CN100444023C - Accurate magnetic suspension worktable for photo etching under extra ultraviolet - Google Patents
Accurate magnetic suspension worktable for photo etching under extra ultraviolet Download PDFInfo
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- CN100444023C CN100444023C CNB2004100096640A CN200410009664A CN100444023C CN 100444023 C CN100444023 C CN 100444023C CN B2004100096640 A CNB2004100096640 A CN B2004100096640A CN 200410009664 A CN200410009664 A CN 200410009664A CN 100444023 C CN100444023 C CN 100444023C
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Abstract
The present invention relates to an accurate magnetic suspension worktable for photo etching under extra ultraviolet. The present invention is composed of a microposition platform cluster assembly (117), a coarse positioning platform assembly (125) and a base assembly (132), wherein the base assembly (132) is arranged at the bottom; the coarse positioning platform assembly (125) is arranged over the base assembly (132), and the coarse positioning platform assembly (125) can move along Y direction corresponding to a base; the base (101) supports the coarse positioning platform assembly (125) through a magnetic suspension guide rail (102); the microposition platform assembly (117) is arranged over the coarse positioning platform assembly (125), the coarse positioning platform assembly (125) supports the microposition platform assembly (117) through a magnetic suspension guide rail (112), and the microposition platform assembly (117) moves along X direction corresponding to the coarse positioning platform assembly (125); a cable platform (107), a balance block (103) and an electromagnet (118) of the coarse positioning platform assembly (125) effectively reduces the positioning error of the worktable, and enhances the rigidity of the worktable. The present invention realizes the XY long travel linear motion and the six dimensions micromotion in directions of X, Y, Z, theta<X>, theta<Y> and theta<Z>. The present invention has the advantages of simple structure, high rigidity, low energy consumption and high accuracy. The present invention is suitable for accurate processing and detection operation of extra ultraviolet photo etching machines and other vacuum treatment environments.
Description
Technical field
The present invention relates to a kind of extreme ultraviolet photolithographic equipment, particularly the accurate magnetic levitation work stage of extreme ultraviolet photolithographic.
Background technology
The projection lithography technology is a cutting edge technology of IC lithography process, it utilizes being synchronized with the movement of mask platform and work stage, can project to the figure on the mask on the wafer that scribbles resist by the micro optical system, through technologies such as typing, developments, finally on wafer, copy figure again with reduction magnification.Scan exposure is different with disposable burn-out, and it utilizes the at the uniform velocity rectilinear scanning of conventional fillet slit image field to realize the continuous moving exposure that large chip size image field is interior, because image field is divided equally and can be reduced projection error and aberration; The continuously automatic leveling and focusing of one by one little image field can make full use of effective depth of focus of camera lens in scanning in addition, controls and has proofreaied and correct the local unevenness of wafer in the big image field better and enlarge and improved the photoetching process scope.Thereby utilizing the step-scan technology, the camera lens of little image field can carry out the photoetching of large size chip, and better image quality can be provided.
Extreme ultraviolet photolithographic (EUVL) is called as the most potential photoetching process of future generation, it utilizes the extreme ultraviolet light source of wavelength for 13.5nm, reduction projection by the multi-layer mirror formation, in vacuum environment, the mask pattern is copied on the silicon chip, the realization high resolution lithography (＜70nm).Fig. 1 is the EUVL fundamental diagram.An EUVL system has comprised a light source 1, for example synchrotron radiation light source or laser plasma light source, the X ray 2 that it sends is by condenser 3, light beam 4 after the convergence shines on the mask 5, mask 5 beam reflected are after optical system 7 reflections, pass window 8 again, mask graph projects on the wafer 9 the most at last.Mask 5 is installed on the mask platform 6, and wafer 9 is installed on the work stage 10.
EUVL adopts the scan exposure mode, the image quality of its litho machine not only depends on the quality of optical system, the Kinematic Positioning and the dynamic synchronization performance that also depend on work stage and mask platform, thereby strict requirement has been proposed for running precision, speed, acceleration and Kinematic Positioning and the scan-synchronized performance of work stage, mask platform.And, because EUVL works in vacuum environment, not only require each component materials and vacuum environment to adapt, require also that Workpiece platform structure is simple, energy consumption is low, in light weight, volume is little.
Existing photoetching precision workpiece stage structure has comprised multiple design proposal: a kind of is to adopt traditional mechanical positioning mode, i.e. rigidity contact is supported and " electric rotating machine+ball-screw " type of drive location.This locator meams exists very big disadvantage, not only produces friction, wearing and tearing, metallic dust, influences the microelectronic product quality, and the mass inertia of actuator and joint gap have reduced the bearing accuracy and the response frequency of equipment.Another kind is to adopt the air supporting locator meams, though eliminated friction, the structure bulky complex, support stiffness is little, and load-bearing capacity and impact resistance reduce, and also limit the raising of bearing accuracy.
US patent2002/0074516 discloses a kind of photoetching precision workpiece stage structure, the XY mobile platform of its design, the magnetic field shielding of motor can be fallen when its characteristics are scanning motion, relatively be suitable for the occasion of the strict control of needs electromagnetic interference (EMI) such as electron beam exposure apparatus.But for EUVL, the air-float guide rail that its uses problem that leaks air easily, thereby be not suitable for the vacuum operation environment of EUVL.
Magnetic levitation technology and linear contactless Driving technique are organically combined, become a kind of new approaches of precision positioning work stage.
US Patent 2004/0080727 discloses a kind of photoetching precision workpiece stage structure, is characterized in that motor has cooling device, has improved the heat radiation of motor, and it has used 2 linear electric motors at X, Y respectively to driving, and realizes the noncontact guiding with magnetic suspended guide.Shortcoming is to use motor too many, and energy consumption is big.
In addition, wire tension changes, and acceleration and the deceleration vibratory impulse that cause work stage of motor in motion process, also is a major issue of restriction workpiece station positioning accuracy and dynamic property.
US.Patent 5699621 discloses a kind of photoetching precision workpiece stage structure, and its X, Y platform all adopt linear motor driving, magnetic suspension guide to, simple in structure, energy consumption is low.But do not consider the interference problem of lead, and the motor accelerator is to the impact of work stage, thereby repetitive positioning accuracy is restricted.
US.Patent6353271 discloses a kind of EUVL precision workpiece stage structure, and it utilizes linear electric motors and magnetic suspended guide to drive the accurate location that can realize 6DOF.Its shortcoming is to have adopted " electric rotating machine+ball-screw " type of drive location in the step motion direction, also electromechanical shock power is not compensated.
Summary of the invention
At precision that exists in the existing photoetching precision workpiece stage and the contradiction between the stroke, and problem such as vibratory impulse, wire tension, the invention provides a kind of long stroke precision positioning of high precision work stage that is applicable to the operation of extreme ultraviolet photolithographic vacuum environment, the present invention not only can realize the step-scan campaign that the scan exposure process is required, and can improve mechanism precision and stability.
The technical solution adopted in the present invention:
A kind of accurate magnetic levitation work stage with 6DOF of the present invention mainly comprises the mini positioning platform assembly, coarse positioning platform assembly and base assembly.Wherein: base assembly is positioned at bottommost, and the coarse positioning platform assembly is positioned at directly over the base assembly, can move along the Y direction relative to pedestal, and pedestal supports the coarse positioning platform assembly by magnetic suspended guide.The mini positioning platform assembly is positioned at directly over the coarse positioning platform assembly, is supported by magnetic suspended guide by the coarse positioning platform assembly, can move along directions X relative to the coarse positioning platform assembly.
The structure of each assembly is as follows:
(A) base assembly is positioned at the bottommost of whole magnetic suspension precision work stage.Comprise:
(1) pedestal is positioned at the bottommost of work stage assembly, is the core component of base assembly.
(2) Y direction linear electric motors are elementary, are installed in the pedestal upper surface centre position, arrange along the Y direction.
