CN100410659C - Microgas sensor using one-dimension nanometer material - Google Patents

Microgas sensor using one-dimension nanometer material Download PDF

Info

Publication number
CN100410659C
CN100410659C CNB2005101122168A CN200510112216A CN100410659C CN 100410659 C CN100410659 C CN 100410659C CN B2005101122168 A CNB2005101122168 A CN B2005101122168A CN 200510112216 A CN200510112216 A CN 200510112216A CN 100410659 C CN100410659 C CN 100410659C
Authority
CN
China
Prior art keywords
layer
electrode layer
nanometer material
metal
monodimension nanometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005101122168A
Other languages
Chinese (zh)
Other versions
CN1793893A (en
Inventor
侯中宇
蔡炳初
张亚非
徐东
魏星
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Jiaotong University
Original Assignee
Shanghai Jiaotong University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Jiaotong University filed Critical Shanghai Jiaotong University
Priority to CNB2005101122168A priority Critical patent/CN100410659C/en
Publication of CN1793893A publication Critical patent/CN1793893A/en
Application granted granted Critical
Publication of CN100410659C publication Critical patent/CN100410659C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Abstract

The present invention relates to a miniature gas sensor using one-dimensional nanometer materials, which belongs to the technical field of sensors. The present invention comprises a substrate, a metal base electrode layer, a one-dimensional nanometer material layer, a metal supporting pole layer and a metal top electrode layer, wherein the metal base electrode layer is arranged on the substrate; the one-dimensional nanometer material layer is arranged on the metal base electrode layer; the metal supporting pole layer is arranged on the substrate; a top electrode is arranged on the substrate. The metal base electrode layer, the one dimensional nanometer material layer and the metal supporting pole layer are isolated mutually, and gas gaps are formed between the top electrode layer, the base electrode layer and the one dimensional nanometer material layer for mutual isolation. The present invention has the advantages of high selectivity, high sensitivity, low energy consumption, low cost and easy realization of arrays and miniaturization. Moreover, the present invention is favorable to the improvement of security and stability.

Description

Use the mini type gas sensor of monodimension nanometer material
Technical field
What the present invention relates to is a kind of sensor of microelectronics technology.It specifically is a kind of mini type gas sensor that uses monodimension nanometer material.
Technical background
Is the sensor of mechanism based on the ionization of gas molecule in electric field with the charged particle transport that produces therefrom, can be used for sensing gas with various composition and content information, with respect to the sensor of other types, the major advantage of this sensor is that it has very high selectivity.
Find through literature search prior art, people such as Modi.Ashish are at " Nature (nature) ", " Miniaturized gas ionization sensors using carbonnanotubes (the using the minitype gas ionization transducer of carbon nano-tube) " of 2003 the 424th curly hair tables.This article has proposed a kind of monodimension nanometer material---when carbon nano-tube is used as electrode, because the effect of its highfield enhancer, under identical voltage, can produce stronger electric field than the common metal plate electrode, therefore be equivalent to can be under lower voltage gas breakdown, and serve as according to composition and the concentration information of judging gas with the different voltage breakdown of all gases.Because the gas sensor of this principle has the high feature of selectivity to the gas of certain scope, therefore the described technology of the document has solved the problem of the working sensor voltage that reduces this type of principle to a certain extent, but the document does not propose a kind of device architecture of processing realization, but experimental each parts is simply pieced together, in fact, one of core texture key element that replants device is an electrode separation, only make little extremely several microns to tens microns the level of electrode separation, just can avoid this sensor is carried out operation with high pressure, but so little spacing needs high-precision manufacturing process to control, and in order to introduce such manufacturing process, the device architecture that is fit to this manufacturing process must be arranged, the device architecture that is proposed in the document is experimental, is difficult to realize high-precision batch machining according to this organization plan.The know-why that does not also have the document is applied to the microsensor manufacturing at present, and proposes to be suitable for utilizing the device architecture of advanced fine process to occur.
Summary of the invention
The present invention is directed to the deficiencies in the prior art and defective, a kind of mini type gas sensor that uses monodimension nanometer material is proposed, make it be suitable for utilizing microelectric technique to carry out processing and manufacturing, can utilize microelectronic processing technology that the key parameter of device is carried out High Accuracy Control, so the sensor of this kind structure have the advantage that selectivity height, highly sensitive, low energy consumption, cost are low, be easy to realize array, miniaturization.
The present invention is achieved by the following technical solutions, the present invention includes: substrate, metallic bottom electrode layer, monodimension nanometer material layer, metal support layer, metal roof electrode layer.Wherein, the metallic bottom electrode layer is arranged on the substrate.The monodimension nanometer material layer is arranged on the metallic bottom electrode layer.Metal support layer is arranged on the substrate.The metal roof electrode layer is arranged on the substrate.Isolate mutually between metallic bottom electrode layer, monodimension nanometer material layer and the metal support layer.There is gas gap to isolate mutually between metal roof electrode layer and metallic bottom electrode layer, the monodimension nanometer material layer.
Described substrate, its surface has high insulating property, and it can be a glass, also can be the silicon chip that the upper strata has insulation course, and insulating layer material can be silicon dioxide, silicon nitride, also can be other dielectric substrate.
Described metallic bottom electrode layer can be individual layer or multiple layer metal film.
Described monodimension nanometer material layer can be the potpourri that monodimension nanometer material and other materials form.
Described metal support layer can be individual layer or multiple layer metal film.
Described metal roof electrode layer is positioned on the metal support layer, and links to each other with metal support layer, and gapped mutual isolation has gas between metal roof electrode layer and metallic bottom electrode layer, the monodimension nanometer material layer in the gap.
In device architecture of the present invention, because top electrode, hearth electrode and electrode support all are made of metal, therefore being beneficial to the photosensitive material photoetching development technology, metal selective electroplating technology and the multilayer technique that use microelectronic processing technique realizes, and help controlling accurately distance between top electrode and the monodimension nanometer material layer, thereby operating voltage can be reduced by a larger margin, cut down the consumption of energy, improve security, stability.
Description of drawings
Fig. 1 is the two-dimensional structure sketch of a kind of structure of the present invention.
Fig. 2 is that the present invention works as monodimension nanometer material laminar surface gas ionization output voltage-current signal curve when being about 3 microns apart from the top electrode spacing.
Fig. 3 is the present invention's gas ionization output voltage-current signal curve when working as one-dimensional nano material film surface distance top electrode spacing and being about 10 microns.
Embodiment
As shown in Figure 1, the present invention includes: substrate 1, metallic bottom electrode layer 2, monodimension nanometer material layer 3, metal support layer 4, metal roof electrode layer 5.Wherein, metallic bottom electrode layer 2 is arranged on the substrate 1.Monodimension nanometer material layer 3 is arranged on the metallic bottom electrode layer 2.Metal support layer 4 is arranged on the substrate 1.Metal roof electrode layer 5 is arranged on the substrate 1.Isolate mutually between metallic bottom electrode layer 2 and monodimension nanometer material layer 3 and the metal support layer 4.There is gas gap to isolate mutually between metal roof electrode layer 5 and bottom electrode layer 2 and the monodimension nanometer material layer 3.
Described substrate 1, its surface has high insulating property, and it can be a glass, also can be the silicon chip that the upper strata has insulation course, and insulating layer material can be silicon dioxide, silicon nitride, also can be other dielectric substrate.
Described metallic bottom electrode layer 2 can be individual layer or multiple layer metal film.Described metal, for example chromium, copper, gold, platinum, aluminium, nickel, iron-nickel, nickel-copper.
Described-dimension nano material layer 3, be the mixture film that comprises monodimension nanometer material.Its monodimension nanometer material can be carbon nano-tube, carbon nano-fiber, nano silicon carbide silica fibre, nano zine oxide fiber.
Described metal support layer 4 can be individual layer or multiple layer metal film.Its metal can be chromium, copper, gold, platinum, aluminium, nickel, iron-nickel, nickel-copper.
Described metal roof electrode layer 5 is positioned on the metal support layer 4, and links to each other with metal support layer 4, and gapped mutual isolation has gas between metal roof electrode layer 5 and metallic bottom electrode layer 2, the monodimension nanometer material layer 3 in the gap.
When the present invention works, when between metal roof electrode layer 5 and metallic bottom electrode layer 2, applying certain voltage, will in the gap between monodimension nanometer material layer 3 and the metal roof electrode layer 5, produce electric field, when electric field is enough to puncture gas in the gap, external circuit will be converted to the conducting state after the gas breakdown fast by the short-circuit condition that gas does not puncture, just detect electric current, discharge inception voltage according to heterogeneity and concentration gases, the different fact of discharge initial current, can be used as the foundation of judging that whether certain composition and content gas exist, also can be used as the foundation whether certain gas componant and content change.In device architecture of the present invention, because metal roof electrode layer 5, metallic bottom electrode layer 2 and electrode support layer 4 all are made of metal, therefore being beneficial to the photosensitive material photoetching development technology, metal selective electroplating technology and the multilayer technique that use microelectronic processing technique realizes, and help controlling accurately distance between top electrode and the monodimension nanometer material layer, thereby operating voltage can be reduced by a larger margin, cut down the consumption of energy, improve security, stability.
As Fig. 2, shown in Figure 3, be gas ionization output voltage of the present invention-current signal curve.Tested gas has three kinds, is respectively air, volume ratio and is 1% helium and volume ratio and be 10% carbon dioxide mix in air.The air pressure of these three kinds of gases is 1 atmospheric pressure.The test environment temperature is 18 degrees centigrade.Device microelectronic processing technique manufacturing, usability luminescent material are as the little galvanoplastics of the metal of little mold, and metal roof electrode layer 5 is respectively about 1-3 micron (Fig. 2) and about 8-10 micron (Fig. 3) apart from the spacing of carbon nano-tube.As seen from the figure, the operating voltage of device can be reduced to several volts to tens volts level, and the planar dimension of device is about 3 * 3 millimeters, the selectivity height, and stability, security is good, and energy consumption is low, is easy to realize volume production, is easy to array, and cost is low.

Claims (5)

1. mini type gas sensor that uses monodimension nanometer material, comprise: substrate (1), metallic bottom electrode layer (2), monodimension nanometer material layer (3), metal support layer (4), metal roof electrode layer (5), it is characterized in that, metallic bottom electrode layer (2) is arranged on the substrate (1), monodimension nanometer material layer (3) is arranged on the metallic bottom electrode layer (2), metal support layer (4) is arranged on the substrate (1), metal roof electrode layer (5) is arranged on the substrate (1), isolate mutually between metallic bottom electrode layer (2) and monodimension nanometer material layer (3) and the metal support layer (4), have gas gap to isolate mutually between metal roof electrode layer (5) and metallic bottom electrode layer (2) and the monodimension nanometer material layer (3); Described substrate (1) is a dielectric substrate.
2. the mini type gas sensor of use monodimension nanometer material according to claim 1 is characterized in that, described metallic bottom electrode layer (2) is individual layer or multiple layer metal film.
3. the mini type gas sensor of use monodimension nanometer material according to claim 1 is characterized in that, said monodimension nanometer material layer (3) is the mixture film that comprises monodimension nanometer material.
4. the mini type gas sensor of use monodimension nanometer material according to claim 1 is characterized in that, described metal support layer (4) is individual layer or multiple layer metal film.
5. the mini type gas sensor of use monodimension nanometer material according to claim 1, it is characterized in that, described metal roof electrode layer (5), be positioned on the metal support layer (4), and link to each other with metal support layer (4), gapped mutual isolation between metal roof electrode layer (5) and metallic bottom electrode layer (2), the monodimension nanometer material layer (3) has gas in the gap.
CNB2005101122168A 2005-12-29 2005-12-29 Microgas sensor using one-dimension nanometer material Expired - Fee Related CN100410659C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2005101122168A CN100410659C (en) 2005-12-29 2005-12-29 Microgas sensor using one-dimension nanometer material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2005101122168A CN100410659C (en) 2005-12-29 2005-12-29 Microgas sensor using one-dimension nanometer material

Publications (2)

Publication Number Publication Date
CN1793893A CN1793893A (en) 2006-06-28
CN100410659C true CN100410659C (en) 2008-08-13

Family

ID=36805460

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005101122168A Expired - Fee Related CN100410659C (en) 2005-12-29 2005-12-29 Microgas sensor using one-dimension nanometer material

Country Status (1)

Country Link
CN (1) CN100410659C (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101236177B (en) * 2008-02-28 2010-11-17 上海交通大学 Gas sensors electrode structure integrating three kinds detection for discharging, gas-sensitivity and electric quantity
CN101236178B (en) * 2008-02-28 2010-11-17 上海交通大学 Multiple calibration index gas composition distinguishing and recognition method
CN101349665B (en) * 2008-09-04 2011-06-08 上海交通大学 Adsorption and ionization complementary enhanced gas sensor
CN101349671B (en) * 2008-09-04 2011-08-31 上海交通大学 Field effect tube and molecular ionization fusion gas sensor
CN101408514B (en) * 2008-09-04 2010-08-18 上海交通大学 Gas sensor based on gas discharge spectral analysis and method for testing gas thereof
CN113390952B (en) * 2021-06-15 2022-12-16 上海航天科工电器研究院有限公司 Ionization type gas sensor and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6445006B1 (en) * 1995-12-20 2002-09-03 Advanced Technology Materials, Inc. Microelectronic and microelectromechanical devices comprising carbon nanotube components, and methods of making same
WO2004059298A1 (en) * 2002-12-20 2004-07-15 Rensselaer Polytechnic Institute Miniaturized gas sensors featuring electrical breakdown in the vicinity of carbon nanotube tips
CN1632557A (en) * 2004-12-22 2005-06-29 浙江大学 Multi-wall carbon nano-tube film gas sensor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6445006B1 (en) * 1995-12-20 2002-09-03 Advanced Technology Materials, Inc. Microelectronic and microelectromechanical devices comprising carbon nanotube components, and methods of making same
WO2004059298A1 (en) * 2002-12-20 2004-07-15 Rensselaer Polytechnic Institute Miniaturized gas sensors featuring electrical breakdown in the vicinity of carbon nanotube tips
CN1632557A (en) * 2004-12-22 2005-06-29 浙江大学 Multi-wall carbon nano-tube film gas sensor

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
Miniaturized gas ionization sensors using carbon nanotubes. Ashish Modi, Nikhil Koratkar, Eric Lass, Bingqing Wei,Pulickel M. Ajayan.nature,Vol.424 . 2003
Miniaturized gas ionization sensors using carbon nanotubes. Ashish Modi, Nikhil Koratkar, Eric Lass, Bingqing Wei,Pulickel M. Ajayan.nature,Vol.424 . 2003 *
Study of improving identification accuracy of carbonnanotube film cathode gas sensor. Zhang Yong, Liu Junhua, Li Xin, Tang Xiaojun, ZhuChangchun.Sensors and Actuators A,Vol.125 . 2005
Study of improving identification accuracy of carbonnanotube film cathode gas sensor. Zhang Yong, Liu Junhua, Li Xin, Tang Xiaojun, ZhuChangchun.Sensors and Actuators A,Vol.125 . 2005 *
基于局部高电场中气体导电原理的新型气体传感器. 戴平湖,凌保明.仪器仪表学报,第19卷第3期. 1998
基于局部高电场中气体导电原理的新型气体传感器. 戴平湖,凌保明.仪器仪表学报,第19卷第3期. 1998 *

Also Published As

Publication number Publication date
CN1793893A (en) 2006-06-28

Similar Documents

Publication Publication Date Title
CN100410659C (en) Microgas sensor using one-dimension nanometer material
Briand et al. Design and fabrication of high-temperature micro-hotplates for drop-coated gas sensors
US20040075140A1 (en) Microsensor and single chip integrated microsensor system
CN105987935B (en) MEMS gas sensor and preparation method thereof
CN106918627B (en) A kind of analysis and detection device based on closed bipolar electrode array
JP2004090208A (en) Electric component and method for manufacturing the same
CN201096739Y (en) A gas sensitive array sensor
CN111413375B (en) Gas sensor based on gas-sensitive membrane-electrode interface resistance signal
KR101403406B1 (en) Fabrication method for gas sensor and temperature sensor based on suspended carbon nanowires
US11414763B2 (en) Manufacturing method of sensor in an internet-of-things
CN101975803A (en) Planar gas sensor and manufacturing method thereof
CN104597095A (en) Co3V2O8 sensing electrode and three-dimensional three-phase boundary-based YSZ electrode mixed potential NO2 sensor and preparation method thereof
JP6730280B2 (en) Limiting current type gas sensor
CN1808111A (en) Ionized gas sensor microarray structure based on micro-electronic fabrication technology
Prajapati et al. An ultralow power nanosensor array for selective detection of air pollutants
CN101566598A (en) ZrO2 oxygen sensor for solid state reference partial pressure of oxygen and manufacture method thereof
CN113358701B (en) Large-scale array gas sensor and preparation method thereof
CN101349665B (en) Adsorption and ionization complementary enhanced gas sensor
CN104407034A (en) Gas sensor chip
Chang et al. Aerosol jet printing of nickel oxide nanoparticle ink with ultraviolet radiation curing for thin-film temperature sensors
CN201903532U (en) Double-sensitive-layer bulk acoustic wave hydrogen resonance sensor
CN101408514B (en) Gas sensor based on gas discharge spectral analysis and method for testing gas thereof
CN106053576A (en) Zirconium-based sensor and organic volatile matter detection device with same
CN106596683A (en) Dual active electrode nitrogen oxide sensor chip and preparation method thereof
CN200975988Y (en) Air contamination sensor of planar construction

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20080813

Termination date: 20101229