinder, and above-mentioned second lift drive mechanism comprises motor.
In addition, the processing unit of a thirteenth aspect of the present invention, it is characterized in that, in aspect first aspect and the third aspect~12 in the described invention of either side, be provided with below another load port in above-mentioned two load ports at above-below direction and have the host body of maintaining part that multilayer is used to keep the substrate of same size.
In addition, the processing unit of a fourteenth aspect of the present invention is characterized in that, in the described invention, above-mentioned maintaining part has the transducer that detection has or not aforesaid substrate aspect the 13.
In addition, the processing unit of a fifteenth aspect of the present invention is characterized in that, aspect first aspect~14 in the described invention of either side, above-mentioned carrying device constitutes based on multi-joint manipulator.
In addition, the processing unit of a sixteenth aspect of the present invention, comprise the load chamber that is configured in the process chamber side, it is characterized in that above-mentioned load chamber comprises: mounting is taken in the framework of a plurality of above-mentioned handled objects and is separated from each other along above-mentioned side and two load ports disposing; And be configured between these load ports and the carrying device of the above-mentioned handled object of conveyance between these load ports and above-mentioned probe chamber, wherein, along the conveyance path configurations of the auto-conveying apparatus of above-mentioned framework, above-mentioned carrying device has the detent mechanism of the location of carrying out above-mentioned handled object to above-mentioned each load port respectively.
In addition, the processing unit of a seventeenth aspect of the present invention, comprise the load chamber that is configured in the process chamber side, it is characterized in that above-mentioned load chamber comprises: mounting take in a plurality of above-mentioned handled objects body with cover framework and be separated from each other along above-mentioned side and two load ports disposing; And be configured between these load ports and the carrying device of the above-mentioned handled object of conveyance between these load ports and above-mentioned probe chamber, wherein, above-mentioned each load port has the direction switching mechanism and the switching mechanism that the lid by this direction switching mechanism above-mentioned framework relative with above-mentioned carrying device is carried out switch of the direction of the above-mentioned framework of conversion respectively, and above-mentioned carrying device has the detent mechanism of the location of carrying out above-mentioned handled object.
In addition, the processing unit of a eighteenth aspect of the present invention, it is characterized in that, aspect first aspect~17 in the described invention of either side, be positioned in framework double as transmitter (sender) and receiver (receiver) respectively in above-mentioned each load port.
In addition, the processing unit of a nineteenth aspect of the present invention is characterized in that, aspect first aspect~17 in the described invention of either side, the framework that is positioned in above-mentioned each load port can be switched transmitter and receiver respectively.
According to the present invention, a kind of processing unit can be provided, this processing unit can not increase existing single floor space of loading the processing unit of type, change over two processing unit that load type by setting up load port, and, can utilize existing automatic carrying line to realize the full automation of wafer transfer.
Description of drawings
Fig. 1 is the stereogram of expression as the testing fixture of an execution mode of processing unit of the present invention.
Fig. 2 is the plane graph of the layout in the clean room of expression testing fixture shown in Figure 1.
Fig. 3 is the stereogram of the loadlock interior of expression testing fixture shown in Figure 1.
Fig. 4 is the plane graph of expression load chamber shown in Figure 3.
Fig. 5 is the side view of expression load chamber shown in Figure 3.
Fig. 6 is the side view that directly advances driving mechanism of expression wafer transfer device shown in Figure 3.
Fig. 7 is the stereogram of expression wafer transfer device shown in Figure 5.
Fig. 8 is the stereogram of the lift drive mechanism of expression wafer transfer device shown in Figure 7.
Fig. 9 is the side view of major part of the variation of expression testing fixture shown in Figure 1.
Figure 10 is the stereogram of major part of load chamber of another execution mode of expression processing unit of the present invention.
Figure 11 is the plane graph of employed wafer transfer device in another execution mode of expression processing unit of the present invention.
Figure 12 (a) and (b) are respectively the figure of employed buffer table (buffer table) and wafer station in the expression load chamber shown in Figure 10, (a) are its front elevation, (b) are that the major part of buffer table is amplified the sectional view of representing.
Figure 13 is the plane graph of major part of another execution mode of expression processing unit of the present invention.
Figure 14 is the plane graph of major part of another execution mode of expression processing unit of the present invention.
Figure 15 (a) is a plane graph of representing the structure of testing fixture in the past, (b) is the plane graph append load port in testing fixture in the past after.
Symbol description
10 testing fixtures (processing unit)
11 load chambers
Probe chambers (process chamber) 12
13A, 13B, 13C load port
14,14A, 14B wafer transfer device (carrying device)
15 buffer tables (buffer table) (packaging container)
18 secondary chucks (sub chuck) (detent mechanism)
19OCR (recognition device)
21 derailing switches (opener) (switching mechanism)
133 push part
132 turntables (rotary body)
The 132A rotating driveshaft
Embodiment
Below, according to Fig. 1~execution mode shown in Figure 12 the present invention is described.In the present embodiment, as processing unit, be that example describes with the testing fixture.This testing fixture is a device of checking the electrical characteristics of handled object.
First execution mode
The testing fixture 10 of present embodiment, for example as shown in Figure 1, the probe chamber 12 that comprises the load chamber 11 of conveyance handled object (for example wafer) and carry out the electrical characteristics inspection of wafer, load chamber 11 is configured in the side of probe chamber 12.Load chamber 11 comprise mounting take in the wafer case of multi-disc wafer (cassette) (not shown) former and later two first, second load port 13A, 13B and be configured in wafer transfer device (with reference to Fig. 3) 14 between first, second load port 13A, the 13B, under the control of control device (not shown) and drive.This testing fixture 10, for example as shown in Figure 2, the both sides of the carrying line L in being formed at the clean room respectively are arranged with a plurality of respectively.In the present embodiment, the load chamber in the past that has a load port is forwardly changed over first, second load port 13A before and after having, the load chamber 11 of 13B, floor space is identical with existing testing fixture in fact, also do not enlarge floor space as use the carrying line L corresponding in the past with testing fixture 10, can expand the function of load chamber 11, thereby realize full automation from the box conveyance of wafer to the inspection of wafer.
In addition, as shown in Figure 2, auto-conveying apparatus V can move to arrow A, B on carrying line L, side at the testing fixture of stipulating 10, use wafer case arm (cassette arm) H, as shown by arrow C, with load port 13 transfers of wafer case (not shown) to testing fixture 10.Certainly, the operator also can be directly with wafer case to first, second load port 13A, 13B transfer.In addition, in Fig. 1, the face of the oblique below of testing fixture 10 is positive.Therefore, in the present embodiment, load chamber 11 is configured in the right side side of probe chamber 12.
Before and after first, second load port 13A, 13B have mutually identical structure, as Fig. 3~shown in Figure 5, clip wafer transfer device 14 configuration relatively mutually.These load ports 13A, 13B are the center with wafer transfer device 14, the left and right symmetrically configuration.Therefore, the first load port 13A to the place ahead (left among each figure) below describes.The first load port 13A, for example as Fig. 3~shown in Figure 5, comprise base station 131, be arranged on the base station 131 and the turntable of mounting wafer case (turntable) 132, make turntable 132 rotation and be set at the rotary drive mechanism (not shown) in the base station 131 and the wafer that will expose pushes push part 133 in the wafer case from postrotational wafer case, turntable 132 can be by rotary drive mechanism half-twist on both forward and reverse directions, so that moving into of wafer case taken out of mouth towards probe chamber 12 sides and wafer transfer device 14 sides.
In the probe chamber of base station 131 12 sides, optical pickocff (not shown) is isolated with turntable 132 and is provided with, and utilizes this optical pickocff to detect the wafer that exposes from wafer case.Whether optical pickocff detects wafer and is positioned at and can utilizes push part 133 that it is pushed the scope of wafer case, is exposing to the situation that can't utilize push part 133 that it is pushed back, gives the alarm by signal lamp P (with reference to Fig. 1) etc.
In addition, as shown in Figure 4, be provided with the locking mechanism 134 that wafer case is fixing on turntable 132, when wafer case was positioned on the turntable 132, locking mechanism 134 work were fixed on wafer case on the turntable 132.Side portion in wafer transfer device 14 sides of base station 131 upper surfaces, be formed with end from probe chamber 12 sides towards carrying line L side until the slit of central portion (slit) S, be formed with forwards first, second short slit (following only be called " short seam ") S1, S2 that (being left among Fig. 4) extends respectively at the both ends of this slit S.Push part 133 is erect setting in the mode that moves back and forth by slit S between the first short seam S1 and the second short seam S2.This push part 133 moves to wafer case in the second short seam S2 after the first short S1 of seam moves to the second short S2 of seam, and the wafer that will partly expose from wafer case pushes in the wafer case thus, makes it get back to original position in the wafer case.In addition, push part 133 drives automatically, makes to make by turntable 132 rotation in wafer case to move into when taking out of mouthful towards wafer transfer device 14 sides, and wafer is pushed in the wafer case.
In addition, as Fig. 3, shown in Figure 5, below the first load port 13A, buffer table 15 and wafer station 16 dispose up and down, and the two 15,16 is supported by supporter 17.Buffer table 15 for example is to take in the platform of the needle point grinding of probe with substrates such as wafers, and wafer station 16 is to be used to confirm to check the wafer that finishes and the wafer that inspection finishes is fetched into the outer platform that can pull out of device.Buffer table 15 is from the front, on the internal face of the left and right sides, be formed for along the vertical direction keeping multiple (for example, 200mm Φ, 300mm Φ) needle point grinding of size is with the groove (slot) of wafer, and the needle point grinding of taking in different size by these grooves is with wafer etc.
In addition, as shown in Figure 5, be provided with the secondary chuck 18 of the prealignment that carries out wafer and read the information read device 19 of the identifying information of wafer below the second load port 13B, the two 18,19 supports by supporter 20.As information read device 19, optical character reading device (OCR), barcode reader etc. are for example arranged, be provided with OCR in the present embodiment.Therefore, below will describe OCR19.
As Fig. 3~shown in Figure 7, wafer transfer device 14 comprises: the carrying arm 141 of conveyance wafer; Make carrying arm 141 forwards, backwards direction move described laterly directly advance driving mechanism 142 by what motor and endless band constituted; The rotary plate 143 of the two circle is set; Make the rotary drive mechanism 144 of carrying arm 141 with the following central link of this rotary plate 143 and by rotary plate 143 to the both forward and reverse directions rotation; Support the base station 145 (with reference to Fig. 6) of these members; With make first, second lift drive mechanism 146 of carrying arm 141 liftings, 147 two kind of lift drive mechanism by base station 145.In addition, as Fig. 4, Fig. 5, shown in Figure 6, leading section at rotary plate 143, the place ahead that pair of right and left image sensor (mapping sensor) 148 is configured in carrying arm 141 is the position of below slightly, can utilize based on cylinder mechanism directly advance driving mechanism 148A forwards, backwards direction be provided with movably, utilize these image sensors 148 before the wafer in the wafer case is taken out of, to detect the receiving state (the sheet number of wafer etc.) of wafer.
Carrying arm 141 as Fig. 5~shown in Figure 7, comprising: Pei Zhi first, second arm 141A, 141B up and down; With at separately base end part, vacate predetermined gap up and down and keep two of first, second arm 141A, 141B to keep body 141C, keep body 141C and directly advance driving mechanism 142 and link by these.Directly advance driving mechanism 142, for example as shown in Figure 7, comprise: be configured on the substrate and with the endless band 142A, the lodge that keep body 141C to link be surrounded with the front and back of endless band 142A pulley (pulley) 142B, with carrying arm 141 forwards, backwards direction move the guide rail (not shown) of guiding and the motor 142C that links with the pulley 142B at rear, after obtaining the actuating force of motor 142C, carrying arm 141 is along guide rail and front and back are directly advanced mobile.
In addition, as Fig. 5, shown in Figure 6, rotary drive mechanism 144 comprises: the rotating shaft 144A that hangs down in the center below rotary plate 143 and link and be fixed on motor 144C on the base station 145 by endless band 144B and rotating shaft 144A, motor 144C rotates to both forward and reverse directions, thereby makes carrying arm 141 on the rotary plate 143 towards first, second load port 13A, 13B side or probe chamber 12 sides.This rotating shaft 144A is supported by axle with rotating freely on base station 145.
The lift drive mechanism of carrying arm 141 for example as Fig. 6, shown in Figure 8, comprises first, second lift drive mechanism 146,147 two kind of lift drive mechanism, makes that the carrying arm 141 on the base station 145 carries out lifting according to different actions.
As Fig. 6, shown in Figure 8, first lift drive mechanism 146 comprises: be fixed on the bottom surface of load chamber 11 the first guide plate 146A, the left and right sides that is configured in the first guide plate 146A and leading section by first link pair of right and left cylinder mechanism 146C that parts 146B and cylinder body body link and by second link parts 146D respectively with the second guide plate 146E of connecting rod (rod) binding of cylinder mechanism 146C, connecting rod by cylinder mechanism 146C flexible, the second guide plate 146E is along the first guide plate 146A lifting.In addition, the engaging part 146F of the second guide plate 146E engages with the guide rail 146G of the first guide plate 146A.
As Fig. 6, shown in Figure 8, second lift drive mechanism 147 comprises: be configured in the ball-screw 147A of the front of the second guide plate 146E, built-in and the lifting body 147B of the nut part that ball-screw 147A screws togather and the motor (not shown) that ball-screw 147A is rotated to both forward and reverse directions, the rotation of the both forward and reverse directions by ball-screw 147A, lifting body 147B is along the second guide plate 146E lifting.The engaging part 147C of lifting body 147B engages with the guide rail 147D of the second guide plate 146E.In addition, lifting body 147B is integrated with the base station 145 (with reference to Fig. 6) that supports carrying arm 141 grades, makes carrying arm 141 liftings.
146C drives by cylinder mechanism, and first lift drive mechanism 146 makes wafer transfer device 141 with the 147 1 gas ground liftings of second lift drive mechanism between the lower end position of its descend most end position and first, second load port 13A, 13B.In addition, drive by motor, second lift drive mechanism 147 is at its lower end position, when below the second load port 13B, carrying out the prealignment of wafer etc., make wafer transfer device 141 lifting bit by bit, perhaps, make wafer transfer device 141 lifting bit by bit in order in first, second load port 13A, 13B, to take out the wafer arbitrarily in the wafer case one by one.
Then, operation is described.At first, carrying the automatic conveyance car V that takes in the wafer case of 25 wafer for example moves on carrying line L, after its first load port 13A with the testing fixture 10 of regulation was relative, the wafer case arm H of conveyance car V drove automatically, with wafer case transfer on the turntable 132 of load port 13A.At this moment, moving into of wafer case taken out of mouth towards probe chamber 12 sides.Automatically conveyance car V enters the operation of the next wafer case of conveyance after the transfer wafer case.
From automatic conveyance car V on turntable 132 during the transfer wafer case, wafer can expose in wafer case because of inertia force sometimes.Therefore, in load port 13A, optical pickocff work detects the wafer that exposes in the wafer case and whether is positioned at permissible range.Judge wafer when optical pickocff and expose to permissible range when above, give the alarm by making signal lamp P neglect bright go out suddenly etc., thereby it is notified to the operator.The operator is according to this alarm and wafer is pushed into original position in the wafer case.When optical pickocff judged that exposing of wafer is positioned at permissible range, the rotary drive mechanism of turntable 132 drove, and makes turntable 132 to the clockwise direction half-twist, thereby made moving into of wafer case take out of mouth towards wafer transfer device 14 sides.
When moving into of wafer case taken out of mouth towards wafer transfer device 14 sides, because of the rotation of wafer case, wafer can expose from part in the wafer case sometimes.Therefore, when moving into of wafer case taken out of mouth towards wafer transfer device 14 sides, push part 133 drove, and via slit S, moved to wafer case one side second short the seam among the S2 from the first short seam S1, and wafer is pushed in the wafer case.Then, push part 133 is returned the first original weak point via opposite path and is stitched S1.
When push part 133 was returned original position, wafer transfer device 14 drove.At this moment, at first, first lift drive mechanism 146 drives, and the second guide plate 146E rises to the end that rises along the guide rail 146G of the first guide plate 146A from the end that descends, the position that arrival can be extracted the undermost wafer in the wafer case on the first load port 13A out.Then, second lift drive mechanism 147 drives, ball-screw 147A rotation, and lifting body 147B rises with base station 145 by nut part.As a result, carrying arm 141 rises to the upper end from the lower end of wafer case.During this period, utilize image sensor 148 to detect the receiving state of the wafer in the wafer case.Then, the motor of second lift drive mechanism 147 descends by ball-screw 147A carrying arm 141 to opposite spin, moves to the position of taking out the regulation wafer in wafer case.In addition, image sensor 148 can detect wafer in the lower end from wafer case when the upper end is mobile, perhaps detects wafer twice when the moving back and forth between the two ends up and down of wafer case.
Then, the motor 142C that directly advances driving mechanism 142 drives, and makes by the carrying arm 141 that keeps body 141C to keep by endless band 142A to drive.Carrying arm 141 advances from the rear end, enters in the wafer case on the first load port 13A, and for example the first arm 141A is positioned at the downside of the wafer of expectation.At this moment, second lift drive mechanism 147 drives, and carrying arm 141 is risen a little, utilizes the first arm 141A absorption to keep wafer.At this moment, wafer is incorporated in original position by push part 133, and therefore, the first carrying arm 141A conveyance wafer accident can not occur.Then, carrying arm 141 is back to the rear end, utilizes the first arm 141A that wafer is taken out of in wafer case.
Then, first lift drive mechanism 146 drives, and the connecting rod of cylinder mechanism 146C shrinks, and carrying arm 141 descends between first, second load port 13A, 13B.Then, the motor 144C of rotary drive mechanism 144 drives, and makes rotary plate 143 Rotate 180s ° by endless band 144B and rotating shaft 144A, thereby the front end that makes carrying arm 141 is towards the second load port 13B side.Then, the motor 142C that directly advances driving mechanism 142 drives, and by endless band 142A, is advanced to the secondary chuck 18 that is configured in second load port 13B below by the carrying arm 141 that keeps body 141C to keep.At this moment, the ball-screw 147A of second lift drive mechanism 147 drives along both forward and reverse directions, and carrying arm 141 liftings utilize OCR19 to read the identifying information of the wafer that is kept by the first arm 141A.Then, with wafer from the first arm 141A mounting to secondary chuck 18.Then, 18 rotations of secondary chuck are carried out prealignment according to directional plane (orientation flat) etc. to wafer.Then, the ball-screw 147A rotation of second lift drive mechanism 147, after utilizing the first arm 141A absorption to keep wafer and it being lifted from secondary chuck 18, make carrying arm 141 retreat rear end to the rotary plate 143 from secondary chuck 18 by directly advancing driving mechanism 142.
When carrying arm 141 was back to rear end on the rotary plate 143, the front end that makes carrying arm 141 by rotary drive mechanism 144 to the counter clockwise direction half-twist was towards probe chamber 12 sides.Then, carrying arm 141 advances by directly advancing on the wafer chuck (not shown) of driving mechanism 142 in probe chamber 12, make carrying arm 141 liftings by second lift drive mechanism 147, from the first arm 141A with untreated wafer handling to wafer chuck, carrying arm 141 is back to the rear end by directly advancing driving mechanism 142, and retreats from probe chamber 12.
Then, when the inspection in probe chamber 12 finished, carrying arm 141 entered in the probe chamber 12 by directly advancing driving mechanism 142, by second lift drive mechanism 147, utilized the second arm 141B to accept the wafer of having handled.Then, carrying arm 141 after probe chamber 12 is back to rear end on the rotary plate 143, carrying arm 141 by rotary drive mechanism 144 to the counter clockwise direction half-twist, thereby the front end that makes carrying arm 141 is towards the first load port 13A side.Then, after rising by first, second lift drive mechanism 146,147, carrying arm 141 enters in the wafer case by directly advancing driving mechanism 142, and the wafer of having handled is put back to position original in the wafer case from the second arm 141B.Carrying arm 141 is back to the rear end by directly advancing driving mechanism 142 from wafer case.Then, second lift drive mechanism 147 drives, and makes carrying arm 141 liftings to next wafer position, takes out next wafer, repeats above-mentioned a series of operation, and the electrical characteristics of all wafers in the wafer case are checked.
In addition, during the wafer in the wafer case is handled, automatic conveyance car V conveyance wafer case, and with the second load port 13B transfer of wafer case to sky.When the electrical characteristics inspection to all wafers in the wafer case on the first load port 13A finished, turntable 132 made moving into of wafer case take out of mouth towards probe chamber 12 sides to the counter clockwise direction half-twist.So the wafer case arm H at the automatic conveyance car V of standby drives, and the wafer case on the load port 13 is put on the automatic conveyance car V, to next operation conveyance.During this period, in load chamber 11 and probe chamber 12, the wafer that is positioned at the second load port 13B is handled.Therefore, in the present embodiment, the wafer case on first, second load port 13A, the 13B works as transmitter and receiver respectively.
As described above, according to present embodiment, load chamber 11 is configured in the side of probe chamber 12, and, front and back at load chamber 11 are provided with first, the second load port 13A, 13B, and the secondary chuck 18 of configuration below the second load port 13B, in addition, in first of front and back, the second load port 13A, be provided with between the 13B and have the wafer transfer device 14 that can rotate with the carrying arm 141 of lifting, therefore, can not increase existing single floor space of loading the testing fixture of type, change over two testing fixtures 10 that load type by setting up load port, and this testing fixture 10 can be tackled and single loaded the existing automatic carrying line L that type uses and need not increase change.In addition, because secondary chuck 18 is located at the below of the second load port 13B, so, can effectively utilize the space of second load port 13B below, and do not need in load chamber 11, to vacate the intrinsic space of secondary chuck, thereby can realize saving the space that is provided with of testing fixture 10.
In addition, because first, second load port 13A, 13B arrange along the automatic carrying line L of auto-conveying apparatus V, so, even when the operator be positioned at the front of testing fixture 10, when for example the wafer of the wafer case of mounting is checked on to the first load port 13A of testing fixture 10, auto-conveying apparatus V also can and the second load port 13B between carry out the handing-over of wafer case and do not disturb with the operator.
In addition, first, the second load port 13A, 13B arranges along the automatic carrying line L of auto-conveying apparatus V, and, when 132 rotations of each turntable make wafer case and wafer transfer device 14 relative, wafer case on each turntable 132 disposes equidistantly with respect to wafer transfer device 14 left-right symmetric, therefore, make wafer transfer device 14 take out of operation and move into the time of taking out of roughly the same between whole wafers of two wafer case with respect to moving into of wafer case, thereby can suppress each load port 13A, the deviation of the wafer transfer between 13B and the probe chamber 12, and then can shorten wafer transfer time in testing fixture 10.In addition, because wafer case is the configuration of center and left and right symmetrically with wafer transfer device 14 like this, so, from wafer case during to probe chamber 12 conveyance wafers, (for example can not be subjected between all wafers in two wafer case by the environment in the testing fixture 10, temperature, humidity etc.) the deviation that influence caused, can be always with certain state conveyance wafer and check accurately.
In addition, according to present embodiment, in first, second load port 13A, 13B, be respectively arranged with the transducer of the detection wafer that part is exposed from wafer case, therefore, when when wafer exposes from wafer case during to first, second load port 13A, 13B transfer from automatic conveyance car V with wafer case, can detect exposing of wafer automatically by transducer, thereby can prevent the various disadvantages that produce because of exposing of wafer.
In addition, in first, second load port 13A, 13B, be provided with the wafer that to expose to wafer transfer device 14 sides from wafer case and push push part 133 in the wafer case, therefore, can utilize wafer transfer device 14 from wafer case, to take out of wafer reliably and accident can not occur.And, near secondary chuck 18, be provided with the OCR19 that discerns wafer, therefore, can effectively utilize the be provided with space of the space of second load port 13B below as OCR19.
In addition, wafer transfer device 14 comprises first, second lift drive mechanism 146,147 two kind of lift drive mechanism, and therefore, two kinds of functions of first, second lift drive mechanism 146,147 of can applying in a flexible way accurately and reliably make the wafer lifting.First lift drive mechanism 146 comprises cylinder mechanism 146C, therefore, can make carrying arm 141 liftings at short notice.In addition, second lift drive mechanism 147 comprises ball-screw 147A and as the motor of its drive source, therefore, can make carrying arm 141 lifting bit by bit, thereby can to take out of position etc. corresponding and control accurately with moving into of wafer.
In addition, according to present embodiment, side at testing fixture 10, from automatic conveyance car V after the first load port 13A transfer wafer case that is arranged on load chamber 11 front and back, in the first load port 13A, make the wafer case rotation, from this wafer case to probe chamber 12 one by one the conveyance wafer during, below the second load port 13B, carry out the location of wafer, during wafer is checked, carry out the handing-over of wafer case from automatic conveyance car V to the second load port 13B, therefore, from dropping into wafer to the wafer that takes out after checking to testing fixture 10, can automation, and, at first of testing fixture 10, the second load port 13A, always there is wafer case in handling at least in any in 13B, therefore, even the review time high speed also can make testing fixture 10 turn round incessantly, thereby can improve checking efficiency.
In addition, in the present embodiment, the situation of using the open wafer case of automatic conveyance car V conveyance (open cassette) is illustrated, but, using FOUP (Front Opening Unified Pot: under situation front-open wafer box) as wafer case, as required, also can hold by the airtight FOUP of lid and carry out conveyance, and FOUP is positioned among first, second load port 13A, the 13B by the operator by the operator.In this case, as will not needing wafer push part 133 illustrating in the 3rd execution mode, the derailing switch that the lid of automatic switch FOUP is set in load port replaces push part 133, and is corresponding with FOUP thus.
Second execution mode
The testing fixture 10A of present embodiment, for example as shown in Figure 9, below the first load port 13A, also be provided with the 3rd load port 13C, thereby can in bilevel the first, the 3rd load port 13A, 13C, accommodate wafer case C respectively, in addition, similarly constitute with the testing fixture 10 of first execution mode in fact.Therefore, the part identical or suitable with first execution mode marks identical symbol and describes.
That is, as shown in Figure 9, the 3rd load port 13C is configured in the below of the first load port 13A, has and first, second load port 13A, structure that 13B is identical in fact.The carrying arm 141 of wafer transfer device 14 is by first, second lift drive mechanism (not shown) and lifting is relative with the first load port 13A or the 3rd load port 13C, the wafer in each wafer case C is moved into taken out of.When in the wafer case C of the first load port 13A, moving into when taking out of wafer, shown in the solid line among Fig. 9, carrying arm 141 rises to after the position relative with the first load port 13A by first elevating mechanism, by of up and down two ends between the lifting of second lift drive mechanism, similarly move into the wafer of taking out of in the wafer case C with the situation of first execution mode at wafer case C.In addition, when in the wafer case C of the 3rd load port 13C, moving into when taking out of wafer, only second lift drive mechanism drives, shown in the chain-dotted line among Fig. 9, carrying arm 141 is relative with the 3rd load port 13C, carrying arm 141 passes through up and down two ends between the lifting of second lift drive mechanism at wafer case C, wafer is moved into taken out of.When carrying arm 141 is taken out of wafer in each wafer case C, with first execution mode similarly with wafer to the process chamber conveyance, and the wafer that will finish predetermined processing in process chamber takes out of from process chamber, moves into then in each wafer case C.
According to present embodiment, to compare with the situation of first execution mode, load port is extended, therefore, in testing fixture 10A, can more than enoughly hold 1 wafer case C, also can handle wafer incessantly even the review time of wafer shortens, thereby can further improve disposal ability.In addition, also can expect the action effect same in the present embodiment with first execution mode.
In first, second execution mode, the example at the front and back of wafer transfer device 14 configuration load port is illustrated, still, processing unit of the present invention also can only be provided with bilevel load port in the place ahead of wafer transfer device.In this case, even with the identical floor space of processing unit of in the past single port, also can enlarge load port, thereby can tackle the high speed of the processing speed of handled objects such as wafer.In addition, in second execution mode, be provided with bilevel load port, still, also bilevel load port can be set at the rear of wafer transfer device in the place ahead of wafer transfer device.In addition, also the elevating mechanism of wafer case can be in first load port, appended, in this case, the lifting travel of carrying arm can be dwindled.
The 3rd execution mode
The testing fixture 10B of present embodiment, for example as shown in Figure 10 and Figure 11, the first load port 13A becomes the structure of mounting FOUP as wafer case C, be provided with the derailing switch 21 of the lid of automatic switch FOUP, and, the structure difference of buffer table 15, in addition, the testing fixture 10 according to first execution mode constitutes in fact.Therefore, the part identical or suitable with first execution mode marks identical symbol and describes, and describes as wafer case C with FOUP.
The first load port 13A in the present embodiment as Figure 10, shown in Figure 11, comprising: the base station 131 that has peristome in the above; To be arranged on the turntable 132 of the peristome of base station 131 with the conplane mode of top formation of base station 131; With the top last and mounting that is arranged on turntable 132, the mounting portion 135 of fixed wafer box C.Turntable 132 rotates by the rotating driveshaft 132A that central authorities below it link, thereby makes the wafer case C rotation in the mounting portion 135.Clamp system (not shown) is installed in mounting portion 135, can and automatic guide vehicle), carry out the automatic handing-over of wafer case C between the OHT (Overhead Hoist Transport: overhead lifting transmission) for example AGV of visit (access) first load port 13A (Automated Guided Vehicle:.The action of clamp system and AGV, OHT is moved synchronously.
The center of turntable 132 (rotating driveshaft 132A axle core) O as shown in figure 11, is configured in the position of only departing from given size d downwards from the centre line L at the Width center by derailing switch 21.In addition, mounting portion 135 is configured on the turntable 132, and making becomes following position relation: in the position of representing with thick line, and the center O of the wafer W of representing with thick line in the wafer case (not shown) that receives from AGV or OHT
1Only depart from given size D to the right from the center O of turntable 132.When thereby turntable 132 makes mounting portion 135 only be rotated counterclockwise 90 ° as shown by arrows when making its thick line position from Figure 11 rotate to the fine rule position by rotating driveshaft 132A, the center O of the wafer W of representing with fine rule
1Arrive on the centre line L, and the position before rotate to derailing switch 21 only near given size d, the wafer case C in the mounting portion 135 is relative with derailing switch 21.Thus, wafer case C by the state of turntable 132 before rotate to derailing switch 21 only near given size d, can make from wafer case C to derailing switch 21 displacement only save given size d, and then can save the floor space of respective amount.
In addition, though not shown,, mounting portion 135 constitute can by comprise guide rail etc. directly advance driving mechanism and on turntable 132 forwards, backwards direction move.When the lid of the wafer case C in the mounting portion 135 was relative with derailing switch 21 as shown in figure 10, shown in arrow among this figure, mounting portion 135 directly advanced to derailing switch 21 by directly advancing driving mechanism, and lid is combined automatically with derailing switch 21.Under this state, derailing switch 21 takes off the lid of wafer case C and conveyance downwards automatically, thus, moving into of wafer case C is taken out of mouth open, and is used to utilize wafer transfer device 14 to move into and takes out of wafer W.
In addition, below the first load port 13A, buffer table 15 shown in Figure 12 (a) and wafer station 16 be configuration up and down according to first execution mode.Shown in this figure (a), on buffer table 15, in multilayer, vacate equal intervals mutually along the vertical direction and be formed with the needle point grinding wafer W that keeps same bore (for example 300mm Φ)
1Or the groove 151 of wafer W.Because take in the needle point grinding wafer W of same bore like this
1Or wafer, so, even limited space also can be provided with the groove 151 of multilayer shown in this figure (a).Thus, even because of the grinding number of times that wafer size increases, chip-count significantly increases the needle point grinding that causes probe increases, by in buffer table 15, taking in the needle point grinding wafer W of multi-disc in advance
1, also can tackle the increase of grinding number of times, thereby use the needle point grinding wafer W of multi-disc continuously
1
But, buffer table in the past needless to say, in the buffer table of first execution mode, take in the different needle point grinding wafer of bore, therefore, can't take in the needle point grinding wafer of same size, needing sometimes for the time being device to be stopped to become the disposal ability main reasons for decrease to change the needle point grinding wafer.
In addition, shown in Figure 12 (b), each groove 151 of buffer table 15 is formed by shelf 151A, 151B up and down respectively.In each groove 151, be respectively arranged with to be used for detecting and have or not the needle point grinding wafer W
1Deng optical pickocff 152, utilize these optical pickocffs 152 can confirm to be incorporated in needle point grinding wafer W in each groove 151 separately
1Optical pickocff 152 comprises light-emitting component 152A and photo detector 152B, and distribution 152C, 152C by separately are connected with wiring substrate 153.In the shelf 151A of downside, be formed with the space 151C that takes in light-emitting component 152A, in the shelf 151B of upside, be formed with the space 152D that takes in photo detector 152B.In each shelf 151C, be formed with the hole 151E that the light of light-emitting component 152A passes through respectively.The optical pickocff 152 of each groove 151 disposes on the fore-and-aft direction of groove 151 alternately every one respectively, and adjacent optical pickocff 152 up and down is not overlapping.
Thus, have or not the needle point grinding wafer W in a groove 151
1, detect by the optical pickocff 152 of this layer, do not have or not the needle point grinding wafer W and do not detect in the groove 151 on its upper strata
1That is the light mutually noninterfere of optical pickocff 151 up and down.Like this, can utilize the optical pickocff 152 that is located in each groove 151 to detect the needle point grinding wafer W of each groove 151 reliably
1Deng, also can determine to be maintained at the kind of the wafer in this groove 151.
As described above, according to present embodiment, the first load port 13A has the mounting portion 135 of mounting wafer case C and makes the turntable 132 of these mounting portion 135 rotations, the center O of the wafer W in the wafer case C
1Only depart from given size d with the center O of turntable 132, make the 135 eccentric rotations of mounting portion, therefore, when turntable 132 makes from the eccentric rotation of wafer case C that AGV or OHT receive, wafer case C only to derailing switch 21 near given size d, and relative with derailing switch 21, thus can make from wafer case C to derailing switch 21 displacement only save given size d, and then can save the floor space of respective amount.
In addition, according to present embodiment, below the first load port 13A, be provided with buffer table 15, this buffer table 15 has the needle point grinding wafer W that multilayer is used to keep same size (for example 300mm Φ) at above-below direction
1Groove 151, therefore, can take in the needle point grinding wafer W of the same size of multi-disc
1Even, because of significantly increasing the needle point grinding number of times that causes probe, the inspection chip-count of the wafer of 300mm Φ increases, and also can be with multi-disc needle point grinding wafer W
1Continuously grinding, thus the disposal ability of checking can be improved.In addition, each groove 151 of buffer table 15 has to be used for detecting and has or not the needle point grinding wafer W
1Deng optical pickocff 152, therefore, can confirm to have or not the needle point grinding wafer W in each groove 151
1, and then, by pre-determining the corresponding relation of each groove 151 and optical pickocff 152 separately, can determine to be incorporated in the needle point grinding wafer W in each groove 151
1Kind.In addition, also can expect the action effect same in the present embodiment with first execution mode.
The 4th execution mode
The testing fixture of present embodiment except wafer transfer device and secondary chuck and OCR are integrated, similarly constitutes with first execution mode in fact.The part identical or suitable with first execution mode mark same-sign describes the feature of present embodiment.
Under the situation of wafer transfer device 14A in the present embodiment, for example as shown in figure 13, rotary plate 143 is provided with the secondary chuck 18 as detent mechanism.This pair chuck 18 constitutes can lifting and rotation, is set at the half-way of taking out of wafer W (representing with chain-dotted line in the figure) and retreating from wafer case.In addition, be provided with OCR19 in the side of secondary chuck 18 as information read device.Therefore, carrying arm 141 is relative with wafer case, retreats midway in the wafer W of taking out of regulation from wafer case and to rotary plate 143, and secondary chuck 18 receives wafer W.Then, in the process of secondary chuck 18 arrow theta direction rotation in this figure, utilize OCR19 to read after the identifying information of wafer W, carry out prealignment.After the prealignment, same with first execution mode, carrying arm 141 is transferred wafer W to the main card dish of probe chamber.That is, in the first embodiment, carrying arm 141 is taken out of wafer W from wafer case after, need be with the secondary chuck and the OCR of wafer W conveyance to the second load chamber side, but, in the present embodiment, in wafer transfer device 14A, can carry out prealignment and the identifying information that reads wafer W.
Thereby according to present embodiment, wafer transfer device 14A has secondary chuck 18 and OCR19, therefore, can shorten and take out of wafer to the time that hands over to the probe chamber from wafer case.In addition, can expect the action effect same with first execution mode.
The 5th execution mode
The testing fixture of present embodiment except the carrying arm that multi-joint manipulator replacement wafer transfer device is set, constitutes according to the 4th execution mode in fact.Therefore, also wafer transfer device and secondary chuck are described in the present embodiment.
Wafer transfer device 14B in the present embodiment, for example as shown in figure 14, comprising: the multi-joint manipulator 149 of conveyance wafer W, support multi-joint manipulator 149 base station 145 (with reference to Fig. 6), be located at the secondary chuck 18 on the base station 145 and be located near the secondary chuck 18 OCR19.
Shown in figure, multi-joint manipulator 149 comprises: a plurality of arm 149A, the joint 149B that these arms 149A is linked mutually, the hand 149C that links with the front end of these arms 149A and the rotary driving part 149D that links with the base end part of these arms 149A.A plurality of arm 149A are middle mind-set both forward and reverse directions rotation with base end part, change the conveyance direction of wafer W.A plurality of arm 149A stretch by the effect of joint 149B that their are linked, when a plurality of arm 149A and hand 149C stretch, will move into respect to wafer case by the wafer W of hand 149A maintenance and take out of, and the main card dish of probe chamber between carry out giving and accepting of wafer.In addition, as multi-joint manipulator 149, can use known in the past multi-joint manipulator.
Therefore, also same in the present embodiment with the 4th execution mode, except the identification of the prealignment that can in wafer transfer device 14B, carry out wafer W and wafer W, also can expect the action effect same with first execution mode.
In addition, in first~the 5th execution mode, the wafer case that is positioned in first, second load port works as transmitter and receiver respectively.But, also can be with the wafer case of first load port as the transmitter special use, the wafer case of second load port as the receiver special use, in addition, also can suitably be switched transmitter and receiver with the wafer case of first, second load port and used.
In addition, in the above-described embodiment, be that example is illustrated with the testing fixture, still, also can be applied to handled object is implemented the processing unit of predetermined processing.Therefore, the present invention is not limited by above-mentioned execution mode at all, can suitably design as required to change each inscape.Utilizability on the industry
The present invention can be widely used in being configured in the various processing unit in the clean room of semiconductor fabrication factory.
Claims (19)
1. a processing unit comprises the load chamber that is configured in the process chamber side, it is characterized in that:
Described load chamber comprises: mounting is taken in the framework of a plurality of described handled objects and is separated from each other along described side and two load ports disposing; Be configured between these load ports and the carrying device of the described handled object of conveyance between these load ports and described probe chamber; With the below that is arranged at least one load port in described two load ports and carry out the detent mechanism of the location of described handled object.
2. a processing unit comprises the load chamber that is configured in the process chamber side, it is characterized in that:
Described load chamber comprises: mounting take in a plurality of described handled objects framework and with described side in abutting connection with, separate and two load ports disposing at above-below direction mutually; And described side in abutting connection with configuration and between these load ports and described probe chamber the carrying device of the described handled object of conveyance; And with described side in abutting connection with the detent mechanism that is provided with and carries out the location of described handled object.
3. processing unit as claimed in claim 1 or 2 is characterized in that:
Described each load port is respectively along the conveyance path configurations of the auto-conveying apparatus of described framework, and described auto-conveying apparatus between carry out the handing-over of described framework.
4. as each described processing unit in the claim 1~3, it is characterized in that:
Described load port has: change the direction switching mechanism of the direction of described framework; With the switching mechanism that the lid by this direction switching mechanism described framework relative with described carrying device is carried out switch.
5. processing unit as claimed in claim 4 is characterized in that:
Described direction switching mechanism has the mounting portion of the described framework of mounting and makes the rotary body of this mounting portion rotation, the center of the described handled object in the described framework is configured in the position of only departing from given size with the center of described rotary body, utilize described rotary body, described mounting portion carries out the off-centre rotation.
6. processing unit as claimed in claim 5 is characterized in that:
Only rotate predetermined angular by described rotary body, the lid of described framework is relative with described switching mechanism, and described framework is only to the approaching described given size in the position of the switch of described switching mechanism.
7. as claim 5 or 6 described processing unit, it is characterized in that:
Described predetermined angular is 90 °.
8. as each described processing unit in the claim 1~7, it is characterized in that:
Near described detent mechanism, be provided with the recognition device of the described handled object of identification.
9. as each described processing unit in the claim 1~8, it is characterized in that:
In described load port, be provided with the transducer of the described handled object that detection exposes from described framework.
10. processing unit as claimed in claim 9 is characterized in that:
In described load port, be provided with the described handled object that from described framework, to expose and push push part in the described framework.
11., it is characterized in that as each described processing unit in the claim 1~10:
Described carrying device comprises first lift drive mechanism and two kinds of lift drive mechanisms of second lift drive mechanism.
12. processing unit as claimed in claim 11 is characterized in that:
Described first lift drive mechanism comprises cylinder, and described second lift drive mechanism comprises motor.
13., it is characterized in that as each described processing unit in claim 1 and 3~12:
Be provided with below another load port in described two load ports at above-below direction and have the host body of maintaining part that multilayer is used to keep the substrate of same size.
14. processing unit as claimed in claim 13 is characterized in that:
Described maintaining part has the transducer that detection has or not described substrate.
15., it is characterized in that as each described processing unit in the claim 1~14:
Described carrying device constitutes based on multi-joint manipulator.
16. a processing unit comprises the load chamber that is configured in the process chamber side, it is characterized in that:
Described load chamber comprises: mounting is taken in the framework of a plurality of described handled objects and is separated from each other along described side and two load ports disposing; And be configured between these load ports and the carrying device of the described handled object of conveyance between these load ports and described probe chamber, wherein, along the conveyance path configurations of the auto-conveying apparatus of described framework, described carrying device has the detent mechanism of the location of carrying out described handled object to described each load port respectively.
17. a processing unit comprises the load chamber that is configured in the process chamber side, it is characterized in that:
Described load chamber comprises: mounting take in a plurality of described handled objects body with cover framework and be separated from each other along described side and two load ports disposing; And be configured between these load ports and the carrying device of the described handled object of conveyance between these load ports and described probe chamber, wherein, described each load port has the direction switching mechanism and the switching mechanism that the lid by this direction switching mechanism described framework relative with described carrying device is carried out switch of the direction of the described framework of conversion respectively, and described carrying device has the detent mechanism of the location of carrying out described handled object.
18., it is characterized in that as each described processing unit in the claim 1~17:
Be positioned in framework difference double as transmitter and receiver in described each load port.
19., it is characterized in that as each described processing unit in the claim 1~17:
The framework that is positioned in described each load port can be switched transmitter and receiver respectively.
Applications Claiming Priority (9)
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JP2006-132546 | 2006-05-11 | ||
JP2006132546 | 2006-05-11 | ||
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JP2007044729 | 2007-02-23 | ||
JP2007-112353 | 2007-04-20 | ||
JP2007112353A JP4146495B1 (en) | 2006-05-11 | 2007-04-20 | Processing equipment |
JP2007112353 | 2007-04-20 |
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CN101071764A true CN101071764A (en) | 2007-11-14 |
CN101071764B CN101071764B (en) | 2010-08-18 |
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CN 200710107430 Expired - Fee Related CN101071784B (en) | 2006-05-11 | 2007-05-11 | Probing apparatus and probing method |
CN 200710107426 Expired - Fee Related CN101071764B (en) | 2006-05-11 | 2007-05-11 | Probing apparatus and probing method |
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Also Published As
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CN101071764B (en) | 2010-08-18 |
CN101071784B (en) | 2010-08-18 |
CN101071784A (en) | 2007-11-14 |
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