CN100426440C - Cold cathode electron gun and vacuum gauge tube using the same - Google Patents
Cold cathode electron gun and vacuum gauge tube using the same Download PDFInfo
- Publication number
- CN100426440C CN100426440C CNB2004100270204A CN200410027020A CN100426440C CN 100426440 C CN100426440 C CN 100426440C CN B2004100270204 A CNB2004100270204 A CN B2004100270204A CN 200410027020 A CN200410027020 A CN 200410027020A CN 100426440 C CN100426440 C CN 100426440C
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- grid
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- vacuum gauge
- pointed
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- 238000012216 screening Methods 0.000 claims description 43
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 239000002041 carbon nanotube Substances 0.000 claims description 11
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 8
- 239000010937 tungsten Substances 0.000 claims description 8
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000012360 testing method Methods 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 10
- 230000005684 electric field Effects 0.000 description 12
- 238000005259 measurement Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 238000013022 venting Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 239000002048 multi walled nanotube Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 1
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/30—Vacuum gauges by making use of ionisation effects
- G01L21/34—Vacuum gauges by making use of ionisation effects using electric discharge tubes with cold cathodes
Abstract
The present invention relates to a cold cathode electron gun used for measuring an ultrahigh vacuum and an extremely high vacuum, which comprises a grid electrode and a cathode which is arranged below the grid electrode. The present invention is characterized in that a shaded pole is parallelly arranged above the grid electrode. The present invention also provides a vacuum gauge pipe which uses the cold cathode electron gun, which comprises a casing, a collecting electrode, an anode and the cold cathode electron gun, wherein the cold cathode electron gun and the collecting electrode are symmetrically arranged in a coaxial mode corresponding to the anode; one end of the opening of the casing is connected with a device to be measured. The present invention is characterized in that the cold cathode electron gun comprises a grid electrode, a shaded electrode which is parallelly arranged above the grid electrode, and a cathode which is arranged below the grid electrode. The present invention adopts the vacuum gauge pipe of the cold cathode electron gun, and has the advantages of small cathode volume, small power consumption, high sensitivity and gas suction and deflation rate reduction.
Description
[technical field]
The present invention relates to a kind of ultra high vacuum and extra-high vacuum measurement equipment, relate in particular to a kind of vacuum gauge that is used for the cold-cathode gun that superelevation is true and extra-high vacuum measures and adopts this cold-cathode gun.
[background technology]
The contemporary science and technology development is swift and violent, at many high-technology fields, needs high vacuum environment, as: the simulation in cosmic space, superconductor technology, nuclear fusion reaction, ultralow temperature and huge particle accelerator technology etc.And in the ultra high vacuum field, the research of the ultra high vacuum rule important step that is absolutely necessary.
In the prior art, Bayard and Alpert are widely used in high vacuum and ultra high vacuum measurement in the BA type ionization gauge of nineteen fifty invention, its structure as shown in Figure 1, this BA type ionization gauge comprises a glass shell 4, one collector 2, a plurality of glass and metal sealing by fusing lead-in wire 3, an at least one hot filament 1 and a grid 5.This ionization gauge is because volume ratio is bigger, electrode is many, can adsorb more gas molecule and ion at electrode surface, when vacuum degree rises, electrode surface gas molecule desorption, it is also many to emit gas, thus can only in the dynamic vacuum system, use, and be not suitable for being applied to the measurement of ultra high vacuum and extra-high vacuum.The AxTRAN extreme high vacuum gauge that the ultra high vacuum measuring equipment that has had product to sell has ULVAC to make, it can measure 10
-11Pa, but its structure more complicated, the difficulty of degassing costs an arm and a leg, and is difficult to promote practicability.
Be applicable to that regulating of ultra high vacuum and extra-high vacuum measurement must have characteristics such as volume is little, venting is few, if be applied to the space field, can volume little except wishing vacuum gauge, outside simple in structure, the power consumption of also wishing vacuum gauge is little, to alleviate the weight of whole vacuum gauge and supporting power supply.
Old big a beautiful gem of department of electronic engineering, tsinghua university and Li Youzhe once in the micro-ionization gauge of the eighties development (referring to " scientific basic of vacuum technique ",, national defence publishing house in 1987) electronic of development utilization static saddle field constraint can produce extremely long electron path thereby can obtain the notion of high ionization gauge sensitivity on the basis.
