CN100413062C - Method for producing heat pipes - Google Patents

Method for producing heat pipes Download PDF

Info

Publication number
CN100413062C
CN100413062C CNB2004100280140A CN200410028014A CN100413062C CN 100413062 C CN100413062 C CN 100413062C CN B2004100280140 A CNB2004100280140 A CN B2004100280140A CN 200410028014 A CN200410028014 A CN 200410028014A CN 100413062 C CN100413062 C CN 100413062C
Authority
CN
China
Prior art keywords
photoresist layer
making method
heat control
control making
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2004100280140A
Other languages
Chinese (zh)
Other versions
CN1719600A (en
Inventor
沈志华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CNB2004100280140A priority Critical patent/CN100413062C/en
Publication of CN1719600A publication Critical patent/CN1719600A/en
Application granted granted Critical
Publication of CN100413062C publication Critical patent/CN100413062C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Micromachines (AREA)

Abstract

The present invention relates to a manufacturing method of a heat pipe, which comprises the following steps: a substrate is provided, and an oxidizing layer is formed on the surface of the substrate; a photoresistive layer is attached on the oxidizing layer; a passage is formed on the photoresistive layer via a micro electromechanical manufacturing technology; the open end of the passage is sealed; a layer of high molecular polymer covers the surface of the photoresistive layer to form an outer housing of the heat pipe; a hole for the flow of working fluid is opened on the outer housing and the photoresistive layer; the working fluid is filled via the hole, and then the hole is sealed. The heat pipe which is made via the manufacturing method has the advantages that the occupied space is small, the condition that heat generation electronic components are smaller and smaller is satisfied, a pipe wall of the heat pipe has flexibility, one end of the heat pipe can be bent optionally to contact the heat generation electronic components, and the heat pipe can be installed limberly and are not be limited by the space of the heat generation electronic components.

Description

The heat control making method
[technical field]
The invention relates to a kind of manufacture method of heat pipe, refer in particular to a kind of manufacture method that is applied to the heat pipe of heat-generating electronic elements heat radiation.
[background technology]
Fast development along with electronics and information industry, electronic component disposal abilities such as central processing unit are strengthened day by day, the heat that produces all increases with it, fin can't satisfy radiating requirements gradually in conjunction with the heat radiation module of fan, especially notebook computer, heat pipe is a critical elements that is widely used in heat transfer usefulness at present.Heat pipe is as a kind of heat transfer unit (HTU), and it is an amount of hydraulic fluid of splendid attire in sealing low pressure heat conductivility good metal housing, and when utilizing hydraulic fluid to do in housing that vapour-liquid two is alternate to be transformed and absorb or the principle of emitting big calorimetric is carried out work.Hydraulic fluid is selected the liquid that heat of vaporization height, good fluidity, chemical property are stable, boiling point is lower usually for use, as water, ethanol, acetone etc.For quickening the back-flow velocity of cooling back liquid, on inner walls, also be provided with capillary structure usually, under the capillary absorption affinity effect of capillary structure, quicken the back-flow velocity of liquid greatly.Because the hydraulic fluid circulation rate in the heat pipe is fast, so the heat transfer efficiency height.
The method of at present existing multiple manufacturing heat pipe, wherein a kind of method is: a heating panel is processed, to offer the terminal non-through passage of heat of multiple tracks; Again the openend of each passage of heat is sealed and keep at least one openend; Carry out while filling operation fluid and evacuation process from this openend that is retained, and again to its final technology of being sealed.Though the heat pipe that traditional heat control making method is processed into has hot preferably transfer efficiency, can satisfy heat-generating electronic elements heat radiation requirement to a certain extent, but the general volume of heat pipe is bigger, need use with radiator, fan combination just can reach better heat radiating effect, and institute takes up space bigger.Along with electronic component performance such as central processing unit improve constantly, caloric value is increasing, the conventional heat pipe volume bigger than normal with the electronic element piece day of year contradiction that becomes to diminishing, can not satisfy the heat radiation of the high electronic component of caloric value.
Along with micro electronmechanical manufacturing technology constantly develops, the research of microsystem began to be paid attention to by people in recent years.Micro electronmechanical manufacturing technology is a kind of integrated and microminiaturization system manufacturing technology in conjunction with multiple technologies fields such as light, mechanical, electrical, material, control, physics, living doctor, chemistry.Micro electronmechanical manufacturing technology is the technology that is skillful in making micro-structural, different being of this kind technology and traditional mechanical processing method maximum: micro electronmechanical manufacturing technology can batch manufacturing, modification for different parameters is convenient, can accomplish that workpiece and finished product are one-body molded, and can combine closely with the conventional semiconductor process technique.Micro electronmechanical manufacturing technology is the basis of all micro electro mechanical system (MEMS) technology development, and this technology can produce the micro-structural trickleer than hair, element and product etc.Therefore, industry begins to use this technology and processes small heat dissipation element.
Along with the heat-generating electronic elements performance improves constantly, respective volume but diminishes day by day, how to provide a kind of manufacture method that can satisfy the heat pipe of the heat-generating electronic elements heat radiation that caloric value is big, volume is little to become the key that industry solves this type of problem.
[summary of the invention]
The object of the present invention is to provide a kind of manufacture method that can satisfy the heat pipe of the heat-generating electronic elements heat radiation that caloric value is big, volume is little.
The manufacture method of heat pipe of the present invention may further comprise the steps: a substrate is provided, forms an oxide layer at this substrate surface; At this oxide layer surface attachment one photoresist layer; On photoresist layer, form passage by micro electronmechanical manufacturing technology; The openend of passage is sealed; At photoresist layer surface coverage one deck high molecular polymer, form the shell of heat pipe; On shell and photoresist layer, offer an aperture that supplies working fluid to enter; By the aperture to the passage internal-filling liquid; Sealing of hole.
Owing to utilize micro electronmechanical manufacturing technology, make this heat pipe little than the volume of conventional heat pipe among the present invention, institute takes up space little, can satisfy the situation that the heat-generating electronic elements volume diminishes day by day; In addition, the thermotube wall that utilizes micro electronmechanical fabrication technique is thin to have a pliability, can be arbitrarily crooked and heat-generating electronic elements one end in contact, the heat-generating electronic elements spatial limitation that is not subjected to flexible for installation.
With reference to the accompanying drawings, the invention will be further described in conjunction with the embodiments.
[description of drawings]
Fig. 1 is a heat control making method schematic diagram of the present invention.
Fig. 2 is the processing schematic diagram of photoresist layer shown in Figure 1.
Fig. 3 is the still unsealed schematic perspective view of heat pipe of the present invention.
Fig. 4 is the generalized section along Fig. 3 IV-IV line.
[embodiment]
See also Fig. 1 to Fig. 4, heat control making method of the present invention is: a substrate 10 (in the embodiment of the invention be substrate with the silicon wafer) is provided; Form the very thin silicon dioxide oxide layer 20 of one deck with dry type oxidation process on the surface of substrate 10.There is the substrate 10 of oxide layer 20 to place on the vacuum coater above-mentioned surface attachment, is coated with an amount of photoresist and adheres to liquid it is evenly distributed on the oxide layer 20, form a photoresist layer 30.After coating finishes, place it on the heating plate and carry out soft baking, make photoresist layer 30 become solid-state homogeneous film, so far can form required photoresist layer 30 by original liquid state with 90 ℃ of temperature.Above-mentioned photoresist layer 30 is placed on the microscope carrier of exposure machine and exposes by instrument 100, so as with required design transfer to photoresist layer 30; With developer solution the pattern on the photoresist layer 30 is carried out development treatment, exposed portion is removed with chemical solution, unexposed portion stays, thereby forms a passage 40 on photoresist layer 30.Then, photoresist layer 30 is washed, dries up, be placed on the heating plate and carry out roasting firmly with 120 ℃ of temperature.Afterwards, remove substrate 10 with potassium hydroxide etch, at this moment, the main effect of oxide layer 20 is the obstacles during as potassium hydroxide etch, utilize potassium hydroxide to SiO 2 etch rate slowly principle reach the purpose of protection photoresist layer 30.The openend of passage 40 is sealed, a high molecular polymer is provided, it is coated on the surface of photoresist layer 30, form a housing and be enclosed in the shell 50 of the outer surface of photoresist layer 30 as heat pipe.On shell 50 and photoresist layer 30, offer one with the aperture 60 of external communications.Then, shell 50 surfaces are dried, splash into passage 40 as working fluid 70 by aperture 60 with deionized water after, use the colloid sealing of hole, can finish the manufacturing process of whole heat pipe.
Owing to utilize micro electronmechanical manufacturing technology, make this heat pipe volume little than conventional heat pipe among the present invention, institute takes up space little, can satisfy the situation that the heat-generating electronic elements volume diminishes day by day; In addition, utilize the thermotube wall attenuation of micro electronmechanical fabrication technique to have pliability, arbitrarily bending and heat-generating electronic elements one end in contact, the heat-generating electronic elements spatial limitation that is not subjected to flexible for installation.
In addition, on photoresist layer 30, can form a plurality of passages 40, and the shape of passage 40 can be decided according to the actual requirements.

Claims (9)

