CN101009248A - Making method of the film transistor array and its structure - Google Patents
Making method of the film transistor array and its structure Download PDFInfo
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- CN101009248A CN101009248A CN 200610001698 CN200610001698A CN101009248A CN 101009248 A CN101009248 A CN 101009248A CN 200610001698 CN200610001698 CN 200610001698 CN 200610001698 A CN200610001698 A CN 200610001698A CN 101009248 A CN101009248 A CN 101009248A
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Abstract
A manufacturing method of film transistor array includes steps as following. Providing base plate, the base plate comprises gate electrode layer, gate insulated layer and silicon layer. The gate electrode layer, gate insulated layer and silicon layer are patterned to define the grid area, grid line and grid line connection area. The protecting layer is the whole base plate. The protecting layer is patterned to make two contacting windows are in the protecting layer and the silicon layer of the grid area, the protecting layer of part area of the grid line and the protecting layer of the grid line connection area are eliminated. Ion distributing layer and metal layer are in the whole base plate. The Ion distributing layer and metal layer are patterned to form source electrode area, drain area, data wire, data wire connection area and the second layer grid line connection area. The pixel electrode is formed on the protecting layer and electric connected with the drain area. With this method, the film transistor array can be produced just need four photoengraving mask.
Description
Technical field
The present invention relates to a kind of manufacture method and structure thereof of thin film transistor (TFT) array, and be particularly related to a kind of manufacture method and structure thereof of thin film transistor (TFT) array of use four road photo etched mask operations.
Background technology
Along with flat-panel monitor research and development development, the price of Thin Film Transistor-LCD wherein is more and more lower, and occupation rate of market also increases day by day.Therefore, how reducing manufacturing cost is present panel vendor problem the most deeply concerned.The thin film transistor (TFT) array of existing Thin Film Transistor-LCD need use five photo etched masks, and promptly five road gold-tinteds (photoetching etching) operation can be finished, and each road gold-tinted operation comprises photoresist coating, exposure, development and photoresist and removes operation.Therefore, if can save the gold-tinted step one, then can significantly reduce the technology cost, and significantly improve productive rate.In addition, display panel substrate is increasing, and photo etched mask is also more and more expensive, reduces by a photo etched mask, also can reduce the photo etched mask cost.
Fig. 1 is the present general profile that uses the thin film transistor (TFT) array that five road photo etched masks make.On substrate 100, form metal level earlier, then use the first road photo etched mask that metal level is carried out patterning, to form the electrode 104 of gate electrode 102 and storage capacitors.Then, on substrate 100, deposit gate insulation layer (silicon nitride) 106, amorphous silicon 108 and N
+Cloth is planted layer 110, then re-uses the second road photo etched mask to amorphous silicon 108 and N
+Cloth is planted layer 110 and is carried out patterning.Then carry out the deposition of ito transparent electrode and define ito transparent electrode shown in Figure 1 114 with the 3rd road photo etched mask.Then, define source/drain pattern 112 with the 4th road photo etched mask.At last, carry out the deposition of protective layer (passivation layer), and use the 5th road photo etched mask to define the pattern of protective layer 116.Under this known thin-film transistor structure, five road photo etched masks are unavoidable, but also cause the rising of cost.
In order to reduce the number of photo etched mask, there is several different methods to be suggested.Wherein a kind of half mode (half tone) or grey mode (gray tone) photo etched mask of being to use.This kind method mainly is in the end to be used as two photo etched masks with one and half modes or grey mode photo etched mask to use, and after half accent exposure and developing, etches gate regions, then continues to etch source/drain regions again.But this kind photo etched mask costs an arm and a leg, though can reduce photo etched mask, need to increase the operation of one etching photoresist, make manufacturing cost can't reduce too much.In addition, when using half mode or grey mode photo etched mask the control of pattern comparatively difficult, this can produce problems such as scale error again, and makes the qualification rate step-down.
Fig. 2 A to 2D is depicted as U.S. Pat Pat.No.6, the technology that is disclosed for 891, No. 196, and it is the another kind of technological process profile that uses four road photo etched masks to make thin film transistor (TFT) arrays.Shown in Fig. 2 A, on substrate 201, form earlier metal level, insulating barrier and silicon layer, define the island areas of gate electrode 202, gate insulation layer 203 and silicon layer 204 again with photo etched mask.Then, form protective layer 205, and define source/drain 206.Then, form protective layer 207, and with photo etched mask patterning protective layer 205,207.Then, form the ITO electrode layer, with photo etched mask ITO electrode layer 208 is carried out patterning again.In the method, the part of ITO layer 208 is as general pixel electrode, and another part is also as the contact electrode of source/drain.But the method carries out being to use when cloth is planted more special technology to amorphous silicon, that is uses high-temperature plasma to carry out the diffusion of phosphorus, to form N
+Cloth is planted layer.Therefore, though the photo etched mask number has minimizing, N
+Cloth is planted the formation of layer need use more special mode, and the structure of whole thin-film transistor also complicates.
Therefore, how the photo etched mask number is reduced and can use general technology, just become the target that everybody makes great efforts in the field for this reason to reduce cost.
Summary of the invention
In view of the above problems, the objective of the invention is to propose a kind of manufacture method and structure thereof of thin film transistor (TFT) array, it can reduce the cost of technology and simplify technology.
Another object of the present invention is manufacture method and the structure thereof that proposes a kind of thin film transistor (TFT) array, and it can make technological process have more elasticity.
For reaching above-mentioned purpose, the present invention proposes a kind of manufacture method of thin film transistor (TFT) array, and it comprises following steps.Substrate is provided, is formed with gate electrode layer, gate insulation layer and silicon layer on this substrate.This gate electrode layer, this gate insulation layer and this silicon layer are carried out patterning, to define gate regions, gate line and gate line Wiring area.Form protective layer on whole base plate.Protective layer is carried out patterning, so that in protective layer and be positioned at and form two contact holes on this silicon layer of gate regions, and remove the protective layer on subregional protective layer in gate line top and the gate line Wiring area.Form implanting ions layer and metal level on whole this substrate.Implanting ions layer and metal level are carried out patterning, to form source area, drain region, data wire, data wire Wiring area and second layer gate line Wiring area.Forming pixel electrode is electrically connected on protective layer and with the drain region.
According to an embodiment of the present invention, aforesaid manufacture method also comprises etching step, in order to exposed silicon layer is carried out etching.In addition, aforementioned gate line Wiring area is formed by gate electrode layer, gate insulation layer, silicon layer, implanting ions layer and metal layer stack.Gate insulation layer can for example be silicon nitride layer or silicon oxide layer.When silicon layer was polysilicon layer, the implanting ions layer was that P type or N type cloth are planted layer.When silicon layer was amorphous silicon layer, the implanting ions layer was generally N type cloth and plants layer.Aforementioned pixel electrode can for example be transparency electrode or metal electrode.
In addition, the present invention also proposes a kind of manufacture method of thin film transistor (TFT) array, and it may further comprise the steps.Substrate is provided, is formed with gate electrode layer, gate insulation layer and silicon layer on this substrate.This gate electrode layer, this gate insulation layer and this silicon layer are carried out patterning, to define gate regions, gate line and gate line Wiring area.Form protective layer on whole base plate, and form photoresist layer on protective layer.Protective layer and photoresist layer are carried out patterning, so that in protective layer and photoresist and be positioned at and form two contact holes on the silicon layer of gate regions, and remove protective layer and photoresist on subregional protective layer in gate line top and the gate line Wiring area.The silicon layer that exposes is carried out the implanting ions step, in the silicon layer that exposes of gate regions, to form source electrode and drain electrode.Form metal level on whole base plate, and metal level is carried out patterning formation source metal, drain metal layer, data wire, data wire Wiring area and second layer gate line Wiring area.Forming pixel electrode is electrically connected on protective layer and with the metal level that is connected drain electrode.
According to an embodiment of the present invention, aforesaid manufacture method also comprises etching step, in order to exposed silicon layer is carried out etching.In addition, aforementioned gate line Wiring area is by gate electrode layer, gate insulation layer, silicon layer, form with metal layer stack.Gate insulation layer can for example be silicon nitride layer or silicon oxide layer.In above-mentioned manufacture method, when silicon layer was polysilicon layer, the implanting ions step was the implanting ions that carries out P type or N type; When silicon layer was amorphous silicon layer, the implanting ions step is generally carried out N type cloth and plants layer.Aforementioned pixel electrode can be transparency electrode or metal electrode.
In addition, the present invention also proposes a kind of array architecture of thin film transistor, and it comprises: substrate is distinguished into gate line Wiring area and gate regions on this substrate; Stacked structure is positioned on the gate regions and gate line Wiring area of substrate, and wherein stacked structure is made of gate electrode layer, gate insulation layer and silicon layer; Protective layer is covered on the substrate and exposes the stacked structure of gate line Wiring area, and the protective layer that is positioned on the stacked structure of gate regions also has two contact holes, to expose this silicon layer; The implanting ions layer is covered on the protective layer and corresponding on the stacked structure of gate regions and be covered on this stacked structure of gate line Wiring area, wherein the implanting ions layer also is connected with silicon layer; Metal level is covered on the implanting ions layer, and the metal level that wherein is positioned at the gate line Wiring area is as second layer gate line Wiring area, and the metal level that is positioned at gate regions is respectively as source electrode and drain electrode; And pixel electrode layer, be covered on the protective layer and be connected with the implanting ions layer with metal level as drain electrode.
