CN100487976C - Loop micro-cavity wave-guide filter for eliminating distributed mode coupling and its making method - Google Patents
Loop micro-cavity wave-guide filter for eliminating distributed mode coupling and its making method Download PDFInfo
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- CN100487976C CN100487976C CNB2006100119815A CN200610011981A CN100487976C CN 100487976 C CN100487976 C CN 100487976C CN B2006100119815 A CNB2006100119815 A CN B2006100119815A CN 200610011981 A CN200610011981 A CN 200610011981A CN 100487976 C CN100487976 C CN 100487976C
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Abstract
The invention discloses a making method of ring-shaped micro-cavity waveguide filter to eliminate the distributed coupling, which comprises the following steps: (1) growing lower-wave conduct-bag layer, waveguide layer and upper-wave conduct-bag layer on the substrate sequently; (2) coating photoresist on the cleaned surface of upper-wave conduct-bag layer; (3) transmitting the needed pattern on the photoresist through ordinary photo-etching or electronic beam exposing and developing technique; (4) etching through chemical corrosion or dry method to obtain the entire element structure.
Description
Technical field
The invention belongs to technical field of semiconductors, be meant a kind of loop micro-cavity wave-guide filter and manufacture method of eliminating the distribution pattern coupling especially.
Background technology
The microcavity filter is a kind of device that utilizes the interior signal-selectivity download of frequency-selecting effect realization channel of microcavity.Because the microcavity volume is little, channel lines width, free spectral domain is big, and utilize the cascade cavity configuration can realize characteristics such as various filtering characteristic, be wave-dividing device (C.Manolatou, etc, the Coupling of modes analysis ofresonant channel add-drop filters that application prospect is arranged in wavelength division multiplexing (WDM) system very much, IEEE J.Quantum Electron.35, p.1322 (1999)).
Filter based on distributed feed-back is only supported standing wave mode owing to single chamber, therefore needs at least two resonant cavitys could realize that signal is downloaded completely.Loop micro-cavity wave-guide filter is owing to have the capable mode characteristics of high-quality-factor, can under the small size cavity configuration, obtain the filtering characteristic of narrow linewidth, big free spectrum width, and a plurality of loop micro-cavity wave-guides of cascade can have bigger design freedom, the high-order filtering performance of the characteristic that improves.(B.E.Little，etc，Microring?resonator?channeldropping?filters，J.Lightwave?Technol.15，p.998(1997))。In common annular micro-cavity wave-guide filter, because the coupling length of annulus and input and output straight wave guide part is very short, coupling efficiency is very low.In order to address this problem, loop micro-cavity wave-guide filter (R.Grover, etc, Laterally coupled InP Based single modemicroracetrack notch filter have been proposed again, IEEEPhoton.Technol.Lett.15, p.1082 (2003)).This microcavity and waveguide-coupled structure are at waveguide-coupled laser (S.J.Choi simultaneously, etc, Eight-channel microdisk CW laserarrays vertically coupled to common output bus waveguides, IEEEPhoton.Technol.Lett.16, p.356 (2004)), modulator (Q.Xu, etc, Micrometre-scale silicon electro-optic modulator, Nature 435, p.325 (2005)), delayer (J.K.S.Poon, etc, Transmission andgroup delay of microring coupled-resonator opticalwaveguides, Opt.Lett.31, p.456 (2006)) and gate (T.A.Ibrahim, etc, Alloptical and/nand logic gates using semiconductor microresonators, IEEE Photon.Technol.Lett.15, p.1422 (2003)) etc. obtain extensive concern in the application.In all these were used, the coupling of waveguide and microcavity was the basis.In filter, it has directly determined performance parameters such as filtration efficiency, extinction ratio and on-off ratio.The coupling chromatic dispersion is again the important parameter at the designing filter operating wavelength range, especially under the close coupling situation, serious coupling chromatic dispersion makes the energy at filter disresonance wavelength place also significantly download (R.Grover, etc, Laterally coupledInP Based single mode microracetrack notch filter, IEEEPhoton.Technol.Lett.15, p.1082 (2003); P.Dumon, etc, Low loss SOIphotonic wires and ring resonators fabricated with deep UVlithography, IEEE Photon.Technol.Lett.16, p.1328 (2004)).The present invention is directed to the coupling chromatic dispersion problem in the loop micro-cavity wave-guide filter,, optimize filter construction and weaken the distribution pattern coupling phenomenon, improve the extinction ratio and the fineness of filter by analyzing the variation of filtering characteristic under the different structure parameter.
