CN100381935C - Direct write-in method and apparatus of parallel laser based on harmonic resonance method - Google Patents
Direct write-in method and apparatus of parallel laser based on harmonic resonance method Download PDFInfo
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- CN100381935C CN100381935C CNB2006101509832A CN200610150983A CN100381935C CN 100381935 C CN100381935 C CN 100381935C CN B2006101509832 A CNB2006101509832 A CN B2006101509832A CN 200610150983 A CN200610150983 A CN 200610150983A CN 100381935 C CN100381935 C CN 100381935C
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Abstract
This invention relates to laser direct write method and device based on resonance vibration , wherein, the method comprises the following steps: it writes the laser and focus laser projection filter system and resonance infraction lens array in two split lens; separately forming exposure combination point array and focus point array in surface; exposure combination point and load base slice work station for connection control to fulfill random float pattern process; test focus point is reflected by point array base slice through resonance infraction lens array, projection filter system, two direction split lens, lambada /4 wave, bias split lens then into off focus system to form off focus signals together with computer, focus adjusting system to fulfill focus adjusting servo.
Description
Technical field
The invention belongs to the laser technical field of writing direct, particularly based on direct wiring method of the parallel laser of harmonic resonance method and device.
Background technology
Existing laser direct-writing technology all adopts the single-point exposure mode, and make efficiency is lower.In order to improve the make efficiency of devices such as microarray and Microstructure Optics, Chinese scholars has been done a lot of useful trials.
Patent 200410017768.6 " high resolution digitizing micro-optic gray scale mask manufacturing system and method for making " utilizes two to three spatial light modulator combination modulation to write laser, finishing exposure by the projection of final minification projection objective makes, this invention can improve system's intensity modulation resolving power, but this system exists the final minification multiple of the power that writes laser, spatial light modulator pixel micro mirror performance, projection objective system and picture element characteristic and data transmission and problems such as storage system requirement height, projection distortion, and the resolving power that writes of real system is difficult to improve.
Patent 200410043377.1 " projection aligner " provides a kind of exposure device, by image optical system the two-dimensional pattern of DMD micro mirror modulation being projected to photosensitive material finishes exposure and makes, this invention can suppress projection distortion, improve MTF performance and light utilization efficiency, but this device does not have focusing system, makes it be confined to the making of scale-of-two patterns such as mask, integrated circuit.
(the Dario Gil of the no mould etching system based on the zone plate objective lens array that people such as the Dario Gil of U.S. MIT propose, Rajesh Menon, D.J.D.Carter, H.I.Smith.Lithographic Patterning and Confocal Imaging withZone.J.Vac.Sci.Technolo.B, 2000,18 (6): 2881-2885),, can expand the making scope of this system greatly by introducing the confocal microscopy focusing system in system.Yet, consider the operating characteristic of zone plate list wavelength, this system introduces the zone plate that is fit to write laser and two kinds of wave bands of focusing test laser respectively in same objective lens array, thereby focusing system is separated with writing system, in actual fabrication, because photoresist gluing homogeneity, axle-system axial are beated, substrate tilts and the speck lens array is made error, not only increase the control difficulty, and influence focusing synchronism, accuracy and stability, can only be confined to the making of binary graphics such as mask, integrated circuit at present; Simultaneously, the manufacture difficulty of objective lens array also increases thereupon, and the zone plate light utilization efficiency is low.
Summary of the invention
In order to overcome the deficiencies in the prior art part, satisfy the demand of element manufacturing such as microarray and Microstructure Optics, the present invention proposes to adopt the humorous derivative lens array based on the harmonic resonance method, with writing light beam and focusing light beam, reach the purpose that writes accuracy, stability that real-time synchronous-focusing write, improved the direct writing system of parallel laser synchronously with the wiring method of point focusing.The present invention also provides a kind of direct writing station of the parallel laser based on the harmonic resonance method based on said method.
