CN100436328C - Drying method of raw material blank in continuous production of vanadium nitride and its device - Google Patents
Drying method of raw material blank in continuous production of vanadium nitride and its device Download PDFInfo
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- CN100436328C CN100436328C CNB2004100218455A CN200410021845A CN100436328C CN 100436328 C CN100436328 C CN 100436328C CN B2004100218455 A CNB2004100218455 A CN B2004100218455A CN 200410021845 A CN200410021845 A CN 200410021845A CN 100436328 C CN100436328 C CN 100436328C
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- SKKMWRVAJNPLFY-UHFFFAOYSA-N azanylidynevanadium Chemical compound [V]#N SKKMWRVAJNPLFY-UHFFFAOYSA-N 0.000 title claims abstract description 40
- 238000001035 drying Methods 0.000 title claims abstract description 40
- 239000002994 raw material Substances 0.000 title abstract description 6
- 238000010924 continuous production Methods 0.000 title abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims description 82
- 238000005245 sintering Methods 0.000 claims description 76
- 238000000034 method Methods 0.000 claims description 43
- 239000007789 gas Substances 0.000 claims description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 6
- 230000001737 promoting effect Effects 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 238000003860 storage Methods 0.000 claims description 2
- 238000011084 recovery Methods 0.000 abstract description 2
- 229910052720 vanadium Inorganic materials 0.000 abstract description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 abstract description 2
- 238000001354 calcination Methods 0.000 abstract 7
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000002585 base Substances 0.000 description 49
- 230000003245 working effect Effects 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002912 waste gas Substances 0.000 description 3
- 239000003575 carbonaceous material Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- -1 ferrous metals Chemical class 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
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Abstract
The present invention discloses a drying method of raw material blanks in the continuous production of vanadium nitride, and a device thereof. The raw material blanks are delivered in a sealed auxiliary electrothermal furnace; simultaneously, protective gas is led to the auxiliary electrothermal furnace; the raw material blanks are dried for 4 to 7h in the temperature range of 400 to 700 DEG C and taken out of the auxiliary electrothermal furnace, and enter a main calcination furnace. The auxiliary electrothermal furnace is arranged at one side of the main calcination furnace; the auxiliary electrothermal furnace and the main calcination furnace are mutually communicated by fully enclosed and sealed passages; a gas inlet and a gas outlet are arranged on the auxiliary electrothermal furnace; the center line of the auxiliary electrothermal furnace is coincident with the automatic return center line of the main calcination furnace; a sealed valve is arranged between the auxiliary electrothermal furnace and the main calcination furnace. The raw material blanks after being dried enter the main calcination furnace. The present invention enhances energy utilization, is suitable for industrial mass production, reduces carrying times of charging, enhances labor productivity, simultaneously reduces the powder ratio of the charging, is favorable to enhance the vanadium recovery rate in the whole production process. The present invention can obviously enhance the service life of the main calcination furnace, and stabilize the product quality.
Description
Technical field
The present invention relates to a kind of pre-dried method and device thereof that is used for the furnace charge of vanadium nitride production process, especially the drying means and the device thereof of vanadium nitride continuous flow procedure Central Plains material base.
Background technology
At present, existing at home producing in the method for vanadium nitride, be not mentioned to relevant furnace charge pre-dried problem, external common way is to build a furnace dried furnace charge separately, and this dried forms can satisfy the processing requirement described in U.S. Pat 3334992, US4040814, US3745209, the US4562057.Implement that application number is 01139886.8, publication number is in the process of 1422800 " production method of vanadium nitride ", owing to adopted the method for continuous production vanadium nitride, can shorten the production cycle, make full use of the energy, increase substantially production efficiency and reduce production costs.But, produce in the process of vanadium nitride in the method for using the continuous production vanadium nitride, the drying mode of finding furnace charge is to contain a certain amount of lower boiling alkali metal in the furnace charge to be reduced into simple substance to work-ing life of main sintering oven bigger influence, its major cause being arranged, such as K and Na.Because the working temperature of main sintering oven far surpasses the boiling point of alkali metal, therefore these alkali metals will be sent out the biophase migration by the mode of steam, just obtain their steam after for example K and Na are reduced, and move to the venting port direction, run into water or CO with gas stream in the stove
2After then generate low melting point, high boiling highly basic, such as KOH, NaOH, K
2CO
3, Na
2CO
3Deng and be attached on the furnace chamber material, and constantly the furnace chamber material is corroded, have a strong impact on main sintering oven work-ing life, adopt carbonaceous material to make the furnace chamber material in the above-mentioned for this reason patent application " production method of vanadium nitride ".Carbonaceous material is made the furnace chamber material can more effectively stop the alkaline corrosion, but at high temperature can't stop the erosion of water, and main like this sintering oven is still not ideal enough work-ing life.
