CN101003888A - Equipment of coating by vaporization - Google Patents
Equipment of coating by vaporization Download PDFInfo
- Publication number
- CN101003888A CN101003888A CN 200610033200 CN200610033200A CN101003888A CN 101003888 A CN101003888 A CN 101003888A CN 200610033200 CN200610033200 CN 200610033200 CN 200610033200 A CN200610033200 A CN 200610033200A CN 101003888 A CN101003888 A CN 101003888A
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- China
- Prior art keywords
- coating device
- evaporation coating
- crucible
- evaporation
- liner plate
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Abstract
This invention discloses a deposition device, which comprises a crucible with a gas outlet on the top for holding a deposition material, and a lining around the gas outlet with a hole corresponding to the gas outlet. The hole of the lining has zigzag structure at the inner wall. The deposition device can prevent the deposition material from being contaminated.
Description
[technical field]
The present invention relates to the evaporation coating technique field, relate in particular to a kind of evaporation coating device.
[background technology]
Physical gas phase deposition technology can be divided into two kinds of evaporation, sputters usually, and the common feature of these two kinds of technology is to carry out thin film deposition in the mode of physics.With regard to evaporation, its principle makes deposition material become gaseous state or ionic state, and is deposited on workpiece surface to be plated to form a deposition material rete for by electron beam or step mode deposition material is heated.Evaporation coating technique is simple because of film process, technology is easy to control is used widely, for example the gold and silver rete on optical element surface reflective coating, decoration surface etc.
As shown in Figure 1, evaporate process need be carried out in an evaporation coating device 1, this evaporation coating device 1 comprises the air-bleed system 20 of an evaporation chamber 10 and required vacuum tightness when evaporation to be provided, and has a crucible 11 that is equipped with deposition material, one and the Workpiece carrier to be plated 13 that is oppositely arranged of crucible 11 in the evaporation chamber.When deposition material was heated evaporation, the deposition material particle of evaporation rushed at Workpiece carrier 13 to be plated with certain energy, and is deposited on workpiece to be plated 131 surfaces.
See also Fig. 2, the deposition material particle that is not all evapn all can be deposited on workpiece to be plated 13 surfaces that are oppositely arranged by pre-determined direction, the deposition material particle of part evaporation will be deposited on air stream outlet 112 peripheries of crucible 11, duration of service long afterwards, air stream outlet 112 peripheries of crucible 11 just can deposit one deck deposition material, be unfavorable for cleaning, when using different deposition material, can pollute especially deposition material, to this, one solution of industry is at the sheathed liner plate 12 of crucible 11 peripheries, and this liner plate 12 is except that helping heat radiation, and each evaporation finishes, directly with liner plate 12 sandblastings, the material that can will be deposited on the liner plate 12 is cleaned out.
Yet, the liner plate 12 of prior art is only made an oblique angle usually and is handled, form an inversed taper platform shape opening 124 that cooperates with the air stream outlet 112 of crucible, when an evaporation processing procedure was of long duration, the deposition material particle of evaporation can be deposited on inversed taper platform shape opening 124 inner-wall surfaces of liner plate 12, when deposit thickness is too thick gradually, stress can curl sedimentary deposition material, and behind electron beam or electron irradiation, can become burned black shape, even fall in the crucible 11, influence the quality of deposition material.
In view of this, provide a kind of evaporation coating device that prevents that deposition material from polluting to be necessity in fact.
[summary of the invention]
Below, will a kind of evaporation coating device be described with embodiment,
A kind of evaporation coating device, it comprises that one is used for the crucible of a ccontaining deposition material, and this crucible top has an air stream outlet, an and liner plate that is set in described crucible air stream outlet periphery, and this liner plate has an opening that cooperates with described crucible air stream outlet, wherein, the opening inner-wall surface of described liner plate has the serration structure.
Compared with prior art, described evaporation coating device forms the serration structure on the inversed taper platform shape opening inner-wall surface of the liner plate that is sheathed on its crucible periphery, so, even part deposition material particle is deposited on the inversed taper platform shape opening inner-wall surface of crucible air stream outlet periphery during evaporation, sedimentary deposition material can stress not yet be concentrated and is inwardly curled and become burned black shape behind electron beam or electron irradiation and fall in the crucible, its stress is disperseed by the serration structure, thereby can prevent that deposition material is contaminated, avoid influencing the deposition material quality.
[description of drawings]
Fig. 1 is the evaporation coating device structural representation that prior art provides.
Fig. 2 is crucible and the liner plate assembling schematic perspective view that provides among Fig. 1.
Fig. 3 is the evaporation coating device structural representation that embodiments of the invention provide.
Fig. 4 is the liner plate schematic perspective view that provides among Fig. 3.
Fig. 5 is the liner plate that provides among Fig. 4 diagrammatic cross-section along the V-V direction.
Fig. 6 is the schematic top plan view of the inversed taper platform shape opening inner-wall surface of the evaporation coating device liner plate that provides of embodiments of the invention when having along spination bulge-structure that opening inner-wall surface short transverse is arranged.