According to one embodiment of the present invention, when silicon layer was polysilicon layer, the implanting ions layer was the implanting ions layer of P type or N type; When silicon layer was amorphous silicon layer, the implanting ions layer was generally N type implanting ions layer.In addition, aforementioned pixel electrode can be transparency electrode or metal electrode.
In addition, the present invention also proposes a kind of array architecture of thin film transistor, and it comprises: substrate is distinguished into gate line Wiring area and gate regions on the substrate; Stacked structure is positioned on the gate regions and gate line Wiring area of substrate, and wherein stacked structure is made of gate electrode layer, gate insulation layer and silicon layer; Protective layer is covered on the substrate and exposes this stacked structure of gate line Wiring area, and the protective layer that is positioned on the stacked structure of gate regions also has two contact holes, and to expose silicon layer, the silicon layer that wherein comes out also carries out implanting ions; Metal level is covered on the silicon layer that exposes, and the metal level that wherein is positioned at the gate line Wiring area is as second layer gate line Wiring area, and the metal level that is positioned at gate regions is respectively as source electrode and drain electrode; And pixel electrode layer, be covered on the protective layer and be connected with metal level as drain electrode.
According to an embodiment of the present invention, when silicon layer was polysilicon layer, silicon layer was the implanting ions that carries out P type or N type; When silicon layer was amorphous silicon layer, silicon layer was generally and carries out N type implanting ions.In addition, pixel electrode is transparency electrode or metal electrode.
In sum; the present invention proposes the set-up mode of new array architecture of thin film transistor; can carry out patterning to gate electrode layer, gate insulation layer and silicon layer simultaneously with a slice photo etched mask; define gate regions, gate line and gate line Wiring area; and, get final product so the photo etched mask number can be dropped to 4 roads with data wire, drain metal layer, source metal top as for protective layer.Add silicon layer is adopted general general implanting ions mode, but not special high-temperature plasma diffusion technology, so cost can more reduce.In addition, cooperate structure of the present invention, processing step can flexibly be replaced, and has more the degree of freedom.
State with other purpose, feature and advantage and can become apparent on the present invention for allowing, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Fig. 1 is the present general profile that uses the thin film transistor (TFT) array that five road photo etched masks make.
Fig. 2 A to 2D is the process section that a kind of known use four road photo etched masks are made thin film transistor (TFT) array.
Fig. 3 is according to the resulting thin film transistor (TFT) array profile of the process of the embodiment of the invention one.
Fig. 4 A to 4D is according to the process method flow chart shown in the embodiment one, and wherein the profile of technological process is represented in each figure left side, and right-hand part is represented employed photo etched mask schematic diagram.
Fig. 4 E is the variation example of embodiment one.
Fig. 5 is the generalized section for the gate line contact zone of the thin film transistor (TFT) array of Fig. 3.
Fig. 6 is according to the resulting thin film transistor (TFT) array profile of the process of the embodiment of the invention two.
Fig. 7 A to 7D is according to the process method flow chart shown in the embodiment two, and wherein the profile of technological process is represented in each figure left side, and right-hand part is represented employed photo etched mask schematic diagram.
Fig. 7 E is the variation example of embodiment one.
Fig. 8 is the generalized section of gate line contact zone of the thin film transistor (TFT) array of Fig. 6.
The main element description of symbols
10 substrates, 12 gate electrode layers
14 gate insulation layers, 16 silicon layers
20 protective layers, 24 contact holes
30 implanting ions layers, 34 metal level
30b, 34b source region 30a, 34a drain region
40 pixel electrode layers
34c metal level (gate line)
26 contact hole PR photoresists
50a, 50b source/drain 52 metal levels
52a data wire part
52c metal level (gate line)
100 substrates, 102 gate electrodes
104 storage capacitors electrodes, 106 gate insulation layers
108 amorphous silicon layer 110N
+Cloth is planted layer
112 source/drain pattern 114ITO transparency electrodes
116 protective layers
201 substrates, 202 gate electrodes
203 gate insulation layers, 204 silicon layers
205 protective layers, 206 source/drains
207 protective layer 208ITO electrode layers
Embodiment
Notion of the present invention mainly is to utilize four road photo etched masks to simplify the manufacture method of thin film transistor (TFT) array, to reduce cost.In addition, the change on the four road photo etched mask operation fit structures can make technology more simplify and cost more reduces.Below just be used as the notional illustrative examples of the present invention with several embodiment.