Summary of the invention
Have now in the process of utilizing the vanadium nitride continuous production method to produce vanadium nitride in order to overcome, because former material base water content is bigger, thereby the deficiency that bigger influence is arranged work-ing life to main sintering oven, the water content that technical problem to be solved by this invention provides a kind of former material base that can guarantee to enter main sintering oven is low, thereby improves the drying means and the device thereof of vanadium nitride continuous flow procedure Central Plains material base in the work-ing life of main sintering oven.
The technical solution adopted for the present invention to solve the technical problems is: the drying means of vanadium nitride continuous flow procedure Central Plains material base is that former material base is sent in the secondary electrothermal oven of sealing, feeds shielding gas simultaneously in secondary electrothermal oven; Former material base goes out secondary electrothermal oven and goes forward side by side and become owner of sintering oven behind temperature province inner drying 4～7h of 400～700 ℃.
Further be to guarantee out that the water content of the former material base of secondary electrothermal oven is lower than 0.05%.
Being used for the device of the drying means of above-mentioned vanadium nitride continuous flow procedure Central Plains material base, is to be provided with secondary electrothermal oven outside main sintering oven, and secondary electrothermal oven is provided with gas inlet and pneumatic outlet, is used to feed shielding gas and discharging waste gas and water vapour; Be provided with totally enclosed seal channel between secondary electrothermal oven and the main sintering oven it be interconnected, the medullary ray of secondary electrothermal oven and main sintering oven return central lines automatically, thereby can easily former material base be delivered to main sintering oven from secondary electrothermal oven; Be provided with sealed gate between secondary electrothermal oven and the main sintering oven, be used for and isolate mutually and sealing between main sintering oven and the secondary electrothermal oven.
The invention has the beneficial effects as follows that owing to adopted above drying means and device thereof, former material base has improved energy utilization rate through the laggard sintering oven of becoming owner of of drying treatment, is more suitable in industrial production in enormous quantities.Compare with the separate type drying mode, reduced furnace charge and had bad luck number of times, improved labor productivity, reduce the furnace charge Pulverization ratio simultaneously, help improving the vanadium recovery in the whole process of production; Avoided dried furnace charge to contact, also, guaranteed that anhydrous furnace charge enters main sintering oven, can significantly improve the work-ing life of main sintering oven with regard to solving exsiccant furnace charge moisture absorption problem with air; Make production technique, equipment further simplify, operation is further simple, and quality product is more stable.
Description of drawings
Fig. 1 is the plan structure synoptic diagram of the device of the drying means that is used for vanadium nitride continuous flow procedure Central Plains material base of the present invention.
Embodiment
The present invention is further described below in conjunction with drawings and Examples.