Chen Pijin and Qi Jing disclosed a kind of wide measurement range microionization gauge that use field emission source as electron emitter CN94100653.0 number in 2000 at Chinese patent, this miniature ionization gauge comprises a glass shell, one anode, an ion collector, an electron emitter and a metal film electrode.This electron emitter adopts Spindt type field emission source, and its effect is to reduce the suction venting effect that the chemical reaction process on hot cathode surface is introduced.But this Spindt type field emission source is owing to have the grid of control emitting electrons, and the electric field that this grid produces can exert an influence to the sensitivity of ionization gauge.
Chinese patent discloses a kind of extra-high vacuum micro-ionization gauge with extremely low suction and exhaustion rate for CN99109355.0 number, and this ionization gauge uses field emission cold cathode to replace various forms of hot cathode, improves the sensitivity of ionization gauge thus.But be to use the cold cathode that has only grid, the current potential of grid can have influence on whole Electric Field Distribution of regulating, and has destroyed the shape of saddle field, causes the oscillation effect variation of electronics, and the sensitivity meeting of regulating reduces.
Therefore, provide the influence of a kind of elimination grid potential, highly sensitively be used for the cold-cathode gun that ultra high vacuum measures and use the vacuum gauge of this electron gun very necessary.
[summary of the invention]
For solving the technical problem of prior art, the purpose of this invention is to provide a kind of elimination grid potential influence, the highly sensitive cold-cathode gun that is used for ultra high vacuum and extra-high vacuum measurement.
Another object of the present invention provides a kind of vacuum gauge that uses above-mentioned cold-cathode gun.
For realizing purpose of the present invention, the invention provides a kind of cold-cathode gun that is used for ultra high vacuum and extra-high vacuum measurement, it comprises that a grid, is arranged at the negative electrode of this grid below, with a screening electrode that is set in parallel in this grid top, this negative electrode can be selected the pop-up electron source material such as array of carbon nano-tube, tungsten point, molybdenum point, silicon tip or above-mentioned pointed material for use.
For realizing another object of the present invention, the invention provides a kind of vacuum gauge that uses above-mentioned cold-cathode gun, it comprises a shell, a collector, an anode and a cold-cathode gun; Relative this anode with this collector of this cold-cathode gun is placed with axial symmetry; This shell aperture one end and device under test join, and this cold-cathode gun comprises that screening electrode and that a grid, is set in parallel in this grid top is arranged at the negative electrode of this grid below.
Compared with the prior art, cold-cathode gun of the present invention has the following advantages: one, and cathode volume is littler, and the cathode volume of field emission very little (tens microns) is so the venting of negative electrode can further reduce; Its two, sensitivity is higher, because cathode volume is very little, makes that emission area is enough little, negative electrode, anode and collector can be aimed at more accurately, the oscillation track of electronics can be longer, so the sensitivity of regulating is higher; Electron gun increases by a screening electrode outside grid, make the current potential of grid conductively-closed to fall, and makes the sensitivity of regulating higher.And increase after the screening electrode, electron gun remains the current potential that can regulate (even being zero) towards the current potential of saddle field, thereby can not have influence on the distribution of saddle field, brings into play the advantage of cold cathode as the vacuum gauge electron source to greatest extent.So use the vacuum gauge sensitivity of cold-cathode gun of the present invention higher.
[description of drawings]
Fig. 1 is the schematic diagram of existing BA type ionization gauge.
Fig. 2 is the principle schematic that the present invention is used for the cold-cathode gun of ultra high vacuum measurement.
Fig. 3 is negative electrode, grid and the screening electrode electric energy distribution relation schematic diagram of cold-cathode gun of the present invention.
Fig. 4 is to use the ultra high vacuum of cold-cathode gun of the present invention to regulate schematic diagram.
[embodiment]
The present invention is described in detail below in conjunction with the drawings and specific embodiments.
See also Fig. 2, the embodiment of the invention a kind ofly is used for the negative electrode 21 that screening electrode 26 and that cold-cathode gun 20 that ultra high vacuum measures comprises that mainly a grid 24, is set in parallel in these grid 24 tops is arranged at these grid 24 belows.Negative electrode 21, grid 24 and screening electrode 26 all connect a lead-in wire and link to each other with external circuit.In addition, an available insulating trip 27 separates between this grid 24 and the screening electrode 26.Cold-cathode gun 20 of the present invention, electronics penetrates from negative electrode 21 transmitting terminal carbon nano-tube 211, pulls out through grid 24, passes screening electrode 26 again and launches, and screening electrode 26 just in time shields the firmly electric field of grid, thereby makes the grid Electric Field Distribution can not have influence on screening electrode 26 electric field in addition.
The negative electrode 21 of cold-cathode gun 20 of the present invention can be selected any material that can be used as the pop-up electron source for use, comprises carbon nano-tube, tungsten point, molybdenum point, the array of silicon tip or above-mentioned pointed material etc., and other various field emmision materials.Grid 24 can adopt various cavernous structures, as becket, and metal aperture or wire netting; And screening electrode 26 can adopt the structure same with grid 24, and perhaps different with grid 24 structure, and as long as this screening electrode 26 can play dhield grid 24 effect of electric field guarantees simultaneously that electronics can penetrate to get final product.
The negative electrode 21 that present embodiment is selected for use comprises a tungsten filament needle point 212 and a branch of multi-walled carbon nano-tubes 211 that sticks at tungsten filament needle point 212 tips.Grid 24 and screening electrode 26 are selected metal grid mesh for use, and the mesh of this grid 24 and screening electrode 26 is aimed at fully mutually, and the carbon nano-tube 211 at negative electrode 21 tips is in alignment with this grid 24 and screening electrode 26 one of them mesh.
The mesh of the screening electrode 26 of cold-cathode gun 20 of the present invention is accurately aimed at the mesh of grid 24, can be chosen in microscopically and aim at screening electrode 26 and grid 24, also can be one-body molded screening electrode 26 and grid 24, and the two is aimed at fully.Present embodiment adopts negative electrode 21 structures of having only a transmitting terminal carbon nano-tube 211, and carbon nano-tube 211 needs to aim at fully with grid 24 and screening electrode 26 one of them mesh; In addition,, then only need grid 24 and screening electrode 26 to aim at and get final product, perhaps adopt related process such as photoetching, make negative electrode 21, grid 24 and screening electrode 26 to integrate if when adopting the large tracts of land arrayed emitters.
Cold-cathode gun 20 of the present invention increases after the screening electrode 26, and for electronics, 26 electric energy distributes as shown in Figure 3 from negative electrode 21 to screening electrode.Because the effect of screening electrode 26 can be regulated grid 24 current potentials arbitrarily, do not disturb thereby can not produce to the Electric Field Distribution beyond the screening electrode 26.According to estimates, screening electrode 26 and negative electrode 21 equipotential under Synchronization Control still has the electronics outgoing more than 20%, enough uses as electron source.Under normal conditions, screening electrode 26 can exceed about tens volts current potential than negative electrode 21, fully guarantees the outgoing of electronics.
See also Fig. 4, adopt above-mentioned cold-cathode gun, the vacuum gauge that can prepare a kind of cold cathode is a vacuum gauge 30, it comprise a shell 32, one and the stem stem 35, that joins of the shell 32 golden film 33, a collector 39, the anode 38 and that are formed on shell 32 inwalls be fixed on the cold-cathode gun 31 on the stem stem; This cold-cathode gun 31 comprises that screening electrode 313, that a grid 314, is set in parallel in these grid 314 tops is arranged at the negative electrode 316 of these grid 314 belows; This cold-cathode gun 31 and this collector 39 pairs of these anodes 38 are mutually placed with axial symmetry, and are installed in the shell 32 by support bar (scheming not show); This shell 32 openings one end 36 joins with device under test (figure does not show).General cold-cathode gun 31 and collector 39 distance of antianode 38 mutually equate; This anode 38 can be selected ring-type or poroid electrode for use; This gold film 33 is generally zero potential, is used to provide a bias voltage.
These vacuum gauge 30 Potential distribution forms are that the ring center of anode 38 on axis direction exists a saddle point, near power line bends this saddle point.And from saddle point than the territory, far field, power line is to be the radiation wire straight line at center with the saddle point basically.Suppose to have an electronics, emit from cold cathode ejecting gun 31, electronics is accelerated and pulls to anode direction at the beginning, subsequently, because inertia, electronics passes through anode 38, is retracted by anode potential again before arriving collector 39, and electronics is at cathode electron gun 31 and collect vibration back and forth between the collection 39, because electrode balanced configuration, the number of oscillation is a lot, so electron path is very long, electron path length can reach several kms under the representative operation.At last, electron impact forms the emission current loop to anode 38.These vacuum gauge 30 mechanism sizes are decided on electric parameter.In the electron motion process, to and make a part of gas molecule ionization with gas molecule collision, the cation that produces in the space between collector 39 and anode 38 is in the collector 39 of small positive potential and collects, produce ion flow, this ion flow is to be directly proportional with pressure in the certain pressure intensity scope, so can measure pressure according to this relation.