Embodiment one
Then, use Fig. 3, Fig. 4 A to 4D and Fig. 5 that the first embodiment of the present invention is described.Fig. 3 is according to the resulting thin-film transistor profile of the process flow process of embodiment one.Fig. 4 A to 4D is the process method flow chart according to embodiment one, and wherein the profile of technological process is represented in each figure left side, and right-hand part is represented employed display array design diagram.The left side of Fig. 5 is the gate pad (gate pad) of the thin-film transistor of Fig. 3 or the generalized section that claims gate line Wiring area (gate line contact area).
At first, with reference to Fig. 4 A, on substrate 10, form gate electrode layer 12, gate insulation layer 14 and silicon layer 16.Substrate 10 can be any operable substrate of glass substrate, plastic base, bendable substrate, silicon substrate, metal substrate or the like.Gate electrode layer 12 can use metal or polysilicon etc. to have the material of conductivity, and 14 of gate insulation layers can use any material with electric insulation, and for example silicon nitride or silica or the like are not done special qualification at this.16 of silicon layers can for example be amorphous silicon or polysilicon etc.Then, use photo etched mask M1 to come aforementioned gate electrode layer 12, gate insulation layer 14 are carried out patterning with silicon layer 16, form the section shape as Fig. 4 A left side, it is roughly island stack layer structure.The present invention first photo etched mask M1 mainly contain be used for defining gate regions (12,14,16), gate line with gate line Wiring area G.
Afterwards, with reference to Fig. 4 B, on whole base plate 10, form protective layer 20.The method that protective layer 20 can use the deposition of any semiconductor fabrication process or smear or the like does not limit especially at this.Then, use second photo etched mask M2, protective layer 20 is carried out patterning, for example go up steps such as photoresist, exposure, development and etching.By this, be formed on the contact hole 24 in the protective layer 20, and remove out the protective layer of part of grid pole line top and the protective layer of gate line Wiring area G.Silicon layer 16 under this contact hole 24 exposes.
Then, the 3rd photo etched mask of the present invention is described.Shown in Fig. 4 C, after forming above-mentioned contact hole and removing the protective layer of protective layer and gate line Wiring area G above the part of grid pole line, formation implanting ions layer 30 for example is N at this on whole protecting layer 20
+The implanting ions layer.In addition, when aforementioned silicon layer 16 was polysilicon layer, implanting ions layer 30 can be the implanting ions layer of P type or N type.When aforementioned silicon layer 16 is amorphous silicon layer, then generally be the implanting ions layer of N type.
Then be to form on the implanting ions layer 30 metal level 34.Afterwards, use the 3rd photo etched mask M3 of the present invention to carry out patterning, this photo etched mask M3 is used for defining data wire, data wire Wiring area, regions and source, second layer gate line Wiring area.
After using photo etched mask M3 to carry out patterning, for example pass through resist exposure, development and etched step, define shown source region, Fig. 4 C left side (30b, 34b), drain region (30a, 34a).Left side metal level 34b shown in Fig. 4 C left side half promptly can be as the data wire of thin film transistor (TFT) array, and it is electrically connected with the source electrode 30b of thin-film transistor.
In aforesaid etching process, beneath silicon layer 16 is understood some and is come out.At this moment, can optionally removal steps of carrying out together exposed silicon layer more.This step is not the step of absolute demand, is the selectivity step.
Please refer to Fig. 4 D, form conductive electrode layer in the top of whole base plate 10.Then, use the 4th photo etched mask M4 of the present invention, it is mainly as the usefulness of definition pixel electrode.After utilizing photo etched mask M4 to carry out patterning, for example go up photoresist, exposure, development and etched step, form pixel electrode layer 40.Drain region 30a, the 34a of this pixel electrode layer 40 and thin-film transistor are for being electrically connected.Pixel electrode layer 40 can be a general metal electrode or as transparency electrode of ITO etc.
As mentioned above, the present invention only through the patterning operation of four road photo etched masks, promptly can finish array architecture of thin film transistor as shown in Figure 3.Method of the present invention does not need to use known five road photo etched masks or use half is transferred or the photo etched mask of tone, makes the cost of photo etched mask part reduction on the spot.
The flow chart of above-mentioned Fig. 4 A to 4D most as can be seen array architecture of thin film transistor, the particularly setting of data wire in thin film transistor (TFT) array and pixel electrode.As for gate line Wiring area part, then please refer to structure shown in Figure 5.Cross-section structure shown in Fig. 5 left side is the pattern G part that corresponds to the photo etched mask M1 of Fig. 4 A.In the manufacturing of gate line Wiring area, also be to make simultaneously by aforesaid four road photo etched mask M1 to M4.Cooperate Fig. 4 A to 4D and Fig. 5 that the manufacturing process of gate line Wiring area is described with that.Fig. 5 draws the profile of gate line Wiring area, gate regions, source/drain regions.Can know each step that corresponds to formation gate line Wiring area the step of finding out Fig. 4 A to 4D from Fig. 5.
Shown in Fig. 5 and Fig. 4 A, the photo etched mask figure of Fig. 4 A right-hand part has shown wherein two row of thin film transistor (TFT) array.In general thin film transistor (TFT) array, the transistorized grid of same row is to link together, and constitutes so-called gate line or scan line, and just can be connected to gate drivers through the gate line Wiring area after the gate line of each rowed transistor.When using the photo etched mask M1 of Fig. 4 A, except the gate location that defines thin-film transistor, also define the position in grid connection district simultaneously.Grid shown in grid connection district and Fig. 4 A has identical construction basically, also is to be made of with silicon layer 16 gate electrode layer 12, gate insulation layer 14.Afterwards, the protective layer 20 of follow-up formation is done patterning, the N+ implanting ions layer 30 of follow-up formation is carried out patterning with metal level 34 with the photo etched mask M3 shown in Fig. 4 C by the photo etched mask M2 shown in Fig. 4 B.The metal level 34c of gate line Wiring area G and metal level 34b as data wire separated from one anotherly do not link to each other, and this part is reached by photo etched mask M3.
In addition, above-mentioned Fig. 4 A is not absolute to the manufacturing process shown in the 4D in proper order, can do suitably according to actual conditions and adjust.The exposed silicon layer of for example aforementioned etching can (the 4th road photo etched mask M4) just carry out after forming pixel electrode.In addition, shown in Fig. 4 E, the patterning that uses photo etched mask M4 to carry out pixel electrode can carry out earlier, forms N afterwards again
+The formation of implanting ions layer 30 and metal level 34, and use photo etched mask M3 to carry out patterning.In other words, on process sequence, the present invention is more whippy.
Embodiment two
Then, use Fig. 6, Fig. 7 A to 7D and Fig. 8 that embodiments of the invention two are described.Fig. 6 is according to the resulting thin-film transistor profile of the process flow process of embodiment two.Fig. 7 A to 7D is the process method flow chart according to embodiment two, and wherein the profile of technological process is represented in each figure left side, and right-hand part is represented employed display array design diagram.Fig. 8 left side is the gate pad or the grid connection district generalized section of the thin-film transistor of Fig. 6.
As can be seen from Figure 6, embodiment two is the variation example of embodiment one, and the discrepancy of itself and embodiment one is the manufacture method that is source/drain.In embodiment one, the manufacture method of source/drain is directly the implanting ions layer to be formed on the silicon layer, and embodiment two does not additionally form the implanting ions layer.Then, utilize Fig. 7 A to 7D that embodiments of the invention two are described.
Shown in Fig. 7 A, this step is identical with the step shown in Fig. 4 A, also is that substrate 10 is provided earlier, is formed with gate electrode layer 12, gate insulation layer 14 and silicon layer 16 on it.Then, use photo etched mask M1 to come to carry out patterning, form section shape as Fig. 7 A left side to stating gate electrode layer 12, gate insulation layer 14 and silicon layer 16.Photo etched mask M1 mainly also be the zone (12,14,16) that is used for defining grid, gate line with gate line Wiring area G.This step is identical with embodiment one, and remaining part can seldom be done narration at this with reference to embodiment one.
With reference to Fig. 7 B, on whole base plate 10, form protective layer 20 and photoresist PR.The method that protective layer 20 can use the deposition of any semiconductor fabrication process or smear or the like does not limit especially at this.Then, use second photo etched mask M2, protective layer 20 and photoresist PR are carried out patterning, for example expose, step such as development and etching.By this, in protective layer 20 and photoresist PR and be positioned at above the gate regions silicon layer 16, form contact hole 26, and remove the protective layer of part of grid pole line top and the protective layer 20 on the gate line Wiring area G.Silicon layer 16 under this contact hole 26 exposes.
Then, utilizing ion implantation, is mask with photoresist PR, and the silicon layer 16 that exposes is carried out implanting ions.In this example is with N
+Ion carries out implanting ions.By this, form source/drain 50a, the 50b of thin-film transistor.Afterwards, photoresist PR is removed.In addition, when aforementioned silicon layer 16 is polysilicon layer, can carry out the implanting ions of P type or N type.When aforementioned silicon layer 16 is amorphous silicon layer, then generally carry out the implanting ions of N type.
Shown in Fig. 7 C, above protective layer 20, form metal level 52.Metal level 52 also is electrically connected with beneath source/ drain 50a, 50b by contact hole 26.Afterwards, use the 3rd photo etched mask M3 of the present invention, this photo etched mask M3 is used for defining data wire, data wire backguy district, regions and source, second layer gate line Wiring area.
After using photo etched mask M3 to carry out patterning,, define shown source region, Fig. 7 C left side (50a, 52a), drain region (50b, 52b) for example through overexposure, development and etched step.That is the left side metal level 52a shown in Fig. 7 C left side half promptly can be as the data wire of thin film transistor (TFT) array, and it is electrically connected with the source electrode 50a of thin-film transistor.Identical with embodiment one, this moment can optionally removal steps of carrying out together exposed silicon layer more.This step is not the step of absolute demand, is the selectivity step.
Please refer to Fig. 7 D, form conductive electrode layer in the top of whole base plate 10.Then, use the 4th photo etched mask M4 of the present invention, it is mainly as the usefulness of definition pixel electrode.After utilizing photo etched mask M4 to carry out patterning, expose, development and etched step, form pixel electrode layer 60.Drain region 50b, the 52b of this pixel electrode layer 60 and thin-film transistor are for being electrically connected.Pixel electrode layer 60 can be general metal electrode, or as transparency electrode of ITO etc.
As mentioned above, the present invention only through the patterning operation of four road photo etched masks, promptly can finish array architecture of thin film transistor as shown in Figure 6.And four above-mentioned road photo etched masks do not need to use known five road photo etched masks or use half is transferred or the photo etched mask of tone, make the cost of photo etched mask part reduction on the spot.In addition, embodiment two is to use general implanting ions method, thus do not need to use the special high-temperature plasma diffusion method shown in known Fig. 2 A to 2D, with phosphorous diffusion to form N
+Cloth is planted layer.In addition, also reduce by a layer insulating plated film, therefore, cost also more reduces than known method.
Similarly, use Fig. 8 to come the manufacturing process of the gate line Wiring area of the brief description embodiment of the invention two.The manufacturing process of gate line Wiring area is similar with embodiment one basically, also is to use photo etched mask M1 to M3.Different with embodiment one is that the gate line of embodiment two does not partly have N
+Cloth is planted layer, and metal level 52 directly overlays the stack layer that gate electrode layer 12, gate insulation layer 14 and silicon layer 16 are constituted.After being patterned to metal level 52c through photo etched mask M3, metal level 52c is just as the wiring that is connected the same transistor gate that lists.
With embodiment one, above-mentioned Fig. 7 A neither be absolute to the order of the manufacturing process shown in the 7D, can do suitably according to actual conditions and adjust.The exposed silicon layer of for example aforementioned etching can (the 4th road photo etched mask M4) just carry out after forming pixel electrode.In addition, shown in Fig. 7 E, the patterning that uses photo etched mask M4 to carry out pixel electrode can carry out earlier, carries out implanting ions layer step afterwards again and forms metal level 52, and use photo etched mask M3 to carry out patterning.In other words, on process sequence, the present invention is whippy.
In sum, the present invention utilizes four road photo etched mask M1 to M4 to form the array of thin-film transistor.Photo etched mask M1 is used for defining area of grid, gate line and gate line Wiring area; Photo etched mask M2 is used for protective layer is defined perforate, forms the contact hole of source electrode and drain electrode, and removes the protective layer on subregional protective layer in gate line top and the gate line Wiring area; Photo etched mask M3 is used for defining data wire, data wire Wiring area, regions and source and second layer gate line Wiring area; Photo etched mask M4 then defines pixel electrode.
In sum; the present invention proposes the set-up mode of new array architecture of thin film transistor; can carry out patterning to gate electrode layer, gate insulation layer and silicon layer simultaneously with a slice photo etched mask; define gate regions, gate line and gate line Wiring area; and, get final product so the photo etched mask number can be dropped to 4 roads with data wire, drain metal layer, source metal top as for protective layer.Add silicon layer is adopted general general implanting ions mode, but not special plasma diffusion technology, so cost can more reduce.In addition, cooperate structure of the present invention, processing step can flexibly be replaced, and has more the degree of freedom.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; any person of ordinary skill in the field; without departing from the spirit and scope of the invention; when can doing a little change and improvement, so the present invention's protection range is as the criterion when looking the claim person of defining.