Above-mentioned purpose realizes by following technical scheme:
The direct wiring method of a kind of parallel laser based on the harmonic resonance method, the method includes the steps of:
1., send synchronously respectively and write laser and linear polarization focusing test laser by writing laser instrument and focusing test laser instrument;
2., write the collimator and extender of the steady optical modulation of laser by acousto-optic modulator, collimating and beam expanding system after, again by directive spatial light modulator after the mirror reflects, spatial light modulator is according to pixel portions, and the control signal modulation of sending according to computing machine writes laser, and directive two is to dichronic mirror then; Focusing test laser is behind the collimator and extender of collimating and beam expanding system, and again through the polarization splitting prism transmission, through λ/4 wave plates, directive two is to dichronic mirror;
3., meet at two and write laser and focusing test laser to dichronic mirror, enter projection filter system jointly, after its amplification, filtering, invest humorous derivative lens array, focus on substrate surface through humorous derivative lens array again and form exposure station combination dot matrix and focusing test point dot matrix respectively;
4., exposure station combination dot matrix and the air-flotation workbench interlock control that is loaded with substrate, finish the exposure of any relief pattern and make; Focusing test is selected dot matrix and is reflected by substrate, once more successively by humorous derivative lens array, projection filter system, two to dichronic mirror, λ/4 wave plates, the directive polarization splitting prism, enter the out of focus detection system through polarization splitting prism reflection again and form defocus signal, with computing machine, that focusing is finished in the acting in conjunction of focusing drive system is servo.
The direct writing station of a kind of parallel laser based on the harmonic resonance method comprises by writing laser instrument 11, and be configured in the acousto-optic modulator 12 that writes laser instrument 11 transmitting terminals successively, collimating and beam expanding system 13, catoptron 14, be placed on the spatial light modulator 15 on catoptron 14 reflected light paths, be placed on the projection filter system 122 on the spatial light modulator 15 reflection end central axis successively, exposure substrate 124, substrate worktable 125 constitutes writes laser system and by focusing test laser instrument 21, and the collimating and beam expanding system 22 that is placed on focusing test laser instrument 21 transmitting terminals successively, polarization splitting prism 23, be placed on λ/4 wave plates 24 on polarization splitting prism 23 transmitted light paths, be placed on the out of focus detection system 25 on polarization splitting prism 23 reflected light paths, be placed on the linear polarization focusing test laser system that the focusing drive system 26 between projection filter system 122 and exposure substrate 124 constitutes, and computing machine 126, this device also is provided with two to dichronic mirror 121 harmonious derivative lens arrays 123, wherein two is configured in combining on the position of intersecting point of spatial light modulator 15 belows and λ/4 wave plates, 24 sidepieces to dichronic mirror 121; Humorous derivative lens array 123 is configured on projection filter system 122 lower portion.
Two to dichronic mirror 121 for to write laser-transmitting, to focusing test laser-bounce or to write laser-bounce, to the focusing test laser-transmitting two to dichronic mirror.Humorous derivative lens array 123 is the humorous derivative lens array that continuous relief or step quantize.Out of focus detection system 25 is can be according to the out of focus detection system of confocal method focusing test, Astigmatism methord focusing test.Spatial light modulator 15 is digital micro-mirror DMD or grating light valve or liquid crystal or MEMS spatial light modulator.
Based on the direct wiring method of the parallel laser of harmonic resonance method following characteristics and beneficial effect are arranged:
1, the speck lens array system in the employing harmonic resonance principle design method, writing laser wave strong point and the identical focal power of focusing test laser wave strong point acquisition, constitute writing system and focusing test system light path altogether by preposition two to dichronic mirror, reach and write laser beam and focusing test laser beam synchronously with the purpose of point focusing, thereby synchronous-focusing writes in real time, and this is one of innovative point that is different from prior art;
2, in design, utilize the condition of resonance of humorous diffraction object lens, the relief depth of modulation diffraction object lens, optimize endless belt width and endless belt number, can avoid the restriction of the minimum resolving power of manufacture craft, the manufacture difficulty of derivative lens array in the reduction method improves the diffraction efficiency of diffraction object lens simultaneously, this be different from prior art innovative point two;
Apparatus of the present invention have following distinguishing feature:
1, uses the device of the direct wiring method of parallel laser based on the harmonic resonance method of the present invention, avoided poor because of photoresist gluing uniformity coefficient, axle-system axial is beated, substrate tilts and the speck lens array is made the shortcoming that error influences focusing accuracy, can increase substantially and write precision, reduce the control difficulty.
2, use the device of the direct wiring method of parallel laser based on the harmonic resonance method of the present invention, improved the degree of depth that writes of the direct writing system of parallel laser, except being fit to the making of binary graphics such as microelectronics, mask, be more suitable for the making of microarray and Microstructure Optics device.
Description of drawings
Fig. 1 is apparatus of the present invention configuration structure synoptic diagram;
Fig. 2 is the configuration structure schematic perspective view of apparatus of the present invention;
Fig. 3 is vertical sliding sleeve diagrammatic cross-section;
Fig. 4 is humorous diffraction list object lens continuous relief profile diagram.
Embodiment
Below in conjunction with accompanying drawing the direct wiring method of the parallel laser based on the harmonic resonance method of the present invention is elaborated with device embodiment.
As shown in Figure 1, the inventive system comprises: by writing laser instrument 11, and be configured in the acousto-optic modulator 12 that writes laser instrument 11 transmitting terminals successively, collimating and beam expanding system 13, catoptron 14, be placed on the spatial light modulator 15 on catoptron 14 reflected light paths, be placed on the projection filter system 122 on the spatial light modulator 15 reflection end central axis successively, exposure substrate 124, substrate worktable 125 constitutes writes laser system and by focusing test laser instrument 21, and the collimating and beam expanding system 22 that is placed on focusing test laser instrument 21 transmitting terminals successively, polarization splitting prism 23, be placed on λ/4 wave plates 24 on polarization splitting prism 23 transmitted light paths, be placed on the out of focus detection system 25 on polarization splitting prism 23 reflected light paths, be placed on the linear polarization focusing test laser system that the focusing drive system 26 between projection filter system 122 and exposure substrate 124 constitutes, and computing machine 126, this device also is provided with two to dichronic mirror 121 harmonious derivative lens arrays 123, wherein two is configured in combining on the position of intersecting point of spatial light modulator 15 belows and λ/4 wave plates, 24 sidepieces to dichronic mirror 121; Humorous derivative lens array 123 is configured on projection filter system 122 lower portion, the operating path of its light is divided into two-way: light path one: write the laser that writes that laser instrument 11 sends, behind steady optical modulation by acousto-optic modulator 12, the collimator and extender of collimating and beam expanding system 13, pass through the reflection of catoptron 14 again, directive spatial light modulator 15; Spatial light modulator 15 will write the laser-bounce beam splitting according to pixel portions, and simultaneously, each pixel portions of control signal of sending according to computing machine 126 is modulated respectively and respectively write laser beam; Respectively write laser beam by two after dichronic mirror 121 transmissions after the modulation, project projection filter system 122, again after it expands bundle amplification filtering, each sub-mirror that the humorous derivative lens array 123 of directive is complementary with it; Humorous derivative lens array 123 will respectively write laser beam and focus on, and form exposure station combination dot matrix on substrate 124 surfaces; Be loaded with the substrate worktable 125 scan exposure points combination dot matrix of exposure substrate 124, finish exposure; Light path two: the linear polarization focusing test laser that focusing test laser instrument 21 sends, enter polarization splitting prism 23 by collimating and beam expanding system 22 collimator and extenders, the e light that sees through is as focusing test laser, again through λ/4 wave plates 24, two reflections to dichronic mirror 121, the filtering of projection filter system 122 is amplified, humorous derivative lens array 123 focus on exposure substrate 124 surfaces, exposure substrate 124 surfaces are with this beam reflection, see through humorous derivative lens array 123 once more, projection filter system 122, two to dichronic mirror 121, λ/4 wave plates, 24 back focusing test light beams become e light by o light, again through the reflection of polarization splitting prism 23, directive out of focus detection system 25 forms defocus signal, with computing machine 126, it is servo that focusing is finished in 26 actings in conjunction of focusing drive system.
