CN100593748C

CN100593748C - Color membrane substrates and manufacturing method thereof

Info

Publication number: CN100593748C
Application number: CN200810038305A
Authority: CN
Inventors: 田广彦
Original assignee: SVA Group Co Ltd
Current assignee: INESA DISPLAY MATERIALS CO., LTD.
Priority date: 2008-05-30
Filing date: 2008-05-30
Publication date: 2010-03-10
Anticipated expiration: 2028-05-30
Also published as: CN101329465A

Abstract

The invention relates to a color film substrate and a manufacturing method thereof. The color film substrate comprises a substrate, a black matrix which is formed on the substrate and defines a plurality of sub-pixel regions, the black matrix is a light blocking layer containing conductive materials, a plurality of pigment layers, each pigment layer is formed in one sub-pixel region, a transparentconductive film which covers above the black matrix and the pigment layers, wherein, the conductive materials which are not covered by the pigment layers are exposed to be electrically connected withthe transparent conductive film. The color film substrate of the invention can reduce the signal delay on a common electrode and improve the liquid crystal display effect.

Description

The manufacture method of color membrane substrates

Technical field

The present invention relates to a kind of manufacture method of color membrane substrates, particularly relate to a kind of manufacture method that is used for the color membrane substrates of liquid crystal indicator.

Background technology

LCD (LCD) is a kind of flat-panel screens that is widely used at present, compares with other display modes, has advantages such as low-power consumption, external form be thin, in light weight, radiationless.Generally speaking, LCD includes array infrabasal plate, color film (CF) upper substrate and is filled in liquid crystal layer between the upper and lower base plate; Color film upper substrate comprise black matrix (Black Matrix, BM), R/G/B uvea and as the transparent conductive film of common electrode; The yawing moment that common electrode on the color film upper substrate and the electric field intensity between the pixel electrode on the array infrabasal plate are being modulated liquid crystal molecule.

A kind of manufacturing process synoptic diagram of color film upper substrate such as Fig. 1, Fig. 2 and shown in Figure 3: be glass substrate often at first at substrate 10) go up deposition layer of metal layer 111 (as chromium, aluminium), utilize photoetching process to form black matrix 11 patterns, please refer to Fig. 1; To reflection of light, on metal level 111, carrying out antireflection processing (as oxidation processes), form oxide layer 112 for fear of metal material usually; Utilize photoetching process on black matrix 12, to form R, G, B uvea 121,122,123 patterns successively, please refer to Fig. 2, mix, can keep certain clearance (as 10 μ m) between the different uveas for fear of uvea; Deposition layer of transparent conductive film 13 (as tin indium oxides) please refer to Fig. 3 as common electrode on whole base plate 10 at last.Common electrode on the color film upper substrate is connected with array infrabasal plate electricity outside the viewing area of LCD, and electrical signal is applied to the common electrode of color film upper substrate by the junction.

In the manufacturing of LCD, if crossing conference, the signal delay of the common electrode of color film upper substrate produces the unequal problem of demonstration, influence the display effect of LCD.For the signal delay of the common electrode that reduces color film upper substrate, the common practice is the thickness that increases transparent conductive film on the color film upper substrate, and this can cause the increase of film formation time and the decline of transmitance again.The multiple-domain vertical orientating type TFT-LCD that opening is especially arranged for common electrode on the color film upper substrate, the connectedness meeting variation of common electrode, signal delay can be more serious.

Summary of the invention

Technical matters to be solved by this invention provides a kind of manufacture method of color membrane substrates, and the color membrane substrates that this method obtains can reduce the signal delay of common electrode on the color membrane substrates under the prerequisite that does not increase the electrically conducting transparent film thickness.

For addressing the above problem, the present invention has also supplied a kind of manufacture method of color membrane substrates, may further comprise the steps:

One substrate is provided;

Deposition contains the light blocking layer of conductive material on this substrate, after handling through antireflection, forms black matrix by photoetching process;

Utilize photoetching process to form the uvea pattern successively on black matrix, the black matrix that utilizes the photoetching process etching not covered by uvea exposes the conductive material in the black matrix;

Deposition covers the transparent conductive film of whole base plate above black matrix and uvea, and the conductive material electricity of exposing in this layer transparent conductive film and the black matrix is connected.

The manufacture method of above-mentioned color membrane substrates, wherein said conductive material are the chromium metal, and described antireflection treatment step is the oxidation processes of chromium metal.

The manufacture method of above-mentioned color membrane substrates, wherein said conductive material are that aluminum metal, described antireflection treatment step are for covering the organic photoresist layer of one deck on aluminum metal layer.

The manufacture method of above-mentioned color membrane substrates, wherein said when utilizing the black matrix that the photoetching process etching do not cover by uvea, utilize the uvea pattern to carry out etching as mask, expose the conductive material in the black matrix.

The manufacture method of above-mentioned color membrane substrates, wherein said uvea are R, G, B uvea.