Claims (22)
1. the manufacture method of a thin film transistor (TFT) array is characterized in that comprising:
Substrate is provided, is formed with gate electrode layer, gate insulation layer and silicon layer on this substrate;
This gate electrode layer, this gate insulation layer and this silicon layer are carried out patterning, to define gate regions, gate line and gate line Wiring area;
Form protective layer on whole this substrate;
This protective layer is carried out patterning, so that in this protective layer and be positioned at and form two contact holes on this silicon layer of this gate regions, and remove this protective layer on this gate line of part and this protective layer on this gate line Wiring area;
Form implanting ions layer and metal level on whole this substrate;
This implanting ions layer and this metal level are carried out patterning, to form source area, drain region, data wire, data wire Wiring area and second layer gate line Wiring area; And
Forming pixel electrode is electrically connected on this protective layer and with this drain region.
2. according to the manufacture method of the described thin film transistor (TFT) array of claim 1, it is characterized in that also comprising etching step, in order to this exposed silicon layer is carried out etching.
3. according to the manufacture method of the described thin film transistor (TFT) array of claim 1, it is characterized in that this gate line Wiring area is formed by this gate electrode layer, this gate insulation layer, this silicon layer, this implanting ions layer and this metal layer stack.
4. according to the manufacture method of the described thin film transistor (TFT) array of claim 1, it is characterized in that this gate insulation layer is silicon nitride layer or silicon oxide layer.
5. according to the manufacture method of the described thin film transistor (TFT) array of claim 1, it is characterized in that when this silicon layer is polysilicon layer that this implanting ions layer is that P type or N type cloth are planted layer.
6. according to the manufacture method of the described thin film transistor (TFT) array of claim 1, it is characterized in that when this silicon layer is amorphous silicon layer that this implanting ions layer is that N type cloth is planted layer.
7. according to the manufacture method of the described thin film transistor (TFT) array of claim 1, it is characterized in that this pixel electrode is transparency electrode or metal electrode.
8. the manufacture method of a thin film transistor (TFT) array is characterized in that comprising:
Substrate is provided, is formed with gate electrode layer, gate insulation layer and silicon layer on this substrate;
This gate electrode layer, this gate insulation layer and this silicon layer are carried out patterning, to define gate regions, gate line and gate line Wiring area;
Form protective layer on whole this substrate, and form photoresist layer on this protective layer;
This protective layer and this photoresist layer are carried out patterning, so that in this protective layer and this photoresist and be positioned at and form two contact holes on this silicon layer of this gate regions, and remove subregional this protective layer in this gate line top and this photoresist, with this protective layer and this photoresist on this gate line Wiring area;
This silicon layer that exposes is carried out the implanting ions step, in this silicon layer that exposes of this gate regions, to form source electrode and drain electrode;
Form metal level on whole this substrate, and this metal level is carried out patterning, to form source area, drain region, data wire, data wire Wiring area and second layer gate line Wiring area; And
Forming pixel electrode is electrically connected on this protective layer and with this metal level that is connected this drain electrode.
9. the manufacture method of described according to Claim 8 thin film transistor (TFT) array is characterized in that also comprising etching step, in order to this exposed silicon layer is carried out etching.
10. the manufacture method of described according to Claim 8 thin film transistor (TFT) array is characterized in that this gate line Wiring area is formed by this gate electrode layer, this gate insulation layer, this silicon layer and this metal layer stack.
11. the manufacture method of described according to Claim 8 thin film transistor (TFT) array is characterized in that this gate insulation layer is silicon nitride layer or silicon oxide layer.
12. the manufacture method of described according to Claim 8 thin film transistor (TFT) array is characterized in that when this silicon layer is polysilicon layer, this implanting ions step is the implanting ions that carries out P type or N type.
13. the manufacture method of described according to Claim 8 thin film transistor (TFT) array is characterized in that when this silicon layer is amorphous silicon layer, this implanting ions step is planted layer for carrying out N type cloth.
14. the manufacture method of described according to Claim 8 thin film transistor (TFT) array is characterized in that this pixel electrode is transparency electrode or metal electrode.
15. an array architecture of thin film transistor is characterized in that comprising:
Substrate is distinguished into gate line Wiring area and gate regions on this substrate;
Stacked structure is positioned on this gate regions and this gate line Wiring area of this substrate, and wherein this stacked structure is made of gate electrode layer, gate insulation layer and silicon layer;
Protective layer is covered on this substrate and exposes this stacked structure of this gate line Wiring area, and this protective layer that is positioned on this stacked structure of this gate regions also has two contact holes, to expose this silicon layer;
The implanting ions layer is covered on this protective layer and corresponding on this stacked structure of this gate regions and be covered on this stacked structure of this gate line Wiring area, wherein this implanting ions layer also is connected with this silicon layer;
Metal level is covered on this implanting ions layer, and this metal level that wherein is positioned at this gate line Wiring area is as second layer gate line Wiring area, and this metal level that is positioned at this gate regions is respectively as source electrode and drain electrode; And
Pixel electrode layer is covered on this protective layer and is connected with this implanting ions layer with this metal level as this drain electrode.
