CN100495215C - 对光滑表面进行微米结构光刻蚀的方法及装置 - Google Patents
对光滑表面进行微米结构光刻蚀的方法及装置 Download PDFInfo
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- CN100495215C CN100495215C CNB2006100377978A CN200610037797A CN100495215C CN 100495215 C CN100495215 C CN 100495215C CN B2006100377978 A CNB2006100377978 A CN B2006100377978A CN 200610037797 A CN200610037797 A CN 200610037797A CN 100495215 C CN100495215 C CN 100495215C
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CN100495215C true CN100495215C (zh) | 2009-06-03 |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN101016634B (zh) * | 2006-12-30 | 2010-12-15 | 苏州大学 | 一种具有表面浮雕微结构金属滚筒的制作方法 |
CN101161400B (zh) * | 2007-11-13 | 2010-11-24 | 苏州维旺科技有限公司 | 一种导光板模仁的制造方法 |
CN101844272A (zh) * | 2010-01-27 | 2010-09-29 | 长春理工大学 | 采用激光干涉光刻技术制作自清洁表面结构的方法和*** |
CN101975976B (zh) * | 2010-08-30 | 2015-03-04 | 北京工业大学 | 基于金属纳米颗粒的光子晶体微纳结构直写方法 |
CN101973512B (zh) * | 2010-08-30 | 2013-07-10 | 北京工业大学 | 紫外激光干涉灼蚀金属微纳结构直写方法 |
US9852997B2 (en) * | 2016-03-25 | 2017-12-26 | Applied Materials, Inc. | Hybrid wafer dicing approach using a rotating beam laser scribing process and plasma etch process |
CN109521651B (zh) * | 2018-11-28 | 2021-04-09 | 吉林大学 | 一种激光干涉光刻*** |
CN110827638B (zh) * | 2019-10-31 | 2024-05-07 | 浙江理工大学 | 一种光场产生装置 |
CN110899983B (zh) * | 2019-12-09 | 2021-09-07 | 沈阳理工大学 | 一种应用激光干涉改善零件表面功能性的方法 |
CN112025230B (zh) * | 2020-07-23 | 2021-10-15 | 成都印钞有限公司 | 一种彩色潜影模具制造方法、模具、产品制造方法及产品 |
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Address after: 1, ten Zi street, Canglang District, Suzhou City, Jiangsu Province, zip code: 215006 Co-patentee after: SVG OPTRONICS, Co.,Ltd. Patentee after: SOOCHOW University Address before: 1, ten Zi street, Canglang District, Suzhou City, Jiangsu Province, zip code: 215006 Co-patentee before: SUZHOU SVG DIGITOPTICS Co.,Ltd. Patentee before: Soochow University |
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Address after: Ten Azusa Street Canglang District of Suzhou City, Jiangsu Province, No. 1 215006 Co-patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. Patentee after: SOOCHOW University Address before: Ten Azusa Street Canglang District of Suzhou City, Jiangsu Province, No. 1 215006 Co-patentee before: SVG OPTRONICS, Co.,Ltd. Patentee before: Soochow University |
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Effective date of registration: 20191122 Address after: 215000 workshop 3, No. 59, Shuangjing street, Suzhou Industrial Park, Jiangsu Province Co-patentee after: SOOCHOW University Patentee after: Suzhou maita Photoelectric Technology Co.,Ltd. Co-patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. Address before: Ten Azusa Street Canglang District of Suzhou City, Jiangsu Province, No. 1 215006 Co-patentee before: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. Patentee before: Soochow University |
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