CN100476597C - Low-foam developer for radioactivity-sensitive composition - Google Patents
Low-foam developer for radioactivity-sensitive composition Download PDFInfo
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- CN100476597C CN100476597C CNB200410102993XA CN200410102993A CN100476597C CN 100476597 C CN100476597 C CN 100476597C CN B200410102993X A CNB200410102993X A CN B200410102993XA CN 200410102993 A CN200410102993 A CN 200410102993A CN 100476597 C CN100476597 C CN 100476597C
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Abstract
To provide a developer for low foaming radiation sensitive composition which excels in development capability, simultaneously exhibits a favorable developability and a pattern reproducibility for a radiation sensitive composition such as a color filter photoresist, a black matrix, a photo spacer or the like, and can solve problems during development caused by bubbles that may generate in a spraying process or the like. The developer for radiation sensitive composition includes a nonionic surfactant in a chemical formula 1, a nonionic surfactant in a chemical formula 2, a nonionic surfactant in a chemical formula 3, an alkali compound and water.
Description
Technical field
The invention provides the radiation sensitive compositions developer solution, it has simultaneously to the good development of radiation sensitive compositions such as pigment and photoresist and the reappearance of figure, the problem that the foam that produces in the steps such as energy elimination spraying causes when developing, spumescence is low and development capability is excellent.
Background technology
General colour liquid crystal display device is made by following method.The black matrix resin is set on transparency carriers such as glass and forms color filter red, green, blue (RGB) pixel, the nesa coating thereon that ito glass is such by sputtering method forms electrode, afterwards, further form alignment films thereon, inject liquid crystal then, thereby make colour liquid crystal display device.
The method of the color filter that uses in the formation colour liquid crystal display device has a variety of, after the photosensitive composite of coating dispersion by organic pigment and inorganic pigment, carries out the pigment dispersing method of rayed and development treatment but mainly adopt on transparency carrier.
The pigment dispersing method is that the colored photoresist that will be dispersed with organic pigment or inorganic pigment carries out spin coating and slot coated, form specific pattern of pixels, make color filter whereby, because the problem of the precision height of color filter location of pixels of making and thickness, life-span length, pin hole etc. is few, so be applicable to the LCD headed by the computer.
When carrying out development treatment for forming color filter, general potassium hydroxide (KOH), the tetramethyl ammonium hydroxide alkaline-based developers such as (TMAH) of using, such developer solution rapid permeability contains in the photosensitive composite in development step the organic pigment that is used for painted or shading and inorganic pigment and photoresist composition, and obtain dissolving and dispersion, not residual not dissolved matter, not because of develop residual and once more absorption etc. produce the problem of residue.
In addition, require developer solution must be not because of development treatment repeatedly, absorb carbon dioxide in air and cause developing performance to change, and the pixel that forms has distinct pattern edge.
As alkaline-based developer, what be widely used is the tetramethyl ammonium hydroxide aqueous solution, but this developer solution can not be eliminated unwanted filming fully, not only produces scum silica frost in the pixel of Huo Deing, and is difficult to form the pixel with excellent image border.
Thereby,, proposed to add in the alkalitropism composition method of various surfactants based on the purpose of the performance that improves developer solution.
Open in flat 7-120935 number the spy of Japan and to disclose a kind of alkaline-based developer, it is the aqueous solution that contains alkali compounds and nonionic surfactant, and pH is 9～13, and the content of nonionic surfactant is 0.01 weight %～1.0 weight %.
Open in flat 9-171261 number the spy of Japan and to disclose the developer solution of being made up of the resiliency aqueous solution, this resiliency aqueous solution makes up nonionic surfactant, strong alkaline substance and alkalescent material and make.
The spy of Japan open sensitive volume and development conditions are disclosed in flat 9-034128 number permissible range greatly, impose a condition, take place when developing the few developer solution of problem of foam easily, it is the developer solution that contains nonionic surfactant and inorganic base composition, and described nonionic surfactant contains polyoxy alkylidene ether.
The spy of Japan open proposed with alkanolamine in flat 11-305451 number on addition the compound of oxirane and epoxypropane as the developer solution of the colored photoresist that is dispersed with pigment; The spy of Japan open proposed with the alkyl phenylene in flat 11-242342 number on addition the compound of oxirane as the developer solution of the colored photoresist that is dispersed with pigment.
Open flat 11-249322 number the spy of Japan and disclose a kind of alkaline-based developer, wherein, as alkali cpd, except that inorganic base, also use alkanolamine as the 2nd composition, and use alkyl (aryl, alkylaryl) to go up the nonionic surfactant that addition has polyoxyethylene and polyoxypropylene, even the pigment concentration height that contains in the radiation sensitive compositions like this, also not remaining not dissolved matter, do not produce scum silica frost, develop residual, problem such as adhere to once more, can be formed with the pixel of distinct pattern edge.
Open in flat 11-288102 number the spy of Japan and to disclose a kind of developer solution, it utilizes the organic basic composition, increases the dissolving selectivity by dissolubility that increases resist dissolving part and the dissolubility that suppresses non-dissolving part.
Open the spy of Japan and to disclose a kind of developer solution in 2000-066415 number, wherein the inorganic alkaline composition has nothing in common with each other.
Disclose for No. 1115035 at European patent and to have utilized addition of ethylene oxide and the manufacture method of epoxypropane and the purposes of having utilized the aqueous developer solution that contains the organic base composition of this method on the acetylenediol.
But, in order to improve the speed of color filter manufacturing step, broken away from the mode that is deposited on the developer solution, radiation sensitive compositions is developed, production stage becomes developer solution directly is sprayed onto spray pattern on the radiation sensitive compositions, but because of the surfactant that contains in the developer solution produces a large amount of foams, this descends throughput rate, since this problem, existing solution of groping this problem.
Summary of the invention
The invention provides the radiation sensitive compositions developer solution, it has simultaneously to color filter photoresist, black matrix, the good development of clearance material radiation sensitive compositions such as (photo spacer) and the reappearance of figure, the problem that the foam that produces in the steps such as energy elimination spraying causes when developing, spumescence is low and development capability is excellent.
In order to reach described purpose, the invention provides low-foam developer for radioactivity-sensitive composition, its contain that Chemical formula 1 represents in addition on the aromatic alcohol nonionic surfactant of alkylidene oxide, Chemical formula 2 represent in addition on the diamine derivative nonionic surfactant of alkylidene oxide, chemical formula 3 expressions addition on acetylenic glycols the nonionic surfactant of alkylidene oxide, alkali compounds and water.
In order to finish described technical task, the present invention specifically provides each component content following low-foam developer for radioactivity-sensitive composition, wherein, the addition on aromatic alcohol that following Chemical formula 1 is represented the nonionic surfactant of alkylidene oxide account for 5 weight %～20 weight %, the nonionic surfactant that following Chemical formula 2 is represented accounts for 1 weight %～20 weight %, the nonionic surfactant of following chemical formula 3 expressions accounts for 0.5 weight %～5 weight %, alkali compounds accounts for 1 weight %～10 weight %, and surplus is a water.
Developer solution of the present invention contains the nonionic surfactant that the following Chemical formula 1 of 5 weight %～20 weight % is represented.
[Chemical formula 1]
In the described Chemical formula 1, n is that 1～3 integer, AO are selected from least a in the group of being made up of oxidation ethylidene, oxypropylene and polyox-yethylene-polyoxypropylene block copolymer, and m is 5～30 integer.
The preferred HLB scope of the nonionic surfactant that described Chemical formula 1 is represented is 12～15, and capillary scope is 38～45 dynes per centimeter.
AO is oxidation ethylidene, oxypropylene or polyoxyethylene-polyoxypropylene block copolymers, and when the clanability of consideration developer solution and low spumescence, m is 6～20 integer preferably.
The representative nonionic surfactant that described Chemical formula 1 is represented has AGNIQUEDSP-13, AGNIQUE TSP-16 (above be the product of Cognis), Emulsogen TS 160, Emulsogen TS 200 (above be the product of Clariant), SPK, M-TSP 1026 (above be ト Application Na system (Co., Ltd.) product) etc.
In developer solution of the present invention, the nonionic surfactant that Chemical formula 1 is represented shows excellent emulsification dispersancy, low spumescence, the cleaning and the dispersion effect that are cleaned thing during to development are outstanding, can show the better development and the reappearance of pattern.
The whole developer solutions of relative 100 weight %, the content of the nonionic surfactant that Chemical formula 1 is represented is 5 weight %～20 weight %, is preferably 10 weight %～15 weight %.
If described content less than 5 weight %, then be difficult to make from the stripping of filming of non-exposed portion be cleaned thing, be that resin and granules of pigments are dispersed in rapidly the developer solution, exist development residue etc. once more attached to the problem of substrate surface.
In addition, if described content surpasses 20 weight %, have following problem: owing to the solubleness in aqueous solution reduce occur developer solution over time or dispersed particles condense or surfactant remains in and makes the generation degree of steeping in the developer solution serious on the substrate and then development decline once more.
In addition, developer solution of the present invention contains nonionic surfactant 1 weight %～20 weight % that useful following Chemical formula 2 is represented.
[Chemical formula 2]
In described Chemical formula 2, EO is that oxidation ethylidene, PO oxypropylene, each x and y are the integers that is selected from the group of being made up of the integer that satisfies x+y=4～25.
The preferred HLB scope of the nonionic surfactant that Chemical formula 2 is represented is 12～16, capillary scope is 35～45 dynes per centimeter.
The representative nonionic surfactant that described Chemical formula 2 is represented has Tetronic 504, Tetronic 704, Tetronic 904, Tetronic 1304 (above be the product of BASF) etc.
In developer solution of the present invention, the nonionic surfactant that Chemical formula 2 is represented shows excellent power of impregnation, emulsification dispersancy, outstanding to the osmotic effect of filming of non-exposed portion when developing, outstanding to the cleaning and the dispersion effect that are cleaned thing, can develop in the shorter time.
With respect to whole developer solutions of 100 weight %, the content of the nonionic surfactant that Chemical formula 2 is represented is 1 weight %～20 weight %, is preferably 5 weight %～15 weight %.
If described content is less than 1 weight %, then a little less than the power of impregnation of filming to non-exposed portion, and development time prolongs, be difficult to make stripping be cleaned thing, be that resin and granules of pigments are dispersed in rapidly in the developer solution, exist development residue etc. once more attached to the problem on the substrate surface.
In addition.If its content surpasses 20 weight %, there are the following problems: along with the solubleness in aqueous solution reduce and occur developer solution over time, along with the increase of power of impregnation, whole photoresists peels off and is difficult to form the serious and development operation decline of the generation degree of steeping optionally pattern, the developer solution, surfactant itself and remains on the substrate and the generation concave-convex surface with the form of residue from substrate.
In addition, the nonionic surfactant that can also contain above-mentioned Chemical formula 2 or 3 expressions of following chemical formula in the developer solution of the present invention respectively contains nonionic surfactant that 1 weight %～20 weight % Chemical formula 2s are represented or the nonionic surfactant that 0.5 weight %～5 weight % chemical formulas 3 are represented.
[chemical formula 3]
In the described chemical formula 3, AO is selected from least a in the group of being made up of oxidation ethylidene, oxypropylene and polyoxyethylene polyoxypropylene block copolymer, and n is 1～40 integer.
The preferred HLB scope of nonionic surfactant of chemical formula 3 expression is 8～18, capillary scope is 35～45 dynes per centimeter.
The representational nonionic surfactant of described chemical formula 3 expressions has Surfyno 1440, Surfyno 1465, Surfyno 1485, Surfyno12502 (more than be the product of Air product) etc.
In developer solution of the present invention, the nonionic surfactant of chemical formula 3 shows excellent power of impregnation, low spumescence, and the osmotic effect of filming to non-exposed portion during development is outstanding, can develop in the shorter time.
With respect to whole developer solutions of 100 weight %, the content of the nonionic surfactant of chemical formula 3 expressions is 0.5 weight %～5 weight %, is preferably 1 weight %～3 weight %.
If then there is following problems in content less than 0.5 weight %: the power of impregnation of filming to non-exposed portion is low, development time prolongs, be difficult to make being cleaned thing, being that resin and granules of pigments are dispersed in the developer solution rapidly of stripping, development residue etc. is once more attached on the substrate surface.
In addition, if its content surpasses 5 weight %, then there are the following problems: along with the minimizing of the solubleness in aqueous solution show developer solution over time, along with the whole photoresists of the increase of power of impregnation peel off and are difficult to form the serious and development operation decline of the generation degree of steeping pattern, the developer solution, surfactant itself with the form of residue residual and generation concave-convex surface on substrate from substrate.
In addition, the nonionic surfactant that the present invention uses is outstanding to emulsification dispersancy and its power of impregnation of capillary ability of the radiation sensitive compositions of development based on reduction, act on the radiation sensitive compositions of non-exposed portion and the surface tension between the substrate by reduction, radiation sensitive compositions is easily removed, in addition, it is also brought into play the function that the described composition that is removed disperses the emulsification of bonding agent and polymkeric substance etc. and prevents the function that it adheres to etc. once more.
In developer solution of the present invention, the purpose based on the dissolving radiation sensitive compositions with respect to whole developer solutions of 100 weight %, contains the alkaline components of 1 weight %～10 weight %.
In the developer solution that radiation sensitive compositions on the substrate is cleaned, eliminates, the known developer solution that inorganic alkaline developer, organic base developer solution, inorganic, organic mixed form are arranged.
As developer solution remaining hardly foreign matter after solvent evaporates of principal ingredient, can not corrode equipment with organic base and organic amine, good to the solubleness of radiation sensitive compositions, show the excellent performance of removing radiation sensitive compositions.As its example, can enumerate tetraalkylammonium hydroxide compounds such as tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide; Alkyl amine compounds such as monomethyl amine, dimethyl amine, Trimethylamine, ethamine, diethylamine, triethylamine, isopropylamine; Chain alcamine compounds such as monoethanolamine, 2-dimethylaminoethanol, 2-DEAE diethylaminoethanol, 2-diisopropylaminoethanol etc.
For the inorganic base developer solution, even long-time the use, the influence of the carbon dioxide that contains in the air that is subjected to is also few, so developer solution does not worsen basically, advantage with long-time stability and this excellent performance, particularly potassium hydroxide do not contain the sodium that the electronic drive circuit of liquid crystal indicator that color filter is installed is brought fault, so can prevent to corrode the problem that causes, we can say more preferably potassium hydroxide.As the example of inorganic base developer solution, can enumerate potassium hydroxide, NaOH, sodium carbonate etc.
The alkali compounds that uses in the developer composition of the present invention can use described organic compound or mineral compound, is preferably selected from the inorganic alkali compound in the group of being made up of potassium hydroxide, NaOH, sodium carbonate especially.
Such alkali compounds can use separately, perhaps mixes more than 2 kinds and 2 kinds and uses.
The content of described alkali compounds is preferably 1 weight %～10 weight %, if its content is less than 1 weight %, then poor to the dissolving power of the macromolecule component that constitutes radiation sensitive compositions, be difficult to fully remove radiation sensitive compositions,, the pattern that forms had only the aggravation of swelling phenomenon if surpass 10 weight %, along with separating out of inorganic base metal, the composition of developer solution changes, and separates at certain composition genetic horizon, thereby performance is caused harmful effect.
Be not particularly limited for the developing method of using developer solution of the present invention, can use the immersion development method, shake development method, drench spray development method, the development method of paddling methods such as (paddle developer).Developer solution of the present invention to form be coated with film development the time extremely useful, the long-time stability excellence of developing performance not only, and when utilizing black matrix, photoresist etc. that the low photosensitive composite of the transmitance of irradiates light is made color filter, also can disperse, dissolve unwanted particulate and resinous principle fully.In addition, do not produce the development residue, not only do not have adhering to once more of organic pigment, inorganic pigment and resin on the substrate, and do not have pixel to come off, problem such as film peels off, can form and the extremely excellent pixel of driving fit of substrate.
Developer solution of the present invention as above can provide, and compares it with existing developer solution and shows radiation sensitive compositions developer solution to the reappearance of the good development of radiation sensitive compositions such as pigment and photoresist and pattern and low spumescence (can eliminate the influence of foam to developing because of producing in the steps such as spraying), development capability excellence.
Description of drawings
Fig. 1 is the figure of expression according to the result after comparative example 1 development step.
Fig. 2 is the figure of expression according to the result after comparative example 2 development step.
Fig. 3 is the figure of expression according to the result after comparative example 3 development step.
Fig. 4 is the figure of expression according to the result after embodiments of the invention 1 development step.
Fig. 5 is the figure of expression according to the result after embodiments of the invention 10 development step.
Fig. 6 is the figure of expression according to the result after embodiments of the invention 14 development step.
Embodiment
In order to specifically describe the present invention, enumerate embodiment below and comparative example is described in detail.
But embodiments of the invention can change into various multi-form, and scope of the present invention is not limited only to the following embodiment that specifies.
According to radiation sensitive compositions developer solution of the present invention, can provide radiation sensitive compositions such as color filter photoresist, black matrix, clearance material are shown good development and pattern reappearance simultaneously; The influence of foam when developing that produces in the steps such as energy elimination spraying has low spumescence; And the radiation sensitive compositions developer solution of development capability excellence.
Comparative example 1～3 and embodiment 1～25
1. the manufacturing of developer solution
According to following table 1～4 composition of being put down in writing and content, in the mixing channel that is provided with stirring machine, add potassium hydroxide, the nonionic surfactant that Chemical formula 1 is represented, the nonionic surfactant that Chemical formula 2 is represented, the nonionic surfactant of chemical formula 3 expressions successively, and to wherein adding ultrapure water, the general assembly (TW) that makes developer solution is 100 weight %, then, stirred 0.5～1 hour in the speed of normal temperature, make developer solution stoste with 200～600rpm.Then, with ultrapure water the developer solution stoste dilution of making is made developer solution for 100 times.
For each comparative example that obtains like this and the developer solution of embodiment,, to pH, surface tension, power of impregnation, spumescence, development capability, estimate over time, the results are shown in table 1～4 based on following benchmark.
2. the evaluation of spumescence
With 100 times of above-mentioned developer solution dilutions of making, spumescence is estimated.With the developer solution of the 20mL capacity of packing into is in the glass tube of 200mL, with the flow of 100mL/min nitrogen is frothed in developer solution, measures foam volume and reaches 100cm
3Time, and as following, with 5 horizontal assess foam.
5:400 is more than second
4:300～400 second
3:200～300 second
2:100～200 second
1: less than 100 seconds
3. the evaluation of emulsifying dispersivity
With 100 times of above-mentioned developer solution dilutions of making, emulsifying dispersivity is estimated.With the developer solution of the 20mL capacity of packing into is in the glass tube of 200mL, after the concentration with 1% is disperseed the emulsification of radiation sensitive compositions stoste, and the emulsification dispersion stabilization on the evaluation time.
Stable more than 5:100 hour
4:80～100 hour
3:60～80 hour
2:40～60 hour
1: less than 40 hours
4. to over time evaluation
Preserve developer solution stoste at normal temperature (20 ℃/1 month) and high temperature (40 ℃/7 days) respectively, the face shaping of visual assessment developer solution stoste is chosen as when showing gonorrhoea phenomenon or phenomenon of phase separation " insufficient " then, and situation in addition is chosen as " excellence ".
5. the evaluation of Xian Yinging
5-1. the manufacturing of test piece
Utilize spin coater, コ one ニ Application グ (test of production code member 1737,5 * 5 * 0.7cm) companies with glass substrate on rotary coating resist (east friendly meticulous society produce), making final thickness is 1.9～2.0 μ m.Follow in the conventional drying device in 100 ℃ of prebakes 3 minutes.Then, with 150mJ/cm
2Exposure expose after, made the test piece that is used for development capability test.
5-2. the test of development capability
Implement the test of development capability with the test piece of above-mentioned preparation.The test method of development capability is as follows.In 26 ℃ temperature, on the heating plate of コ one ニ Application グ company, place the 500ml beaker, after the developer solution of the 250ml that packs into, Yi Bian make the bar magnet rotation, Yi Bian precipitation is implemented to develop.Carry out taking out described test piece after the development of certain hour, in ultrapure water, implement flushing by washing.After nitrogen drying, the exsiccator of same kind is 220 ℃ of strong oven dry of implementing 20 minutes during then with enforcement prebake.
5-3. the evaluation of development capability
Check above-mentioned test piece through developing with scanning electron microscope (SEM: Hitachi, Ltd, model name S-4100), estimating the pattern periphery that forms has the pattern edge of the residual and evaluation resist of exposed portion nothing but, and it the results are shown in following table 1 and table 2.
5: the situation that pattern edge distinctness, residue are removed fully
4: pattern edge distinctness, the residual situation that the small amount of residual thing is arranged
3: pattern edge elongation, the residual situation that the small amount of residual thing is arranged
2: pattern edge elongation, the residual situation that a large amount of residues are arranged
1: because the situation that poor visualization can't compare
Table 1
Table 2
Table 3
Table 4
Claims (7)
1, low-foam developer for radioactivity-sensitive composition, wherein, described developer comprises:
(i) nonionic surfactant represented of the following Chemical formula 1 of 5 weight %～20 weight %;
The (ii) nonionic surfactant of following chemical formula 3 expressions of the nonionic surfactant represented of the following Chemical formula 2 of 1 weight %～20 weight % or 0.5 weight %～5 weight %;
The (iii) alkali compounds of 1 weight %～10 weight %; With
The (iv) water of surplus;
Chemical formula 1
In the described Chemical formula 1, n is that 1～3 integer, AO are selected from least a in the group of being made up of oxidation ethylidene, oxypropylene and polyox-yethylene-polyoxypropylene block copolymer, and m is 5～30 integer;
Chemical formula 2:
In the described Chemical formula 2, EO is that oxidation ethylidene, PO are that oxypropylene, each x and y are the integers that is selected from the group of being made up of the integer that satisfies x+y=4～25;
Chemical formula 3
In the described chemical formula 3, AO is selected from least a in the group of being made up of oxidation ethylidene, oxypropylene and polyoxyethylene polyoxypropylene block copolymer, and n is 1～40 integer.
2, low-foam developer for radioactivity-sensitive composition as claimed in claim 1, wherein, the content of the nonionic surfactant that Chemical formula 1 is represented is 10 weight %～15 weight %, and the content of the nonionic surfactant of chemical formula 3 is 1 weight %～3 weight %.
3, low-foam developer for radioactivity-sensitive composition as claimed in claim 1, wherein, the content of the nonionic surfactant that Chemical formula 1 is represented is 5 weight %～10 weight %, and the content of the nonionic surfactant that Chemical formula 2 is represented is 5 weight %～15 weight %.
4, low-foam developer for radioactivity-sensitive composition as claimed in claim 1, wherein, the HLB scope of the nonionic surfactant that Chemical formula 1 is represented is 12～15, capillary scope is 38～45 dynes per centimeter.
5, low-foam developer for radioactivity-sensitive composition as claimed in claim 1, wherein, the HLB scope of the nonionic surfactant that Chemical formula 2 is represented is 12～16, capillary scope is 35～45 dynes per centimeter.
6, low-foam developer for radioactivity-sensitive composition as claimed in claim 1, wherein, the HLB scope of the nonionic surfactant of chemical formula 3 expressions is 8～18, capillary scope is 35～45 dynes per centimeter.
7, low-foam developer for radioactivity-sensitive composition as claimed in claim 1, wherein, described alkali compounds is to select from the group that potassium hydroxide, NaOH, sodium carbonate are formed.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2003-0099760A KR100539212B1 (en) | 2003-12-30 | 2003-12-30 | Low foaming developer for radiation sensitive composition |
| KR1020030099760 | 2003-12-30 | ||
| KR1020040011396A KR100555589B1 (en) | 2004-02-20 | 2004-02-20 | Developer for radiation sensitive composition |
| KR1020040011396 | 2004-02-20 |
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| CN1637621A CN1637621A (en) | 2005-07-13 |
| CN100476597C true CN100476597C (en) | 2009-04-08 |
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| CNB200410102993XA Active CN100476597C (en) | 2003-12-30 | 2004-12-29 | Low-foam developer for radioactivity-sensitive composition |
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| CN (1) | CN100476597C (en) |
| TW (1) | TWI297420B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007028294A1 (en) * | 2005-09-05 | 2007-03-15 | Byd Company Limited | A developer solution for photoresist |
| CN1928724B (en) * | 2005-09-05 | 2010-09-29 | 比亚迪股份有限公司 | Photoresistance developer |
| CN101178548B (en) * | 2006-11-08 | 2011-08-10 | 新应材股份有限公司 | Alkaline-based developer composition |
| ATE529782T1 (en) * | 2007-08-27 | 2011-11-15 | Agfa Graphics Nv | METHOD FOR DEVELOPING A HEAT SENSITIVE LITHOGRAPHY PRINTING PLATE USING AN AQUEOUS ALKALINE DEVELOPER SOLUTION |
| CN111176082A (en) * | 2020-02-14 | 2020-05-19 | 福建省佑达环保材料有限公司 | High-concentration CF developer composition for display panel field |
| CN113448185B (en) * | 2021-07-22 | 2022-08-05 | 福建省佑达环保材料有限公司 | Developing solution composition used in silicon-based OLED (organic light emitting diode) manufacturing process |
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| US5030550A (en) * | 1988-04-07 | 1991-07-09 | Fuji Photo Film Co., Ltd. | Developer for positive type photoresists |
| US5106724A (en) * | 1987-02-16 | 1992-04-21 | Konica Corporation | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive-type and developer composition for light-sensitive material |
| US5234796A (en) * | 1990-07-11 | 1993-08-10 | Konica Corporation | Method of developing presensitized offset printing plates and developing solution used in that method |
| US6107007A (en) * | 1992-02-10 | 2000-08-22 | Canon Kabushiki Kaisha | Lithography process |
| EP1115035A1 (en) * | 2000-01-04 | 2001-07-11 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
| CN1314931A (en) * | 1999-06-29 | 2001-09-26 | 克拉瑞特国际有限公司 | Water soluble resin composition |
| CN1392973A (en) * | 2000-09-21 | 2003-01-22 | 德山株式会社 | Developing solution for photoresist |
| JP4051821B2 (en) * | 1999-06-09 | 2008-02-27 | 松下電工株式会社 | Contact structure of electromagnetic relay and manufacturing method thereof |
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2004
- 2004-12-29 CN CNB200410102993XA patent/CN100476597C/en active Active
- 2004-12-29 TW TW93141056A patent/TWI297420B/en active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5106724A (en) * | 1987-02-16 | 1992-04-21 | Konica Corporation | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive-type and developer composition for light-sensitive material |
| US5030550A (en) * | 1988-04-07 | 1991-07-09 | Fuji Photo Film Co., Ltd. | Developer for positive type photoresists |
| US5234796A (en) * | 1990-07-11 | 1993-08-10 | Konica Corporation | Method of developing presensitized offset printing plates and developing solution used in that method |
| US6107007A (en) * | 1992-02-10 | 2000-08-22 | Canon Kabushiki Kaisha | Lithography process |
| JP4051821B2 (en) * | 1999-06-09 | 2008-02-27 | 松下電工株式会社 | Contact structure of electromagnetic relay and manufacturing method thereof |
| CN1314931A (en) * | 1999-06-29 | 2001-09-26 | 克拉瑞特国际有限公司 | Water soluble resin composition |
| EP1115035A1 (en) * | 2000-01-04 | 2001-07-11 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
| CN1392973A (en) * | 2000-09-21 | 2003-01-22 | 德山株式会社 | Developing solution for photoresist |
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|---|---|
| TWI297420B (en) | 2008-06-01 |
| CN1637621A (en) | 2005-07-13 |
| TW200521625A (en) | 2005-07-01 |
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