16. the array architecture of thin film transistor according to claim 15 is characterized in that when this silicon layer is polysilicon layer, this implanting ions layer is the implanting ions layer of P type or N type.
17. the array architecture of thin film transistor according to claim 15 is characterized in that when this silicon layer is amorphous silicon layer, this implanting ions layer is a N type implanting ions layer.
18. the array architecture of thin film transistor according to claim 15 is characterized in that this pixel electrode is transparency electrode or metal electrode.
19. an array architecture of thin film transistor is characterized in that comprising:
Substrate is distinguished into gate line Wiring area and gate regions on this substrate;
Stacked structure is positioned on this gate regions and this gate line Wiring area of this substrate, and wherein this stacked structure is made of gate electrode layer, gate insulation layer and silicon layer;
Protective layer, be covered on this substrate and expose this stacked structure of this gate line Wiring area, and this protective layer that is positioned on this stacked structure of this gate regions also has two contact holes, and to expose this silicon layer, this silicon layer that wherein comes out also carries out implanting ions;
Metal level is covered on the silicon layer that exposes, and this metal level that wherein is positioned at this gate line Wiring area is as second layer gate line Wiring area, and this metal level that is positioned at this gate regions is respectively as source electrode and drain electrode; And
Pixel electrode layer is covered on this protective layer and is connected with this metal level as this drain electrode.
20. the array architecture of thin film transistor according to claim 19 is characterized in that when this silicon layer is polysilicon layer, this silicon layer is the implanting ions that carries out P type or N type.
21. the array architecture of thin film transistor according to claim 19 is characterized in that when this silicon layer is amorphous silicon layer, this silicon layer is for carrying out N type implanting ions.
22. the array architecture of thin film transistor according to claim 19 is characterized in that this pixel electrode is transparency electrode or metal electrode.
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| CNB2006100016984A CN100514608C (en) | 2006-01-24 | 2006-01-24 | Making method of the film transistor array and its structure |
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| CNB2006100016984A CN100514608C (en) | 2006-01-24 | 2006-01-24 | Making method of the film transistor array and its structure |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102299104A (en) * | 2011-09-20 | 2011-12-28 | 深圳市华星光电技术有限公司 | Manufacturing method of thin film transistor (TFT) array substrate and TFT array substrate |
| CN102629576A (en) * | 2011-09-26 | 2012-08-08 | 京东方科技集团股份有限公司 | Array substrate and method for manufacturing the same |
| CN104241297A (en) * | 2014-08-25 | 2014-12-24 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method of array substrate and display panel |
| CN106057828A (en) * | 2016-08-12 | 2016-10-26 | 京东方科技集团股份有限公司 | Substrate, preparation method therefor, and display panel |
| CN113985667A (en) * | 2021-10-12 | 2022-01-28 | Tcl华星光电技术有限公司 | Array substrate, preparation method thereof and liquid crystal display panel |
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2006
- 2006-01-24 CN CNB2006100016984A patent/CN100514608C/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102299104A (en) * | 2011-09-20 | 2011-12-28 | 深圳市华星光电技术有限公司 | Manufacturing method of thin film transistor (TFT) array substrate and TFT array substrate |
| CN102629576A (en) * | 2011-09-26 | 2012-08-08 | 京东方科技集团股份有限公司 | Array substrate and method for manufacturing the same |
| US9178046B2 (en) | 2011-09-26 | 2015-11-03 | Boe Technology Group Co., Ltd. | Array substrate and manufacturing method thereof |
| CN104241297A (en) * | 2014-08-25 | 2014-12-24 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method of array substrate and display panel |
| CN104241297B (en) * | 2014-08-25 | 2017-12-08 | 京东方科技集团股份有限公司 | Array base palte and its manufacture method and display panel |
| US9929184B2 (en) | 2014-08-25 | 2018-03-27 | Boe Technology Group Co., Ltd. | Array substrate and fabrication method thereof, and display panel |
| CN106057828A (en) * | 2016-08-12 | 2016-10-26 | 京东方科技集团股份有限公司 | Substrate, preparation method therefor, and display panel |
| CN113985667A (en) * | 2021-10-12 | 2022-01-28 | Tcl华星光电技术有限公司 | Array substrate, preparation method thereof and liquid crystal display panel |
| CN113985667B (en) * | 2021-10-12 | 2023-08-01 | Tcl华星光电技术有限公司 | Array substrate, preparation method thereof and liquid crystal display panel |
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| CN100514608C (en) | 2009-07-15 |
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