CH597262A5 - - Google Patents
Info
- Publication number
- CH597262A5 CH597262A5 CH217376A CH217376A CH597262A5 CH 597262 A5 CH597262 A5 CH 597262A5 CH 217376 A CH217376 A CH 217376A CH 217376 A CH217376 A CH 217376A CH 597262 A5 CH597262 A5 CH 597262A5
- Authority
- CH
- Switzerland
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
- C08F299/0407—Processes of polymerisation
- C08F299/0421—Polymerisation initiated by wave energy or particle radiation
- C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH217376A CH597262A5 (nl) | 1976-02-23 | 1976-02-23 | |
DE19772704927 DE2704927A1 (de) | 1976-02-23 | 1977-02-07 | Initiatoren fuer die photopolymerisation |
NL7701700A NL7701700A (nl) | 1976-02-23 | 1977-02-17 | Initiatoren voor de fotopolymerisatie. |
BE175138A BE851689A (fr) | 1976-02-23 | 1977-02-22 | Inducteurs de photopolymerisation a base de derives de l'anthrone |
GB7519/77A GB1526661A (en) | 1976-02-23 | 1977-02-22 | Initiators for photo polymerisation |
JP1910477A JPS52107084A (en) | 1976-02-23 | 1977-02-23 | Photopolymerization initiator for unsaturated compound |
FR7705212A FR2341598A1 (fr) | 1976-02-23 | 1977-02-23 | Inducteurs de photopolymerisation a base de derives de l'anthrone |
US05/892,568 US4188224A (en) | 1976-02-23 | 1978-04-03 | Photopolymerizable composition containing anthrones |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH217376A CH597262A5 (nl) | 1976-02-23 | 1976-02-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH597262A5 true CH597262A5 (nl) | 1978-03-31 |
Family
ID=4227591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH217376A CH597262A5 (nl) | 1976-02-23 | 1976-02-23 |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS52107084A (nl) |
BE (1) | BE851689A (nl) |
CH (1) | CH597262A5 (nl) |
DE (1) | DE2704927A1 (nl) |
FR (1) | FR2341598A1 (nl) |
GB (1) | GB1526661A (nl) |
NL (1) | NL7701700A (nl) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2720560A1 (de) * | 1977-05-07 | 1978-11-09 | Basf Ag | Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen |
DE3464921D1 (en) * | 1983-05-02 | 1987-08-27 | Du Pont | Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions |
JP5299838B2 (ja) * | 2008-03-18 | 2013-09-25 | 川崎化成工業株式会社 | 10−ヒドロキシ−10−ナフチルメチルアントラセン−9(10h)−オン化合物及びその光ラジカル重合開始剤としての用途。 |
GB2476976A (en) * | 2010-01-18 | 2011-07-20 | Lintfield Ltd | Protected aryl ketones and their use as photoinitiators |
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1976
- 1976-02-23 CH CH217376A patent/CH597262A5/xx not_active IP Right Cessation
-
1977
- 1977-02-07 DE DE19772704927 patent/DE2704927A1/de not_active Withdrawn
- 1977-02-17 NL NL7701700A patent/NL7701700A/nl not_active Application Discontinuation
- 1977-02-22 BE BE175138A patent/BE851689A/xx unknown
- 1977-02-22 GB GB7519/77A patent/GB1526661A/en not_active Expired
- 1977-02-23 JP JP1910477A patent/JPS52107084A/ja active Pending
- 1977-02-23 FR FR7705212A patent/FR2341598A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS52107084A (en) | 1977-09-08 |
GB1526661A (en) | 1978-09-27 |
BE851689A (fr) | 1977-08-22 |
FR2341598A1 (fr) | 1977-09-16 |
DE2704927A1 (de) | 1977-08-25 |
FR2341598B1 (nl) | 1980-04-18 |
NL7701700A (nl) | 1977-08-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |