CN101054715A - Electrochemical copper removing solution - Google Patents
Electrochemical copper removing solution Download PDFInfo
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- CN101054715A CN101054715A CN 200710084279 CN200710084279A CN101054715A CN 101054715 A CN101054715 A CN 101054715A CN 200710084279 CN200710084279 CN 200710084279 CN 200710084279 A CN200710084279 A CN 200710084279A CN 101054715 A CN101054715 A CN 101054715A
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- copper
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- stripping
- electrochemical
- copper stripping
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Abstract
The present invention relates to a solution for electrochemistry copper stripping, belongs to the chemical field, and is characterized in that said electrochemistry copper stripping solution contains a complexant of ethylene diamine of 100-300 g/L, a corrosion inhibitor of triethanolamine of 40-120 g/L and of erinitrit of 50-150 g/L, and an electrolyte of potassium nitrate of 50-150 g/L.The invention possesses the advantages that the discharging problem of Cr6+ containing waster water does not exist in the copper layer stripping by using said copper stripping solution, non-corroding on matrix metal occurs, the electrical current efficiency is high, the copper stripping time is shout, the productivity effect is high, and the adjustment and regeneration of the copper stripping solution is convenient.
Description
Technical field
The present invention relates to a kind of solution of electrochemical copper removing, belong to chemical field.
Background technology
The stripping of copper plate generally can be divided into chemical method and electrochemical process, and the chemical method of stripping copper plate mainly contains following several: 1) chromic anhydride is main method; 2) m-nitrobenzene sodium sulfonate and NaCN are method main and heating; 3) dense HNO
3Method; 4) H
2O
2The method of-ammonium citrate.Cr in these methods
6+, CN
-, harmful, dense HNO
3The tobacco contaminate environment is arranged, and easily to matrix production corrosion, and H
2O
2--the used time of copper of moving back of ammonium citrate method is long, and production efficiency is low, and stability of solution is poor, the cost height.
The electrochemical process of stripping copper plate has following several: 1) chromic anhydride is main method; 2) ammonia salt method; 3) Trisodium Citrate-NaNO
2Method.Method 1) Cr of containing is arranged
6+Waste water, country forbids the problem of discharging; Method 2), 3) though solved the problem of environment protection emission, citric acid-NaNO
2Work-ing life is short, easily matrix is produced corrosion after moving back the copper ability drop; And that the ammonia salt method of using is now moved back the current efficiency of copper solutions is low, and it is long to move back the copper time, and production efficiency is low, can not satisfy demand of practical production.
Summary of the invention
To the objective of the invention is some shortcomings of existing in the above-mentioned prior art in order overcoming, a kind of electrochemical copper removing solution of being made up of complexing agent, inhibiter and ionogen to be provided.Moving back copper solutions with this carries out the stripping of copper layer and does not exist and contain Cr
6+The emission problem of waste water, matrix metal is not corroded, the current efficiency height, it is short to move back the copper time, the production efficiency height, the adjustment and the regeneration of moving back copper solutions are convenient.
Electrochemical copper removing solution of the present invention,--quadrol 100g/L～300g/L, inhibiter--trolamine 40g/L～120g/L and Sodium Nitrite 50g/L～150g/L, ionogen--saltpetre 50g/L～150g/L that contains complexing agent.Condition when moving back copper is: room temperature, voltage 4V～10V, electric current 1A/dm
2～5A/dm
2
Quadrol is complexing agent in electrochemical copper removing solution, with the Cu of anode electrochemical dissolving generation
2+Form complex compound, and kept the stable of electrochemical copper removing solution effectively, guaranteed carrying out smoothly of electrochemical copper removing, the increase of quadrol concentration can make moves back speeding up of copper, but with the increase of quadrol content, the solution conductivity ability reduces, and the speed of moving back copper is descended.As a kind of cathodic inhibiter, the protection part base solid is not corroded trolamine in electrolytic solution.It is bigger that trolamine is led influence to the electricity of electrolytic solution, increases with trolamine content, and the solution conductivity ability significantly reduces, and makes to move back the decline of copper speed.Sodium Nitrite has dual function in electrochemical copper removing solution, the one, as the positive polarity inhibiter, the copper layer of strip part is eliminated after, protection part base solid metal is not corroded; On the other hand as conducting salt, move back the conductivity of copper solutions with improvement,, increase the conductivity that Sodium Nitrite also can improve solution under certain condition, help improving the copper speed of moving back.Saltpetre is conducting salt in electrochemical copper removing solution, and it can improve the current efficiency of electrochemical copper removing solution effectively, and within the specific limits, generally with the increase of potassium nitrate content, conductive capability obviously improves, and has improved the speed of moving back copper greatly.
Advantage of the present invention is: move back copper solutions with this and carry out the stripping of copper layer and do not exist and contain Cr
6+The emission problem of waste water, matrix metal is not corroded, the current efficiency height, it is short to move back the copper time, the production efficiency height, the adjustment and the regeneration of moving back copper solutions are convenient.
Embodiment
Embodiment 1:
Prepare the copper solutions of moving back of 2000L, add 1200L water earlier in moving back the copper groove, gradation adds 200kg Sodium Nitrite, 200kg saltpetre again, stir while adding, treat to dissolve fully the back and add 400kg quadrol, 160kg trolamine, water is mended to 2000L, and stirring gets final product.Move back copper and carry out at ambient temperature, voltage 6V, electric current 3A/dm
2Move back the copper time and adjust, till stripping totally by copper layer thickness.Protection copper plate to underproof copper plate, heat-treatment part strips, the efficient height, and stripping is clean, and matrix metal is not had corrosion.
Embodiment 2:
Prepare the copper solutions of moving back of 2000L, add 1200L water earlier in moving back the copper groove, gradation adds 100kg Sodium Nitrite, 300kg saltpetre again, stir while adding, treat to dissolve fully the back and add 200kg quadrol, 240kg trolamine, water is mended to 2000L, and stirring gets final product.Move back copper and carry out at ambient temperature, voltage 4V, electric current 5A/dm
2Move back the copper time and adjust, till stripping totally by copper layer thickness.Protection copper plate to underproof copper plate, heat-treatment part strips, the efficient height, and stripping is clean, and matrix metal is not had corrosion.
Embodiment 3:
Prepare the copper solutions of moving back of 2000L, add 1200L water earlier in moving back the copper groove, gradation adds 300kg Sodium Nitrite, 100kg saltpetre again, stir while adding, treat to dissolve fully the back and add 600kg quadrol, 80kg trolamine, water is mended to 2000L, and stirring gets final product.Move back copper and carry out at ambient temperature, voltage 10V, electric current 1A/dm
2Move back the copper time and adjust, till stripping totally by copper layer thickness.Protection copper plate to underproof copper plate, heat-treatment part strips, the efficient height, and stripping is clean, and matrix metal is not had corrosion.
Claims (1)
1, a kind of solution of electrochemical copper removing is characterized in that: electrochemical copper removing solution contains complexing agent--quadrol 100g/L～300g/L, inhibiter--trolamine 40g/L～120g/L and Sodium Nitrite 50g/L～150g/L, ionogen--saltpetre 50g/L～150g/L.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100842796A CN100567589C (en) | 2007-02-26 | 2007-02-26 | A kind of solution of electrochemical copper removing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100842796A CN100567589C (en) | 2007-02-26 | 2007-02-26 | A kind of solution of electrochemical copper removing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101054715A true CN101054715A (en) | 2007-10-17 |
| CN100567589C CN100567589C (en) | 2009-12-09 |
Family
ID=38794763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2007100842796A Active CN100567589C (en) | 2007-02-26 | 2007-02-26 | A kind of solution of electrochemical copper removing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100567589C (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102234833A (en) * | 2010-04-20 | 2011-11-09 | 深圳富泰宏精密工业有限公司 | Stripping solution and method for electrolytically removing chromium carbide film |
| CN102560495A (en) * | 2011-12-16 | 2012-07-11 | 成都泛华航空仪表电器有限公司 | Coating stripping technology method for tin-nickel alloy coating |
| CN105239147A (en) * | 2015-10-01 | 2016-01-13 | 常州市奥普泰科光电有限公司 | Preparation method of environment-friendly spraying electrolysis stripping solution |
| CN105525335A (en) * | 2016-02-01 | 2016-04-27 | 无锡市雷博电子有限公司 | Electro-corrosion marking liquid and preparation method thereof |
| CN106149042A (en) * | 2016-06-24 | 2016-11-23 | 惠州市博美环保新材料有限公司 | A kind of kirsite electrolysis stripping copper agent |
| CN106167914A (en) * | 2016-06-24 | 2016-11-30 | 惠州市博美环保新材料有限公司 | A kind of magnesium alloy release agent for electrolytic |
| CN109972194A (en) * | 2019-03-28 | 2019-07-05 | 佛山市兴中达化工实业有限公司 | One kind is de- to hang agent and its application |
| CN114108067A (en) * | 2021-10-21 | 2022-03-01 | 中国航发贵州红林航空动力控制科技有限公司 | Environment-friendly alkaline chromium-free electrolytic copper removal method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4263113A (en) * | 1980-06-02 | 1981-04-21 | Sprague Electric Company | Electrochemical removal of surface copper from aluminum foil |
-
2007
- 2007-02-26 CN CNB2007100842796A patent/CN100567589C/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102234833A (en) * | 2010-04-20 | 2011-11-09 | 深圳富泰宏精密工业有限公司 | Stripping solution and method for electrolytically removing chromium carbide film |
| CN102234833B (en) * | 2010-04-20 | 2013-05-29 | 深圳富泰宏精密工业有限公司 | Stripping solution and method for electrolytically removing chromium carbide film |
| CN102560495A (en) * | 2011-12-16 | 2012-07-11 | 成都泛华航空仪表电器有限公司 | Coating stripping technology method for tin-nickel alloy coating |
| CN105239147A (en) * | 2015-10-01 | 2016-01-13 | 常州市奥普泰科光电有限公司 | Preparation method of environment-friendly spraying electrolysis stripping solution |
| CN105525335A (en) * | 2016-02-01 | 2016-04-27 | 无锡市雷博电子有限公司 | Electro-corrosion marking liquid and preparation method thereof |
| CN106149042A (en) * | 2016-06-24 | 2016-11-23 | 惠州市博美环保新材料有限公司 | A kind of kirsite electrolysis stripping copper agent |
| CN106167914A (en) * | 2016-06-24 | 2016-11-30 | 惠州市博美环保新材料有限公司 | A kind of magnesium alloy release agent for electrolytic |
| CN109972194A (en) * | 2019-03-28 | 2019-07-05 | 佛山市兴中达化工实业有限公司 | One kind is de- to hang agent and its application |
| CN114108067A (en) * | 2021-10-21 | 2022-03-01 | 中国航发贵州红林航空动力控制科技有限公司 | Environment-friendly alkaline chromium-free electrolytic copper removal method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100567589C (en) | 2009-12-09 |
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Owner name: INNER MONGOLIA FIRST MACHINERY GROUP CO., LTD. Free format text: FORMER NAME: INNER MONGOLIA FIRST MACHINERY (GROUP) CO., LTD. |
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Address after: 014032 Baotou Qingshan District Inner Mongolia first machinery manufacturing (Group) Co., Ltd. (the Inner Mongolia Autonomous Region) Patentee after: Inner Mongolia First Machinery Group Corporation Address before: 014032 Baotou Qingshan District Inner Mongolia first machinery manufacturing (Group) Co., Ltd. (the Inner Mongolia Autonomous Region) Patentee before: Inner Mongolia First Machinery Group Corp. |
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Effective date of registration: 20161209 Address after: 014032 Baotou rare earth hi tech Industrial Development Zone, the first functional area of the Inner Mongolia Autonomous Region Patentee after: Baotou Beifang Venture Co., Ltd. Address before: 014032 Baotou Qingshan District Inner Mongolia first machinery manufacturing (Group) Co., Ltd. (the Inner Mongolia Autonomous Region) Patentee before: Inner Mongolia First Machinery Group Corporation |
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Address after: 014032, Baotou, Inner Mongolia two mailbox technology and Information Technology Department Patentee after: Inner Mongolia First Machinery Group Limited by Share Ltd Address before: 014032 Baotou rare earth hi tech Industrial Development Zone, the first functional area of the Inner Mongolia Autonomous Region Patentee before: Baotou Beifang Venture Co., Ltd. |