The manufacture method of color membrane substrates of the present invention, because carrying out electricity with the conductive material among the BM, the common electrode on the color membrane substrates is connected, formed relation in parallel, reduced the interconnected resistance R on the common electrode, and be proportional to total capacitance C on the common electrode and the product of all-in resistance R at the time coefficient τ of the signal delay on the common electrode, that is:

τ∝R*C

Remain unchanged according to the capacitor C between common electrode of the present invention and other metal levels, so the time coefficient τ that reduces to reduce signal delay on the common electrode of resistance R, the signal delay on the common electrode just can be reduced.

Description of drawings

Fig. 1 is for being formed with the structural representation of the color membrane substrates of deceiving matrix in the prior art, wherein Fig. 1 b is the schematic cross-section along Fig. 1 a section line A-A '.

Fig. 1 b is the structural representation that forms the color membrane substrates behind R, G, the B in the prior art, and wherein Fig. 2 b is the schematic cross-section along Fig. 2 a section line A-A ';

Fig. 1 c is the structural representation of the color membrane substrates behind the formation nesa coating in the prior art, and wherein Fig. 3 b is the schematic cross-section along Fig. 3 a section line A-A '.

Fig. 4～Fig. 8 is the cross section structure synoptic diagram of the color membrane substrates in the manufacturing process flow of color membrane substrates of the present invention.

Among the figure:

10, substrate 11, black matrix 111: metal level

112: oxide layer or organic photoresist layer

12, uvea 121, R uvea 122, G uvea 123, B uvea

13, electrically conducting transparent (approaching) film

Embodiment

The invention will be further described below in conjunction with accompanying drawing and exemplary embodiments.

Please refer to Fig. 4, substrate 10 at first is provided, this substrate 10 is the insulation transparent substrate, as glass, plastic substrate, is defined as color membrane substrates, is commonly referred to upper substrate.Depositing metal layers 111 on substrate 10, as chromium metal or aluminum metal layer.

Then, please refer to Fig. 5, metal level 111 is carried out antireflection to be handled, as cover the organic photoresist layer of one deck to the oxidation processes of chromium metal or on aluminum metal layer, form the composite bed of chromium metal level and oxide layer 112 or aluminum metal layer 111 and organic photoresist layer 112, the material of organic photoresist layer can be negative photoresist and mixes carbon black, and thickness is about 1-2 μ m, and the thickness of chromium metal is about 1000-3000A.

Then form black matrix (BM) 11 patterns by photoetching process, define a plurality of subpixel area, the uvea that continues and make in order to separation is to increase color contrast.

Then, please refer to Fig. 6, the color film that will comprise red (R), green (G), blue (B) by photoetching process is formed at sub-pixel area, utilize spin-coating method to form red pixel in sub-pixel area, mode by exposure imaging forms R uvea 121 patterns in the predetermined subpixel area that forms red pixel again, and remove the red pixel of other subpixel area, repeat above-mentioned steps, can get G uvea 122, B uvea 123 patterns, the thickness of uvea 12 forms the uveal order of different colours and includes but not limited to said sequence approximately between 1～2.5 millimeter.

Then, please refer to Fig. 7, utilize the photoetching process etched portions or, aluminum metal or chromium exposed metal/bare metal are come out all not by the BM material of R, G, B uvea 121,122,123 pattern covers; As exposing the conductive material chromium metal among the BM, the BM material that also can utilize R, G, B uvea pattern not to be covered during etching with the oxide layer 112 on the wet etching chromium metal level by uvea as mask (mask) etching.

At last, please refer to Fig. 8.Deposit transparent conductive film 13 on whole base plate 10 forms common electrode, and to make this layer nesa coating 13 be that metal level 111 electricity are connected with conductive material among the BM.The material of this nesa coating 13 can be tin indium oxide (ITO), indium zinc oxide (IZO) etc., and thickness is about 500-2000A.

With 47 inches full HD TV is that example illustrates beneficial effect of the present invention, and its resolution is 1920 * 3 * 1080, and the chromium metal layer thickness is 3000A on the color membrane substrates, and the thickness of common electrode ITO is 1500A:

Prior art is meant that general common electrode does not have situation about being connected with BM conductive material electricity.

From above table, as can be seen, common electrode and conductive material among the BM are carried out electricity be connected, can effectively reduce signal delay, improve the display effect of LCD.

Though the present invention discloses as above with preferred embodiment; right its is not in order to qualification the present invention, any those skilled in the art, without departing from the spirit and scope of the present invention; when can doing a little modification and perfect, so protection scope of the present invention is when with being as the criterion that claims were defined.

Claims

1, a kind of manufacture method of color membrane substrates may further comprise the steps:

One substrate is provided;

2, the manufacture method of color membrane substrates according to claim 1 is characterized in that described conductive material is the chromium metal, and described antireflection treatment step is the oxidation processes of chromium metal.

3, the manufacture method of color membrane substrates according to claim 1 is characterized in that described conductive material is that aluminum metal, described antireflection treatment step are for covering the organic photoresist layer of one deck on aluminum metal layer.

4, the manufacture method of color membrane substrates according to claim 1 is characterized in that describedly when utilizing the black matrix that the photoetching process etching do not cover by uvea, utilizes the uvea pattern to carry out etching as mask, exposes the conductive material in the black matrix.

5, the manufacture method of color membrane substrates according to claim 1 is characterized in that described uvea is R, G, B uvea.