[embodiment]
Below in conjunction with accompanying drawing evaporation coating device provided by the invention is described in further detail.
See also Fig. 3 to Fig. 5, the evaporation coating device 2 that embodiments of the invention provide comprises an evaporation chamber 10, an air-bleed system 20 and a deposition material heating source 30.
Comprise a crucible 11, a liner plate 12 and a Workpiece carrier 13 to be plated in the evaporation chamber 10.Described crucible 11 has the air stream outlet 112 that a deposition material holding part 111 and is positioned at the top.Described liner plate 12 be set in described crucible 11 air stream outlet 112 peripheries and can be by some screw retention, described liner plate 12 comprises a first surface 121, one second surface 122 and one and crucible 11 form fit and the through hole 123 that extends to first surface 121 from second surface 122, described through hole 123 comprises an inversed taper platform shape opening 124, described inversed taper platform shape opening 124 is engaged on the air stream outlet 112 of described crucible 11, be formed with the spination bulge-structure 124a that arranges along the inner-wall surface circumferential direction on described inversed taper platform shape opening 124 inner-wall surfaces, described inversed taper platform shape opening 124 inner-wall surfaces just form a spination curved surface, and described serration structure 124a is shaped as triangular prism.Described Workpiece carrier to be plated 13 is oppositely arranged with the air stream outlet 112 of described crucible 11, can place one or more workpiece to be plated 131 in the described Workpiece carrier 13 to be plated.
The material of described crucible 11 can be selected from high-melting-point materials such as tungsten, molybdenum, tantalum, copper, graphite, aluminum oxide, norbide, boron nitride; The shape of described crucible 11 can be column, frustum, boat shape or other polygonal shape; In addition, described crucible 11 can be provided with a dog-house (figure does not show) and with convenient crucible 11 be fed intake, to realize the continuous evaporating-plating operation.
Certainly, when described crucible 11 be shaped as the inversed taper platform shape time, above-mentioned liner plate 12 just need not one and is sheathed on crucible 11 peripheries with the through hole 123 of crucible 11 form fit, and can directly make an inversed taper platform shape opening 124, and forming a serration structure 124a who extends to the first surface 121 of liner plate 12 with air stream outlet 112 contacts site of crucible 11, described inversed taper platform shape opening 124 just forms a spination curved surface.Described liner plate 12 also can be selected from refractory metals such as tungsten, molybdenum, tantalum, copper, graphite, aluminum oxide, norbide, boron nitride.
Described Workpiece carrier to be plated 13 can also connect a workpiece primary heater unit to be plated so that workpiece surface preheating to be plated reaches better evaporation effect, and a workpiece turn-over rig to be plated is realized the continuous evaporating-plating operation with automatic turn-over workpiece to be plated.
Air-bleed system 20 required vacuum tightness when evaporation chamber 10 evaporations to be provided.
Deposition material heating source 30 comprises use electron beam heating unit, electron beam is launched through an electron beam gun 301, and be concentrated to through turning to magnetic field 302 to turn on the deposition material in the crucible 11, in the present embodiment, electron beam is bump heating deposition material through turning to magnetic field 302 deflections, 270 degree, so design can avoid the electron beam emissive source in the electron beam gun 301 that deposition material is polluted.
Certainly, described deposition material heating source 30 is not limited to the above-mentioned form of utilizing electron beam gun 301 divergent bundles, and also can use electron-bombardment, or other particle-irradiation form, or only use a supply unit, described crucible 11 is directly switched on the deposition material in the heating crucible 11, and the material of crucible 11 just need be selected conduction and dystectic material, for example graphite, aluminum oxide, boron nitride etc. for use at this moment certainly.
During use, electron beam gun 301 is launched electron beam, and electron beam is concentrated to through turning to magnetic field 302 to turn on the deposition material in the crucible 11, the deposition material in the electron beam bump heating crucible 11, deposition material melted by heat and evaporation, the deposition material particle of evaporation is deposited on workpiece surface to be plated.When evaporation finishes, take out workpiece to be plated after cooling, and can take off liner plate 12, and, clean out the deposition material on inversed taper platform shape opening 124 inner-wall surfaces that are deposited on liner plate 12 liner plate 12 sandblastings.
In addition, be not limited to the above-mentioned form that a crucible only is set in the evaporation chamber 10 of described evaporation coating device 2, and one year alms bowl can be set, carry in the alms bowl and can place several crucibles, ccontaining a kind of deposition material in each crucible, at this moment, a rotation motor can be set and carry the alms bowl rotation in carrying alms bowl to drive.When the fusing point of deposition material is close, can realize to workpiece evaporation one alloy material layer to be plated; Perhaps the multiple film layer evaporation according to workpiece to be plated needs, respectively to deposition material irradiating electron beam in each crucible, with different deposition material layers on the evaporation.
