CN101059381A - Piezoelectric film cantilever beam type micro-force sensor micro-force loading device - Google Patents
Piezoelectric film cantilever beam type micro-force sensor micro-force loading device Download PDFInfo
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- CN101059381A CN101059381A CN 200710011275 CN200710011275A CN101059381A CN 101059381 A CN101059381 A CN 101059381A CN 200710011275 CN200710011275 CN 200710011275 CN 200710011275 A CN200710011275 A CN 200710011275A CN 101059381 A CN101059381 A CN 101059381A
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Abstract
The invention relates to a micro force load device of piezoelectric film suspension beam micro force sensor, belonging to sensor and test technical field, used for the static and quasi-static test and label of piezoelectric film suspension beam micro force sensor, wherein a micro force load device is composed of a one-dimension micro displacement table, a two-dimension micro displace table, a piezoelectric dual-crystal micro force generator, and a damping device. The one-dimension micro displacement table is composed of an X-axis micrometer element and a one-dimension micro displacement table base. The two-dimension micro displace table is composed of a Y-axis micrometer element, a Z-axis micrometer element, a two-dimension micro displacement table base, a support plate and a socket head cap screw. The piezoelectric dual-crystal micro force generator III is composed of a micro probe, a fixing block, two piezoelectric ceramic plates, an aluminum plate, a clamping plate and a socket head cap screw. The invention has simple and reliable structure, easy operation, and improved resolution of micro force loading system, to resolve the problems as instability and hard control of micro Newton force load.
Description
Technical field
The invention belongs to sensor and technical field of measurement and test, particularly the static state of piezoelectric film cantilever beam type micro-force sensor and quasi static test and demarcation.
Background technology
Piezoelectric film cantilever beam type micro-force sensor is based on a kind of novel sensor of MEMS technology, has been widely used in the fine measuring instruments such as scanning force microscopy.Whether reach desired technical performance index in order to detect force transducer, before using force transducer, must once comprehensively check it on technology and performance, promptly the sound attitude is demarcated.At present, adopt the vertical loading method that cantilever beam type micro-force sensor is carried out in the system of static and quasistatic demarcation, its small power generally is to be applied on the metal needle point by mass or spring, and the direction by mechanical guide rail confining force is perpendicular to sample surfaces then.The load mode of these two kinds of power, the size of power is at 0-20N, for resolution is the small power of little newton's magnitude, and there is following several respects shortcoming in its loading system: because the factor that machinery loading device exists additional force etc. to be difficult to eliminate, increased the instability and the control difficulty of loading force; These chargers are lower to the accuracy requirement of loading force, limited the demarcation of piezoelectric film cantilever beam type micro-force sensor in little newton's magnitude power.
Summary of the invention
The objective of the invention is to invent the small force loading device of a kind of Simple and Reliable, evaded the shortcoming that exists in the above-mentioned force loading device, improved the resolution of small force loading system.Utilize the micron dimension micrometer respectively on X-axis, Y-axis and Z-direction, accurately control the loading position of microprobe on piezoelectric film cantilever beam type micro-force sensor to be measured; Adopt the piezoelectric ceramic piece of drive power supply for piezoelectric ceramics excitation band microprobe, utilize the micrometric displacement of the inverse piezoelectric effect generation vertical direction of piezoelectric, microprobe is delivered to micrometric displacement on the piezoelectric film cantilever beam type micro-force sensor to be measured, realize the loading of small power, and then small power is demarcated.The charger of whole small power adopts the loading section rigid structure, utilizes micrometric displacement to realize the transmission of small power, and finishes the loading of little newton's magnitude power.Instability and the difficult problem of control that little newton's magnitude power loads have been solved.
The technical solution used in the present invention is a kind of micro-force loading device of piezoelectric film cantilever beam type micro-force sensor, by one-dimensional micro-displacement platform I, and two-dimentional micrometric displacement platform II, little forcer III of piezoelectric bimorph and shock attenuation device IV form; One-dimensional micro-displacement platform I is by X-axis micrometer assembly, one-dimensional micro-displacement platform base 6 is formed, wherein, X-axis micrometer assembly is by X-axis micrometer knob 1, dial sleeve 2 in the X-axis micrometer, socket head cap screw 3, X is to linear slide block 4, X-axis micrometer main shaft 5 is formed, the X-axis micrometer knob 1 that has EXT scale is connected with the threaded one end of X-axis micrometer main shaft 5, X-axis micrometer knob 1 and interior dial sleeve 2 clearance fit of X-axis micrometer, the X of dial sleeve 2 and band guide pin bushing is to linear slide block 4 interference fit in the X-axis micrometer, and be fixed on X on the guide pin bushing of linear slide block 4 by socket head cap screw 3, one-dimensional micro-displacement platform base 6 is shaped as perpendicular type, horizontal bottom is a guide pass, match to the end of linear slide block 4 guide pass with X, the vertical plane of one-dimensional micro-displacement platform base 6 is that Z is to the plane, be fixed in by 4 socket head cap screws 7 on the right plane of two-dimentional micrometric displacement platform base 18, in one-dimensional micro-displacement platform base 6 inner chambers, spring 30 is housed, spring 30 1 ends are fixed in one-dimensional micro-displacement platform base 6 inner chambers, and the other end and X are affixed to linear slide block 4;
Two dimension micrometric displacement platform II is by Y-axis micrometer assembly, Z axle micrometer assembly, two dimension micrometric displacement platform base 18, support plate 19 and socket head cap screw 20 are formed, wherein, Y-axis micrometer assembly is by Y-axis micrometer knob 8, dial sleeve 9 in the Y-axis micrometer, socket head cap screw 10, Y is to linear slide block 11, Y-axis micrometer main shaft 12 is formed, have on the Y-axis micrometer knob 8 of EXT scale and be connected with Y-axis micrometer main shaft 12 threaded one ends, Y-axis micrometer knob 8 and interior dial sleeve 9 clearance fit of Y-axis micrometer, dial sleeve 9 and the Y of band guide pin bushing be to linear slide block 11 interference fit in the Y-axis micrometer, and be fixed on Y on the guide pin bushing of linear slide block 11 by socket head cap screw 10; Z axle micrometer assembly is made up of to linear slide block 16, Z axle micrometer main shaft 17 dial sleeve 14, socket head cap screw 15, Z in Z axle micrometer knob 13, the Z axle micrometer, the Z axle micrometer knob 13 that has EXT scale is connected with Z axle micrometer main shaft 17 threaded one ends, Z axle micrometer knob 13 and interior dial sleeve 14 clearance fit of Z axle micrometer, dial sleeve 14 and the Z of band guide pin bushing be to linear slide block 16 interference fit in the Z axle micrometer, and be fixed on Z on the guide pin bushing of linear slide block 16 by socket head cap screw 15; Two dimension micrometric displacement platform base 18 is shaped as square, and horizontal direction is a Y-axis, and vertical direction is the Z axle, and two-dimentional micrometric displacement platform base 18 horizontal bottom and vertical plane are guide pass, respectively with Y to linear slide block 11 and Z to the guide pass of linear slide block 16 to cooperating; Along continuous straight runs and vertical direction are equipped with spring 31 and spring 32 respectively in the inner chamber of two-dimentional micrometric displacement platform base 18, one end of spring 31 and spring 32 is separately fixed in the inner chamber of two-dimentional micrometric displacement platform base 18, the other end of spring 31 and Y are affixed to linear slide block 11, the other end of spring 32 and Z are affixed to linear slide block 16, and two-dimentional micrometric displacement platform base 18 is affixed by socket head cap screw 20 with support plate 19;
The little forcer III of piezoelectric bimorph is by microprobe 21, fixed block 22, two piezoelectric ceramic pieces 23, aluminum sheet metal 24, intermediate plate 25, socket head cap screw 26 is formed, wherein, aluminum sheet metal 24 is sandwiched in the middle of two rectangular piezoelectric ceramic sheets 23, and it is bonding by bonding agent, probe 21 is installed in the center of fixed block 22 by bonding agent, fixed block 22 is bonded in an end of piezoelectric ceramic piece 23 by bonding agent, with the end of the little forcer III of intermediate plate 25 clamping piezoelectric bimorphs, and the little forcer III of piezoelectric bimorph is installed on the baseplane of one dimension displacement platform base 6 by socket head cap screw 26 away from probe 21; Two piezoelectric ceramic pieces 23 are drawn an electrode A jointly, and aluminum sheet metal 24 is drawn another electrode B;
Shock attenuation device IV is by piezoelectric film cantilever beam type micro-force sensor 27, objective table 28 and damped platform 29 are formed, on damped platform 29, be fixed with objective table 28, piezoelectric film cantilever beam type micro-force sensor 27 is installed on objective table 28, and piezoelectric film cantilever beam type micro-force sensor 27 free ends are aimed at microprobe 21.
Effect of the present invention is to drive micrometer with X-axis, Y-axis and Z axle respectively position and the exposure level of microprobe on cantilever beam type micro-force sensor to be measured to be carried out manually grand moving control, has controlled pre-load force well, measures and calibration range thereby enlarge; Adopt piezoelectric ceramic piece that microprobe is carried out automatically controlled fine motion, small power loading accuracy height can reach little newton's magnitude, has improved the stated accuracy of piezoelectric film cantilever beam type micro-force sensor; Manual adjustments and automatically controlled mode combine, and cooperate necessary surveying instrument and bracing or strutting arrangement, promptly can realize the demarcation of piezoelectric film cantilever beam type micro-force sensor under static and quasistatic, and be simple and reliable for structure, and easy to operate.
Description of drawings:
Accompanying drawing 1 is a piezoelectric film cantilever beam type micro-force sensor micro-force loading device front view.
Accompanying drawing 2 is a piezoelectric film cantilever beam type micro-force sensor micro-force loading device vertical view.
Accompanying drawing 3 is a piezoelectric film cantilever beam type micro-force sensor micro-force loading device right view.
Accompanying drawing 4 is the little forcer III of a piezoelectric bimorph structure enlarged drawing.
Wherein, dial sleeve in the 1-X axle micrometer knob, 2-X axle micrometer, 3-socket head cap screw, 4-X be to linear slide block, 5-X axle micrometer main shaft, 6-one-dimensional micro-displacement platform base, the 7-socket head cap screw, dial sleeve in the 8-Y axle micrometer knob, 9-Y axle micrometer, the 10-socket head cap screw, 11-Y is to linear slide block, 12-Y axle micrometer main shaft, 13-Z axle micrometer knob, dial sleeve in the 14-Z axle micrometer, 15-socket head cap screw, 16-Z be to linear slide block, 17-Z axle micrometer main shaft, 18-two dimension micrometric displacement platform base, the 19-support plate, 20-socket head cap screw, 21-microprobe, the 22-fixed block, the 23-piezoelectric ceramic piece, 24-aluminum sheet metal, 25-intermediate plate, the 26-socket head cap screw, the 27-piezoelectric film cantilever beam type micro-force sensor, 28-objective table, 29-damped platform, the 30-spring, the 31-spring, 32-spring, A-electrode A, the B-electrode B, I-one-dimensional micro-displacement platform, II-two dimension micrometric displacement platform, the little forcer of III-piezoelectric bimorph, the IV-shock attenuation device, X-X direction coordinate axis, Y-Y direction coordinate axis, Z-Z direction coordinate axis.
Embodiment:
Describe enforcement of the present invention in detail below in conjunction with accompanying drawing.At first, utilize body silicon process technology and Surface-micromachining process processing piezoelectric film cantilever beam type micro-force sensor 27.Cantilever beam type micro-force sensor 27 is fixed on the objective table 28, places on the damped platform 29 objective table 28 to be measured again.Measure and timing signal, be fixed on the damped platform 29 after all devices are integrated, cover all devices and device with hurricane globe.
Thisly be used for the micro-force loading device that piezoelectric film cantilever beam type micro-force sensor is demarcated, suit in the ultra-clean chamber work of 23 ℃ isoperibol.Be the blind hole of 1mm at first, microprobe 21 be fixed in the blind hole with bonding agent at square fixed block 22 center drill diameters; After treating that microprobe 21 fixes, with the fixed block 22 of band microprobe 21, at piezoelectric ceramic piece 23 non-electrode leads to client, bearing is positioned at the middle position at the about 5mm of piezoelectric ceramic piece 23 non-electrode leads to client place with adhesive; Treat fixed block 22 after fixing on the piezoelectric ceramic piece 23, use the piezoelectric ceramic piece 23 of intermediate plate 25 clamping band microprobes 21, and be fixed on the one-dimensional micro-displacement platform base 6 by 4 socket head cap screws 26; Electrode A and electrode B are drawn by lead, and link to each other with drive power supply for piezoelectric ceramics, realize voltage drive, and before the use, the little forcer III of piezoelectric bimorph need demarcate.Before carrying out the demarcation of static state and quasistatic, the piezoelectric effect of utilizing piezoelectric is produced the micrometric displacement of vertical direction, microprobe 21 is delivered to micrometric displacement on the piezoelectric film cantilever beam type micro-force sensor 27 to be measured, realizes the loading of small power, and then small power is tested and demarcated.The charger of whole small power adopts the loading section rigid structure, utilizes micrometric displacement to realize the transmission of small power, and finishes the loading of little newton's magnitude power.Package unit is fixed on the damped platform 29, carries out the location and the demarcation of microprobe 21 and pressure measurement conductive film cantilever beam type micro-force sensor 27 then.
During loading, regulating X-axis micrometer knob 1 driving X moves to the guide pass upper edge directions X of linear slide block 4 in one-dimensional micro-displacement platform base 6, regulate Y-axis micrometer knob 8 and Z axle micrometer knob 13 more respectively, driving Y respectively moves along Y and Z direction respectively on the guide pass of linear slide block 16 in two-dimentional micrometric displacement platform base 18 to linear slide block and Z, make microprobe 21 arrive piezoelectric film cantilever beam type micro-force sensors 27 directly over, make needle point over against the load(ing) point place, regulate Z axle micrometer knob 13 again, microprobe 21 has just been contacted with piezoelectric film cantilever beam type micro-force sensor 27 to be measured.Then according to the needs of testing and demarcating, by electrode A and electrode B, by the ceramic driving power supply the little forcer III of the piezoelectric bimorph of having demarcated is applied direct current or ac-excited voltage, by the loading section rigid structure, utilize micrometric displacement to realize the transmission of small power, and finish the loading of little newton's magnitude power, and then piezoelectric film cantilever beam type micro-force sensor 27 is carried out static state and quasi-static demarcation.
Claims (1)
1, a kind of micro-force loading device of piezoelectric film cantilever beam type micro-force sensor, by one-dimensional micro-displacement platform (I), two-dimentional micrometric displacement platform (II), little forcer of piezoelectric bimorph (III) and shock attenuation device (IV) are formed; It is characterized in that, one-dimensional micro-displacement platform (I) is by X-axis micrometer assembly, one-dimensional micro-displacement platform base (6) is formed, wherein, X-axis micrometer assembly is by X-axis micrometer knob (1), dial sleeve (2) in the X-axis micrometer, socket head cap screw (3), X is to linear slide block (4), X-axis micrometer main shaft (5) is formed, the X-axis micrometer knob (1) that has EXT scale is connected with the threaded one end of X-axis micrometer main shaft (5), X-axis micrometer knob (1) and interior dial sleeve (2) clearance fit of X-axis micrometer, the X of dial sleeve (2) and band guide pin bushing is to linear slide block (4) interference fit in the X-axis micrometer, and be fixed on X on the guide pin bushing of linear slide block (4) by socket head cap screw (3), one-dimensional micro-displacement platform base (6) is shaped as perpendicular type, horizontal bottom is a guide pass, match to the end guide pass of linear slide block (4) with X, the vertical plane of one-dimensional micro-displacement platform base (6) is that Z is to the plane, be fixed in by 4 socket head cap screws (7) on the right plane of two-dimentional micrometric displacement platform base (18), in one-dimensional micro-displacement platform base (6) inner chamber, spring (30) is housed, spring (30) one ends are fixed in one-dimensional micro-displacement platform base (6) inner chamber, and the other end and X are affixed to linear slide block (4);
Two dimension micrometric displacement platform (II) is by Y-axis micrometer assembly, Z axle micrometer assembly, two dimension micrometric displacement platform base (18), support plate (19) and socket head cap screw (20) are formed, wherein, Y-axis micrometer assembly is by Y-axis micrometer knob (8), dial sleeve (9) in the Y-axis micrometer, socket head cap screw (10), Y is to linear slide block (11), Y-axis micrometer main shaft (12) is formed, the Y-axis micrometer knob (8) that has EXT scale upward is connected with Y-axis micrometer main shaft (12) threaded one end, Y-axis micrometer knob (8) and interior dial sleeve (9) clearance fit of Y-axis micrometer, dial sleeve (9) and the Y of band guide pin bushing be to linear slide block (11) interference fit in the Y-axis micrometer, and be fixed on Y on the guide pin bushing of linear slide block (11) by socket head cap screw (10); Z axle micrometer assembly is made up of to linear slide block (16), Z axle micrometer main shaft (17) dial sleeve (14), socket head cap screw (15), Z in Z axle micrometer knob (13), the Z axle micrometer, the Z axle micrometer knob (13) that has EXT scale is connected with Z axle micrometer main shaft (17) threaded one end, Z axle micrometer knob (13) and interior dial sleeve (14) clearance fit of Z axle micrometer, dial sleeve (14) and the Z of band guide pin bushing be to linear slide block (16) interference fit in the Z axle micrometer, and be fixed on Z on the guide pin bushing of linear slide block (16) by socket head cap screw (15); Two dimension micrometric displacement platform base (18) is shaped as square, horizontal direction is a Y-axis, vertical direction is the Z axle, and the bottom surface of two-dimentional micrometric displacement platform base (18) is guide pass in level and vertical direction, respectively with Y to linear slide block (11) and Z to the guide pass of linear slide block (16) to cooperating; Along continuous straight runs and vertical direction are equipped with spring (31) and spring (32) respectively in the inner chamber of two-dimentional micrometric displacement platform base (18), one end of spring (31) and spring (32) is separately fixed in the inner chamber of two-dimentional micrometric displacement platform base (18), the other end of spring (31) and Y are affixed to linear slide block (11), the other end of spring (32) and Z are affixed to linear slide block (16), and two-dimentional micrometric displacement platform base (18) is connected by socket head cap screw (20) with support plate (19);
The little forcer of piezoelectric bimorph (III) is by microprobe (21), fixed block (22), two piezoelectric ceramic pieces (23), aluminum sheet metal (24), intermediate plate (25), socket head cap screw (26) is formed, wherein, aluminum sheet metal (24) is sandwiched in the middle of two rectangular piezoelectric ceramic sheets (23), and it is bonding by bonding agent, probe (21) is installed in the center of fixed block (22) by bonding agent, fixed block (22) is bonded in an end of piezoelectric ceramic piece (23) by bonding agent, with the end of the little forcer III of intermediate plate (25) clamping piezoelectric bimorph, and the little forcer III of piezoelectric bimorph is installed on the baseplane of one dimension displacement platform base (6) by socket head cap screw (26) away from probe (21); Two piezoelectric ceramic pieces (23) are drawn an electrode (A) jointly, and aluminum sheet metal (24) is drawn another electrode (B);
Shock attenuation device (IV) is by piezoelectric film cantilever beam type micro-force sensor (27), objective table (28) and damped platform (29) are formed, on damped platform (29), be fixed with objective table (28), piezoelectric film cantilever beam type micro-force sensor (27) is installed on objective table (28), and piezoelectric film cantilever beam type micro-force sensor (27) free end is aimed at microprobe (21).
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| CNB2007100112755A CN100507483C (en) | 2007-05-10 | 2007-05-10 | Piezoelectric film cantilever beam type micro-force sensor micro-force loading device |
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| CNB2007100112755A CN100507483C (en) | 2007-05-10 | 2007-05-10 | Piezoelectric film cantilever beam type micro-force sensor micro-force loading device |
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| CN100507483C CN100507483C (en) | 2009-07-01 |
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| CN101798226A (en) * | 2010-03-19 | 2010-08-11 | 中国电子科技集团公司第二研究所 | High-precision transporting device for processing multi-layer green ceramic chip |
| CN102359844A (en) * | 2011-07-27 | 2012-02-22 | 合肥工业大学 | Differential horizontal micro force loading device and loading method |
| CN102359843A (en) * | 2011-07-27 | 2012-02-22 | 合肥工业大学 | Differential type horizontal micro-force measuring device and measuring method thereof |
| CN102496391A (en) * | 2011-11-18 | 2012-06-13 | 江苏大学 | Assembled two-dimensional micro-displacement platform |
| CN102519646A (en) * | 2011-12-15 | 2012-06-27 | 大连理工大学 | Micro-power loading test method of nonlinear piezoelectric micro-energy collector |
| CN102889963A (en) * | 2011-07-27 | 2013-01-23 | 合肥工业大学 | Loading method of differential type horizontal micro-force loading device |
| CN104714123A (en) * | 2013-12-13 | 2015-06-17 | 旺矽科技股份有限公司 | Electrical property detection device |
| CN105628269A (en) * | 2015-12-25 | 2016-06-01 | 湖南师范大学 | Micro force and micro displacement amplification sensor |
| CN105720858A (en) * | 2016-04-18 | 2016-06-29 | 南京理工大学 | Friction force precisely adjustable impact type piezoelectric driving device |
| CN106370366A (en) * | 2016-08-19 | 2017-02-01 | 西北工业大学 | Angular rigidity testing bench based on piezoelectric translation table feeding |
| CN106783656A (en) * | 2016-12-05 | 2017-05-31 | 武汉新芯集成电路制造有限公司 | A kind of probe structure for WAT detection machines |
| CN107144397A (en) * | 2017-05-05 | 2017-09-08 | 中国计量科学研究院 | Adding mechanism for the small force value standard set-up of dead weight type safe |
| CN111044180A (en) * | 2019-12-12 | 2020-04-21 | 华侨大学 | Continuous radial pressure device of semiconductor substrate piece |
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| CN115342866A (en) * | 2022-10-18 | 2022-11-15 | 中国空气动力研究与发展中心高速空气动力研究所 | Piezoelectric ceramic actuator detection device and system |
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| CN101798226A (en) * | 2010-03-19 | 2010-08-11 | 中国电子科技集团公司第二研究所 | High-precision transporting device for processing multi-layer green ceramic chip |
| CN102889963A (en) * | 2011-07-27 | 2013-01-23 | 合肥工业大学 | Loading method of differential type horizontal micro-force loading device |
| CN102359844A (en) * | 2011-07-27 | 2012-02-22 | 合肥工业大学 | Differential horizontal micro force loading device and loading method |
| CN102359843A (en) * | 2011-07-27 | 2012-02-22 | 合肥工业大学 | Differential type horizontal micro-force measuring device and measuring method thereof |
| CN102889963B (en) * | 2011-07-27 | 2014-08-06 | 合肥工业大学 | Loading method of differential type horizontal micro-force loading device |
| CN102359844B (en) * | 2011-07-27 | 2013-01-09 | 合肥工业大学 | Differential horizontal micro force loading device and loading method |
| CN102359843B (en) * | 2011-07-27 | 2013-01-09 | 合肥工业大学 | Differential type horizontal micro-force measuring device and measuring method thereof |
| CN102496391A (en) * | 2011-11-18 | 2012-06-13 | 江苏大学 | Assembled two-dimensional micro-displacement platform |
| CN102519646A (en) * | 2011-12-15 | 2012-06-27 | 大连理工大学 | Micro-power loading test method of nonlinear piezoelectric micro-energy collector |
| CN104714123A (en) * | 2013-12-13 | 2015-06-17 | 旺矽科技股份有限公司 | Electrical property detection device |
| CN104714123B (en) * | 2013-12-13 | 2018-03-20 | 旺矽科技股份有限公司 | Electrical property detection device |
| CN105628269A (en) * | 2015-12-25 | 2016-06-01 | 湖南师范大学 | Micro force and micro displacement amplification sensor |
| CN105628269B (en) * | 2015-12-25 | 2019-01-18 | 湖南师范大学 | A kind of micro- power and micro-displacement amplify sensor |
| CN105720858A (en) * | 2016-04-18 | 2016-06-29 | 南京理工大学 | Friction force precisely adjustable impact type piezoelectric driving device |
| CN106370366A (en) * | 2016-08-19 | 2017-02-01 | 西北工业大学 | Angular rigidity testing bench based on piezoelectric translation table feeding |
| CN106370366B (en) * | 2016-08-19 | 2019-02-01 | 西北工业大学 | A kind of angular rigidity testboard based on the feeding of piezoelectricity translation stage |
| CN106783656A (en) * | 2016-12-05 | 2017-05-31 | 武汉新芯集成电路制造有限公司 | A kind of probe structure for WAT detection machines |
| CN106783656B (en) * | 2016-12-05 | 2019-11-29 | 武汉新芯集成电路制造有限公司 | A kind of probe structure for WAT detection machine |
| CN107144397A (en) * | 2017-05-05 | 2017-09-08 | 中国计量科学研究院 | Adding mechanism for the small force value standard set-up of dead weight type safe |
| CN107144397B (en) * | 2017-05-05 | 2020-05-05 | 中国计量科学研究院 | Loading mechanism for dead weight type micro force value standard device |
| CN111044180A (en) * | 2019-12-12 | 2020-04-21 | 华侨大学 | Continuous radial pressure device of semiconductor substrate piece |
| CN111982676A (en) * | 2020-07-28 | 2020-11-24 | 宁波大学 | Micro-force loading device |
| CN111982676B (en) * | 2020-07-28 | 2023-09-12 | 宁波大学 | Micro-force loading device |
| CN115342866A (en) * | 2022-10-18 | 2022-11-15 | 中国空气动力研究与发展中心高速空气动力研究所 | Piezoelectric ceramic actuator detection device and system |
| CN115342866B (en) * | 2022-10-18 | 2023-01-31 | 中国空气动力研究与发展中心高速空气动力研究所 | Piezoelectric ceramic actuator detection device and system |
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| CN100507483C (en) | 2009-07-01 |
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