The negative electrode 316 of the cold-cathode gun 31 of vacuum gauge 30 of the present invention can be selected any material that can be used as the pop-up electron source for use, comprises carbon nano-tube, tungsten point, molybdenum point, the array of silicon tip or above-mentioned pointed material etc., and other various field emmision materials.Grid 314 can adopt various cavernous structures, as becket, and metal aperture or wire netting; And screening electrode 313 can adopt the structure same with grid 314, and perhaps different with grid 314 structure, and as long as this screening electrode 313 can play dhield grid 314 effect of electric field guarantees simultaneously that electronics can penetrate to get final product.
The negative electrode 316 of the cold-cathode gun 31 that vacuum gauge 30 of the present invention is selected for use is selected a sticking a branch of multi-walled carbon nano-tubes or a carbon nano pipe array on the tungsten filament needle point for use.Grid 314 and screening electrode 313 are selected metal grid mesh for use, and the mesh of this grid 314 and screening electrode 313 is aimed at fully, and negative electrode 316 carbon nano-tube tips are in alignment with this grid 314 and screening electrode 313 one of them mesh.Electronics penetrates from negative electrode 316 carbon nano-tube transmitting terminals, pull out through grid 314, again from screening electrode 313 emissions, and screening electrode 313 just in time shields the firmly current potential of grid, thereby make the grid Electric Field Distribution can not have influence on the symmetry of anode 38 peripheral electric fields, the electronics longer distance of can vibrating back and forth, the sensitivity that improves vacuum gauge 30.
Those skilled in the art as can be known, this cold-cathode gun 31 that has screening electrode 313 of the present invention does not limit to and is applied to vacuum gauge, can be at wider replacement hot-cathode electric rifle, and can not have influence on the Electric Field Distribution of this structure, and may be applied to the field that a lot of hot cathode can't use.Simultaneously, this kind has the pop-up electron gun 31 of screening electrode 313, do not need in the device of screen potential influence at some, make both equipotentials as long as grid 314 and screening electrode 313 be connected together, thus any needs assurance device electric fields structure be not destroyed can adopt this electron gun as electron source.
Claims (9)
1. one kind is used for the cold-cathode gun that ultra high vacuum and extra-high vacuum measure, it comprises that a grid, is arranged on the negative electrode of this grid below, it is characterized in that grid has cavernous structure, a screening electrode be arranged in parallel above this grid, screening electrode has and the corresponding cavernous structure of grid hole, and this negative electrode comprises a pointed supporter and a branch of carbon nano-tube that is arranged at this pointed supporter tip.
2. cold-cathode gun as claimed in claim 1, its feature is selected tungsten point, molybdenum point, silicon tip or above-mentioned pointed material array for use at pointed supporter.
3. cold-cathode gun as claimed in claim 1 is characterized in that cavernous structure comprises becket, metal aperture or wire netting.
4. vacuum gauge, it comprises a shell, a collector, an anode and a cold-cathode gun; Relative this anode with this collector of this cold-cathode gun is placed with axial symmetry; This shell aperture one end and device under test join, it is characterized in that screening electrode, that this cold-cathode gun comprises that a grid, is set in parallel in this grid top is arranged at the negative electrode of this grid below, grid has cavernous structure, screening electrode has and the corresponding cavernous structure of grid hole, and this negative electrode comprises a pointed supporter and a branch of carbon nano-tube that is arranged at this pointed supporter tip.
5. vacuum gauge as claimed in claim 4 is characterized in that pointed supporter selects tungsten point, molybdenum point, silicon tip or above-mentioned pointed material array for use.
6. vacuum gauge as claimed in claim 4 is characterized in that cavernous structure comprises becket, metal aperture or wire netting.
7. vacuum gauge as claimed in claim 4 is characterized in that anode selects ring-type or poroid electrode for use.
8. vacuum gauge as claimed in claim 4 is characterized in that the inwall of shell is formed with a gold medal film.