(3) Y direction magnetic suspended guide is installed in the pedestal upper surface left and right sides, arranges along the Y direction.
(4) Y direction magnetic stripe is installed in pedestal upper surface, is symmetric arrangement in the elementary left and right sides of linear electric motors.
(B) coarse positioning platform assembly, this assembly is positioned at directly over the pedestal, and base assembly supports the coarse positioning platform assembly by magnetic suspended guide.Comprise:
(1) step rate, be positioned at pedestal directly over, electromagnet by two ends, the left and right sides and the action of a magnetic field between the pedestal magnetic suspended guide are suspended in the pedestal top.
(2) Y direction linear electric motors are secondary, are installed in the elementary corresponding position of linear electric motors on beam lower surface and the pedestal.
(3) the directions X linear electric motors are elementary, are installed in the beam upper surface, and direction is secondary vertical with Y direction linear electric motors.
(4) X is installed in both sides, beam front and back to magnetic suspended guide.
(5) Y is fixed in two ends, the step rate left and right sides to the motion electromagnet.
(6) cable stage is positioned at the step rate top, and is parallel with the mini positioning platform assembly, can move at beam upper edge directions X, and step rate supports cable stage by magnetic suspended guide.
(7) counterbalance weight is positioned at both sides, step rate front and back, can move at directions X along step rate.Step rate is by magnetic suspended guide balance support piece, and its supporting guide is positioned at the below of the corresponding guide rail of mini positioning platform assembly.
(C) mini positioning platform assembly is positioned at directly over the step rate, and step rate supports the mini positioning platform assembly by magnetic suspended guide.Comprise:
(1) micropositioner is positioned at directly over the step rate, has that the 1 long stroke of dimension (directions X) moves and 6 dimension precise motions (X, Y, Z direction mobile and around the rotation θ of X, Y, Z axle X, θ Y, θ Z) ability, and step rate supports micropositioner by magnetic suspended guide.
(2) vacuum cup is installed in micropositioner upper surface center.
(3) the directions X linear electric motors are secondary, are installed in the micropositioner lower surface, with the elementary corresponding position of the X linear electric motors in the coarse positioning platform assembly.
(4) laser mirror is installed in two mutually perpendicular edges of micropositioner upper surface, is used for the position probing of two-frequency laser interferometer measuring system.
The principle of work of the present invention and the course of work:
When giving Y when linear electric motors apply electric current, the linear motor driving coarse positioning platform assembly of step rate bottom and mini positioning platform assembly along Y to moving, i.e. step motion.Because the electromagnet at two ends, the beam left and right sides and the magnetic suspension force effect between base rail, and the magnet of beam bottom and the magnetic field force effect between the pedestal magnetic stripe keep contactless state between beam and pedestal.When the target location is arrived in the coarse positioning platform motion, apply electric current for the directions X linear electric motors, the thrust that motor produces can drive the mini positioning platform assembly and move i.e. scanning motion along directions X.Independently motor secondary has been installed in cable stage bottom, thereby applies electric current to motor and also can promote cable stage and move along directions X.Because the magnetic suspension force effect between the electromagnet before and after the step rate on the guide rail of both sides and micropositioner, cable stage, the counterbalance weight, step rate and said elements keep contactless state.3 directions that can realize micropositioner move and the little rotation of 3 directions, because vacuum cup and laser mirror be fixedly mounted on the micropositioner, so can obtain the motion same with micropositioner.
The invention has the beneficial effects as follows:
1, can realize the long stroke motion of X, Y both direction.Two long stroke motion motors of the present invention adopt cross arranged crosswise, have simple in structure, motion steadily, characteristic of low energy consumption.
2, mechanism precision height.Thick, little two-stage drive mode that the present invention adopts is compared with single-stage type of drive in the prior art, and the present invention can take into account high precision and long stroke;
3, the present invention introduces cable stage, has eliminated because wire tension changes the interference to the work stage motion;
4, the present invention adopts Magnetically suspended guide rail, has got rid of the trueness error that the guide mechanism friction causes.