The evaporation coating device that present embodiment provides, on the inversed taper platform shape opening inner-wall surface that is set in crucible periphery liner plate, form the serration structure, so, even part deposition material particle is deposited on the inversed taper platform shape opening inner-wall surface of liner plate of crucible air stream outlet periphery during evaporation, sedimentary deposition material can stress not yet be concentrated and is inwardly curled and become burned black shape behind electron beam or electron irradiation and fall in the crucible, its stress is disperseed by the serration structure, thereby can prevent that deposition material is contaminated, avoid influencing the deposition material quality.
For another shown in Figure 6, the inversed taper platform shape opening inner-wall surface of described liner plate 12 also can form the serration structure 124b that arranges along opening inner-wall surface short transverse, and the regularly arranged opening inner-wall surface that makes of serration structure 124b forms a spination curved surface.
Be understandable that, concerning one skilled in the relevant art, can make other various corresponding changes and distortion, and all these changes and distortion all should belong to the protection domain in claim of the present invention according to technical scheme of the present invention and technical conceive.
Claims (10)
1. evaporation coating device, it comprises that one is used for the crucible of a ccontaining deposition material, and this crucible top has an air stream outlet, an and liner plate that is set in described crucible air stream outlet periphery, and this liner plate has an opening that cooperates with described crucible air stream outlet, and it is characterized in that: the opening inner-wall surface of described liner plate has the serration structure.
2. evaporation coating device as claimed in claim 1 is characterized in that, described evaporation coating device comprises an evaporation chamber and an air-bleed system that links to each other with described evaporation chamber, and described crucible and described liner plate all place described evaporation chamber.
3. evaporation coating device as claimed in claim 2 is characterized in that, described evaporation coating device further comprises a deposition material heating source.
4. evaporation coating device as claimed in claim 3 is characterized in that, described deposition material heating source comprises the electron beam heating unit.
5. evaporation coating device as claimed in claim 3 is characterized in that, described deposition material heating source comprises electric heating device.
6. evaporation coating device as claimed in claim 1 is characterized in that the material of described crucible is selected from tungsten, molybdenum, tantalum, copper, graphite, aluminum oxide, norbide or boron nitride.
7. evaporation coating device as claimed in claim 1 is characterized in that, the opening of described liner plate is an inversed taper platform shape opening.
8. evaporation coating device as claimed in claim 1 is characterized in that, described spination bulge-structure is shaped as triangular prism.
9. evaporation coating device as claimed in claim 1 is characterized in that, described sawtooth serration structure is regularly arranged along described opening inner-wall surface circumferential direction or short transverse.
10. evaporation coating device as claimed in claim 1 is characterized in that the material of described liner plate is selected from tungsten, molybdenum, tantalum, copper, graphite, aluminum oxide, norbide or boron nitride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100332002A CN100516284C (en) | 2006-01-21 | 2006-01-21 | Equipment of coating by vaporization |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100332002A CN100516284C (en) | 2006-01-21 | 2006-01-21 | Equipment of coating by vaporization |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101003888A true CN101003888A (en) | 2007-07-25 |
| CN100516284C CN100516284C (en) | 2009-07-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100332002A Expired - Fee Related CN100516284C (en) | 2006-01-21 | 2006-01-21 | Equipment of coating by vaporization |
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| Country | Link |
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| CN (1) | CN100516284C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102978574A (en) * | 2012-12-12 | 2013-03-20 | 中国科学院长春光学精密机械与物理研究所 | Evaporation boat for depositing metal alumium film through vacuum thermal evaporation |
| CN103695847A (en) * | 2013-12-24 | 2014-04-02 | 京东方科技集团股份有限公司 | Crucible and evaporation method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1361771A (en) * | 1972-02-15 | 1974-07-30 | Leybold Heraeus Verwaltung | Apparatus for heating material by means of a electron beam in a vacuum |
| DE2917841A1 (en) * | 1979-05-03 | 1980-11-13 | Leybold Heraeus Gmbh & Co Kg | EVAPORATOR FOR VACUUM EVAPORATION SYSTEMS |
| US6342103B1 (en) * | 2000-06-01 | 2002-01-29 | The Boc Group, Inc. | Multiple pocket electron beam source |
| KR100889758B1 (en) * | 2002-09-03 | 2009-03-20 | 삼성모바일디스플레이주식회사 | Heating crucible of organic thin film forming apparatus |
-
2006
- 2006-01-21 CN CNB2006100332002A patent/CN100516284C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102978574A (en) * | 2012-12-12 | 2013-03-20 | 中国科学院长春光学精密机械与物理研究所 | Evaporation boat for depositing metal alumium film through vacuum thermal evaporation |
| CN103695847A (en) * | 2013-12-24 | 2014-04-02 | 京东方科技集团股份有限公司 | Crucible and evaporation method thereof |
| CN103695847B (en) * | 2013-12-24 | 2016-03-16 | 京东方科技集团股份有限公司 | Crucible and evaporation coating method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100516284C (en) | 2009-07-22 |
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