CH589725A5 - - Google Patents

Info

Publication number: CH589725A5
Authority: CH; Switzerland

Application number

CH1502773A

Original Assignee

Siemens Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1972-11-02

Filing date

1973-10-25

Publication date

1977-07-15

1973-10-25 Application filed by Siemens Ag filed Critical Siemens Ag

1977-07-15 Publication of CH589725A5 publication Critical patent/CH589725A5/xx

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Analytical Chemistry (AREA)
Physical Vapour Deposition (AREA)

CH1502773A 1972-11-02 1973-10-25 CH589725A5 (xx)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE2253769A DE2253769C3 (de)	1972-11-02	1972-11-02	Kathodenzerstäubungsanlage mit kontinuierlichem Substratdurchlauf

Publications (1)

Publication Number	Publication Date
CH589725A5 true CH589725A5 (xx)	1977-07-15

Family

ID=5860714

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CH1502773A CH589725A5 (xx)	1972-11-02	1973-10-25

Country Status (6)

Country	Link
US (1)	US3852181A (xx)
JP (1)	JPS4977839A (xx)
CH (1)	CH589725A5 (xx)
DE (1)	DE2253769C3 (xx)
FR (1)	FR2205584B1 (xx)
GB (1)	GB1402820A (xx)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4116806A (en) *	1977-12-08	1978-09-26	Battelle Development Corporation	Two-sided planar magnetron sputtering apparatus
US4175030A (en) *	1977-12-08	1979-11-20	Battelle Development Corporation	Two-sided planar magnetron sputtering apparatus
US4274936A (en) *	1979-04-30	1981-06-23	Advanced Coating Technology, Inc.	Vacuum deposition system and method
DE2950997C2 (de) *	1979-12-18	1986-10-09	Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa	Vorrichtung zum Beschichten
US4423701A (en) *	1982-03-29	1984-01-03	Energy Conversion Devices, Inc.	Glow discharge deposition apparatus including a non-horizontally disposed cathode
JPS62230977A (ja) *	1986-04-01	1987-10-09	Seiko Epson Corp	薄膜製造装置
US4812217A (en) *	1987-04-27	1989-03-14	American Telephone And Telegraph Company, At&T Bell Laboratories	Method and apparatus for feeding and coating articles in a controlled atmosphere
WO1992017621A1 (en) *	1991-04-04	1992-10-15	Conner Peripherals, Inc.	Apparatus and method for high throughput sputtering
US6193853B1 (en)	1999-02-25	2001-02-27	Cametoid Limited	Magnetron sputtering method and apparatus
US6290821B1 (en)	1999-07-15	2001-09-18	Seagate Technology Llc	Sputter deposition utilizing pulsed cathode and substrate bias power
US6833031B2 (en)	2000-03-21	2004-12-21	Wavezero, Inc.	Method and device for coating a substrate
DE10320985B4 (de) *	2003-05-09	2005-03-24	Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co.Kg	Vorrichtung zum Beschichten eines Substrats mit von der Vakuumkammer getrenntem Saugraum
TWI337517B (en) *	2008-03-04	2011-02-11	Inventec Corp	Trace carrier
CZ2015837A3 (cs) *	2015-11-27	2017-03-01	Shm, S. R. O.	Cylindrická katoda pro nanášení vrstev metodou PVD

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3294670A (en) *	1963-10-07	1966-12-27	Western Electric Co	Apparatus for processing materials in a controlled atmosphere
US3521765A (en) *	1967-10-31	1970-07-28	Western Electric Co	Closed-end machine for processing articles in a controlled atmosphere
US3616402A (en) *	1968-05-31	1971-10-26	Western Electric Co	Sputtering method and apparatus
US3793167A (en) *	1972-06-01	1974-02-19	Globe Amerada Glass Co	Apparatus for manufacturing metal-coated glass

1972
- 1972-11-02 DE DE2253769A patent/DE2253769C3/de not_active Expired
1973
- 1973-10-18 GB GB4857773A patent/GB1402820A/en not_active Expired
- 1973-10-25 CH CH1502773A patent/CH589725A5/xx not_active IP Right Cessation
- 1973-10-29 FR FR7338442A patent/FR2205584B1/fr not_active Expired
- 1973-10-30 US US00411088A patent/US3852181A/en not_active Expired - Lifetime
- 1973-11-02 JP JP48123912A patent/JPS4977839A/ja active Pending

Also Published As

Publication number	Publication date
DE2253769A1 (de)	1974-05-09
JPS4977839A (xx)	1974-07-26
FR2205584B1 (xx)	1977-03-11
DE2253769C3 (de)	1979-07-12
FR2205584A1 (xx)	1974-05-31
DE2253769B2 (de)	1978-11-02
US3852181A (en)	1974-12-03
GB1402820A (en)	1975-08-13

Legal Events

Date	Code	Title	Description
1979-07-13	PL	Patent ceased

Publication	Publication Date	Title
JPS4991700A (xx)	1974-09-02
FR2205584B1 (xx)	1977-03-11
JPS5231756Y2 (xx)	1977-07-19
JPS5212035B2 (xx)	1977-04-04
JPS4954587A (xx)	1974-05-27
JPS4980070A (xx)	1974-08-02
JPS522169Y2 (xx)	1977-01-19
JPS5235390Y2 (xx)	1977-08-12
JPS5324670Y2 (xx)	1978-06-24
JPS4953315A (xx)	1974-05-23
JPS48104140U (xx)	1973-12-05
JPS48114377U (xx)	1973-12-27
CH573554A5 (xx)	1976-03-15
NL7312983A (xx)	1974-03-26
CH563689A5 (xx)	1975-06-30
CH568528A5 (xx)	1975-10-31
CH568869A5 (xx)	1975-11-14
CH569075A5 (xx)	1975-11-14
CH569108A5 (xx)	1975-11-14
CH570152A5 (xx)	1975-12-15
CH571824A5 (xx)	1976-01-30
CH562345A5 (xx)	1975-05-30
CH573646A5 (xx)	1976-03-15
CH573880A5 (xx)	1976-03-31
CH577057B5 (xx)	1976-06-30