CH524690A - New process for the deposition by cathodic sputtering of metals or oxides on a metal support and application of said process - Google Patents
New process for the deposition by cathodic sputtering of metals or oxides on a metal support and application of said processInfo
- Publication number
- CH524690A CH524690A CH372571A CH372571A CH524690A CH 524690 A CH524690 A CH 524690A CH 372571 A CH372571 A CH 372571A CH 372571 A CH372571 A CH 372571A CH 524690 A CH524690 A CH 524690A
- Authority
- CH
- Switzerland
- Prior art keywords
- oxides
- metals
- deposition
- application
- metal support
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
- H01J49/46—Static spectrometers
- H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
- H01J49/488—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with retarding grids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7014327A FR2088659A5 (en) | 1970-04-21 | 1970-04-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH524690A true CH524690A (en) | 1972-06-30 |
Family
ID=9054289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH372571A CH524690A (en) | 1970-04-21 | 1971-03-15 | New process for the deposition by cathodic sputtering of metals or oxides on a metal support and application of said process |
Country Status (17)
Country | Link |
---|---|
US (1) | US3773639A (en) |
JP (1) | JPS5324914B1 (en) |
AT (1) | AT304990B (en) |
BE (1) | BE766023A (en) |
BR (1) | BR7102391D0 (en) |
CA (1) | CA933881A (en) |
CH (1) | CH524690A (en) |
DE (1) | DE2119066A1 (en) |
ES (1) | ES390345A1 (en) |
FR (1) | FR2088659A5 (en) |
GB (1) | GB1307956A (en) |
IL (1) | IL36656A (en) |
LU (1) | LU63024A1 (en) |
NL (1) | NL7105157A (en) |
PL (1) | PL83268B1 (en) |
RO (1) | RO61059A (en) |
SE (1) | SE366345B (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2320565A1 (en) * | 1973-04-12 | 1977-03-04 | Radiotechnique Compelec | SELECTIVE TRANSPARENCY PLATE AND ITS MANUFACTURING PROCESS |
AU507748B2 (en) * | 1976-06-10 | 1980-02-28 | University Of Sydney, The | Reactive sputtering |
DE2630883C2 (en) * | 1976-07-09 | 1985-02-07 | Basf Ag, 6700 Ludwigshafen | Use of a layer containing porous inorganic oxides applied to a metallic support by the plasma or flame spraying process as a diaphragm in an electrolysis cell |
AU5889880A (en) * | 1979-07-02 | 1981-01-15 | Olin Corporation | Manufacture of low overvoltage electrodes by cathodic sputtering |
US4400255A (en) * | 1981-06-29 | 1983-08-23 | General Motors Corporation | Control of electron bombardment of the exhaust oxygen sensor during electrode sputtering |
US4420385A (en) * | 1983-04-15 | 1983-12-13 | Gryphon Products | Apparatus and process for sputter deposition of reacted thin films |
US5202008A (en) * | 1990-03-02 | 1993-04-13 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
US5391275A (en) * | 1990-03-02 | 1995-02-21 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
EP0446657B1 (en) * | 1990-03-02 | 1995-07-26 | Applied Materials, Inc. | Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
WO1993010275A1 (en) * | 1991-11-21 | 1993-05-27 | Nisshin Steel Co., Ltd. | Method of forming layer of evaporation coating |
EP0593372B1 (en) * | 1992-10-14 | 2001-09-19 | Daiki Engineering Co., Ltd. | Highly durable electrodes for eletrolysis and a method for preparation thereof |
CA2154428C (en) * | 1995-07-21 | 2005-03-22 | Robert Schulz | Ti, ru, fe and o alloys; use thereof for producing cathodes used for electrochemically synthesizing sodium chlorate |
FR2861219B1 (en) * | 2003-10-15 | 2006-04-07 | Commissariat Energie Atomique | ALKALINE FUEL CELL COMPRISING AN ANODE COMPRISING ALUMINUM AND ZINC AND METHOD OF MANUFACTURING THE ANODE |
US20050205415A1 (en) * | 2004-03-19 | 2005-09-22 | Belousov Igor V | Multi-component deposition |
ITMI20091621A1 (en) * | 2009-09-23 | 2011-03-24 | Industrie De Nora Spa | ELECTRODE FOR ELECTROLYTIC PROCESSES WITH CONTROLLED CRYSTALLINE STRUCTURE |
JP4734664B1 (en) * | 2010-09-17 | 2011-07-27 | 田中貴金属工業株式会社 | Electrode for electrolysis, anode for electrolysis of ozone, anode for electrolysis of persulfate, and anode for chromium electrooxidation |
US10654034B2 (en) | 2014-05-30 | 2020-05-19 | At Energy Llc | Method of preparing platinum-based catalyst and platinum-based catalyst |
RU2562462C1 (en) * | 2014-05-30 | 2015-09-10 | Общество с ограниченной ответственностью "Эй Ти Энерджи", ООО "Эй Ти Энерджи" | Method of producing platinum-based catalyst and platinum-based catalyst |
-
1970
- 1970-04-21 FR FR7014327A patent/FR2088659A5/fr not_active Expired
-
1971
- 1971-03-15 CH CH372571A patent/CH524690A/en not_active IP Right Cessation
- 1971-03-16 SE SE03345/71A patent/SE366345B/xx unknown
- 1971-04-05 US US00131497A patent/US3773639A/en not_active Expired - Lifetime
- 1971-04-06 RO RO66501D patent/RO61059A/ro unknown
- 1971-04-16 NL NL7105157A patent/NL7105157A/xx unknown
- 1971-04-19 JP JP2520271A patent/JPS5324914B1/ja active Pending
- 1971-04-19 CA CA110757A patent/CA933881A/en not_active Expired
- 1971-04-19 GB GB2665571*A patent/GB1307956A/en not_active Expired
- 1971-04-19 ES ES390345A patent/ES390345A1/en not_active Expired
- 1971-04-19 PL PL1971147635A patent/PL83268B1/pl unknown
- 1971-04-20 LU LU63024D patent/LU63024A1/xx unknown
- 1971-04-20 IL IL36656A patent/IL36656A/en unknown
- 1971-04-20 DE DE19712119066 patent/DE2119066A1/en active Pending
- 1971-04-20 BE BE766023A patent/BE766023A/en unknown
- 1971-04-21 AT AT342371A patent/AT304990B/en not_active IP Right Cessation
- 1971-04-22 BR BR2391/71A patent/BR7102391D0/en unknown
Also Published As
Publication number | Publication date |
---|---|
FR2088659A5 (en) | 1972-01-07 |
IL36656A (en) | 1974-01-14 |
US3773639A (en) | 1973-11-20 |
BR7102391D0 (en) | 1973-05-03 |
JPS5324914B1 (en) | 1978-07-24 |
CA933881A (en) | 1973-09-18 |
DE2119066A1 (en) | 1971-11-04 |
RO61059A (en) | 1976-10-15 |
BE766023A (en) | 1971-10-20 |
GB1307956A (en) | 1973-02-21 |
AT304990B (en) | 1973-02-12 |
IL36656A0 (en) | 1971-06-23 |
PL83268B1 (en) | 1975-12-31 |
LU63024A1 (en) | 1972-12-11 |
ES390345A1 (en) | 1973-06-01 |
SE366345B (en) | 1974-04-22 |
NL7105157A (en) | 1971-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |