CN100420622C - Secondary template duplicating process method based on dimethyl silicone polymer mini component - Google Patents
Secondary template duplicating process method based on dimethyl silicone polymer mini component Download PDFInfo
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- CN100420622C CN100420622C CNB2005101273952A CN200510127395A CN100420622C CN 100420622 C CN100420622 C CN 100420622C CN B2005101273952 A CNB2005101273952 A CN B2005101273952A CN 200510127395 A CN200510127395 A CN 200510127395A CN 100420622 C CN100420622 C CN 100420622C
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Abstract
The present invention provides a secondary template duplicating process method based on dimethyl silicone polymer miniature components, which comprises template material, namely organic glass PMMA. The template processing method adopts the way that hot pressing of a primary female template is utilized for forming an organic glass male mold which serves as a processing template for the miniature components of dimethyl silicone polymer material. The material of the primary female template is silicon chips, and the processing mode is a standard MEMS technique. The method of the present invention has the advantages of simple process and low cost, and solves the problem of difficult demoulding between PDMS material and a mould. The repeatability is good, and duplication with high precision and scale production are easily realized.
Description
(1) technical field
The present invention relates to be a kind of be the processing method of the mini component of base material with dimethyl silicone polymer (PDMS).
(2) background technology
MEMS (MEMS) technology is the comprehensive new and high technology with revolution meaning that development in recent years is got up, and its technological core is based on IC technology and micromachining technology.Utilize the bulk silicon technological of MEMS technology, it can produce the mini component of micron even nanoscale features size on silicon chip, for micro-nano technology provides technology ensuring.But the MEMS technology is to the continuous expansion and the infiltration of other each ambit, and the continuous development of mini component material, and is more deeply also more extensive to the requirement of MEMS technology.
It is high polymer that the infinitesimal device has a kind of material of increasingly extensive application, especially silicon rubber or silicon gel.This class high polymer has very desirable physicochemical property: good insulation performance, and barotolerance is good, good heat endurance, very high bio-compatibility and gas permeability possess good optical characteristics again simultaneously, and elastic modelling quantity is low etc.These characteristics make this class material be suitable as the base material even the integral material of micro-fluidic chip, and owing to be applicable to multiple detection method (comprising optical detection), at the microfluid measurement and control area, particularly there is very big application prospect in the biochip field.The particularity of material has determined the particularity of processing technology, and adopting the cast replica method for this class high polymer material is simpler and more direct and practical method, is fit to mass production.So, the making of template also just becomes cast as duplicates the technological core of high polymer material micro-structure as silicon rubber etc.
At present, the template that adopts the cast clone method to make high polymer micro-structural components and parts all is a template, uses the MEMS fabrication techniques.Template mainly contains three types: silicon template, glass template, SU8/Si template.Wherein, the SU8/Si template is the most general, promptly uses novel epoxy negative photoresist (SU8) to make little raceway groove and other fine structure of SU8 by photoetching technique on silicon chip.At first design micro-structural, make photo mask board, on silicon chip, apply the SU8 photoresist with spin-coating method again, obtain SU8 photoresist micro-structural through exposure, development, post bake.It is simple to make the SU8/Si form technology with this legal system, micro-structural can have high depth-to-width ratio, but because of template micro-structural bottom surface is a silicon, the problem that also has silicon fiml plate demoulding difficulty, promptly be cast in the PDMS performed polymer on the silicon fiml plate, after the curing, silicon and PDMS are bonding firmly, and the PDMS components and parts are difficult to strip down in good condition on template.Other material pattern of micro-structure PDMS components and parts generally all has the difficult problem of the demoulding.Report although have on the document, proposed solution, such as stifling one deck releasing agent on template, as silicone oil, the repeatability that operates is good inadequately, can not solve release problems fully, and has increased the process complexity of making micro-structure PDMS components and parts.
(3) summary of the invention
The object of the present invention is to provide a kind of technology simple, good reproducibility, manufacturing cost is low, is easy to realize that high accuracy duplicates the secondary template duplicating process method based on dimethyl silicone polymer mini component with large-scale production.
The object of the present invention is achieved like this:
1, makes a template
(1) material of template is the twin polishing monocrystalline silicon piece,
(2) the silicon chip thermal oxide of cleaning being handled, oxidation bed thickness are approximately
(3) adopt the photolithography plate photoetching oxide layer of making in advance,
(4) adopt ICP (Inductive Couple Plasma induces coupling plasma) etching or each diversity etching process etching, the deoxidation layer,
2, make secondary template
(1) fresh PMMA sheet (polymethyl methacrylate is commonly called as lucite) is kept flat on the powder compressing machine, with ready-made one-off pattern strip have raceway groove one facing to the PMMA sheet, the upper and lower fixture block of powder compressing machine is screwed, add 0-0.5Mpa pressure,
(2) target temperature of powder compressing machine attemperating unit transfers to 90-120 ℃, heats up, and treats that upper and lower fixture block is warming up to target temperature, constant temperature, be incubated 1-10 minute, unscrew upper and lower fixture block, treat that the fixture block temperature reduces near outwarding winding fully behind the normal temperature, take out the PMMA secondary template at the test under microscope figure;
3, utilize secondary template to make the PDMS mini component
(1) configuration PDMS performed polymer vacuumizes in vacuum drying chamber, gets rid of the air that dissolves in the performed polymer,
The PDMS performed polymer that (2) will degas is cast on the PMMA secondary template, is being cured below 80 ℃,
(3) the PDMS components and parts that are cured naturally cool to room temperature, peel off carefully from the PMMA template, at the test under microscope component structure.
The advantage of the inventive method is: technology is simple, and is with low cost, solved the demoulding difficult problem between PDMS material and the mould, and good reproducibility, is easy to realize that high accuracy is duplicated and large-scale production.
(4) specific embodiment
For a more detailed description to the present invention for example below:
1, makes a template
(1) material of template is the twin polishing monocrystalline silicon piece,
(2) the silicon chip thermal oxide of cleaning being handled, oxidation bed thickness are approximately
(3) adopt the photolithography plate photoetching oxide layer of making in advance,
(4) adopt ICP etching or each diversity etching process etching, the deoxidation layer,
(5) for improving the access times of a template, can be at the silicon chip back side with legal bonding one deck 7740 glass of electrostatic bond.
2, make secondary template
(1) fresh (just having thrown off plastic foil) PMMA is kept flat on the powder compressing machine, with ready-made one-off pattern strip have raceway groove one facing to PMMA, the upper and lower fixture block of powder compressing machine is screwed, keeping when screwing going up fixture block is vertical drop, to screwing.Add 0-0.5Mpa pressure; Upper and lower fixture block, template, PMMA sheet surface all should keeping parallelism.
(2) target temperature of powder compressing machine attemperating unit transfers to 90-120 ℃, heats up, and treats that upper and lower fixture block is warming up to target temperature, constant temperature, be incubated 1-10 minute, unscrew upper and lower fixture block, treat that the fixture block temperature reduces near outwarding winding fully behind the normal temperature, take out the PMMA secondary template at the test under microscope figure;
3, utilize secondary template to make the PDMS mini component
(1) configuration PDMS performed polymer vacuumizes in vacuum drying chamber, gets rid of the air that dissolves in the performed polymer.Note, the big silicon gel of viscosity in vacuum, when influxing near the beaker mouth on the liquid PDMS, is closed mechanical pump and vacuum valve, drive pore into, make external and internal pressure basic identical, treat that PDMS falls after, continue to vacuumize, repeat in this way, till no bubble.
The PDMS performed polymer that (2) will degas is cast on the PMMA secondary template, is being cured below 80 ℃; Solidification temperature and time decide on concrete PDMS model, but solidification temperature can not be higher than the softening temperature of PMMA.
(3) the PDMS components and parts that are cured naturally cool to room temperature, peel off carefully from the PMMA template, at the test under microscope component structure.
Be the technology of making integrated capillary electrophoretic chip of method of the present invention below
Adopt bulk silicon technological to make template one time earlier: get 3 o'clock twin polishing (100) silicon chips, cleaning → oxidation → photoetching → ICP etching → scribing, deoxidation layer are produced template one time.With a silicon negative template is motherboard, adopts pressure sintering to make secondary template: get the PMMA plate and a template alignment of well cutting, be placed on the 769YP-15A powder compressing machine, clip the upper and lower fixture block of powder compressing machine, screw, be forced into 0.5MPa, be warming up to 107 ℃, be incubated one minute; Then, unclamp fixture block, be cooled to naturally, take out the PMMA plate, will be stained with PMMA plate washer (liquid flows out when preventing to pour into a mould PDMS) around the PMMA sheet with chloroform liquid near room temperature; Secondary template completes.
The integrated capillary chip adopts the GN512 silicon gel of morning twilight company.Get M: N composition volume ratio 1: 1, mix, stir; Put into vacuum drying chamber, vacuumize repeatedly and degas, obtain not having bubble, transparent, thick silicon gel performed polymer; Performed polymer is poured in the secondary template, put into drying box, be warming up to 80 ℃, be incubated 1 hour, take out, be cooled to room temperature naturally; Carefully peel off the structural detail of the silicon gel integrated capillary electrophoretic chip that obtains being cured.The little raceway groove of integrated capillary electrophoretic chip is wide 100 microns, and is high 20 microns.
Be to adopt method of the present invention to make the technology of dual chamber valve free pump parts below:
Template manufacturing process steps and integrated capillary electrophoretic chip basic identical, etching Micropump cavity is to adopt each diversity caustic solution of KOH when being a template construct, in addition, for improving the life-span of a silica-based template, adopted electrostatic bonding method bonding 7740 glass, the life-span of having improved a template at one-off pattern backboard face.The secondary template processing step is identical, and only because of the pump housing volume is bigger, therefore, the hot pressing holding temperature rises to 110 ℃, and the time is 3min.