5, the present invention adopts balance block device, and the vibratory impulse in the time of can effectively suppressing the motor acceleration, deceleration has improved stability.
6, structure of the present invention, driving and guiding design are particularly suitable for the vacuum operation environment, can be used for the operation of E UVL scan exposure.Also can be used for other precision positioning operation such as nanoprocessing, detection.
Description of drawings
Fig. 1 is the extreme ultraviolet photolithographic fundamental diagram.Among the figure: 1 light source, 2X ray, 3 condensers, 4 light beams, 5 masks, 6 mask platform, 7 reflective opticss, 8 windows, 9 wafers, 10 work stage.
Fig. 2 always schemes for the structure of the specific embodiment of the invention.Among the figure: 101 pedestals, 102Y are to magnetic suspended guide, 103 step rates, and 104 laser mirrors, 105 vacuum cups, 106 micropositioners, 107 cable stages, 108 counterbalance weights, 109 magnetic stripes, 110Y is elementary to linear electric motors, and 111Y is elementary to linear electric motors to guide rail magnetic stripe 113X.
Fig. 3 is the parts explosion of the specific embodiment of the invention.Among the figure: 117 mini positioning platform assemblies, 125 coarse positioning platform assemblies, 132 base assemblies.
Fig. 4 is the vertical view of step rate 103.Among the figure: 118a, 118b, 118c, 118d are electromagnet; 112a, 112b, 114a, 114b are that X is to the guide rail magnetic stripe.
Fig. 5 is the vertical view of mini positioning platform assembly 117.
Fig. 6 is the upward view of mini positioning platform assembly 117 correspondences.
Fig. 7 is the principle assumption diagram of micropositioner 106.Among the figure: 139 displacement transducers, 133 electromagnetism windings, 134 permanent magnets, 135 stators, 136 moving bodys.
Fig. 8 is cable stage 107 structural drawing.Among the figure: 120 supports, 122 output cable interfaces, 121 input cable interfaces, 123 displacement transducers, 118l, 118n electromagnet, 124 linear electric motors are secondary.
Fig. 9 is electromagnet 118 structural drawing in the work stage.
Embodiment
Further specify the present invention below in conjunction with embodiment.
Fig. 2, Fig. 3 are general structure arrangement of the present invention.As shown in Figure 3, the present invention comprises three parts altogether: mini positioning platform assembly 117, coarse positioning platform assembly 125 and base assembly 132.The main body of base assembly 132 is made up of to magnetic suspended guide 102a, 102b with two Y that are fixed in the pedestal two ends pedestal 101.Pedestal 101 upper surfaces are equipped with Y to linear electric motors elementary 110 and two magnetic stripe 109a, 109b.The main body of coarse positioning platform assembly 125 comprises step rate 103, cable stage 107 and counterbalance weight 108.Coarse positioning is decided platform assembly 125 and is supported by magnetic suspended guide 102 by base assembly 132.Step rate 103 lower surfaces are equipped with Y to secondary 116 and two the magnet 115a of linear electric motors, 115b.Electric motor primary 110 actings in conjunction on motor secondary 116 and the pedestal 101, can drive coarse positioning platform assembly 125 and mini positioning platform assembly 117 along Y to move.Magnetic field force size between magnetic stripe 109a, 109b on magnet 115a, 115b and the pedestal 101 just makes 101 of step rate 103 and pedestals keep contactless state, but the vibration can suppress step rate 103 high-speed motions the time, has increased the rigidity of step rate 103.Each is fixed with 2 electromagnet 118a respectively two ends, step rate 103 left and right sides, 118b, 118c, 118d, they with the pedestal guide assembly in corresponding magnetic stripe 111 (111a, 111b) between the magnetic field force effect of generation, step rate 103 is suspended in above the pedestal.Step rate 103 upper surfaces have been fixed X to linear electric motors elementary 113.Step rate 103 front and back both side surface are fixed with guide rail magnetic stripe 112 (112a, 112b) with 