Apparatus of the present invention stereoscopic figure is provided with the accurate air supporting rotary table 125 of the substrate 124 that is loaded with the surface adsorption photosensitive material as shown in Figure 2 in the middle of the platform 222 that is supported by wedge type block 221.Platform 222 is provided with the two gantry structures across accurate air supporting rotary table 125, and two gantry structures are made up of pillar 223 and crossbeam 226, and pillar 223 is fixed on the platform 222.Be packaged with vertical sliding sleeve 224 of projection filter system 122, humorous derivative lens array 123 successively, be connected with horizontal sliding sleeve 225 by sleeve 227, laterally sliding sleeve 225 is connected with crossbeam 226, and vertically sliding sleeve 224 can be driven by focusing drive system 26 and move up and down adjustment along sleeve 227.In addition, vertically sliding sleeve 224 is supported by sleeve 227 and horizontal sliding sleeve 225 and can be moved along crossbeam 226.Whole device is placed on the air spring ground.
During work, light path one: what write that laser instrument 11 sends writes laser 228, behind the steady optical modulation by acousto-optic modulator 12, the collimator and extender of collimating and beam expanding system 13, and the reflection by catoptron 14 again, directive spatial light modulator 15; The pixel portions of spatial light modulator 15 will write the laser-bounce beam splitting, and simultaneously, each pixel portions of control signal of sending according to computing machine 126 is modulated respectively and respectively write laser beam; The laser beam that respectively writes after the modulation passes through two after dichronic mirror 121 transmissions, forms exposure stations combination dot matrix via vertical sliding sleeve 224 on exposure substrate 124 surfaces; Be loaded with accurate air supporting rotary table 125 revolving scannings of exposure substrate 124, finish exposure; Light path two: the linear polarization focusing test laser 229 that focusing test laser instrument 21 sends, enter polarization splitting prism 23 by collimating and beam expanding system 22 collimator and extenders, the e light that sees through is as focusing test laser, again through λ/4 wave plates 24, two reflections to dichronic mirror 121, vertically sliding sleeve 224 focuses on substrate 124 surfaces, substrate 124 surfaces are with this beam reflection, see through vertical sliding sleeve 224 once more, two to dichronic mirror 121, λ/4 wave plates, 24 back focusing test light beams become e light by o light, again through the reflection of polarization splitting prism 23, directive out of focus detection system 25 forms defocus signal, with computing machine 126,26 actings in conjunction of focusing drive system, it is servo to finish focusing.
This device can suitably add reflecting prism, so that the device space layout in the device light path on the basis of modifier principle not.As signal, the lens in the installation drawing all adopt simple lens to represent, but in the reality, drawn lens are all represented lens combination system.Substrate worktable 125 in this device is illustrated as accurate air supporting rotary table 125, also can be the precise 2-D worktable.Spatial light modulator 15 of the present invention is an example with digital micro-mirror DMD, type space photomodulators such as also available grating light valve, liquid crystal, MEMS.In addition, the devices such as monitoring device, pick-up unit and locating device that this device is indispensable are not because of belonging to category of the present invention, so do not show and discuss.