As shown in Figure 1, the drying means and the device thereof of vanadium nitride continuous flow procedure of the present invention Central Plains material base are provided with secondary electrothermal oven 1 outside main sintering oven 2.The side and the secondary electrothermal oven 1 that preferably secondary electrothermal oven 1 are arranged on main sintering oven 2 be arranged in parallel with main sintering oven 2, because there have been a push pedal or the automatic line of return of go-cart in the side of main sintering oven 2, secondary electrothermal oven 1 is installed in this, can make full use of main sintering oven 2 existing facility.At this moment, the promoting mainly cylinder and can use returning of main sintering oven 2 to push away cylinder 9 of secondary electrothermal oven 1, like this can simplification device and efficient and reliability higher.Secondary electrothermal oven 1 is provided with gas inlet 5 and pneumatic outlet 8; be used to feed shielding gas and discharging waste gas and water vapour; gas inlet 5 is arranged on the exit end of secondary electrothermal oven 1; pneumatic outlet 8 is arranged on the inlet end of secondary electrothermal oven 1; the shielding gas of secondary electrothermal oven 15 enters from the gas inlet; waste gas that produces and water vapor are discharged from pneumatic outlet 8, thereby the flow direction of the shielding gas that assurance feeds is opposite with the direction of motion of former material base in secondary electrothermal oven 1.Be provided with totally enclosed seal channel 3 between secondary electrothermal oven 1 and the main sintering oven 2 it be interconnected, the medullary ray of secondary electrothermal oven 1 and main sintering oven 2 return central lines automatically, thereby can easily former material base be delivered to main sintering oven 2 from secondary electrothermal oven.Be provided with sealed gate 4 between secondary electrothermal oven 1 and the main sintering oven 2, be used for and isolate mutually and sealing between main sintering oven 2 and the secondary electrothermal oven 1, block the gas communication between secondary electrothermal oven 1 and the main sintering oven 2, sealed gate 4 preferably is provided with twice, and seal channel 3 and sealed gate 4 all can be made by metal material processing such as steel, non-ferrous metals.Because being material metal material seals, seal channel 3 and sealed gate 4 connect and compose, if temperature is too high, then can be out of shape bigger by metalwork, thereby influence the seal degree of sealed gate 4, therefore the temperature conditions of the former material base that can come out of the stove according to the exit end of secondary electrothermal oven 1, can will go out secondary electrothermal oven 1 after the former material base cooling, former material base cooling can adopt naturally cooling or water under the secluding air condition to cool off at secondary electrothermal oven 1 shell.When adopting when secondary electrothermal oven 1 shell cools off, one section water-cooled section 10 can be set at the exit end of secondary electrothermal oven 1, water-cooled section 10 is provided with water-in 6 and water outlet 7, can utilize the shell of the secondary electrothermal oven 1 of water cooling like this, thereby cools off the former material base of secondary electrothermal oven.Described secondary electrothermal oven 1 preferably adopts hermetic pushed bat kiln or the tunnel furnace consistent with main sintering oven, and kiln chamber size, push pedal or the go-cart of secondary electrothermal oven 1 are also consistent with main sintering oven.
Former material base successive is sent in the secondary electrothermal oven 1 of above-mentioned sealing, promptly former material base is continuously into and out of secondary electrothermal oven 1.The successive implication is that former material base is contained in the silo, silo sequential queue campaign, heating zone, flat-temperature zone and the cooling area by secondary electrothermal oven successively.When former material base successive being sent in the secondary electrothermal oven 1 of above-mentioned sealing, feed shielding gas in secondary electrothermal oven, shielding gas is nitrogenous neutrality or reducing gas, as industrial nitrogen, anhydrous NH
3, one or more the mixture etc. in the industrial gas.The flow direction of shielding gas is opposite with the direction of motion of former material base in secondary electrothermal oven 1, i.e. antikinesis, can farthest guarantee so former material base in secondary electrothermal oven 1 by successive drying.Former material base goes out secondary electrothermal oven 1 and goes forward side by side and become owner of sintering oven behind temperature province inner drying 4～7h of 400～700 ℃.
Can cool off according to the temperature conditions of former material base when going out secondary electrothermal oven 1, promptly former material base goes out secondary electrothermal oven 1 and goes forward side by side and become owner of sintering oven 2 after being cooled to below 150 ℃.Like this, former material base gets final product successive into and out of secondary electrothermal oven 1 and main sintering oven 2, and makes the water content that draws secondary electrothermal oven 1 and enter the former material base of main sintering oven 2 be lower than 0.05%.
Should remain malleation in the above-mentioned secondary electrothermal oven 1, the barometric point of promptly secondary electrothermal oven 1 inside is higher than its atmosphere outside pressure.Its malleation value is preferable with 10Pa～100Pa.
The method of cooling of above-mentioned raw materials base can be that naturally cooling or the water under the secluding air condition cools off at secondary electrothermal oven 1 shell.
Production control, data gathering, record of production and storage production and the related process parameter of secondary electrothermal oven 1 all adopt existing electronic controls to finish automatically, and electronic controls can adopt existing P LC (programmable controller), PC or other existing Industrial Control Computers.
Embodiment 1: the drying means and the device thereof of vanadium nitride continuous flow procedure of the present invention Central Plains material base, be that parallel sided at main sintering oven 2 is provided with secondary electrothermal oven 1, being provided with totally enclosed seal channel 3 between secondary electrothermal oven 1 and the main sintering oven 2 is interconnected it, the medullary ray of secondary electrothermal oven 1 and main sintering oven 2 return central lines automatically, and the cylinder of promoting mainly of secondary electrothermal oven 1 uses returning of main sintering oven 2 to push away cylinder 9, be provided with two seals gate 4 between secondary electrothermal oven 1 and the main sintering oven 2, be used to block the gas communication between secondary electrothermal oven 1 and the main sintering oven 2.Gas inlet 5 is arranged on the exit end of secondary electrothermal oven 1, and pneumatic outlet 8 is arranged on the inlet end of secondary electrothermal oven 1, thereby the flow direction of the shielding gas that assurance feeds is opposite with the direction of motion of former material base in secondary electrothermal oven 1.Described secondary electrothermal oven 1 adopts the hermetic pushed bat kiln consistent with main sintering oven, and kiln chamber size, push pedal or the go-cart of secondary electrothermal oven 1 are also consistent with main sintering oven.Above-mentioned seal channel 3 and sealed gate 4 are made by steel, the exit end of secondary electrothermal oven 1 is provided with one section water-cooled section 10, water-cooled section 10 is provided with water-in 6 and water outlet 7, can utilize the shell of the secondary electrothermal oven 1 of water cooling like this, thereby cools off the former material base of secondary electrothermal oven.
Former material base after the moulding is placed in the feeding warehouse of secondary electrothermal oven 1, former material base is controlled by PLC, automatically pass in and out secondary electrothermal oven 1, simultaneously to the secondary electrothermal oven 1 inner industrial nitrogen that feeds, air pressure in the secondary electrothermal oven 1 is than its outside high 60Pa～100Pa, material stops 4h postcooling to 150 700 ℃ of temperature provinces and ℃ goes out secondary electrothermal oven 1 automatically, enters main sintering oven 2 more automatically, and the former material base water-content that at this moment enters main sintering oven 2 does not detect (less than 0.01%).
Embodiment 2: the drying means and the device thereof of vanadium nitride continuous flow procedure of the present invention Central Plains material base, be that parallel sided at main sintering oven 2 is provided with secondary electrothermal oven 1, being provided with totally enclosed seal channel 3 between secondary electrothermal oven 1 and the main sintering oven 2 is interconnected it, the medullary ray of secondary electrothermal oven 1 and main sintering oven 2 return central lines automatically, and the cylinder of promoting mainly of secondary electrothermal oven 1 uses returning of main sintering oven 2 to push away cylinder 9, be provided with two seals gate 4 between secondary electrothermal oven 1 and the main sintering oven 2, be used to block the gas communication between secondary electrothermal oven 1 and the main sintering oven 2.Gas inlet 5 is arranged on the exit end of secondary electrothermal oven 1, and pneumatic outlet 8 is arranged on the inlet end of secondary electrothermal oven 1, thereby the flow direction of the shielding gas that assurance feeds is opposite with the direction of motion of former material base in secondary electrothermal oven 1.Described secondary electrothermal oven 1 adopts the hermetic pushed bat kiln consistent with main sintering oven, and kiln chamber size, push pedal or the go-cart of secondary electrothermal oven 1 are also consistent with main sintering oven.Above-mentioned seal channel 3 and sealed gate 4 are made by steel.
Former material base after the moulding is placed in the feeding warehouse of secondary electrothermal oven 1, and former material base is controlled by PLC, passes in and out secondary electrothermal oven 1 automatically, simultaneously to the anhydrous NH of secondary electrothermal oven 1 inner feeding
3Air pressure in the secondary electrothermal oven 1 is than its outside high 40Pa～70Pa, material stops 5.5h postcooling to 140 550 ℃ of temperature provinces and ℃ goes out secondary electrothermal oven 1 automatically, enters main sintering oven 2 more automatically, and the former material base water-content that at this moment enters main sintering oven 2 does not detect (less than 0.01%).