114 (114a, 114b), (108a 108b) is positioned at both sides, step rate 103 front and back to counterbalance weight 108, by electromagnet 118 (118k, 118m, 118i, 118j) with X to guide rail magnetic stripe 114 (114a, magnetic field force 114b) is adsorbed on the step rate 103, is moved along directions X by the reacting force driven equilibrium piece 108 of motor.Cable stage 107 is positioned at step rate 103 tops, also be by electromagnet 118 (118n, 118l) with X to guide rail magnetic stripe 112 (112a, 112b) magnetic field force between is suspended in directly over the step rate 103, drive by linear electric motors 124, can be at step rate 103 upper edge X to moving.Mini positioning platform assembly 117 is supported by magnetic suspended guide 112 by step rate 103, and its main body comprises micropositioner 106, laser mirror 104, vacuum cup 105.It is secondary 119 to linear electric motors that micropositioner 106 bottoms are equipped with X, and it and X be to elementary 113 effects of linear electric motors, drive mini positioning platform assembly 117 along X to long stroke motion.The electromagnet 118 of micropositioner 106 by being installed in its inboard, lower end (118e, 118f, 118g, 118h) (step rate 103 keeps constant clearance for 112a, 112b) the magnetic field force effect between, guarantees the linearity of X to long stroke motion to guide rail magnetic stripe 112 with X.Vacuum cup has been installed in micropositioner 106 upper surface centers, and laser mirror 104 has been installed at micropositioner 106 upper surfaces two mutually perpendicular edges.
Fig. 4 is the vertical view of step rate 103, and the lower surface of step rate 103 has been installed Y to linear electric motors secondary 116 and magnet 115a and 115b, and they are corresponding to linear electric motors elementary 110 and magnetic stripe 109a, 109b with the Y of pedestal upper surface respectively. Electromagnet 118a, 118b, 118c, the 118d of Y direction motion guide installed in step rate 103 left and right sides; Magnetic suspended guide magnetic stripe 112a, 114a, 112b, the 114b of X to motion installed in the outside, rear and front end.Step rate 103 upper surfaces are equipped with X elementary 113 to linear electric motors, are used to drive mini positioning platform assembly 117, realize the long stroke motion of directions X.
Fig. 5, Fig. 6 are respectively the vertical view and the backplan of mini positioning platform assembly 117 structures.Micropositioner 106 is supported by the magnetic suspended guide 112 of step rate 103, its lower surface has been installed X to linear electric motors secondary 119, it acts on to linear electric motors elementary 113 mutually with X on the step rate 103, makes micropositioner 106 possess long stroke (＞300 μ m) locomitivity at directions X.Micropositioner 106 two ends installed inside 4 electromagnet 118g, 118h, 118e, X is to guide rail magnetic stripe 112a on the 118f, they and step rate 103, the magnetic field force between 112b makes micropositioner 106 be suspended in the top of step rate 103.Along micropositioner 106 upper surfaces two mutually perpendicular edges laser mirror 104 has been installed, has been used to detect the position of micropositioner 106 and vacuum cup 105.Vacuum cup 105 is installed in micropositioner 106 upper surface centers, is used for fixing wafer to be processed.
Fig. 7 is the schematic diagram of micropositioner, and it is based on magnetic suspension principle, and moving body can produce the small movements of 6 degree of freedom directions.Be installed in the electric field force Ra and the magnetic field force Rs combined action of 134 of 4 corresponding on 4 electromagnetism windings 133 (I, II, III, IV) and the moving body 136 on the stator 135 permanent magnets, can drive moving body and move (nano-precision) or around little rotation (differential of the arc precision) of θ x, θ y, θ z along X, Y, Z direction are little.Because the effect of magnetic field force Rs, 136 of stator 135 and moving bodys keep contactless state.139 is displacement transducer, is used to detect the hoverheight between moving body and stator.
Fig. 8 is cable stage 107 structural drawing.Cable stage 107 is supported and suspended on step rate 103 tops by magnetic suspended guide 112.Cable stage 107 main bodys are supports 120, its below installed inside electromagnet 118n, 118l, they and X produce magnetic field force to guide rail magnetic stripe 112a between 112b, be used to support cable stage 107.It is secondary 124 to linear electric motors that X has been installed in cable stage 107 lower surface centers, and the X on it and the step rate 103 interacts to linear electric motors elementary 113, can promote cable stage 107 and move along directions X.Input cable interface 121 is installed in cable stage 107 bottoms, is used for being connected with extraneous input cable.Cable stage 107 upper surfaces have been installed output cable interface 122 towards mini positioning platform assembly 117 directions, are used for being connected with the cable of mini positioning platform assembly 117.Cable stage 107 left-hand face have been installed displacement transducer 123, are used to detect the distance of 106 of cable stage 107 and micropositioners.In the work stage motion process, cable length changes, and causes it to act on that tension force changes on the micropositioner 106, influences kinematic accuracy.The effect of cable stage 107 is that it can follow the motion of mini positioning platform assembly 117, and keeps constant distance with it, holds constant thereby make cable act on trying hard to keep on the mini positioning platform assembly 117.The also available independent DC servo motor of cable stage 107 drives.Because cable stage 107 accuracy requirements are not too high, thereby DC servo motor can meet the demands.
Fig. 9 is electromagnet 118 structural drawing.138 is body, and its two workplaces 130 and 131 intersect 45 degree, and this frame mode can be realized realizing accurate guide function with minimum electromagnet and sensor.130 faces are fixed with an electromagnet 126 and a displacement transducer 127,131 faces are fixed with an electromagnet 128 and a displacement transducer 129, can control magnetic field force between electromagnet and guide rail magnetic stripe by the control electromagnet current, thereby make the component suspension that links to each other with electromagnet on magnetic stripe, realize accurate noncontact guide function.Displacement transducer 127 and 129 is used to detect the hoverheight between electromagnet and respective track magnetic stripe.
Claims (6)
1, the accurate magnetic levitation work stage of a kind of extreme ultraviolet photolithographic, it is made up of mini positioning platform assembly [117], coarse positioning platform assembly [125], base assembly [132]; Base assembly [132] is positioned at bottommost, and coarse positioning platform assembly [125] is positioned at directly over the base assembly [132], can be relative to pedestal along Y to moving, pedestal [101] supports coarse positioning platform assembly [125] by magnetic suspended guide [102]; Mini positioning platform assembly [117] is positioned at directly over the coarse positioning platform assembly [125], support by magnetic suspended guide [112] by coarse positioning platform assembly [125], move along directions X relative to coarse positioning platform assembly [125], it is characterized in that: coarse positioning platform assembly [125] is supported by magnetic suspended guide [102] by base assembly [132], and its main body comprises step rate [103], cable stage [107] and counterbalance weight [108].
2, according to the accurate magnetic levitation work stage of the described extreme ultraviolet photolithographic of claim 1, it is characterized in that: described mini positioning platform assembly [117] comprises micropositioner [106], vacuum cup [105], laser mirror [104], electromagnet [118], linear electric motors secondary [119]; Micropositioner [106] is supported by the magnetic suspended guide [112] of step rate [103], its lower surface has been installed X to linear electric motors secondary [119], it acts on to linear electric motors elementary [113] mutually with X on the step rate [103], makes micropositioner [106] possess long stroke＞300 μ m locomitivities at directions X; Electromagnet [118g, 118h, 118e, 118f] has respectively been installed in micropositioner [106] inboard, two ends, and they and step rate [103] are gone up the magnetic field force of X between guide rail magnetic stripe [112a, 112b] makes micropositioner [106] be suspended in the top of step rate [103]; Along micropositioner [106] upper surface two mutually perpendicular edges laser mirror [104] has been installed, laser mirror [104] two work minute surfaces become to be arranged vertically; Vacuum cup [105] is installed in micropositioner [106] upper surface center; Mini positioning platform assembly [117] has long stroke motion and 6 degree of freedom directions of a direction, i.e. the micromotion ability that X, Y, Z direction move and θ x, θ y, θ z direction are rotated.