The humorous diffraction object lens of continuous relief can reach 100% diffraction efficiency in theory, are illustrated in figure 4 as the humorous diffraction object lens continuous relief profile diagram of embodiment of the present invention, and its design parameter is: write wavelength X
0=441.6nm, resonance factor p=3, resonance wavelength (being the focusing test wavelength) is λ=662.4nm, resonance level is m=2, focal distance f=512 μ m, the endless belt number is 3, wherein harmonic resonance condition is
Utilize the above-mentioned direct writing station of the parallel laser based on the harmonic resonance method, the embodiment of wiring method of the present invention may further comprise the steps:
(1) sends synchronously respectively and write laser and linear polarization focusing test laser by writing laser instrument 11 and focusing test laser instrument 21;
(2) write the collimator and extender of the steady optical modulation of laser by acousto-optic modulator 12, collimating and beam expanding system 13 after, again by catoptron 14 reflections, directive spatial light modulator 15, spatial light modulator 15 is according to pixel portions, the control signal modulation of sending according to computing machine 126 writes laser, then through two to dichronic mirror 121 transmissions; Behind the collimator and extender of focusing test laser path collimating and beam expanding system 22, again through polarization splitting prism 23 transmissions, through λ/4 wave plates 24, directive two is to dichronic mirror 121 and through its reflection;
(3) meet at two to dichronic mirror 121 write laser and focusing test laser, enter vertical sliding sleeve 224 jointly and form exposure stations combination dot matrix and focusing test point dot matrix on substrate 124 surfaces respectively;
(4) exposure station combination dot matrix and the accurate air supporting rotary table 125 interlock controls that are loaded with substrate 124 are finished the exposure of any relief pattern and are made; Described focusing test is selected dot matrix and is reflected by substrate 124, once more successively by vertical sliding sleeve 224, two to dichronic mirror 121, λ/4 wave plates 24, directive polarization splitting prism 23, enter out of focus detection system 25 through polarization splitting prism 23 reflections again and form defocus signal, with computing machine 126,26 actings in conjunction of focusing drive system, it is servo to finish focusing.
Claims (6)
1. direct wiring method of the parallel laser based on the harmonic resonance method, the method includes the steps of:
1., send synchronously respectively and write laser and linear polarization focusing test laser by writing laser instrument and focusing test laser instrument;
2., write the collimator and extender of the steady optical modulation of laser by acousto-optic modulator, collimating and beam expanding system after, again by directive spatial light modulator after the mirror reflects, spatial light modulator is according to pixel portions, and the control signal modulation of sending according to computing machine writes laser, and directive two is to dichronic mirror then; Focusing test laser is behind the collimator and extender of collimating and beam expanding system, and again through the polarization splitting prism transmission, through λ/4 wave plates, directive two is to dichronic mirror; It is characterized in that:
3., meet at two and write laser and focusing test laser to dichronic mirror, enter projection filter system jointly, after its amplification, filtering, invest humorous derivative lens array, focus on substrate surface through humorous derivative lens array again and form exposure station combination dot matrix and focusing test point dot matrix respectively;
4., exposure station combination dot matrix and the air-flotation workbench interlock control that is loaded with substrate, finish the exposure of any relief pattern and make; Focusing test is selected dot matrix and is reflected by substrate, once more successively by humorous derivative lens array, projection filter system, two to dichronic mirror, λ/4 wave plates, the directive polarization splitting prism, enter the out of focus detection system through polarization splitting prism reflection again and form defocus signal, with computing machine, that focusing is finished in the acting in conjunction of focusing drive system is servo.
2. direct writing station of the parallel laser based on the harmonic resonance method, comprise by writing laser instrument (11), and be configured in the acousto-optic modulator (12) that writes laser instrument (11) transmitting terminal successively, collimating and beam expanding system (13), catoptron (14), be placed on the spatial light modulator (15) on catoptron (14) reflected light path, be placed on the projection filter system (122) on spatial light modulator (15) the reflection end central axis successively, exposure substrate (124), substrate worktable (125) constitutes writes laser system and by focusing test laser instrument (21), and the collimating and beam expanding system (22) that is placed on focusing test laser instrument (21) transmitting terminal successively, polarization splitting prism (23), be placed on going on polarization splitting prism (23) transmitted light path/4 wave plates (24), be placed on the out of focus detection system (25) on polarization splitting prism (23) reflected light path, be placed on the linear polarization focusing test laser system that the focusing drive system (26) between projection filter system (122) and exposure substrate (124) constitutes, and computing machine (126), it is characterized in that: this device also is provided with two to the harmonious derivative lens array of dichronic mirror (121) (123), wherein two is configured in combining on the position of intersecting point of spatial light modulator (15) below and λ/4 wave plates (24) sidepiece to dichronic mirror (121); Humorous derivative lens array (123) is configured on projection filter system (122) lower portion.