Embodiment 3: the drying means and the device thereof of vanadium nitride continuous flow procedure of the present invention Central Plains material base, be that parallel sided at main sintering oven 2 is provided with secondary electrothermal oven 1, being provided with totally enclosed seal channel 3 between secondary electrothermal oven 1 and the main sintering oven 2 is interconnected it, the medullary ray of secondary electrothermal oven 1 and main sintering oven 2 return central lines automatically, and the cylinder of promoting mainly of secondary electrothermal oven 1 uses returning of main sintering oven 2 to push away cylinder 9, be provided with two seals gate 4 between secondary electrothermal oven 1 and the main sintering oven 2, be used to block the gas communication between secondary electrothermal oven 1 and the main sintering oven 2.Gas inlet 5 is arranged on the exit end of secondary electrothermal oven 1, and pneumatic outlet 8 is arranged on the inlet end of secondary electrothermal oven 1, thereby the flow direction of the shielding gas that assurance feeds is opposite with the direction of motion of former material base in secondary electrothermal oven 1.Described secondary electrothermal oven 1 adopts the hermetic pushed bat kiln consistent with main sintering oven, and kiln chamber size, push pedal or the go-cart of secondary electrothermal oven 1 are also consistent with main sintering oven.Above-mentioned seal channel 3 and sealed gate 4 are made by steel, the exit end of secondary electrothermal oven 1 is provided with one section water-cooled section 10, water-cooled section 10 is provided with water-in 6 and water outlet 7, can utilize the shell of the secondary electrothermal oven 1 of water cooling like this, thereby cools off the former material base of secondary electrothermal oven.
Former material base after the moulding is placed in the feeding warehouse of secondary electrothermal oven 1, former material base is controlled by PLC type robot calculator, automatically pass in and out secondary electrothermal oven 1, simultaneously to the secondary electrothermal oven 1 inner coke-oven gas that feeds, air pressure in the secondary electrothermal oven 1 is than its outside high 20Pa～50Pa, material stops 7h postcooling to 130 450 ℃ of temperature provinces and ℃ goes out secondary electrothermal oven 1 automatically, enters main sintering oven 2 more automatically, and the former material base water-content that at this moment enters main sintering oven 2 does not detect (less than 0.01%).
Claims (19)
1, the drying means of vanadium nitride continuous flow procedure Central Plains material base; be that former material base is sent in the secondary electrothermal oven (1) of sealing; simultaneously in secondary electrothermal oven, feed shielding gas, behind temperature province inner drying 4～7h of 400～700 ℃, go out secondary electrothermal oven (1) and go forward side by side and become owner of sintering oven (2).
2, the drying means of vanadium nitride continuous flow procedure as claimed in claim 1 Central Plains material base, it is characterized in that: the water content when former material base goes out secondary electrothermal oven (1) is lower than 0.05%.
3, the drying means of vanadium nitride continuous flow procedure as claimed in claim 1 Central Plains material base, it is characterized in that: former material base after drying goes out secondary electrothermal oven (1) after cooling.
4, the drying means of vanadium nitride continuous flow procedure as claimed in claim 3 Central Plains material base, it is characterized in that: the temperature when former material base goes out secondary electrothermal oven (1) is lower than 150 ℃.
5, the drying means of vanadium nitride continuous flow procedure as claimed in claim 3 Central Plains material base, it is characterized in that: the method for cooling of described former material base is to cool off at secondary electrothermal oven (1) shell at the cooling section naturally cooling or at the cooling section water.
6, the drying means of vanadium nitride continuous flow procedure as claimed in claim 1 Central Plains material base is characterized in that: remain malleation in the described secondary electrothermal oven (1).
7, the drying means of vanadium nitride continuous flow procedure as claimed in claim 6 Central Plains material base, it is characterized in that: the malleation value in the described secondary electrothermal oven (1) is 10Pa～100Pa.
8, the drying means of vanadium nitride continuous flow procedure as claimed in claim 1 Central Plains material base, it is characterized in that: described former material base successive is into and out of secondary electrothermal oven (1).
9, the drying means of vanadium nitride continuous flow procedure as claimed in claim 8 Central Plains material base, it is characterized in that: the flow direction of described shielding gas is opposite into and out of the direction of motion of secondary electrothermal oven (1) with former material base successive.
10, the drying means of vanadium nitride continuous flow procedure as claimed in claim 1 Central Plains material base, it is characterized in that: described shielding gas is nitrogenous neutrality or reducing gas.
11, the drying means of vanadium nitride continuous flow procedure as claimed in claim 10 Central Plains material base, it is characterized in that: described shielding gas is industrial nitrogen, anhydrous NH
3, one or more the mixture in the industrial gas.
12, as the drying means of 1～9 any described vanadium nitride continuous flow procedure of claim Central Plains material base, it is characterized in that: the production control of secondary electrothermal oven (1), data gathering, record of production and storage production and related process parameter are finished automatically by electronic controls.
13, the device that is used for the drying means of vanadium nitride continuous flow procedure as claimed in claim 1 Central Plains material base, comprise main sintering oven (2), it is characterized in that: be provided with secondary electrothermal oven (1) outside described main sintering oven (2), secondary electrothermal oven (1) is provided with gas inlet (5) and pneumatic outlet (8); Being provided with totally enclosed seal channel (3) between secondary electrothermal oven (1) and the main sintering oven (2) is interconnected it, the medullary ray of secondary electrothermal oven (1) and main sintering oven (2) return central lines automatically, be provided with sealed gate (4) between secondary electrothermal oven (1) and the main sintering oven (2).
14, the device that is used for the drying means of vanadium nitride continuous flow procedure Central Plains material base as claimed in claim 13, it is characterized in that: described secondary electrothermal oven (1) is arranged on the side of main sintering oven (2) and be arranged in parallel with main sintering oven (2), and the returning of the main exactly sintering oven of cylinder (2) of promoting mainly of secondary electrothermal oven (1) pushes away cylinder (9).
15, the device that is used for the drying means of vanadium nitride continuous flow procedure Central Plains material base as claimed in claim 13, it is characterized in that: the cooling section of the exit end of described secondary electrothermal oven (1) comprises water-cooled section (10), and water-cooled section (10) is provided with water-in (6) and water outlet (7).
16, the device that is used for the drying means of vanadium nitride continuous flow procedure Central Plains material base as claimed in claim 13, it is characterized in that: described gas inlet (5) are arranged on the exit end of secondary electrothermal oven (1), and pneumatic outlet (8) is arranged on the inlet end of secondary electrothermal oven (1).
17, the device that is used for the drying means of vanadium nitride continuous flow procedure Central Plains material base as claimed in claim 13 is characterized in that: be provided with two seals gate (4) between described secondary electrothermal oven (1) and the main sintering oven (2).
18, the device that is used for the drying means of vanadium nitride continuous flow procedure Central Plains material base as claimed in claim 13, it is characterized in that: described secondary electrothermal oven (1) is hermetic pushed bat kiln or tunnel furnace.
19, the device that is used for the drying means of vanadium nitride continuous flow procedure Central Plains material base as claimed in claim 18 is characterized in that: kiln chamber size, push pedal or the go-cart of described secondary electrothermal oven (1) is consistent with main sintering oven.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100218455A CN100436328C (en) | 2004-02-17 | 2004-02-17 | Drying method of raw material blank in continuous production of vanadium nitride and its device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100218455A CN100436328C (en) | 2004-02-17 | 2004-02-17 | Drying method of raw material blank in continuous production of vanadium nitride and its device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1657419A CN1657419A (en) | 2005-08-24 |
| CN100436328C true CN100436328C (en) | 2008-11-26 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100218455A Expired - Lifetime CN100436328C (en) | 2004-02-17 | 2004-02-17 | Drying method of raw material blank in continuous production of vanadium nitride and its device |
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| CN103388101B (en) * | 2013-07-18 | 2015-06-03 | 陕西丰源钒业科技发展有限公司 | Vanadium-nitrogen microalloy additive and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4562057A (en) * | 1984-03-29 | 1985-12-31 | Union Carbide Corporation | Preparation of low-carbon vanadium nitride |
| CN1422800A (en) * | 2001-12-04 | 2003-06-11 | 攀枝花钢铁(集团)公司 | Vanadium nitride production method |
| CN1431146A (en) * | 2003-02-21 | 2003-07-23 | 中国科学院上海硅酸盐研究所 | Method for preparing powder of nano vanadium nitride in cubic phase |
-
2004
- 2004-02-17 CN CNB2004100218455A patent/CN100436328C/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4562057A (en) * | 1984-03-29 | 1985-12-31 | Union Carbide Corporation | Preparation of low-carbon vanadium nitride |
| CN1422800A (en) * | 2001-12-04 | 2003-06-11 | 攀枝花钢铁(集团)公司 | Vanadium nitride production method |
| CN1431146A (en) * | 2003-02-21 | 2003-07-23 | 中国科学院上海硅酸盐研究所 | Method for preparing powder of nano vanadium nitride in cubic phase |
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| CN1657419A (en) | 2005-08-24 |
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