9. vacuum gauge as claimed in claim 4 is characterized in that cold-cathode gun is fixed in a stem stem.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100270204A CN100426440C (en) | 2004-04-21 | 2004-04-21 | Cold cathode electron gun and vacuum gauge tube using the same |
| US11/092,087 US7141983B2 (en) | 2004-04-21 | 2005-03-29 | Cold cathode device and vacuum gauge using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100270204A CN100426440C (en) | 2004-04-21 | 2004-04-21 | Cold cathode electron gun and vacuum gauge tube using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1691245A CN1691245A (en) | 2005-11-02 |
| CN100426440C true CN100426440C (en) | 2008-10-15 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100270204A Expired - Lifetime CN100426440C (en) | 2004-04-21 | 2004-04-21 | Cold cathode electron gun and vacuum gauge tube using the same |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7141983B2 (en) |
| CN (1) | CN100426440C (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7768267B2 (en) * | 2007-07-11 | 2010-08-03 | Brooks Automation, Inc. | Ionization gauge with a cold electron source |
| WO2009085165A2 (en) * | 2007-12-19 | 2009-07-09 | Brooks Automation, Inc. | Ionization gauge having electron multiplier cold emmission source |
| CN102087949B (en) * | 2010-12-31 | 2012-11-21 | 清华大学 | Vacuum gauge |
| US8928329B2 (en) * | 2011-07-26 | 2015-01-06 | Mks Instruments, Inc. | Cold cathode gauge fast response signal circuit |
| CN103094049B (en) * | 2011-10-28 | 2015-11-25 | 清华大学 | Ionization gauge |
| US8866068B2 (en) | 2012-12-27 | 2014-10-21 | Schlumberger Technology Corporation | Ion source with cathode having an array of nano-sized projections |
| CN103606503B (en) * | 2013-11-26 | 2016-06-29 | 电子科技大学 | The many electrons’ system cold-cathode gun that a kind of microwave phase modulation is controlled |
| CN111982393B (en) * | 2020-08-27 | 2021-11-19 | 天津科技大学 | Real-time monitoring vacuum instrument |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3378712A (en) * | 1966-11-18 | 1968-04-16 | Gen Electric | Field emission ionization gauge with restricted line of sight between field emissionanode and ion collector |
| CN1240933A (en) * | 1999-06-25 | 2000-01-12 | 清华大学 | Very-high-vacuity micro-ionization meter with very low gas absorption and release rates |
| US20030057953A1 (en) * | 2001-09-13 | 2003-03-27 | Duniway Stockroom Corp. | Ionization vacuum pressure gauge |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3051868A (en) * | 1960-08-29 | 1962-08-28 | Ca Nat Research Council | Ionization vacuum gauges |
| US5422573A (en) * | 1990-04-11 | 1995-06-06 | Granville-Phillips Company | Ionization gauge and method of using and calibrating same |
| FR2679653B1 (en) * | 1991-07-23 | 1993-09-24 | Commissariat Energie Atomique | IONIZATION VACUMETER. |
| TW413828B (en) | 1995-07-07 | 2000-12-01 | Nippon Electric Co | Electron gun provided with a field emission cold cathode and an improved gate structure |
| JP2002508836A (en) * | 1997-05-09 | 2002-03-19 | ザ フレデリックス カンパニー | Bayard-Alpert vacuum gauge neutralizing X-ray effect |
| US6025723A (en) * | 1997-08-27 | 2000-02-15 | Granville-Phillips Company | Miniature ionization gauge utilizing multiple ion collectors |
| JP4493139B2 (en) * | 2000-02-02 | 2010-06-30 | キヤノンアネルバ株式会社 | Ionization gauge |
| JP3730476B2 (en) * | 2000-03-31 | 2006-01-05 | 株式会社東芝 | Field emission cold cathode and manufacturing method thereof |
| ITTO20030627A1 (en) * | 2003-08-08 | 2005-02-09 | Varian Spa | VACUOMETER IN IONIZATION. |
-
2004
- 2004-04-21 CN CNB2004100270204A patent/CN100426440C/en not_active Expired - Lifetime
-
2005
- 2005-03-29 US US11/092,087 patent/US7141983B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3378712A (en) * | 1966-11-18 | 1968-04-16 | Gen Electric | Field emission ionization gauge with restricted line of sight between field emissionanode and ion collector |
| CN1240933A (en) * | 1999-06-25 | 2000-01-12 | 清华大学 | Very-high-vacuity micro-ionization meter with very low gas absorption and release rates |
| US20030057953A1 (en) * | 2001-09-13 | 2003-03-27 | Duniway Stockroom Corp. | Ionization vacuum pressure gauge |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1691245A (en) | 2005-11-02 |
| US7141983B2 (en) | 2006-11-28 |
| US20050237066A1 (en) | 2005-10-27 |
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