Summary of the invention
The objective of the invention is to, a kind of loop micro-cavity wave-guide filter and manufacture method of eliminating the distribution pattern coupling is provided, by the influence of the difference between investigation input waveguide and output waveguide and loop micro-cavity wave-guide width to loop micro-cavity wave-guide filter extinction ratio and fineness, realization is to the optimization of device waveguiding structure, weaken even eliminate the distribution pattern coupling phenomenon, obtain the loop micro-cavity wave-guide filter of High Extinction Ratio and high-fineness.
The objective of the invention is to realize by following scheme:
The invention provides a kind of manufacture method of eliminating the loop micro-cavity wave-guide filter of distribution pattern coupling, it is characterized in that, comprise the steps:
(1) waveguide covering, ducting layer and last waveguide covering under growing successively on the substrate;
(2) the waveguide cladding surface is coated photoresist on cleaning up;
(3) by common photoetching or electron beam exposure and developing technique with required figure transfer to photoresist;
(4), obtain the entire device structure by chemical corrosion or dry etching.
Wherein by chemical corrosion or dry etching, etching depth stops at the centre of ducting layer or following waveguide covering.
Wherein required figure is a loop micro-cavity wave-guide, and the input waveguide and the output waveguide of two rectilinear forms arranged in the both sides of loop micro-cavity wave-guide.
Wherein the width of this input waveguide and output waveguide is greater than or less than the width of loop micro-cavity wave-guide.
Wherein the refractive index of ducting layer is higher than the refractive index of waveguide covering and following waveguide covering.
Wherein the material of ducting layer is III-V family material or Si sill.
Wherein an end of input waveguide is an input, and the other end is the transmission end, and output waveguide is for downloading end.
The invention provides a kind of loop micro-cavity wave-guide filter of eliminating the distribution pattern coupling, it is characterized in that, comprising:
One substrate;
Waveguide covering once, this time waveguide covering is grown on the substrate, and the surface of this time waveguide covering is formed with loop micro-cavity wave-guide through etching, is formed with the input waveguide and an output waveguide of a linearity in the both sides of loop micro-cavity wave-guide;
One ducting layer, this ducting layer are grown in down on the loop micro-cavity wave-guide and input waveguide and output waveguide that forms on the waveguide covering;
Waveguide covering on one, waveguide covering is grown on the ducting layer on this.
Wherein the width of this input waveguide and output waveguide is greater than or less than the width of loop micro-cavity wave-guide.
Wherein the refractive index of ducting layer is higher than the refractive index of waveguide covering and following waveguide covering.
Wherein the material of ducting layer is III-V family material or Si sill.
Wherein an end of input waveguide is an input, and the other end is the transmission end, and output waveguide is for downloading end.
Description of drawings
For better explanation purpose of the present invention, below in conjunction with drawings and Examples describe in detail as after, wherein:
Fig. 1 is the longitudinal sectional drawing of loop micro-cavity wave-guide filter of the present invention;
Fig. 2 is the vertical view of Fig. 1;
Fig. 3 is the normalization transmission spectrum of the transmission end of input waveguide 222 in the loop micro-cavity wave-guide filter of symmetrical beam waveguiding structure;
Fig. 4 is the normalization transmission spectrum of the transmission end of input waveguide 222 in the loop micro-cavity wave-guide filter of asymmetrical beam waveguiding structure;
Fig. 5 is at the input waveguide 222 width one way normalization transmission spectrum of the transmission end of input waveguide 222 simultaneously not in the loop micro-cavity wave-guide filter;
Fig. 6 is at the input waveguide 222 width one way normalization transmission spectrum of the transmission end of input waveguide 222 simultaneously not in the loop micro-cavity wave-guide filter.
Embodiment
See also Fig. 1 and Fig. 2, the invention provides a kind of manufacture method of eliminating the loop micro-cavity wave-guide filter of distribution pattern coupling, comprise the steps:
(1) waveguide covering 22, ducting layer 33 and last waveguide covering 44 under growing successively on the substrate 11; Wherein the refractive index of ducting layer 33 is higher than the refractive index of waveguide covering 44 and following waveguide covering 22; Wherein the material of ducting layer 33 is III-V family material or Si sill;
(2) photoresist 55 is coated on waveguide covering 44 surfaces on cleaning up;
(3) by common photoetching or electron beam exposure and developing technique with required figure transfer to photoresist 55, wherein required figure is a loop micro-cavity wave-guide 333, and the input waveguide 222 and the output waveguide 444 of two rectilinear forms arranged in the both sides of loop micro-cavity wave-guide 333; Wherein the width of this input waveguide 222 and output waveguide 444 is greater than or less than the width of loop micro-cavity wave-guide 33; Wherein an end of input waveguide 222 is an input, and the other end is the transmission end, and output waveguide 444 is for downloading end;
(4), obtain the entire device structure by chemical corrosion or dry etching; Described by chemical corrosion or dry etching, etching depth stops at the centre of ducting layer 33 or following waveguide covering 22.
In conjunction with consulting Fig. 1 and Fig. 2, a kind of loop micro-cavity wave-guide filter of eliminating the distribution pattern coupling of the present invention comprises:
One substrate 11;
Once the waveguide covering 22, and this time waveguide covering 22 is grown on the substrate 11, and the surface of this time waveguide covering 22 is formed with loop micro-cavity wave-guide 333 through etching, are formed with the input waveguide 222 and an output waveguide 444 of a linearity in the both sides of loop micro-cavity wave-guide 333;
One ducting layer 33, this ducting layer 33 are grown in down on the loop micro-cavity wave-guide 333 and input waveguide 222 and output waveguide 444 that forms on the waveguide covering 22; Wherein the width of this input waveguide 222 and output waveguide 444 is greater than or less than the width of loop micro-cavity wave-guide 333; Wherein an end of input waveguide 222 is an input, and the other end is the transmission end, and output waveguide 444 is for downloading end;
Wherein the refractive index of ducting layer 33 is higher than the refractive index of waveguide covering 44 and following waveguide covering 22; Wherein the material of ducting layer 33 is III-V family material or Si sill;
Waveguide covering 44 on one, waveguide covering 44 is grown on the ducting layer 33 on this.
Please consult Fig. 1 and Fig. 2 again, a kind of manufacture method of eliminating the loop micro-cavity wave-guide filter of distribution pattern coupling of the present invention comprises the steps:
(1) waveguide covering 22, waveguide covering 33 and last waveguide covering 44 under growing successively on the substrate 11 that cleans up;
(2) resist coating 55 on the good structure sheet of (1) step epitaxial growth, by common photoetching or electron beam exposure and developing technique required planar graph is transferred on the photoresist 55, Fig. 2 is seen in the planar graph definition, what show among the figure is loop micro-cavity wave-guide 333, but be not limited to loop micro-cavity wave-guide 333, any loop micro-cavity wave-guide all is fit to.Input waveguide 222 and output waveguide 444 duct widths equate, and are not equal to the duct width of loop micro-cavity wave-guide 333.The distance that input waveguide 222 leaves loop micro-cavity wave-guide 333 can equate with the distance that output waveguide 444 is left loop micro-cavity wave-guide 333, also can not wait.
(3) by chemical corrosion or dry etching method with the figure transfer on the photoresist 55 to last waveguide covering 44, ducting layer 33 and following waveguide covering 22.Wherein etching can stop at the centre of ducting layer 33 or time waveguide covering 22, and waveguide covering 44 was etched and sees through on emphasis guaranteed.
Please shown in Figure 1 in conjunction with consulting again, ducting layer 33 is ducting layers 33 of high-index material, can be the SiN in the Si base, also can be GaAs and InGaAsP in III-V family material.Ducting layer 33 is covered by last waveguide covering 44 and following waveguide covering 22 respectively up and down, and last waveguide covering 44 and following waveguide covering 22 can be that same material also can be a different materials, and its refractive index of principal security is lower than ducting layer 33.Last waveguide covering 44 can also be an air layer, and promptly ducting layer 33 directly contacts with air.Substrate 11 is device substrate, substrate 11 should with following waveguide covering 44 lattice match, also can adopt identical materials with following waveguide covering 44.Again in conjunction with shown in Figure 2, input waveguide 222 and output waveguide 444 are input waveguide 222 and the output waveguides 444 in the filter construction, wherein input waveguide 222 two ends are defined as the input and the transmission end of filter respectively, and the port definition of input homonymy is for downloading end in the output waveguide 444 and in the input waveguide 222.Remove loop micro-cavity wave-guide 333 among Fig. 2, input waveguide 222, the shadow region of output waveguide 444, other parts are all represented air.
See also shown in Figure 2ly, incoming signal is entered by the input of input waveguide 222, with loop micro-cavity wave-guide 333 the coupling rear sections takes place and stays in the input waveguide 222 by the output of transmission end, and part enters output waveguide 444 by downloading end output.
Fig. 3 is the normalization transmission spectrum of the transmission end of input waveguide 222 in symmetrical beam waveguiding structure (duct width of input waveguide 222 and output waveguide 444 is equal to the duct width of the loop micro-cavity wave-guide 333) loop micro-cavity wave-guide filter.This figure is the numerical simulation result to device illustrated in figures 1 and 2, has just adopted the symmetrical beam waveguiding structure this moment.The structural parameters of selecting for use in the calculating are as follows: partly long 3.5 microns of the straight wave guides of loop micro-cavity wave-guide 333, and 2 microns of annulus part external diameters, these two parameters are selected respective channels 5THz at interval.The waveguide of loop micro-cavity wave-guide 333 is wide, and input waveguide 222 and output waveguide 444 waveguides are wide to be all 0.2 micron, and such duct width guarantees that be single mode waveguide in considering wave-length coverage.Input waveguide 222 and output waveguide 444 and loop micro-cavity wave-guide 333 spacings are all 0.2 micron.The waveguide of loop micro-cavity wave-guide 333 is wide, and input waveguide 222 and output waveguide 444 equivalent refractive index under two-dimentional mould shape is all 3.2, the equivalent refractive index of the vertical sandwich construction of this corresponding InGaAsP material.Solid line is respectively the normalization transmission spectrum of the relative incident wave of input waveguide 222 transmission end signal power circuits among Fig. 3, and dotted line is an one way normalization transmission spectrum, and promptly corresponding light signal is along propagating preceding transmission spectrum of a week in the loop micro-cavity wave-guide 333.The coupling of big more corresponding loop micro-cavity wave-guide 333 of dotted line value and input waveguide 222 is weak more.Can see tangible distribution pattern coupling phenomenon by Fig. 3, the envelope of input waveguide 222 transmission end transmission spectrums a dell occurred near 1.55 microns of wavelength, in the scope of nearly 80 nanometers whether the transfer rate of the input waveguide 222 transmission ends of resonance wave strong point all be lower than 10%.The transfer rate at the 1.5528 microns places of disresonance wavelength in the middle of for example adjacent two resonant modes only 9.3%, just nearly 90% power circuit is from the download end output of output waveguide 444, this moment extinction ratio (resonance wave strong point transmission can flow and disresonance wavelength place transmit can stream ratio) have only 0.4dB, fineness (ratio of the mode of resonance live width at free spectral domain and resonance wavelength place) only is 1.Find simultaneously a resonance wave strong point signal at 2.0707 microns places in input waveguide 222 transmission end transfer rates near 1, just signal is almost subzero year.
Fig. 4 is the normalization transmission spectrum of the transmission end of input waveguide 222 in asymmetrical beam waveguiding structure (duct width of input waveguide 222 and output waveguide 444 is not equal to the duct width of the loop micro-cavity wave-guide 333) loop micro-cavity wave-guide filter.Here the waveguide of input waveguide 222 and output waveguide 444 is wide 0.24 micron, and other parameters are identical with Fig. 3.Can see that the hole in the transmission spectrum of input waveguide 222 transmission ends almost disappears.The transfer rate of the disresonance wavelength place input waveguide 222 transmission ends in the more whole wave-length coverage in the middle of adjacent two resonant modes is located minimum but still greater than 96%, this moment, extinction ratio reached 14.7dB, had improved 36 times than symmetrical optical waveguide structure at 1.6025 microns.And the resonance peak broadening of transmission spectrum the lowest point also is suppressed, and improved 8 times with the comparison fineness as a result of Fig. 3, so we can adopt this asymmetrical beam waveguiding structure to suppress even eliminate this distributed couplings phenomenon, improves device extinction ratio and fineness.
Fig. 5 be in the loop micro-cavity wave-guide filter when the duct width of different input waveguides 222 the one way normalization transmission spectrum of input waveguide 222 transmission ends, wherein other parameters are identical with Fig. 3.The duct width difference that can see the duct width of input waveguide 222 and loop micro-cavity wave-guide 333 is big more, and one way normalization transmission spectrum minimum value is big more, and coupling just is weak more, and the distribution pattern coupling phenomenon is not obvious more.According to this variation tendency, can optimize duct width according to the needs of practical application, eliminate the distribution pattern coupling phenomenon to greatest extent, improve extinction ratio and fineness.General when the duct width of loop micro-cavity wave-guide 333 is taken as 0.2 micron, the duct width of input waveguide 222 is taken as 0.24 micron better.
Fig. 6 be in the annular micro-cavity wave-guide filter when the duct width of different input waveguides 222 the one way normalization transmission spectrum of the transmission end of input waveguide 222.The annulus outer radius is respectively 4,6, and 10 microns, the same Fig. 3 of other structural parameters.In the duct width of input waveguide 222 is 0.2 micron symmetrical wave guide structure, there is tangible distribution pattern coupling phenomenon equally, this is the universal phenomenon in a kind of loop micro-cavity wave-guide filter.In the duct width of input waveguide 222 is 0.26 micron asymmetrical wave guide structure, find that the distribution pattern coupling is subjected to very big inhibition equally.
Remove the photoresist 55 of the superiors at last.
The front is that example describes the present invention with the InGaAsP material, but is not construed as limiting the invention.
Disclosed, be a kind of of preferred embodiment, the change of every part or modification and come from the technological thought of the new shape of this practicality and be have the knack of this technology the people was easy to know by inference, all do not break away from patent right scope of the present invention.
Claims (12)
1, a kind of manufacture method of eliminating the loop micro-cavity wave-guide filter of distribution pattern coupling, this loop micro-cavity wave-guide filter is made up of a loop micro-cavity wave-guide and the input waveguide and the output waveguide that form in the loop micro-cavity wave-guide both sides, the width of this input waveguide and output waveguide is not equal to the width of loop micro-cavity wave-guide, it is characterized in that, comprise the steps:
(1) waveguide covering, ducting layer and last waveguide covering under growing successively on the substrate, refractive index of waveguide covering and following waveguide covering is less than the refractive index of ducting layer on this;
(2) the waveguide cladding surface is coated photoresist on cleaning up;
(3) by common photoetching or electron beam exposure and developing technique with required figure transfer to photoresist;
(4), obtain the entire device structure by chemical corrosion or dry etching.
2, the manufacture method of the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 1 is characterized in that, wherein by chemical corrosion or dry etching, etching depth stops at the centre of ducting layer or following waveguide covering.
3, the manufacture method of the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 1, it is characterized in that, wherein required figure is a loop micro-cavity wave-guide, and the input waveguide and the output waveguide of two rectilinear forms arranged in the both sides of loop micro-cavity wave-guide.
4, the manufacture method of the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 3 is characterized in that wherein the width of this input waveguide and output waveguide is greater than or less than the width of loop micro-cavity wave-guide.
5, the manufacture method of the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 2 is characterized in that, wherein the refractive index of ducting layer is higher than the refractive index of waveguide covering and following waveguide covering.
6, according to the manufacture method of the loop micro-cavity wave-guide filter of claim 1,2, the coupling of 4 or 5 described elimination distribution patterns, it is characterized in that wherein the material of ducting layer is III-V family material or Si sill.
7, the manufacture method of the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 3 is characterized in that wherein an end of input waveguide is an input, and the other end is the transmission end, and output waveguide is for downloading end.
8, a kind of loop micro-cavity wave-guide filter of eliminating the distribution pattern coupling is characterized in that, comprising:
One substrate;
Waveguide covering once, this time waveguide covering is grown on the substrate, the surface of this time waveguide covering is formed with loop micro-cavity wave-guide through etching, be formed with the input waveguide and an output waveguide of a linearity in the both sides of loop micro-cavity wave-guide, the width of this input waveguide and output waveguide is not equal to the width of loop micro-cavity wave-guide;
One ducting layer, this ducting layer are grown in down on the loop micro-cavity wave-guide and input waveguide and output waveguide that forms on the waveguide covering;
Waveguide covering on one, waveguide covering is grown on the ducting layer on this;
The refractive index of this ducting layer is greater than the refractive index of last waveguide covering and following waveguide covering.
9, the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 8 is characterized in that wherein the width of this input waveguide and output waveguide is greater than or less than the width of loop micro-cavity wave-guide.
10, the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 9 is characterized in that, wherein the refractive index of ducting layer is higher than the refractive index of waveguide covering and following waveguide covering.
11, according to Claim 8 or the loop micro-cavity wave-guide filter of 10 described elimination distribution patterns coupling, it is characterized in that wherein the material of ducting layer is III-V family material or Si sill.
12, the loop micro-cavity wave-guide filter of elimination distribution pattern coupling according to claim 8 is characterized in that wherein an end of input waveguide is an input, and the other end is the transmission end, and output waveguide is for downloading end.
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| CN103178951B (en) * | 2013-03-15 | 2016-05-25 | 中国科学院半导体研究所 | Based on the chaos signal generator of tunable micro-ring resonator |
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| US20040008942A1 (en) * | 2002-07-11 | 2004-01-15 | Lambda Crossing Ltd. | Micro-ring resonator |
| US20040022474A1 (en) * | 2000-09-22 | 2004-02-05 | Lim Desmond R. | Methods of altering the resonance of waveguide micro-resonators |
| WO2005064375A1 (en) * | 2003-12-24 | 2005-07-14 | Pirelli & C. S.P.A. | Low loss microring resonator device |
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| US20040022474A1 (en) * | 2000-09-22 | 2004-02-05 | Lim Desmond R. | Methods of altering the resonance of waveguide micro-resonators |
| US20040008942A1 (en) * | 2002-07-11 | 2004-01-15 | Lambda Crossing Ltd. | Micro-ring resonator |
| WO2005064375A1 (en) * | 2003-12-24 | 2005-07-14 | Pirelli & C. S.P.A. | Low loss microring resonator device |
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