CN101067199A - Fe-Co series target material and manufacturing method thereof - Google Patents
Fe-Co series target material and manufacturing method thereof Download PDFInfo
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- CN101067199A CN101067199A CN200710126640.7A CN200710126640A CN101067199A CN 101067199 A CN101067199 A CN 101067199A CN 200710126640 A CN200710126640 A CN 200710126640A CN 101067199 A CN101067199 A CN 101067199A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F3/15—Hot isostatic pressing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0433—Nickel- or cobalt-based alloys
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
- C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
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- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/20—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder
- H01F1/22—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder pressed, sintered, or bound together
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2202/00—Physical properties
- C22C2202/02—Magnetic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0206—Manufacturing of magnetic cores by mechanical means
- H01F41/0246—Manufacturing of magnetic circuits by moulding or by pressing powder
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- Chemical Kinetics & Catalysis (AREA)
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Abstract
The invention discloses a process for manufacturing Fe-Co train target material for forming soft magnetism thin film. The process include following steps: mixing first powder whose weight ratio of Fe to Co is 8:2 to 7:3 and second power whose weight ratio of Fe to Co is 2:8 to 0: 10, so that the weight ratio of Fe to Co is 8:2 to 2:8, and press-molding the mixture by applying pressure of more than 100 MPa. In one or both of the first powder and the second powder, at least one added element selected from the group comprising Nb, Zr, Ta, Hf is added, 3 to 15 atomic % relative to the mixed powder weight. The Fe-Co train target material made in said manner has high-density, and lower magnetic permeability than before.
Description
The application requires Japanese patent application 2006-128224 number of on May 2nd, 2006 application as its right of priority, its disclosed full content as with reference to and be included in the content of the present invention.
Technical field
The present invention relates to be used for forming the Fe-Co series target material and the manufacture method thereof of soft magnetic film by sputtering method.
Background technology
In recent years, because the Magnetographic Technology progress is remarkable, the drive unit high capacity has advanced the high record densityization of magnetic recording medium.Yet in the magnetic recording medium of employed interior return to zero, in order to realize high record density, recorded bit (bit) becomes more meticulous, requires the high-coercive force of the degree that can not be write down by recorded bit in present wide world.So,, studied perpendicular magnetic recording as the method that addresses these problems, improves recording density.
So-called perpendicular magnetic recording is meant the media face that forms with respect in the magnetic film of perpendicular magnetic recording body, and easy magnetizing axis is in the method vertical direction orientation, that be suitable in the high record density.In perpendicular magnetic recording, developed and had the magnetic recording rete that improves recording sensitivity and 2 layers of recording medium of soft magnetism rete.This magnetic recording rete uses CoCrPt-SiO usually
2It is alloy.
On the other hand, soft magnetic film as 2 layers of recording medium, having proposed to use Fe-Co-B is the soft magnetic film of alloy, for example, disclosed as opening in the 2004-346423 communique the spy, in the microtexture of cross section, the diameter that does not have the maximum inscribed circle of describing in the field of boride phase is the following Fe-Co-B alloy target materials of 30 μ m.
In the film forming of above-mentioned soft magnetic film, use magnetron sputtering system usually.So-called this magnetron sputtering system is meant in the back side of target arrangement of magnets, makes flux leakage by the surface at target, makes plasma buncs in this leakage magnetic flux field, reaches the film forming sputtering method of high speed.This magnetron sputtering system is because to make flux leakage with the sputtering surface at target be feature, so the permeability of target itself is when high, is difficult to form required enough magnetic leakage flux in the magnetron sputtering system at the sputtering surface of target.So the requirement based on the permeability of doing one's utmost to reduce target itself has proposed the spy and has opened the 2004-346423 communique.
On the other hand, the permeability of target is low more, and the thickness of target can be thick more.That is, can make more film, therefore improve productivity by a target.Yet because in the above-mentioned technology always, permeability is low inadequately, the threshold value of the thickness of target is 5mm, if owing to complete leaked magnetic flux do not occur on the target surface, therefore there is the problem that can not carry out normal magnetron sputtering in the thickness more than it so.
Summary of the invention
Inventors have found now: first raw material powder and second raw material powder with mass ratio of other specific Fe: Co that mix the mass ratio with certain specific Fe: Co, make that the mass ratio of Fe: Co is 8: 2~2: 8, and, add the mixed powder hot compacting that specific interpolation element is 3~15 atom % by making, thereby obtained guaranteeing high-density and permeability ratio all low target always.
Thereby, the objective of the invention is to: provide a kind of can guarantee high-density and permeability than always all low, thus by increasing the thickness of target, can improve the Fe-Co series target material and the manufacture method thereof of the productivity of film.
That is, according to the present invention, the manufacture method of Fe-Co series target material comprises following operation:
The mass ratio of preparing Fe: Co is 8: 2~7: 3 first raw material powder and Fe: the mass ratio of Co is 2: 8~0: 10 second raw material powder;
Mix first raw material powder and second raw material powder and make that the mass ratio of Fe: Co is 8: 2~2: 8, obtain mixed powder;
The pressure that this mixed powder is applied more than the 100MPa under the temperature of 1073~1473K forms,
In first raw material powder and second raw material powder one or both sides, add at least a interpolation element that is selected among the group that Nb, Zr, Ta and Hf form, make the element that adds add up to 3~15 atom % with respect to the total amount of aforementioned mixed powder.
In addition, according to the present invention, the Fe-Co series target material can be according to the aforesaid method manufacturing, this Fe-Co series target material is the Fe by 85~97 atom %: the mass ratio of Co is that the elementary composition Fe-Co of at least a interpolation that is selected among the group that Zr, Nb, Ta and Hf form of 8: 2~2: 8 Fe and Co and 3~15 atom % is the target that alloy is made.
Embodiment
The manufacture method of Fe-Co series target material
In the manufacture method of Fe-Co series target material of the present invention, at first, the mass ratio of preparing Fe: Co is 8: 2~7: 3 first raw material powder and Fe: the mass ratio of Co is 2: 8~0: 10 second raw material powder.Composition by making first raw material powder and second raw material powder can reduce magnetic properties (permeability) effectively in above-mentioned scope.
Then, mix first raw material powder and second raw material powder, make that the mass ratio of Fe: Co is 8: 2~2: 8, make mixed powder.In the scope that is blended in this mass ratio, can prevent the increase of magnetic properties (permeability).
In manufacture method of the present invention, in first raw material powder and second raw material powder one or both sides, add at least a interpolation element in Nb, Zr, Ta and the Hf group of being selected from that total amount with respect to mixed powder adds up to 3~15 atom %, preferred 5~10 atom %.This interpolation element should add to before mixing among first raw material powder and second raw material powder one or the both sides in advance.When the amount of this interpolation element is lower than 3 atom %, even add in the Fe-Co mix powder, noncrystalline also difficulty; If surpass 15 atom %, saturation magnetic flux density reduces.The preferred mode according to the present invention, the interpolation element is preferably any two kinds among Nb, Zr, Ta and the Hf.
The preferred mode according to the present invention is added element and is preferably added in second raw material powder to add up to respect to the first raw material powder total amount to add to more than the 1 atom % in first raw material powder and/or more than adding up to 1 atom % with respect to the second raw material powder total amount before mixing.Therefore, can obtain the effect that permeability reduces fully by adding element.
The mixed powder of above-mentioned gained, under the temperature of 1073~1473K, more than the pressurization 100MPa, the pressure that preferably applies 100~500MPa forms, and obtains the Fe-Co series target material.The manufacturing process that uses in the method for the present invention can be this method that can high-density be shaped such as the hot compacting of HIP, hot pressing etc., has no particular limits, and any can.As the making method of powder, can be that gas is pulverized, pigment are broken, casting-comminuted powder any, without limits.Forming temperature in the reason of above-mentioned scope is: if be lower than 1073K, density does not reach 100%, and in addition, if surpass 1473K, the diffusion between powder is excessively carried out so, and it is more to cause high magnetic to be separated out mutually.And, if compacting pressure in the reason of above-mentioned scope for to be lower than 100MPa, density does not reach 100%.In addition, if the compacting pressure height is so out of question, still, from the viewpoint of cost and productivity, the upper limit is preferably 500MPa.
The Fe-Co series target material
Manufacturing method according to the invention, the Fe-Co series target material that can make are that the mass ratio of the Fe of 85~97 atom %: Co is that the Fe-Co that at least a interpolation element in the group that is selected from Zr, Nb, Ta and Hf of 8: 2~2: 8 Fe and Co and 3~15 atom % constitutes is the alloy manufacturing.What the Fe-Co series target material of manufacturing was high-density and permeability than always is all low.According to optimal way of the present invention, the Fe-Co series target material has 10~200 permeability.Its result can increase the thickness of target, can improve the productivity of film.In addition, permeability is 200 when following, can increase the thickness of target, is 10 when above, can obtain the enough characteristics as magneticsubstance.
Use the sputter of Fe-Co series target material
As mentioned above, in the film forming of soft magnetic film, use magnetron sputtering system usually.So-called this magnetron sputtering system is meant by in the back side of target arrangement of magnets, makes flux leakage on the surface of target, makes plasma buncs in this leakage magnetic flux field, can the film forming sputtering method of high speed.This magnetic controlled tube sputtering apparatus is in order to eliminate the shortcoming of 2 utmost point DC light emitting discharge sputter equipments, to give magnetic field be feature near the γ electronics is trapped in target to put into magnet in the inboard of target, because the γ electronics has been obtained the track around magnetic line of force, plasma body concentrates near the target, can reduce the infringement to substrate.In addition, because γ electronic motion distance is elongated, can under low pressure carry out high-speed sputtering simultaneously.
Embodiment
Below, according to embodiment the present invention is specified.
As shown in table 1, making Fe-Co by gas comminuting method or casting is alloy.In the gas comminuting method, be that argon gas, nozzle diameter are that 6mm, air pressure are to carry out under the condition of 5MPa at gaseous species.In addition, in casting, dissolve, pulverize then the formation powder by ceramic crucible (diameter 200mm, long 30mm) and carry out.In the following classification of 500 μ m, various powder stirred 1 hour by V-Mixer to the powder made.
So the various powder of making are filled in the seal pot that the SC material of diameter 200mm, high 100mm forms, when highest attainable vacuum 10-1Pa is above, after the degassing vacuum-sealing, by HIP (square extruding such as heat), be to be made into body under 5 hours the condition in temperature 1173K, pressure 150MPa, residence time.Then, the molding of gained is carried out machined into and Si Qie (wire cut), obtain having external diameter 180mm, the target of the final form of thickness 3~10mm.The characteristic of above-mentioned target is as shown in table 2.
Table 1
Sequence number | Combination in mixed total component | Raw material powder A | Raw material powder B | Remarks | |||||||||||
Ratio of components | Add element (at%) | Ratio of components | Add element (at%) | Ratio of components | Add element (at%) | ||||||||||
The ratio of Fe and Co | The total amount of Zr, Nb, Ta, Hf | Fe | Co | Zr | Nb | Ta | Hf | Fe | Co | Zr | Nb | Ta | Hf | ||
1 | 8∶2 | 7 | 74.2 | 25.8 | 4 | 3 | - | - | - | - | The embodiment of the invention | ||||
2 | 7∶3 | 7 | 71 | 29 | 4 | 3 | - | - | 0 | 100 | 1 | 1 | |||
3 | 6∶4 | 7 | 76 | 24 | 4 | 3 | - | - | 0 | 100 | 0 | 1 | |||
4 | 4∶6 | 7 | 77 | 23 | - | - | 3 | 3 | 0 | 100 | 1 | 0 | |||
5 | 3∶7 | 10 | 73 | 27 | 4 | 3 | - | - | 0 | 100 | 2 | 1 | |||
6 | 8∶2 | 15 | 70 | 30 | - | 4 | 5 | 5 | 11 | 89 | 0 | 0 | 1 | ||
7 | 7∶3 | 14 | 71 | 29 | 6 | 8 | - | - | 0 | 100 | 0 | 0 | |||
8 | 6∶4 | 12 | 76 | 24 | 6 | 6 | - | - | 11 | 89 | 0 | 0 | |||
9 | 4∶6 | 15 | 77 | 23 | - | - | 7 | 7 | 9 | 91 | 0 | 1 | |||
10 | 3∶7 | 5 | 73 | 27 | 1 | 2 | - | - | 13 | 87 | 1 | 1 | |||
11 | 7∶3 | 14 | 71 | 29 | 6 | 8 | - | - | 0 | 100 | 0 | 0 | |||
12 | 6∶4 | 14 | 76 | 24 | 6 | 6 | - | - | 11 | 89 | 1 | 1 | |||
13 | 4∶6 | 9 | 77 | 23 | - | - | 4 | 4 | 9 | 91 | 1 | 0 | |||
14 | 1∶8 | 11 | 100 | 0 | - | 4 | 5 | 5 | 16 | 84 | 1 | 1 | 1 | Comparative example | |
15 | 9∶1 | 7 | 73 | 27 | 4 | 3 | - | - | 0 | 100 | 0 | 0 | |||
16 | 3∶7 | 16 | 70 | 30 | 8 | 8 | - | - | 0 | 100 | 0 | 0 | |||
17 | 3∶7 | 16 | 70 | 30 | - | - | 8 | 8 | 0 | 100 | 0 | 0 | |||
18 | 7∶3 | 15 | 89 | 11 | - | 4 | 5 | 5 | 11 | 89 | 1 | 0 | |||
19 | 7∶3 | 10 | 76 | 24 | - | 4 | 5 | 5 | 22 | 78 | 1 | 1 | |||
20 | 3∶7 | 9 | 73 | 27 | 4 | 3 | - | - | 0 | 100 | 1 | 1 | |||
21 | 7∶3 | 14 | 69 | 31 | 6 | 8 | - | - | 0 | 100 | 1 | 1 |
Notes) underscore is for beyond the condition of the present invention
Table 2
Sequence number | Forming temperature (K) | Compacting pressure (MPa) | Permeability | Relative density (%) | Remarks |
1 | 1173 | 150 | 100 | 100 | The embodiment of the invention |
2 | 1173 | 200 | 90 | 100 | |
3 | 1223 | 180 | 85 | 100 | |
4 | 1123 | 220 | 110 | 100 | |
5 | 1223 | 220 | 120 | 100 | |
6 | 1173 | 180 | 100 | 100 | |
7 | 1173 | 200 | 90 | 100 | |
8 | 1223 | 220 | 85 | 100 | |
9 | 1123 | 200 | 110 | 100 | |
10 | 1223 | 250 | 120 | 100 | |
11 | 1073 | 200 | 90 | 100 | |
12 | 1373 | 180 | 85 | 100 | |
13 | 1123 | 200 | 110 | 100 | |
14 | 1223 | 200 | 200 | 100 | Comparative example |
15 | 1223 | 200 | 250 | 100 | |
16 | 1223 | 180 | 5 | 100 | |
17 | 1223 | 280 | 5 | 100 | |
18 | 1223 | 200 | 250 | 100 | |
19 | 1223 | 200 | 220 | 100 | |
20 | 1523 | 200 | 250 | 100 | |
21 | 1023 | 200 | 240 | 96 |
Notes) underscore is for beyond the condition of the present invention
In order to estimate the characteristic of the target of doing making, carry out following measurement.
(1) permeability is measured
The loop test sheet is made: external diameter 15mm, internal diameter 10mm, high 5mm
Device: BH tracer
Externally-applied magnetic field: 8kA/m
The average permeability of measurement project: 0~100A/m (Oe)
(2) density
Density measurement is according to Archimedes's method, undertaken by calculating relative density (ratio of the relative bulk density of actual density).
As shown in table 2, sequence number 1~13rd, the embodiment of the invention, sequence number 14~21st, comparative example.Comparative example sequence number 14 is because Fe and Co ratio in mixed total component are 1: 8, and Fe content is low, Co content height, thereby the permeability height in the magnetic properties.Comparative example sequence number 15 is because Fe in mixed total component and Co ratio are the content height of 9: 1 and Fe, and the content of Co is low, thereby the permeability height in the magnetic properties.Comparative example sequence number 16 is owing to the content height that adds element Zr, Nb, thereby permeability is low.Comparative example sequence number 17 is owing to the content height that adds element T a and Hf, thereby permeability is low.
Comparative example sequence number 18 is because Fe ratio height, the Co ratio of first raw material powder are low, thereby the permeability height.Comparative example sequence number 19 is owing to low, the Co ratio height of Fe ratio of second raw material powder, thereby the permeability height.Comparative example sequence number 20 is owing to the forming temperature height, and by reaction, what magnetic properties was high separates out mutually, the permeability height.Comparative example sequence number 21 is owing to low, the Co ratio height of Fe ratio of first raw material powder, thereby permeability is low, and in addition, because forming temperature is low, relative density is also poor.
Arbitrary example owing to embodiment of the invention sequence number 1~13 all satisfies condition of the present invention as can be known to this, thereby the permeability excellence in the magnetic properties.
As mentioned above, set Fe in first raw material powder and second raw material powder and the ratio of Co, and with respect to these mixed powders, when the ratio that adds Fe in mixed total component of a certain amount of interpolation element and Co is optimum range, can make the permeability in the magnetic properties lower than always, can increase the thickness of target, therefore can realize attempting boosting productivity, have excellent effect.
Claims (7)
1, the manufacture method of Fe-Co series target material wherein, comprises following operation:
The mass ratio of preparing Fe: Co is 8: 2~7: 3 first raw material powder and Fe: the mass ratio of Co is 2: 8~0: 10 second raw material powder;
Mix first raw material powder and second raw material powder, make that the mass ratio of Fe: Co is 8: 2~2: 8, obtain raw material powder;
The pressure that this mixed powder is applied more than the 100MPa under the temperature of 1073~1473K forms,
And, in first raw material powder and second raw material powder one or both sides, adding at least a interpolation element that is selected among the group that Nb, Zr, Ta and Hf constitute, this interpolation element adds up to 3~15 atom % with respect to the total amount of described mixed powder.
2, the method for claim 1, wherein described interpolation element is before described mixing, adds in first raw material powder more than adding up to 1 atom % with the total amount with respect to first raw material powder.
3, method as claimed in claim 1 or 2, wherein, described interpolation element adds in second raw material powder more than adding up to 1 atom % with the total amount with respect to second raw material powder before described mixing.
4, a kind of Fe-Co series target material, wherein, this Fe-Co series target material is the Fe-Co series target material that can make by the described method of claim 1, this Fe-Co series target material comprises:
The mass ratio of the Fe of 85~97 atom %: Co is 8: 2~2: 8 Fe and Co;
At least a interpolation element among the group who is selected from Zr, Nb, Ta and Hf formation of 3~15 atom %.
5, Fe-Co series target material as claimed in claim 4 wherein, has 10~200 permeability.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006128224 | 2006-05-02 | ||
JP2006128224A JP5037036B2 (en) | 2006-05-02 | 2006-05-02 | FeCo-based target material |
JP2006-128224 | 2006-05-02 |
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Publication Number | Publication Date |
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CN101067199A true CN101067199A (en) | 2007-11-07 |
CN101067199B CN101067199B (en) | 2010-11-10 |
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CN200710126640.7A Expired - Fee Related CN101067199B (en) | 2006-05-02 | 2007-04-27 | Fe-Co series target material and manufacturing method thereof |
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US (2) | US20080038145A1 (en) |
JP (1) | JP5037036B2 (en) |
CN (1) | CN101067199B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103080369A (en) * | 2010-07-23 | 2013-05-01 | 吉坤日矿日石金属株式会社 | Magnetic material sputtering target provided with groove in rear face of target |
CN111957579A (en) * | 2019-05-20 | 2020-11-20 | 米亚索乐装备集成(福建)有限公司 | Powder screening method and system |
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JP4953082B2 (en) * | 2006-10-10 | 2012-06-13 | 日立金属株式会社 | Co-Fe-Zr alloy sputtering target material and method for producing the same |
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JP2015190017A (en) * | 2014-03-28 | 2015-11-02 | 三菱マテリアル株式会社 | Softly magnetic thin film forming sputtering target |
JP6113817B2 (en) * | 2015-11-30 | 2017-04-12 | 山陽特殊製鋼株式会社 | An alloy for a soft magnetic thin film layer and a sputtering target material in a perpendicular magnetic recording medium, and a perpendicular magnetic recording medium having a soft magnetic thin film layer. |
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DE3935698C2 (en) * | 1988-10-26 | 1995-06-22 | Sumitomo Metal Mining Co | Alloy target for the production of a magneto-optical recording medium |
JPH04139707A (en) * | 1990-10-01 | 1992-05-13 | Kawasaki Steel Corp | Soft magnetic thin film having high saturation magnetic flux density |
JPH0574643A (en) * | 1991-09-13 | 1993-03-26 | Kawasaki Steel Corp | Manufacture of soft magnetic thin film |
KR960002611B1 (en) * | 1991-09-30 | 1996-02-23 | 가부시키가이샤 도시바 | Magnetic film |
JPH08311642A (en) * | 1995-03-10 | 1996-11-26 | Toshiba Corp | Magnetron sputtering method and sputtering target |
US5780175A (en) * | 1996-02-02 | 1998-07-14 | Lucent Technologies Inc. | Articles comprising magnetically soft thin films and methods for making such articles |
KR100348920B1 (en) * | 1998-09-03 | 2002-08-14 | 마쯔시다덴기산교 가부시키가이샤 | Magnetic film and method for producing the same |
US20020058159A1 (en) * | 2000-11-15 | 2002-05-16 | Yukiko Kubota | Soft magnetic underlayer (SUL) for perpendicular recording medium |
JP2002309353A (en) * | 2001-04-13 | 2002-10-23 | Fujitsu Ltd | Soft-magnetic membrane and magnetic head for recording using the membrane |
US7141208B2 (en) * | 2003-04-30 | 2006-11-28 | Hitachi Metals, Ltd. | Fe-Co-B alloy target and its production method, and soft magnetic film produced by using such target, and magnetic recording medium and TMR device |
US20060042938A1 (en) * | 2004-09-01 | 2006-03-02 | Heraeus, Inc. | Sputter target material for improved magnetic layer |
US7566508B2 (en) * | 2005-03-02 | 2009-07-28 | Seagate Technology Llc | Perpendicular media with Cr-doped Fe-alloy-containing soft underlayer (SUL) for improved corrosion performance |
JP2006265653A (en) * | 2005-03-24 | 2006-10-05 | Hitachi Metals Ltd | Fe-Co-BASED ALLOY TARGET MATERIAL AND METHOD FOR PRODUCING THE SAME |
US20070017803A1 (en) * | 2005-07-22 | 2007-01-25 | Heraeus, Inc. | Enhanced sputter target manufacturing method |
-
2006
- 2006-05-02 JP JP2006128224A patent/JP5037036B2/en not_active Expired - Fee Related
-
2007
- 2007-04-24 US US11/789,422 patent/US20080038145A1/en not_active Abandoned
- 2007-04-27 CN CN200710126640.7A patent/CN101067199B/en not_active Expired - Fee Related
-
2013
- 2013-02-11 US US13/764,182 patent/US20130149185A1/en not_active Abandoned
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103080369A (en) * | 2010-07-23 | 2013-05-01 | 吉坤日矿日石金属株式会社 | Magnetic material sputtering target provided with groove in rear face of target |
CN103080369B (en) * | 2010-07-23 | 2015-01-21 | 吉坤日矿日石金属株式会社 | Magnetic material sputtering target provided with groove in rear face of target |
CN102485948A (en) * | 2010-12-06 | 2012-06-06 | 北京有色金属研究总院 | FeCoTaZr alloy sputtering target material and manufacture method thereof |
CN111957579A (en) * | 2019-05-20 | 2020-11-20 | 米亚索乐装备集成(福建)有限公司 | Powder screening method and system |
Also Published As
Publication number | Publication date |
---|---|
JP2007297688A (en) | 2007-11-15 |
CN101067199B (en) | 2010-11-10 |
JP5037036B2 (en) | 2012-09-26 |
US20130149185A1 (en) | 2013-06-13 |
US20080038145A1 (en) | 2008-02-14 |
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