3, according to claim 1 or the accurate magnetic levitation work stage of 2 described extreme ultraviolet photolithographics, it is characterized in that: the main body of described base assembly [132] is made up of to magnetic suspended guide [102a, 102b] pedestal [101] and two Y being fixed in the pedestal two ends; Pedestal [101] upper surface is equipped with Y to linear electric motors elementary [110] and two magnetic stripes [109a, 109b].
4, according to the accurate magnetic levitation work stage of any one described extreme ultraviolet photolithographic of claim 1 to 2, it is characterized in that: step rate [103] lower surface is equipped with Y to linear electric motors secondary [116] and two magnets [115a, 115b]; Magnetic field force between the magnetic stripe [109a, 109b] on magnet [115a, 115b] and the pedestal [101] makes between step rate [103] and pedestal [101] and keeps contactless state; Each is fixed with electromagnet [118a, 118b, 118c, 118d] respectively step rate [103] two ends, the left and right sides; Step rate [103] is suspended on the pedestal [101]; Step rate [103] upper surface has been fixed X to linear electric motors elementary [113]; Both side surface is fixed with magnetic stripe [112,114] before and after the step rate [103], counterbalance weight [108a, 108b] is positioned at both sides, step rate [103] front and back, and the magnetic field force between guide rail magnetic stripe [114a, 114b] is adsorbed on the step rate [103] by electromagnet [118k, 118m, 118i, 118j] and X.
5, according to the accurate magnetic levitation work stage of the described extreme ultraviolet photolithographic of claim 4, it is characterized in that: described cable stage [107] is supported and suspended on step rate [103] top by magnetic suspended guide [112]; Cable stage [107] main body is support [120], its below installed inside electromagnet [118n, 1181]; X has been installed to linear electric motors secondary [124] in cable stage [107] lower surface center, X has installed input cable interface [121] to linear electric motors secondary [124] outside, cable stage [107] upper surface has been installed output cable interface [122] towards micropositioner [106] direction, and left-hand face has been installed displacement transducer [123].
6, according to claim 2 or the accurate magnetic levitation work stage of 5 described extreme ultraviolet photolithographics, the workplace [130,131] that it is characterized in that described electromagnet [118] intersects 45 degree, and each face respectively is fixed with an electromagnet [126,128] and a displacement transducer [127,129].
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| CNB2004100096640A CN100444023C (en) | 2004-10-14 | 2004-10-14 | Accurate magnetic suspension worktable for photo etching under extra ultraviolet |
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| CNB2004100096640A CN100444023C (en) | 2004-10-14 | 2004-10-14 | Accurate magnetic suspension worktable for photo etching under extra ultraviolet |
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| CN114888384B (en) * | 2022-06-02 | 2024-04-05 | 哈尔滨工业大学 | Electric spark plane shaking motor |
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| US6353271B1 (en) * | 1999-10-29 | 2002-03-05 | Euv, Llc | Extreme-UV scanning wafer and reticle stages |
| US20040080727A1 (en) * | 2002-10-23 | 2004-04-29 | Canon Kabushiki Kaisha | EUV exposure apparatus with cooling device to prevent overheat of electromagnetic motor in vacuum |
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| US5699621A (en) * | 1996-02-21 | 1997-12-23 | Massachusetts Institute Of Technology | Positioner with long travel in two dimensions |
| US6353271B1 (en) * | 1999-10-29 | 2002-03-05 | Euv, Llc | Extreme-UV scanning wafer and reticle stages |
| US20040080727A1 (en) * | 2002-10-23 | 2004-04-29 | Canon Kabushiki Kaisha | EUV exposure apparatus with cooling device to prevent overheat of electromagnetic motor in vacuum |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101834550A (en) * | 2010-04-27 | 2010-09-15 | 西安交通大学 | Positioning device based on maglev planar motor |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1760760A (en) | 2006-04-19 |
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