Claims (2)
1. secondary template duplicating process method based on dimethyl silicone polymer mini component is characterized in that:
1.1 make template one time
1.1.1 the material of template is the twin polishing monocrystalline silicon piece,
1.1.2 with the silicon chip thermal oxide that cleaning was handled, oxidation bed thickness about 6000
1.1.3 adopt the photolithography plate photoetching oxide layer of making in advance,
1.1.4 adopt ICP etching or each diversity etching process etching, the deoxidation layer,
1.2 making secondary template
1.2.1 fresh PMMA sheet is kept flat on the powder compressing machine, with ready-made one-off pattern strip have raceway groove one facing to the PMMA sheet, the upper and lower fixture block of powder compressing machine is screwed, add 0-0.5Mpa pressure,
1.2.2 the target temperature of powder compressing machine attemperating unit transfers to 90-120 ℃, heat up, treat that upper and lower fixture block is warming up to target temperature, constant temperature, be incubated 1-10 minute, unscrew upper and lower fixture block, treat that the fixture block temperature reduces near outwarding winding fully behind the normal temperature, take out the PMMA secondary template at the test under microscope figure;
Make the PDMS mini component 1.3 utilize secondary template
1.3.1 configuration PDMS performed polymer vacuumizes in vacuum drying chamber, gets rid of the air that dissolves in the performed polymer,
1.3.2 the PDMS performed polymer that will degas is cast on the PMMA secondary template, is being cured below 80 ℃,
1.3.3 the PDMS components and parts that are cured naturally cool to room temperature, peel off carefully from the PMMA template, at the test under microscope component structure.
2. the secondary template duplicating process method based on dimethyl silicone polymer mini component according to claim 1 is characterized in that: when making a template, after the etching at the silicon chip back side with legal bonding one deck 7740 glass of electrostatic bond.
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2005101273952A CN100420622C (en) | 2005-12-28 | 2005-12-28 | Secondary template duplicating process method based on dimethyl silicone polymer mini component |
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| CNB2005101273952A CN100420622C (en) | 2005-12-28 | 2005-12-28 | Secondary template duplicating process method based on dimethyl silicone polymer mini component |
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| CN1789108A CN1789108A (en) | 2006-06-21 |
| CN100420622C true CN100420622C (en) | 2008-09-24 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101200550B (en) * | 2007-11-14 | 2010-08-11 | 大连水产学院 | Method for preparing template imitating micro-nano structure surface |
| CN101607432A (en) * | 2008-06-19 | 2009-12-23 | 鸿富锦精密工业（深圳）有限公司 | The manufacture method of optical element |
| CN104560711B (en) * | 2015-01-27 | 2017-02-01 | 哈尔滨工业大学 | Cell-culture micro-fluidic chip with self-antibacterial function |
| CN105538587B (en) * | 2016-01-22 | 2018-07-06 | 苏州汶颢芯片科技有限公司 | Soft chip adapted to injection system and the method for making soft chip |
Citations (5)
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| CN1437018A (en) * | 2003-03-14 | 2003-08-20 | 哈尔滨工业大学 | Prepn of capillary electrophoresis chip for biochemical analysis |
| WO2004062899A2 (en) * | 2003-01-16 | 2004-07-29 | Seung-Seob Lee | Method for manufacturing of polymer micro needle array with liga process |
| US20040233424A1 (en) * | 2003-05-21 | 2004-11-25 | National Cheng Kung University | Chip-based microfluidic particle detector with three dimensional focusing mechanisms |
| CN1557967A (en) * | 2004-02-12 | 2004-12-29 | 上海交通大学 | Encapsulation method for plastic micro-flow control analysis chip |
| CN1683443A (en) * | 2005-03-09 | 2005-10-19 | 哈尔滨工业大学 | Chip simply non-reversion binding method using poly dimethyl siloxanes as substrate material |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004062899A2 (en) * | 2003-01-16 | 2004-07-29 | Seung-Seob Lee | Method for manufacturing of polymer micro needle array with liga process |
| CN1437018A (en) * | 2003-03-14 | 2003-08-20 | 哈尔滨工业大学 | Prepn of capillary electrophoresis chip for biochemical analysis |
| US20040233424A1 (en) * | 2003-05-21 | 2004-11-25 | National Cheng Kung University | Chip-based microfluidic particle detector with three dimensional focusing mechanisms |
| CN1557967A (en) * | 2004-02-12 | 2004-12-29 | 上海交通大学 | Encapsulation method for plastic micro-flow control analysis chip |
| CN1683443A (en) * | 2005-03-09 | 2005-10-19 | 哈尔滨工业大学 | Chip simply non-reversion binding method using poly dimethyl siloxanes as substrate material |
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