CN100469744C - Method for removing impurity of tetrafluoroethylene - Google Patents
Method for removing impurity of tetrafluoroethylene Download PDFInfo
- Publication number
- CN100469744C CN100469744C CNB2006101649611A CN200610164961A CN100469744C CN 100469744 C CN100469744 C CN 100469744C CN B2006101649611 A CNB2006101649611 A CN B2006101649611A CN 200610164961 A CN200610164961 A CN 200610164961A CN 100469744 C CN100469744 C CN 100469744C
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- Prior art keywords
- tetrafluoroethylene
- rectifying
- tower
- distillation column
- extractive distillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 title claims abstract description 72
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000012535 impurity Substances 0.000 title claims abstract description 19
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000007872 degassing Methods 0.000 claims abstract description 7
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 235000019407 octafluorocyclobutane Nutrition 0.000 claims abstract description 5
- 238000000895 extractive distillation Methods 0.000 claims description 31
- 238000003795 desorption Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 239000000945 filler Substances 0.000 claims description 13
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 239000011737 fluorine Substances 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 11
- 238000000605 extraction Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 4
- 238000012856 packing Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 abstract description 7
- 150000002576 ketones Chemical class 0.000 abstract description 5
- 150000001298 alcohols Chemical class 0.000 abstract description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 1
- 239000004341 Octafluorocyclobutane Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 43
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000005336 cracking Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- OOXUPJORBHWNHT-UHFFFAOYSA-N FC(C(F)=C=C)C(F)(F)F Chemical compound FC(C(F)=C=C)C(F)(F)F OOXUPJORBHWNHT-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 2
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UPLPHRJJTCUQAY-WIRWPRASSA-N 2,3-thioepoxy madol Chemical compound C([C@@H]1CC2)[C@@H]3S[C@@H]3C[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@](C)(O)[C@@]2(C)CC1 UPLPHRJJTCUQAY-WIRWPRASSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- -1 Methylene fluoride Trifluoromethane Carbon monoxide Chemical compound 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 125000004773 chlorofluoromethyl group Chemical group [H]C(F)(Cl)* 0.000 description 1
- 238000006392 deoxygenation reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001839 systemic circulation Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The invention discloses an impurity removing method in the perfluoroethylene, which comprises the following steps: distilling perfluoroethylene gas with impurity in the degassing tower; controlling certain quantity to rectify in the extracting rectifying tower; adopting oligomer solvent of alcohols, ketones, chloroform and octafluorocyclobutane as extractant; combusting fluoride impurity gas on the top of rectifying tower; adsorbing the component from extracting rectifying tower autoclave; returning the component to rectifying unit directly to obtain the product.
Description
Technical field
The present invention relates to chemical field, specifically, relate to a kind of method of removing impurity in the tetrafluoroethylene.
Background technology
Difluorochloromethane (CHClF
2, below be referred to as F
22) cracking generates needs in the technology of tetrafluoroethylene through with lower unit: the cracking unit, the Disacidifying and dewatering unit, compressed element, rectification cell obtains the higher tetrafluoroethylene monomer of purity (its process flow sheet is seen accompanying drawing one) at last, in the cracking unit, F
22Thermo-cracking generates tetrafluoroethylene (C
2F
4) monomer, generate a certain amount of impurity simultaneously as carbon monoxide, vinylidene, trifluoro-ethylene, methylene fluoride, trifluoromethane, its reaction equation is as follows:
In the cracking material, be dissolved with rare gas elementes such as oxygen, nitrogen, remove simultaneously in the acid unit is that water, alkali are removed the acid that reaction generates, owing to all be dissolved with rare gas elementes such as oxygen, nitrogen in the materials such as water, alkali, therefore rare gas element water-soluble, alkali also enters production system in these unit; At compressed element, because the import of compressor may form negative pressure, the micro-air in the environment will enter system.Based on above reason, contain gases such as a certain amount of oxygen nitrogen, carbon monoxide, vinylidene, trifluoro-ethylene, methylene fluoride, trifluoromethane in the whole production system.Because the tetrafluoroethylene activity is stronger, easy and tetrafluoroethylene reaction generation explosive substance when oxygen level reaches finite concentration, have a strong impact on the safety in production of tetrafluoroethylene, and if rare gas element accumulates increase in system, then the working pressure of total system also can raise, and whole production system can't be moved continuously; If materials such as fluorine-containing impurity such as vinylidene, trifluoro-ethylene, methylene fluoride, trifluoromethane accumulate, will have a strong impact on the quality product of tetrafluoroethylene in addition in system.Therefore the tetrafluoroethylene production system must efflux rare gas element and fluorine-containing foreign gases such as deoxygenation nitrogen, carbon monoxide continuously to system, with the continuous safe operation of guaranteeing total system and the quality product of tetrafluoroethylene.Because tetrafluoroethylene and rare gas element and foreign gas are not easily separated, so contain a large amount of tetrafluoroethylene gas in institute's exhaust body, it is formed as table 1.
Table 1
| The component title | Tetrafluoroethylene | Methylene fluoride | Trifluoromethane | Carbon monoxide | Other |
| Mass content % | 92.18 | 0.20 | 0.80 | 4.58 | 2.24 |
As can be seen from Table 1: contain a large amount of tetrafluoroethylene in institute's exhaust body, at present, in the tetrafluoroethylene production equipment, the quantity discharged of tetrafluoroethylene is about 1.5% of monomer output in institute's exhaust body, a large amount of tetrafluoroethylene is discharged in the air will cause certain environmental pollution, and therefore reclaiming tetrafluoroethylene has favorable economic benefit and social benefit.
About the report that reclaims tetrafluoroethylene from emission gases seldom, it is to utilize F that a kind of method is arranged at present
113Methyl alcohol, chloroform, the glycol dimethyl ether equal solvent is made extraction agent, the method of utilizing extracting rectifying is fluoro-gas such as tetrafluoroethylene, methylene fluoride, trifluoromethane, vinylidene, trifluoro-ethylene and rare gas element such as carbon monoxide, oxygen, nitrogen separately, the rectifying of fluoro-gas retrieval system gets tetrafluoroethylene, but there is following distinct disadvantage in this method: though 1. this method is isolated system to rare gas element, but this method is not with fluorine-containing foreign gas such as methylene fluoride, trifluoromethane, vinylidene, the trifluoro-ethylene separation system, fluorine-containing foreign gas is in systemic circulation and accumulation, when being accumulated to the quality that will have a strong impact on tetrafluoroethylene monomer when a certain amount of.2.F
113In use can enter in the atmosphere with emptying end gas, and F
113Because of the use that is under an embargo at present of havoc atmospheric ozone layer, with F
113The use that is under an embargo, this technology can not re-use.Solvent boiling point height, operation energy consumption height, corrodibility is strong, toxicity is big, it is high that material is required, therefore for guaranteeing the long period safe operation of tetrafluoroethylene production system, must seek the high novel solvent of Paratetrafluoroethylene selectivity and overcome above-mentioned shortcoming, adopting novel solvent is emphasis of the present invention.
Summary of the invention
The method that the purpose of this invention is to provide impurity in a kind of removal tetrafluoroethylene that is suitable for industrial applications.
In order to realize purpose of the present invention, the invention provides a kind of method of removing impurity in the tetrafluoroethylene, comprise the steps: impure tetrafluoroethylene gas by after the degassing tower fore-running, enter extractive distillation column rectifying, extraction agent is one or more in alcohols, ketone, chloroform or the Perfluorocyclobutane oligopolymer, the rare gas element of extracting rectifying column overhead directly goes burning disposal, the component of extracting rectifying Tata still gained is directly returned the tetrafluoroethylene production system after by the desorption tower desorb, and rectifying gets tetrafluoroethylene monomer again.
The production process of tetrafluoroethylene comprises cracking unit, compressed element, the whole process of rectification cell in the prior art, the foreign gas that discharging contains tetrafluoroethylene is the three wastes gas in the tetrafluoroethylene production process, owing to contain a large amount of tetrafluoroethylene in this gas, therefore along with the discharging of foreign gas, the tetrafluoroethylene loss is bigger, the purpose of this patent is exactly to reclaim the tetrafluoroethylene of loss, but the tetrafluoroethylene that reclaims can not also need further refining directly as the product use.Owing in the tetrafluoroethylene production process rectification cell is arranged, there is no need to establish again the tetrafluoroethylene that the independent rectifying of a cover rectifier unit is reclaimed, the present invention be the tetrafluoroethylene that will reclaim directly return tetrafluoroethylene that the rectification cell in the tetrafluoroethylene production process produces with cracking together rectifying obtain tetrafluoroethylene.This is a working cycle, will produce impure gas during rectifying continuously and simultaneously also obtain the tetrafluoroethylene product continuously, and the tetrafluoroethylene that reclaims in the foreign gas returns distillation system rectifying again continuously.
Wherein, containing after the foreign gas fore-running of tetrafluoroethylene preferably, the flow with 50～150kg/h enters extractive distillation column rectifying.
Wherein, described extraction agent alcohols is preferably C
1～C
4Lower alcohol, ketone is preferably C
1～C
4Lower ketones.
Wherein, the filler of extractive distillation column is preferably the special network of metal English and restrains this filler, metal Pall ring granular filler or metal structured packing.
Wherein, liquid-gas ratio is preferably 10～0.5:1, and liquid-gas ratio is an extraction agent and the volume ratio of the identical dimensional unit of the gas that enters extractive distillation column, for example rise/liter.
Wherein, the specific liquid rate of extractive distillation column is preferably 10～50m
3/ (m
2.h), the spray temperature is preferably-20～20 ℃.
Wherein, the pressure of extractive distillation column is preferably 0.1～1.0MPa.
Wherein, the pressure of desorption tower is preferably 0.01～0.8MPa.The tower top temperature of desorption tower is preferably-20～20 ℃, and tower still temperature is preferably 20～100 ℃.
The present invention is because of increasing the second-stage treatment system newly and selecting for use with the double solvents of alcohols, ketone, chloroform, Perfluorocyclobutane oligopolymer equal solvent and make extraction agent, effectively removed other fluorine-containing impurity, reached the purpose that not only can reclaim tetrafluoroethylene but also can remove fluorine-containing impurity, avoid fluorine-containing impurity in system, to circulate, guaranteed the stable of tetrafluoroethylene quality product.Present method turndown ratio is big, and technical process is short, and the extraction agent boiling point is relatively low, low toxicity, low-corrosiveness, low price, less demanding to material, and running cost is low, invest little, so suitable suitability for industrialized production of present method.
Description of drawings
Remove the schema of impurity in Fig. 1 tetrafluoroethylene tail gas.
Embodiment
Following examples are used to illustrate the present invention, but are not used for limiting the scope of the invention.
Embodiment 1
A kind of method of removing impurity in the tetrafluoroethylene, with impure tetrafluoroethylene gas by after the degassing tower fore-running, flow with 50kg/h enters extractive distillation column rectifying, extraction agent is a methyl alcohol, the fluorine-containing foreign gas of extracting rectifying column overhead is directly gone burning disposal, the component of extracting rectifying Tata still gained is directly returned the tetrafluoroethylene production system after by the desorption tower desorb, obtains tetrafluoroethylene monomer after the rectifying.The filler of described extractive distillation column is that the special network of metal English restrains this filler.During described extracting rectifying, liquid-gas ratio is 10:1.During described extracting rectifying, the specific liquid rate of extractive distillation column is 10m
3/ (m
2.h), the spray temperature is-20 ℃.During described extracting rectifying, the pressure of extractive distillation column is 0.1MPa.The tower top temperature of extractive distillation column is-20 ℃, and tower still temperature is 20 ℃.During described desorb rectifying, the pressure of desorption tower is 0.01MPa, and the tower top temperature of desorption tower is-20 ℃, and tower still temperature is 20 ℃.
Embodiment 2
A kind of method of removing impurity in the tetrafluoroethylene, with impure tetrafluoroethylene gas by after the degassing tower fore-running, flow with 100kg/h enters extractive distillation column rectifying, extraction agent is an acetone, the fluorine-containing foreign gas of extracting rectifying column overhead is directly gone burning disposal, the component of extracting rectifying Tata still gained is directly returned the tetrafluoroethylene production system after by the desorption tower desorb, obtains tetrafluoroethylene monomer after the rectifying.The filler of described extractive distillation column is a metal Pall ring granular filler.During described extracting rectifying, liquid-gas ratio is 5:1.During described extracting rectifying, the specific liquid rate of extractive distillation column is 30m
3/ (m
2.h), the spray temperature is 0 ℃.During described extracting rectifying, the pressure of extractive distillation column is 0.5MPa.The tower top temperature of extractive distillation column is 0 ℃, and tower still temperature is 60 ℃.During described desorb rectifying, the pressure of desorption tower is 0.1MPa, and the tower top temperature of desorption tower is 0 ℃, and tower still temperature is 60 ℃.
Embodiment 3
A kind of method of removing impurity in the tetrafluoroethylene, with impure tetrafluoroethylene gas by after the degassing tower fore-running, flow with 150kg/h enters extractive distillation column rectifying, extraction agent is a chloroform, the fluorine-containing foreign gas of extracting rectifying column overhead is directly gone burning disposal, the component of extracting rectifying Tata still gained is directly returned the tetrafluoroethylene production system after by the desorption tower desorb, obtains tetrafluoroethylene monomer after the rectifying.The filler of described extractive distillation column is a metal structured packing.When described extracting rectifying, liquid-gas ratio is 0.5:1.During described extracting rectifying, the specific liquid rate of extractive distillation column is 50m
3/ (m
2.h), the spray temperature is 20 ℃.During described extracting rectifying, the pressure of extractive distillation column is 1.0MPa.The tower top temperature of extractive distillation column is 20 ℃, and tower still temperature is 100 ℃.During described desorb rectifying, the pressure of desorption tower is 0.8MPa, and the tower top temperature of desorption tower is 20 ℃, and tower still temperature is 100 ℃.
Embodiment 4
A kind of method of removing impurity in the tetrafluoroethylene, with impure tetrafluoroethylene gas by after the degassing tower fore-running, flow with 100kg/h enters extractive distillation column rectifying, extraction agent is a Perfluorocyclobutane, the fluorine-containing foreign gas of extracting rectifying column overhead is directly gone burning disposal, the component of extracting rectifying Tata still gained is directly returned the tetrafluoroethylene production system after by the desorption tower desorb, obtains tetrafluoroethylene monomer after the rectifying.The filler of described extractive distillation column is a metal Pall ring granular filler.During described extracting rectifying, liquid-gas ratio is 2:1.During described extracting rectifying, the specific liquid rate of extractive distillation column is 30m
3/ (m
2.h), the spray temperature is 10 ℃.During described extracting rectifying, the pressure of extractive distillation column is 0.5MPa.The tower top temperature of extractive distillation column is-5 ℃, and tower still temperature is 50 ℃.During described desorb rectifying, the pressure of desorption tower is 0.1MPa, and the tower top temperature of desorption tower is 0 ℃, and tower still temperature is 60 ℃.
Claims (7)
1, a kind of method of removing impurity in the tetrafluoroethylene, comprise the steps: impure tetrafluoroethylene gas by after the degassing tower fore-running, enter the rectifying of extraction-rectification tower, extraction agent is one or more in methyl alcohol, acetone, chloroform, the Perfluorocyclobutane, the fluorine-containing foreign gas of extracting rectifying column overhead is directly gone burning disposal, the component of extracting rectifying Tata still gained is directly returned the tetrafluoroethylene production system after by the desorption tower desorb, obtains tetrafluoroethylene monomer after the rectifying.
2, the method for claim 1 is characterized in that the flow with 50～150kg/h enters extractive distillation column rectifying after the impure tetrafluoroethylene gas fore-running.
3, method as claimed in claim 1 or 2, the filler that it is characterized in that extractive distillation column are that the special network of metal English restrains this filler, metal Pall ring granular filler or metal structured packing.
4, method as claimed in claim 1 or 2, when it is characterized in that described extracting rectifying, liquid-gas ratio is 10～0.5:1.
5, method as claimed in claim 1 or 2, when it is characterized in that extracting rectifying, the specific liquid rate of extractive distillation column is 10～50m
3/ (m
2.h), the spray temperature is-20～20 ℃.
6, method as claimed in claim 1 or 2, when it is characterized in that extracting rectifying, the pressure of extractive distillation column is 0.1～1.0MPa, and the tower top temperature of extractive distillation column is-20～20 ℃, and tower still temperature is 20～100 ℃.
7, method as claimed in claim 1 or 2, when it is characterized in that desorb rectifying, the pressure of desorption tower is 0.01～0.8MPa, and the tower top temperature of desorption tower is-20～20 ℃, and tower still temperature is 20～100 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006101649611A CN100469744C (en) | 2006-12-08 | 2006-12-08 | Method for removing impurity of tetrafluoroethylene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006101649611A CN100469744C (en) | 2006-12-08 | 2006-12-08 | Method for removing impurity of tetrafluoroethylene |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1962585A CN1962585A (en) | 2007-05-16 |
| CN100469744C true CN100469744C (en) | 2009-03-18 |
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|---|---|---|---|
| CNB2006101649611A Expired - Fee Related CN100469744C (en) | 2006-12-08 | 2006-12-08 | Method for removing impurity of tetrafluoroethylene |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101550061B (en) * | 2009-05-13 | 2012-01-04 | 上海三爱富新材料股份有限公司 | Trifluoroethylene recovery method and device thereof |
| CN105237335B (en) * | 2015-10-28 | 2017-03-01 | 江苏海企技术工程股份有限公司 | TFE recovery process and its device |
| CN106316779B (en) * | 2016-08-18 | 2019-02-05 | 山东东岳高分子材料有限公司 | A method of recycling high-purity trifluoro-ethylene from tetrafluoroethene by-product |
| CN109867583B (en) * | 2019-03-15 | 2022-02-18 | 丹东明珠特种树脂有限公司 | Process for obtaining 2,4, 4-trimethyl-1-pentene from carbon tetra-laminated oil |
| CN110862295A (en) * | 2019-10-11 | 2020-03-06 | 江苏梅兰化工有限公司 | Novel process for preparing high-purity hexafluoropropylene |
| CN110818529B (en) * | 2019-10-11 | 2022-08-23 | 江苏梅兰化工有限公司 | Novel process for preparing high-purity vinylidene fluoride |
| CN114276213B (en) * | 2021-12-30 | 2024-03-19 | 浙江博瑞电子科技有限公司 | Method for removing trace unsaturated impurities of fluorine-containing organic matters |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3680289A (en) * | 1970-05-29 | 1972-08-01 | Kali Chemie Ag | Process of separating tetrafluoroethylene from gas mixtures containing the same |
-
2006
- 2006-12-08 CN CNB2006101649611A patent/CN100469744C/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3680289A (en) * | 1970-05-29 | 1972-08-01 | Kali Chemie Ag | Process of separating tetrafluoroethylene from gas mixtures containing the same |
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Address after: 643201 Zigong County, Sichuan Province, Chenguang Road, No. 135, Fushun Patentee after: ZHONGHAO CHENGUANG RESEARCH INSTITUTE OF CHEMICAL INDUSTRY Co.,Ltd. Address before: 643201 Chenguang Chemical Research Institute, Sichuan, Zigong Patentee before: ZHONGHAO CHENGUANG Research Institute OF CHEMICAL INDUSTRY |
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Granted publication date: 20090318 |