1. heat control making method may further comprise the steps:
(1) provides a substrate, form an oxide layer at this substrate surface;
(2) at this oxide layer surface attachment one photoresist layer;
(3) on photoresist layer, form passage by micro electronmechanical manufacturing technology;
(4) openend with passage seals;
(5), form the shell of heat pipe at photoresist layer surface coverage one deck high molecular polymer;
(6) on shell and photoresist layer, offer an aperture that supplies working fluid to enter;
(7) by the aperture to the passage internal-filling liquid;
(8) sealing of hole.
2. heat control making method as claimed in claim 1 is characterized in that: the photoresist layer in above-mentioned (2) step is by adhering to liquid at oxide layer surface coated photoresist, carries out soft roasting and form then.
3. heat control making method as claimed in claim 1 is characterized in that: above-mentioned (3) step further may further comprise the steps:
(1) with the photoresist layer exposure, make required design transfer to photoresist layer;
(2) pattern on the photoresist layer is carried out development treatment;
(3) photoresist layer washed, dry up, roasting firmly, form above-mentioned passage.
4. heat control making method as claimed in claim 1 is characterized in that: also comprise with potassium hydroxide etch between above-mentioned (3) step and (4) step and remove substrate.
5. heat control making method as claimed in claim 1 is characterized in that: above-mentioned (8) step is to utilize the colloid sealing of hole.
6. heat control making method as claimed in claim 1 is characterized in that: the working fluid in the described passage is a deionized water.
7. heat control making method as claimed in claim 1 is characterized in that: described substrate is a silicon wafer.
8. heat control making method as claimed in claim 1 is characterized in that: described oxide layer is a silicon dioxide.
9. heat control making method as claimed in claim 1 is characterized in that: offer a plurality of passages on the described photoresist layer.
CNB2004100280140A 2004-07-06 2004-07-06 Method for producing heat pipes Expired - Fee Related CN100413062C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2004100280140A CN100413062C (en) 2004-07-06 2004-07-06 Method for producing heat pipes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2004100280140A CN100413062C (en) 2004-07-06 2004-07-06 Method for producing heat pipes

Publications (2)

Publication Number Publication Date
CN1719600A CN1719600A (en) 2006-01-11
CN100413062C true CN100413062C (en) 2008-08-20

Family

ID=35931392

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100280140A Expired - Fee Related CN100413062C (en) 2004-07-06 2004-07-06 Method for producing heat pipes

Country Status (1)

Country Link
CN (1) CN100413062C (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4199074A1 (en) * 2021-12-16 2023-06-21 Siemens Aktiengesellschaft Electronic module comprising a pulsating heat pipe with a channel structure
EP4199075A1 (en) * 2021-12-16 2023-06-21 Siemens Aktiengesellschaft Electronic module comprising a pulsating heat pipe with a channel structure

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109742061B (en) * 2019-01-14 2020-06-30 清华大学 Flexible electronic device and method of manufacturing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010022219A1 (en) * 1998-04-13 2001-09-20 Masami Ikeda Plate type heat pipe and its mounting structure
US20040052056A1 (en) * 2001-12-13 2004-03-18 Minehiro Tonosaki Cooling device, electronic equipment device, and method of manufacturing cooling device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010022219A1 (en) * 1998-04-13 2001-09-20 Masami Ikeda Plate type heat pipe and its mounting structure
US20040052056A1 (en) * 2001-12-13 2004-03-18 Minehiro Tonosaki Cooling device, electronic equipment device, and method of manufacturing cooling device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4199074A1 (en) * 2021-12-16 2023-06-21 Siemens Aktiengesellschaft Electronic module comprising a pulsating heat pipe with a channel structure
EP4199075A1 (en) * 2021-12-16 2023-06-21 Siemens Aktiengesellschaft Electronic module comprising a pulsating heat pipe with a channel structure
WO2023110219A1 (en) * 2021-12-16 2023-06-22 Siemens Aktiengesellschaft Electronics module comprising a pulsating heat pipe with a channel structure

Also Published As

Publication number Publication date
CN1719600A (en) 2006-01-11

Similar Documents

Publication Publication Date Title
CN1969382B (en) Heat dissipating device with enhanced boiling/condensation structure
JP4585745B2 (en) Method for forming a semiconductor device
JP5818889B2 (en) Method of manufacturing a CMOS compatible microchannel heat sink for electronic cooling
TW591984B (en) Micro-circulating flow channel system and its manufacturing method
US20030066625A1 (en) Mems microcapillary pumped loop for chip-level temperature control
CN103681541A (en) Wafer Level Embedded Heat Spreader
WO2018106554A2 (en) Lost wax cast vapor chamber device
CN106449565B (en) Manufacturing method based on graphene bigger serface flexible heat sink device
CN100413062C (en) Method for producing heat pipes
US20100018686A1 (en) Method of producing a wall, particularly a wall of a micro heat exchanger, and micro heat exchanger comprising, in particular, nanotubes
Eng et al. An experimental study on an electro-osmotic flow-based silicon heat spreader
US20040121588A1 (en) Method of forming dual damascene pattern in semiconductor device
US11201103B2 (en) Vapor chamber on heat-generating component
JP3941606B2 (en) Cooling device, evaporator substrate, electronic device and cooling device manufacturing method
WO2008069453A1 (en) Heat control device and method of manufacturing the same
CN102738076A (en) Through hole propriety copper interconnection manufacturing method
TWI292468B (en) Method of producing a heat pipe
CN108609574B (en) Enclosed structure, method of making same and device
CN103676470B (en) A kind of method and device forming photoetching agent pattern
Moon et al. Development of the micro capillary pumped loop for electronic cooling
CN100499020C (en) Wafer having thermal circuit and its power supplier
JP5101074B2 (en) How to make electronic interconnects
JP2003133412A (en) Method of improving adhesion of dielectric layer to copper
TWI747262B (en) Notebook computer, vapor chamber device and method for fabricating the vapor chamber device
CN105244291B (en) A kind of painting method for the three-dimensionally integrated photosensitive BCB of big thickness

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20080820

Termination date: 20150706

EXPY Termination of patent right or utility model