3. the direct writing station of the parallel laser based on the harmonic resonance method according to claim 2 is characterized in that: two to dichronic mirror (121) for to write laser-transmitting, to focusing test laser-bounce or to write laser-bounce, to the focusing test laser-transmitting two to dichronic mirror.
4. the direct writing station of the parallel laser based on the harmonic resonance method according to claim 2 is characterized in that: humorous derivative lens array (123) is the humorous derivative lens array of continuous relief or step quantification.
5. the direct writing station of the parallel laser based on the harmonic resonance method according to claim 2 is characterized in that: out of focus detection system (25) is can be according to the out of focus detection system of confocal method focusing test, Astigmatism methord focusing test.
6. the direct writing station of the parallel laser based on the harmonic resonance method according to claim 2 is characterized in that: spatial light modulator (15) is digital micro-mirror DMD or grating light valve or liquid crystal or MEMS spatial light modulator.
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US8642232B2 (en) * | 2011-11-18 | 2014-02-04 | Periodic Structures, Inc. | Method of direct writing with photons beyond the diffraction limit |
| US9304410B2 (en) | 2011-11-18 | 2016-04-05 | Periodic Structures Inc. | Apparatus and method of direct writing with photons beyond the diffraction limit |
| CN102890430B (en) * | 2012-09-18 | 2015-09-09 | 天津芯硕精密机械有限公司 | A kind of device and method directly writing exposure machine adjustment plane of exposure Power uniformity |
| US9195139B2 (en) | 2013-12-30 | 2015-11-24 | Periodic Structures, Inc. | Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist |
| CN109617545B (en) * | 2018-12-12 | 2021-03-12 | 汕头大学 | Device and method with two third harmonic enhancement and photoelectric switch functions |
| CN110376171B (en) * | 2019-07-15 | 2021-11-19 | 上海理工大学 | Transmission type fluorescence detection imaging system applied to dPCR detector |
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| JP2001284223A (en) * | 2000-03-30 | 2001-10-12 | Canon Inc | Exposure system |
| US20030184832A1 (en) * | 2002-02-28 | 2003-10-02 | Shingo Imanishi | Exposure apparatus, exposure method, recording and/or reproducing apparatus, and recording and/or reproducing method |
| JP2004335949A (en) * | 2002-11-29 | 2004-11-25 | Nikon Corp | Aligner and exposure method |
| CN1564053A (en) * | 2004-04-16 | 2005-01-12 | 南昌航空工业学院 | High solution digital microoptical grey mask prodn. system and its prodn, method |
| CN1687816A (en) * | 2005-06-17 | 2005-10-26 | 哈尔滨工业大学 | Space aligning method of ultra-precision rotary shaft and direct writing optical axis of laser direct writing apparatus |
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4512642A (en) * | 1981-09-18 | 1985-04-23 | Ashai Kogaku Kogyo Kabushiki Kaisha | Automatic focusing apparatus in optical drawing machine |
| JP2001284223A (en) * | 2000-03-30 | 2001-10-12 | Canon Inc | Exposure system |
| US20030184832A1 (en) * | 2002-02-28 | 2003-10-02 | Shingo Imanishi | Exposure apparatus, exposure method, recording and/or reproducing apparatus, and recording and/or reproducing method |
| JP2004335949A (en) * | 2002-11-29 | 2004-11-25 | Nikon Corp | Aligner and exposure method |
| CN1564053A (en) * | 2004-04-16 | 2005-01-12 | 南昌航空工业学院 | High solution digital microoptical grey mask prodn. system and its prodn, method |
| CN1687816A (en) * | 2005-06-17 | 2005-10-26 | 哈尔滨工业大学 | Space aligning method of ultra-precision rotary shaft and direct writing optical axis of laser direct writing apparatus |
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